technical program - society of vacuum coaters · 2012-06-14 · society of vacuum coaters •...

09Symposium on Cleantech Energy Conversion, Storage and Related Processes

Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS)

Joint Session on Atmospheric Plasma Technologies

PreliminaryProgramfor the 2009 Technical Conference

Education Program

Featuring in Santa Clara:

Exhibit May 11 & 12, 2009Feauturing Free Wireless Internet throughout the Exhibit Hall

Vendor Innovators Showcase and Live Product Demonstrations

Exhibit Hall Reception, Lunch and Beer Blast

M ay 9 – 1 4 , 2 0 0 9 ~ S a n ta C l a r a C o n v e n t i o n C e n t e r ~ S a n ta C l a r a , C A

Technical Program May 11–14, 2009

Including two New Tutorials on Hot Topics for 2009!May 9–14, 2009

Join, Renew and Register on-line at www.svc.org

� Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

MessageandInvitationfrom theProgramChairsThe 52nd Annual SVC Technical Conference — Santa Clara, CA

After yet another year of breakthroughs and advances in technology, the Society of Vacuum Coaters is anxious to showcase the most innovative ideas and latest discoveries in vacuum coating at our Annual Technical Conference (TechCon), May 9-14, 2009 in Santa Clara, CA. While many industries are struggling to find significance in today’s economy, vacuum coating has discovered far-reaching applications, spanning numerous industries and has positioned itself to be an integral part of tomorrow’s technology. Join us in Santa Clara to participate in this inspiring program and be involved with our international community.

It’s About the Location!While planning the SVC 2009 TechCon, we couldn’t help but appreciate the relevance of the location of this year’s event. Santa Clara, California is in the heart of the Silicon Val-ley, the scene of modern industry adapting to tomorrow’s technology; science unifying with commerce to create novel processes and products to serve the needs of today’s consumer; innovation merging with the entrepreneurial spirit to realize exciting opportunities in clean energy and beyond. Much the same could be said about vacuum coating technology. Brilliant minds in vac-uum science are discovering new, ground-breaking applications for vacuum coating and introducing their developments to a wide array of both established and emerging industries world-wide. These achievements amount to momentous progress in the way much of the world does business and utilizes modern technology. The 2009 TechCon, from May 9-14 will encapsulate the spirit of the Silicon Valley with the promise of coating technology by offering meaningful technical sessions, filled with new ideas pre-sented by both experts in the field and the brightest in young professionals.

It’s About the Technology!Join us to learn about the latest develop-ments in optical coating, vacuum processes and coatings for health care applications, tribological and decorative coating, vacu-um web coating, large area coating, process modeling and control and emerging tech-nologies. Each session has an impressive lineup of invited speakers and presentations to help you broaden your insight and ask questions of others with similar needs or problems. Do you have an important de-velopment you would like to share with the vacuum coating community? There is still an opportunity to be involved in presenting your latest inspiration or discovery in either our Heuréka! or Poster sessions. The Poster session offers the ability to share key ad-vances with your peers and colleagues in the well-attended venue of the Exhibit Hall dur-ing our reception on Monday. Submit your abstract today to participate in these post-deadline opportunities. Log onto www.svc.org no later than March 1, 2009 and submit your abstract in order to be included in the Final Program!

Special Sessions–It’s About the Topics!A vacuum coating conference in the Silicon Valley would be remiss if it didn’t feature our technology as it applies to clean energy. This year’s Symposium on Cleantech Energy Conversion, Storage and Related Processes explores the vast prospects of thin films for solar energy, smart glazing and energy ef-ficient coatings, organic and emerging pho-tovoltaic technologies and cleantech venture opportunities and their impact on the indus-try. Clean energy is also the focus of both our Keynote and Plenary Addresses for the 2009 TechCon. We welcome Mark R. Pinto, our Keynote Speaker from Applied Materials in Santa Clara, CA, who will present “Thin Film Technology for the Energy Industry” to the conference on Monday morning. Billy G. Johansson, of Seabased AB in Uppsala, Sweden will open our conference on Sunday evening with the Plenary address, “Renew-able Energy – Novel Solutions and Trends.” We are eager to share their expertise with our community.The Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS) will examine the latest developments in technology for physical vapor deposition and substrate treatment prior to deposition. Following four years of overwhelming suc-cess of the HIPIMS topic, we have enhanced the session to include presentations on all aspects of modern HIPIMS technology.Recent developments confirm that atmo-spheric plasma has become an important tool in general coating, complementary to vacuum coating. Recognizing this, SVC has included a Joint Session on Atmospheric Plasma Technologies, co-organized by Emerging Technologies, Plasma Processing and Vacuum Web Coating Technical Advi-sory Committees.

It’s About the People!More than ever, establishing a trusted net-work of contacts and experts is critical to the growth of your career and your business. SVC has created a conference program that will not only allow you to share in the lat-est in new discoveries, but will give you the chance to talk to experts, meet potential customers and introduce yourself to an international network of vacuum coating professionals. Within the full schedule of the TechCon program, are invaluable net-

working events, including two Networking Breakfast Sessions and three “Meet the Ex-perts” Corner sessions which allow for sub-stantive question and answer time with the leaders in our field and the chance to meet others within the vacuum coating commu-nity. We also invite you to enjoy our other special events, including the ever-popular Mr. Wizard Program, the SVC Foundation 5K Run, the Welcome Reception and the Tuesday evening off-site networking event at the spectacular Tech Museum of Innova-tion in San Jose. Sign up for any or all of these events during your on-line conference registration. A strong commitment to education is part of SVC’s charter. Twenty-six tutorials, taught by specialists in the topic, will be presented at the TechCon, allowing both novice and experienced vacuum coaters the ability to broaden their understanding of the ap-plications of vacuum coating. A full list of all the tutorials offered at the TechCon is on our Web Site, www.svc.org. Supporting our pledge to further education, we have invited Michel Moisan of the Université de Montréal, Canada and Erich Bergmann of École D’Ingeniéurs de Genève, Switzerland to present their latest work during our Donald M. Mattox Tutorial Program on Monday and Wednesday afternoon. Both of our speakers will be shedding light on topics relevant to a wide array of attendees.Don’t miss the Vendor Innovators Showcase and Live Product Demonstrations begin-ning on Tuesday morning. This is an excel-lent venue to see, touch and experience the latest in products, services and equipment from vendors around the world. You just might find an original way to better compete in today’s evolving marketplace!Remember, log on to the SVC Web Site, www.svc.org, to register for and plan your travel to the 52nd Annual Technical Confer-ence and Exhibit. This one-stop registration process is simple and fast and makes the “logistics” of attending the conference easy. We look forward to seeing you in Santa Clara in May 2009!Ladislav Bárdos, Uppsala University, Sweden (46/18-4713034; [email protected]) is the Program Chair. Ludvik Martinu, École Polytechnique de Montréal , Canada (514/340-4099; [email protected]) and Charles Bishop, C.A. Bishop Consult-ing, United Kingdom (44/1509 502076; [email protected]) are the Assistant Program Chairs.

Renewable Energy – Innovative Solutions and TrendsPresented by Billy G. Johansson, Seabased AB, Uppsala, Sweden

In a high-level seminar arranged in September 2008 by the Swedish-American Chamber of Commerce, discussions took place about the rapid increase of carbon dioxide content in the air. Some delegates compared the situation with writing a book and suggested that chapter

one was ready. Chapter one dealt with the problem of getting the world to understand that carbon dioxide increase is a problem. The delegates were in agreement that the problem was understood. It is now neces-sary to find the best solutions and act. The future will show if this book turned out to be a drama, a thriller or, if we are lucky, a comedy. To succeed in this we cannot just act as we have always done by improv-ing the existing solutions. We need to have a new type of wild, daring and humanitarian solution, but still cost-efficient. Innovative solutions must be found. Any idea/solution initially has to be “tested” intellectu-ally against the Physical Laws. Few politicians know the facts about different renewable energies. The facts for average power: sun – 100W/m², wind (11m/s) – 1kW/m², wave (Sweden) = 5-10Kw/m wave, wave (USA) = 15-60kW/m wave, and underwater current (2m/s) – 4kW/m². Another interesting fact is that the number of full load hours differs a lot as follows: sun – 1,000 h/year, wind (Sweden) – 2,200 h/year, wave (Sweden) – 3,000 to 4,000 h/year, wave (USA) – 3,000 to 6,000 h/year, and underwater currents – 7,000 h/year. Having these facts as

SVCTechConPlenaryAddress

background, three new ways of extracting renewable energy have been invented in Sweden. For wind energy there is a solution that uses a vertical arrangement, which of course, will lead to better cost perfor-mance and lower risk for failures or breakdown. For wave energy, the solution is based on a Wave Energy Converter (WEC) placed on the seabed (well protected) having a point absorber driving a linear genera-tor. Arrays of WECs are then connected via underwater switchgears to the grid. For underwater current, the solution is based on a vertical arranged turbine with a slow speed generator. This will also result in a minimum or no negative influence on the environment. The trend we see nowadays is an increased focus on environment friendly solutions that will get even stronger in the future. However, it is important to question solutions that are not cost-effective and do not focus on the environment for the whole supply chain, including recycling.Billy Johansson is a businessman who has been working all his professional life with energy producing plants. His background reveals many interesting and daring projects, such as building and delivering a turnkey hydropower plant in Jammu Kashmir, India with a total value of 880 MUSD, during his time as President of ABB Generation. Also, he is a negotiator and among other things succeeded in settling the Swedish Claim against the Romanian state in 2001, an affair that had been going on since the 50s. Currently, he is working with wave power, an interesting concept, with a unique solution in which he strongly believes. His references include 28 years work for ABB in Sweden, 6 years with INC International Negotiation Consultants AB, and 5 years with Seabased AB.

Sunday Evening, May 10, afterthe Opening Ceremonies, Awards

Presentations and Annual BusinessMeeting at 7:00 p.m.

Monday Morning, May 11, at 8:30 a.m.

Thin Film Technology for Energy ApplicationsPresented by Mark R. Pinto, Applied Materials, Santa Clara, CA

Over 40 years of thin film process innovations have helped enable the IC industry today to produce well over 1018 transistors per year at costs of nanodollars per transistor, thereby empowering the information age. Likewise, large area thin film manufacturing has dramatically improved the performance and cost of low-cost displays over the past 15 years, enabling high definition video from the handheld to the wall-mounted HDTV. The overwhelming societal and market pull today for new solu-tions in the field of clean energy offers an exciting opportunity to build

on a similar base of technology. Through a combination of materials innovation and highly productive processing platforms we have the potential to enable new solutions for conservation, conversion and storage and thus profoundly change the economics of clean energy.Mark R. Pinto is a Senior Vice President of Applied Materials where he serves both as the corporate Chief Technology Officer and as the General Manager of the Energy and Environmental Solutions business including the company’s ef-forts in solar manufacturing solutions. Prior to joining Applied, he spent 19 years with Bell Laboratories where he was involved in R&D and management of IC technology, optoelectronics and design. Dr. Pinto holds a Ph.D. in Electrical Engineering from Stanford University and was named both a Bell Labs Fellow and also of the IEEE for his contribu-tions to semiconductor technology.

Inside . . . Message and Invitation from the

Program Chairs ............................................. 2Plenary Address and Keynote Presentation ....... 32009 SVC TechCon Technical Program........ 4–14Donald M. Mattox Tutorial program ............. 5, 9A Vacuum Wizard’s Guide to

Understanding Vacuum and Vacuum Coating ........................................... 6

“Meet the Experts” Corner .................................. 8Sponsored Students ........................................... 10SVC Foundation 5K Fun Run and Walk ......... 11Technology Forum Breakfasts ........................... 11SVC Networking Events at the TechCon .......... 122009 SVC Exhibit ........................................ 16–17Corporate Sponsors ........................................... 18How Do I Get to Santa Clara? .......................... 18Education Program ..................................... 19–29

Schedule ....................................................... 19Short Courses and Instructors .............. 20–29

SVC Companions Program ............................... 29General Conference Information ...................... 30Conference Registration Form .......................... 31

KeynotePresentation

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org �


Monday Morning, May 11

Technology Forum Breakfast7:00 a.m.-8:15 a.m.

Facilitator-led round-table discussions pro-vide an opportunity for informal discussion and interaction on specific subjects. See page 11 for topics and facilitators.

Keynote Presentation8:30 a.m.–9:15 a.m.

Thin Film Technology for Energy ApplicationsPresented by Mark R. Pinto, Applied Materials, Santa Clara, CA

Please see abstract and biographical sketch on page 3.

Vacuum Web CoatingModerators: Greg Tullo, SE Associates, Inc. and James McShane, Avery Dennison

9:30 a.m. W-1 Polyester Substrates and Vacuum Deposition: Process Optimisation for Improved Product PerformanceInvited 40 min. TalkM. Hodgson, Dupont Teijin Films UK Ltd., Wilton Centre, United Kingdom

10:10 a.m. W-2 Transparent Conducting Oxides on Polymer Substrates S. Louch, Centre for Process Innovation, Redcar, United Kingdom; and M. Hodgson, Dupont Teijin Films, Middlesbrough, United Kingdom

10:30 a.m. W-3 Optical, Electrical, and Structural Properties of ZAO and ZGO Coat-ings Deposited by Magnetron Sputtering onto Plastic Substrate R. Kleinhempel, R. Thielsch, and A. Wahl, Southwall Europe GmbH, Grossroehrsdorf, Germany

10:50 a.m. W-4 Transparent Conducting Films by Vacuum and Atmospheric CoatingS. Barth and T. Port, CPFIlms Inc., Martins-ville, VA; and H. Memarian and M. Saif, CP-Films Inc., Canoga Park, CA

11:10 a.m. W-5 Characteristics of Hetero-Atoms Doped ZnO Thin Films Prepared by Electron Cyclotron Resonance-Metal Organic Chemical Vapor DepositionJ.K. Lee, Korea Institute of Science and Tech-nology, Seoul, Korea; and J.H. Park and D. Byun, Korea University, Seoul, Korea

11:30 a.m. W-6 Low Temperature Deposi-tion of AZO Coatings on Polymeric WebP. Barker, G.T. West, and P.J. Kelly, Manches-ter Metropolitan University, Manchester, United Kingdom; and J.W. Bradley, University of Liverpool, Liverpool, United Kingdom

11:50 a.m. W-7 Deposition of High Mobility ZnO and InZnO Thin Films at Ambient Tem-perature Using HiTUS Based Technology for TFT Applications

J.D. Dutson, Plasma Quest Ltd., Hook, United Kingdom; A.J. Flewitt and P. Beecher, Univer-sity of Cambridge, Cambridge, United King-dom; and S.J. Wakeham and M.J. Thwaites, Plasma Quest Ltd., Hook, United Kingdom

Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS)Moderator: Jolanta Klemberg-Sapieha, École Polytechnique de Montréal, Canada

9:30 a.m. HP-1 PVD Processes in High Aspect Ratio Features by HIPIMSInvited 40 min. TalkJ. Weichart, M. Elghazzali, and S. Kadlec, OC Oerlikon Balzers AG, Balzers, Principality of Liechtenstein; and A.P. Ehiasarian, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield, United Kingdom

10:10 a.m. HP-2 Effect of the High Ion Ir-radiation on the Structure, Tribological and High Temperature Performance of CrAlYN/CrN Nanoscale Multilayer Coatings Depos-ited by the HIPIMS Technology P. Hovsepian, A.P. Ehiasarian, and Y. Puran-dare, Sheffield Hallam University, Sheffield, United Kingdom; R. Braun, DLR-German Aerospace Center, Cologne, Germany; and I.A. Ross, University of Sheffield, Sheffield, United Kingdom

10:30 a.m. HP-3 Industrial Impact of HIP-IMS+ Technology for Chromium Nitride CoatingsF. Papa, C. Strondl, I. Kolev, T. Krug, and R. Tietema, Hauzer Techno Coating BV, Venlo, The Netherlands

10:50 a.m. HP-4 HIPIMS-MPP Deposited Ta and Cr Coatings for High Temperature Wear and Erosion Applications S.L. Lee, F. Yee, M. Cipollo, and S. Smith, U.S. Army ARDEC-Benét Laboratories, Waterv-liet, NY; and R. Chistyakov and B. Abraham, Zond Inc./Zpulser LLC, Mansfield, MA

11:10 a.m. HP-5 Pulsed Magnetron Sputter-ing of Metallic Films Using a Hot TargetJ. Vlcek, B. Zustin, J. Rezek, K. Burcalova, and J. Tesar, University of West Bohemia, Plzen, Czech Republic

11:30 a.m. HP-6 Magnetron Configuration to Enhance Deposition Rate in High Power Impulse Magnetron SputteringA.P Ehiasarian and A. Vetushka, Sheffield Hallam University, Sheffield, United Kingdom

11:50 a.m. HP-7 Mass/Energy Analysis of a Modulated Pulse Power Plasma Compared to a DC PlasmaW.D. Sproul, Reactive Sputtering, Inc., San Marcos, CA; J. Lin, J.J. Moore, Z. Wu, and X. Zhang, Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO; R. Chistyakov and B. Abraham, Zpulser, LLC, Mansfield, MA; and A. Rees, Hiden Analytical, Ltd., Warrington, United Kingdom

Emerging TechnologiesModerators: Chris Stoessel, Southwall Tech-nologies and Clark Bright, 3M Corporation

9:30 a.m. E-1 Photocatalytic Thin Films for Biomedical ApplicationsInvited 40 min. TalkP.M. Martin, Columbia Basin Thin Film Solu-tions, LLC, Kennewick, WA; W.D. Bennett, Pacific Northwest National Laboratory, Rich-land, WA; B.F. Monzyk, Battelle Memorial Institute, Columbus, OH; K.A. Dasse, Levit-ronix, Waltham, MA; and R.J. Gilbert, MIT, Boston, MA

10:10 a.m. E-2 Comparison of Ion Trap and Quadrupole Sensors for Mass SpectrometryG.A. Brucker, Brooks Automation, Inc., Longmont, CO

10:30 a.m. E-3 Effect of Growth Conditions on the Structure Stability, Transport and Magnetic Properties of Co Doped TiO2 FilmsB. Ali, University of Delware, Newark, DE; A.K. Rumaiz, Brookhaven National Laborato-ry, Upton, NY; and A. Ozbay, E.R. Nowak, and S.I. Shah, University of Delware, Newark, DE

10:50 a.m. E-4 Soft Polymer-Like Carbon Coatings as Adhesive Interfaces on Polymer SubstratesJ. Lackner, Joanneum Research, Niklasdorf, Austria; R. Major, Polish Academy of Sci-ences, Krakow, Poland; T. Schoberl, Erich Schmid Institute of Materials Science, Loe-ben, Austria; W. Waldhauser, Joanneum Research, Niklasdorf, Austria; and B. Major, Polish Academy of Sciences, Krakow, Poland

11:10 a.m. E-5 Highly Insulating Al2O3, SiO2 and Si3N4 Films for Sensor Applications De-posited by Reactive Pulse Magnetron Sputter-ingP. Frach, H. Bartzsch, and D. Gloess, Fraun-hofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; M. Gittner, Technische Universität IFE, Dresden, Germany; E. Schultheiss, Technische Univer-sität IFE, Dresden, Germany and Fraunhofer FEP, Dresden, Germany; W. Brode, Siegert TFT GmbH, Hermsdorf, Germany; and J. Hartung, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany

11:30 a.m. E-6 Microwave Plasma-Assisted Chemical Vapor Deposition Homoepitaxial Synthesis of Single Crystalline DiamondT. Schuelke, M. Yaran, D. King, and M. Beck-er, Fraunhofer USA, East Lansing, MI; and J. Asmussen, T. Grotjohn, and D. Reinhard, Michigan State University, East Lansing, MI

Joint Session on Atmospheric Plasma TechnologiesModerator: Hana Baránková, Uppsala Uni-versity, Sweden

9:30 a.m. JAPT-1 Development of Adhe-sive-Free Lamination Technique Using a Plasma Surface Treatment at Atmospheric PressureInvited 40 min. Talk

TechnicalProgram Underline indicates the presenting author.

TheDonaldM.MattoxTutorialProgramAdvances and Drawbacks of Microwave PlasmasMonday Afternoon, May 1112:30 p.m.-1:10 p.m.

Presenter: Michel Moisan, Groupe de Physique des Plasmas, Université de Montréal, Canada and Laboratoire International de Technologies et Applications des Plasmas (LIA-LITAP)

As compared to conventional RF ca-pacitive or inductive discharges, micro-wave-sustained plasmas exhibit some specific characteristics: i) the electric field sustaining the discharge is provided by wave propagation either along dielectric materials (including the plasma itself) or within the structure of field applica-tors that radiate outwardly to penetrate dielectric discharge vessels (transparent to microwaves): there are no electrodes in contact with the discharge (increased lifetime and/or operating time of systems) and no self-biasing of the field applicators (less damage to substrates); ii) electron cyclotron resonance (ECR) allows to sustain efficiently discharges in the 0.1-10 mTorr (collisionless) pressure range; iii) impedance matching is easier, more efficient and reproducible than with RF systems. Nonetheless, microwave plasmas suffer from severe difficulties compared to other technologies (corona and dielectric barrier discharges at atmospheric pres-sure, RF discharges at reduced pressure) in the two main sectors of industrial applica-tions, namely chemistry in gaseous phase and plasma processing of surfaces. These are essentially: i) the (radial) contraction of microwave (tubular) discharges typi-cally at pressures above 10-20 Torr and, additionally, filamentation at frequencies above 1 GHz; ii) difficulty of scaling up microwave plasma sources for surface treatments. Design, performance and applications of new generations of micro-wave plasma sources are reviewed.Michel Moisan is Professor of Physics at Université de Montréal (UdeM), a leading French-speak-ing university located in Montréal, Québec. After completing a B.Sc. and M.Sc. in Physics at UdeM, he received a Doctorat d’État (D.Sc.) in Plasma Physics at Université Paris-XI (Orsay) followed by a post-doc at Institutes of the Academy of Sciences in the former USSR. His main field of interest is the design, development and modeling of microwave plasma sources. Some of these plasma sources were put to use in applications such as polymer etching, abatement of greenhouse gases, dia-mond film deposition and, more recently, plasma sterilization of medical devices. He has co-edited Microwave Discharges (with C.M. Ferreira) and Microwave Excited Plasmas (with J. Pelletier) and published, with Jacques Pelletier, Physique des Plas-mas Collisionnels: Introduction aux Décharges HF, a French textbook. He is the co-author of 28 families of patents and numerous well-cited papers.

M. Kogoma, Sophia University, Tokyo, Japan; A. Manabe, Fujimori Kogyo Co. Ltd., Yoko-hama, Japan; and K. Tanaka, Sophia Univer-sity, Tokyo, Japan

10:10 a.m. JAPT-2 A Novel Atmospheric Microplasma Source with Integrated GaN HEMT Microwave Power Oscillator R. Gesche, S. Kuehn, and H.E. Porteanu, Fer-dinand-Braun-Institut, Berlin, Germany; and R. Kovacs and J. Scherer, Aurion Anlagen-technik GmbH, Hessen, Germany

10:30 a.m. JAPT-3 Influence of Substrate to Source Distance on the Properties of Siloxane Coatings Deposited Using an Atmospheric Plasma Jet System D.P. Dowling and M. Ardhaoui, University College Dublin, Dublin, Ireland

10:50 a.m. JAPT-4 Biomedical Applications of Atmospheric Pressure PlasmaK.-D. Weltmann, Th. von Woedtke, R. Bran-denburg, and J. Ehlbeck, INP Greifswald e.V., Greifswald, Germany

11:10 a.m. JAPT-5 Chemical and Morpho-logical Study of Atmospheric Pressure Plasma Treated Fibers and Polymer FilmsInvited 40 min. Talk D.D. Pappas and A.A. Bujanda, United States Army Research Laboratory, Aberdeen Prov-ing Ground, MD; J.H. Yim, Department of Chemical and Biological Engineering, Drexel University, Philadelphia, PA; and K.E. Stawhecker, J.A. Orlicki, J.D. Demaree, R.E. Jensen, United States Army Research Labora-tory, Aberdeen Proving Ground, MD

11:50 a.m. JAPT-6 Large Area SiO2 Films Deposition by Atmospheric Pressure Plasma Enhanced Chemical Vapour Deposition (AP-PECVD): Growth Mechanisms by Surface CharacterizationP.A. Premkumar and S. Starostin, Eindhoven University of Technology, Eindhoven, The Netherlands; H. de Vries and R. Paffen, FU-JIFILM Manufacturing Europe B.V., Tilberg, The Netherlands; and M.C.M van de Sanden and M. Creatore, Eindhoven University of Technology, Eindhoven, The Netherlands

Monday Afternoon, May 11

The Donald M. Mattox Tutorial Program12:30 p.m. – 1:10 p.m. See sidebar.

“Meet the Experts” Corner1:30 p.m.-2:30 p.m.

Get the Answers to Your Vacuum Coating Problems! See page 8 for details.

SVC Exhibit Opens!3:00 p.m.-8:00 p.m.

Don’t Miss the Only Exhibit Dedicated to Vacuum Coating Technologies

Tribological and Decorative CoatingModerators: Allan Matthews, The University of Sheffield, United Kingdom and Hans-Joachim Scheibe, Fraunhofer Institute for Ma-terial and Beam Technology IWS, Germany

1:30 p.m. T-1 Novel Design Approaches to the Development of Multifunctional Nano-composite Coatings for Demanding Engine ApplicationsInvited 40 min. TalkA. Erdemir and O.L. Eryilmaz, Argonne National Laboratory, Argonne, IL; and M. Urgen, K. Kazmanli, and V. Ezirmik, Istanbul Technical University, Istanbul, Turkey

2:10 p.m. T-2 Engineered PVD Coatings for Piston Rings ApplicationJ.A. Araujo and G. Marques, MAHLE Metal Leve S.A., Sao Paulo, Brazil

2:30 p.m. T-3 Reactive Co-Evaporation of Carbon/Carbide Nanocomposites: Process, Structure and Tribological Properties E. Bergmann, University of Applied Science of Western Switzerland, Geneva, Switzerland; G. Wahli, Roth & Rau AG, Neuchâtel, Swit-zerland; G. Pannatier, Platit AG, Grenchen, Switzerland; B. Pecz and L. Toth, Muszaki Fizikai és Anyagtudományi Kutatóintézet, Bu-dapest, Hungary; and C. Mitterer, University of Leoben, Leoben, Austria

2:50 p.m. T-4 Erosion-Resistant Multilayer Coatings A. Flores Renteria, O. Schroeter, R. Mykhay-lonka, and C. Leyens, Technical University of Brandenburg at Cottbus, Cottbus, Germany

3:10–3:30 p.m. Break in the Exhibit Hall

3:30 p.m. T-5 Effect of Si Incorporation on the Mechanical and Electrochemical Proper-ties of DLC Films M. Azzi, École Polytechnique de Montréal, Montréal, Canada and McGill University, Montréal, Canada; M. Paquette, École Poly-technique de Montréal, Montréal, Canada; J.A. Szpunar, McGill University, Montréal, Canada; and J.E. Klemberg-Sapieha and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

3:50 p.m. T-6 Present Status of Carbon Based Cutting Tool Coatings for Soft Alloy Workpiece Materials40 min. TalkG.J. van der Kolk, Ionbond Netherlands, Venlo, The Netherlands; and E. Damond, Ionbond France, Chassieu, France

Vacuum Processes and Coatings for Health Care ApplicationsModerator: Dave Glocker, Isoflux Incorporated

1:30 p.m. HC-1 The Effect of Surface To-pography on the Retention of Organic Soil and MicroorganismsA. Packer, P.J. Kelly, K.A. Whitehead, J. Ver-ran, and G.T. West, Department of Biological Sciences, Manchester Metropolitan Univer-sity, Manchester, United Kingdom ÿÿÿ


1:50 p.m. HC-2 Hydrogen-Free Tetrahedral Amorphous Carbon Coatings for Biomedical ImplantsL. Haubold, M. Becker, T. Schuelke, and H.-J. Scheibe, Fraunhofer USA, East Lansing, MI; and G. Woodrough and J. Helmuth, Symme-try Medical Jet, Lansing, MI

2:10 p.m. HC-3 Sterilisation of Surgical In-struments Using Mini Electron AcceleratorsInvited 40 min. TalkF.H. Roegner and G. Gotzmann, Fraunhofer Institute for Electron Beam and Plasma Tech-nology FEP, Dresden, Germany

2:50 p.m. HC-4 Validation Concepts for a Biomedical Product P.E. Gagnon and J. Gibbs, Corning Inc., Ken-nebunk, ME

Plasma ProcessingModerator: Mariadriana Creatore, Eindhoven University of Technology, The Netherlands

1:30 p.m. P-1 Novel Control of Surface Energy for Functional Metallization by Inte-grated Diagnostics of Processing Plasma Invited 40 min. TalkJ.G. Han, N. Britun, Y.J. Kim, and Y.S. Choi, Sungkyunkwan University, Suwon, South Korea

2:10 p.m. P-2 Negative Ion Density Mea-surement by Photo-Detachment in RF and Pulsed DC Magnetron DischargesSponsored Student PresentationS.D. You, R. Dodd, P.M. Bryant, and J.W. Bradley, University of Liverpool, Liverpool, United Kingdom

2:30 p.m. P-3 Electrical Probes for Monitor-ing Electron Density, Ion Flux and Film Prop-erties in Deposition PlasmasInvited 40 min. TalkN.S.J. Braithwaite, Department of Physics and Astronomy, The Open University, Milton Keynes, United Kingdom

Large Area CoatingModerator: Michael Andreasen, NxEdge Inc.

1:50 p.m. L-11 Stay Green - Optical Thick-ness and Composition Control for Large Area CoatersW. Theiss, W. Theiss Hard- and Software, Aachen, Germany

2:10 p.m. L-12 Reactive Magnetron Sputter-ing of ZnO:Al, A Status ReportB. Szyszka, V. Sittinger, W. Dewald, A. Pflug, S. Ulrich, A. Kaiser, and W. Werner, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Poster Presentations4:30 p.m.-8:00 p.m. in the Exhibit Hall

SVC will continue to accept abstracts for the Poster Session.

Poster-1 Tribological Properties of CrAlSiN Coating with Post-Deposition Heat Treat-ment

W.Y. Ho and C.W. Chen, MingDao Universi-ty, ChangHua, Taiwan; and W.Y. Ho, National Pingtung University, Pingtung, Taiwan

Poster-2 Photocatalytic Activity of Plasma Deposited TiO2 P. Hájková, Technical University in Liberec, Liberec, Czech Republic; P. Spatenka, Tech-nical University in Liberec, Liberec, Czech Republic and University of South Bohemia, Ceske Budejovice, Czeck Republic; J. Kru-meich, University of Applied Sciences Hof, Hof, Germany; P. Exnar, A. Kolouch, Tech-nical University of Liberec, Liberec, Czech Republic; J. Matousek, Charles University in Prague, Praha, Czech Republic; and M. Horakova, Technical University in Liberec, Liberec, Czech Republic

Poster-3 Particle-in-Cell Monte Carlo Analy-sis of Inhomogeneities in Large Area Magne-tron Discharges M. Siemers, A. Pflug, and B. Szyszka, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Poster-4 The Latest Soft Electron TechnologiesG. Gotzmann, F.H. Roegner, and D. Roeder, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

Poster-5 Cr-Si-N Coating for Aerospace Ap-plicationsE. Bousser, M. Benkahoul, M. Azzi, L. Mar-tinu, and J.E. Klemberg-Sapieha, École Poly-technique de Montréal, Montréal, Canada

Poster-6 Laser-Based Sensor for Real Time Sputter Monitoring and End Point Detection in Ion Beam Etch Systems A. Yalin and L. Tao, Colorado State Univer-sity, Fort Collins, CO; and N. Yamamoto, Kyushu University, Fukuoka, Japan

Poster-7 Study on Surface Modification of Polycarbonate Polymer Plastics by Low En-ergy Ion BeamY. Yan, J. Wu, G. Zhang, Y. Wang, and P. Wen, Beijing Institute of Aeronautical Materials, Beijing, China

Poster-8 Plasma Analysis of a Novel PECVD Process for Corrosion Resistant Interior Coating of Pipelines S. Lapp and F. Placido, University of the West of Scotland, Paisley, United Kingdom

Poster-9 Study of Structure Densification in TiO2 Coatings Prepared by Magnetron Sput-tering Under Low Pressure of Oxygen Plasma DischargeJ. Domaradzki, D. Kaczmarek, and E.L. Prociow, Wroclaw University of Technology, Wroclaw, Poland; and Z.J. Radzimski, Silicon Quest International, Reno, NV

Poster-10 The Design and Development of an LPCVD Reactor for the Growth of 3C-SiC on SiStudent Scholarship PresentationM. Orthner, L. Rieth, and F. Solzbacher, Uni-versity of Utah, Salt Lake City, UT


LearnandRemember...A Vacuum Wizard’s Guide to Understanding Vacuum and Vacuum CoatingSunday Afternoon, May 101:00 p.m. – 4:00 p.m.

Your Vacuum Wizard is Don McClure, Acuity Consulting and Training

This half-day event is based on an extensive set of engaging tabletop dem-onstrations. Many of the

demonstrations use a transparent vacuum chamber, so attendees can “see” the prin-ciples of vacuum coating in action. The goals of this event are to make selected concepts related to vacuum and vacuum coating seen and remembered. This in turn provides a path to deeper under-standing. Attendees will be offered highly accessible and thought provoking demon-strations and/or descriptions of the es-sential elements and principles of vacuum, vacuum processing and vacuum coating. The presentation is suitable for both non-technical and technical attendees. The only prerequisite is curiosity about our amazing world.

This presentation provides the attendee with memorable experiences related to:

• pressure and vacuum• vacuum pumps (the many ways a vac-

uum wizard produces “good” vacuum levels)

• vacuum measurement methods (how vacuum wizards know the vacuum level in a container)

• very high temperatures (and the magic of making coatings by evaporation)

• very low temperatures (and the magic of cryopumping)

• how materials change from solid to liquid to gas and back (more vacuum coating magic)

• what the “mean free path” is (and why vacuum wizards care)

• why low pressures are needed to make pure coatings (and why the “low” pres-sures needed can be so different in different applications)

There is no charge to attend this Special Event! Everyone is welcome—conference registrants, exhibitors, tutorial attendees, students, and teachers. However, the num-ber of attendees is limited so that everyone can see the demonstrations. Register using the SVC On-line TechCon registration form. Then it is first come—first seated.

Monday Afternoon (continued)

Poster-11 Voltage Control for Reactive Sput-tering: Achieve Up to 10 Times the Typical Sputter Rate While Dramatically Reducing Input Power RequirementsD. Pelleymounter and K. Nauman, Advanced Energy Industries, Inc., Fort Collins, CO

Monday Evening, May 11

Heuréka! Post-Deadline Recent Developments Session7:30 p.m.-9:00 p.m.

Deadline is March 1, 2009 for publication of a Heuréka! abstract in the Final Program.

7:30 p.m. H-1 Actual Trends in PatentsR. Bethke, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunsch-weig, Germany; B. Rager, Fraunhofer-Gesell-schaft, Muenchen, Germany; and W. Diehl, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Tuesday Morning, May 12

Technology Forum Breakfast7:00 a.m.-8:15 a.m.

See page 11 for topics and facilitators.

Optical CoatingModerators: Stéphane Larouche, Duke Uni-versity and Ulrike Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Germany

8:30 a.m. O-1 Monte Carlo Analysis of Random Thickness Errors in Infrared Optical CoatingsD. Fuller and W. Hasan, FLIR Systems, Inc., Wilsonville, OR

8:50 a.m. O-2 Modern State of Art in De-sign and Monitoring of Optical CoatingsInvited 40 min. TalkA. Tikhonravov and M. Trubetskov, Research Computing Center, Moscow State University, Moscow, Russia

9:30 a.m. O-3 Designing Optical Coatings by Using Low-Index Equivalent Layers and Low-Index Effective Media U. Schulz and N. Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany

9:50 a.m. O-4 Broad Band Metal Dielectric FiltersD. Cushing, University of Arizona, Tucson, AZ

10:10–10:30 a.m. Break in the Exhibit Hall

Moderators: Alexander Tikhonravov, Moscow State University, Russia and Robert Sargent, JDSU

10:30 a.m. O-5 Using Different Thin-Film Design Software for Different RequirementsInvited 40 min. TalkU. Schallenberg, mso jena Mikroschichtoptik GmbH, Jena, Germany

11:10 a.m. O-6 Laser Guidance: A New Weapon Against the War on ErrorC. Zelisse, Delft Measurement Systems, Delft, The Netherlands

11:30 a.m. O-7 Computer Simulation of Monitoring of Narrow Bandpass Filters at Non-Turning PointsR. Willey, Willey Optical Consultants, Char-leviox, MI; and A. Zoeller, Leybold Optics GmbH, Alzenau, Germany

11:50 a.m. O-8 In situ Stress Measurement in Optical Coating Deposition SystemM. Fang, J. Huang, K. Yi, Z. Fan, and J. Shao, Shanghai Institute of Optics and Fine Me-chanics, Shanghai, China

Large Area CoatingModerator: Michael Andreasen, NxEdge Inc.

8:30 a.m. L-1 Energy Saving Glass SolutionsInvited 40 min. TalkR. Blacker, Guardian Industries Corporation, Carleton, MI

9:10 a.m. L-2 Enhanced Growth of Thin Silver Films via HiPIMS DepositionG.T. West and P.J. Kelly, Manchester Met-ropolitan University, Manchester, United Kingdom

9:30 a.m. L-3 Sensors for Uniform Reactive Magnetron Sputtering Deposition on Large Areas V. Bellido-Gonzales, B. Daniel, D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom; and J. Counsell, J. Counsell Ltd., West Kirby, United Kingdom

9:50 a.m. L-4 Properties of Plasma Polym-erized Thin Films Deposited from Hexameth-yldisiloxan (HMDSO) by Magnetron-PECVD Process R. Nyderle, R. Bluethner, and T. Preussner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; and D. Pavic, Bluetec GmbH & Co. KG, Tren-delburg, Germany


Moderator: Johannes Struempfel, VON AR-DENNE Anlagentechnik GmbH, Germany

10:30 a.m. L-5 Thickness Dependence of Electron Transport in Polycrystalline SnO2:F Films T. Ikeda, H. Odaka, and T. Oyama, Asahi Glass Co., Ltd., Kanagawa, Japan

10:50 a.m. L-6 Spatio-Temporal Measure-ments of Plasma Properties in an AC Mag-netron Source Using an Automated Boxcar Langmuir ProbeP. Greene and P. Brillhart, Applied Materials, Fairfield, CA; and B. VornDick and S. Shan-non, North Carolina State University, Raleigh, NC

ÿÿÿ

All Attendees, Exhibitors, Presenters, and Visitorsmust use the On-line Registration System to Register for the Conference and to make Reservations at the Hotels!To register, go to the SVC Web Site at www.svc.org. Register on-line for the TechCon and your information is auto-matically linked to the hotel reservation system where you are guided through a step-by-step reservation process and re-ceive instant confirmation.RENEW your SVC membership dues for 2009 or JOIN SVC in order to register for the TechCon at the Member rates!

Hotel ReservationsRooms have been reserved for SVC Tech-Con attendees at the Hyatt Regency Santa Clara, Hilton Santa Clara and the Biltmore Hotel & Suites from May 8 through depar-ture on May 14, 2009.You must register for the TechCon first in order to book a room in the SVC room block at one of these hotels.

• Hyatt Regency Santa Clara (attached to the Convention Center): $199 single/double plus taxes

• Hilton Santa Clara (across the street): $184 plus taxes

• Biltmore Hotel & Suites: $154 plus taxes (includes shuttle to the Conven-tion Center, breakfast, and free wireless internet)

The SVC conference rate is not guaranteed after April 6, 2009. Space is limited at these hotels. Click on the “Book Hotel Reservations” link on your TechCon Registration Acknowledge-ment to make your hotel reservations. You will need to know your arrival and departure date and have a credit card available to reserve your room. Telephone reservations will not be accepted. Cancel-lations (and modifications) can be made on-line. There will be no cancellation fee for cancellations made on or before April 15, 2009.


“Meet the Experts” CornerThis year in our “Meet the Experts” Cor-ner program we have a variety of experts available to answer questions on every as-pect of vacuum coating. There will be two experts available from 1:30 to 2:30 p.m. on Monday, Tuesday and Wednesday with the general specialist areas as follows:

Monday–Don McClure and Rick Spencer will be available to answer questions on web substrates and coatings, as well as sputtering in general, including reactive sputtering and choice of power supply.

Tuesday–Plasmas can be used in so many ways at low pressure up to atmospheric pressure and with low to very high density. With this in mind we have brought together two experts on different aspects of plasma use: Arutiun Ehiasarian who is expert on HIPIMS and Mariadriana Creatore who is an expert on all aspects of plasma process-ing.

Wednesday–There are many similarities between optical and tribological coatings such as the need to control coating stoichi-ometry, density and stress levels. With this in mind, our final team combines the ex-pertise of Frank Placido in optical coatings with that of Roel Tietema in tribological coatings.

Joint Session on Atmospheric Plasma TechnologyModerator: Masuhiro Kogoma, Sophia Uni-versity, Japan

8:30 a.m. JAPT-7 Abrasion Protection of Plastics with Atmospheric Pressure Plasma CoatingsC. Weikart and H. Lakrout, The Dow Chemi-cal Company, Midland, MI; J. Warakomski, (retired), Midland, MI; and M. Larive, M. Semer, A. Gilman, T. Rhoton, and T. Fisk, The Dow Chemical Company, Midland, MI

8:50 a.m. JAPT-8 A Systematic Study of the Adhesive Properties of a Plasma Polymerised Primer Bonding Siloxane Elastomer to Stain-less SteelSponsored Student PresentationC.E. Nwankire and D.P. Dowling, University College Dublin, Dublin, Ireland

9:10 a.m. JAPT-9 Equipment for Large Area Plasma Processing at Atmospheric PressureI. Dani, G. Maeder, J. Roch, P. Grabau, B. Dresler, D. Linaschke, S. Tschoecke, S. Kaskel, and V. Hopfe, Fraunhofer Institute for Mate-rial and Beam Technology IWS, Dresden, Germany

9:30 a.m. JAPT-10 Current and Future Prospects of Non-Thermal Plasmas Exhaust-Air Pollution ControlR. Brandenburg, R. Basner, and K.-D. Welt-mann, INP Greifswald e.V., Greifswald, Ger-many

9:50 a.m. JAPT-11 Environmental Applica-tions of the Atmospheric Pressure Plasma SourcesH. Baránková and L. Bárdos, Uppsala Univer-sity, Uppsala, Sweden


10:30 a.m. JAPT-12 Atmospheric Pressure Plasma Deposition of Transparent Conduc-tors - Tailoring Precursor Chemistries K. Johnson, S. Jha, R. Sailer, and D. Schulz, North Dakota State University, Fargo, ND

SVC Exhibit Opens!10:00 a.m.- 5:00 p.m.

Vendor Innovators ShowcaseThe Vendor Innovators Showcase presenta-tions will begin in the Exhibit Hall starting at 10:30 a.m. Presentation times will be an-nounced in the Final Program.

Moderator: Frank Zimone, Reactive Nano-Technologies

I-1 Benefits of Aluminum for the Construc-tion of Vacuum Chambers for Use in Large Area Coating and Deposition SystemsK. Coates, J. Bothell, R. Bothell, and E. Jones, Atlas Technologies, Port Townsend, WA

I-2 Investigation of Creep Behaviour with a New Innovative Nanoindentation TesterN. Conte and R. Consiglio, CSM Industries SA, Peseux, Switzerland; and N. Randall, CSM Instruments Inc., Needham, MA

I-3 Recent Innovations in In Situ Optical MonitoringS. Hicks, Intellevation Ltd., Glasgow, United Kingdom

I-4 Optimized Magnetic Designs for Rotat-able Magnetron TechnologyV. Bellido-Gonzales, M. Holik, and D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom

I-5 Advanced Sputter Magnetrons and Linear Ion SourcesJ. Madocks, General Plasma, Inc., Tucson, AZ

I-6 Surface Modification by 3D Nano CoatingsM. Rosen, Cotec GmbH, Karlstein, Germany

I-7 Industrial HiPIMS-Bias Power SuppliesG. Eichenhofer, Solvix SA, Villaz-St. Pierre, Switzerland

Live Product DemonstrationsModerator: Frank Zimone, Reactive Nano-Technologies

Presentation times will be announced in the Final Program.

LP-1 A Demonstration of Theory and Meth-ods for Cost-Effective NanoindentationN. Randall, CSM Instruments, Needham, MA

Tuesday Afternoon, May 12


Get the answers to your vacuum coating problems! See sidebar for details.

Tribological and Decorative CoatingModerators: Jolanta Klemberg-Sapieha, École Polytechnique de Montréal, Canada and Kent Coulter, Southwest Research Institute

1:30 p.m. T-7 The Morphology of Sn Thin Films on Plastic Substrates Deposited with Sputtering and Thermal EvaporationJ.H. Yang, J.I. Jeong, Y.H. Park, and K.H. Lee, Research Institute of Industrial Science and Technology, Pohang, Korea

1:50 p.m. T-8 Plasma-Based Deposition of Dielectric/Metal Nanocomposite Films Ex-hibiting Surface Plasmon Resonance Effects for the Production of Hard and Uniform Co-loured CoatingsH.T. Beyene, Materials Innovation Institute, Delft, The Netherlands; and M. Creatore and M.C.M van de Sanden, Eindhoven University of Technology, Eindhoven, The Netherlands

2:10 p.m. T-9 New Cost-Effective Titanium Based Protective and Decorative Coatings by Ion Plating Plasma Assisted IPPA


11:10 a.m. L-7 Design Tools and Simulations for Plasma Processing in Large Area CoatingInvited 40 min. TalkA. Pflug, M. Siemers, and B. Szyszka, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

11:50 a.m. L-8 Higher Performing Cylindri-cal Target Materials and Rotating Sputter Magnetrons Meeting the Upcoming Chal-lenges for PV ApplicationsA. Blondeel, N. Carvalho, and W. De Boss-cher, Bakaert Advanced Coatings, Deinze, Belgium

12:10 p.m. L-9 Stress-Free Bonding of Large Linear Sputtering Targets for LCD DisplaysA. Duckham, H.B. Parker, T.J. Acchione, M.A. Curran, and J.E. Newson, Reactive Nano-Technologies, Inc., Hunt Valley, MD

Tuesday Morning (continued)

C. Misiano, Romana Film Sottili, Rome, Italy; and P. Matarazzo and M. Pezzilli, Romana Film Sottili, Anzio, Italy

2:30 p.m. T-10 Broadening the Application Window of Ternary Zr Compounds by Using HIPIMSA. Santana, Ionbond, Olten, Switzerland; A. Hieke, Ionbond Netherlands b.v., Venlo, The Netherlands; R. Fontana, Ionbond North East, Rockaway, NJ; and G.J. van der Kolk, Ionbond Netherlands b.v., Venlo, The Neth-erlands

2:50 p.m. T-11 Decorative Coatings Ob-tained by Combination of PVD, Galvanic and Powder Coatings J. Barriga, Fundación Tekniker, Eibar, Spain; C. Schrauwen, TNO Science and Industry, Eindhoven, The Netherlands; D. Gawne, London South Bank University, London, United Kingdom; C. Zubizarreta, Fundación Tekniker, Eibar, Spain; and A. Hovestad, TNO Science and Industry, Eindhoven, The Neth-erlands

Symposium on Cleantech Energy Conversion, Storage and Related Processes

LargeAreaCoatingModerators: Michael Andreasen, NxEdge Inc. and Bernd Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany

1:30 p.m. L-10 North America - The Next Solar Growth MarketInvited 40 min. TalkE. Wegener and P. Thompson, AGC Flat Glass North America, Alpharetta, GA

2:10 p.m. CT-1 Silicon Oxide Barrier Layers on Flexible Metal Substrates for Thin Film Photovoltaics Produced by High Rate EB-De-position for Large Area Coatings F. Haendel, H. Morgner, and C. Metzner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

2:30 p.m. CT-2 PECVD Thin Films for Anti-Reflection and Passivation of Crystalline Silicon Solar CellsM. George, H. Chandra, and J.E. Madocks, General Plasma, Inc., Tucson, AZ

2:50 p.m. CT-3 Stochastic Nanostructures on Polymers for Solar ApplicationsN. Kaiser, K. Fuechsel, U. Blumrueder, P. Munzert, and U. Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany

3:10 p.m. CT-4 Web and Inline System Op-timization Utilizing Thermal Sources for Thin Film Solar J. Patrin and R. Brasnahan, Veeco Instru-ments, St. Paul, MN; and D.L. Miller, Consul-tant, Valley Center, CA

SVC Exhibit Beer Blast!3:30 p.m.-5:00 p.m.

Wednesday Morning, May 13


ThinFilmPhotovoltaicsModerators: Wolfgang Diel and Volker Sit-tinger, Fraunhofer Institute for Surface Engi-neering and Thin Films IST, Germany

8:30 a.m. CT-5 Basic Economics of Photo-voltaics for Vacuum CoatersInvited 40 min. TalkG. Smestad, Solideas, Santa Clara, CA

9:10 a.m. CT-6 A Turnkey Approach for CIGS Thin Film Photovoltaic ProductionInvited 40 min. TalkD. Schmid, I. Koetschau, A. Kampmann, and T. Hahn, centrotherm photovoltaics AG, Blaubeuren, Germany

9:50 a.m. CT-7 TiO2-Ge Nanocomposites for Solar Cells ApplicationsS.I. Shah and B. Ali, University of Delaware, Newark, DE; and M. Abbas, COMSATS Insti-tute of Technology, Islamabad, Pakistan

10:10–10:30 a.m. Break

10:30 a.m. CT-8 Perspectives and Challenges of Thin-Film Solar Cell TechnologiesInvited 40 min. TalkB. Rech, Helmholtz-Zentrum Berlin, Berlin, Germany

11:10 a.m. CT-9 A Novel Approach for Thin-Film Crystalline Silicon on GlassK. Sharma, A. Illiberi, A. Branca, M. Cre-atore, and M.C.M. van de Sanden, Eindhoven University of Technology, Eindhoven, The Netherlands

11:30 a.m. CT-10 Progressive DC Power for TCO DepositionD. Ochs, HUETTINGER Elektronik GmbH + Co. KG, Freiburg, Germany; and P. Rozanski and P. Ozimek, HUETTINGER Electronic Sp. z O.O., Zielonka, Poland

Optical CoatingModerators: Uwe Schallenberg, mso jena Mikroschichtopik GmbH, Germany and Angus Macleod, Thin Film Center, Inc.

8:30 a.m. O-9 Recent Advances in the De-sign of Optical Filters with Arbitrary Inter-mediate Refractive Indices Invited 40 min. TalkS. Larouche, Pratt School of Engineering, Duke University, Durham, NC

9:10 a.m. O-10 Antireflection Coating Design by Fourier Frequency Filtering with Frequency Range Adjustments P. Verly, National Research Council of Cana-da, Ottawa, Canada

9:30 a.m. O-11 Ultralow-Refractive-Index Optical Coatings from IR to DUV J. Wang, Corning Tropel Corporation, Fair-port, NY

ÿÿÿ

TheDonaldM.MattoxTutorialProgramCoatings for Automotive ApplicationsWednesday Afternoon, May 1312:20 p.m.-1:00 p.m.

Presenter: Erich Bergmann, École D’ingeniéurs de Ge-nève, University of Applied Science of Western Switzer-land, Geneva, Switzerland

Wear protecting PVD coatings were first introduced on a large scale to automotive applications in the early eighties; AlSn20Co nanocomposite coatings on conrod bearings were the materials which enabled the introduction of the first turbocharged diesel engines. However, the big wave started with the introduction of the WC/C coatings for the new hydraulic cam followers of the com-mon rail system by Balzers/Bosch/INA. From then on, the application of PVD coatings spread quickly to a wide range of components. PVD coatings for automo-tive components have become the fastest growing sector of PVD wear protection coatings and the main enabler of innova-tions in cars. Today PVD coatings can be found in almost every system of a car. This tutorial will present the requirements and wear mechanisms of the most impor-tant subsystems of cars and compare them with the PVD coatings currently used. A special focus will be given to the recent and current developments for engine components.Erich Bergmann received his Ph.D. in Solid State Physics from the University of Graz, Austria, before joining the international center of the Battelle Memorial Institute in Geneva, where his research focused on surface science applications in electro-chemistry and tribology. He built the first solid-state fuel cell with a lifetime of 1000 hours in 1978. He then joined the Swatch group where he developed self-lubricating coatings for watch movements and decorative coatings for cases and bracelets. He built and managed the first deco-coating center outside Japan. In 1983 he presented the first black-coated watches at the Basel Fair : The Ferrari Collection of Cartier. He joined Balzers as Head of Development for wear-resistant coatings in 1984 and remained in that position for 10 years, intro-ducing new tool coatings, arc coating technology, the first large scale wear part coatings: Balinit C (WC/C) and the first industrial scale diamond coat-ings. Since 1984, he has been Professor of Material Science at the Geneva School of Engineering and an industrial consultant. He directs the Master Pro-gram on Nano- and Microtechnology at the Swiss Universities of Applied Science. He holds some 40 patents and is co-author of the Surfaces volume of the French Treatise of Material Science, contribu-tor to several other books, author viz. co-author of some 80 papers.


9:50 a.m. O-12 Multifunctional Optical Coatings on Polymers Deposited by Pulse Magnetron Sputtering and Magnetron En-hanced PECVD P. Frach, H. Bartzsch, K. Taeschner, J. Liebig, and E. Schultheiss, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

10:10–10:30 a.m. Break

Moderators: Bryant Hichwa, Sonoma State University and Ludvik Martinu, École Poly-technique de Montréal, Canada

10:30 a.m. O-13 On the Influence of Surface and Interface Roughness on the Optical Per-formance of Silver Based Stacks Deposited onto Plastic FilmR. Thielsch, R. Kleinhempel, T. Boehme, and A. Wahl, Southwall Europe GmbH, Gross-roehrsdorf, Germany

10:50 a.m. O-14 Mo- and In-Doped VO2 Thermochromic Coatings Grown by Reactive DC Magnetron SputteringSponsored Student PresentationC. Batista, V. Teixeira, and R.M. Ribeiro, Department of Physics, University of Minho, Braga, Portugal

11:10 a.m. O-15 Optical Properties of ITO Thin Films Produced by Plasma Ion-Assisted Evaporation and Pulsed DC SputteringK. Fuechsel, U. Schulz, N. Kaiser, and A. Tu-ennermann, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany

11:30 a.m. O-16 Low Temperature Deposi-tion of Indium-Tin Oxide Films Using Mag-netron SputteringJ.I. Jeong and J.H Yang, Research Institute of Industrial Science and Technology, Pohang, Korea

Tribological and Decorative CoatingModerators: Michael Drory, Timken Technol-ogy Center and Klaus Bewilogua, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany

8:30 a.m. T-12 Friction Reduction of Mod-ern Combustion Engines Using New Tribo-logical CoatingsInvited 40 min. TalkT. Hosenfeldt and Y. Musayev, Schaeffler KG, Herzogenaurach, Germany

9:10 a.m. T-13 DLC Base Coating on Plas-tics as Support for Scratch Resistant Decora-tive FinishesP. Peeters, I. Kolev, J. Landsbergen, R. Tietema, and T. Krug, Hauzer Techno Coat-ing BV, Venlo, The Netherlands

9:30 a.m. T-14 Advanced Magnetron Sput-ter Technique for Deposition of Superhard a-C:H Coatings K. Bewilogua, M. Keunecke, H. Thomsen, and R. Wittorf, Fraunhofer Institute for Sur-face Engineering and Thin Films IST, Braun-schweig, Germany; Y. Ivanov, SVS Vacuum Coating Technologies GmbH & Co. KG, Karl-stadt, Germany; and T. Zufrass, Systec GmbH & Co. KG, Karlstadt, Germany

9:50 a.m. T-15 Influence of Surface Rough-ness on the Tribological Performance of Su-perhard Amorphous Carbon Films H.-J. Scheibe, A. Leson, and V. Weihnacht, Fraunhofer Institute for Material and Beam Technology IWS, Dresden, Germany

10:10–10:30 a.m. Break

10:30 a.m. T-16 How Substrate Constraints Affect the Performance of Thin Film Coatings Under Dynamic Impact LoadingInvited 40 min. TalkL.V. Davies, Caterpillar, Inc., Peoria, IL

11:10 a.m. T-17 Erosion, Corrosion and Wear Resistance and Microstructure of Dia-mond-Like Carbon (DLC) Coatings Prepared Using a Mesh MethodR. Wei, M. Jakab, V. Poenitzsch, and K. Coulter, Southwest Research Institute, San Antonio, TX

11:30 a.m. T-18 Adhesion of ZrCN Decora-tive PVD Coatings on Nickel Electroplated Substrates: Effect of StressesC. Zubizarreta, J.Goikoetxea, J. Barriga, U. Ruiz-Gopegui, and B. Coto, Fundación Tekniker, Eibar, Spain

11:50 a.m. T-19 ALD-Deposited Nanome-ter Scale Metal Oxide Films as Adhesion Promoters for Sputtered Metal and Ceramic Coatings on PMMA T. Kaariainen and D.C. Cameron, Lappeen-ranta University of Technology, Mikkeli, Finland

Plasma ProcessingModerator: James Bradley, University of Liv-erpool, United Kingdom

8:30 a.m. P-4 Plasma-Based Approach to Controlling the Oxygen Concentration in Graphene OxideS.G. Walton, E.H. Lock, and M. Baraket, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC; P.E. Sheehan and Z. Wei, Chemistry Division, U.S. Naval Research Laboratory, Washington, DC; and J.T Robinson and E.S. Snow, Electronics Division, U.S. Naval Research Laboratories, Washington, DC

8:50 a.m. P-5 Modeling the Plasma Growth of Carbon Nanostructured Materials Invited 40 min. TalkE. Neyts, M. Eckert, A. Maeyens, and A. Bogaerts, University of Antwerp, Antwerp, Belgium

SVC Brings Outstanding Students to the 2009 TechConThe SVC Student Sponsorship Committee is pleased to sponsor six talented students who will present their work in the oral technical sessions in Santa Clara.Shao Dong YouUniversity of Liverpool, Liverpool, United KingdomShao Dong You will present the paper entitled, “Negative Ion Density Measure-ment by Photo-Detachment in RF and Pulsed DC Magnetron Discharges” (P-2) on Monday, May 11 at 2:10 p.m.Charles NwankireUniversity College Dublin, Dublin, IrelandCharles Nwankire will present the paper entitled, “A Systematic Study of the Adhe-sive Properties of a Plasma Polymerised Primer Bonding Siloxane Elastomer to Stainless Steel” (JAPT-8) on Tuesday, May 12 at 8:50 a.m.Carlos BatistaUniversity of Minho, Braga, PortugalCarlos Batista will present the paper entitled, “Mo- and In-Doped VO2 Ther-mochromic Coatings Grown by Reactive DC Magnetron Sputtering” (O-14) on Wednesday, May 13 at 10:50 a.m.Matej HalaÉcole Polytechnique de Montréal, Montréal, CanadaMatej Hala will present the paper entitled, “Analysis of Reactive HIPIMS Discharge Based on Time- and Space-Resolved Opti-cal Emission Spectroscopy” (HP-8) on Wednesday, May 13 at 1:30 p.m.Ante HecimovicSheffield Hallam University, Sheffield, United KingdomAnte Hecimovic will present the paper entitled, “Spatial and Temporal Evolution of Ion Energies in HIPIMS Plasma Dis-charge” (HP-10) on Wednesday, May 13 at 2:10 p.m.Meghan SchulzUniversity of Delaware, Newark, DEMeghan Schulz will present the paper entitled, “Visible Light-Active C-Doped TiO2 Thin Films for Solar Hydrogen Gen-eration” (CT-14) on Wednesday, May 13 at 4:10 p.m.

10 Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

Wednesday Morning (continued)

9:30 a.m. P-6 Film Microstructure Char-acterization of Plasma-Deposited SiO2-Like Films M. Creatore, N.M. Terlinden, G. Aresta, and M.C.M van de Sanden, Eindhoven University of Technology, Eindhoven, The Netherlands

9:50 a.m. P-7 Plasma Treatment of Micro-powder - From Laboratory Experiments to Production PlantP. Spatenka, Technical University in Liberec, Liberec, Czech Republic and University of South Bohemia, Ceske Budejovice, Czeck Republic; J. Hladík, Department of Mate-rial Science, Technical University of Liberec, Liberec, Czech Republic; and M. Peciar, Institute of Process and Fluid Engineering, Slovak University of Technology in Bratislava, Bratislava, Slovakia

10:10–10:30 a.m. Break

Moderator: Scott Walton, U.S. Naval Research Laboratory

10:30 a.m. P-8 Detecting and Preventing In-stabilities in Plasma ProcessesD.C. Carter and V.L. Brouk, Advanced Energy Industries, Inc., Fort Collins, CO

10:50 a.m. P-9 Pulsed Heating for Plasma Assisted Processes, Principles and Applica-tionE. Bergmann and A. Houbbi, University of Applied Science of Western Switzerland, Ge-neva, Switzerland; and B. Pecz and L. Toth, Muszaki Fizikai és Anyagtudományi Ku-tatóintézet, Budapest, Hungary

11:10 a.m. P-10 Recent Advances in APP-Based Food and Non-Food Decontamination/SterilizationJ. Engemann, JE PlasmaConsult GmbH, Wuppertal, Germany

11:30 a.m. P-11 Plasma Enhanced PVD Coatings for 120mm and 155mm Barrel Ap-plicationsS.L. Lee, U.S. Army ARDEC-Benét Labo-ratories, Watervliet, NY; R. Wei, Southwest Research Institute, San Antonio, TX; M. To-daro, U.S. Army ARDEC-Benét Laboratories, Watervliet, NY; E. Langa, Southwest Research Institute, San Antonio, TX; and S. Smith, U.S. Army ARDEC-Benét Laboratories, Waterv-liet, NY

Wednesday Afternoon, May 13

The Donald M. Mattox Tutorial Program12:20 p.m.–1:00 p.m.

See sidebar on page 9.


Get the answers to your vacuum coating problems! See page 8 for details.


VentureForum1:30 p.m.-2:30 p.m.Moderators: Carl Lampert, Star Science and Michael Andreasen, NxEdge Inc.

SmartMaterialsModerators: Claes Granqvist, Uppsala Uni-versity, Sweden and Carl Lampert, Star Science

2:30 p.m. CT-11 Emissivity Modulating Electrochromic DeviceInvited 40 min. TalkH. Demiryont, Eclipse Energy Systems, Inc., St. Petersburg, FL

3:10–3:30 p.m. Break

3:30 p.m. CT-12 New Thermochromic Coatings for Energy Efficient WindowsC.G. Granqvist, N.R. Mlyuka, and G.A. Nik-lasson, Ångström Laboratory, Uppsala Uni-versity, Uppsala, Sweden

3:50 p.m. CT-13 Boron-Doped Polycrystal-line Diamond Electrodes for Electrochemical ApplicationsM. Becker and T. Schuelke, Fraunhofer USA, East Lansing, MI; G. Swain, Department of Chemistry, Michigan State University, East Lansing, MI; and J. Asmussen, Department of Electrical and Computer Engineering, Michi-gan State University, East Lansing, MI

4:10 p.m. CT-14 Visible Light-Active C-Doped TiO2 Thin Films for Solar Hydrogen GenerationSponsored Student PresentationM. Schulz, H.Y. Lin, M. Day, and S.I. Shah, University of Delaware, Newark, DE

4:30 p.m. CT-15 The Properties of Metal Doped TiOx Thin Films Deposited by PVD MethodM. Horakova, Technical University in Li-berec, Liberec, Czech Republic; N. Martin and E. Aubry, Institut FEMTO-ST, Besancon, France; P. Spatenka, Technical University in Liberec, Liberec, Czech Republic and Uni-versity of South Bohemia, Ceske Budejovice, Czeck Republic; and P. Hájková, Technical University in Liberec, Liberec, Czech Republic

Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS)Moderator: Arutiun Ehiasarian, Sheffield Hallam University, United Kingdom

1:30 p.m. HP-8 Analysis of Reactive HIP-IMS Discharge Based on Time- and Space-Resolved Optical Emission SpectroscopySponsored Student PresentationM. Hala, N. Viau, O. Zabeida, J. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

ÿÿÿ

SVC Foundation Sponsors the Fourth Annual 5K Fun Run and WalkGet up a little earlier and join friends and colleagues for the SVC Fourth Annual Fun Run and Walk in Santa Clara. No matter what your ability, this event is always a great experience for all runners and walk-ers who participate.

Want to try it this year? The Fourth Annual 5K Fun Run and Walk will be on Tuesday, May 12, 2009 at 6:00 a.m. Participating in this event will not only benefit your own health, but also the SVC Foundation, which awards scholarships to students working in the field of vacuum coating technology.

The Foundation is also looking for Spon-sors who would like to have their com-pany’s name and logo on the back of the T-Shirt given to every participant in the event. Please contact Wolfgang Decker at [email protected] for further infor-mation on sponsoring this popular event.

The registration fee of $25 will include a T-shirt. Register for the 5K Run when you register for the TechCon using the SVC On-line Registration system on the SVC Web Site at www.svc.org.

Technology Forum Breakfast Topics and SpeakersMonday, May 117:00 a.m. – 8:15 a.m.

• ALD and Plasma Assisted ALD (W.M.M. Kessels)

• Coatings for Photovoltaics (W. Diehl)• High-Power Impulse Magnetron

Sputtering Systems (HIPIMS) (A. Ehiasarian)

• N- and P-type Transparent Conductive Coatings (C. Bright)

• Optical Coating Design (A. Macleod)• Process Modeling (B. Szyszka)• Tribological Coatings (W. Sproul &

A. Matthews)

Tuesday, May 127:00 a.m. – 8:15 a.m.

• Atmospheric Plasma Technologies (H. Báránková, L. Bárdos)

• Cleantech Energy Conversion and Storage (C. Lampert, R. Shimshock)

• Diamond-Like Carbon (DLC) Coatings (K. Bewilogua, G.J. van der Kolk, T. Schuelke)

• Fabrication & Performance Optical Coatings (L. Martinu, B. Hichwa)

• Gas/Moisture Permeation Barrier Layers (M. Creatore)

• Magnetron Sputtering (D. Glocker)• Plasma Processing and Biomaterials

(P. Gagnon)

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org 11

1:50 p.m. HP-9 A Langmuir Probe Study of the Plasma Parameters in the HiPIMS Dis-chargeJ.T. Gudmundsson, University of Iceland, Reykjavik, Iceland; and P. Larsson, D. Lundin, and U. Helmersson, Linkoping University, Linkoping, Sweden

2:10 p.m. HP-10 Spatial and Temporal Evolution of Ion Energies in HIPIMS Plasma DischargeSponsored Student PresentationA. Hecimovic and A.P. Ehiasarian, Sheffield Hallam University, Sheffield, United Kingdom

2:30 p.m. HP-11 The Temporal and Spatial Evolution of Ion Energies in HIPIMS Dis-chargesJ.W. Bradley and A. Mishra, University of Liverpool, Liverpool, United Kingdom; and P. Kelly, Manchester Metropolitan University, Manchester, United Kingdom

2:50 p.m. HP-12 Arbitrary Voltage Pulse Shape Plasma Generator with RF Capabilities for Material Processing R. Chistyakov and B. Abraham, Zond Inc./Zpulser LLC, Mansfield, MA

3:10–3:30 p.m. Break

3:30 p.m. HP-13 Reactive Sputtering Using HiPIMSM. Aiempanakit and E. Wallin, Linkoping University, Linkoping, Sweden; W. Moller, Forschungszentrum Dresden-Rossendorf, Dresden, Germany; and U. Helmersson, Linkoping University, Linkoping, Sweden

3:50 p.m. HP-14 Progress in Process Con-trol of High Rate HiPIMS Processes for Opti-cal Thin Films M. Vergoehl, O. Werner, and S. Bruns, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

4:10 p.m. HP-15 Heat Treatable TCO Film for Position 1 Based on HIPIMSV. Sittinger, F. Horstmann, W. Boentoro, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

4:30 p.m. HP-16 Modulated Pulse Power Deposition of ITO, Silicon and Silver Coat-ingsR. Chistyakov and B. Abraham, Zond Inc./Zpulser LLC, Mansfield, MA; W.D. Sproul, Reactive Sputtering, Inc., San Marcos, CA; and J.J. Moore and J. Lin, Colorado School of Mines, Golden, CO

4:50 p.m. HP-17 HIPIMS Power Supply Requirements, A Guide to Selecting a SupplyD. Ochs, Huettinger Elektronik GmbH + Co., Freiburg, Germany; R. Spencer, Alacritas Consultancy Ltd., Markfield, United King-dom; and P. Ozimek, Huettinger Electronic Sp. Z.O.o., Warsaw, Poland

Vacuum Web CoatingModerator: Dick Swisher, Swisher and Associates

1:30 p.m. W-8 Roll-to-Roll Deposition for OLED Lighting Devices 40 min. TalkC. May, S. Mogck, and J. Amelung, Fraun-hofer IPMS, Dresden, Germany

2:10 p.m. W-9 Roll-to-Roll Fabrication of Flexible Active Matrix Display Backplanes and Integrated Circuits Based on a ZnO SemiconductorInvited 40 min. TalkD.J. McClure, 3M Corporate Research, St. Paul, MN

2:50 p.m. W-10 Pentacene Deposition for Vacuum Web Coated Organic TransistorsG.A.W. Abbas and H.E. Assender, University of Oxford, Oxford, United Kingdom

3:10–3:30 p.m. Break

3:30 p.m. W-11 Sputtering Synthesis of An-timicrobial Materials and Associated Process Optimization Approaches to Remain Com-petitive in Global MarketsInvited 40 min. TalkD. Field, NUCRYST Pharmaceuticals, Fort Saskatchewan, Canada

4:10 p.m. W-12 In-Register In-Vacuum Pat-tern Printing; From Wish to RealityN. Copeland and L. Harland, General Vacu-um Equipment, Heywood, United Kingdom

4:30 p.m. W-13 Impact of Metallizing Process Parameters on Metal Deposition, Optimum Film Properties and Converting PerformanceE. Mount, EMMOUNT Technologies, LLC, Canandaigua, NY

4:50 p.m. W-14 Multi-Layer, Low Emissiv-ity MaterialsA. Yializis and S. Yializis, Sigma Technologies International, LLC, Tucson, AZ

TBD WFT-1 Regression Analysis for the Determination of Optical Density J. McShane and A. Jones, Avery Dennison, Schererville, INThis is a Guaranteed Vacuum Web Coating Flexible Time (WFT) presentation; it will be presented in place of a cancelled paper earlier in this session if such situ-ation arises.

Process Modeling and ControlModerators: Dan Carter, Advanced Energy Industries and Colin Quinn, Kaufman and Robinson, Inc.

1:30 p.m. A-1 Fundamental Understanding of Pulsed PECVD Through Diagnostics and Modeling Invited 40 min. TalkC.A. Wolden, Colorado School of Mines, Golden, CO

2:10 p.m. A-2 Optimizing Sputter Processes via 3D Magnetic and Plasma Simulations D. Monaghan, M. Holik, and V. Bellido-Gon-zales, Gencoa Ltd., Liverpool, United King-dom; and J. Bradley, Liverpool University, Liverpool, United Kingdom

Networking Events Abound at the 2009 TechCon in Santa ClaraThe SVC TechCon is known for providing many opportunities for attendees to meet and interact with each other.

Network at Social Functions(included in the TechCon registration fee!)• Welcome Reception for TechCon regis-

trants and exhibitors• Exhibit Hall Reception, Lunch and Beer

Blast • Technology Forum Breakfasts

Networking Event at The Tech Museum of Innovation in San Jose

Tuesday Evening, May 12, 20096:00 p.m. – 10:00 p.m.Cost per person: $62

This unique setting reflects the innovative, creative spirit of the Silicon Valley and makes the perfect backdrop for this SVC Networking Event. This evening event will feature:

• Catered Buffet Dinner• California Wine Tasting• Light Entertainment• Transportation to and from the Event

The SVC has reserved the lower level of this amazing museum just for this special event. Guests will be free to sip wine while exploring the exhibits and mingling with friends, colleagues, and customers in this quietly elegant venue.Space is limited and it is recommended that tickets be purchased when registering on-line for the TechCon.

Technology Forum Breakfast Table TopicsFacilitator-led round-table discussions provide an opportunity for informal dis-cussion and interaction on specific topics.See sidebar on page 11.

“Meet the Experts” CornerThe popular “Meet the Experts” Corner will once again provide an informal set-ting for conference registrants to obtain answers to their vacuum coating prob-lems. A team of experts will be available to answer questions relating to general thin film deposition issues. See sidebar on page 8.

1� Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

Wednesday Afternoon (continued)

2:30 p.m. A-3 Simulation Analysis of Plasma Discharge Anomalies in PVD and PECVD ProcessesM. Siemers, A. Pflug, and B. Szyszka, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

2:50 p.m. A-4 Through-Planet Intermittent Optical MonitorS. Smith and D. Smith, Plymouth Grating, Plymouth, MA; and P. Glenn, Bauer Associ-ates, Natick, MA

3:10–3:30 p.m. Break

3:30 p.m. A-5 Performance Comparison of XY and Programmable Sweep Controllers for E-beam Deposited Optical Coatings: Capabil-ity Limitations and Optimization Techniques D. Radgowski and G. Reimann, Cyber Mate-rials LLC, Boston, MA; and E. Speyerer and M. Gevelber, Boston University, Boston, MA

3:50 p.m. A-6 Differential Sputter Yield Measurements of Single- and Multi-Element Targets Due to Ion Beam Bombardment A. Yalin, B. Rubin, J. Topper, and C. Farnell, Colorado State University, Fort Collins, CO

Thursday Morning, May 14


PhotovoltaicsModerators: Barry Thompson, University of Southern California and Jens Hauch, Konarka Technologies GmbH, Germany8:30 a.m. CT-16 An Update on the Center for Advanced Molecular PhotovoltaicsInvited 40 min. TalkM. McGehee, Department of Materials Sci-ence and Engineering, Stanford University, Stanford, CA9:10 a.m. CT-17 New Materials for Organic Photovoltaic Devices M.E. Thompson, M.D. Perez, K. Mutolo, and C. Schlenker, Department of Chemistry, Uni-versity of Southern California, Los Angeles, CA9:30 a.m. CT-18 Advanced Processing of New Materials for Extended Operational Life-time of Polymer Solar CellsS. Gevorgyan and F. Krebs, Risø National Laboratory for Sustainable Energy, Technical University of Denmark, Roskilde, Denmark9:50 a.m. CT-19 Stability Investigations of Organic Photovoltaic CellsJ.A. Hauch, A. Seemann, F.R. Kogler, and P. Schilinsky, Konarka Technologies GmbH, Nuremberg, GermanyBreak 10:10–10:30 a.m.10:30 a.m. CT-20 Modification of Anomor-phology in Polymer: Fullerene Blends-Route Towards High Efficiency Polymer Solar CellsInvited 40 min. Talk

Y. Yang, Department of Materials Science and Engineering, University of California Los An-geles, Los Angeles, CA; G. Li and V. Shrotriya, Solarmer Energy Inc., El Monte, CA; and Y. Yao, H.Y. Chen, and S. Sista, Department of Materials Science and Engineering, Universi-ty of California Los Angeles, Los Angeles, CA11:10 a.m. CT-21 Supramolecular Approach-es for Polymer-Based Solar CellsB.C. Thompson, University of Southern Cali-fornia, Los Angeles, CA11:30 a.m. CT-22 Alternative Hole Transport Layers for Organic PhotovoltaicsD.C. Olson, J.J. Berry, N.E. Widjonarko, M.S. White, M.O. Reese, and D.S. Ginley, National Renewable Energy Laboratory, Golden, CO11:50 a.m. CT-23 Large Scale Demonstrations of Polymer Solar Cells as a Tool for Innovation, Cost Analysis and Market Development T. Nielsen and F. Krebs, Risø National Labo-ratory for Sustainable Energy, Technical Uni-versity of Denmark, Roskilde, Denmark

Optical CoatingModerators: James Hilfiker, J.A. Woollam Co., Inc. and Georg Ockenfuss, JDSU8:30 a.m. O-17 Titanium Dioxide Thin Films: Their Structure and its Effect on their Photoactivity and Photocatalytic PropertiesM.L. Kaariainen, T.O. Kaariainen, and D.C. Cameron, ASTRaL, Lappeenranta University of Technology, Mikkeli, Finland

8:50 a.m. O-18 In-situ Spectroscopic Ellip-sometry for Atomic Layer DepositionInvited 40 min. TalkW.M.M. Kessels, Eindhoven University, Eind-hoven, The Netherlands

9:30 a.m. O-19 End-Hall Ion Sources: Im-provements, Problems, Future V.V. Zhurin, Colorado Advanced Technology, LLC, Fort Collins, CO

9:50 a.m. O-20 Anisotropic Nonlinear Op-tical Absorption in Gold Nanorod Nanocom-posite Coatings: Theory and Experiment J.-M. Lamarre, École de Polytechnique de Montréal, Montréal, Canada; F. Billard, In-stitut Carnot de Bourgogne, Dijon Cedex, France; C. Harkati Kerboua, Université de Montréal, Montreal, Cananda; M. Lequime, Institut Fresnel, Marseille Cedex, France; S. Roorda, Université de Montréal, Montréal, Canada; and L. Martinu, École de Polytech-nique de Montréal, Montréal, Canada

Break 10:10–10:30 a.m.

Moderators: J.A. Dobrowolski, National Re-search Council of Canada (retired), Canada and W.M.M. Kessels, Eindhoven University of Technology, The Netherlands

10:30 a.m. O-21 High Reflective Silver Coat-ings on 3D Plastic Parts for Solar Concentra-torsT. Schmauder, S. Kueper, and P. Wohlfahrt, Leybold Optics GmbH, Alzenau, Germany

ÿÿÿ

Visas,Customs,andCustomerServiceMaking Life Easier for International Meeting Attendees and ExhibitorsApply for your visa as soon as you submit your abstract! Important steps to remem-ber:1. Review your visa status, and find out

if you need a U.S. visa or a renewal. Depending on your country of origin, you may qualify for the Visa Waiver Program – see http://www.travel.state.gov/visa/temp/without/without_1990.html

2. Review the visa wait times informa-tion for interview appointments and visa processing at each embassy and consular section worldwide available at http://www.travel.state.gov/visa/temp/wait/tempvisitors_wait.php. Visit the embassy or consular section web site where you will apply for your visa to find out how to schedule an interview appointment, pay fees and any other instructions.

3. Plan on an interview at the embassy or consulate, which is required for most visa applicants. As part of the visa in-terview, a quick fingerprint scan should be expected. Applicants who need ad-ditional screening are informed during the application process.

4. As soon as you submit your abstract, send your request for the Letter of Invi-tation immediately to SVC at [email protected]. You will need this Letter of In-vitation to accompany your application for a visa, which you must take with you to the interview with the embassy in your country. The whole process can take at least four months depending upon your country of residence.

See the appropriate links at www.travel.state.gov for more information about visas required for temporary visitors to the U.S.SVC has an International Freight For-warder to assist exhibitors to get their equipment into the United States.Reference Web Sites:U.S. DEPT. OF STATE, TRAVEL INFORMATIONFor foreign citizens traveling to the United States and American citizens traveling abroad.www.travel.state.govU.S. DEPARTMENT OF STATE, VISA INFORMATIONDo you need a visa? If so, visit this Web Site:http://travel.state.gov/visa/index.html

Plan Ahead and Start the Visa Application Process Immediately!

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org 1�

10:50 a.m. O-22 Optical Coatings on Glass Tubes Made by Atomic Layer Deposition (ALD) Technology T. Alasaarela, J. Maula, and S. Sneck, Beneq Oy, Vantaa, Finland

11:10 a.m. O-23 Precision Deposition of Multilayer Optical Coatings Using Optically Monitored Closed Field Magnetron Sputtering D. Gibson, I. Brinkley, S. Stanley, and M. Walls, Applied Multilayers Ltd., Coalville, United Kingdom

11:30 a.m. O-24 Optical Properties and Mi-crostructure of Oxide Sculptured Thin Films by Glancing Angle DepositionX. Xiao, Y. Jin, H. He, H. Qi, Z. Fan, and J. Shao, Shanghai Institute of Optics and Fine Mechanics, Shanghai, China

11:50 a.m. O-25 ALD (Atomic Layer Deposi-tion) for Optical CoatingsJ. Maula, T. Alasaarela, and S. Sneck, Beneq Oy, Vantaa, Finland

Vacuum Web CoatingModerators: Eldridge Mount, EMMOUNT Technologies and Akita Jones, Avery Dennison

8:30 a.m. W-15 Efficacy of Flexible Mois-ture Barrier Films Produced Using a Roll-to-Roll Coater as Measured by the Calcium TestS. Louch, Centre for Process Innovation, Red-car, United Kingdom; M. Hodgson, Dupont Teijin Films, Middlesbrough, United King-dom; and S. Edge and K. Luxmore, Centre for Process Innovation, Redcar, United Kingdom

8:50 a.m. W-16 All-in-Vacuum Deposited Transparent Multilayer Barriers on Polymer SubstratesJ. Fahlteich, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

9:10 a.m. W-17 Study of High Gas Barrier Performance of Film with Coated SiOxNy LayersH. Yanagihara, Mitsubishi Plastics, Naga-hama, Japan; C. Ookawara and S. Yoshida, Mitsubishi Plastics, Inc., Ibaraki, Japan; and K. Ohdaira and H. Matsumura, Japan Ad-vanced Institute of Science and Technology, Ishikawa, Japan

9:30 a.m. W-18 High Rate Roll-to-Roll Deposition of ALD Thin Films on Flexible SubstratesE. Dickey and W. Barrow, Lotus Applied Technology LLC, Hillsboro, OR

9:50 a.m. W-19 Innovative Transparent Barrier for Packaging S. Guenther, S. Straach, and N. Schiller, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

Break 10:10–10:30 a.m.

10:30 a.m. W-20 Polymer Nanofilms from a Topochemical Deposition/Polymerization ProcessInvited 40 min. TalkJ. Lauterbach, Department of Chemical Engi-neering, University of Delaware, Newark, DE

11:10 a.m. W-21 Plasma Enhanced Chemical Vapor Deposition (PECVD) on Web Using Novel Linear, High Density Plasma Source M.A. George, H. Chandra, P. Morse, L. Birch, and J. Madocks, General Plasma, Inc., Tuc-son, AZ

11:30 a.m. W-22 Chemistry of Powder For-mation in SiOx Deposition PlasmasM. Ricci, J.L. Dorier, and Ch. Hollenstein, École Polytechnique Fédérale de Lausanne (EPFL); and P. Fayet, Tetra Pak (Suisse) SA, Romont, Switzerland

11:50 a.m. W-23 Magneto-Optical Properties of Magnetic Clusters and Thin Films on PET Substrates K. Schmidegg and V. Rinnerbauer, Hueck Folien GmbH, Baumgartenberg, Austria; and L.D. Sun, M. Hohage, and P. Zeppenfeld, Jo-hannes Kepler University, Linz, Austria

TBD WFT-2 Paucity of Materials‚ a Potential Constraint to the Growth of Many Markets Including Displays and PhotovoltaicsC. Bishop, C.A. Bishop Consulting Ltd., Loughborough, United KingdomThis is a Guaranteed Vacuum Web Coating Flexible Time (WFT) presentation; it will be presented in place of a cancelled paper earlier in this session if such situ-ation arises.


Thursday Morning (continued)SVC Foundation Student Scholarship Recipient to Present at the 2009 TechConMichael OrthnerUniversity of Utah, Salt Lake City, UTMichael Orthner will present a Poster entitled, “The Design and Development of an LPCVD Reactor for the Growth of 3C-SiC on Si” (Poster 10) on Monday, May 11, from 4:30 p.m.-8:00 p.m. in the Exhibit Hall

SVC Foundation Scholarship CommitteeHelp your alma mater and the SVC Foundation by connecting capable students to scholarship dollarsThe Society of Vacuum Coaters Founda-tion has scholarship dollars available for undergraduate and graduate students like Michael Orthner who are pursuing work in any and all fields related to vacuum coating. We are trying to get the word out to all appropriate university groups. You can help. We want to connect to professors directly rather than simply sending a flyer to relevant universities.

Please respond to me with the name, de-partment, and university of any professor doing work in any area related to vacuum coating. The foundation will then be sure that this individual receives the applica-tion information, so they in turn can pass it on to their students. If you have detailed contact information (mailing addresses) that’s even better – but not required.

The SVC Foundation Committee would be grateful for any and all responses.On behalf of the SVC Foundation Scholarship Committee; Donald J. McClureAcuity Consulting and [email protected]

To help companies get the most from their presence at the TechCon Exhibit, the SVC has implemented a Sponsorship Level Program for the 2009 TechCon and Exhibit in Santa Clara. These levels offer every company the opportunity to raise company awareness, promote new products and services and enhance exhibit participation. We have a sponsorship package to meet any budget and if you don’t see what you need, please contact us to discuss designing a custom package for your company. Official sponsors are recognized during their sponsored event, and also with prominent on-site signage, recognition on the SVC Web Site, in the SVC Bulletin, the Preliminary and Final Technical Programs, and TechCon Exhibit Guide.

Thank You 2009 TechCon Event Sponsors

Gold Sponsors - $2,500• Denton Vacuum, LLC• DHF Technical Products• Edwards• General Plasma, Inc.• Soleras Ltd.• Vacuum Research Corporation

Silver Sponsors - $1,000• Academy Group• GfE Materials Technology, Inc.• IPT Ionen - und Plasmatechnik GmbH• Vacuum Engineering & Materials Co., Inc.

Bronze Sponsors - $500• Darly Custom Technology, Inc.• GENERAL Vacuum Equipment Ltd.• Hereaus Incorporated• Torr International, Inc.• Vergason Technology, Inc.

Our Level Sponsors

Registration Tote Bags• Brooks Automation, Inc. • DHF Technical Products• Williams Advanced Materials, Inc.• Zpulser, LLC

Badge Lanyards• Reactive NanoTechnologies, Inc.

Hotel Reservation Web Splash Page• Zpulser, LLC

Logo Bottled Water• Denton Solar• Sumitomo (SHI) Cryogenics of America, Inc.

Conference RegistrationWeb Splash Page• Brooks Automation, Inc.

Other TechCon Sponsors

Visit www.svc.org or E-mail [email protected] for more information on becoming a TechCon Event Sponsor.

Beer Blast Beer Sponsor• VON ARDENNE

Exhibit Lounge Sponsor• Physics Today


SVC Listens to Exhibitors!A flexible Technical Conference Program schedule provides long breaks for TechCon attendees to visit the Exhibit. SVC attracts attendees to the Exhibit Halls and keeps them there!

• Poster Session on Monday afternoon• Vendor Innovators Showcase and Live

Product Demonstrations in the Exhibit Hall on Tuesday

• Dinner on Monday Evening (for everyone – including Exhibit visitors)

• Exhibitor Luncheon on Tuesday for TechCon registrants and Exhibit booth personnel

• Free Wireless Internet throughout the Exhibit Hall!

• Beer Blast for everyone on Tuesday after-noon

Enhance Your Company’s Visibility at the TechCon!Recognized as THE premier event by engi-neers, manufacturers, technologists, scien-tists, and business professionals working in the international vacuum coating industry, the SVC TechCon and Exhibit is a wise in-vestment of your conference and marketing dollars. Opportunities to promote your prod-ucts and services are abundant.The popular Vendor Innovators Showcase and Live Product Demonstrations will be pre-sented in the Exhibit Hall and will be sched-uled to coincide with show hours on Tuesday. These unique promotional venues will mean that attendees touring the exhibit hall can “drop in” for one or more of the presentations highlighting new products, new equipment, or a new process.Don’t miss this opportunity to enhance your company’s visibility at the TechCon. For more information on the Vendor Innovators Show-case, Live Demonstrations, or to reserve your booth in this one-of-a-kind event, visit the SVC Web Site at www.svc.org or call 505/856-7188.Deadline for submitting abstracts for the Ven-dor Innovators Showcase is March 1, 2009 to be included in the Final Program.

�00�SVCExhibitExhibit Hours:Monday, May 11

3:00 p.m.–8:00 p.m.Tuesday, May 12

10:00 a.m.–5:00 p.m.

This is the Only Exhibit Devoted Entirely to Vacuum CoatingTakeAdvantageoftheMarketingOpportunitiesinSantaClara–IntheHeartofCalifornia’sSiliconValley

Target Marketing in SVC PublicationsThe SVC TechCon and Exhibit is a wise in-vestment of your conference and marketing dollars. We offer many opportunities to pro-mote your products and services during this annual event and throughout the year.

2009 TechCon Exhibit Guide(Print and Digital Versions)

The TechCon Exhibit Guide (TEG) showcases the products and services of exhibiting companies participating in the annual SVC TechCon Exhibit. It highlights the upcoming presentations by the Plenary Speaker, Key-note Speaker, Donald M. Mattox Tutorial Speakers,

and other invited speakers in the Technical Program, and also

describes the Education Program that is designed to assist registrants in solving their vacuum coating problems.This is a unique opportunity for exhibitors to promote their presence at the TechCon Exhibit. The advance, first class mailing of the Guide will go to thousands of potential

visitors working near the 2009 Santa Clara location.The digital version of the TEG is sent to all SVC subscribers on a worldwide basis. Advertising in this Guide is an excellent op-portunity for your company to emphasize the services it offers to the vacuum coating community.Closing date for artwork is March 1.

Sponsorship Opportunities at the TechCon in Santa ClaraSVC is offering a Sponsorship Level Program for the 2009 TechCon and Exhibit in Santa Clara. This program offers every company the opportunity to raise company awareness, pro-mote new products and services and enhance exhibit participation. Companies can choose from Bronze, Silver and Gold Sponsorship packages. For more information about the Sponsorship Level Program, see page 15 or visit the Web Site at www.svc.org.


ÿÿÿ

A&N CorporationAcademy GroupAccuVac TechnologyAdvanced Energy Industries, Inc.Alcatel Vacuum Products, Inc.Alicat Scientific, Inc.Ambios Technology, Inc.Ametek, Inc.Angstrom Sciences, Inc.Applied MaterialsApplied Multilayers LimitedARi Industries, Inc.Austin Scientific, an Oxford Instruments

CompanyBekaert Advanced Coatings N.V.Beneq OyBrooks Automation, Inc.Brooks InstrumentCenter for Tribology, Inc.Chengdu Ultra Pure Applied Materials

Co., Ltd.Coastal Instruments, Inc.Coating Materials a Division of Tico

Titanium, Co.COTEC GmbHCSM Instruments, Inc.Dark Field Technologies, Inc.Darly Custom Technology, Inc.Denton Vacuum, LLCDexter Magnetic Technologies, Inc.DHF Technical ProductsDuniway Stockroom CorporationDynaVacEB SourcesEBARA Technologies, Inc.EdwardsEvatecExotech, Inc.Fil-Tech, Inc.

Filmetrics, Inc.Fraunhofer FEPFraunhofer ISTFraunhofer USA CCLGencoa Ltd.General Plasma, Inc.GENERAL Vacuum Equipment Ltd.GfE Materials Technology, Inc.GNB CorporationH.C. StarckHauzer Techno Coating BVHeatWave Labs, Inc.Heraeus IncorporatedHiden Analytical, Inc.Huettinger Electronic, Inc.HVA, LLCIllinois Instruments, Inc.Impedans Ltd.INFICONInland Vacuum Industries, Inc.InstruTech, Inc.Intellevation LtdIntlvacIonBond LLCIPR Ionen- und Plasmatechnik GmbHJ.A. Woollam Co., Inc.Jori Resources CorporationKashiyama USA, Inc.Kaufman & RobinsonKDFKolzer Korea Vac-Tec Co., Ltd.Kurt J. Lesker CompanyLeybold OpticsLintelle EngineeringMaterials Science, Inc.MC Power SystemsMDC Vacuum Products, LLCMeivac Inc

Midwest Tungsten Service, Inc.MKS Instruments, Inc.MPF Products, Inc.Mustang Vacuum SystemsMyers VacuumNiles Electronics, Inc.Nor-Cal Products, Inc.Oerlikon Leybold Vacuum USA Inc.Osaka Vacuun USA, INC.Pfeiffer VacuumPhysics TodayPlasma Process Group, Inc.Plasma Technology Systems, LLCPlasmaterials, Inc.Precision Metal Works Ltd.Process Materials, Inc.ProTech MaterialsProvac AG-Ricmar Sales & ServicePTB Sales, Inc.PVT Plasma und Vakuum Technik

GmbHR.D. Mathis CompanyReactive NanoTechnologies, Inc.Reldan Metals, Co.Rigaku Vacuum ProductsRocky Brook Associates, Inc.SAGE industrial sales, inc.SCI Engineered MaterialsSemicore Equipment, Inc.Shimadzu Precision InstrumentsSidrabe, Inc.Sierra Applied Sciences, Inc.Sigma Technologies International, Inc.Soleras Ltd.Solid Sealing TechnologySolvix SASputtering ComponentsSumitomo (SHI) Cryogenics of America,

Inc.

Superior Technical Ceramics Corp.SVC FoundationSycon Instruments, Inc.System Control TechnologiesTecport Optics, Inc.Ted Pella, Inc.TelemarkThermal Conductive Bonding, Inc.Thermionics Vacuum ProductsTorr International, Inc.Transfer Engineering and Manufacturing,

Inc.TRIBOtechnicTrinos Vacuum Systems, Inc.Tuthill Vacuum & Blower SystemsUC Components, Inc.Ulvac Technologies, Inc.Umicore Thin Film ProductsVacuum Engineering & Materials Co.,

Inc.Vacuum InnovationsVacuum Process Technology, LLCVacuum Research CorporationVapor Technologies, Inc.Varian, Inc.VAT, Inc.Veeco Instruments, Inc.Vergason Technology, Inc.VON ARDENNE Anlagentechnik GmbHW. Theiss Hard and SoftwareWilliam Andrew (Applied Science

Publishers)Williams Advanced MaterialsXEI Scientific, Inc.Xiamen Advanced High-Tech Material

Co., Ltd.Zpulser, LLC

Exhibiting Companies at the 52nd Annual TechCon (as of December 10, 2008)Exhibit Visitors, TechCon and Education Program Attendees!Visit our SVC Exhibiting Companies that serve the vacuum coating industry! There is no charge to visit the Exhibit.


Bulletin(Print and Digital Versions)

The SVC Bulletin informs and educates with its bal-anced mix of news and technology. The Bulletin is published three times each year (spring, summer, and fall), and is read by more than 15,000 profes-sionals working in

the vacuum coating community and related sci-

ences and technologies. Each issue contains previews or reviews of the TechCon, SVC committee activities, technical articles, book reviews, Corporate Sponsor news and profiles, and Society news.The Bulletin will continue to expand its edito-rial content, with each issue featuring several original contributed articles and reprints of some of the most interesting papers presented at the most recent TechCon. This expansion offers advertisers more four-color advertising opportunities. When space is limited, priority will be given to four color ads.Your ad in the Bulletin also gets viewed by an international list of subscribers to our digital

version of the Bulletin. This enhanced version offers viewers direct hyperlinks to advertisers, easy navigation and searchable content.Contact SVC at [email protected] or visit www.svc.org and click Advertising/Sponsorship for more information on SVC publications.

Take Advantage of 24/7 Web Site Advertising at www.svc.orgPurchase a logo and hyperlink on the SVC Web Site and experience the many benefits of Web advertising before and after the Tech-Con. The Virtual Exhibit section of the Web Site remains live until almost the end of the calendar year, when the 2009 Exhibitors are uploaded and the cycle begins again.

We’ve also added two new advertising oppor-tunities on the Web Site that put company ads and logos in front of every visitor to the site. The Rotating Banner Ad and the Rotating Corporate Sponsor Logo are both located on the main page of the Web Site and include a URL link to the Web Site of choice.

Product & Services (P&S) DirectorySVC members facilitate their search for vacuum coating products and services by turning to the resources listed in the PVD Product and Services Directory. Updated annually, the Directory is mailed to SVC members and others who contact SVC looking for products and services related to the vacuum coating field. By offering free listings, SVC can provide a more complete directory to the vacuum coat-ing community. Give your company greater emphasis with an ad in the Directory.

Closing date for artwork is September 1.

Corporate Sponsors3M CompanyAcademy GroupAdvanced Energy Industries, Inc.Angstrom Sciences, Inc.*Applied MaterialsAustin Scientific, an Oxford Instruments Company*Bekaert Advanced Coatings N.V.Brooks Automation, Inc.CeramTec North AmericaCoating Materials, A Division of TicoCPFilms, Inc.Darly Custom Technology, Inc.Denton Vacuum, LLCDexter Magnetic Technologies, Inc.DynaVacEdwardsFerrotec (USA) CorporationFil-Tech, Inc.Galileo Vacuum Systems, Inc.Gemch Co., Ltd.*GENERAL Vacuum Equipment Ltd.GfE Materials Technology, Inc.Goodfellow CorporationHauzer Techno Coating BVHenze Boron Nitride Products GmbH*Heraeus IncorporatedHuettinger Electronic, Inc.INFICON*IonBond LLCITN Energy Systems, Inc.JDSUJoel Ltd.Kurt J. Lesker CompanyLeybold Optics USA, Inc.Materials Science International, Inc.Materials Science, Inc.*MDC Vacuum Products, LLCMEWASA North America, Inc.*Midwest Tungsten Service, Inc.*Milman Thin Film Systems PVT, LTD.Mitsubishi Plastics, Inc.MKS Instruments, Inc.Mustang Vacuum SystemsNanovea/Division of Micro Photonics, Inc.Nor-Cal Products, Inc.Pfeiffer VacuumPlasmaterials, Inc.*Process Materials, Inc.Providence Metallizing Company, Inc.PTB Sales, Inc.PVT Plasma und Vakuum Technik GmbHR.D. Mathis CompanyReactive NanoTechnologies, Inc.*SAGE industrial sales, inc.Semicore Equipment, Inc.Singulus Technologies AG Singulus Technologies, Inc.Soleras Ltd.Southwall Technologies, Inc.Sputtering Materials, Inc.Sumitomo (SHI) Cryogenics of America, Inc.System Control Technologies (SCT)Techni-Met, Inc., Division of Williams Advanced

Materials, Inc.*TelemarkThermionics Vacuum ProductsThin Film Center, Inc.Toray Plastics (America), Inc.UC Components, Inc.Umicore Thin Film ProductsVacuCoat Technologies, Inc.Vacuum Engineering & Materials Company, Inc.Vacuum Process Technology, Inc.Varian, Inc.VAT, Inc.Veeco Solar EquipmentVergason Technology, Inc.VON ARDENNE Anlagentechnik GmbHWilliams Advanced Materials, Inc.Yeagle Technology, Inc.

Bold indicates Charter Corporate Sponsor* indicates new 2006/2007/2008 Corporate Sponsors


HowDoIGettoSantaClara?AirportService: San Francisco Intl. Airport - SFO (www.flysfo.com) and Mineta San Jose Intl. Airport - SJC (www.sjc.org)For assistance with ground transportation, look for the Information Booths inside each airport.

ShuttleService:Super Shuttle (650/246-8942, www.supershuttle.com, SVC Discount Code: SF7FE) Super Shuttle blue and yellow vans take you from the airport to your hotel and bring you back. To keep prices low, you can share the ride with a few other passengers. To arrange a pickup from your home, office or hotel to or from any of the airports served by Super Shuttle, simply visit the reservations page at www.supershuttle.com or call 800 BLUE-VAN (258-3826). NOTE: No reserva-tions needed for service from SFO; Service from SJC is by reservation only.

TaxiService:From Mineta San Jose Intl. Airport to Santa Clara - fares can range from $15.00 - $20.00.

PublicTransportationCaltrain - Caltrain is a commuter train along the peninsula from San Francisco to San Jose. It has stops at every city along the way. Caltrain is currently operating seven days a week (800/660-4287, www.caltrain.com). You can take Caltrain from San Francisco to Santa Clara. From San Francisco, take Caltrain south to the Santa Clara station. The Santa Clara station is located directly across from Santa Clara University. To go to the Santa Clara Conven-tion Center, you will have to transfer at Caltrain’s Mountain View station. At Caltrain’s Mountain View station, take the Valley

Transportation Authority (VTA) Light Rail to Santa Clara’s Great America station.Valley Transportation Authority (VTA)Bus service and light rail serving Santa Clara and the rest of Silicon Valley. For information and fares, call 408/321-2300 or visit www.vta.org.Light rail service is available from Mineta San Jose International Airport to the Santa Clara Con-vention Center. Light rail is a medium-capacity electric powered transit system that runs in the cities of Santa Clara and San Jose. The light rail stops in front of the Santa Clara Convention Center, Hyatt Regency Santa Clara and Hilton Santa Clara.

RentalCarService:San Francisco International Airport’s Rental Car Center allows travelers to pick up and drop off rental cars at one convenient location and is served by the AirTrain automated people mover. To access the Rental Car Center from the airport terminals, take the AirTrain Blue Line. AirTrain, SFO’s fully automated people mover system, operates 24 hours every day and provides convenient and frequent service throughout SFO. AirTrain stations are located in all ter-minals, terminal parking garages, the Rental Car Center and SFO’s BART station. Alamo, Avis, Budget, Dollar, Enterprise, Hertz, National and Thrifty car rental counters are located on the fourth floor of the SFO Rental Car Center.Mineta San Jose International Airport has a clearly marked Rental Car Shuttle bus stop in each terminal. Rental Car Shuttles provide regular transportation for customers to and from the terminals and the Rental Car Center. Alamo, Avis, Budget, Dollar, Enterprise, Fox, Hertz, National, and Thrifty car rental counters are located at the SJC airport. If you arrive after hours and find no service, please call 408/277-3661.

DrivingtoSantaClaraConventionCenterandSVCContractedHotelsVisit the SVC Web Site at www.svc.org for driving directions to the Santa Clara Convention Center and SVC host hotels. Addresses for destinations in Santa Clara are listed below.

Santa Clara Convention Center5001 Great America Parkway

Santa Clara, CA 95054www.santaclara.org

Hyatt Regency Santa Clara5101 Great America Parkway

Santa Clara, CA 95054www.santaclara.hyatt.com

Hilton Santa Clara4949 Great America Parkway

Santa Clara, CA 95054www.santaclara.hilton.com

Biltmore Hotel & Suites2151 Laurelwood Rd.

Santa Clara, CA 95054www.hotelbiltmore.com

Cour

tesy

of S

anta

Clar

a Ch

ambe

r of C

omm

erce

& C

VB

Vacuum Technology: Components and System (Discount package for V-201, V-202, and V-203 available)High Vacuum System Operation (O’Hanlon)An Introduction to Physical Vapor Deposition (PVD) Processes (Shah)Thin Film Growth and Microstructure Evolution (Greene)An Introduction to Optical Coatings (Macleod)Sputter Deposition (Greene) - Day 1 of 2-Day CourseVacuum System Gas Analysis (O’Hanlon)Optical Coating Design and Monitoring (Willey)Plasma Web Treatment (Grace)High Power Impulse Magnetron Sputtering (Anders/Ehiasarian)Characterization of Thin Films (Christensen)Sputter Deposition (Greene) - Day 2 of 2-Day CourseVacuum Materials and Large System Performance (O’Hanlon)Numerical Methods for Optical Coatings (Dobrowolski)Primer on Thin Films and Vacuum Technology (McCrary)Introduction to Plasma Processing Technology (Báránkova & Bárdos) Half-day p.m.Sputter Deposition in Manufacturing (Glocker)Reactive Sputter Deposition (Greene)Sputter Deposition onto Flexible Substrates (McClure)Tribological Coatings (Sproul & Matthews)Troubleshooting for Thin Film Deposition Processes (Ash)The Practice of Reactive Sputtering (Sproul)ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications (Bright)Practical Aspects of Vacuum Technology: Operation & Maintenance of Production Vacuum Systems (Langley)Nonconventional Plasma Sources and Methods in Processing Technology (Báránkova & Bárdos) Atmospheric Plasma Technologies (Báránkova & Bárdos) Half-day a.m. NEW!Alternative Transparent Conductive Coatings (TCOs) to ITO (Bright) Half-day a.m.Diamond Like Carbon Coatings – from Basics to Industrial Realization (Schuelke, Bewilogua & van der Kolk) Half-day a.m.Introduction to Nanotechnology: What the Technical and Business Professional Should Know (Burrows) Half-day a.m. NEW!

Tutorial Classification SystemThe tutorial codes are intended to provide the prospective attendee with some guidance as to whether the emphasis in the tutorial is primarily on vacuum technology (V code), or vacuum deposition coating processes and technology (C code), or other miscellaneous topics (M code). The tutorial number is intended to indicate the level of tutorial specializa-tion—the lower numbers refer to tutorials that are basic or introductory in nature, and the higher numbers refer to tutorials that offer a more specialized treatment of a specific topic. Tutorials are full day (8:30 a.m. to 4:30 p.m.) unless otherwise noted.

For details on all tutorials in the SVC portfolio, including the tutorial description, topical outline, tutorial syllabus and biographical sketches of the instructors, explore the Education button

on the new SVC Web Site at www.svc.org

EDUCATION PROGRAM SCHEDULE May 9Saturday

• • • •

V-201C-103C-311C-104

May 11Monday

• • • •

C-203V-203C-303C-101

C-210 (p.m.)

May 12Tuesday

• • • •

C-208C-315C-211C-308

May 13Wednesday

• • • •

C-212C-317C-304V-207

May 14Thursday

• • • •

C-324 (a.m.)

C-321 (a.m.)

C-320 (a.m.)

C-325 (a.m.)

May 10Sunday

• • • •

C-203V-202C-301C-314C-323C-322

2009 TechCon Education ProgramMay 9–14, 2009

SVC Preliminary Tutorial RosterYou do not have to register for the TechCon or be a member of SVC to attend tutorials.

Anyone can take advantage of the practical problem-solving tutorials developed by the SVC. Taught by some of the most respected professionals in the vacuum coating industry, these tutorials cover every aspect of vacuum coating. Twenty-six tutorials will be offered, including two new tutorials on Hot Topics! Tutorials complement the technical conference sessions and Exhibit. Discounted fees are available for students. For more detailed information, visit the education section of the SVC Web Site at www.svc.org. Register on-line or contact the SVC at 505/856-7188 or E-mail to [email protected].

�0 Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

Education Program Schedule

Saturday, May 9

Vacuum Technology: Components and Systems (V-�01,V-�0�,V-�0�offeredMay�,10and11)

This group of tutorials (V-201, V-202, and V-203) is designed in modu-lar form where each module consists of a lecture, a problem-solving or demonstration session, and a review. All participants are expected to bring a pocket calculator and take part in group problem solving. The tutorials are not theoretical, but practical. They emphasize the underly-ing concepts in a physical rather than a mathematical way. Prerequisites are a desire to learn, and enough of a mathematics background to han-dle simple algebra. Persons registering for three of this specific group of tutorials at the SVC Technical Conference receive a discounted fee of $1,450 and only one textbook is provided in this case. The Student fee for all three tutorials is $425.

V-201 | High Vacuum System OperationSaturday, May 9 8:30 a.m. –4:30 p.m.Tutorial fee: $640 (includes text book) Student fee: $190

This tutorial is intended for those who wish to learn how mechanical pumps and high vacuum pumps form a high vacuum system and how three such systems are operated. At the end of this tutorial, using all available materials, a participant should be able to explain the opera-tion of diffusion, cryo, and turbo pumped systems; understand the dif-ferences between a viscous gas and a rarefied gas; and show how these differences govern the operation of the systems.

Tutorial Content• Introduction to vacuum systems• Rotary mechanical pumps• Diffusion pumps and systems• Cryogenic pumps and systems• Turbomolecular pumps and systems

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).

Instructor: John F. O’Hanlon, University of ArizonaJohn F. O’Hanlon is Professor Emeritus of Electrical and Computer Engineering, the University of Arizona. He retired from IBM Research Division in 1987, where he was involved in thin-film deposition, vacuum processing, and display technology. He retired from UA in 2002, where he directed the NSF Ind./Univ. Center for Microcontamination Control. His research focused on particles in plasmas, cleanrooms, and ultrapure water contamination. He is the author of A User’s Guide to Vacuum Technology, 3rd edi-tion. (John Wiley & Sons, 2003).

Also available through the SVC On Location Education Program

C-103 | An Introduction to Physical Vapor Deposition (PVD) ProcessesSaturday, May 9 8:30 a.m. –4:30 p.m.Tutorial fee: $640 (includes text book) Student fee: $190

Physical vapor deposition (PVD) processes are atomistic deposition processes in which material vaporized from a source is transported in the form of a vapor through a vacuum or low-pressure gaseous envi-ronment to the substrate, where it condenses and film growth takes place. PVD processes can be used to deposit films of compound mate-rials by the reaction of depositing material with the ambient gas envi-ronment or with a codeposited material. This tutorial will discuss and compare the four basic PVD techniques: vacuum evaporation, sputter deposition, arc vapor deposition, and ion plating. Vacuum evapora-tion uses thermal vaporization as a source of depositing atoms; sputter deposition uses physical sputtering as the vaporizing source; arc vapor deposition uses a high-current, low-voltage arc for vaporization; and ion plating uses concurrent or periodic energetic particle bombard-

TutorialsOfferedatthe�00�TechConment to modify the film growth. The parameters used for each tech-nique will be discussed along with their advantages, disadvantages, and applications. This is an entry-level tutorial to acquaint the students with various PVD processes used for “surface engineering.”

Tutorial Content• Introduction: deposition environments (vacuum and plasma), film

formation, film structures, reactive deposition, factors affecting film properties

• Vacuum evaporation and vaporization, evaporation and sublima-tion, deposition chambers, vaporization sources (resistive and e-beam), evaporation materials, fixture design, process param-eters, monitoring and control, advantages and disadvantages, ap-plications

• Sputter deposition and physical sputtering, plasmas (dc, rf, mag-netron, and pulsed dc), sputtering target configurations, reactive sputter deposition, sputtering materials, process parameters, mon-itoring and control, advantages and disadvantages, applications

• Arc vapor deposition and vacuum and plasma arcs, properties of arcs, generation and “steering” of arcs, arc sources, reactive arc de-position, process parameters, monitoring and control, advantages and disadvantages, applications

• Ion plating and bombardment effects, bombardment configura-tions, reactive ion plating, ion plating vaporization sources and evaporation, sputtering and arc process parameters, monitoring and control, advantages and disadvantages, applications

• PVD deposition systems and configurations (batch, load-lock, and in-line), pumping options

The tutorial fee includes the text, Handbook of Physical Vapor Deposi-tion (PVD) Processing, Donald M. Mattox (William Andrew Publish-ing/Noyes Publications, 1998).

Instructor: S. Ismat Shah, University of DelawareS. Ismat Shah graduated from the University of Illinois at Urbana-Champaign in 1986 from the Department of Materials Science and Engineering. He worked for the Du-Pont Company as senior Staff Scientist for 12 years before joining the University of Delaware in 1999, where he has a joint appointment in the Department of Materials Science and Engineering and the Department of Physics and Astronomy. He has been involved in the field of thin films and nanostructured materials for 22 years. He has over 145 publications in the field and six patents awarded. He is the Chair of the SVC Education Committee. He teaches the first on-line tutorial offered by the SVC, in col-laboration with the University of Delaware, on Vapor Deposition Processes.


C-104 | An Introduction to Optical CoatingsSaturday, May 9 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

A one-day introduction to optical coatings and their design, manu-facture, and behavior is taught at a fundamental level. A knowledge of basic principles is the key to solving even complex and involved prob-lems. Why are metals better for some coatings than dielectrics? How many layers are needed for high reflectance? How can adhesive tape stick better than an optical coating even though it has a poorer adhe-sive force? Why do coating properties drift after manufacture? Why is it difficult to find high-index materials for the ultraviolet? Why does coating performance vary with angle of incidence? The material cov-ered in this tutorial should make answers to these and similar questions immediately clear.

The level of the tutorial is suitable for those new to the field, those who want a quick refresher, or those with experience who would like to fit it into an ordered framework. Advanced mathematics is definitely not required.

Tutorial Content• Introduction, including fundamentals of light• Optics of thin film materials• Coating design basics

• Manufacture• Microstructure• Coating performance, properties and behavior

Instructor: H. Angus Macleod, Thin Film Center, Inc.H. Angus Macleod has more than 40 years of experience in optical coatings, both in manufacturing and in research. He was born and educated in Glasgow, Scotland, and worked both in industry and academia in Great Britain before joining the University of Arizona as Professor of Optical Sciences in 1979. Since 1995, he has been full time with the Thin Film Center, Inc., a software, training and consulting company in Tucson, AZ, that he co-founded in 1986. He is the author of Thin Film Optical Filters, 3rd edition (IoP Publishing, 2001).

C-311 | Thin Film Growth and Microstructure EvolutionSaturday, May 9 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for engineers, technicians, and others involved with the vapor deposition of thin films by sputtering, evaporation, MBE, CVD, GS-MBE, etc., and who need to obtain a better under-standing of the effects of operating parameters on the properties of metal, semiconductor, and dielectric films and alloys. The tutorial is concentrated on the development of a detailed atomic-scale under-standing of the primary experimental variables and surface reaction paths controlling nucleation/growth kinetics and microstructural evo-lution during vapor-phase deposition of thin films. The goal is to devel-op an appreciation of the advantages and disadvantages of competing growth techniques and to learn how to design better and more efficient film growth processes to achieve required properties.

Thin-film technology is pervasive in many advanced fields of modern technology including microelectronics, optics, magnetics, hard and corrosion-resistant coatings, micromechanics, etc. Progress in each of these areas depends upon the ability to selectively and controllably deposit thin films (thickness ranging from tens of Ångstroms to mi-crometers) with specified physical properties. This, in turn, requires control – often at the atomic level – of film microstructure and micro-chemistry.

Essential fundamental aspects, as well as the technology of thin-film nucleation and growth from the vapor phase (evaporation, MBE, sput-tering, and CVD) are discussed in detail and highlighted with “real” ex-amples. The tutorial begins with an introduction on substrate surfaces: structure, reconstruction, and adsorption/desorption kinetics. Nucle-ation processes are treated in detail using insights obtained from both in situ (RHEED, LEED, STM, AES, EELS, etc.) and post-deposition (TEM and AFM) analyses. The primary modes of nucleation include two-dimensional (step flow, layer-by-layer, and two-dimensional mul-tilayer), three-dimensional, and Stranski-Krastanov. The fundamental limits of epitaxy will be discussed.

Experimental results and simulations will be used to illustrate processes controlling three-dimensional nucleation kinetics, island coalescence, clustering, secondary nucleation, column formation, preferred orienta-tion, and microstructure evolution. The effects of low-energy ion-irra-diation during deposition, as used in sputtering and plasma-CVD, will be discussed with examples.

Tutorial Content

The tutorial provides an understanding of:• The role of the substrate in mediating growth kinetics• The nucleation process• Film growth modes• Epitaxy• The development and control of film stress (strain engineering)• Nucleation and growth of strain-mediated self-organized

structures

• Polycrystalline film growth, texture, and microstructure evolution• Structure-zone models of film microstructure• The role of low-energy ion/surface interactions during film growth• The relationship between film growth parameters and film

properties

Instructor: Joe Greene, Editor-in-Chief of Thin Solid Films, the D. B. Willett Professor of Materials Science and Physics, University of Illinois, and Past Director of the Frederick Seitz Materials Research LaboratoryJoe Greene is the D.B. Willett Professor of Materials Science and Physics Director of the Frederick Seitz Materials Research Laboratory at the University of Illinois. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during vapor-phase film growth in order to controllably manipulate microchemistry, microstructure, and physical properties. His work has involved film growth by all forms of sputter deposition (MBE, CVD, MOCVD, and ALE). He was President of the American Vacuum Society in 1989, a consultant for several research and development laboratories, and a visiting professor at several universi-ties. Recent awards include receipt of the Aristotle Award from SRC (1998), the Adler Award from the American Physical Society (1998), Fellow of the American Vacuum Society (1993) and the American Physical Society (1998), and the Turnbull Prize from the Materials Research Society (1999). He was elected to the US National Academy of Engineering in 2003. He is the Editor-in-Chief of Thin Solid Films.


Sunday, May 10

V-202 | Vacuum System Gas AnalysisSunday, May 10 8:30 a.m. –4:30 p.m.Tutorial fee: $640 (includes text book) Student fee: $190

This tutorial is intended for those who wish to understand how to ana-lyze the performance of a vacuum system. Basic vacuum gauges that measure pressure in the low vacuum and in the high vacuum region will be described. Residual gas analyzers provide a useful method of analyzing the performance of a system and how various components are operating by looking at the partial pressures of individual gases. The class concludes with a discussion of leak detection: when it should be attempted and how to detect leaks with a pressure gauge, an RGA, and a mass spectrometer leak detector.

Tutorial Content• Gas laws• Gas flow• Vacuum gauges• Residual gas analyzers• Leak detection


Instructor: John O’Hanlon, University of Arizona

For John O’Hanlon’s profile, see V-201 (Saturday)


C-203 | Sputter Deposition (two – day tutorial)Sunday and Monday, May 10–11 8:30 a.m. –4:30 p.m.Tutorial fee: $890 Student fee: $190

This tutorial covers fundamental mechanisms associated with genera-tion of glow discharges, sputtering, and energetics of target and sub-strate processes. Operation and system design will be discussed for dc, rf, magnetron (both magnetically balanced and unbalanced), pulsed dc, and ion beam sputtering. The advantages and disadvantages of these different modes of operation will be examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of sputter deposition to provide direction in designing new processes. Present and future trends in sputter deposi-tion also will be addressed.

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org �1

�� Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

Tutorial Content• Processes controlling film growth and properties• The role of energetic particles in controllably modifying these

processes• Target sputtering effects• Nature and energy of sputtered atoms• Diode, triode, magnetron, and ion beam systems• dc, pulsed dc, mid-frequency ac, and rf power for targets and sub-

strates• Reactive sputtering of conducting and dielectric layers• Alloy sputtering

Instructor: Joe Greene, Editor-in-Chief of Thin Solid Films, the D. B. Willett Professor of Materials Science and Physics, University of Illinois, and Past Director of the Frederick Seitz Materials Research Laboratory.

For Joe Greene’s profile, see C-311 (Saturday)


C-301 | Optical Coating Design and MonitoringSunday, May 10 8:30 a.m. –4:30 p.m.Tutorial fee: $595 (includes text books) Student fee: $190

This tutorial covers optical coating design principles and techniques from both classical approaches and other different viewpoints. Meth-ods for the design and execution of monitoring strategies to produce desired coating results are described. The sensitivities, possibilities, and limitations of most control techniques are described.

Tutorial Content• Fundamentals of thin film optics from various points of view• The use of graphical methods for understanding and designing

optical coatings• A Fourier viewpoint of optical coatings• Practical monitoring and control of thin film growth• Error compensation and degree of control• Sensitivity to errors and monitoring strategies

The tutorial fee includes two textbooks: Practical Design of Optical Thin Films, Ronald R. Willey, 2007; and Practical Monitoring and Control of Optical Thin Films, Ronald R. Willey, 2007 (both published by Willey Optical Consultants).

Instructor: Ronald R. Willey, Willey Optical, ConsultantsRonald R. Willey graduated from MIT in optical instrumentation, has an M.S. from FIT, and over 35 years of experience in optical system and coating development and production. He is very experienced in practical thin films design, process develop-ment, and the application of industrial Design Of Experiments methodology. He is the inventor of a robust plasma/ion source for optical coating applications. He worked in optical instrument development and production at Perkin-Elmer and Block Associates. He developed automatic lens design programs at United Aircraft Research Labora-tories. He formed Willey Corporation in 1964 and served a wide variety of clients with consulting, development, prototypes, and production. In 1981 he joined Martin Marietta Aerospace and was Director of the Optical Component Center where he was responsible for optical fabrication, coating, and assembly. He joined Opto Mechanik in 1985 where he was responsible for the development of all new technologies, new instruments, and production engineering. He was a Staff Scientist at Hughes Danbury Optical Systems. He holds four patents and has published many papers and a book on optical coating, optical design, and economics of optical tolerances. He is a fellow of the Optical Society of America and SPIE and a past Director of the Society of Vacuum Coaters. He now is a consultant in the above-listed technical areas.


C-314 | Plasma Modification of Polymer Materials and Plasma Web TreatmentSunday, May 10 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

Plasma treatments are used in the web coating and roll conversion in-dustries to tailor polymer surfaces while preserving their bulk proper-ties. This tutorial is intended for engineers, scientists, and technicians who would like to gain a better understanding of the influence of plas-ma process factors on treatment performance, as well as the practical issues related to process robustness, process speed, and ease of scale-up. While much of the tutorial deals with treatment of polymer webs, the key concepts presented are applicable to polymer surfaces in general and plasma treatment of materials in general.

Tutorial Content• A basic introduction to plasmas including discussion of species

distributions, the structure of glow-discharge plasmas, electrical breakdown of gases, and mechanisms of sustaining a plasma.

• Discussion of industrial applications of plasmas for polymer sur-face modification including wettability control & printing, bond-ing & adhesion, nucleation of films, control of biointeraction with surfaces, and control of gas-film interactions.

• Description of a variety of plasma treatment technologies and the importance of controlling the industrial treatment environment.

• The interaction of plasmas with polymer surfaces.• The basics of polymer surface analysis along with examples of

surface analytical techniques applied to plasma treated polymers including X-ray photoelectron spectroscopy, static secondary ion mass spectrometry, and high-resolution electron energy loss spec-troscopy. Also included is discussion of adhesion, wetability, etc.

• Practical aspects of plasma web treatment including treatment dose, process factors and their roles, practical treatment efficiency, process verification, and process stability issues.

• Mechanisms of surface modification in the context of a site bal-ance model.

Instructor: Jeremy M. Grace, Eastman KodakJeremy M. Grace is currently a senior principal scientist at the Eastman Kodak com-pany. At Kodak, he has worked in the areas of plasma surface modification, thin-film adhesion, sputter deposition, and organic vapor deposition. He has written several patents and journal articles in the area of plasma modification of polymers. He is a member of the Society of Vacuum Coaters and the American Vacuum Society, and served as chair of the Upstate New York Chapter of the AVS (UNY-VAC) from 1998 - 2000.


C-322 | Characterization of Thin FilmsSunday, May 10 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial examines the broad range of techniques available to char-acterize thin film materials. We examine the range of properties of interest and how thin film properties may differ from bulk properties. Generic differences between counting and spectroscopic techniques are presented. Available “probes” are identified.

The main emphasis of the tutorial is an overview of a wide range of characterization techniques. We examine imaging techniques such as Optical microscopy, Scanning electron microscopy (SEM), Transmis-sion electron microscopy (TEM), and Scanning probe microscopies (STM, AFM …). We also explore techniques, which provide informa-tion about structural properties including X-ray diffraction (XRD), Stylus profilometry, Quartz crystal monitors (QCM) and density mea-surements.

The tutorial examines techniques, which explore chemical properties such as Auger electron spectroscopy (AES), Energy Dispersive Analysis of X-rays (EDAX), X-ray Photoelectron Spectroscopy (XPS, ESCA), Secondary Ion Mass Spectrometry (SIMS), and Rutherford Backscat-tering (RBS). AES is used as a prototype to examine quantitative analysis of spectroscopic data. Characterization techniques for optical properties such as ellipsometry and optical scattering are also consid-ered. Many of these chemical and optical techniques can also provide information about structural properties.

Techniques for determining electrical and magnetic properties are also discussed. These include resistance / four point probe, Hall effect, mag-neto-optical Kerr effect and ferromagnetic resonance. The emphasis here is on materials characterization as opposed to device characteriza-tion.

The tutorial concludes with an examination of techniques used to ex-plore mechanical properties such as stress-curvature measurements, friction testing, micro/nano indentation and adhesion tests.

Tutorial ContentOverview of wide range of characterization techniques for thin films including:

• Mechanical properties (stress, friction, micro/nano indentation, adhesion…)

• Imaging (microscopies: optical, SEM, TEM, AFM …)• Structural properties (XRD, profilometry, QCM …)• Chemical properties (AES, EDAX, XPS, SIMS, …)• Electrical/magnetic properties (resistance, Hall effect, Kerr effect)

Instructor: Tom Christensen, University of Colorado at Colorado SpringsTom Christensen is a Professor in the Department of Physics at the University of Colo-rado at Colorado Springs. He received his B.S. in physics from the University of Minne-sota in 1979 and his M.S. and Ph.D. degrees in Applied Physics from Cornell University. After several years as a member of the technical staff at Sandia National Laboratories in Albuquerque he joined the University of Colorado faculty in 1989. He has worked with vacuum technology, thin film technology and surface characterization since 1980 and has taught local AVS short courses since 1992.


C-323 | High Power Impulse Magnetron SputteringSunday, May 1 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for engineers, technicians, students, and oth-ers interested in high power impulse magnetron sputtering (HIPIMS). With HIPIMS we mean a pulsed sputtering process where the power density on the sputtering target is greatly enhanced (about two orders of magnitude) over the average power density. Hence, the word “im-pulse” is adopted to signify a low duty cycle of operation.

Some basic understanding or experience with plasmas and materials is desirable but not required. The tutorial starts with a brief introduction to basic plasma and sheath physics. The operation of dc magnetrons is explained to provide the foundation for the understanding of the time-dependent processes in pulsed systems, and especially those of HIPIMS discharges.

High power density leads to significant ionization of the sputtered material, enabling effective surface modification via ion etching and ion assistance to film growth. The interface to the substrate can be engineered and the film texture can be influenced using the HIPIMS plasma in combination with an appropriate bias.

Tutorial Content• HIPIMS - An Introduction• Stationary plasmas, sheaths, discharge• The dc magnetron processes

• Ion surface modification: etching and film growth, energetic condensation

• Pulsed plasmas and sheaths• High Power Impulse Magnetron Sputtering: the discharge• Plasma characterization and plasma diagnostics• Substrate biasing: etching / growth assist• Interface engineering by using HIPIMS plasmas• Deposition and coatings by HIPIMS• Hardware• Applications

Instructors: André Anders, Lawrence Berkeley National Laboratory and Arutiun Ehiasarian, Sheffield Hallam University, United KingdomAndré Anders is the Leader of the Plasma Applications Group at Lawrence Berkeley National Laboratory, Berkeley, California. He studied physics in Poland, Germany, and Russia. He holds an M.S. (1984) and Ph.D. degree (1987) in physics from Humboldt University, Berlin. He was with the Academy of Sciences, Berlin, 1987-1991, and moved to Berkeley, CA, in 1992. His research includes coatings by sputtering and ca-thodic arcs, plasma immersion ion implantation, and plasma and ion source develop-ment. He has authored about 160 papers in refereed journals and holds several pat-ents. He is the author of A Formulary for Plasma Physics (Akademie, Berlin, 1990), the editor and co-author of the Handbook of Plasma Immersion Ion Implantation and Deposition (Wiley, NY, 2000); and Cathodic Arc Plasma Deposition, (about to be published by Springer, NY). He serves on several international advisory committees of conferences and on the Editorial Board of Surf. & Coat. Technol. He is a Fellow of IEEE and IoP (UK), and a member of MRS, AVS, and SVC. He received the Chatterton Award (1994) and an R&D 100 Award (1997).

Arutiun P. Ehiasarian joined the Nanotechnology Centre for PVD Research at Sheffield Hallam University, UK in 1998 where he obtained his PhD in Plasma Science and Surface Engineering. His research within NTCPVD has concentrated on development of plasma PVD technologies for substrate pretreatment prior to coating deposition to improve adhesion, deposition of coatings with dense microstructure, low-pressure plasma nitriding and hybrid processes of plasma nitriding/coating deposition. He has experience with cathodic vacuum arc discharges, dc and pulsed magnetron discharges, and radio-frequency coil enhanced magnetron sputtering. He utilizes plasma diagnos-tics such as optical emission spectroscopy (OES), electrostatic probes, energy-resolved mass spectroscopy and atomic absorption spectroscopy. Materials characterization includes high-resolution TEM, STEM, STEM-EDS, SEM, and XRD as well as mechani-cal testing available at NTCPVD. Arutiun is one of the pioneers of high power impulse magnetron sputtering (HIPIMS) technology and his work in the field has been ac-knowledged with the R.F. Bunshah Award (2002), the TecVac Prize (2002) and the Hüttinger Industrial Accolade. He is an author of more than 50 publications, 10 invited lectures, 3 patents and 1 book chapter in the field of PVD and HIPIMS.


Monday, May 11

V-203 | Vacuum Materials and Large System PerformanceMonday, May 11 8:30 a.m. –4:30 p.m.Tutorial fee: $640 (includes text book) Student fee: $190

This tutorial is intended for those who wish to learn the basics of vacu-um materials and large system performance. Materials used for sealing and constructing high vacuum systems, as well as fluids for pumping and lubricating will be reviewed. The performance of large systems used for coating rigid and flexible substrates forms the backbone of work done by members of the SVC. Here we will describe the perfor-mance of systems used for coating rigid substrates (batch coaters) and flexible substrates (roll coaters). We will characterize when, why, and how to cross-over properly from roughing pumping to high vacuum pumping for all types high vacuum system types. We will illustrate the effects of outgassing, permeation and gas loading on system operation.

Tutorial Content • Materials in vacuum • Seals, joints, and valves • Rough pumping large systems • System performance • Multichamber systems

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org ��



Instructor: John O’Hanlon, University of Arizona

For John O’Hanlon’s profile, see V-201 (Saturday)


C-303 | Numerical Methods for Optical CoatingsMonday, May 11 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

After a brief general introduction, the performance of classical optical coatings, such as antireflection coatings, reflectors, cutoff filters, band pass filters, polarizers, and beam splitters, is reviewed and compared to that of filters based on different physical principles. In the next part of the tutorial, various numerical methods are outlined that can be used for the design of multilayer coatings for various challenging applica-tions. Refinement techniques are discussed that can be used to enhance the performance of reasonable starting designs. Various synthesis methods are described that do not require a starting design. These lat-ter techniques include the comprehensive search, gradual evolution, minus filter, the flip-flop, needle, refractive index step, and the inverse Fourier transform methods. All are illustrated by examples. Solutions to some interesting problems found at the NRC are presented. Numeri-cal methods are also very useful at various stages of the actual manu-facture of multilayer systems. Results obtained with completely auto-matic deposition systems are described in which the computer software not only controls the deposition, but also evaluates at various stages the performance of the partial multilayer. On this basis it then makes run-time adjustments to the remaining layers of the thin film system to reduce the effect of errors that have been made thus far. Finally, the present state of the art of design and manufacture is illustrated with the results submitted to the Manufacturing Problems held at the last few meetings of the OSA’s Optical Interference Coatings conferences. A more detailed list of topics discussed in the tutorial than the one given below will be found in the Detailed Tutorial Syllabus.

Tutorial Content• General introduction• Review of basic optical filters• Materials used in multilayer systems• Specifications of multilayer systems• Numerical design of multilayer systems

-Refinement methods-Synthesis methods-Commercial thin film design programs

• Some interesting problems solved at the NRC• Computer assisted manufacture of multilayers• Manufacture with real-time re-optimization• OIC Manufacturing problems• Real time optimization with etching

Instructor: George Dobrowolski, NRC of Canada (retired)J.A. (George) Dobrowolski is currently a guest worker at the National Research Council of Canada. His main interests are optical filters, in general, and the development of theoretical methods for the design and construction of optical multilayer systems, in particular. He also is interested in the development of various new technological and consumer-oriented applications of optical coatings. He is the author or co-author of about 150 publications, eight handbook articles, and 28 patents in the field of optical thin films. He received the 1987 Joseph Fraunhofer Award, the 1996 David Richard-son Medal of the Optical Society of America, and the 1997 Medal of Achievement in Industrial and Applied Physics of the Canadian Association of Physicists. In 2005 he was awarded the SVC Nathaniel Sugerman Award. Dobrowolski is the co-inventor of the optical thin film security devices used on all Canadian bank notes of $5 and higher denominations.


Nathaniel Sugerman Memorial Tutorial

C-101 | A Primer on Thin Films and Vacuum TechnologyMonday, May 11 8:30 a.m. –4:30 p.m.Tutorial fee: $260 Student fee: $45

Nathaniel Sugerman was a founding member, an avid supporter, and mentor of the Society of Vacuum Coaters. This tutorial was created in his memory for newcomers to the vacuum coating industry and for those nontechnical people associated with the industry who wish to gain a basic knowledge of thin film and vacuum technology. The tuto-rial is intended for people who are complete novices in the field.

This tutorial will provide an overview of vacuum and thin film technol-ogy associated with the manufacture of a variety of consumer products. These products are compact discs, food packaging barrier coatings (e.g.; potato chip bags), sunglasses and ophthalmic coatings, optical coatings, and integrated circuits.

The deposition techniques used to manufacture the above-listed prod-ucts will be described at the introductory level, including sputtering, evaporation, and chemical vapor deposition. In addition, a survey of various methods to clean and prepare substrates will be discussed. The nature of what a vacuum is, how it is achieved, and the techniques required to maintain the necessary vacuum for the above deposition processes will be described in some detail. Vacuum measurement tech-niques and residual gas analysis will be given a brief overview. Students will be given a private preview of typical key exhibits prior to the open-ing of the Exhibit Hall.

Tutorial Content• Some commercial products using vacuum technology• What is a vacuum?• How is a vacuum achieved?• What is a thin film?• How is a thin film produced?• Uses for thin films

The tutorial fee includes the SVC Education Guides to Vacuum Coating Processing.

Instructor: Leon McCrary, ConsultantLeon McCrary was the Marketing Manager at Denton Vacuum, LLC, and was Presi-dent of DynaVac for a number of years. He has over 46 years of experience in vacu-um technology and coating development. He holds a patent for the “Ivadizer” process (ion plating of aluminum for corrosion protection onto steel and aluminum alloys) and for a broad beam ion source used for ion-assisted deposition. His current specialty is in optical coaters used primarily for precision optics and telecommunications. He has specialized in the reactive sputtering of oxide coatings on a large scale and the development of applying new coating technology to production equipment. He was on the Board of Directors of the SVC for a number of years and was the Treasurer of the Society for six years.


C-210 | Introduction to Plasma Processing Technology (halfday)

Monday, May 11 1:00 p.m. –4:30 p.m.Tutorial fee: $385 Student fee: $70

The goal of the tutorial is to show the link and provide understanding of relations between coating application, coating (or modified surface) properties, selection criteria on process characteristics, selection crite-ria on plasma parameters, and method design. It is possible to predict how the process parameters will be reflected in the coating and in the opposite direction, requirements on the coating properties can imply how the process should be designed.

Tutorial Content• Plasma-assisted technologies, general attributes• Useful criteria, basic relations and limits for plasma, classification

of plasmas• Generation of gas discharge plasma, plasma diagnostics• Generation of vapor species, transport through medium, diffu-

sion, condensation at the surface• Consequences of the deposition process on film properties• Fundamentals of radical and ion-assisted plasma chemistry• Homogeneous and heterogeneous plasma-assisted reaction in

deposition of films• Examples of novel plasma processes• Hybrid plasma processes

Instructors: Hana Baránková and Ladislav Bárdos, Uppsala University, Sweden, and BB Plasma HB, Sweden.Hana Baránková is an Associate Professor at the Angstrom Laboratory, Uppsala University and Director of the interdisciplinary program on environmental applications of plasma.She received her PhD from the Czech Academy of Science. Her primary interests are innovation in coating technology, development of plasma sources, plasma processing and plasma treatment of surfaces and gases. She has published over 140 scientific papers and conference contributions and holds several industrial patents on plasma systems. She is an inventor of metastable assisted deposition and co-inventor of the Linear Arc Discharge (LAD) source, the Magnets-in-Motion concept in plasma sources and Fused Hollow Cathode and Hybrid Hollow Electrode Activated Discharge (H-HEAD) cold atmospheric plasma sources. Hana Baránková has been serving 6 years on the SVC Board of Directors, is Secretary of SVC, organizer of Atmospheric Plasma Technologies and Heuréka sessions and member of the Education, Interna-tional Relations, Strategic Planning, Scholarship, and Student Sponsorship Committees. She acts as a consultant and is a co-founder of two companies, BB Plasma HB and BB Plasma Design AB.

Ladislav Bárdos is an Associate Professor at Uppsala University in Sweden and Re-search leader of the Plasma group at Angstrom laboratory. He received his PhD in 1978 from the Czech Acad. Sci. and a Doctor of Science degree from Charles Uni-versity in Prague in 1995. In 1984 he was awarded the Czechoslovak State Prize for outstanding research results in the plasma deposition of thin films. He has more than 25 years of experience in the field of applied plasma physics and thin films. He has published over 200 scientific papers and conference contributions, designed several plasma sources for industry and has 15 Czech, 7 Swedish and several international patents. He runs a consulting company in plasma sources and processing technology. His primary interests are microwave plasmas, including downstream ECR and surface-wave generation, and particularly the radio frequency generated hollow cathodes and hybrid sources at both low and atmospheric pressures. Lad Bardos is Program Chair for 2009 and 2010 SVC TechCons, is currently serving on the SVC Board of Directors and is TAC chair of a special session Heuréka at the SVC TechCon and a member of the SVC Publications and Strategic Planning Committees.


Tuesday, May 12

C-208 | Sputter Deposition in ManufacturingTuesday, May 12 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial emphasizes issues of practical importance to those using sputtering as a manufacturing process. It is intended for engineers, sci-entists, and technicians who would like an understanding of the factors that influence product throughput, coating quality, and process ro-bustness and reliability. The primary focus will be on the use of planar magnetrons of various shapes, but other sources will be covered as well. The relationships between the sputtering conditions and important film properties –such as microstructure, composition, stress, adhesion and the resulting mechanical, electrical, and optical characteristics –will be discussed. New developments that are finding their way into practical applications also will be highlighted. No prior formal training in sput-tering is required to appreciate the Tutorial Content.

Tutorial Content• Sputtering plasmas and the nature of the sputtering process• Estimating deposition rates and rate limiting factors• Cathode geometries and associated film thickness profiles• Film composition and compositional uniformity• Biased sputtering and the use of unbalanced magnetrons• Sources of substrate heating• rf sputtering of dielectrics from insulating targets• The dc, pulsed dc, and ac reactive sputtering of dielectrics• Process control methods for reactive sputtering• Arcing, disappearing anodes, and other process stability issues• Ion beam sputtering

Instructor: David Glocker, Isoflux IncorporatedDavid Glocker is President of Isoflux Incorporated, a manufacturer of magnetron equipment, which he founded in 1993. He has more than 20 years’ experience in thin film research, development, and manufacturing and has taken a number of new processes from laboratory-scale feasibility studies through successful production. He is an inventor or co-inventor of 25 U.S. patents and an author of more than 25 research papers in the areas of sputter source design, plasmas and plasma characteristics, sources of substrate heating in sputtering, and the control of sputtering processes and sputtered film properties. He also is the co-editor of The Handbook of Thin Film Process Technology, a major reference work in the field.


C-211 | Sputter Deposition onto Flexible SubstratesTuesday, May 12 8:30 a.m.–4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for engineers, scientists, and others who are interested in sputter deposition onto polymer substrates in a roll-to-roll format. This tutorial will emphasize practical aspects of the topics, and the treatment will be descriptive with little mathematics used. Some of the material presented overlaps with material presented in our other offering, “Basics of Vacuum Web Coating” (C-204). Feel free to contact the instructor if you feel uncertain about which tutorial is most appro-priate for your needs. There will be time dedicated to problem solving; bring your questions and problems and leave with new solutions and/or new directions.

Tutorial Content

This tutorial provides the participant with an introduction to:• Markets for sputter-coated web products• Vacuum technology for sputter web coating• Substrate characteristics• Web handling, web winding, and web cooling issues• The sputter coating process• Process and product monitoring methods• Current topics in sputter web coating

Additionally, the notes provide extensive information and references to sputtering (written at several levels) and a comprehensive bibliography on sputter web coating.

Instructor: Donald J. McClure, Acuity Consulting and TrainingDonald J. McClure is President of Acuity Consulting and Training and recently retired from 3M’s Corporate Research Laboratory, where he spent 25 years working on a broad range of products and projects that utilized vacuum roll coating and processing. Don served the Society of Vacuum Coaters in many roles including President and Sec-retary. He has offered his tutorials on the “Basics of Vacuum Web Coating” and “Sput-ter Deposition onto Flexible Substrates” for many years. His presentation, “A Wizard’s Guide to Vacuum and Vacuum Coating,” has received rave reviews from attendees. He was the SVC’s 2004 Nathaniel Sugerman Award recipient.




C-308 | Tribological CoatingsTuesday, May 12 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for design engineers, materials scientists, and coatings developers who have a need to specify and develop coatings for tribological applications (i.e., those in which wear must be reduced or prevented and/or friction minimized). The coatings also may need to have corrosion-resistant properties to operate in arduous conditions. The tutorial begins with a description of the mechanics of wear and discusses the problems of selecting coatings for optimal tribological performance. An overview of the main processes for producing tri-bological coatings is given, emphasizing vacuum deposition methods. Tribological test methods also are over-viewed, including tests for adhesion and mechanical properties. Coatings developed for enhanced tribological properties are described, and information is provided on some applications for these coatings.

Tutorial Content• Wear mechanisms and theories (adhesion, abrasion, erosion,

fatigue, corrosion, etc.)• Tribological and mechanical test methods (e.g., pin on disc, abra-

sive wheel, scratch adhesion, microhardness, etc.)• Coating processes and selection• Benefits of ceramic coatings by PVD methods• Information on tribological coatings (e.g., metal nitrides, carbides,

oxides, superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes)

• Applications information (e.g., metal cutting and forming, mold-ing, bearings, pumps, auto parts, etc.)

Instructors: Allan Matthews, University of Sheffield, United Kingdom and Bill Sproul, Reactive Sputtering, Inc.Allan Matthews is Professor of Surface Engineering, and Head of the Department of Engineering Materials at the University of Sheffield, UK. He has been working on plasma-assisted PVD processes for about 30 years. He spent his early career in the aerospace industry and subsequently carried out research into enhanced plasma-based coating and treatment processes as well as test and evaluation methods. He holds eight patents in these fields and has authored or co-authored over 330 publications, including the book, Coatings Tribology (Elsevier, 2009). He is a SVC Board Member and a former Chair of the Executive Committee of the Advanced Surface Engineering Division of the AVS. He is a former Chairman, Symposium Committee member and Proceedings Editor for the ICMCTF Conference. He a member and past Chair of the British Vacuum Council and a Co-Editor of the Elsevier journal, Surface and Coatings Technology.

Bill Sproul is the founder and owner of Reactive Sputtering, Inc. Prior to starting his own company, he worked at Advanced Energy Industries, the Borg-Warner Corpora-tion, Northwestern University, and Sputtered Films, Inc. Throughout his career he has been involved with the sputter deposition of hard materials for wear and corrosion applications. He is the author or co-author of more than 149 technical papers. He has 11 patents to his credit, and he is the inventor of the high rate reactive sputter-ing process. He is a past president of the American Vacuum Society, and he chaired the International Conference on Metallurgical Coating and Thin Films (ICMCTF) three times. He is an AVS Fellow, and in 2003 he received the SVC Mentor Award and the AVS Thornton Award. He currently serves on the SVC Board of Directors and is the ICMCTF treasurer.


C-315 | Reactive Sputter DepositionTuesday, May 12 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial covers the fundamental mechanisms and technology of high rate reactive sputter deposition of conducting and insulating thin films. Following a brief introduction to reactive sputtering, including discussion of basic issues, target choices, and system configurations, we examine the effects of reactive gas addition on target surface and glow discharge processes which control film growth rates. Deposition approaches used in reactive sputtering – dc, rf, magnetron, pulsed dc,

and ion beam – are discussed and compared. Process control strategies (e.g.: flow, partial pressure, and target voltage, and multi-loop control) and their implementation are described in detail using numerous examples. The advantages and disadvantages of these different modes of operation are examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understand-ing of reactive sputter deposition to provide direction in designing new processes. The effects of energetic particle irradiation (positive and negative ions and fast neutrals) on film properties are also discussed. Present and future trends in reactive sputter deposition are addressed.

Tutorial Content• Introduction to reactive sputter deposition of conducting and in-

sulating thin films• Target processes during reactive sputtering• Glow discharge volume processes during reactive sputtering• Deposition technologies used in reactive sputtering (dc, rf, mag-

netron, pulsed dc, ion beam)• Process control strategies• Particle irradiation effects during film growth• Film properties• Computer-based modeling

Instructor: Joe Greene, Editor-in-Chief of Thin Solid Films, the D. B. Willett Professor of Materials Science and Physics, University of Illinois, and Past Director of the Frederick Seitz Materials Research Laboratory.

For Joe Greene’s profile, see C-311 (Saturday)


Wednesday, May 13

V-207 | Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum SystemsWednesday, May 13 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is designed to teach the basic fundamentals of vacuum technology to technicians, equipment operators, line process opera-tors, and maintenance personnel. This tutorial will address how to use and maintain an existing vacuum effectively, not how to design a system. The introduction will consist of a very basic explanation of what a vacuum is and how it is attained and proceeds to an explanation of the three gas flow regimes (i.e., viscous, transition, and molecular flow). This is followed by a description of the types of pumps used in the viscous flow region (e.g., mechanical displacement pumps, venturi/suction pumps, and sorption pumps). Types of high vacuum pumps are next discussed; these include diffusion pumps, turbopumps, and cryopumps.

The next section deals with the care and maintenance of pumps and vacuum systems, including both compressible “rubber” gasket and metal gasket systems. The unique role that water plays in both pump-down from atmosphere and in outgassing will be addressed, and tech-niques to ameliorate its harmful effects will be presented. The effects of other unique “bad actors” will be discussed also. Many useful charts and tables will be presented and explained.

Participants are requested to present any problems or difficulty that they may be experiencing with their vacuum systems for discussion. This makes for very interesting examples, and the problem might actu-ally be solved.

Tutorial Content• Introduction to vacuum• Explanation of the three gas flow regimes• Viscous flow pumps• High vacuum pumps• Care and maintenance of pumps and vacuum systems including

both compressible “rubber” gasket and metal gasket systems

• Evaluating system performance: pumpdown rate and leak-up rate• Leak detection and correction• Cleaning and conditioning of vacuum components and system• Operation of vacuum systems: crossover pressure, interlocks, and

safety• Applications of vacuum systems for vacuum coating• Pumpdown and outgassing

Instructor: Robert A. Langley, Oak Ridge Scientific Consultants (retired)Robert (Bob) A. Langley retired from Oak Ridge National Laboratory in 1994 and San-dia National Laboratories in 1999. He has performed research in the fields of atomic and molecular physics, solid state physics, material science, vacuum science and tech-nology, upper atmospheric phenomena, fusion power research, and high-energy accel-erators, published over 130 scientific papers and is a Fellow of the American Vacuum Society. He obtained his BS, MS and PhD in physics at Georgia Tech and accepted visiting academic positions at Princeton University and University of New Castle, Aus-tralia. He is associate editor of Vacuum Technology and Coating magazine, teaches vacuum related tutorials for the American Vacuum Society and the Society of Vacuum Coaters, served on the Board of Directors of the AVS, and at present consults on vacuum science and technology, and microwave material processing.


C-212 | Troubleshooting for Thin Film Deposition ProcessesWednesday, May 13 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

Vacuum deposited thin films are used for optical coatings, electri-cally-conductive coatings, semiconductor wafer fabrication, and a wide variety of other uses. They may be deposited on glass, plastic, semi-conductors, and other materials. Usually, a vacuum deposition process produces durable, adherant films of good quality. But what do you do when things go wrong? Not all films can be deposited on all substrate materials. Sometimes films peel off or crack. Other times they are cloudy, absorbing, scattering, or have other unacceptable properties.

This tutorial will teach you about techniques and tools that can be used to identify the source of the problems, correct the process, and get back into production. It will also help in learning how to develop new processes and products. The tutorial is designed for process engineers and technicians, quality control personnel, thin film designers, and maintenance staff.

Tutorial Content• Mechanical, electrical, and optical properties of thin films• Process parameters that affect film properties• Gauge and instrument calibration• Properties of substrate surfaces• Measurement of film stress• Detection of contamination• Introduction to surface analysis techniques (Auger, ESCA, SIMS,

FTIR)• Substrate preparation and cleaning

Instructor: Gary S. Ash, Castle Brook CorporationGary S. Ash is President of Castle Brook Corporation, Dartmouth, MA. The company provides technical and management consulting services for the vacuum and cryogen-ics industry. He has had more than 35 years of experience in vacuum systems, pumps and other components, deposition processes ranging from evaporation to sputtering to molecular beam epitaxy. Engineering experience includes equipment and process design, manufacturing process development, materials and failure analysis, and ap-plications support. In addition, he has had extensive experience in product strategy, development, and manufacturing planning for industrial products and services. He was previously employed by the CTI-Cryogenics division of Helix Technology Corporation, ASTeX, RIBER division of Instruments SA, Optical Coating Laboratory Inc., Spectrum Systems division of Barnes Engineering Co., AAI Corporation, and American Electronic Laboratories. He holds BS and MS degrees in electrical engineering from Cornell Uni-versity and a PhD in optical physics from Heriot-Watt University, Edinburgh, Scotland.


C-304 | ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and ApplicationsWednesday, May 13 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for scientists, engineers, technicians, and others, interested in understanding the deposition and properties of transparent conductive coatings (TCCs). The major topic of the tuto-rial is indium tin oxide, ITO. Deposition by dc magnetron sputtering is emphasized although all common deposition processes are described. Specific examples of the ITO properties achieved with evaporation, reactive and ceramic target sputtering deposition processes are shown. Post-deposition processing also is discussed. A methodology is de-scribed for developing an ITO (or any TCC) deposition process in your own equipment. Typical ITO properties are compared with those achieved by optically enhanced metals TCC (alternative TCO to ITO are mentioned but not discussed in detail – see C-321). The selection and design of a TCC to meet the requirements of a particular applica-tion are presented. Some knowledge of basic thin film coatings and interference optics is assumed, although key basics will be reviewed. The tutorial will briefly cover the basic physics and fundamentals of conductivity. A prior introductory solid state physics tutorial would be helpful but is not required. Time will be available for questions con-cerning your process problems.

Tutorial Content• Basic physics of transparent conductive coatings (TCCs)• Major deposition methods for TCCs• Control of TCC Film Properties• Selection of deposition method and process conditions• TCC performance in applications• Manufacturing issues• Optional topics

– Thin film optics– Metal Nitride TCC

Instructor: Clark Bright, 3M CompanyClark Bright is a Senior Staff Scientist and Group Technical Leader with 3M Corpora-tion. He is directing the development and scale-up of processes for vacuum deposition of multilayer organic and inorganic thin film products. He previously was Vice President at Presstek, Inc., and its Delta V Technology subsidiary, where he directed the R&D of transparent conductive oxides, barrier coatings, polymer multilayer (PML) technology, and custom vacuum coating equipment. While at Southwall Technologies, as Director of Product Development he led the development of a web coating process for sputter depositing a durable, conductive (ITO), multilayer antireflection coating on plastic film used on CRT computer monitors. He has published and presented numerous papers on optical coatings and holds 11 patents in the field.


C-317 | The Practice of Reactive Sputtering Wednesday, May 13 8:30 a.m. –4:30 p.m.Tutorial fee: $540 Student fee: $95

This tutorial is intended for engineers, technicians, materials scientists, and coating developers, who have a desire and need to understand how the reactive sputter deposition process really works. The goal of the tu-torial is to give the student a thorough understanding of all of the fac-tors that affect the reactive sputtering process in order that the student can apply this knowledge to improve their reactive deposition process and achieve both high deposition rates and excellent film properties.

This tutorial covers the basics of reactive sputtering followed by a comparison of the use of flow control versus partial pressure control of the reactive gas. The latter allows operation in the transition region between the metallic and poisoned states of the target, and films can be deposited at much higher rates with excellent properties using partial pressure control compared to flow control of the reactive gas. Along with using partial pressure control, it is important to use the right type



of power to assure that there is no arcing during the deposition. Which type of power to use and along with which partial pressure sensor are reviewed. Large area coating presents special challenges for the control of the reactive gas, and the need for multiple gas inlets along the length of a long cathode and sensing in each gas inlet zone are discussed. The requirements for a partial pressure control system along with commer-cially available controllers are presented. Multiple gas reactive sputter-ing and reactive high power pulsed magnetron sputtering (HPPMS) are emerging areas that are advancing the state of the art for reactive sput-tering. How they work and what factors are important for controlling these two processes are discussed.

Tutorial Content• Basics of reactive sputtering• Flow control versus partial pressure control of the reactive gas• Power supplies for reactive sputtering• Reactive gas sensors• Large area reactive sputtering• Control systems for reactive sputtering• Multiple gas reactive sputtering• Reactive high power pulsed magnetron sputtering

Instructor: Bill Sproul, Reactive Sputtering, Inc.

For Bill Sproul’s profile, see C-308 (Tuesday)


Thursday, May 14

C-320 | Diamond Like Carbon Coatings – from Basics to Industrial Realization (half-day)

Thursday, May 14 8:30 a.m. –12:30 p.m.Tutorial fee: $385 Student fee: $70

This tutorial is recommended for engineers and R&D staff members, who are involved in specifying new designs and surface treatments for components and tools. The application of Diamond Like Carbon, often in combination with pre-treatments like plasma nitriding and polish-ing, allows much improved wear resistance (abrasive, adhesive, fatigue) and to reduction of friction forces. Under the umbrella name of DLC, various classes of coatings have been developed, where each class of coatings has its own deposition technology and coating characteristics. The industrial applications are presently mainly in components for e.g. automotive, aerospace, general machine building.

Tutorial Content• Basics and standardization• Classification of different DLC’sß• DLC’s in comparison to diamond films• Structure of hydrogen free and hydrogenated DLC’s• Mechanical properties of DLC’s• Tribological behaviour of DLC’s• Carbon based coating systems• Technology and processes• PVD processes for deposition of hydrogen free DLC films• Plasma assisted CVD processes for preparation of a-C:H and

modified a-C:H:X coatings• Hybrid processes• Duplex processes• Sputter deposition of metal containing a-C:H:Me coatings• Sputter deposition of metal free a-C:H coatings• Improved coating adhesion by interlayer systems• Industrial applications• Contact modes and wear mechanisms• Coating design for specific wear mechanisms

• Industrial DLC applications• Industrial deposition methods• Representative industrial examples• Near future expectations

Instructors: Thomas Schuelke, Fraunhofer USA, Klaus Bewilogua, Fraunhofer-Institute, Braunschweig, Germany, and Gerry van der Kolk, Ionbond Netherlands b.v., Venlo, The NetherlandsThomas Schuelke holds M.Sc. and Ph.D. degrees in physics and has worked for the Fraunhofer Society for 13 years. He gained industrial experience in the semiconductor industry. Currently he manages Fraunhofer USA’s activities in advanced industrial coat-ing technologies. His team performs applied R&D projects for industry and govern-ment with a focus on carbon-based materials.

Klaus Bewilogua studied physics at the Technical University in Dresden, Germany, and completed his thesis in 1973. In the following time he was research assistant at the Technical University in Chemnitz, Germany, where he worked on structure analyses of amorphous materials and on the plasma assisted deposition of hard coatings. 1983 he qualified for lecturer. In 1990 Klaus Bewilogua joined the Fraunhofer Institute for Surface Engineering and Thin Films in Braunschweig, Germany. As head of a depart-ment he is responsible for R&D in the field of hard coatings, especially diamond-like carbon and cubic boron nitride.

Gerry van der Kolk has studied physics and has received his Ph.D at Delft University. His working experience is partly R&D (Delft University, Philips Research, Brookhaven NL), partly equipment building (Gemco, Hauzer). His present position is Director of Ionbond Europe and global co-ordinator for the segment Components, in which he is involved in application development of DLC’s.

C-321 | Alternative Transparent Conductive Oxides (TCOs) to ITO (half-day)

Thursday,May 14 8:30 a.m. –12:30 p.m.Tutorial fee: $385 Student fee: $70

This tutorial is intended for scientists, engineers, technicians, and oth-ers, interested in understanding the options and issues in selecting an alternative n-type TCO to indium tin oxide, ITO. Potential alternatives other than TCO such as organic conductors and nanomaterials are not discussed. Emerging TCO alternatives for cost sensitivity applications, performance driven applications and the many cases in which a com-promise between cost and performance must be made, are discussed Typical ITO properties are summarized and compared with those achieved by emerging TCO coatings. A methodology is developed for selecting the alternative TCO coating to meet the requirements of a particular application.

It is strongly recommended that SVC tutorial, C-304 “ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Proper-ties and Applications” be taken prior to this tutorial. Some knowledge of introductory solid state physics, the fundamentals of conductivity, thin film optical interference coatings and common vacuum deposition methods also is assumed.

Tutorial Content• Introduction• Performance expectations – ITO baseline• TCO replacement candidates• Cost OR performance driven application?• Cost AND performance application – Compromise• E/O Summary of Some Alternative TCO Materials• Alternative TCO performance

Instructor: Clark Bright, 3M Company

For Clark Bright’s profile, see C-304 (Wednesday)


C-324 | Atmospheric Plasma Technologies (halfday)New!Thursday, May 14 8:30 a.m. –12:30 p.m.Tutorial fee: $385 Student fee: $70Atmospheric plasma technologies is a rapidly growing area in plasma-assisted technologies. However, the atmospheric plasma requires a special design of plasma sources to ensure non-equilibrium, i.e. non-thermal plasma in a number of applications in coating and surface treatment. Technologies using the atmospheric pressure plasma sources bring about fast processes, but it is important to be aware of limits giv-en by atmospheric plasma properties and plasma chemical reactions. This introduction tutorial addresses the most important principles and applications of non-thermal atmospheric plasma.Tutorial Content

• Cold atmospheric plasma sources - principles, problems to solve• Corona and Dielectric Barrier Discharges (DBD)• Microwave atmospheric plasmas• Radio frequency atmospheric plasma sources• Fused Hollow Cathodes• Advantages and limits of the atmospheric plasma sources• Applications of the atmospheric plasma

Instructors: Ladislav Bárdos and Hana Baránková, Uppsala University and BB Plasma HB, SwedenFor the instructor’s profiles, see C-210 (Monday)

C-325 | Introduction to Nanotechnology: What the Technical and Business Professional Should Know (halfday)New!Thursday, May 14 8:30 a.m. –12:30 p.m.Tutorial fee: $385 Student fee: $70The prefix “nano” is now attached to many products and research areas. Does “nano” really mean anything? Nanotechnology is unique in that

it is not limited to one particular industry segment of materials set. Rather, nanoscience leads to new ways of manipulating materials which could potentially revolutionize a wide cross-section of existing technol-ogies, including the thin film industry. If we allow “nano” to become no more than a marketing gimmick, however, the potential for public mis-understanding leading to fear and ill-conceived regulation increases. This tutorial aims to teach what nano is and how we got there. The goal is to equip attendees with enough background information to ask hard questions and lead a rational and broad-based conversation on the risks and rewards of nanotechnology. A technical degree is not required.

Tutorial Objectives• Understand what the term “nano” really means, outside of the

hype• Ask meaningful questions about socially responsible nanotechnol-

ogy development• React appropriately to legislative initiatives concerning the regula-

tion of nano• Explore how technological development inevitably leads to na-

noscale processing• Visualize where future developments in nanotechnology may lead

and how they might affect conventional technologies

Instructor: Paul Burrows, ConsultantPaul Burrows is a Science and Technology Consultant based in Kennewick, WA with 22 years of experience in nanoscale research and development. From 2000 – 2008 he was a Laboratory Fellow at Pacific Northwest National Laboratory in Richland, WA, where he managed a broad research initiative in nanoscience and nanotechnology and organic light emitting devices (OLEDs) for displays and solid state lighting. He was previously a Research Scholar at Princeton University, where he was part of the research team that developed multiple technology platforms around stacked, transpar-ent, phosphorescent and flexible OLEDs. He has also held research appointments at the University of Southern California and the Riken Institute in Saitama, Japan. He graduated with a PhD in Physics from Queen Mary College, University of London in 1989, has co-authored over 110 publications and is named as a co-inventor of 78 issued U.S. Patents.

California here we come!There’s something so romantic about California. The SVC conference dates in May will assure us of a breath of vibrant spring as we meet in the Santa Clara Valley, tucked between the mountains to the west and the bay to the east.

Companions, don’t underestimate all the wonderful options we’ll have to explore in the Santa Clara area: beautiful old missions, his-toric mansions, a docent-led tour of an art museum and its gardens, a quiet meditation in the olive garden of a monastery, a walk through fragrant rose gardens in peak bloom, wonder about the Winchester House mysteries, enjoy the Museum of Quilts and Textiles, check out the history of flight, or savor 150+ teas and scrumptious treats at a very special tea room. Who knew Santa Clara had so much to offer?

Getting around will be easy. Right outside the door of the Conven-tion Center is the light rail station which will whisk us around town and off to San Jose or other stops. The adventure of new sights and unique discoveries is calling!

Companions are invited to meet for breakfast at the Hyatt Regency on Monday morning, May 11 to renew friendships and greet new guests. We will coordinate a special visit from the hotel concierge staff to provide information on some of the top local attractions and answer questions. Start your day there and head out on your own or with a group to share the fun together. We always have a great time!

Special Winery Tour DayWine tasting in the Santa Cruz Mountains is an experience to savor. Among the nearly 80 wineries sprinkled throughout the appellation are small, fam-ily-run operations where the first one to greet you on arrival will be the winery dog, ridge-line estate wineries with pan-oramic vistas of the Monterey

Bay, and slope-side vineyards surrounded by redwoods and coastal madrones. The atmosphere is laid back, friendly and unrushed, the wines are out of this world, and the vintners are delighted to share their knowledge and passion for their craft with their guests.

Does that sound like fun? We would like to put together a special private tour of several wineries with gorgeous views and a picnic lunch—with wine, of course! If you are interested, the cost would be between $50-80 depending on the number of guests and whether we go to wineries that charge for tastings and tours.

For the Special Winery Tour, please contact Jodie McClure, SVC Companions Hostess, [email protected], by April 15, 2009, and she will finalize the arrangements and cost.

InvitationtoallCompanions


If you are unable to register on-line, you may use the form on the inside back cover of this brochure. 1. Conference Registrant (including presenters and students) Complete the full registration form including the payment section2. Invited Presenter ONLY (already approved by the Program Chairs) No fee is required but it is necessary to complete the registration form3. Tutorial Registrant ONLY (including students) Note: It is not necessary to register for the TechCon in order to reg-

ister for tutorials or visit the Exhibit.4. Personnel from an Exhibiting Company Individuals from Exhibiting companies who wish to register for the

TechCon or tutorials have a special path to follow using the On-line Registration System, and a special box to check on the Conference Registration form (opposite).It is strongly recommended that Exhibit booth contacts ask their booth personnel to individually register for the TechCon if using the On-line Registration System, since there are opportunities to register for other events (such as the Networking Event at The Tech Museum of Innovation in San Jose) and/or purchase other products.

5. Media Personnel ONLY—No fee is required6. Exhibit Visitor ONLY—No fee is required.

General Conference Information• Special reduced TechCon registration fees apply to students and

member/nonmember presenters.• All Conference registrants will receive a copy of the CD-ROM for

the 1991–2009 Conference Proceedings to be released in the Fall of 2009.

• Conference registrants (ONLY) are eligible to purchase the printed Conference Proceedings at the special rate of $46 (plus $15 for ship-ping outside North America).

• Register early! Individual tutorial fees and conference registration fees are $100 higher than the fees in this Preliminary Program after April 18, 2009.

�0 Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org

SVC�00�TechConRegistrationforTechConandTutorialRegistrants,PersonnelfromanExhibitingCompany,MediaPersonnel,andExhibitVisitorsThe On-line Registration process at www.svc.org will guide you through the registration steps.

• Only Conference registration and tutorial cancellations received on or before April 18, 2009, will be refunded. Refunds will be made upon receipt of a written notice, less a $25 service fee for the TechCon and each individual tutorial. No refunds will be made for cancellations received after April 18, 2009.

Membership Issues—Please Note!You must pay your 2009 Membership Dues before you can register at the “Member Rate” for the 2009 TechCon.

Special NeedsIf you have disability or dietary needs, please contact SVC with the details.

On-Site RegistrationSVC Registration is located in the foyer of the Santa Clara Convention Center. If you are not attending a tutorial, please pick up your badge after 8:30 a.m. if possible. Saturday May 9 7:15 a.m.–10:00 a.m. Tuesday May 12 7:15 a.m.–5:00 p.m.Sunday May 10 7:15 a.m.–8:00 p.m. Wednesday May 13 7:15 a.m.–5:00 p.m.Monday May 11 7:15 a.m.–8:00 p.m. Thursday May 14 7:30 a.m.–11:30 a.m.

Conference Registration Fees • TechCon Registration fees include the following social/network-

ing events:• Welcome Reception on Sunday, May 10• Reception in the Exhibit Hall on Monday, May 11• Luncheon in the Exhibit Hall on Tuesday, May 12• Technology Forum Breakfasts on Monday and Tuesday, May 11

and 12• Beer Blast in the Exhibit Hall on Tuesday, May 11

• SVC Membership for 2009 is provided to those paying the Non-member fee.

Tutorials Offered at the 2009 TechCon• SVC reserves the right to cancel any tutorial. If a tutorial is can-

celled registrants will be notified, and a full refund of tuition will be made.

• A Discount package price of $1,450 ($425 for students) is available (with only one textbook included) if you register for V-201, V-202, and V-203 on Saturday, Sunday, and Monday.

• Tutorials are full day (8:30 a.m. to 4:30 p.m.) unless otherwise noted. The schedule for half-day tutorials are either (8:30 a.m. to 12 noon) or (1:00 p.m. to 4:30 p.m.).

Saturday,May�V-201 High Vacuum System Operation (includes text)C-103 Introduction to Physical Vapor Deposition (PVD) Processes (includes text)C-311 Thin Film Growth and Microstructure EvolutionC-104 An Introduction to Optical Coatings Sunday,May10 C-203 Sputter Deposition (Day 1) (2-days Sunday & Monday)V-202 Vacuum System Gas AnalysisC-301 Optical Coating Design and Monitoring (includes text)C-314 Plasma Modification of Polymer Materials and Plasma Web TreatmentC-323 High Power Impulse Magnetron SputteringC-322 Characterization of Thin Films

Monday,May11C-203 Sputter Deposition (Day 2)V-203 Vacuum Materials and Large System Performance (includes text)C-303 Numerical Methods for Optical CoatingsC-101 Primer on Thin Films and Vacuum TechnologyC-210 Introduction to Plasma Processing Technology (half-day p.m.)

Tuesday,May1�C-208 Sputter Deposition in ManufacturingC-315 Reactive Sputter DepositionC-211 Sputter Deposition onto Flexible SubstratesC-308 Tribological CoatingsWednesday,May1�C-212 Troubleshooting for Thin Film Deposition ProcessesC-317 The Practice of Reactive SputteringC-304 ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and ApplicationsV-207 Practical Aspects of Vacuum Technology: Operation & Maintenance of Production Vacuum SystemsThursday,May1�C-324 Atmospheric Plasma Technologies (half-day a.m.) NEW!C-321 Alternative Transparent Conductive Coatings (TCOs) to ITO (half-day a.m.).C-320 Diamond Like Carbon Coatings – from Basics to Industrial Realization (half-day a.m.)C-325 Introduction to Nanotechnology (half-day a.m.) NEW!

Conference Registration FormFull Name: _____________________________________________________________________________________________________________Title: ❏ Equipment Development Engineering ❏ Process Development Engineering ❏ Staff Scientist ❏ R&D or Production Manager ❏ Marketing/lSales Manager

❏ Technician/Operator ❏ R&D or Professor ❏ Student: Undergraduate/Graduate/Post Graduate ❏ Other ___________________________________

Organization:____________________________________________________________________________________________________________

Address:_______________________________________________________________________________________________________________

City: _________________________ State: ______________________ Zip/Postal: _____________ Country:________________________________

Phone: ____________________ Fax: ___________________________ E-mail: ______________________________________________________

How did you learn about the SVC Technical Conference?❏ SVC Communication ❏ Bulletin❏ Call for Papers/Exhibit Prospectus ❏ Marketing E-mail❏ TechCon Exhibit Guide ❏ SVC Web Site❏ Preliminary Program ❏ Colleague❏ Other/Magazine _____________________________________

Is this your first visit to the SVC TechCon?❏ Yes ❏ NoPlease indicate any Special Needs:❏ Dietary❏ Disability

Which Sector best describes your Organization?❏ Industry ❏ Research Institute❏ Academia ❏ Equipment Supplier❏ Government ❏ Consultant❏ Other ______________________________

May we share your contactinformation with our Sponsors?❏ Yes❏ No

› Renew Your Membership for 2009 or Join SVC On-Line Member‡ Non-MemberAttendee Registration (through 4/18/09/after 4/18/09) (through 4/18/09/after 4/18/09)

❏ Full Conference . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$545 .00/$645 .00 . . . . . . . . . . $735 .00/$835 .00

❏ Invited Presenter . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . .$0 .00

❏ Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$340 .00/$440 .00 . . . . . . . . . . $510 .00/$610 .00 Note: Presenter Rate does not apply to co-authors

❏ Media Personnel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . .$0 .00

❏ Student Conference . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $65 .00 . . . . . . . . . . . . . . . . . . .$65 .00

❏ Student Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $40 .00 . . . . . . . . . . . . . . . . . . .$40 .00

❏ Tutorial(s) Only . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . See Fees Below . . . . . . . . . . . . See Fees Below

❏ Exhibit Visitor Only . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . .$0 .00 ‡Member Fee applies only to those who have paid their 2009 Membership Dues. If the fee has not been paid and the Member rate is checked, then SVC will charge the membership dues to the credit card provided.

› Renew Your Membership for 2009 or Join SVC On-Line Member‡ Non-MemberExhibitor Registration (through 4/18/09/after 4/18/09) (through 4/18/09/after 4/18/09)

❏ Exhibitor Booth Personnel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . .$0 .00

❏ Exhibitor with Full Conference Registration . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$545 .00/$645 .00 . . . . . . . . . . $735 .00/$835 .00

❏ Exhibitor Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$340 .00/$440 .00 . . . . . . . . . . $510 .00/$610 .00

Tutorials Offered at the 2009 TechCon: It is NOT necessary to register for the Conference in order to attend a tutorial or visit the Exhibit . SVC reserves the right tocancel any tutorial . If a tutorial is cancelled registrants will be notified and a full refund of tuition will be made . All tutorial fees are $100 higher after April 18, 2009 (this increase does not apply to students). A Discount package price of $1,450 ($425 for students) is available (with only one text book included), if you register for V-201, V-202 and V-203 on Saturday, Sunday and Monday .

Saturday, May 9 Reg/Student

❏ V-201* $640/$190❏ C-103* $640/$190❏ C-104 $540/$95❏ C-311 $540/$95

Sunday, May 10 Reg/Student

❏ V-202* $640/$190❏ C-203 (2-Day) $890/$190❏ C-301* $595/$190❏ C-314 $540/$95❏ C-322 $540/$95

*Textbook included with these courses.

Monday, May 11 Reg/Student

❏ V-203* $640/$190❏ C-101 $260/$45❏ C-210 $385/$70❏ C-303 $540/$95

Tuesday, May 12 Reg/Student

❏ C-208 $540/$95❏ C-211 $540/$95❏ C-308 $540/$95❏ C-315 $540/$95

Wednesday, May 13 Reg/Student

❏ C-212 $540/$95❏ C-304 $540/$95❏ C-317 $540/$95❏ V-207 $540/$95

Thursday, May 14 Reg/Student❏ C-320 $385/$70❏ C-321 $385/$70❏ C-324 $385/$70❏ C-325 $385/$70

Special Events at the TechCon❏ Mr. Wizard Program (Sunday afternoon) (Space is limited . First come—first seated) . . . . . . . . . . No fee

❏ SVC Foundation 5K Run — T-Shirt Size ❏ S ❏ M ❏ L ❏ XL ❏ XXL . . . . . . . . $25 .00

❏ Welcome Reception on Sunday evening . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . No fee

❏ The Tech Museum Networking Event (includes dinner, wine tasting and entertainment)on Tuesday evening . . . . . . . . . . . . . . . . . . . . . . _______ tickets at $62 each = ___________

Payment Information❏ Visa ❏ MasterCard ❏ American Express ❏ Discover ❏ Bank Transfer ❏ Check #__________ ❏ PO #_________

Credit Card Number: ___________________________________ Expiration: ___________________ Total Due___________________

Security Number: ___________________________________ Please Print Name: _______________________________________________ Security number is on the back of your card . Visa/MC/DCVR - 3 digits . Amex - 4 digits Print name as it appears on the card .

Signature: ___________________________________ Billing Zip: __________________

Society of Vacuum Coaters • 505/856-7188 • Fax 505/856-6716 • E-mail [email protected] • www.svc.org �1

Society of Vacuum Coaters 71 Pinon Hill Place NE Albuquerque, NM 87122-1914 USA

09TechnicalConference

Exhibit and Education Program

• Conference Registration • Hotel Reservations • SVC Foundation 5K Run &Walk • Networking Event • Education Program

M ay 9 – 1 4 , 2 0 0 9 ~ S a n ta C l a r a C o n v e n t i o n C e n t e r ~ S a n ta C l a r a , C A

Register On-line

Join, Renew and Register at www.svc.org

technical program - society of vacuum coaters · 2012-06-14 · society of vacuum coaters •...

Documents