presentation3 - inteldownload.intel.com/pressroom/kits/events/idffall_2007/keynoteotelli… ·...
TRANSCRIPT
SourceSource DrainDrain
Low Resistance LayerLow Resistance Layer
Silicon SubstrateSilicon Substrate
>20% Performance Increase
>10X Gate Leakage Reduction
HighHigh--K Gate DielectricK Gate DielectricMetal GateMetal Gate
IntelIntel’’s Unique Solutions Unique SolutionHighHigh--K Metal Gate 45nmK Metal Gate 45nm TransistorTransistor