furnaces and wet bench area savitha p. wet bench july and august month was very busy cense usage...
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![Page 1: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/1.jpg)
Furnaces and Wet bench area
Savitha P
![Page 2: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/2.jpg)
Wet bench • July and August month was very busy
% Usage (Wet bench)
Cense
Physics
ISU
ECE
MRC
INUP
Mecheng
CeNSE usage includes •lab course,•INUP hands-on•electroplating slots
Need to have purple-nitrile gloves for all processes?
![Page 3: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/3.jpg)
Wet bench - Maintenance
• Process run sheets for monthly monitoring of– Silicon etches – TMAH & KOH – oxide etching– Electrodeposition
Electrodeposition Cu - August
![Page 4: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/4.jpg)
Furnaces% Usage (Dry oxidation)
Cense
INUP
ECE
Unused % Usage (Phosphorus diffusion)
Cense
ISU
INUP
Unused
The exhaust problem for the Phosphorus diffusion has been solved
![Page 5: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/5.jpg)
Furnace
% Usage (Wet oxdn)
Cense
MRC
ECE
Mech
isu
INUP
Unused
Furnace-Monthly chart
![Page 6: Furnaces and Wet bench area Savitha P. Wet bench July and August month was very busy CeNSE usage includes lab course, INUP hands-on electroplating slots](https://reader035.vdocuments.us/reader035/viewer/2022072006/56649d205503460f949f4168/html5/thumbnails/6.jpg)
Issues• All furnaces have temperature control
problems, especially Boron/wet diffusion– Problem with the temperature control board?– Maintenance engineer expected in Sept
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ALD installation• Installation engineer expected on 12th Sept• Needed for installation
– 8 inch wafers for process (6-7)?– 100mm Silicon wafers for test runs (atleast 10 Nos. for process demonstration)– Process gas N2 purity 5.0 (3-6 Bar) – Instrument gas N2 purity 2.5 (5-6 Bar)– Cooling liquid for Huber-chiller (e.g. glycol, -25 deg C) – For process gases: 6mm Stainless Steel tube or thick wall Teflon tube outer diameter
6mm, inner diameter 3mm with ¼” VCR connection– For instrument gas flexible tube 4-10mm– Precursors e.g. TMA, DEZn, DI-water…– N2 (purity 2.5) for Dry pump min. 20SLM!!! 6mm tube. – Cooling system for dry pump (This should be a separate cooling unit apart from
Unichiller shipped along with ALD tool)– Helium leak detector available– In Addition to that all the necessary Electrical inputs, N2 Generator for both
instrument and process gas supplies as specified earlier.