high power and energy femtosecond lasers€¦ · pharos is a femtosecond laser system combining...

WWW.LIGHTCON.COM | [email protected] | REV. 2001144

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PHAROS is a femtosecond laser system combining millijoule pulse energies and high average powers. PHAROS features a mechanical and optical design optimized for industrial applications such as precise material processing. Compact size, an integrated thermal stabilization system, and sealed design allow PHAROS integration into machining workstations.

Laser diodes pumping Yb medium significantly reduces maintenance costs and provides a long laser lifetime. Software tunability of PHAROS allows the system to cover applications

normally requiring different classes of laser. Tunable parameters include pulse duration (190 fs – 20 ps), repetition rate (single pulse to 1 MHz), pulse energy (up to 2 mJ) and average power (up to 20 W). Its power level is sufficient for most material processing applications at high machining speeds. The built-in pulse picker allows convenient control of the laser output in pulse-on-demand mode. PHAROS compact and robust optomechanical design features stable laser operation across varying environments.

FEATURES ᰋ 190 fs – 20 ps tunable pulse duration

ᰋ 2 mJ maximum pulse energy

ᰋ 20 W output power

ᰋ 1 kHz – 1 MHz tunable base repetition rate

ᰋ Pulse picker for pulse-on-demand operation

ᰋ Rugged industrial grade mechanical design

ᰋ Automated harmonics generators (515 nm, 343 nm, 257 nm, 206 nm)

ᰋ Optional CEP stabilization

ᰋ Possibility to lock oscillator to external clock

High Power and Energy Femtosecond Lasers

Typical spectrum of PHAROS

Typical pulse duration of PHAROSPulse energy vs base repetition rate for PHAROS

1.0

0.6

0.8

0.4

Re

lati

ve s

pe

ctra

l in

ten

sity

, a.u

.

0.2

1010 1015 1020 1025 1030 1035 10400.0

Wavelength, nm

SpectralFWHM = 8.2 nm

1.0

0.8

0.6

Delay, fs

0.4

-1000-1500 -500 0 500 1000 1500

0.2

0.0

Gaussian fit223 fs

Inte

nsi

ty, a

.u.

Pu

lse

en

erg

y, µ

J

Repetition rate, kHz

1000

100

10

101 100 1000

PHAROS PH1-SP-1mJ / 6 W, 1 mJ

PHAROS PH2-SP-20W-2mJ / 20 W, 2 mJ

PHAROS PH1-10W / 10 W, 200 µJ

PHAROS PH1-20W / 20 W, 400 µJ

REV. 200114 | [email protected] | WWW.LIGHTCON.COM 5

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SSPECIFICATIONSModel ¹⁾ PH1-10W PH1-15W PH1-20W PH1-SP-1mJ PH2-SP-20W-2mJ

OUTPUT CHARACTERISTICMax. average power 10 W 15 W 20 W 6 W 20 W

Pulse duration (assuming Gaussian pulse shape) < 290 fs < 190 fs

Pulse duration range 290 fs – 10 ps (20 ps on request) 190 fs – 10 ps (20 ps on request)

Max. pulse energy > 0.2 mJ or > 0.4 mJ > 1 mJ > 2 mJ

Beam quality TEM₀₀ ; M² < 1.2 TEM₀₀ ; M² < 1.3

Base repetition rate ²⁾ 1 kHz – 1 MHz

Pulse selection Single-Shot, Pulse-on-Demand, any base repetition rate division

Centre wavelength 1028 nm ± 5 nm 1033 nm ± 5 nm

Output pulse-to-pulse stability ³⁾ < 0.5 % rms over 24 hours

Power stability < 0.5 % rms over 100 h

Pre-pulse contrast < 1 : 1000

Post-pulse contrast < 1 : 200

Polarization Linear, horizontal

Beam pointing stability < 20 µrad/°C

OPTIONAL EXTENSIONSOscillator output Optional. Please contact [email protected] for more details or customized solutions

Typical output 1 – 6 W, 50 – 250 fs, ~1035 nm, ~ 76 MHz, simultaneously available

Harmonics generator Integrated, optional (see page 8)

Output wavelength 515 nm, 343 nm, 257 nm, 206 nm

Optical parametric amplifier Integrated, optional (see page 15)

Tuning range 640 – 4500 nm

BiBurst mode Tunable GHz and MHz burst with burst-in-burst capability, optional (see page 9)

GHz-mode (P)

Intra burst pulse separation ⁴⁾ ~ 200 ± 40 ps ~ 500 ± 40 ps

Max no. of pulses ⁵) 1 . . 25 1 . . 10

MHz-mode (N)

Intra burst pulse separation ~ 16 ns

Max no. of pulses 1 . . 9, (7 with FEC)

PHYSICAL DIMENSIONSLaser head ⁶⁾ 670 (L) × 360 (W) × 212 (H) mm 730 (L) × 419 (W) × 233 (H) mm

Rack for power supply & chiller 642 (L) × 553 (W) × 673 (H) mm PS integrated in the laser head

UTILITY REQUIREMENTSElectric 110 V AC, 50 – 60 Hz, 20 A or 220 V AC, 50 – 60 Hz, 10 A

Operating temperature 15 – 30 °C (air conditioning recommended)

Relative humidity < 80 % (non condensing)

DANGER: VISIBLE AND/OR INVISIBLE LASER RADIATION AVOID EYE OR SKIN EXPOSURE TO DIRECT, REFLECTED OR SCATTERED RADIATION

CLASS 4 LASER PRODUCT

¹⁾ More models are available on request.²⁾ Some particular repetition rates are software denied due to system design.³⁾ Under stable environmental conditions.⁴⁾ Custom spacing on request.⁵⁾ Maximum number of pulses in a burst is dependent on the laser repetition rate. Custom number of pulses on request.⁶⁾ Dimensions might increase for non-standard laser specifications.


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Am

bien

t tem

pera

ture

, °C

Out

put p

ower

, W

Ambient temperatureOutput power, RMS=0.12%

Time, h

0 55 5.92

10 5.94

15 5.96

20 5.98

25 6.00

30 6.02

35 6.04

40 6.05

10 15 20 25 30

Beam

dire

ctio

n, µ

rad

Tem

pera

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, °C

Time, h0 5

0 14

12

10

8

20

-20

-40

-60

16

40 18

60 20

80 22

100 24

120 26

140 28

10 15 20 25

Temperature

HorizontalVertical

PHAROS output power with power lock enabled under unstable environment

Ou

tpu

t p

ow

er,

W

Time, h

20.06

20.08

20.10

20.12

20.14

20.16

20.18

1000 200 300 400 500 600

RMS < 0.03%

Long term stability graph of PHAROS

Ou

tpu

t p

ow

er,

WP

um

p c

ur r

en

t, A

40

38

36

34

32

Year 2009 2010 2011 2012 2013 2014 2015 2016 2017 2018 2019

8

7

6

5

4Ou

tpu

t p

ow

er,

WP

um

p c

urr

en

t, A

38

36

34

32

30

Year 2009 2010 2011 2012 2013 2014 2015 2016 2017 2018

8

7

6

5

4

Output power of industrial PHAROS lasers operating 24/7 and current of pump diodes during the years

1000

800

Wai

st d

iam

eter

, µm

Z location, mm

600

400

200

350 400 450 500 550 600 650

Typical M² measurement data of PHAROS

Typical near-field beam profile of PHAROS at 200 kHz

Typical far-field beam profile of PHAROS at 200 kHz

STABILITY MEASUREMENTS


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Short term pulse-to-pulse energy stability of PHAROS lasers. 1.2×10⁷ pulses (1 min at 200 kHz),

STD < 0.11%, peak-to-peak < 1%

Nu

mb

er

of

pu

lse

s4×105

3×105

2×105

1×105

0

Normalized pulse energy, a.u.

0.996 0.998 1.000 1.002 1.004

PHAROS PH1 laser outline drawing

0 2140

160

180

200

220

240

260

280

300

320

4 6 8 10Time, h

Phas

e st

d (la

st 1

k sa

mpl

es),

mra

d

12 14 16

Std of all samples = 206 mrad

PHAROS CEP stability when laser is isolated from all noticeable noise sources – vibrations, acoustics, air circulation and electrical noise. System can achieve < 300 mrad std of CEP stability over a long time scale (> 8 hours) and < 200 mrad over a short time scale (< 5 min)

CEP stability over a short time scale

Carrier-envelope phase (CEP) over the long period with active phase stabilization system

CEP stability over a long time scale

0 20

150

160

170

180

190

200

210

40 60 80 100

Time, s

Phas

e st

d (la

st 1

k sa

mpl

es),

mra

d

120 140 160

Std of all samples = 181 mrad

0 2

-0.50

-0.75

-1.00

-0.25

0.00

0.25

0.50

0.75

1.00

4 6 8 10

Time, h

Car

rier

Env

elop

e Ph

ase,

rad

12 14

σ = 206 mrad

70

670

360

212

5420 30 168

(74)(104)

(272)

1030 nm output

without H

1030 nm output

with Auto H

Auto 2H Auto 3H, 4H515 nm 343, 257 nm

OUTLINE DRAWINGS


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PHAROS laser can be equipped with automated harmonics modules. A selection of fundamental (1030 nm), second (515 nm), third (343 nm), fourth (257 nm) or fifth (206 nm) harmonic outputs are available through software control.

3H output stability

4H output stabilityPHAROS harmonics energy vs pulse repetition rate

SPECIFICATIONSModel 2H 2H-3H 2H-4H 4H-5H

Output wavelength 1) (automated selection)

1030 nm 515 nm

1030 nm 515 nm 343 nm

1030 nm 515 nm 257 nm

1030 nm 257 nm 206 nm

Input pulse energy 20 – 2000 µJ 50 – 2000 µJ 2) 20 – 2000 µJ 2) 200 – 1000 µJ

Pump pulse duration 190 – 300 fs

Conversion efficiency > 50 % (2H) > 50 % (2H) > 25 % (3H)

> 50 % (2H) > 10 % (4H) 3)

> 10 % (4H) 3) > 5 % (5H) 4)

Beam quality (M²) ≤ 400 μJ pump < 1.3 (2H), typical < 1.15 < 1.3 (2H), typical < 1.15

< 1.4 (3H), typical < 1.2 < 1.3 (2H), typical < 1.15

n/a (4H)n/a

Beam quality (M²) > 400 μJ pump < 1.4 (2H) < 1.4 (2H)

< 1.5 (3H)< 1.4 (2H) n/a (4H)

FEATURES ᰋ 515 nm, 343 nm, 257 nm and 206 nm

ᰋ Output selection by software

ᰋ Mounts directly on a laser head and integrated into the system

ᰋ Rugged industrial grade mechanical design Harmonics generator module attached to PHAROS



Automated Harmonics Generators

Harmonics generators are designed to be used in industrial applications where a single output wavelength is desired.

Modules are mounted directly on the output of the laser and integrated into the system.

¹⁾ Depends on pump laser model.²⁾ High energy versions are available, please contact Light Conversion for specifications.³⁾ Max 1 W output. ⁴⁾ Max 0.15 W output.

HG | PHAROSP

uls

e e

ne

rgy,

µJ

Repetition rate, kHz

100

200

400

10

20

40

60

1

2

4

6

0.1

0.2

0.4

0.6

101 100 1000

PHAROS PH1-20W-400µJ

SH (400 µJ pump)

TH (400 µJ pump)

SH (200 µJ pump)

TH (200 µJ pump)

SH (50 µJ pump)

TH (50 µJ pump)

Ou

tpu

t p

ow

er,

W

2.0

2.1

2.2

2.3

2.4

2.5

2.6

2.7

Time, h

1000 50 150 200 250 300

RMS = 0.27%

Ou

tpu

t p

ow

er,

W

Time, h

40 2 6 8 10 121.44

1.46

1.48

1.50

1.52

1.54

1.56

RMS = 0.23%


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Tunable GHz and MHz burst with burst-in-burst capability

PHAROS and CARBIDE 40W (CB3) have an option for tunable GHz and MHz burst with burst-in-burst capability – called BiBurst. The distance between burst packet groups is called nanosecond burst, N (MHz-Burst). The distance between sub-pulses in the group is called picosecond burst, P (GHz-Burst).

In single pulse mode, one pulse is emitted at a time at some fixed frequency. In burst mode, the output consists of several picosecond burst packets each separated by an equal time period between each packet. Each packet can contain a number of sub-pulses which are also separated by an equal time period between each pulse.

High pulse energy femtosecond laser with flexible BiBurst functionality brings new production capabilities to high-tech manufacturing industries such as consumer electronics, integrated photonic chip manufacturing, stent cutting, surface functionalization, future displays manufacturing and quantum computing.

BiBurst material fabrication areas cover:

ᰋ brittle material drilling and cutting ᰋ deep engraving ᰋ selective ablation ᰋ transparent materials volume modification ᰋ hidden marking ᰋ surface functional structuring.

SPECIFICATIONSModel CARBIDE-CB3 (40 W) PHAROS PHAROS-SP

P, GHz-modeIntra burst pulse separation ¹⁾ ~ 440 ± 40 ps ~ 200 ± 40 ps ~ 500 ± 40 ps

Max no. of pulses ²⁾ 1 . . 10 1 . . 25 1 . . 10

N, MHz-modeIntra burst pulse separation ~16 ns

Max no. of pulses 1 . . 10 1 . . 9, (7 with FEC) 1 . . 9, (7 with FEC)

¹⁾ Custom spacing on request.²⁾ Maximum number of pulses in a burst is dependent on the laser repetition rate. Custom number of pulses on request.

BiBurst

1 kHz – 1 MHz carrier frequency260 fs – 10 ps tunable pulse duration

BiBurst

GHz-Burst

MHz-Burst

Adjustable number of pulses in GHz and MHz burst

Adjustable intra-burst amplitude slope

ns

psfs


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Industrial-grade Optical Parametric Amplifier

FEATURES ᰋ Automatically tunable or fixed wavelength options

ᰋ Robust, integrated mechanical design

ᰋ Simple, user-friendly operation

ᰋ Up to 2 MHz repetition rate, down to single shot operation

ᰋ Up to 40 W pump power

ᰋ Integrated beam splitter for pump laser beam

Tunable I-OPA-TW module attached to air-cooled CARBIDE-CB5

I-OPA series of optical parametric amplifiers marks a new era of simplicity in the world of tunable wavelength femtosecond light sources. Based on 10 years of experience producing the ORPHEUS series of optical parametric amplifiers, this solution brings together the flexibility of tunable wavelength with robust industrial-grade design. The original I-OPA is a rugged module attached to our PHAROS laser, providing long term stability comparable to that of the industrial harmonics modules. The new and improved tunable version is designed to be coupled with our PHAROS and CARBIDE series femtosecond lasers and primarily intended to be used with spectroscopy or microscopy applications that demand high stability. The -HP model is targeted to be coupled with our HARPIA series as a pump beam source for ultrafast pump-probe spectroscopy. The -F model is primarily designed to be used as a light source in multiphoton microscopy devices. The -ONE model will be useful in the field of mid-IR spectroscopy, as well as other applications where higher pulse energy is required in the infrared part of the spectrum. All of these models can be used for micromachining and other

Typical I-OPA module energy conversion curves. Pump: PHAROS-10W, 100 µJ, 100 kHz

Out

put p

ower

, mW

Puls

e en

ergy

, µJ

Wavelength, nm

1200

1100

1000

900

800

700

12

11

10

9

8

7

6

5

4

3

2

1

0

600

500

400

300

200

100

0500 1000 1500 2000 2500 3000 3500 4000 4500

I-OPA-ONE signalI-OPA-ONE idlerI-OPA-HP signalI-OPA-HP idler

I-OPA

FIxed wavelength I-OPA-FW beam pointing and output power measurements under harsh environment conditions (humidity and temperature cycling)

Time, h

Beam

pos

ition

, µm

Hum

idity

, %

0.0-250

-200

-150

-100

-50

50

0

20

40

60

80

100

120

140

160

0

0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0

Position XPosition YHumidity

Time, h

Beam

dire

ctio

n, µ

rad

Hum

idity

, %

0.0-500

-400

-300

-200

-100

100

0

20

40

60

80

100

120

140

160

0

0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0

Direction XDirection YHumidity

Time, h

Out

put p

ower

, mW

Hum

idity

, %

0.0450

470

460

480

490

500

550

0

20

40

60

80

100

120

140

160

540

530

520

510

0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0

Output power

Humidity

industrial applications; the tunable version suited to be the ideal R&D system, while the fixed wavelength I-OPA would be the cost-effective solution for large scale production.


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S SPECIFICATIONS OF TUNABLE I-OPAModel I-OPA-TW-HP I-OPA-TW-F I-OPA-TW-ONE

Based on ORPHEUS model ORPHEUS ORPHEUS-F ORPHEUS-ONE

Pump power Up to 40 W

Pump pulse energy 10 – 400 µJ 20 – 400 µJ

Pulse repetition rate Up to 2 MHz

Tuning range, signal 640 – 1010 nm 650 – 900 nm 1350 – 2060 nm

Tuning range, idler 1050 – 2600 nm 1200 – 2500 nm 2060 – 4500 nm

Conversion efficiency at peak, signal wavelength > 7 % @ 700 nm > 9 % @ 1550 nm

Additional options n/aSCMP: Signal pulse compressor

ICMP: Idler pulse compressor PCMP: pre-chirp dispersion compensator

n/a

Pulse bandwidth 1) 80 – 220 cm-¹ @ 700 – 960 nm 200 – 750 cm-¹ @ 650 – 900 nm 150 – 500 cm-¹ @ 1200 – 2000 nm 60 – 150 cm-¹ @ 1450 – 2000 nm

Pulse duration 2) 120 – 250 fs < 55 fs @ 800 – 900 nm < 70 fs @ 650 – 800 nm

< 100 fs @ 1200 – 2000 nm150 – 300 fs

Wavelength extension options

SHS: 320 – 505 nm SHI: 525 – 640 nm

Conversion efficiency 1.2% at peak

Contact [email protected] DFG: 4500 – 10000 nm 3)

ApplicationsMicro-machining

Microscopy Spectroscopy

Nonlinear microscopy Ultrafast spectroscopy

Mid-IR spectroscopy AFM microscopy



¹⁾ I-OPA-F outputs broad bandwidth pulses which are compressed externally.²⁾ Output pulse duration depends on wavelength and pump laser pulse duration.

I-OPA-F requires pulse compressors to achieve short pulse duration.³⁾ Up to 16 µm tuning range is accessible with external Difference Frequency Generator.


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SPECIFICATIONS OF FIXED WAVELENGTH I-OPAModel I-OPA-FW-HP I-OPA-FW-F I-OPA-FW-ONE

Pump power Up to 40 W

Pump pulse energy 10 – 500 µJ 10 – 500 µJ 20 – 1000 µJ

Pulse repetition rate Up to 2 MHz

Wavelength range, signal 640 – 1010 nm 650 – 900 nm 1350 – 2060 nm

Wavelength range, idler 1050 – 2600 nm 1200 – 2500 nm 2060 – 4500 nm

Conversion efficiency at peak, signal wavelength >7 % @ 700 nm >7 % @ 700 nm > 9 % @ 1550 nm

Pulse bandwidth 1) 80 – 220 cm-¹ @ 700 – 960 nm 200 – 750 cm-¹ @ 650 – 900 nm 150 – 500 cm-¹ @ 1200 – 2000 nm 60 – 150 cm-¹ @ 1450 – 2000 nm

Pulse duration 2) 120 – 250 fs < 55 fs @ 800 – 900 nm < 70 fs @ 650 – 800 nm

< 100 fs @ 1200 – 2000 nm150 – 300 fs

ApplicationsMicro-machining

Microscopy Spectroscopy

Nonlinear microscopy Ultrafast spectroscopy

Micro-machining Mid-IR generation

COMPARISON WITH OTHER FEMTOSECOND AND PICOSECOND LASERSLaser technology Our solution HG or HIRO I-OPA-FW-F I-OPA-FW-ONE

Pulse energy at 100 kHz, using PHAROS-10W laser

Excimer laser (193 nm, 213 nm) 5H of PHAROS (205 nm) 5 µJ

n/a

n/a

TH of Ti:Sa (266 nm) 4H of PHAROS (257 nm) 10 µJ

TH of Nd:YAG (355 nm) 3H of PHAROS (343 nm) 25 µJ

SH of Nd:YAG (532 nm) 2H of PHAROS (515 nm) 50 µJ 35 µJ

Ti:Sapphire (800 nm) OPA output (750 – 850 nm) n/a 10 µJ

Nd:YAG (1064 nm) PHAROS output (1030 nm) 100 µJ

Cr:Forsterite (1240 nm) OPA output (1200 – 1300 nm)

n/a

5 µJ n/a

Erbium (1560 nm) OPA output (1500 – 1600 nm) 3 µJ 15 µJ

Thulium / Holmium (1.95 – 2.15 μm) OPA output (1900 – 2200 nm) 2 µJ 10 µJ

Other sources (2.5 – 4.0 μm) OPA output 1 – 5 µJ

Note that the pulse energy scales linearly in a broad range of pump parameters. For example, a PHAROS PH1-20 laser at 50 kHz (400 µJ energy) will increase the output power twice, and the pulse energy 4 times compared to the reference table above. The pulse duration at the output is <300 fs in all cases. The OPA output is not limited to these particular ranges of operation, it is continuously tunable as shown in energy conversion curves.

Fixed wavelength I-OPA in comparison to tunable version or standard ORPHEUS line devices lacks only computer-controlled wavelength selection. On the other hand, in-laser mounted design provides mechanical stability and eliminates the effects of air-turbulence ensuring stable long-term performance and minimizing energy fluctuations.

Fixed wavelength I-OPA-FW module attached to PHAROS



¹⁾ I-OPA-F outputs broad bandwidth pulses which are compressed externally.²⁾ Output pulse duration depends on wavelength and pump laser pulse duration.

I-OPA-F requires external pulse compressors to achieve short pulse duration.


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Outline drawing and output ports of CARBIDE-CB5 with tunable I-OPA-TW-HP

Outline drawing and output ports of CARBIDE-CB3 with tunable I-OPA-TW-HP

421

19

4

12

5 17

6

68

16

0

68

350

Fundamental (1030 nm) Fundamental (1030 nm)OPA output

24

630

773

143

86

108

PHAROS with fixed wavelength I-OPA-FW-F and compressors for signal and idler

Output ports of Pharos with fixed wavelength I-OPA-FW

691

1070

430

85(39) 62 30 30 114

IdlerSignal

Residual OPA pump (515 nm or 1030 nm)

Fundamental (1030 nm)

Optional Uncompressed Fundamental (for SHBC)

125

70

212

421773

86

108

143350

24

19

4 16

0

12

5 18

8

68

OPA outputFundamental (1030 nm)

Fundamental (1030 nm)

OUTLINE DRAWINGS


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SEXAMPLES OF INDUSTRIAL APPLICATIONS

Multi-pass, cadmium tungstate cutting. No cracks. All thermal trace effects eliminated. Source: Micronanics Laser Solutions Centre.

Taperless hole microdrilling in stainless steel alloys. Source: Workshop of Photonics.

Glass needle microdrilling. Source: Workshop of Photonics.

Longitudinal section of the single void. Source: “Ultrashort Bessel beam photoinscription of Bragg grating waveguides and their application as temperature sensors”, G. Zhang, G. Cheng, M. Bhuyan, C. D’Amico, Y. Wang, R. Stoian. Photon. Res. (2019).

Stent cut using CARBIDE laser. Source: Amada Miyachi America.

Various glass drilling. Source: Workshop of Photonics.

Brittle & highly thermal sensitive material cutting

Steel drillingGlass needle microdrilling

Nanodrilling in fused silica

Stainless steel stent cutting

Various type glass drilling

100 µm

700 µm

190 µm

5 µm

1 µm

163 nm

Laser beam300 µm

300 µm

2 mm


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3D milled sample in copper. Zoom in SEM image. Source: “Highly-efficient laser ablation of copper by bursts of ultrashort tuneable (fs-ps) pulses”, A.Žemaitis, P.Gečys, M.Barkauskas, G.Račiukaitis, M.Gedvilas. Scientific Reports (2019).

(a) Schematic of the laser treatment, (b) laser patterning strategy, (c) SEM image of induced LIPSS. Source: “Tribological Properties of High-Speed Uniform Femtosecond Laser Patterning on Stainless Steel”, I.Gnilitskyi, A.Rota, E.Gualtieri, S.Valeri, L.Orazi. Lubricants (2019).

SEM image of the Ti-6Al-4V (TC4) surface after irradiation with progressively laser scan. Source: “Large-Scale Fabrication of Nanostructure on Bio-Metallic Substrate for Surface Enhanced Raman and Fluorescence Scattering”, L.Lu, J.Zhang, L.Jiao, Y.Guan. Nanomaterials (2019).

3D waveguide fabricated in fused silica glass. Source: Workshop of Photonics.

Fabricated moth-eye 3-D profile image, taken by laser scanning microscope. Source: “Terahertz broadband anti-reflection moth-eye structures fabricated by femtosecond laser processing”, H.Sakurai, N.Nemoto, K.Konishi, R.Takaku, Y.Sakurai, N.Katayama, T.Matsumura, J.Yumoto, M.Kuwata-Gonokami. OSA Continuum (2019).

(a) SEM image of a fabricated LiNbO3 micro-disk resonator, (b) close up view, (c) atomic force microscope (AFM) image of micro-disk wedge, (d) optical microscope image of micro-disk resonator with different diameters. Source: “Fabrication of Crystalline Microresonators of High Quality Factors with a Controllable Wedge Angle on Lithium Niobate on Insulator”, J.Zhang, Z.Fang, J.Lin, J.Zhou, M.Wang, R.Wu, R.Gao, Y.Cheng. Nanomaterials (2019).

Milling of complex 3D surfaces Friction and wear reduction

Surface-enhanced Raman scattering (SERS) sensors fabrication

3D waveguides

Terahertz broadband anti-reflection structures

Selective Cr thin film ablation

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(a) first-order Bragg gratings inscribed in written waveguide, (b) Resonant spectral transmission of inscribed BGW. Source: “Ultrashort Bessel beam photoinscription of Bragg grating waveguides and their application as temperature sensors”, G.Zhang, G. heng, M.Bhuyan, C.D’Amico, Y.Wang, R.Stoian. Photon. Res. (2019).

(a) Welding of transparent polymers for sealing of microfluidic devices, (b) COC welding seam (c) top view on a sealed microfluidic device. Source: “A New Approach to Seal Polymer Microfluidic Devices Using Ultrashort Laser Pulses”, G. Roth, C. Esen and R. Hellmann. JLMN-Journal of Laser Micro/Nanoengineering (2019).

Various 3D structures fabricated in SZ2080 polymer using multi-photon polymerization. Source: Workshop of Photonics.

Various 3D structures fabricated in SZ2080 polymer using multi-photon polymerization – nanophotonic devices, microoptics, micromechanics. Source: Femtika.

Various structures fabricated in fused silica glass. Source: Femtika.

Form induced birefringence-retardance variation results in different colors in parallel polarized light. Source: Workshop of Photonics.

Bragg grating waveguide (BGW) writing

Lab-on-chip channel ablation and welding

3D free shape multi-photon polymerization

3D micro printing using multi-photon polymerization

3D glass etching

Birefringent glass volume modifications

5 µm

100 µm

300 µm

50 µm

400 µm 200 µm

100 µm

10 µm

10 µm

10 µm

40 µm

200 µm1 mm

Welding seam

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