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How to Design Power Electronics The HF in Power Semiconductor Modeling and Design Innovations in EDA Webcast Series September 3, 2015 Ingmar Kallfass Institute of Robust Power Semiconductor Systems University of Stuttgart

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How to Design Power Electronics

The HF in Power Semiconductor Modeling and Design

Innovations in EDA Webcast Series

September 3, 2015

Ingmar Kallfass

Institute of Robust Power Semiconductor Systems

University of Stuttgart

Outline

• Semiconductor-Based Power Electronics

• An Introduction

• Challenges in Power Module Design

• Power Module Design Flow

• Modeling and Characterization

• Electro-Thermal Co-Simulation

• GaN Integration: Power Electronic

Circuits

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SEMICONDUCTOR-BASED POWER ELECTRONICS –

AN INTRODUCTION

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Where Power Electronics meet Microwaves Semiconductor Technologies

4

Frequency

Po

we

r

Scaling & Device Engineering

Performance

Maturity & Reliability

Cost

Share of Markets and Applications

Silicon IGBT

MOSFET

vs.

Compounds SiC

MOSFET/IGBT

GaN HEMT

Compounds GaAs/InP

HEMT/HBT

GaN HEMT

vs.

Silicon

MOSFET

SiGe HBT

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Power Electronics – A Definition

„Power Electronics is the extension of solid-state electronics away from

handling communications and data and into the business of efficiently

handling power, from milliwatts to gigawatts.

It makes the mobile phone battery last longer, it makes hybrid cars

practicable, and it helps make electrical generation and distribution

possible from sources ranging from a solar cell on your roof to a nuclear

reactor in mainland Europe.”

[BIS]

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Power Electronics – A Definition

„Power Electronics is (...) an enabling technology that often determines the

performance of, and provides the competitive advantage for, much more

expensive devices or systems. For example, choosing a mobile phone or

lap-top computer for its battery life is actually a Power Electronics decision,

with the battery performance itself just one part of that.

The importance of Power Electronics to the economy is consequently very

much greater than its direct market value.

Power Electronics is rarely seen as an end product by the general public,

but it does play a critical role in almost all aspects of our daily lives.”

[BIS]

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Applications and Technologies

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Source: „GaN-on-Si power transistors from French lab Leti”, CEA-Leti

http://www.electronicsweekly.com/news/design/power/gan-on-si-power-transistors-french-lab-leti-2015-07/

Power Semiconductor Figures of Merit

• Johnson FOM

• describes the capability of power handling at

high frequencies

• Baliga FOM

• describes the capability of minimizing on-state power loss in a transistor switch, i.e. loss due to

current flow through on-resistance

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Power Semiconductor Figures of Merit

• Switching loss power as function of transistor area (simplified)

• Minimum switching loss

• Semiconductor-related loss term (= FOM)

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FOM Power Semiconductors

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[Catrene]

SEMICONDUCTOR-BASED POWER ELECTRONICS –

CHALLENGES IN POWER MODULE DESIGN

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Power Conversion:

Small and Light, but also Efficient, Robust and EM Compatible

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power density [W/cm3]

effic

ien

cy [%

]

ECPE* Technology Roadmap

Requirement Key Performance

Indicator

Goal: Improvement by

2020 by a factor of

size power density

[kW/l]

2-3

weight power-to-mass ratio

[kW/kg]

2

efficiency efficiency

[%]

3

cost relative cost

[kW/€]

2-3

robustness failure rate

[1/h]

3

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65 W

[golem.de]

60 W

DC-DC PSiP

24 W/cm3

*European Center for Power Electronics

Design Measures in Switched-Mode Converters

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Control Filters (Passives)

Transistor Power Switches

Reduction of Related entities Measures

Size, weight of passives

high fsw

Transistor switching loss small FOM = RonQsw

high d/dt slopes

Parasitic LC resonance

(gate and power loops)

compact layout & high

integration density

Cooling effort high temp. operation

of wide-bandgap SC

EMC shielding/filtering EMC-oriented design

Tradeoffs

fsw d/dt high T operation integration

density

size

weight

efficiency

cost

robustness

EMC

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Optimum design requires an RF-refined design flow

from device characterization and modeling

to multi-domain circuit analysis

Multi-Domain Modeling & Design

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Modeling

Transistor

Package

DBC, PCB

static

dynamic

thermal

Rth

,HS

Cth,J

Rth

,JC

Cth,HS

Characterization Modeling Design

IV

CV

QV

vs Temperature

LF dispersion

Thermal impedance

B1506A

electro-thermal

co-simulation

electro-magnetic

simulation

time and

frequency domain

analysis

POWER MODULE DESIGN FLOW

MODELING AND CHARACTERIZATION

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Refining a (Transistor-)Switch Model

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Ron

Caps

Ids/gm

gate IV (HEMT)

bulk IV (MOSFET)

1 dim. f(V)

2 dim. f(V) NQS LF dispersion

electro-thermal

RF parasitics (package)

high fidelity overtly simplistic

Dynamic IV for Switching of Inductive Loads

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1

2 3

Id

Vds

VDS ID

VG

tON tcross OFF

t

t

VG

Vin IdMAX

PLOSS

tcross ON

VPlateau

1 2 3

Gate charge is required for the

calculation of switching loss

and efficiency

Dynamic IV for Switching of Inductive Loads

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Dynamic IV in a FET transistor switch transits from sub-threshold to saturation to linear regime

Conventional Capacitance Measurement

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1

10

100

1000

10000

100000

0 50 100 150 200 250 300 350 400 450 500

Cap

acit

an

ce (

pF

)

Vds (V)

Ciss

Coss

Crss

measurement conditions

as defined in datasheets

• Vgs = 0 V

• Vds = 0 to 500 V

• f = 100 kHz

DUT: SiC MOSFET

600V, 100mΩ, 35A

B1506A

Q derived from capacitance:

Capacitance Trace for Inductive Load Switching

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GaAs 0.15µm RF power pHEMT

Cgs [fF/0.1mm] Cgd [fF/0.1mm]

datasheet

application

Qg Measurement

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0

2

4

6

8

10

12

14

16

18

0 200 400 600 800

Vg

s (

V)

Qg (nC)

Qg HC

Qg HV

Measurement setup:

Ig = 5mA

HC meas:

Vdsoff=60V

Idson=10A

HV meas:

Vdsoff = 100V

DUT: Si MOSFET

100V, 11mΩ, 200A

B1506A

Capacitance derived from Q:

JESD24-2 standard

Traps in GaN Devices

• well known from RF devices

• „drain-lag“/“gate-lag“

• LF dispersion

• dynamic Ron

• after OFF-to-ON switching,

Ron remains high for a period

of time

• trapping time constants from

ns to ms or even longer (continuous exposure)

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[Catrene]

Dynamic Ron Measurement

25

Vstress

Vlow Von

tstress

t

Vds, Id

Quiescent

Vstress

Meas

1 2

3

1

2

3

Meas

Id

Vds tdelay1

Vds pulse delay

Vgs pulse delay

Vds pulse width

Vgs pulse width

T_delay1 for safety. Minimun value depends

on slew rate of drain SMU

Very short „total_delay“ necessary for

measuring dynamic effects

total delay

Vds_Pulse

Vgs_Pulse

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Trapping Effects in GaN devices

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0

5

10

15

20

25

0 5 10 15

Id (

A)

Vds (V)

Effect of Vstress in Output Characteristics

V_Stress = 50V

V_Stress = 100V

V_Stress = 150V

V_Stress = 200V

Measurement Setup • VdsPulse_Delay = 1us

• VdsPulse_width = 10us

• VgsPulse_Delay = 1.6us

• VgsPulse_Width = 8us

• Period = 2ms

• NOS = 1

DUT: 600V GaN-on-Si

trapping states in

the off-state affect

Ron in the on-state

Ron vs. Time

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Measurement Setup • VdsPulse_Delay = 1us

• VdsPulse_Width = 10us

• VgsPulse_Delay = 1.5us

• VgsPulse_Width = 8us

• Period = 2ms

• NOS = 1

• Resolution=200ns

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

0.E+00 1.E-06 2.E-06 3.E-06 4.E-06 5.E-06

Ro

n (Ω

)

Time (seconds)

Vstress = 200V

Vstress = 20V

DUT: 600V GaN-on-Si

SMU slew rate

delay

stable voltages

?

Benchmarking Different GaN Devices

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0

5

10

15

20

25

30

35

0 2 4 6 8

Id (

A)

Vds (V)

Device A

Device B

Device C

Measurement setup • Same voltage conditions

• VdsPulse_Delay = 1us

• VdsPulse_Width = 10us

• VgsPulse_Delay = 1.5us

• VgsPulse_Width = 8us

• Period = 2ms

• NOS = 1 comparable

devices from

different

manufacturers

Ron Temperature Dependence

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0

0.05

0.1

0.15

0.2

0.25

0.3

0 20 40 60 80

Ro

n (Ω

)

Ids (A)

Vgs=10V

T=23°C

T=100°C

T=150°C

Measurement Setup • Vgs=10V

• GatePulse_Delay=100us

• GatePulse_Width=100us

• DrainPulse_Delay=0us

• DrainPUlse_Width=200us

• PulsePeriod=50ms

DUT:

SiC MOSFET

600V / 100mΩ / 35A

B1506A w/ heat plate

Model Requirements

• 2D Capacitance Model

• LF Dispersion Model

• Thermal Model

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POWER MODULE DESIGN FLOW

ELECTRO-THERMAL CO-SIMULATION

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SiC MOSFET Multi-Chip

Power Module

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AlN DBC with half- and full-bridge

• bare-die SiC MOSFETs

• driver ICs

• bootstrap supply

• buffer caps

• fsw > 100 kHz

• power up to 10 kW

• Reliability: 10°C simulated ΔT from Tj to Theatsink

Electro-Thermal Co-Simulation

Operating the Full-Bridge Module as a DC-AC Inverter 03/09/15

Alternating output voltage

VP = 340 V

Alternating output current

IP = 11 A

Alternating output power

Temperature transients

Rth heatsink: 0.917 K/W HB1

HB2

Innovations in EDA Webcast Series

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fsw = 100 kHz

Fullbridge Module Transient Simulation 03/09/15

Observations

• The temperature in the SiC MOSFETs pulsates with 60 Hz

• Temperature difference about 5 °C

• Temperature peaking is only visible in the junction layer

• Time constants of the materials are high enough

Innovations in EDA Webcast Series

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Electro-thermal Co-Simulation 03/09/15

New degrees of freedom

• Thermal equivalent circuit extraction (thermal impedance)

• Optimized compact layout of modules (hybrid, multi-chip, on-chip)

• Reduction of safety margins (de-rating)

• Robustness-oriented design

• Lifetime prediction (coupling to thermo-mechanical co-simulation)

Heatsink 2mm

Cu (DBC) 0.3 mm

Solder 0.1 mm

SiC 0.4 mm

Al-Top 0.04 mm

Bond-vert. 0.5 mm

Ceramic (DBC) 0.63 mm

Cu (DBC) 0.3 mm

Bond-hor.

Mold mass 1 mm

M1 M2

Innovations in EDA Webcast Series

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POWER MODULE DESIGN FLOW

GAN INTEGRATION

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AlGaN/GaN HEMTs...

can be tailored for power (Baliga FOM, RonQg,

Vbd) and microwave applications (Johnson FOM,

fmax, Vbd)

show best RonQg compared to Si and SiC

can be cost-efficient when on Si-substrate

as lateral devices are amenable to monolithic

functional integration

are today less mature (traps -> reliability, dynamic

Ron, ...)

are intrinsic depletion-mode / normally-on

devices, normally-off are more complex (p-

doping, Si-GaN cascode, ...)

have limited input dynamic range due to Schottky

gate (except MISFET)

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600V E-(GI)HEMT

600V D-HEMT

600V E-mode

Si/GaN cascode

650V E-HEMT

600V E-HEMT

GaN Driver Integration: Motivation

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Quasi normally-off

GaN driver

(Monolithic) Integration of

Gate driver & power transistor

Switching

Speed:

reduction of gate

loop inductance

Robustness:

normally-off

default

behaviour

t

VGS

conventional hybrid assembly

shoot-through

currents

over-shoot

& oscillations

Normally-On Quasi-Normally-Off

GaN-on-Si HFET GaN-on-Si HFET

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−2.9 0 1.1 V

ID

VGS = 0V

ID

VDS

VGS

Mönch et.al.

ISPSD 2015

Boost Converter

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GaN 600 V

HFET

GaN gate

driver

VG-

VG++

VOUT VIN

switching

node

Monolithic integration Hybrid integration

Mönch et.al.

ISPSD 2015

• No shoot-through currents

robust

• Default: pull-down

power transistor off

Hybrid GaN Power Module

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Mönch et.al.

ISPSD 2015

Q1: GaN Power HEMT

100 mm, 24 A, 600 V

D: GaN Schottky diode

50 mm, 12 A, 600 V

QPD: GaN HEMT

10 mm, 2.4 A, 600 V

QPU: GaN HEMT

10 mm, 2.4 A, 600 V

4x GaN diode, <100V, 10 mm

Turn-On and Turn-Off Transitions

Turn-on

tf,DS > 1.6 ns

dV/dtMAX ≈ 91 V /ns

tr,GS ≈ 5.4 ns

no overshoot

no oscillation

fast switching

Turn-off

tr,DS > 1.2 ns

dV/dtMAX ≈ 177 V /ns

tf,GS ≈ 3.8 ns

fast switching

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Mönch et.al.

ISPSD 2015

Monolithic Integration: Gate Driver & Power

Transistor

Parasitic gate loop

inductance almost eliminated

Monolithic combination of

transistors with different

voltage ratings

Power transistor 600 V / 24 A

Pull-up driver <100 V / 2.4 A

Pull-down driver <100V / -1.2 A

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3 x

2 m

m2

CONCLUSION

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Thank you for your attention

Ingmar Kallfass

University of Stuttgart

Institute of Robust Power Semiconductor Systems

Pfaffenwaldring 47

D – 70569 Stuttgart

Tel.: +49 (0)711-685-68747

Fax: +49 (0)711-685-58747

E-Mail: [email protected]

Innovations in EDA Webcast Series

ILH was founded in the frame of

ILH is a member of

References

[Catrene] Integrated power & energy efficiency, Power device

technologies, simulations, assembly and circuit topographies enabling high

energy efficiency applications, Catrene Scientific Committee Working

Group Integrated power & energy efficiency,

http://www.catrene.org/web/downloads/IPEE_Report_by_Catrene%20Sci._

Comm.pdf

[BIS] UK Department for Business Innovation and Skills, “Power electronics: A

strategy for success,” 2011.

[ECPE] [Online] http://www.ecpe.org/

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