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MEMS mirror for low cost laser scanners

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  • MEMS mirror for low cost

    laser scanners Ulrich Hofmann

  • Outline

    Introduction Optical concept of the LIDAR laser scanner MEMS mirror requirements MEMS mirror concept, simulation and design fabrication process first results summary and outlook

  • Introduction

    Goals of the LIDAR sensor development:

    range: 80 m field of view: 250 degrees compact size: 6 cm x 6 cm x 8 cm low cost: < 40

  • LIDAR sensor optics concept

  • 2D-MEMS mirror

    omnidirectional lens

    LIDAR sensor optics concept

  • MEMS mirror requirements

    1. large mirror aperture size of 7mm

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    4. large tilt angle of 15 degrees in both axes

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    4. large tilt angle of 15 degrees in both axes

    5. low static and dynamic mirror deformation

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    4. large tilt angle of 15 degrees in both axes

    5. low static and dynamic mirror deformation

    6. shock and vibration robust design

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    4. large tilt angle of 15 degrees in both axes

    5. low static and dynamic mirror deformation

    6. shock and vibration robust design

    7. full functionality over broad temperature range (-40..+85C)

    MEMS mirror requirements

  • 1. large mirror aperture size of 7mm

    2. two-axis laser beam deflection

    3. circular scan pattern => constant azimuth angle

    4. large tilt angle of 15 degrees in both axes

    5. low static and dynamic mirror deformation

    6. shock and vibration robust design

    7. full functionality over broad temperature range (-40..+85C)

    8. mass producible at low cost

    MEMS mirror requirements

  • Standard 2D MEMS mirror design approach: Gimbal mount configuration

    mirror

    springs

    stacked

    vertical

    comb drives

    gimbal

  • Gimbal mount design is the optimum choice for laser projection displays ...

  • ... but not for a 7mm circle scanner

    1. circular scanning requires identical resonant frequencies of both

    axes difficult to achieve with a gimbal design

    2. the MEMS scanner would become too large and too expensive

    3. disadvantageous eigenmode spectrum

  • MEMS mirror concept: Tripod design

    stacked vertical comb electrodes for driving and sensing

    circular bending springs

    (thickness 40 m)

    mirror plate (diameter 7mm, thickness 500 m)

    identical resonant frequencies in xy minimum chip-size circular springs enable large tilt angle advantageous eigenmode spectrum

  • Finite element analysis of dynamic mirror deformation

    0

    2

    4

    6

    8

    10

    12

    14

    3 4 5 6 7 8

    mirror diameter [mm]

    de

    form

    ati

    on

    [

    m]

    solid mirror

    mirror with

    stiffening ring

    standard mirror with

    no reinforcement

    mirror

    standard

    thickness 80m

    mirror with

    stiffening rings

    thickness 500m

    solid mirror

    thickness 500m

  • Modal analysis

    1st mode:

    parasitic piston mode

    @ 1kHz

    2nd mode:

    first scan axis

    @ 1.6kHz

    Tripod 1st axis (f=677Hz)

    Tripod 1st axis (f=1.6kHz) Tripod 1st axis (f=1.6kHz)

    3rd mode:

    second scan axis

    @ 1.6kHz

    4th mode:

    parasitic mode

    @ 11.7kHz

  • electrostatic out-of-plane actuation by stacked vertical comb drives

    0,0000 0,0005 0,0010 0,0015 0,0020 0,0025

    -0,15

    -0,10

    -0,05

    0,00

    0,05

    0,10

    0,15

    Capaci

    tive S

    ignal [

    V]

    Time [s]

    capacitive signal

    drive pulse

    phase control loop

  • 1. minimum damping

    2. maximum scan angle

    3. low driving voltage

    4. effective protection against contamination

    hermetic vacuum packaging of MEMS mirrors on wafer level

  • MEMS wafer

    vacuum encapsulation of 2D-MEMS mirrors on wafer-level

  • MEMS wafer

    Glass wafer glassfrit bonding

    vacuum encapsulation of 2D-MEMS mirrors on wafer-level

  • vacuum encapsulation of 2D-MEMS mirrors on wafer-level

    MEMS wafer

    Glass wafer

    bottom wafer

    Au / Si

    eutectic bonding

    glassfrit bonding

  • the benefit of vacuum encapsulation of MEMS scanning mirrors

    atmosphere vacuum

    Q-factor > 140,000

  • fabrication process based on dual layer 80m thick polysilicon process

  • frontside etch

  • rear side etch

  • Wafer level vacuum encapsulation (cavity depth > 3 mm)

    titanium-getter

  • fabricated tripod mirror test structure

    rear side of the mirror

    stiffening rings

    mirror

    comb drive

    electrodes

    spacer

    circular

    suspension

  • first functional test of tripod mirror test structure

    single axis excitation

    f=1.5kHz

    dual axis excitation

    f=1.5kHz

  • Tripod MEMS mirror design with increased tilt angle Finite Element Analysis of nonlinear springs

    0

    5

    10

    15

    20

    25

    0 1 2 3 4 5

    torque [mNm]

    tilt

    an

    gle

    [d

    eg

    ree

    ]

    7.5 deg @ 180 volts

    tripod test structure

    f = 1.5 kHz

    new tripod mirror

    f = 0.8 kHz

  • Conclusion

    Vacuum packaging is the key for large aperture MEMS mirrors to achieve large scan angles

    A tripod seems to be the appropriate design for a two-axis circle scanning MEMS mirror

    Batch processing on 8-inch silicon wafers enables low-cost mass production of these devices

  • Acknowledgement

    This work has been supported by the EC within the 7th framework programme

    under grant agreement no. FP7-ICT-2009-4_248123 (MiniFaros)