introduction to nanoheat; aspel group
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Introduction to Nanoheat; Aspel group. 20030910. TCAD. Collision-dominated quasi-ballistic. Double gate device/ quantum confinement. Conduction subband vs. position. Electron distribution function vs. position under high gate bias (top of the barrier). - PowerPoint PPT PresentationTRANSCRIPT
Introduction toNanoheat; Aspel group
20030910
TCAD
Collision-dominated quasi-ballistic
Double gate device/ quantum confinement
Conduction subband vs. position
Electron distribution function vs. position under high gate bias (top of the barrier)
Average electron velocity (high gate bias)
Key concepts to develop a ballistic theory
E-k relation (top of the barrier) under high gate bias: Vds=0/ small/ large
I-V characteristic for ballistic MOSFET (T>0, nondegenerate)
Ballistic limit characteristic vs. measured I-V
Backscattering at the top of the barrier
Average carrier velocity & inversion layer density (ballistic/ with scattering)
Effect of scattering within channel
Key concepts to develop a scattering theory
The scattering model
Transmission coefficient under low drain bias
Relating mean-free-path to a macroscopic quantity
Transmission coefficient under high drain bias
Electron injected into the channel undergoing its first scattering event
Scattering event in momentum space
Probability of it returning to the source
Classical ballistic/ quantum ballistic/ drift-diffusion
Essential physical picture of steady-state carrier transport in the nanoscale MOSFET
bottleneck
Monet
Continuum classical heat diffusion equation
Boltzmann transport equation (phonon)
Q’’’: electron-phonon interactions
Energy transfer process
Monte Carlo simulation Semi-classical approach
(1) Scattering rate (2) Free flight (F=ma) Fermi-Golden Rule
Heat generation profile (10nm DGSOI)
Cornell Aspel group
Primary research area- develop high speed interconnect system for chip-to-chip communication including receivers, transmitters, link architectures in CMOS, and stochastic encoding
Optical properties of sapphire substrate
300nm~ (6um)
Commercial 850nm GaAs/AlGaAs-quantum-well vertical-cavity surface emitting lasers (VCSELs) and 980nm InGaAs/AlGaAs VCSELs were used as front and back emitting structures, respectively.
“A high performance SiGe/Si MQW heterojunction phototransistor,” IEEE Trans. Electron Device (under revision), 2003
“A 7mW 1Gbps CMOS Optical Receiver For Through Wafer Communication”, accepted Proceedings of the International Symposium on Circuits and Systems, 2003