lecture: tuesday/thursday 9:30 – 10:45 mueunjae memorial hall,...
TRANSCRIPT
AMSE 609Advanced Electron MicroscopyAdvanced Electron Microscopy
Spring 2010
• Lecture: Tuesday/Thursday 9:30 – 10:45Mueunjae Memorial Hall, Room 305
• Instructor: Prof. Sang Ho Oh, Room 319, Bldg #1Tel: 279-2144, E-mail: [email protected]
AMSE 609 Spring 2010
Course Objectivej• Goals:
- In depth understanding of fundamentals of scattering, diffraction and imaging.
- Understand three major TEM image forming principles, i.e. diffraction/phase/STEM Z-contrast imaging
- Introduce electron spectroscopy and spectroscopic imaging- Introduce electron spectroscopy and spectroscopic imaging
- Get specialized with TEM technique(s) that you use most
- Keep up with current progress in TEM instrumentation and Keep up with current progress in TEM instrumentation and advances in TEM characterization
AMSE 609 Spring 2010
Course Mechanisms• Prerequisite:
MUST l t AMSE 608 b f h d
• Grading policy:
- MUST complete AMSE 608 beforehand
- Attendance and class activity 20%- Reading assignments and homework 30%
TEM Laboratories and term paper 50%- TEM Laboratories and term paper 50%
Term project: Chose TEM technique(s) (not limited to those covered in this course) and a material system (you may want to work on your own ) y (y y ysample) that you wish to study more deeply. Submit 1 page abstract by April 8 and term paper by June 1. The writing guideline for term paper will be given later in class. Self-operation of TEM is highly recommended. will be given later in class. Self operation of TEM is highly recommended. Extra points will be added for those accompanied by quantitative interpretation based on simulations. All submission and presentation should be given in English
AMSE 609 Spring 2010
should be given in English.
Course ContentsI. ELASTIC ELECTRON SCATTERING: IMAGING
1. Diffraction contrast1 1 Kinematical diffraction theory1.1. Kinematical diffraction theory1.2. Dynamical diffraction theory1.3. Defect analysis: Dislocations and twins
2. Phase contrast2. Phase contrast2.1. Image formation theory of HRTEM2.2. Simulation of HRTEM images2.3. Aberration function and practical correctionp2.4. Phase retrieval by exit-wave reconstruction of HRTEM2.5. Other phase contrast techniques
3. STEM Z-contrast3.1. Image formation theory of HADDF Z-contrast3.2. Simulation of HAADF Z-contrast image
II. INELASTIC ELECTRON SCATTERING: SPECTROSCOPY1. EELS and EDS2. Spectroscopic imaging
AMSE 609 Spring 2010III. TERM PRESENTATION
Text book• Lecture note:
Will be uploaded at e-class a day advance
1 D id B Willi C B C t “T i i El t
• References:
Will be uploaded at e class a day advance
1. David B. Williams, C. Barry Carter, “Transmission Electron Microscopy”, 2nd edition, Springer (2009).
2. Brent Fultz, James M. Howe, “Transmission Electron Microscopy and Diffractometry of Materials”, 3rd edition, Springer (2008).
3. Peter R. Buseck, John M. Cowley, Leory Eyring, “High-Resolution Transmission Electron Microscopy and Associated Techniques” Transmission Electron Microscopy and Associated Techniques , Oxford University Press (1998).
4. Ludwig Reimer, Helmut Kohl, “Transmission Electron Microscopy: Physics of Image Formation”, 5th edition, Springer (2008).
5. John C. H. Spence, “High-Resolution Electron Microscopy”, 3rd
edition, Oxford Science Publications (2003).
AMSE 609 Spring 2010
edition, Oxford Science Publications (2003).
About me…• Education:
- B. S. – Han Yang University (1996)- M. S. – POSTECH (1998)- Ph.D. – POSTECH (2002)
• Professional Experiences:- Post doctoral research – Max-Planck Institute @ Stuttgart, Germany
Senior Researcher KRISS @ Daejeon Korea- Senior Researcher – KRISS @ Daejeon, Korea- Researcher – Erich Schmid Institute @ Leoben, Austria- Researcher – Oak Ridge National Lab @ Oak Ridge, TN, US- Senior Researcher – KBSI @ Daejeon, Korea- Assistant Prof @ POSTECH since July 2009
• Research Expertise:- Crystalline defects, crystal growth, thin films, perovskite oxides, electron
microscopy size effects mechanical behavior nanostructured materials
AMSE 609 Spring 2010
microscopy, size effects, mechanical behavior, nanostructured materials
What can you do with a TEM?
AMSE 609 Spring 2010
What can you do with a TEM?y
• Selected Area Selected Area Diffraction (SAD)
C t ll hi t t - Crystallographic structure from particular areas of a sample.p
- Used to distinguish and identify crystalline (and amorphous) phases in a material.
Selected area diffraction pattern110 Zone axis pattern of a f.c.c. Au film
P tt l d bl t i i i th A fil
- Wave description of diffraction
AMSE 609 Spring 2010
Pattern reveals double twining in the Au film
What can you do with a TEM?y• Convergent Beam El t Diff ti Electron Diffraction (CBED)
- Point and Space Group determination
- Local strain
- Nanoscale diffraction
Convergent beam electron diffraction pattern
111 Z i tt f ili
AMSE 609 Spring 2010
111 Zone axis pattern of silicon
Note detailed structure in the central disck
What can you do with a TEM?y
• Large-angle • Large-angle Convergent Beam Electron Diffraction Electron Diffraction (LACBED)
- Misorientation across grain boundaries
- Dislocation Burgers vector
- Crystalline symmetry
AMSE 609 Spring 2010
What can you do with a TEM?y
• Diffraction Contrast Imaging
• Strain fieldsStrain fields- Dislocations
- Stacking faults- Stacking faults
- Grain boundaries
- PrecipitatesPrecipitates
- Second phases
Typical bright field imageDislocation configuration at the interface between a SiGe heteroepitaxial layer and a Si (100) substrate
- Dynamical diffraction theory- Intensity of diffracted beam
D f t l i
AMSE 609 Spring 2010
p y ( )viewed in plan view (along [100])- Defect analysis
What can you do with a TEM?y
• Diffraction Contrast Imaging
• One beam selected One beam selected for imaging
T itt d “b i ht fi ld”- Transmitted – “bright field”
- Diffracted – “dark field”
AMSE 609 Spring 2010
What can you do with a TEM?y
Bright field image Dark field image ‘Weak beam’ dark field image
AMSE 609 Spring 2010
dark field image
What can you do with a TEM?y• High-resolution imagingimaging
• Atomic column i t l ti images at resolutions from 0.7Å and above
- Interference of transmitted and diffracted electron diffracted electron waves
High resolution micrograph of a copper-sapphire interface- Contrast Transfer Function
- Image simulation (Thickness-defocus map)- Contrast delocalization
Aberration (Cs) correction
AMSE 609 Spring 2010
- Aberration (Cs) correction- Exit wave reconstruction
What can you do with a TEM?y
Electron • Electron holographyM th • Map the mean inner potential
f t i lof a material
AMSE 609 Spring 2010
What can you do with a TEM?y
• High angle annular g gdark field (HADDF) imaging
Au nanoparticles in a Al2O3 film
g g
- Accomplished in a dedicated Scanning
Au
gTEM (STEM)
- Collects incoherent Al2O3
Siscatter, yields atomic resolution
Au
Si
Au nanoparticleson a Si nanowire
- Image forming theory
I i l ti ( / h )
AMSE 609 Spring 2010
- Image simulation (w/ phonon)
What can you do with a TEM?y
Electron energy loss • Electron energy loss spectroscopy
- Measures the amount of energy lost by the incident electrons.
- Similar spatial l ti resolution, energy
resolution of ≈ 1 eV.
- Probes density of state Probes density of state (DOS) locally.
EELS spectrum from CaCO
AMSE 609 Spring 2010
EELS spectrum from CaCO3
What can you do with a TEM?y
Energy Filtered • Energy Filtered Imaging
- Zero loss imaging removes inelastically scattered electrons from image La M edge Ti L edgeelectrons from image
- Selective imaging of electrons that have lost a electrons that have lost a particular energy
- Most commonly used to
LaSrMnO3/SrTiO3 thin film
Mn L edge A+B+Ccreate a map of local (≈ 1 nm) chemistry
AMSE 609 Spring 2010
3 3
What can you do with a TEM?y
• Dynamical behavior- Possible to apply many type of
stimuli to samples during simultaneous imagingsimultaneous imaging
- Probe interrelationships between structure-properties between structure properties and processing
- Stimuli include:• Temperatures to 1300 oC• Temperature to LN2• Chemical flux
N i l ti
Dissociation of ZnO crystal at 360 oC under high energy (1 25 MeV) electron beam
• Nanomanipulation• Nanoindentation• Electrical bias in combination with
heating
AMSE 609 Spring 2010
high energy (1.25 MeV) electron beamheating• Uniaxial strain
A Way to organize our thoughtsy g g• In AMES 609, we will cover:
- Elastic & inelastic scattering
- Diffraction• Single scattering
(kinematical)• Multiple scattering
(dynamical)(dynamical)
- Image formation:• Diffraction contrast• Phase contrast• Incoherent imaging
- Spectroscopy:p py• Energy Dispersive X-ray Spectroscopy• Electron Energy Loss Spectroscopy
AMSE 609 Spring 2010
Coming up in next classg p• Basic properties of electrons: A quick reminder…
- Wave-particle duality- Wave-particle duality
h hp mv
Every particle with mass m and momentum p (velocity v ) can be described by a wave with wavelength λ.
p mv
• Elastic scattering- Particle perspective - Wave perspectiveParticle perspective Wave perspective
AMSE 609 Spring 2010