state-of-the-art thin film x-ray optics for synchrotrons

State-of-the-art thin film X-ray optics for

synchrotrons and FEL sources

Frank Hertlein – Incoatec GmbH – Geesthacht, Germany

2/20 ACTOP-2008 October 9-11 2008, Trieste Italy

Incoatec:

Innovative Coating Technologies

• Incoatec is founded with Bruker AXS in 2002

• Own R&D activities and application lab

• over 12 years of experience in X-ray optics and

over 18 years of experience in thin film technology


! Products & Services

! Multilayer coating

! Deposition of thin films

! Characterization

! Applications

• Total reflection optic for FEL

• Multi-stripe optic for Tomography Beamline

! Conclusion

Outline


Products & Services

• Multilayer mirrors

• Customized coatings for synchrotron mirrors and other applications

• Incoatec Microfocus Source I!STM

• Upgrades of existing equipment


Products:

Incoatec Microfocus Source – I!S

High performance at only 30 W

• High brilliance low-power microfocus source

• For Cu or Mo

• Air-cooled

• New type of 2D beam shaping Montel Optics:

The QuazarTM Optics

• New easy-to-align housing, optional with motors

• Low maintenance

• Tube change as easy as for conventional sealed-

tubes

• 3 Years warranty


Products:

Multilayer Mirrors

XRD SCD XRF Synchro

-tron

Göbel Mirror Montel Mirror XRF - Multilayer

AnalysatorCoating of

Synchrotron

Mirror

up to 150 cm


Products:

X-ray Optics for Synchrotron Beamlines

We produce the coating for your optic as you like!

• Special Carbon Coatings: for High

Flux Beamlines like FEL at DESY

• Multilayer (Stripes) Coatings:

optimized for the most different

applications, dimensions and shapes

• Cooperation with GKSS: R&D for

film and deposition technology

Typical mirror substrate materials:

Fused Silica, Zerodur, Silicon, …

Mirrors up to 150 cm length!


Deposition by Magnetron Sputtering

• Magnetron

• Sputtering

Optimized deposition facilities

for different sizes, gradients and precisions

Argon Plasma


Deposition of Thin Films

Magnetron Sputtering

• Monolayer, Multilayer, Graded-

Multilayer, Stripe-Multilayer

• area for deposition:

up to 150 x 12 x 12 cm

or 6’’ diameter

• film thickness: single layer 1..500 nm

• Precision: typical ±1%, up to ±0.1%

Target materials:

for Totalreflection:

C, SiC, Rh, Ru, Ir, Au, W, Cr, ...

ML-Reflector:

W, WSi2, Ru, V, La, Mo, TiO2, Ni …

ML-Spacer:

C, BN, B4C, Si,…


Requirement for coating

! good homogeneity over the whole mirror, up to 0.2%

! exact d-spacing over the whole stack, with up to several hundred pairs

! low roughness, better than 0.3 nm

! sharp interfaces, none interdiffusion


TEM-Picture of a multilayer coating

Perfect correspondence of the

layer-thickness over 500 pairs

500 pairs d = 1.4 nmSurface

Pair 470 - 498

Si-Substrate

Pair 2 - 30


Characterization with XRR

Bruker D8

with 5 DOF

motorized table

Substrates up to 30 x 30 x 6 cm!


3,8

4,0

4,2

4,4

4,6

4,8

5,0

5,2

5,4

5,6

5,8

-75 -65 -55 -45 -35 -25 -15 -5 5 15 25 35 45 55 65 75

Position (mm)

d-s

pacin

g (

nm

)

Characterization with XRR

Graded Multilayer Characterization with XRR

Datapoint

Reference value

Tolerance

±1%

d-spacing accuracy better 1% !

1.E-07

1.E-06

1.E-05

1.E-04

1.E-03

1.E-02

1.E-01

1.E+00

0 1 2 3 4 5 6 7 8 9


Characterization with SFM / AFM

Research & Development:

SFM

Scanning Force Microscope

AFM

Atomic Force Microscope

Rq,rms = 0.24±0.02 nm

Sca

nn

ing

Fo

rce

Mic

rosco

py

(F. F

elte

n, T

UH

H)

C-Film (38 nm) on Silicon


0 100 200 300

0.0

0.2

0.4

0.6

0.8

1.0

amorphous carbon layer,

d=38 nm, ! = 1.27 nm

simulation by IMD fordiamond, " = 3.5 g/cm3

d=38 nm, ! = 0 nm C-K

o

Reflectivity

Photon Energy (eV)

Application I:

Total reflection optics of carbon for FEL

Coating made by:

Substrate made by:

Optics for FEL at Desy

R(E) ~ 95-96 % at 50 - 250 eV at grazing incidence of 2

deg

Reflectivity vs. Energy measured by B. Steeg, Hasylab


Characterization

of Total Reflection Optics

XRR measurement with

Cu-K" (8 keV) at different positions

density: 2.2 g/cm3

roughness: 0.5 nm

thickness: 44.2 nm

Measured by M. Störmer, GKSS

150 cm Carbon Coating

on Si-Substrate

SPIE proceeding 2008

7077/4


Characterization

of Total Reflection Optics

150 cm Carbon Coating on Si-SubstrateMean film thickness

44.2 nm

Standard deviation

0.2 nm rms

Peak-to-Valley

~1 nm

Homogeneity

better 2 %

Measured by M. Störmer,

GKSS

< 1 nm

XRR at 27 positions

SPIE proceeding 2008

7077/4


Application II:

Multi-stripe X-ray Optics

Stripe A : [Ru/C]100, d = 40 !, " = 0.5, R > 80% for 10 < E < 22 keV

Midspace: Si111, Dorientation< 0.01°, ! = 0.1 nm, slope error 0.04’’

Stripe B : [W/Si]100, d = 30 !, " = 0.5, R > 80% for 22 < E < 45 keV

Coating made by:

Substrate made by:

Pic

ture

co

urte

sy o

f M. S

tam

pa

no

ni, P

SI-S

LS

Tomography Beamline

(M. Stampanoni, PSI-SLS)


Conclusion - Our profile

• Simulation of layer and optics properties

- Flexible, on customer request

• Physical Vapour Deposition (PVD) methods for coatings

- extreme precise coatings

- large area coatings

- with gradients / stripes / monolayer / multilayer

• Characterization of thin films

We produce the optics as you like!Flexible “in-house” manufacturing for various wavelengths and applications


Conclusion - Our costumers

• Zeiss

• JenOptik

• Desy / Hasylab

• Bessy

• University of Hamburg

• University Göttingen

• APS / ANL

• Swiss Light Source

PSI

• SESO

• …


Thank you for your attention

Incoatec GmbH

Max-Planck-Str. 2 • 21502

Geesthacht • Germany

Tel: +49(0)41 52 - 88 93 81 •

www.incoatec.de

state-of-the-art thin film x-ray optics for synchrotrons

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