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Exceptional ballistic transport in epigraphene Walt de Heer Georgia Institute of Technology

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Page 1: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Exceptional ballistic transport in

epigraphene

Walt de Heer

Georgia Institute of Technology

Page 2: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Program Objective

First formulated in 2001 and patented in 2003, our objective is to develop nanoelectronics based on epitaxial graphene on silicon carbide.

Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010

Page 3: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Si crystal Si wafer

SiC wafer

Si nanoelectronics

200 GHz epitaxial graphene transistor (GaTech)

3

Intel funded the GIT Graphene project in 2003

Page 4: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Epitaxial graphene, by the CCS method reviewed in PNAS 108, 16900 (2011)

First CCS Induction Furnace

(2004)

The graphene sheet continuously covers the entire surface. Its major disadvantage is, that it cannot be back gated.

STM (Courtesy J. Stroscio)

pleat

50 nm

400 nm

0.5 nm

0.05 nm Atomically flat

Epitaxial graphene produced by vacuum sublimation of Si from electronics grade SiC.

Page 5: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Important achievements

• Record breaking high- speed analog FETs.

• Demonstration of high quality semiconducting epigraphene and related FETs.

• Demonstration of novel spintronic devices.

• Record breaking room temperature exceptional (not understood) single channel ballistic transport, involving new physics.

Gate

Sou

rce

Dra

in

1µm

Gate

Sou

rce

graphene

S D G graphene

SiC

Page 6: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Exfoliated graphene nanoribbons have transport gaps

Transport gap (not a band-gap) “Edge disorder”

This realization essentially ended exfoliated nanoelectronics research!

Page 7: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

for W=40 nm and L=1 µm E1,0/kB=600 K, E0,1/kB=23 K,

Ribbons as waveguides

Caveat: Micron length graphene ribbons are quantum dots!

c* ≈ 106 m/s

Page 8: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Structured graphene growth on sidewalls

~1500C, 10 min

Graphene ribbon

Photo-lithography defined Ni mask Plasma etched SiC step

Preferential graphene growth on the recrystallized (1-10n) facets

Selective growth on sidewalls etched into SiC Avoids disorder at edges

M.Sprinkle, Nature Nano 2010

Graphene grows rapidly on substrate steps and sidewalls. The sidewall first re-crystallizes (facets) and then graphitizes

Page 9: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

High device density

M.Sprinkle, Nature Nano 2010

More than 10,000 FETs per chip (6 x 4 mm2) Scalable method

Page 10: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

27°

S

Sample bias (V) Sample bias (V) Sample bias (V)

0

0.1

dI/

dV

(ar

b.u

nit

s)

dI/

dV

(ar

b.u

nit

s)

dI/

dV

(ar

b.u

nit

s)

Antonio Tejeda, Muriel Sicot, CNRS, France

STM - STS: graphene on side wall - buffer on Si-face

Page 11: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Ribbons and beyond: Structured graphene

Page 12: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

.

Exceptional Room temperature Ballistic Transport in Epitaxial Graphene Nanoribbons

( Nature 506, 349, 2014)

Page 13: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Multiprobe, in-situ transport measurements

SEM image of 4 probes positioned on a sidewall ribbon Outer probes supplying a current. Inner probes measure potential.

Omicron nanoprobe system (Tegenkamp group Hannover)

Page 14: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

0 1 2 3 4 5 Inner probe spacing L(µm)

R4

pp (

h/e

2)

0

1

2

3

Multiprobe, in-situ transport measurements

Four-point (R4pt) and two-point (R2pt) resistances as a function of probe spacing L.

4.2

28

16

58

l(µm)

(-100)

Page 15: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Mo

bili

ty (

cm

2 V

-1 s

-1)

Ribbon width (nm)

Resis

tivity (

µW

-cm

)

Sh

ee

t re

sis

tan

ce

(W

)

100 1000 10 10-2

10-1

100

101

102

103

107

102

103

104

105

106

104

100

101

102

103 R = r

Length

Width.Thickness

r =¶R

¶LW.T

How to determine resistivity unambiguously

Measuring dR/dL eliminates contact resistances

Room temperature resisitivies and mobilities

0 1 2 3 4 5

Inner probe spacing L(µm)

R4

pp (

h/e

2)

0

1

2

3

Theoretical limit

Typical 2D exfoliated

Page 16: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Ribbon conductance versus probe spacing and temperature

Two channels (0+, 0-)

One channel (0+)

0- turns off

0+ turns off

17 µm L0=200 nm

G=1+ exp(-T/T0) (L≤L0) G=1+ exp(1-L/L0) exp(-T/T0) (L>L0) T0=hc*/kBL

The 0- mode is the lowest longitudinal excitation of the ribbon, i.e. the n=0, m=1 state

Page 17: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Longitudinal excitations of quasi particles

n=0, m=1

n=0, m=0

• What are the quasi particles? • They are Fermions and appear to have large magnetic moments. • They seem to have finite, temperature independent lifetimes! • Could they be composite particles (charged excitons)?

E0,1=hc*/2L

E0,0=0

Page 18: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Summary Transport in neutral epigraphene nanostructures is exceptional,

with no counterpart in any other material system.

A new kind of quasiparticle is involved whose properties are ideal

for a new form of electronics.

Page 19: Exceptional ballistic transport in epigraphene Walt de Heer …€¦ · Sprinkle et al. Nature Nano, vol. 5, pp. 727-731,. 2010. Si crystal Si wafer SiC wafer Si nanoelectronics 200

Conductance is ballistic at room temperature. G≈G0=2e2/h (≈1/13kW). Theoretically it should be 2G0

Current densities exceeding 10,000 µA/µm are sustained

Nanotube

fiber

- L (µm)

G (

2e2

/h)

L

V