ccmr – ret 2008

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CCMR – RET 2008 Week 1 June 29 to July 3 2008

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CCMR – RET 2008. Week 1 June 29 to July 3 2008. The Hill Exiting Cascadilla Hall. The Hill on College Ave. The Hill on Campus Road. The Hill on East Ave. The Hill to enter Clarke Hall. Day 1 Monday June 29, 2008. Kevin’s Email: - PowerPoint PPT Presentation

TRANSCRIPT

Page 1: CCMR – RET 2008

CCMR – RET 2008Week 1

June 29 to July 3 2008

Page 2: CCMR – RET 2008

Day 1Monday June 29, 2008

Kevin’s Email:“Cornell is up on a hill so it is extremely steep between the town of Ithaca and Cornell, but the campus itself is relatively manageable. I don’t think it will be too hilly for you...”

The Hill Exiting Cascadilla Hall

The Hill on College Ave

The Hill on Campus Road

The Hill on East Ave

The Hill to enter Clarke Hall

Page 3: CCMR – RET 2008

We Thought the hard part was over ……

The Construction Crane outside of Clarke Hall

Our First Detour!

Page 4: CCMR – RET 2008

Becoming Oriented to CCMR

Page 5: CCMR – RET 2008

Kit Umbach Introducing us to Materials Science

Page 6: CCMR – RET 2008

What is Materials Science• Interdisciplinary – Basic Science • Physics• Chemistry• Some biology

– Engineering • Electrical• Mechanical• Chemical

Page 7: CCMR – RET 2008

As A Materials Scientist What should we ask?

1. What is the structure and composition of materials?

2. How are the properties related to its structure and composition?

3. Can the structure and composition be manipulated through processing to achieve improved properties?

Page 8: CCMR – RET 2008

What is Materials Science Used For?

• Enables Technologies– Nanotechnology– Information and Telecommunications– Biotechnology – Life science– Energy– Environmental Technology

Page 9: CCMR – RET 2008
Page 10: CCMR – RET 2008

Atomic Force Microscope

• FUNCTION• At Cornell University the scientists are looking

at microscopic grooves in the surface of a sample.

• In biology, it has been used to look at images of DNA, single proteins, gap junctions, and living cells.(Hon and Hansma, 1992)

Page 11: CCMR – RET 2008

Benefits of AFM

• It can analyze a sample between 10 and 20 cm2 to a resolution of less than 2 nanometers.

• It is considered a non-destructive method of scanning because the force used by the probe is very small.

• There is very little time needed for preparation.

Page 12: CCMR – RET 2008

Problems With AFM

• It is difficult to use with biological structures because they are soft and can be distorted or destroyed.

• Hoh and Hansma, 1992, Trends Cell Bio 2, 208-213

Page 13: CCMR – RET 2008

Classroom Uses

• Princeton RET 1999- Lesson plan had the students construct and test a model of an AFN over five periods.

• Stanford Nanofabrication Facility-Nanoleap program-physics module- Their remote access activity uses AFM. Live video is beamed to high school classes.

Page 14: CCMR – RET 2008

How the AFM Works

• The AFM has a fine ceramic or semiconductor tip that acts like the needle in a phonograph. The tip is at the end of a canilever. As the tip is repelled or attracted by the surface, the canilever beam deflects. The magnitude of the deflection is caught by a laser. This gives the topography of the sample.

Page 15: CCMR – RET 2008

Water Jet Cutting

• Water jet cutting is done using a garnet abrasive.

• Low psi of 15,000• High psi of 50,000

Page 16: CCMR – RET 2008

Water Jet Cutting

• Water jet cutting is done using a garnet abrasive.

• Low psi of 15,000• High psi of 50,000

Page 17: CCMR – RET 2008

Water Jet Cutting

Page 18: CCMR – RET 2008

Water Jet Cutting

Page 19: CCMR – RET 2008

Finished Products

Page 20: CCMR – RET 2008

Planar Magnetron Sputtering

Page 21: CCMR – RET 2008

Planar Magnetron Sputtering

• Deposits thin metal and insulation films onto substrates

• Material does not need to be heated• More than one material can be

sputtered at a time

Page 22: CCMR – RET 2008

Planar Magnetron SputteringCathode Center Magnet

Ring Magnet

Target

(used) Target Mount

Page 23: CCMR – RET 2008

Planar Magnetron Sputtering

Page 24: CCMR – RET 2008

Planar Magnetron Sputtering• The chamber is evacuated• Argon is introduced, then ionized in the chamber

Argon Plasma

Page 25: CCMR – RET 2008

Planar Magnetron Sputtering•The cathode ring behind the target attracts the argon ions•The ions bombard the target, knocking off atoms, creating an atomic “dust”.•The dust settles on the substrate •Thickness of the deposition is monitored by crystal sensors

Page 26: CCMR – RET 2008

Planar Magnetron SputteringWe used this machine to:

Deposit Niobium and Tin onto four

sapphire substrates in a 2:1 ratio Two of the samples were heated to

1000°C for 5 hours to anneal the metals

We will be testing the different properties of these samples in the weeks to come

Coated samples in the furnace

Furnace used to anneal metals

Page 27: CCMR – RET 2008

Planar Magnetron Sputtering

We used this machine to:

Coat 2” silicon wafers with gold.

The metal disks made with the water jet cutter were used as masks.

Page 28: CCMR – RET 2008

Instron Model 1125

•Electro-mechanical

•Records force & distance

Page 29: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* Results

Page 30: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* Results

STEE

L

COPPER

BRASS

TITANIUMALUMINUM

DELRIM

Page 31: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* ResultsDISTANCE STRETCHED

FORC

E

Page 32: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* ResultsDISTANCE STRETCHED

FORC

E

Page 33: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* ResultsDISTANCE STRETCHED

FORC

E

Page 34: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* ResultsDISTANCE STRETCHED

FORC

E

Page 35: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* Results

Page 36: CCMR – RET 2008

* Calibration “strain gauge”

* 6 Samples

* What it Means

* Video

* Results

Page 37: CCMR – RET 2008

Young’s modulus for steel = 16,000,000 psi