c. alexander, w. h. butler, w. d. doyle, h. fujiwara, j. w ... · pdf filecenter for materials...
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Center for Materials for Information Technology
A NSF Materials Research Science and Engineering Center
MRAMs
C. Alexander, W. H. Butler, W. D. Doyle, H. Fujiwara,J. W. Harrell, G. J. Mankey, R. Schad, P. B. Visscher, (G)
MINT Review Meeting, 11/5/2003
Center for Materials for Information Technology
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Outline
• Motivation and introductory remark• Issues to be addressed• Topics chosen from preliminary work• Summary
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Motivation
• Although it is at the stage that the first product of MRAM will soon be announced, there are still critical problems to be solved:– reproducibility of switching,– scalability for future high density devices.
• Our group has a wide range of experience to address those problems: – materials physics and synthesis (Mankey, (G)), – thin film magnetics including exchange-coupled multilayers (Doyle, Fujiwara), – high speed magnetization switching/resonance (Alexander, Doyle, Visscher) – thermal agitation effect (Harrell), – transport phenomena (Butler, Schad), – magnetic and/or transport measurements (Alexander, Doyle, Mankey, Schad,
(G), Fujiwara), – computer simulation and visualization (Visscher).
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Write process and operation margin
Word current
Digit current
Selected bit
Coincident-current schemee.a.
MTJ
Schematic cross-section of an MRAM cell
Word line
Digit line
Pinned layer
Easy axisMemory layer
o
Hh.a.
Hd
Hw
He.aM
Operation marginNiFe yoke
Critical field for switching and operation margin
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x
1
0.5
0
-0.5
-1
y 10.50-0.5-1
Decrease of marginHh.a.
x
-0.5
y0-
Ideal margin
Dispersion effect
Thermal effectWord disturbance
Digit disturbance
MO
He.a
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Issues to be addressedGeneral basic issues on MRAM:
• Dominant causes for irreproducible switching andswitching field distribution (SFD).
• Thermal agitation effect on switching• Size effect on noise in magnetic tunneling elements
Optimum design and experiment on memory layers withwide operation margin:
• Conventional coincident (easy/hard axis field) pulse operation scheme
• Sequential (+/− 45º field) pulse operation scheme (recently proposed by Motorola)
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Topics to be presented
• Quasi-static and dynamic measurements of SFD• Conventional coincident-pulse operation MRAM:
– Proposed multilayer free-layer system with an increased operation margin
• Sequential-pulse operation MRAM:– Analytic/numeric parameter optimization—margin maximization– Energy landscape to help understand the switching mechanism– LLG (Landau-Lifshitz-Gilbert) simulation of switching
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Dynamic Measurements of SFD• FMR (Ferromagnetic Resonance):
− ∆H0 (extrapolation of ∆H to zero frequency) measures anisotropy distribution.
• Stripline measurements (nanosecondpulses):– measure remanent coercivity by MOKE – Glass substrate – Dependence on field direction
We have demonstrated that our FMR and MOKE-strip line systems have sufficient sensitivity on NiFe samples 2 x 10 micronsx 50 nm.
Glass Sub.
Film
Copper
Dielectric
Laser
Cross section of CPW
-30 -20 -10 0
-1
0
1
Mr /
Mr 0
Field (Oe)
100 ns 25 ns 5 ns 2 ns
(300 x 300 µm2)
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Composite free-layer for conventional coincident pulse-driven MRAM
#2
Critical switching field curves
AF layer
Soft F layer
#1
Coupling layer
210-1-2
2
1
0
-1
-2
Hdigit
Hword
Hk
HkMargin
ab
c
210-1-2
2
1
0
-1
-2
Hdigit
Hword
100 Oe
HkMargin
ab
c
(0.4 x 0.2µm2
x 2nm)
-100 Oe
Two-layer MRAM cell
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Sequential-pulse driven MRAM(Analytic/numeric parameter optimization--
margin maximization)
Sequential application of Hw and Hd
t
t
Hw
Hd
o
o
Synthetic AF memory cell
M1
M2
AF coupling Hw“0”
“1”Hw
HdHd
e.a.
h.a.
Corresponding magnetizationconfigurations
(a) (b)
(c)
(d)
(e)
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Analytic/numeric optimization - margin maximization
90º60º
30º
0º
120º
150º
180º
(continued)
hd
hw
o
Operation field margin in heasy, hhard domain
hhard
heasy
Equal angle curves in heasy, hhard domain
Taking in to account of thermal agitation effect, we tried to maximize operation margin (V = 0.3 × 0.15 µm2 × 2 nm, Hmax= 150 Oe).
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Energy contours for SAF MRAM
hword
hword+hdigit
hdigit
m
M1
M2
Blue vector m: static equilibrium in the presence of the word field.
h drags m up the slope, along the trajectory shown in blue.
Contours of constant static energy
Later, when hword+hdigitis applied, m moves so h is again perpendicular to the contour.
(total magnetization)
HI
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HA (y)
Worl
d Line
DigitLine
M2M1
EA (x)
Total magnetization trajectories for sequential pulse-field application
mx
my
mx
my
my
mx mx
Switching No Switching
my
T=0
T=R.T.t
t
Hw
Hdo
oτrise = τ fall = 2 ns
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Summary• General basic issues:
• Investigate dominant causes for irreproducible switching through − measurements of static and dynamic SFD,− observation of nucleation sites for switching by SEMPA,− simulation of thermal agitation effect on switching.
• Study size effect on noise in magnetic tunneling elements.
• Design and experiment on memory layers for both Conventional Coincident-Pulse driven scheme and Sequential-Pulse driven scheme.
• Proposed a new memory layer composed of F-AF coupled layers for theconventional scheme.
• Established analytic/numeric optimization method for both types of MRAMs.
• Demonstrated effectiveness of dynamic simulation and visualization for both designing and understanding.
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CPW (coplanar wave guide)-MOKE system for the study of fast switching of patterned films
Lock in Ampl. Computer
PulseGenerator
Photodiode
Polarizer
Analyser
He-Ne laser
Spatial filter
Objective LensElectromagnet
CPW
CCD
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Time series plots I
T=0 T=300KRise Time = 0
hJ=3.1
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Time series plots II
T=0Rise Time = 2 ns
T=300K
hJ=3.1
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Minimum Switching Field
Minimum Switching Field is the minimum value of the Word and the Digit field required to switch the sample.
Fields are normalized to Hk.
Little effect of the rise time.
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Dynamic simulation and visualization
Fig. 5. t (ns)φ
(deg
rees
)
angle of M from easy direction
hard-axis pulse
Roller-coaster visualization
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Quasi-static Measurements of SFD
MOKE/VSM• Mr-H angular dependence(SFD/matrial
parameters)•T/sweep rate dependence(∆E forswitching)
Seed layer
Mag. layer
Cap. layer
104 elements
• Clarify factors controlling and /or having possible correlation with the SFD.
• Conceivable causes for SFD :Geometrical factors:
macroscopic (aspect ratio/thickness)microscopic defects (grains/grain-
boundaries)Material inhomogeneities
• Focus on microscopic factors.
• Measurement: MOKE / VSM / SQUIDSEMPA (ORNL / Max Planck Inst.)
Observe reversal nucleation.Specify inhomogeneities.
(poly/single-X’tal/amorphous)
SEMPA(rsl:15 nm, with H )