1 nanotech project 2008 / phase 2 project: team: accoto celso adham mohamed larrieu jeancharles le...
TRANSCRIPT
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1ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
ACCOTO CelsoADHAM Mohamed
LARRIEU JeanCharles
LE GROS ChristopheMAQUEDA LÓPEZ Mariazel OTTONELLO BRIANO Floria
PIZZATO DanielSADRINI Jury
Team Members:
Interferometric Modulator Display
Presentation 4: Anatomy of an iMod
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2ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Introduction
Presentation 3:• We are designing a new MEMS based
Display based on a Fabrey Perot Interferometer (iMod)
Previous Problems: - Actuation voltage too high - process: insulating material (PMMA)
would have melted…
Agenda: 1. New Design2. Simulations3. Fabrication
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3ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Improving the Design
Last time, we planned to:
• Changed physical design Modify back electrode of device
• Materials More compliant materials
• Thicknesses Thinner back plate (technology issue)
• Lengths Resolution is a constraint
• Boost V Low power constraint
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4ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
New ANSYS Design
New single IMOD model:two beams support the
reflective plate
Former design
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5ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
MATBLAB Simulations
Why did we simulate our model on MATLAB?• it’s difficult to set design parameters on ANSYS• to have an idea of the values that we will use on ANSYS for the dynamic simulation
Hypothesis: 1) Static simulation: just a look at the final state of the system
▪ No viscosity forces▪ No switching time analysis
2) Clamped beam modeling of the system3) Everything is made with poly-Silicon
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6ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
MATBLAB Results
Dimensions:
• 20 μm plate
• Displacement function of the voltage (3 to 6 V)
Vertical position of beam along its length
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7ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
MATBLAB Results
New Design:
Lenght Voltqge
8 μm 31.1 V
10 μm 22.3 V
12 μm 16.9 V
14 μm 13.4 V
16 μm 11.0 V
18 μm 9.2 V
20 μm 7.8 V
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8ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
MATBLAB Results: comparison
Results:@ 20 μm: from 30 V to 7.8V
26 % improvement changing the design!
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9ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Choice of the design
Adv: residual stress just twist the structure.
Dis: difficult to design.Adv: beams instead of plate
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10ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
ANSYS Design
New design:
• From plate to beam• Less stiff system• Plate parallel to
substrate
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11ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
ANSYS Simulation Difficulties…
• 400 lines code• 34 3-D points (102
positions)
• Problems in the meshing• Problems assembling the
system
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12ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Process Flow & Mask Design
New process flow:
- Previous mistakes- New design
Mask modeling:
- AutoCAD
Eg. of mask
... Still preliminary
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13ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Process Flow
Glass substrate
Silver deposition: sputtering
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14ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Silver deposition:sputtering
Process Flow
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15ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Resist deposition
Process Flow
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16ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 1
Process Flow
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17ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Etching
Process Flow
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18ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Dielectric layer
Process Flow
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19ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 1
Resist+etch+resist removal
Process Flow
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20ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
SiO2 layer: PECVD
Process Flow
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21ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 2
Resist: DQN
Process Flow
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22ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
SiO2 etch 80 nmexactly
Process Flow
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23ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 3
Resist: DQN
Process Flow
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24ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
SiO2 etch 50 nmexactly
Process Flow
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25ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Remove DQN
Process Flow
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26ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Deposition of Al:Reflective layer
Process Flow
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27ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 4
Deposition of protective squares
Process Flow
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28ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Etch of Al +Removal of protective
squares
Process Flow
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29ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
SiO2 deposition
Process Flow
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30ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 5
Etching of SiO2
Process Flow
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31ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 6
Etching of SiO2
Process Flow
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32ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
SiN deposition
Process Flow
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33ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Mask 7
Etching of SiO2
Process Flow
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34ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
V+
Concept of the system
Column selection
Row selection
ProcessorTSP 65131
Vhold
V+ V-
Battery
“Operating Principles of Mirasol Displays: Interferometric Modulation (IMOD) Drive”, QUALCOMM December 2007
Vhold
V-
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35ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
“Operating Principles of Mirasol Displays: Interferometric Modulation (IMOD) Drive”, QUALCOMM December 2007
PSPICE Design
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36ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
• Mask is the 1st approximation of the fabrication process
• Final masks for the process are under review
• Ansys/Matlab:
• Less stiff beams → lower activation voltage: 8V
• Vibration analysis and switching time to be checked
• PSPICE
• Addressing circuit has been defined
• Power consumption has been evaluated
Conclusions
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37ÉC OLE POL Y TEC H NIQ U EFÉ DÉRALE D E LA USANNE
Nanotech Project 2008 / Phase 2Project:Team:
Thank you for your attention!