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Creative Technology Solution
Company Profile
Name CTS (Creative Technology Solution)
President Dong-Kwan Lee
Foundation July 9, 2010
Address Cheongju-City,Chungcheong buk-do,Korea
Business Field
Single CMP Polisher & Auto CMP Polisher
Standalone Post Cleaner
Software Development
Semiconductor Parts Manufacture & Development
Equipment Refurbish & Modify_CMP 200MM,300MM
Certification
Quality Management System
ISO 9001 ISO 14001 Venture Enterprise Cert R&D Cert KCS Cert
Product Certification
CE Cert Design Patent Cert Patent Cert
Organization Chart
PRESIDENT
DESIGN
DEPARMENT SOFTWARE
DEPARMENT MANUGACTURING &
CS DEPARMENT SALES & OVERSEAS S
ALES DEPARMENT
Quality Control
TEAM
PURCHASING
TEAM
Factory & Office
Manufacture Room
☞ Manufacture Room Size : 230 M2
☞ Product : 8/12 inch CMP system
☞ Manufacturing Capacity : 20 tools/year
☞ Metrology for 8/12 inch oxide, Tungsten
History Model Name Customer Remark
Nov, 2017 AP-300 Shinhan Diamond CMP Disk_Korea
Nov, 2017 AP-300 MS Materials CMP Slurry_Korea
Jun, 2016 ScS-300 Soulbrain CMP Slurry_Korea
Mar, 2016 AIP-300 SKC CMP Pad_Korea
Jan, 2016 AP-300 SKC CMP Pad_Korea
Oct, 2015 AP-300 3M CMP Disk_Korea
Oct, 2015 AP-300 Dongjin CMP Slurry_Korea
Aug, 2015 AP-300 KC Tech CMP Slurry_Korea
Mar, 2015 AP-300 Shinhan Diamond CMP Disk_Korea
Feb, 2015 AP-300 FNS Tech CMP Pad_Korea
Nov, 2014 AP-300 E-hwa Diamond CMP Disk_Korea
Sep, 2014 AP-300 Sae-sol Diamond CMP Disk_Korea
Nov, 2013 AP-300 Soul-brain CMP Slurry_Korea
May, 2013 AP-300 Cabot Microelectronics CMP Slurry_Korea
Mainly, CTS CMP equipment is suitable to apply Pad, Diamond Disk, Slurry R&D field.
Sales Record
Business Portfolio
Business Detail Business
Unit
Cleaner Manufacturing
ScS-300TM
CMP Manufacturing
AP-300TM
♣ R&D CMP Polisher
♣ Zone Control able Carrier
♣ 200,300mm Polishing Carrier Compatible
♣ Rotary Type Concept Mechanism
♣ Best Solution for R&D System
♣ Post CMP Wafer Cleaning.
♣ Integration into cluster tools.
♣ Post Deposition Wafer Cleaning.
♣ Customized Wafer Flow Sequence per Chamber.
♣ High Speed Rotation Wafer & Brush_600rpm.
♣ 2 Cassette Foup + T.R + Brush#1,2 + SRD.
Business Portfolio
Business Detail Business
Unit
♣ Compact Size 840x840x1640 (W x L x H mm)
♣ N2 Blowing
♣ Spin 2500rpm
♣ Control PC Base
♣ 200mm, 300mm Spin Rinse Dry
SRD Manufacturing
AS-300
CMP Manufacturing
AIP-300TM
♣ Auto Wafer Polishing.
♣ High performance planarization process.
♣ Super-Qualified Reliability.
♣ Various Wafer Polishing Usage.
♣ Advanced carrier Zone controls.
♣ In & Ex-situ Pad Conditioning_13zone.
♣ Real Data monitor & Save Data.
Business Portfolio
Business Detail Business
Unit
♣ CMP Carrier Membrane
♣ CMP Retainer Ring
♣ PVA Brush
♣ Carrier Film
♣ We can supply CMP consumable parts. CMP
Consumable
Part
♣ Doosan Unipla231
♣ Mirra3400 Ontrak&Mesa
♣ Ebara Frex200,Frex300s,s2
♣ Auriga EC
♣ IPEC 776,472
♣ CMP System Installation, Service & Part Sales
CMP Refurbishing
Partner Companies
Thank you
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