furnaces and wet bench area savitha p. wet bench - movement cmos wet bench moving to the new clean...

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Furnaces and Wet bench area Savitha P

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Page 1: Furnaces and Wet bench area Savitha P. Wet bench - Movement CMOS wet bench moving to the new clean room Purchase orders for chemicals still not released

Furnaces and Wet bench area

Savitha P

Page 2: Furnaces and Wet bench area Savitha P. Wet bench - Movement CMOS wet bench moving to the new clean room Purchase orders for chemicals still not released

wet bench

- of-fice

hrs:160

wet bench- non office hrs:16

0

Wet oxdn- office hours 160

Wet oxdn- non

office hrs 160

Boron diff of-

fice hrs: 160

Boron diff- non

office hrs: 160

Used 96 12 NaN 48 0 NaN 32 0

Not Used

64 140 NaN 112 160 NaN 128 160

Downtime

0 0 NaN 0 0 NaN 0 0

10

30

50

70

90

110

130

150

170Equipment Utilization Chart

Tota

l no

: of s

lots

/hrs

Page 3: Furnaces and Wet bench area Savitha P. Wet bench - Movement CMOS wet bench moving to the new clean room Purchase orders for chemicals still not released

Wet bench - Movement

• CMOS wet bench moving to the new clean room

• Purchase orders for chemicals still not released

• MOS chemicals will take 3-4 months to ship after release of the purchase order

Page 4: Furnaces and Wet bench area Savitha P. Wet bench - Movement CMOS wet bench moving to the new clean room Purchase orders for chemicals still not released

Furnaces - Movement• All except annealing furnaces moving to Equip.

dev. room• Maintenance need to be done for all– Change thermocouple (Euros 625-650)– Gas connections to suit clean room– New tubes/ clean old tubes

Page 5: Furnaces and Wet bench area Savitha P. Wet bench - Movement CMOS wet bench moving to the new clean room Purchase orders for chemicals still not released

Dektak, 4-probe, Film thickness probe measurement and CPD

• Moving to new clean room– Document made regarding precautions while

moving• Stylus/ probe tip to be protected• Probe head to be cushioned

– CPD moving to Equp. dev. room