research institute for precision machine manufacturing (rusia)

17
Joint Stock Company Research Institute for Precision Machine Manufacturing Principal direction of the company's activity: Development and production of special technological equipment for micro-, nano - electronics, microwave technology, solar energy, medicine, etc. Achievements: Since the company establishment in 1962 more than 3000 types of equipment for industry, science and education have been designed and manufactured. General Director M. BIRUKOV, Ph.D. NIIME Research Institute for Molecular Electronics

Upload: representacion-comercial-de-rusia-en-argentina

Post on 12-Jan-2017

121 views

Category:

Technology


4 download

TRANSCRIPT

Joint Stock CompanyResearch Institute for Precision Machine

Manufacturing

Principal direction of the company's activity:

Development and production of special technological equipment for micro-, nano - electronics, microwave technology, solar energy, medicine, etc.

Achievements:

Since the company establishment in 1962 more than 3000 types of equipment for industry, science and education have been designed and manufactured. General Director

M. BIRUKOV, Ph.D.

NIIMEResearch Institute for Molecular Electronics

Research Institute of Precision Machine Manufacturing (NIITM) was established in 1962 inZelenograd to become a key enterprise with the main focus on creation of specific processingequipment for electronic industry.

Equipment based on NIITM development formed the foundation of semiconductor productionin Russia and Soviet republics. Equipment of the company was exported to the CMEA countriesand China.

Research and production activities of NIITM are marked by a variety of fundamental andapplied researches and developments: a number of scientific works are published; more than600 certificates for the invention and patents are received. Innovative projects of the companyare awarded by state decorations, Orders and Medals at the international exhibition. In March1981 the company was awarded the Order of the Red Banner of Labor.

Nowadays Research Institute of Precision Machine Manufacturing belongs to a group ofcompanies headed by JSC “Research Institute of Molecular Electronics".

NIITM offers services for development of a wide range of research and industrial technologicalequipment and supplies vacuum-plasma and physical and thermal chambers as well as clustersbased on it for process implementation in nano-, micro- and electronics, microwavetechnology, medicine, solar energy, etc.

About the company

Directions of equipment production

JSC NIITM creates and produces vacuum-plasma and physical and thermal equipment:

Plants for industrial productionMiddle-size plants for

researches and small-scale production

Compact installations for technological training in

technical universities

Process scheme of technological equipment

Application field of the equipment developed by NIITM

• Microelectronics and microwave equipment

• Materials and coatings

• Sensors and control devices

• Advanced technologies

• Sustainable power sources

• Medicine and medical devices

Over the last 10 years the company has developed more than 55 types of innovative technologicalequipment for processing plates in diameter 100, 150, 200 mm for the implementation of thetechnology level to 0.8 microns:

Manufactured products range

• Set of vacuum installations for film deposition onto wafers by magnetron sputtering;

• Set of vacuum installations for film deposition by electron-beam evaporation;

• Set of vacuum installations for dry processing of the surface in the rf discharge plasma;

• Set of vacuum installations for film deposition from gas environment in the rf discharge plasma;

• Set of installations for heat treatment of wafers;

• Set of vacuum installations for receiption of high-purity materials.

• More than fifty years of experience in the development and production of specialtechnological vacuum-plasma and physical and thermal equipment for the electronicsindustry;

• Development and production of the equipment according to customer's specifications.Maximum adaptation of basic equipment to the required technological processes of thecustomer.

• Development test of technological solutions and Test Activities with the customer.Experience and high professional level of the staff in the development and production ofequipment for modern technologies;

• A wide range of equipment for specialists training, researches, small-scale and serialproduction of nano-, micro- and electronics, microwave technology, obtaining ultra-purematerials, solar energy, etc.;

• Ability to develop new technological equipment for the customer quickly and efficiently;

• Warranty and post-warranty product support, ability to upgrade equipment accordingto the new customer tasks.

Competitive advantages

Оборудование для промышленного производства

The company has developed and produced the set of installations for individualprocessing of plates up to 200 mm (8 inch) with load lock "from plate holder to theplate holder".

Magna ТМ-200

Plasma ТМ-200

Izophaz ТМ-200

Modern development level of technological equipment

Оборудование для промышленного производства

Vacuum cluster plants for plates (Ø 150 mm)processing

KVTU-6

2-position mini cluster

3-position mini cluster

APPENDIX

Set of vacuum installations for film deposition by magnetron sputtering onto plates 100, 150, 200 mm in diameter for realization of 0,8 um level technology

Magna ТМ 22

Magna ТМ 5

Magna ТМ R

Magna ТМ 29

Magna ТМ 200

МVU ТМ Magna 9,10

МVU ТМ Magna 1-8,11,12

NVU ТМ Magna

Magna ТМ 7

Helicon ТМ

Оборудование для промышленного производства

Set of vacuum installations for film deposition by electron-beam evaporation onto plates 100, 150, 200 mm in diameter for realization of 1,0 – 0,8 um level technology

ELU ТМ 38

ELU ТМ 5

Set of vacuum installations for dry processing of the surface in the RF discharge plasma on plates 100, 150, 200 mm in diameter for realization of 0,8 um level technology

Plasma ТМ 7

MVU ТМ Plasma 01

NVU ТМ Plasma

MVU ТМ Plasma 02

MVU ТМ Plasma 03

MVU ТМ Plasma 04

MVU ТМ Plasma 06

Plasma ТМ 200

Plasma ТМ 5

Set of vacuum installations for film deposition from gas environment in the RF discharge plasma on plates 100, 150, 200 mm in diameter for realization of 1,0 – 0,8 um level technology

MVU ТМ Izophaz 01

MVU ТМ Izophaz 02

MVU ТМ Izophaz 03 (ALD)

Izophaz ТМ 200

Set of installations for heat treatment of plates 100, 150, 200 mm in diameter for realization of 1,0 – 0,8 um level technology at 300-1200 ° C

Oxid ТМ 1

Otjig ТМ 4

MVU ТМ Otjig

Otjig ТМ 5

Otjig ТМ 4М

Otjig ТМ 6

Izotron ТМ 1

Izoplaz ТМ 1

Оборудование для промышленного производства

Set of vacuum installations for receiption of high-purity materials (maximum purification rate – 99,99999)

Hydryd ТМ Chlorid ТМ

Monooxid ТМ

THANK YOU FOR YOUR ATTENTION!

Russia, 124460 Moscow, Zelenograd, Panfilovskiy pr., 10Phone: +7(495)229-7501, Fax: +7(495)229-7522Email: [email protected]; [email protected], Web-site: www.niitm.ru