METAMATERIALS

Goal

Have a patterned material that blocks infrared light.

Project Outline

Thick 1D structures (50-100 microns) Variety of 2D structures (2-20 microns) Phase mask creation Thick 3D structures (50-100 microns) via

phase mask interference lithography Sol gel process to create 3D structures

from other materials Testing of photonic and mechanical

properties

Calculations

2 µm spacing 2-D & 3-D material.

n λ = 2 d sinθ

~2000 nm wavelength range

infrared region

Potential Obstacles

Attaining a thick photoresist layer• uniformity issues • adhesion problems

Time Constraints• Run time of experiments• Gaining access to laboratories

and becoming trained on equipment

Potential Obstacles

New Field of Research (Interference Lithography, Metamaterials)

• Trial and error• Limited background info

Large Room for Error• Multistep process• Measurements and spacing must be very

precise to get desired results

Current Plans

Continue designing 2D print models and create 2D phase masks

Research photoresist application methods and Interference Lithography