track c: a new method for automatic generation of drc and lvs runsets/ dr. elena ravve

23
May 1, 2013 1 A new method for automatic generation of DRC and LVS runsets Dr. Elena Ravve Software Engineering Department Ort Braude College, Karmiel (common work with TowerJazz Semiconductor) May 1, 2013

Upload: chiportal

Post on 17-Dec-2014

967 views

Category:

Technology


2 download

DESCRIPTION

 

TRANSCRIPT

Page 1: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 1

A new method for automatic

generation of DRC and LVS runsets

Dr. Elena Ravve

Software Engineering Department Ort Braude College, Karmiel

(common work with TowerJazz Semiconductor)

May 1, 2013

Page 2: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 2

What is the problem? From designer to manufacturer

Page 3: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 3

What is the problem? From manufacturer to designer

Page 4: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 4

Physical Design Kits Package

Physical Design Kits Package

Page 5: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 5

From Design Rule Manuscript to Runsets: multiple interpretations

Page 6: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 6

From DRM to Runsets: derivatives and revisions

Runsets

Runsets

Runsets

Runsets

Runsets

Runsets

Page 7: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 7

Definition of the problem

• Any semiconductor manufacturing process contains a set of physical design rules for geometrical configuration of available layers, wiring, placement and so on.

• Every chip, which is expected to be manufactured in the given technology, must satisfy the limitations of the design rules.

Page 8: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 8

Definition of the problem (ctnd)

• Design Rile Manual (DRM) may contain hundreds of physical design rules and definitions of dozens legal devices.

• Design rule checking (DRC) and Layout vs. Schematics (LVS) runsets are provided in order to guarantee that the given chip does not give the design rule violations.

Page 9: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 9

Definition of the problem (ctnd)

• Writing and testing of DRC and LVS runsets traditionally is done MANUALY

• It leads to

– Problematic knowledge accumulation and transfer

– Different interpretations of rules and definitions

– Inconsistency of revisions and derivatives

– Maintenance problems

– etc.

Page 10: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 10

Solution of the problem

• The proposed innovation is based on the fact that the set of legal devices for any process or technology may be divided into final set of technology independent categories such that transistors, capacitors, resistors, diodes and so on.

Page 11: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 11

Solution of the problem (cntd)

• Moreover, the set of physical design rules for any process or technology may be divided into final set of technology independent categories such that width, space, enclosure and so on.

Page 12: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 12

DRM composition rather than free style writing

• We create one set of parameterized templates for DRC/LVS purposes, such that one template (or rather sub-set of templates) corresponds to a DRC/LVS category.

• We force the DRM composer (integrator) to fulfill the templates (in any relevant way, for example, using GUI) instead of free-style writing of the document.

12

Page 13: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 13

DRM composition rather than free style writing (ctnd)

For any design rule or legal device for a given technology, the integrator

• chooses the relevant parameterized template,

• provides the specific values of required parameters or (preferably) chooses them from a choice list.

13

Page 14: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 14

DRM composition rather than free style writing (ctnd)

The obtained information is transformed and stored as a data structure that will be used for different purposes, such that DRC and LVS runsets generation in particular verification tools and so on.

14

Page 15: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 15

Auto Design Rules Tool

15

Page 16: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 16

Implementation: choice lists

16

Page 17: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 17

Implementation: code generation

17

Page 18: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 18

Implementation: main steps 1-7

18

Page 19: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 19

Implementation: generated code

19

Page 20: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 20

Benefits of the presented method

• Better quality and confidence level of the delivered DRC/LVS runsets

• Total elimination of the step of manual runsets coding for any verification tool

• Reduction of time and effort to implement runsets

• Full coverage of all physical design rules and legal devices

20

Page 21: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 21

Benefits (ctnd)

• Common base for different processes, technologies and verification tools

• Detection and correction of mistakes and bug at earliest stages of the flow

• Human independent accumulation and transfer of knowledge

• Reduction of manual writing

• Reduction of human factor

21

Page 22: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 22

Benefits (ctnd)

• Formal approach to DRM composition that allows precise formulation of physical design rules and description of legal devices

• Effective and safe way to change the DRC/LVS runsets for all verification tools, according to the changes in DRM and bug fixes

22

Page 23: TRACK C: A new method for automatic generation of DRC and LVS runsets/ Dr. Elena Ravve

May 1, 2013 23

Thank you for your attention!

Questions?

May 1, 2013