suss micro optics, wafer scale manufacturing, r. voelkel, june 2009
TRANSCRIPT
Wafer Scale Manufacturing
Processes In Optical
Technologies For IlluminationReinhard Völkel
SUSS MicroOptics, Neuchâtel
www.suss.ch, [email protected]
2
Light Makes The Difference!
Egyptian God Ra with Madame Taperet , 1000 BC (Louvre, Paris)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Light Makes The Difference!
3
Thomsas A. Edison (Patent 1880)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Lighting Roadmap
4
Lighting, Illumination: Optics Is Light Work!
5 Source: 3M Vikuiti, ASML, Coherent
Light Sources Devices, Systems
„Collect all photons and illuminate!“
Performance (brightness, contrast, color,
uniformity, efficiency)
Size (larger area, smaller device)
Costs (manufacturing, energy saving, lifetime)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Conservation of Etendue – Lagrange Invariant
Etendue is a property of an optical system, which characterizes how
"spread out" the light is in area and angle.
Lagrange invariant is a measure of the light propagating through an
optical system. For a given optical system, the Lagrange invariant is a
constant throughout all space, that is, it is invariant upon refraction and
transfer.
6R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Concepts for Illumination
Optical Design & Illumination
Leonard Euler (1707 – 1783)
8R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
In 1893 August Köhler (1866–1948) from
Carl Zeiss in Jena, introduced a new and
revolutionary method for uniform illumination
of specimen in an optical microscope in his
doctoral thesis.
The Köhler method allows to adjust the size
and the numerical aperture of the object
illumination in a microscope independent
from each other.
August Köhler, Zeitschrift für wissenschaftliche
Mikroskopie, Band X, Seite 433-440 (1893)
Köhler Illumination, Köhler Integrator (Fly‘s Eye)
9R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
In 1893 August Köhler (1866–1948) from Carl
Zeiss in Jena, introduced a new and revolutionary
method for uniform illumination of specimen in an
optical microscope in his doctoral thesis.
The Köhler method allows to adjust the size
and the numerical aperture of the object
illumination in a microscope independent
from each other.
August Köhler, Zeitschrift für wissenschaftliche
Mikroskopie, Band X, Seite 433-440 (1893)
Köhler Illumination, Köhler Integrator (Fly‘s Eye)
10R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
11
1946: Microlens Array Homogenizer
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
12
2005: Nikon Corporation
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Light Sources Today: More Power – Less Energy!
Uniformity
Efficiency
Costs
13R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Illumination Concepts For Displays
14
Source: 3M Vikuiti
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Richard Ulbricht Invented The Ulbricht Sphere
15
Dr. Richard Ulbricht (1849 – 1923, Dresden)
Invented the Ulbricht Sphere when he was trying to find the optimium
optics for electrical illumination of Dresden„s train stations (≈ 1891)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
LED
Reflector
LED
Substrate
Beam Collimation Beam Shaping
Intensity
Homogenization
Plastic, Glass
Tasks for Micro-Optics
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
RXI Collimator
• High efficiency LED out-coupling
• Etendue limited performance (88% max)
• Short (D / L ~ 3)
• Bezier curves description (8 surfaces)
• Direct optimization
RXI
Refraction Reflection Total Internal Refraction
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Wafer-Scale Manufacturing Is Quite Sucessful!
Wafer-based „SEMI“ technology changed our world dramatically in the
last 50 years!
Manufacturing concepts from SEMI are adapted for other products.
Computers, digital cameras, displays, LED, OLED, high-power switches,
wafer-level cameras, ...
Wafer-based „SEMI“ technology for Optics is very successful.
Question: Is it now possible to integrate Optics on the LED using
Wafer-Level Packaging?
18
Wafer-Level Camera (WLC)
Microlens Imprint Lithography (SMILE)
20
Example: Mobile Phone Cameras
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
21
Example: Mobile Phone Cameras
Wafer-Level Solutions
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
22
Microlens Replication on Wafer Level
1. Lens Imprinting 2. Lens Transfer
Stamp Holder
PDMS Stamp on glass baker
UV epoxy
Wafer
Chuck with glass inlay
Fabricated lens wafer with transferred lenses
Loaded PDMS Stamp
Fabricated lens wafer with residual layer
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
23
Wafer-Level Packaging of Lens Wafer
Substrate holder
Edge handling chuck for lens stacking
with loaded buffer wafer
Process equipment:
Substrate holder with glass inlay to hold buffer and lens wafers
by vacuum
Edge handling chuck or buffer plate avoids lens damages on
lens surfaces
Assisted Alignment for highly precise alignment of Opto wafers
prior to UV bonding
High intensity UV exposure for short process times
Loaded buffer wafer with double sided lens wafer on edge handling chuck
Opto wafer stack with UV bonded lens wafer
VAC 1
VAC 2 Substrate
Holder
Edge Handling Chuck
SUSS MA/BA8 Gen3
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
24
BMBF-VDI COMIKA: Wafer Level Camera
MA/BA8 Gen3 Micro Lens replication on 200mm waferMaterial: Delo Katiobond 18499
Basic concept of WLC sample
Schott B33, 8”
100µm
UV Bond: Delo PHOTOBOND 4302
UV Bond: Delo Katiobond AD VE18499
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Micro-Optics on Wafer-Level
Unwrapped phase / lambda
Zeiss Diffusor 6101 HH, 10-02-05 RV
SUSS MicroOptics
x / norm. radius
0.00 1260.77252.15 504.31 756.46 1008.62
y /
no
rm.
rad
ius
12
60
.77
0.0
01
00
8.6
27
56
.46
50
4.3
12
52
.15
Ph
ase
/ l
am
bd
a
-2.22
-1.63
-1.04
-0.46
0.13
0.72
10.02.2005
14:49:32
Mean -0.10
RMS 0.34
P-V 2.94
Refractive Microlens Arrays (ROE) Binary Optics Diffractive Optical Elements (DOE)
Random Diffusers, Homogenizer Wafer-Level Camera, Fiber Arrays, Sensors
25
Wafer-Level Camera for disposable endoscopes(Photo: AWAIBA)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Micro-Optics on Wafer-Level
Unwrapped phase / lambda
Zeiss Diffusor 6101 HH, 10-02-05 RV
SUSS MicroOptics
x / norm. radius
0.00 1260.77252.15 504.31 756.46 1008.62
y /
no
rm.
rad
ius
12
60
.77
0.0
01
00
8.6
27
56
.46
50
4.3
12
52
.15
Ph
ase
/ l
am
bd
a
-2.22
-1.63
-1.04
-0.46
0.13
0.72
10.02.2005
14:49:32
Mean -0.10
RMS 0.34
P-V 2.94
Refractive Microlens Arrays (ROE) Binary Optics Diffractive Optical Elements (DOE)
Random Diffusers, Homogenizer Wafer-Level Camera, Fiber Arrays, Sensors
26R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Wafer-Based Manufacturing
Technology For MicroOptics
SUSS MicroOptics – We Set The Standards
World leading supplier of high-quality Micro-Optics
8‟‟ Wafer Technology, Wafer-Level Packaging, SUSS Imprint Lithography
More than 200 active customers, e.g. to SEMI equipment manufacturers, Laser
& Optics industry, Sensors & Metrology and Medical
Part of the SUSS MicroTec Group (www.suss.com)
28
Neuchâtel, Swiss Watch Valley
SMO is “Preferred Supplier” for Carl Zeiss SMT AG:
DUV Laser Beam Shaping Solutions (ASML Steppers)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
SUSS MicroOptics – 8’’ Wafer Fab
Cleanroom facility (Class 1 – 1000) for the wafer-based
manufacturing of high-quality Micro-Optics
Fully established 8‘‘ technology based on SEMI processes
200 mm wafer size (8‟‟)
Fused silica, Borofloat, Silicon and CaF2
Refractive Microlenses: Spheres, aspheres
Diffractive Optical Elements (16-level)
Random diffusers, hybride Micro-Optics
Double sided arrays, stops, coatings
Wafer-Level Packaging, Bonding
Master Lens Arrays for Replication and
Imprint Lithography
29 R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Micro-Optics Solutions
Semiconductor Technology
Industrial Optics & Vision
Healthcare & Life Science
Metrology
Laser & Material Processing
Information Technology
Research
Unwrapped phase / lambda
Zeiss Diffusor 6101 HH, 10-02-05 RV
SUSS MicroOptics
x / norm. radius
0.00 1260.77252.15 504.31 756.46 1008.62
y /
no
rm.
rad
ius
12
60
.77
0.0
01
00
8.6
27
56
.46
50
4.3
12
52
.15
Ph
ase
/ l
am
bd
a
-2.22
-1.63
-1.04
-0.46
0.13
0.72
10.02.2005
14:49:32
Mean -0.10
RMS 0.34
P-V 2.94
Health Care & Life
Science28%
Industrial Optics, Vision14%
Information Techn.
8%
Laser & Material
Processing9%
Metrology7%
Research9%
SEMI Technology
18%
Divers7%
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Wafer-Based Manufacturing of Microlens Arrays (ROE)
SUSS MicroOptics uses standard manufacturing technologies from
Semiconductor Industry, like resist coating, lithography, resist melting,
reactive ion etching, deposition, sputtering and lift-off
Excellence in quality, array uniformity, and lateral dimension accuracy
31R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
High-Quality Diffractive Optical Elements
32
8„„ wafer scale
Binary, 8-level, 16-level
SiO2, B33, Si, CaF2
0.5 μm min feature size
< 50nm overlay accuracy
190nm to 5µm wavelength
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Laser Beam Shaping and Homogenizing
Laser Beam Shaping
Spot-GeneratorFlat-Top (1D)Flat-Top (2D Line-Generator Ablation (borosilicate)
Excimer Flat-Top
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Diffuser for Köhler Integrator
35
No diffuser Diffuser (rotating)
Experiment: Laser Diode, 670 nm, condenser lens ƒFL = 40 mm
Uniformity: > 10 % Uniformity: << 5 %
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
SEM – Images of Diffusers
36
Ground Glass 10° HT Diffuser 1° (SMO)E Diffuser (SMO)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
m
m
70
160
2
1
m
m
160
500
2
1
m
m
100
300
2
1
37
Shaping of Random Diffusers
Ground Glass Diffuser
Shaped Random Diffuser (2D)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Improved Diffuser Plates (Fused Silica)
Gauss, Super-Gauss, Flat-Top, …
No zero order, sharp cut-off, no loss in large angles
38
-5 -4 -3 -2 -1 0 1 2 3 4 5
I
HWHM
1.23°
Rotational
symmetric
Gaussian like
intensity shape
1
Enci
rcle
d E
ner
gy
90%
Encircled
Energy
Design
Value
2.52° >1.34
°
10%
Encircled
Energy
Design
Value
Encircled Energy
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Static 1D Random Diffuser
39R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
MO-Optics: Customized Illumination
for SUSS Mask Aligner
MO-Optics – YIELD IMPROVEMENT
MO-Optics
Better uniformity (± 2%)
More light (up to 25%)
Flexible illumination settings
Higher resolution for proximity, steeper sidewalls
Optimized illumination for specific mask pattern
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Example: 480 µm Proximity GAP
Aligner: MA150 @SMO, Angle Defining Element: Small Ring
Proximity Gap: 480µm
Photoresist: AZ 1.3µm dick (Silizium-Wafer)
20µm Lines & Spaces (MO-Optics, Ring) 20µm Vias (MO-Optics, Ring)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
MO-Optics: Gray-Level with Customized Illumination
#2589 Ring IFP LV0.5#2588 Malteser 0°IFP LV1.0 #2590 Malteser 45°IPF LV1.0 #2591 ohne Blende
(Proximity Lithography at Fraunhofer IOF, Jena)
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Substrate Conformal Imprint Lithography
(SCIL)
Marc A. Verschuuren, Robert van de Laar, Hans van Sprang
Philips Research
45
46
47
48 R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009
Future: Light Sources and Collimation Optics
on Wafer-Level?
SUSS.
Our Solutions
Set Standards
SUSS MicroOptics www.suss.ch
SUSS MicroTec www.suss.com
R. Voelkel, SUSS MicroOptics, „Wafer Scale Manufacturing“, World of Photonics, Panel, LASER„09, Munich, June 17, 2009