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    EE105 Fall 2007 Lecture 2, Slide 1 Prof. Liu, UC Berkeley

    Announcements

    HW1 is posted, due Tuesday 9/4

    Discussion Section 102 (We 9-10) moved to 289 Cory

    Lab sections:

    If a section is over-subscribed, then priority will be given tostudents officially registered for this section.

    Paid position for videotaping EE105 lectures is available

    Lecture 1, Slide 1

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    EE105 Fall 2007 Lecture 2, Slide 2 Prof. Liu, UC Berkeley

    Lecture 2

    OUTLINE

    Basic Semiconductor Physics (contd)

    Carrier drift and diffusion

    PN Junction Diodes

    Electrostatics

    Capacitance

    Reading: Chapter 2.1-2.2

    Lecture 1, Slide 2

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    EE105 Fall 2007 Lecture 2, Slide 3 Prof. Liu, UC Berkeley

    Dopant Compensation

    An N-type semiconductor can be converted into P-type material by counter-doping it with acceptors

    such that NA > ND.

    A compensated semiconductor materialhas both

    acceptors and donors.

    P-type material

    (NA > ND)

    DA

    i

    DA

    NN

    nn

    NNp

    2

    AD

    i

    AD

    NN

    np

    NNn

    2

    N-type material

    (ND > NA)

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    EE105 Fall 2007 Lecture 2, Slide 4 Prof. Liu, UC Berkeley

    Types of Charge in a Semiconductor

    Negative charges: Conduction electrons (density = n)

    Ionized acceptor atoms (density = NA)

    Positive charges:

    Holes (density =p)

    Ionized donor atoms (density = ND)

    The net charge density (C/cm3) in a semiconductor is

    AD NNnpq

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    EE105 Fall 2007 Lecture 2, Slide 5 Prof. Liu, UC Berkeley

    Carrier Drift

    The process in which charged particles move becauseof an electric field is called drift.

    Charged particles within a semiconductor move with

    an average velocity proportional to the electric field.

    The proportionality constant is the carrier mobility.

    Ev

    Ev

    ne

    ph

    Notation:

    p hole mobility (cm2/Vs)n electron mobility (cm2/Vs)

    Hole velocity

    Electron velocity

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    EE105 Fall 2007 Lecture 2, Slide 6 Prof. Liu, UC Berkeley

    Velocity Saturation

    In reality, carrier velocities saturate at an upper limit,called the saturation velocity(vsat).

    E

    vE

    v

    bv

    bE

    sat

    sat

    0

    0

    0

    0

    1

    1

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    EE105 Fall 2007 Lecture 2, Slide 7 Prof. Liu, UC Berkeley

    Drift Current

    Drift current is proportional to the carrier velocityand carrier concentration:

    vhtA = volume from which all holes cross plane in time t

    pvhtA = # of holes crossing plane in time t

    q pvhtA = charge crossing plane in time t

    qpvhA = charge crossing plane per unit time = hole current

    Hole current per unit area (i.e. current density) Jp,drift = qpvh

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    EE105 Fall 2007 Lecture 2, Slide 8 Prof. Liu, UC Berkeley

    Conductivity and Resistivity

    In a semiconductor, both electrons and holesconduct current:

    The conductivityof a semiconductor is Unit: mho/cm

    The resistivityof a semiconductor is Unit: ohm-cm

    EEnpqJ

    EqnEqpJJJ

    EqnJEqpJ

    npdrifttot

    npdriftndriftpdrifttot

    ndriftnpdriftp

    )(

    )(

    ,

    ,,,

    ,,

    np qnqp

    1

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    EE105 Fall 2007 Lecture 2, Slide 9 Prof. Liu, UC Berkeley

    Resistivity Example

    Estimate the resistivity of a Si sample doped withphosphorus to a concentration of 1015 cm-3 andboron to a concentration of 1017 cm-3. The electronmobility and hole mobility are 700 cm2/Vs and 300

    cm

    2

    /Vs, respectively.

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    EE105 Fall 2007 Lecture 2, Slide 10 Prof. Liu, UC Berkeley

    Electrical Resistance

    where is the resistivity

    ResistanceWt

    L

    I

    VR (Unit: ohms)

    V

    + _

    L

    tW

    I

    homogeneously doped sample

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    EE105 Fall 2007 Lecture 2, Slide 11 Prof. Liu, UC Berkeley

    Carrier Diffusion

    Due to thermally induced random motion, mobileparticles tend to move from a region of highconcentration to a region of low concentration.

    Analogy: ink droplet in water

    Current flow due to mobile charge diffusion isproportional to the carrier concentration gradient.

    The proportionality constant is the diffusion constant.

    dx

    dpqDJ pp

    Notation:

    Dp hole diffusion constant (cm2/s)

    Dn electron diffusion constant (cm2/s)

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    EE105 Fall 2007 Lecture 2, Slide 12 Prof. Liu, UC Berkeley

    Diffusion Examples

    Non-linear concentration profile varying diffusion current

    L

    NqD

    dx

    dp

    qDJ

    p

    pdiffp

    ,

    dd

    p

    pdiffp

    L

    x

    L

    NqD

    dx

    dp

    qDJ

    exp

    ,

    Linear concentration profile constant diffusion current

    dL

    xNp

    exp

    L

    xNp 1

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    EE105 Fall 2007 Lecture 2, Slide 13 Prof. Liu, UC Berkeley

    Diffusion Current

    Diffusion current within a semiconductor consists ofhole and electron components:

    The total current flowing in a semiconductor is the

    sum of drift current and diffusion current:

    )(

    ,

    ,,

    dx

    dpD

    dx

    dnDqJ

    dx

    dnqDJ

    dx

    dpqDJ

    pndifftot

    ndiffnpdiffp

    diffndiffpdriftndriftptot JJJJJ ,,,,

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    EE105 Fall 2007 Lecture 2, Slide 14 Prof. Liu, UC Berkeley

    The Einstein Relation

    The characteristic constants for drift and diffusion arerelated:

    Note that at room temperature (300K)

    This is often referred to as the thermal voltage.

    q

    kTD

    mV26q

    kT

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    EE105 Fall 2007 Lecture 2, Slide 15 Prof. Liu, UC Berkeley

    The PN Junction Diode

    When a P-type semiconductor region and an N-typesemiconductor region are in contact, a PN junction

    diode is formed.VD

    ID

    +

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    EE105 Fall 2007 Lecture 2, Slide 16 Prof. Liu, UC Berkeley

    Diode Operating Regions

    In order to understand the operation of a diode, it isnecessary to study its behavior in three operation

    regions: equilibrium, reverse bias, and forward bias.

    VD = 0 VD > 0VD < 0

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    EE105 Fall 2007 Lecture 2, Slide 17 Prof. Liu, UC Berkeley

    Carrier Diffusion across the Junction

    Because of the difference in hole and electronconcentrations on each side of the junction, carriersdiffuse across the junction:

    Notation:

    nn electron concentration on N-type side (cm-3)

    pn hole concentration on N-type side (cm-3)

    pp hole concentration on P-type side (cm-3)

    np electron concentration on P-type side (cm-3)

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    EE105 Fall 2007 Lecture 2, Slide 18 Prof. Liu, UC Berkeley

    Depletion Region

    As conduction electrons and holes diffuse across thejunction, they leave behind ionized dopants. Thus, a

    region that is depleted of mobile carriers is formed.

    The charge density in the depletion region is not zero.

    The carriers which diffuse across the junction recombinewith majority carriers, i.e. they are annihilated.

    width=Wdep

    quasi-

    neutral

    region

    quasi-

    neutral

    region

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    EE105 Fall 2007 Lecture 2, Slide 19 Prof. Liu, UC Berkeley

    Carrier Drift across the Junction

    Because charge density 0 in the depletion region,an electric field exists, hence there is drift current.

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    EE105 Fall 2007 Lecture 2, Slide 20 Prof. Liu, UC Berkeley

    PN Junction in Equilibrium

    In equilibrium, the drift and diffusion components ofcurrent are balanced; therefore the net current

    flowing across the junction is zero.

    diffndriftn

    diffpdriftp

    JJ

    JJ

    ,,

    ,,

    0,,,, diffndiffpdriftndriftptot JJJJJ

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    EE105 Fall 2007 Lecture 2, Slide 21 Prof. Liu, UC Berkeley

    Built-in Potential, V0

    Because of the electric field in the depletion region,there exists a potential drop across the junction:

    DiA

    n

    p

    p

    p

    p

    p

    p

    x

    x

    p

    pppp

    Nn

    N

    q

    kT

    p

    pDxVxV

    p

    dpDdV

    dx

    dpD

    dx

    dVp

    dx

    dpqDEqp

    p

    n

    /

    lnln)()(221

    2

    1

    ln20

    i

    DA

    n

    NN

    q

    kTV (Unit: Volts)

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    EE105 Fall 2007 Lecture 2, Slide 22 Prof. Liu, UC Berkeley

    Built-In Potential Example

    Estimate the built-in potential for PN junction below.

    Note that

    N P

    ND = 1018 cm-3 NA = 10

    15 cm-3

    mV603.2mV26)10ln( q

    kT

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    EE105 Fall 2007 Lecture 2, Slide 23 Prof. Liu, UC Berkeley

    PN Junction under Reverse Bias

    A reverse bias increases the potential drop across thejunction. As a result, the magnitude of the electric fieldincreases and the width of the depletion region widens.

    112

    0 R

    DA

    si

    dep

    VVNNq

    W

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    EE105 Fall 2007 Lecture 2, Slide 24 Prof. Liu, UC Berkeley

    Diode Current under Reverse Bias

    In equilibrium, the built-in potential effectivelyprevents carriers from diffusing across the junction.

    Under reverse bias, the potential drop across the

    junction increases; therefore, negligible diffusion

    current flows. A very small drift current flows, limitedby the rate at which minority carriers diffuse from the

    quasi-neutral regions into the depletion region.

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    EE105 Fall 2007 Lecture 2, Slide 25 Prof. Liu, UC Berkeley

    PN Junction Capacitance

    A reverse-biased PN junction can be viewed as acapacitor. The depletion width (Wdep) and hence the

    junction capacitance (Cj) varies with VR.

    dep

    sij

    WC

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    EE105 Fall 2007 Lecture 2, Slide 26 Prof. Liu, UC Berkeley

    Voltage-Dependent Capacitance

    si 10-12 F/cm is the permittivity of silicon.

    0

    0

    0

    0

    1

    2

    1

    VNN

    NNqC

    V

    V

    CC

    DA

    DAsij

    R

    j

    j

    VD

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    EE105 Fall 2007 Lecture 2, Slide 27 Prof. Liu, UC Berkeley

    Reverse-Biased Diode Application

    A very important application of a reverse-biased PNjunction is in a voltage controlled oscillator (VCO),

    which uses an LC tank. By changing VR, we can

    change C, which changes the oscillation frequency.

    LC

    fres

    1

    2

    1

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    EE105 Fall 2007 Lecture 2, Slide 28 Prof. Liu, UC Berkeley

    Summary

    Current flowing in a semiconductor is comprised of drift

    and diffusion components:

    A region depleted of mobile charge exists at the junction

    between P-type and N-type materials.

    A built-in potential drop (V0) across this region is establishedby the charge density profile; it opposes diffusion of carriers

    across the junction. A reverse bias voltage serves to enhance

    the potential drop across the depletion region, resulting in

    very little (drift) current flowing across the junction.

    The width of the depletion region (Wdep) is a function of the

    bias voltage (VD).

    dxdpqD

    dxdnqDEqnEqpJ pnnptot

    ln20

    i

    DA

    n

    NN

    q

    kTV

    112 0 D

    DA

    sidep VV

    NNqW