news on production at izm / twente
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News on production at IZM / Twente. Yevgen Bilevych. CERN 22.02.2012. Main technological steps for the formation of structure TimePix chip or dummy substrate / spacer / Al grid. 1. Formation of protection layer. - PowerPoint PPT PresentationTRANSCRIPT
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News on production at IZM / Twente
Yevgen Bilevych
CERN 22.02.2012
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Main technological steps for the formation of structureTimePix chip or dummy substrate / spacer / Al grid
4. Formation of “support” / grid
1. Formation of protection layer
2. Deposition of spacer material
3. Deposition of Al thin film
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Main technological steps for the formation of GemGrid structure
4. Dry etching of BCB
Chip
1. Aluminum deposition (bottom electrode)
2. Deposition of BCB
3. Formation of Al grid
Chip
GemGrid IZM, Berlin and University of Bonn
200 mm silicon dummy wafer
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Main technological steps for the formation of structureTimePix chip / SiO2 or SU-8 / Al grid
4. Dry wet etching of SiO2
or wet etching of SU-8
Chip
1. Formation of SixNy layer
2. Deposition of SiO2 or SU-8
3. Formation of Al grid
GemGrid NIKHEF and University of Twente
TimePix single chip
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SiO2
SU-8
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Main technological steps for the formation of structureTimePix wafer / SU-8 pillar / Al grid
5. Development of SU-8
Chip
1. Formation of SixNy protection layer
2. Deposition of SU-8
3. Pillars-like structure formation
4. Formation of Al grid
InGrid University of Bonn, IZM Berlin, NIKHEF and University of Twente
200 mm TimePix wafer
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before
now
Main problems:- formation of protection layer
- deposition of Al- final development of SU-8
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Polyimide mask
Microsystems HD 4100 polyimide - negative tone, solvent developed, photodefinable polyimide
Steps:• Spinning• Baking• Exposition• Development• Silicon nitride deposition• Chemical activation of polyimide• Stripping
Advantage:• Silicon technology compatible
• Perfect alignment• No residuals
Disadvantage:• Temperature sensitive process
• Time consuming process• mechanical scratching of bonding pads
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deposition of Al layer
Sputtering system Leybold Z660
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25x x x x x x x x x x x x x x x x x x x x x x
DC 50%, no sputter etching, 30 sec – the deposition time for every sputtering run, + cooling delay
Total thickness: ~ 800 nm
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Development of SU-8
1. Acetone2. Acetone:IPA:H2O (1:1:2)3. Acetone:IPA:H2O (1:1:1)4. Acetone:IPA (1:1)5. Microstrip 60016. H2O7. IPA8. Acetone9. Drying in the air
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1. 200 mm TimePix wafer / SixNy / SU-8 pillars / Al grid - yield of high quality InGrids about 70%
2. Single TimePix chip / SixNy / SiO2 (hole) / Al grid
3. Single TimePix chip / SixNy / SU-8 (hole) / Al grid
4. 200 mm silicon wafer / BCB (hole) / Al grid
Conclusion