theon sensors s.a. - corallia€¦ · design develop and integration of mems 3. sales for 2007 €...
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PRIVATE & CONFIDENTIAL 14-17/11/2007
MEMS Business Unit
December 2007
THEON SENSORS S.A.
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Company Profile
1.
HELLENIC COMPANY-ESTABLISHED IN 1997
2.
SCOPE OF BUSINESS DESIGN DEVELOP AND MANUFACTURE OF
ELECTRO-OPTICAL SYSTEMS
DESIGN DEVELOP AND INTEGRATION OF MEMS
3.
SALES FOR 2007 €
12 M, PROJECTED SALES FOR 2008 €
15 M
4.
SALES ΒΑCKLOG (for the next 3 years) AS OF 31-12-2007: €
70
M
5.
NATO/NATIONAL SECRET CLASSIFIED
6.
ISO 9001:2000 CERTIFIED
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Company's Operating Activities
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Design and Simulation of Silicon sensing elements
• Design and simulation of signal conditioning electronics for Micro –Systems
• Design of multilayer PCB
• Design of electronic interface to the overall system
• Micro Assembly / Packaging (Wire and Die Bonding)
• Design of Systems Housing (Mechanical Designs)
• Testing & Characterization
Products / Capabilities• Mass Air Flow Sensing Systems (Capability of measuring other media like water)• Capacitive pressure sensor
• Capacitive accelerometer
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PRIVATE & CONFIDENTIAL 14-17/11/2007
MEMS advantages
•
Size reduction (cm to μm)MEMS fit into any products compared to macro devicesReduced weight critical for many applications
•
Price reduction Adoption of IC fabrication process led to high volume
production (million devices) Due to reduced size more dies per wafer
•
Increased performance Integration with IC allows new functionalities Reduced power consumption ideal for all modern applications Better resolution, response timeIncreased reliabilityVersatility
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Product Development Process
• Design and simulation of MEMS sensor
• Design and simulation of electronics
• Design of electronic interface
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Product Development Process
• Design of multilayer PCB
• Design of mechanical housing
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PRIVATE & CONFIDENTIAL 14-17/11/2007
In-House Development Infrastructure •10000 class Cleanroom
(50 m2)
Intended for Packaging and TestingOf MEMS components
• Die Bonder (FINEPLACER®
Pico MA)5 µm (0.2 mil) placement accuracy
Eutectic Soldering AuSn SolderingThermo CompressionThermo-/ Ultrasonic BondingAdhesive TechnologiesACP (Anisotropic Conductive Paste)Chip On Glass (ACF)
• Wire Bonder (Kulicke
& Soffa
)4500 Series Ball Bonder
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PRIVATE & CONFIDENTIAL 14-17/11/2007
In-House Development Infrastructure • PCB Rapid Prototyping
ProtoMat®
C100 HF Circuit Board PlotterBoardMaster®
control software
Through-Hole PlatingMultilayer
• Multi-axis CNC lathes• Machine center of the latest technology
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PRIVATE & CONFIDENTIAL 14-17/11/2007
In-House Testing / Characterization Infrastructure
• Characterization of pressure sensors
• Probe Station for on die/waferelectrical tests
• Climatic chamber for environmental tests
• Characterization of air flow sensors
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PRIVATE & CONFIDENTIAL 14-17/11/2007
MASS AIR FLOW SENSING SYSTEM
• SENSOR DIE (HOT WIRE ANEMOMETER)
• SIGNAL CONDITIONING ELECTRONICS
• MECHANICAL HOUSING (Rapid prototype) Medical applications
Characteristics
Weight : 40gSize : 70mm(L), 50mm(W), 30mm(H)Calibration Gas : AirFlow range : Bidirectional (+/-200SLPM)Power Supply : 12VOutput signal : Analog voltageResponse time : <5msPressure drop : 1mbar@200SLPMExtremely good tolerance in condensation
•
Capability of adapting the characteristics to customer needs
•
Same sensor capable of measuring other media, like gas, water, oil
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Capacitive Pressure SensorPRINCIPLE OF OPERATION
CAPACITANCE CHANGE BETWEEN MOVABLE MEMBRANES
ADVANTAGES OVER OTHER TECHNOLOGIES
LOW POWER CONSUMPTIONSMALL DIMENSIONS (0.8mm X 0.8mm)
THERMAL STABILITY
SENSORS CAN BE DESIGNED & MANUFACTUREDUNDER CUSTOMER SPECIFICATIONS
SOLUTIONS BASED ON FULL CUSTOM ASICSCAN BE PROVIDED
Available pressure sensor chips
Range: 1-5BarResolution: 20mbar
Accuracy: ±1%
C-P characteristic of the pressure sensor
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PRIVATE & CONFIDENTIAL 14-17/11/2007
MEMS Capacitive AccelerometerSANDIA SUMMiT
V® Microfabrication
process
for inertial sensors (accelerometers, gyros)
Typical Specifications: 2-axisHigh G (shock), >±100GLow G , <±1GResolution, <0.5mg
Polysilicon Surface Micromachining Novel SOI Surface Micromachining(wafer level packaging)
Signal Conditioning ElectronicsFull Custom ASIC solution provided by THEON
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PRIVATE & CONFIDENTIAL 14-17/11/2007
Product development roadmap
Identify
customer needs & priorities
Feasibility Stage
Development Stage
Pre-production Stage
Production Stage
• Understand the application and the required specifications
• Emphasize the technological challenges• Propose a scope of work• Propose suitable design solutions• Proof of concept
• System optimization and characterization• Environmental tests (temperature, humidity, etc)• Crucial parameters and test methods are fixed
in agreement with the client and according tothe production requirements.
• Determination of the engineering-production process• Determination of the Qualification tests• Determination of the Outsourcing parts & suppliers• Fix Pricing
• Delivery schedule