NCTU NDL E-Gun B Manual

DEC.20.2017

I. Preparation 1. Check the pressure and

the temperature of

cooling water (<25℃).

2. Check the operation of

compressor.

3. Check whether

warning message is on

the display or not.

4. Check quartz crystal

frequency on

deposition controller.

4 .8< f < 5 MHz。

<<Cooling water meter>>

<<Compressor>>

<<Warning message>>

<<Deposition controller>>

5. Confirm that the icon “冷凍幫浦”(cryogenic pump) turns

red and machine gets warm-up.

The temperature of cryogenic pump is below -6℃.

6. Adjust the knobs of

X/Y position on

LOCAL CONTROL

BOX to default

setting.

EMISSION turns to 0.

7. Sign the record book.

Replace the status

board.

<<Operation panel>>

<<Cryogenic pump>>

<<LOCAL CONTROL BOX>>

II. Breaking vacuum & Place target materials and wafers 1. Use ID card to sign in the system. 2. Select 半自動模式(semi-automatic mode).

Before breaking the vacuum you need to stop 抽真空(vacuum) first and then start 破真空(break vacuum) while the handle of chamber rotated by 45 degree. Until the icon ATM turns red, open the chamber.

Crucible selection

<<Operation panel>> 3. Open 遮板(shutter). Place target materials and close shutter.

And follow the order 4>3>2>1>4 as changing crucibles. 4. Select proper holders with two different sizes for 4” and 6”

<<Chamber>> 5. Click the icon Jig, and check the speed in 6 ~ 8 rpm.

If not, use rotation controller to adjust the speed. 6. Close chamber and make sure the door is fastened.

Execute 半自動模式(semi-automatic mode) and then click 抽真空 to vacuum the chamber manually.

III. Setting recipe 1. Select PROGRAM under MENU. 2. Click in DEPO PROGRAM to set the parameters. 3. Choose wanted program number under Gun 1 and Gun 2 in PROCESS PROGRAM.

If either doesn’t have process, it should be filled with 128. Gun 3 and Gun 4 are unused. 4. Go back to MENU and select Data Display.

Jig

ATM

vacuum

Breaking vacuum

Semi-automatic Automatic

Locking panel

Shutter switch

Holder

Shutter

Crucible 1

<<DEPO PROGRAM (1)>>

<< DEPO PROGRAM (2)>>

<<PROCESS PROGRAM>>

IV. Deposition 1. Execute 半自動模式 and click 抽真空 to vacuum the chamber manually. 2. Turn on Ion gauge. Until the pointer on the vacuum gauge is at the left of green pointer, you can

start the process and set as log L. 3. Turn off 抽真空 and 半自動模式 4. Confirm that key is at remote and turn on E-gun power. 5. As heating wafer, turn on Heater at AUTO mode. 6. Start 自動鍍膜 mode, tune the process parameters, and turn off 自動破真空. 7. Check process recipe and program settings again. 8. Press 開始 to start the process.

<<5kW POWER SUPPLY>>

<<LOCAL CONTROL BOX>>

Pressure meter

Rotation

Chamber heater

Ion gauge

<<Automatic mode>> V. End of process 1. Turn off the power of E-gun and heater. 2. Must wait for another 20 min after the temperature of chamber <40℃.

And then you can do the following step of breaking vacuum. 3. Turn off ion gauge. 4. Break vacuum in the semi-automatic mode. 5. Stop Jig and take out wafers. 6. Open the shutter, take out crucible, and finally close shutter. 7. Close the door of the chamber. 8. Select semi-automatic mode and vaccum the chamber.

VI. Finish and standby 1. Use ID card to log out the system. 2. Return the crucibles and the target materials to the drawer. 3. Fill in the record book. Change the status board.

☆Set as 手動

破真空 Crucibles

Process starts/stops

Process flow

• Check the cooling water pressure is same as the marked spot (Back side of E-gun)

• Check the level of PO2, PN2, CDA is normal (Back side of E-gun)