sequential quadrature measurements for ......iii abstract sequential quadrature measurements for...

120
SEQUENTIAL QUADRATURE MEASUREMENTS FOR PLASMA DIAGNOSTICS by Julio Martin-Hidalgo A thesis submitted in partial fulfillment of the requirements for the degree of MASTER OF SCIENCE in Electrical Engineering Approved: Dr. Charles M. Swenson Dr. Koushik Chakraborty Major Professor Committee Member Dr. Todd Moon Dr. Mark R. McLellan Committee Member Vice President for Research and Dean of the School of Graduate Studies UTAH STATE UNIVERSITY Logan, Utah 2014

Upload: others

Post on 24-Aug-2020

6 views

Category:

Documents


0 download

TRANSCRIPT

Page 1: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

SEQUENTIAL QUADRATURE MEASUREMENTS FOR PLASMA

DIAGNOSTICS

by

Julio Martin-Hidalgo

A thesis submitted in partial fulfillmentof the requirements for the degree

of

MASTER OF SCIENCE

in

Electrical Engineering

Approved:

Dr. Charles M. Swenson Dr. Koushik ChakrabortyMajor Professor Committee Member

Dr. Todd Moon Dr. Mark R. McLellanCommittee Member Vice President for Research and

Dean of the School of Graduate Studies

UTAH STATE UNIVERSITYLogan, Utah

2014

Page 2: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

ii

Copyright c© Julio Martin-Hidalgo 2014

All Rights Reserved

Page 3: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

iii

Abstract

Sequential Quadrature Measurements for Plasma Diagnostics

by

Julio Martin-Hidalgo, Master of Science

Utah State University, 2014

Major Professor: Dr. Charles M. SwensonDepartment: Electrical and Computer Engineering

The study of the ionosphere has been very important due to its effects on terrestrial

and satellite communications. This thesis presents an introduction of the ionosphere effects,

its modeling and measurement methods that have been used along the history.

The Sweeping Impedance Probe (SIP) has proven over the years to be a reliable method

based on the radio frequency (RF) behavior of the plasma. A new SIP architecture is

presented based on the latest techniques available, using a Vector Network Analyzer (VNA)

detection and employing dynamic correction of errors with Correlated Double Sampling

(CDS) and a reference channel. The design will be detailed showing the component selection

based on their performance parameters. In this sense, several analyses have been made

to ensure that the sweep rate and accuracy requirements can be met. The testing and

calibration methodology is developed to further increase the final accuracy of the instrument.

Lastly, the main conclusions of the project are summarized and new and exciting lines

of work are presented for what is expected to be the next generation of SIP instruments.

(120 pages)

Page 4: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

iv

Public Abstract

Sequential Quadrature Measurements for Plasma Diagnostics

by

Julio Martin-Hidalgo, Master of Science

Utah State University, 2014

Major Professor: Dr. Charles M. SwensonDepartment: Electrical and Computer Engineering

The ionosphere is the atmosphere layer characterized by its high concentration of

ionized plasma. It has a great impact on radio communications with satellites, causing

disturbances and disruptions. Therefore, it is important to understand and predict the

ionosphere characteristics.

The Sweeping Impedance Probe (SIP) is an instrument for characterizing the ionosphere

used for many decades with great success. In this thesis, a new SIP architecture design is

presented using the latest techniques and components available. The design is detailed and

analyses have been performed to ensure the required performances. The new SIP will be

flown in the Auroral Spatial Structures Probe (ASSP) sounding rocket mission in early 2015,

and it is expected it will make the most accurate measurements to date.

Lastly, the conclusions of this project are presented and future work is outlined for what

will become the next generation of SIP instruments.

Page 5: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

v

To my family...

Page 6: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

vi

Acknowledgments

First of all, I would like to thank Dr. Charles Swenson. Without him this thesis would

not have been possible. He is not only a great professional but also a wonderful person.

There are many people at Space Dynamics Laboratory (SDL) involved in this project who

have helped me in one way or the other, including Chad Fish, Tim Nielsen, Cameron Weston,

Wade Cox, and many others. In particular, the coaching provided by Wayne Sanderson and

Earl Pound at the beginning of the project was very helpful.

I would like to mention professors from Utah State University (USU), where I have been

able to learn many interesting and various topics, and in some cases, who have helped me

be a better engineer and researcher developing my critical thinking and improving my skills.

I would also like to thank my family who, from far away, have given me their support

and strength. Thanks to my friend, Dean, for his corrections and the good times during

these years.

Last, but not least, I am grateful to Fundacion Obra Social La Caixa for giving me the

opportunity to study here. It has been not only very educational, but also an incredible

personal experience for me.

Julio Martin-Hidalgo

Page 7: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

vii

Contents

Page

Abstract . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . iii

Public Abstract . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . iv

Acknowledgments . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . vi

List of Tables . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ix

List of Figures . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . x

Acronyms . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . xiii

1 Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11.1 History . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11.2 Ionospheric Measurements . . . . . . . . . . . . . . . . . . . . . . . . . . . . 31.3 Plasma Physics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5

1.3.1 Plasma as a Dielectric Medium . . . . . . . . . . . . . . . . . . . . . 51.3.2 Capacitor Model . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 61.3.3 Balmain Model . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8

1.4 RF Impedance Probe Methods . . . . . . . . . . . . . . . . . . . . . . . . . 91.4.1 Plasma Frequency Probe . . . . . . . . . . . . . . . . . . . . . . . . 101.4.2 Sweeping Impedance Probe . . . . . . . . . . . . . . . . . . . . . . . 10

1.5 ASSP Mission . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 101.6 Thesis Outline . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12

2 Instrument Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 142.1 Vector Network Analyzer Concept . . . . . . . . . . . . . . . . . . . . . . . 142.2 Sweeping Impedance Probe Requirements . . . . . . . . . . . . . . . . . . . 152.3 Block Diagram . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 172.4 Theory of Operation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18

2.4.1 Correlated Double Sampling . . . . . . . . . . . . . . . . . . . . . . . . 212.4.2 Reference Channel . . . . . . . . . . . . . . . . . . . . . . . . . . . . 232.4.3 Summary of Instrument Operation . . . . . . . . . . . . . . . . . . . 24

3 Design and Analyses . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 253.1 Detailed Design . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 25

3.1.1 Direct Digital Synthesizer . . . . . . . . . . . . . . . . . . . . . . . . 253.1.2 RF Head . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 273.1.3 Detector and ADC . . . . . . . . . . . . . . . . . . . . . . . . . . . . 293.1.4 Controller . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 303.1.5 Power Conditioning and Filtering . . . . . . . . . . . . . . . . . . . . 34

Page 8: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

viii

3.2 Analyses . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 353.2.1 Noise . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 373.2.2 Nonlinear Errors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 41

3.2.2.1 Loading Effect . . . . . . . . . . . . . . . . . . . . . . . . . . 413.2.2.2 Harmonic Analysis . . . . . . . . . . . . . . . . . . . . . . . . 413.2.2.3 ADC Resolution . . . . . . . . . . . . . . . . . . . . . . . . 423.2.2.4 ADC Linearity . . . . . . . . . . . . . . . . . . . . . . . . . 423.2.2.5 Other Sources of Nonlinearity . . . . . . . . . . . . . . . . 44

3.2.3 Saturation: Maximum Admittance . . . . . . . . . . . . . . . . . . . 443.2.4 Measurement Uncertainty . . . . . . . . . . . . . . . . . . . . . . . . 44

4 Calibration and Testing . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 474.1 Calibration Methodology . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 47

4.1.1 Error Model . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 474.1.2 Calibration Loads . . . . . . . . . . . . . . . . . . . . . . . . . . . . 494.1.3 Calibration Procedure . . . . . . . . . . . . . . . . . . . . . . . . . . 50

4.2 Initial Tests . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 50

5 Conclusions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 56

References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 59

Appendices . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 61A Current Transformer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62

A.1 Theory . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62A.2 Configurations Tested . . . . . . . . . . . . . . . . . . . . . . . . . . 65A.3 Final Transformer Tests . . . . . . . . . . . . . . . . . . . . . . . . . 69A.4 Hystereis and Saturation . . . . . . . . . . . . . . . . . . . . . . . . 72A.5 Shield Rejection . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 72

B PCB Schematics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 74C FPGA RTL Diagrams . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 82D Calibration Loads Characterization . . . . . . . . . . . . . . . . . . . . . . . 97E Ground Support Equipment . . . . . . . . . . . . . . . . . . . . . . . . . . . 103

E.1 Scalar Network Analyzer . . . . . . . . . . . . . . . . . . . . . . . . 103E.2 SIP Ground Support Equipment . . . . . . . . . . . . . . . . . . . . 103

F DVD Contents . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 106

Page 9: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

ix

List of Tables

Table Page

3.1 SIP modules occupation on the FPGA. . . . . . . . . . . . . . . . . . . . . . 34

3.2 Power consumption of the SIP instrument. . . . . . . . . . . . . . . . . . . . 36

3.3 Measurement uncertainty of the SIP instrument. . . . . . . . . . . . . . . . 46

A.1 List of current transformer configurations tested. . . . . . . . . . . . . . . . 66

Page 10: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

x

List of Figures

Figure Page

1.1 Ionosphere electron density vs. altitude and composing layers. . . . . . . . . 2

1.2 Global TEC real-time data. . . . . . . . . . . . . . . . . . . . . . . . . . . . 2

1.3 Capacitor model of an impedance probe. . . . . . . . . . . . . . . . . . . . . 7

1.4 Impedance of a small antenna in plasma. . . . . . . . . . . . . . . . . . . . . 8

1.5 ASSP main payload schematic view. . . . . . . . . . . . . . . . . . . . . . . . 11

2.1 Block diagram of the N2PK network analyzer. . . . . . . . . . . . . . . . . 15

2.2 ASSP SIP block diagram. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18

2.3 SIP VNA block diagram and operation. . . . . . . . . . . . . . . . . . . . . 19

2.4 Admittance plane and calculation of the components. . . . . . . . . . . . . . 21

2.5 Measurement of complementary values (CDS) for offset cancellation. . . . . 23

2.6 Measurement of a reference admittance for phase delay and gain correction. 24

3.1 DDS output configuration. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26

3.2 RF Head block diagram. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28

3.3 Mitigation of shunt capacitance with a guard. . . . . . . . . . . . . . . . . . 29

3.4 FPGA design block diagram. . . . . . . . . . . . . . . . . . . . . . . . . . . 32

3.5 FPGA and SIP overall timing diagram. . . . . . . . . . . . . . . . . . . . . 33

3.6 Power generation and conditioning from the primary bus. . . . . . . . . . . 35

3.7 Phase noise spectrum at the DDS output. . . . . . . . . . . . . . . . . . . . 38

3.8 Phase noise spectrum at the LNA output. . . . . . . . . . . . . . . . . . . . 39

3.9 Phase noise spectrum at the ADC input. . . . . . . . . . . . . . . . . . . . . 39

3.10 CDS filter response in time and frequency domains. . . . . . . . . . . . . . . 40

Page 11: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

xi

3.11 Phase noise spectrum reduction with the use of CDS. . . . . . . . . . . . . . 40

3.12 Loading effect on the DDS output. . . . . . . . . . . . . . . . . . . . . . . . . 41

3.13 Nonlinear error produced by harmonic mixing of the local oscillator with DDSharmonics. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 43

3.14 Saturation and gain analysis of the measurement chain. . . . . . . . . . . . 44

3.15 Admittance gain and phase error as a function of the quadrature componentserrors. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 45

4.1 Noise measurements with different configurations. . . . . . . . . . . . . . . . . 51

4.2 Offset measurements with and without CDS. . . . . . . . . . . . . . . . . . 52

4.3 Dynamic range of the instrument measuring different capacitors. . . . . . . 53

4.4 Residual error for a 4 pF capacitor measurement. . . . . . . . . . . . . . . . 54

4.5 Measurement comparison of a resonant frequency with a commercial VNA. 55

A.1 Typical circuit using a current transformer. . . . . . . . . . . . . . . . . . . 63

A.2 General model of the current transformer. . . . . . . . . . . . . . . . . . . . 63

A.3 Lumped elements model of the current transformer. . . . . . . . . . . . . . 63

A.4 Low frequency model of the current transformer. . . . . . . . . . . . . . . . 64

A.5 High frequency model of the current transformer. . . . . . . . . . . . . . . . 65

A.6 Current transformer test set-up. . . . . . . . . . . . . . . . . . . . . . . . . . 67

A.7 Normalized gain for different core geometries and sizes. . . . . . . . . . . . . 67

A.8 Normalized gain for different core materials. . . . . . . . . . . . . . . . . . . 68

A.9 Normalized gain for different turns ratio. . . . . . . . . . . . . . . . . . . . . 69

A.10 Final tests for transformer selection. . . . . . . . . . . . . . . . . . . . . . . 70

A.11 Final tests for transformers selection with detail in the operational frequencybandwidth. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 71

A.12 Harmonics testing of the current transformer. . . . . . . . . . . . . . . . . . 72

A.13 Current transformer shield rejection test set-up. . . . . . . . . . . . . . . . . 73

Page 12: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

xii

A.14 Rejection ratio of currents through the shield of the current transformer. . . 73

D.1 Test set-up for the calibration loads characterization. . . . . . . . . . . . . . 97

D.2 Calibration of the VNA with an SMB to N-type adapter and an N-type cal kit. 98

D.3 s1,1 magnitude and phase of the 50 Ω load. . . . . . . . . . . . . . . . . . . . 99

D.4 Impedance magnitude and phase of the 50 Ω load. . . . . . . . . . . . . . . 99

D.5 s1,1 magnitude and phase of the SHORT load. . . . . . . . . . . . . . . . . . 100

D.6 Impedance magnitude and phase of the SHORT load. . . . . . . . . . . . . 100

D.7 s1,1 magnitude and phase of the OPEN load. . . . . . . . . . . . . . . . . . . 101

D.8 Impedance magnitude and phase of the OPEN load. . . . . . . . . . . . . . . 101

D.9 s1,1 magnitude and phase of the unloaded SMB connector. . . . . . . . . . . 102

D.10 Impedance magnitude and phase of the unloaded SMB connector. . . . . . 102

E.1 SNA GSE block diagram. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 104

E.2 SNA GSE software interface. . . . . . . . . . . . . . . . . . . . . . . . . . . 104

E.3 SIP GSE software interface. . . . . . . . . . . . . . . . . . . . . . . . . . . . 105

Page 13: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

xiii

Acronyms

AC Alternating Current

ADC Analog-to-Digital Converter

AM Amplitude Modulation

ASSP Auroral Spatial Structures Probe

AWG American Wire Gauge

CDS Correlated Double Sampling

CSV Comma-Separated Value

CT Current Transformer

DAC Digital-to-Analog Converter

DAS Data Acquistion System

DC Direct Current

DCR Direct Conversion Receiver

DDS Direct Digital Synthesizer

DUT Device Under Test

EMI Electromagnetic Interference

FDTD Finite Difference Time Domain

FPGA Field-Programmable Gate Array

GBW Gain-Bandwidth Product

GPS Global Positioning System

GSE Ground Support Equipment

IGRF International Geomagnetic Reference Field

INL Integral Nonlinearity

LDO Low-Dropout Regulator

LNA Low-Noise Amplifier

LO Local Oscillator

LPF Low-Pass Filter

Page 14: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

xiv

LSB Less Significant Bit

MF Major Frame

PFP Plasma Frequency Probe

PIP Plasma Impedance Probe

PLL Phase Locked Loop

RAM Random-Access Memory

RF Radio Frequency

RMS Root Mean Squared

RSS Root Sum Squared

RTL Register-Transfer Level

SDL Space Dynamics Laboratory

SF Sub Frame

SFDR Spurious-Free Dynamic Range

SIP Sweeping Impedance Probe

SNA Scalar Network Analyzer

SS Stainless Steel

SSB Single-Sideband

TCR Temperature Coefficient of Resistance

TEC Total Electron Content

TM Telemetry

UART Universal Asynchronous Receiver/Transmitter

USU Utah State University

VNA Vector Network Analyzer

Page 15: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

1

Chapter 1

Introduction

1.1 History

When Marconi transmitted the first transatlantic radio waves in 1901, the scientific

community was astonished. It was well known that electromagnetic waves propagate in

straight lines, and the Earth’s curvature should it have made impossible this kind of long

distance transmission. Heaviside and Kennelly speculated that a layer of ionized plasma

high in the atmosphere could have been reflecting radio waves. Later in 1932, the term

ionosphere proposed by Watson-Watt was adopted.

The ionosphere is composed of ions and free electrons forming a plasma. The high-energy

ultraviolet and X-rays solar radiation are absorbed by the neutral atoms and molecules

causing them to release electrons. Due to this ionization mechanism, the plasma is quasi-

neutral, that is, the number of ions and electrons are practically the same. As will be

explained, it is often more convenient to determine the number of electrons instead of the

different ions. The fundamental parameter which defines the level of ionization is the electron

density or Total Electron Content (TEC).

The ionosphere has a great temporal and spatial variability. In altitude, the different

species and concentrations found in the atmosphere absorb different wavelength and amounts

of energy, creating layers of higher concentration as shown in Fig. 1.1 [1]. The ionosphere

extends from 70 km in altitude to thousands of km, with the electron density being zero at

the surface (total recombination). During the night, two layers named E and F are present.

During the day, the D layer appears and layer F is divided into two sublayers. In addition to

the daily cycle, differences can be also be observed with the seasons and with the solar cycle.

The spatial variability is mainly influenced by the Earth’s magnetic field (Fig. 1.2 [2]). At

low latitudes, plasma is concentrated on either side of the magnetic equator forming what

Page 16: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

2

is known as the equatorial anomaly. Of even more importance are the solar storms which

cause disturbances in the ionosphere, or plasma bubbles which form at the bottom of the

ionosphere and float to the top leaving a turbulent wake that is impenetrable to radio waves.

Both are unpredictable with the current models.

The ionosphere has numerous effects on radio waves depending on their frequency.

Low frequency radio waves, like the one transmitted by Marconi, are bounced from the

ionosphere, while the higher frequency waves are capable of passing through. However,

they also suffer from different effects like absorption, Faraday rotation, or phase change

due to an increased electrical path. The highest frequency of radio waves that will reflect

Fig. 1.1: Ionosphere electron density vs. altitude and composing layers.

Fig. 1.2: Global TEC real-time data.

Page 17: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

3

back to Earth when transmitted vertically is called the critical frequency of the ionosphere.

Radio waves are reflected from the ionosphere when their frequency matches the resonance

of the ionospheric plasma. This resonance is related to the local electron density so that

radio waves are reflected at different altitudes depending on their frequency, with the lower

frequencies reflected at the E layer and the higher frequencies at the F layer. Changes in

the electron density can allow radio waves to be transmitted further away (like AM radios

during the night) or be completely disrupted. In the same way, satellite communications

get affected with distortions and disruptions. The Global Positioning System (GPS) signals

must be corrected for the total electron content line-of-sight from the satellite to the receiver

to achieve high accuracy. This is done by sending signals at two or more distinct frequencies

and comparing the relative delay between them to determine the total electron content. The

GPS constellation includes a TEC instrument to account for the increased delay of the radio

waves, improving the positioning accuracy, as well as providing high redundancy to mitigate

disruptions.

Because of its practical implications on radio wave transmission and its high variability,

the ionosphere has been studied for decades with many different methods. Nowadays TEC

real-time maps are available online, but there is still a high demand for better models and

predictability. For example, the United States government spends $500 million annually

to predict and mitigate the disturbances produced by the ionosphere. One of the best

models available is GAIM-GM by Utah State University (USU) Space Weather Center,

which provides real-time information on the structure of the ionosphere based on 357 TEC

stations.

1.2 Ionospheric Measurements

After its discovery, the ionosphere was studied with the same mechanism Marconi

used to communicate over the Earth’s horizon that is, by reflecting radio waves from it.

Ionosondes operate by emitting a signal of time varying frequency to the ionosphere and

determining the propagation time of the reflected signal. With this information the virtual

height and electron density can be calculated at different altitudes. Another approach is the

Page 18: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

4

incoherent scatter radar, measuring the reflected power scattered by the cloud of electrons

around individual ions. These techniques were later implemented in the mid 50s on satellites

making the first topside sounders (i.e. above the F layer).

While most of the current TEC data and models are developed with ground instruments,

in-situ measurements provide better accuracy and are more appropriate to measure localized

plasma anomalies, turbulences, or bubbles. Because the ionosphere minimum height is

about 70 km, the use of high altitude atmospheric balloons is impossible, reserving in-situ

measurements for sounding rockets and satellites. In fact, the first in-situ measurement

was made by error. After World War II, Americans and Soviets acquired V2 rockets and

scientists from Germany. Post war testing of the V2 rockets implemented a radio for

telemetry purposes. On some the first flights the radio signal was lost when the rockets

exceed a certain altitude and recovered again once it fell below the same altitude. It was

understood that the local ionospheric plasma was interacting with the antenna and detuning

it from the transmitter. This and other phenomena were used to study the density and

structure of the ionosphere. After those first experiments, space weather measurements

with sounding rockets became an important scientific goal. They are still in use for low

altitudes where satellites can not survive due to high atmospheric drag or during short lived

phenomena when it is difficult to get a satellite at the correct location.

Two groups of instruments have been widely used over the years for in-situ measurements

of the electron density: Langmuir probes and impedance probes. The first uses probes that

collect the free electrons and measure the Direct Current (DC) current collected by the probe

as a function of voltage. The latter are based on probes immersed in the plasma and studying

the varying electrical properties of its impedance. USU and the Space Dynamics Laboratory

(SDL) have an extensive history of over 50 years studying the ionosphere on-board sounding

rockets and small satellites [3], and are one of the pioneers of the impedance probes.

Page 19: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

5

1.3 Plasma Physics

1.3.1 Plasma as a Dielectric Medium

In order to understand the impedance probe methods, it is convenient to first understand

the plasma properties of the ionosphere. A cold plasma with a magnetic field aligned with

the Z-axis, can be approximated as a dielectric medium with the following form for the

tensor permitivity:

←→ε r =

ε1 −iε2 0

iε2 ε1 0

0 0 ε3

, (1.1)

where

ε1 = 1 +1

ω

∑k

ω∗kω

2pk

Ω2k − ω∗

k2 , (1.2)

ε2 =1

ω

∑k

Ωk

Ω2k − ω∗

k2 , (1.3)

ε3 = 1− 1

ω

∑k

ω2pk

ω∗k

, (1.4)

ω∗ = ω − jνk, (1.5)

ω2pk =

nkq2k

ε0mk, (1.6)

Ωk =qkBomk

, (1.7)

nk, mk, qk, and νk are the density, mass, charge, and ion or electron neutral collision

frequency of the kth species, with the first species being electrons followed by various ion

species.

For frequencies between 100 kHz and 20 MHz, the ions are unmoving due to their higher

mass. Focusing on the electrons, the plasma presents several interesting natural resonant

frequencies.

Page 20: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

6

• Plasma frequency (ωp): the natural resonant frequency of the electrons on a plasma in

the absence of a magnetic field. It is dependent on the electron density ne,

ωp =ε0me

e2ne. (1.8)

• Electron gyrofrequency (Ωk): the natural resonant frequency of the electrons under a

constant magnetic field,

Ωe =eBome

. (1.9)

1.3.2 Capacitor Model

The most common geometry used for impedance probes used short dipoles and

monopoles. These probes are electrically short, and therefore its free space impedance

is purely capacitive. As a first approach, we can consider the probe as a capacitor filled with

dielectric plasma (see Fig. 1.3). It can be shown that the impedance under this condition

follows the equation

C(θ) = C01

2[ε1(1 + cos2(θ)) + ε3 ∗ sin2(θ)], (1.10)

where θ is the angle between the probe and the magnetic field and C0 is the free space

capacitance for a cylindrical capacitor with inner radius a and outer radius b given by

C0 =2πε0L

ln( ba). (1.11)

When the probe is excited at low frequencies between 100 kHz and 20 MHz, only the

electrons are capable of moving, while the ions that are heavier than the electrons remain

static. The electron-neutron collision frequency in the altitudes of interest (E and F regions)

is only a few kHz, much lower than the cyclotron frequency and can be eliminated from the

Page 21: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

7

r

+

-

Fig. 1.3: Capacitor model of an impedance probe.

expression. With these considerations the impedance is

Z =2

jωC0[(1 +ω2p

Ω2e−ω2 ) cos2(θ) + (1− ω2

p

ω2 ) sin2(θ)]. (1.12)

The impedance is shown in magnitude and phase in Fig. 1.4. Two resonant frequencies

are observed.

• A low impedance resonance (similar to a R-L-C series resonant circuit) at the electron

gyrofrequency.

• A high impedance resonance (similar to a R-L-C parallel resonant circuit) at the

upper-hybrid frequency. This frequency is the combination of the plasma frequency

and gyrofrequency

ω2uh = ω2

p + Ω2e. (1.13)

The electron density can be obtained by measuring the upper-hybrid frequency as

follows

ne =4πε0me

e2(f2uh − f2

c ), (1.14)

where the only unknown parameter is the electron gyrofrequency. Because it is only dependent

Page 22: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

8

of the magnetic field, it can be calculated from magnetic field models (IGRF), or with the

use of local measurements of the magnetic field.

1.3.3 Balmain Model

The capacitor approach fails to account for the effects of the plasma on the charge

distribution on the probe surface. It is also limited to cold plasmas, but the general impedance

shape and resonant frequencies are the same as other models, and it is very intuitive. More

complex models have been developed over the years, with Balmain’s model [4] being the most

accepted and used. It treats the probe as an antenna with an assumed triangular current

distribution. The modeled impedance can be seen in Fig. 1.4, and has been validated several

times in plasma chambers as well as sounding rocket flights. The impedance expression is as

follows

Z =a

jω2πε0ε1LF 1/2[ln

L

ρ− 1− ln

a+ F 1/2

2F], (1.15)

in which F = sin2 θ + a2cos2θ and a2 = ε1/ε3.

1 1.5 2 2.5 3 3.5 4 4.5 5

102

104

106

fc

fuh

fp

Frequency [MHz]

Mag

nit

ud

e[Ω

] C0

Capacitor modelBalmain model

1 1.5 2 2.5 3 3.5 4 4.5 5

−90

−45

0

45

90

Frequency [MHz]

Ph

ase

[deg

rees

]

Fig. 1.4: Impedance of a small antenna in plasma.

Page 23: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

9

Another approach is to numerically solve for the impedance of an antenna in a plasma.

This has been done using a Finite Difference Time Domain (FDTD) model and plasma fluid

equations [5]. One of the key observations of this model is that when near the upper hybrid

resonance the current distribution on the antenna deviates from the triangular shape as

was assumed by Balmain. The result is that the magnitude of the impedance is an order of

magnitude less than what is predicted by the analytical theories.

The impedance or radio frequency (RF) methods have several advantages over Langmuir

probes. They are loosely dependent on the rocket or spacecraft surface charge (providing an

absolute measurement), the magnetic field orientation, or the plasma temperature. Although

the free space capacitance changes with the geometry of the probe, the resonant frequencies

remain unchanged, making this kind of instruments ideal and accurate for plasma diagnostics.

The upper-hybrid frequency usually has a high quality factor, being very sharp, and the

phase crosses zero, making it very convenient and simple for instruments to track this

frequency.

One source of error of this kind of probes is the shunt capacitance that is in parallel

with the probe and sense electronics input. It is the total capacitance of the sensor geometry

that is not filled with plasma and is electrically parallel with the actual probe input. The

physical cause of the shunt capacitance are the stray capacitances of traces or wires inside

the instrument before its connection to the probe input. The result is a reduced sensitivity

to the plasma effects to be observed. It can be effectively mitigated with electrical guard

designs as will be explained in the following chapters.

1.4 RF Impedance Probe Methods

Several approaches have been used over the years for measuring the parallel resonance

of an impedance probe which is associated with the upper hybrid frequency of a plasma.

They can mainly be classified into two groups, those that sweep and measure the magnitude

of the impedance curve, and those that observe the phase change associated with the parallel

resonance.

Page 24: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

10

1.4.1 Plasma Frequency Probe

The Plasma Frequency Probe (PFP) measures the upper-hybrid frequency by tracking

when the phase crosses zero as the resonant frequency is changed. The usual method is

some kind of analog Phase Locked Loop (PLL), although there are several variations. They

perform a wide sweep to locate the resonant frequency and then they lock in. If for any

reason the lock is lost, the search procedure is started again. It has also been implemented a

Sweeping PFP, where a continuous sweep is performed until the resonant frequency is found.

The number of steps taken in the sweep is recorded and the procedure begins again.

1.4.2 Sweeping Impedance Probe

The Sweeping Impedance Probe (SIP) excites the probe with a constant voltage, and

measures the current flowing. The method for measuring the current has been changed

over the years as new electronic components became available, and with new innovative

designs. They normally measure it in quadrature to obtain the complex impedance. Because

the measure is proportional to the admittance, they are sometimes referred as admittance

probes (and it is usually more convenient for expressing errors or saturation ranges). When

the measurement is finished, the frequency is swept over the full range, obtaining a very

detailed impedance curve. The main disadvantage is the lower sweep rate compared with

the PFP and the huge amount of telemetry required for a single sweep.

Only the variations of the impedance with respect the free space capacitance C0 are of

interest. Several techniques have been used trying to subtract C0 from the probe impedance,

obtaining a narrower range and increased sensibility. However, determining C0 is not easy

because it requires a rocket mock-up hanging in free space in the absence of any element for

many meters.

The latest SIP instruments flown are the STORMS mission [6], and the Japanese

S-520-26 [7], in 2012.

1.5 ASSP Mission

The Auroral Spatial Structures Probe (ASSP) [8] is a NASA mission intending to

Page 25: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

11

study the energy flow around the aurora. It will consist of a sounding rocket, which ejects

six subpayloads during the flight. This will be the first mission directed by NASA with

a constellation deployed from a sounding rocket. This formation will take measurements

simultaneously providing unique spatial and temporal variations of the different magnitudes.

ASSP is scheduled to be launched in the early 2015 from Poker Flats Flight, and will measure

the ionosphere under aurora conditions from 110 km to 606 km.

The ASSP instruments are being developed and built by SDL-USU. All seven payloads

include several instruments such as electric field, magnetometer and a Langmuir probe.

Additionally, the main payload in the rocket includes a SIP and a Multi Fix-Bias Langmuir

Probe. The position of the different instruments can be seen in Fig. 1.5.

The ASSP SIP is implemented using a new architecture, intending to be more accurate

ERAU Sweeping

Langmuir Probe

SLP

USU Sweeping

Impedance Probe

(SIP)

72 in

USU Electric Field

Probe

0.50in.

Ø 2.0in.

EFP Sensor

EFP Guard

EFP Guard

UTD E-Field

Boom System

Guard

FPP Sensor

EFP Sensor 1

EFP Sensor 2

EFP Sensor 3

EFP Sensor 4

SIP Sensor

NASA Air Spring

1.0in.

19 in24.5 in

6.0 in

8.0in.

ERAU Multi Fix-

Bias (via FPP)

Langmuir Probe

called Fast

Temperature probe

(FTP)

Science (Flux MAG)

Sensor Head

USU Ground

Heater Support

ASSP Sub

Payloads

Power Cntl

USU-SDL

Main

Electronics

Power Cntl

Sweeping

Impedance

Probe

Pull Away Umbi

Internal Heating

110 to 120 C for

60 min pre-

launch

SLP Guard

1

SLP

Science Measurements

Electric Field Probe, (V12, V34)

Electric Field Spectrometer (WP1-WP16)

Floating Potential Probe (FPP)

Magnetic Field [Mres MAG] (B1x, B1y, B1z)

Magnetic Field [Flux MAG] (B2x, B2y, B2z)

Sweeping Langmuir Probe (SLP-H, SLP-L)

Fast Temperature Probe (FTP[1-5]-L – FTP[1-5]-H)

Sweeping Impedance Probe (SIP1 – SIP4)

GPS Position and Timing

NASA TM Power

SDL Mid Hinge

Boom System

Science (Mres MAG)

Magnetoresistive

Sensor Head

UTD E-Field

Boom Hinge

SIP Pre-AMP

Electric Field Wave

Power Probe uses V34

SLP Guard

Fig. 1.5: ASSP main payload schematic view.

Page 26: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

12

and fast than the previous generations by using the latest electronic components and

techniques, and a very careful design and calibration methodology. The ASSP mission is

ideal for a SIP due to the high altitude, which will cover regions E and F.

1.6 Thesis Outline

The objective of this thesis is to present the work done and the lessons learned during

the development of the new SIP architecture.

Chapter 1 has covered the ionosphere history, past measurements, in particular the RF

methods, where an introduction of the plasma physics behind these instruments is given

for clarity. Lastly, the ASSP mission has been introduced where the SIP instrument will

be used. This chapter should give the reader a general idea of the motivation behind this

project and thesis.

The ASSP SIP overview is covered in Chapter 2, including the requirements driving

the design and the theory of operation of the instrument.

Chapter 3 details the different components and units comprising the ASSP SIP. The

different analyses during the design are presented here showing the performances achieved

compared with the requirements.

SIP testing, calibration, and performances results are presented in Chapter 4. Calibration

is a critical step during testing, based on the error model analyzed, well known calibration

loads, and a careful methodology.

In Chapter 5, the conclusions of this project are described, giving the reader a summary

of the achievements and tasks that could be improved in the future.

As part of any engineering job, multiple design files have been generated. These

are included in the different Appendices for reference. Appendix A contains the current

transformer analyses and testing. The design schematics of the different boards can be

found in Appendix B. The digital design implemented in the Field Programmable Gate

Array (FPGA) is shown in Appendix C. Appendix D includes the characterization of the

calibration loads. Software were developed to operate the test equipment and the instrument,

and they are detailed in Appendix E. All the information related to this thesis is included in

Page 27: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

13

electronic format in the DVD attached. Its contents are described in Appendix F.

Page 28: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

14

Chapter 2

Instrument Overview

2.1 Vector Network Analyzer Concept

The Sweeping Impedance Probe developed for the Auroral Spatial Structures Probe

sounding rocket is based on concept and designs developed by the amateur radio community

for vector network analyzers. This community has developed a variety of low-cost vector

network analyzers (VNA) and released the designs and build experiences on the Internet.

Assembled or unassembled kits for these VNAs can be purchased. These VNAs are able to

make transmission and reflection measurements from 0.05 to 60 MHz, with about 0.035 Hz

frequency resolution and over 110 dB of dynamic range. This capability spans the needs for

an impedance probe. The ASSP SIP is greatly influenced by the VNA developed by the

radio amateur with call sign N2PK and is referred to as the N2PK VNA.

The block diagram for the N2PK VNA [9] is presented in Fig. 2.1 where a Device Under

Test (DUT) is shown undergoing a simple transmission or Wheatstone type reflection bridge

measurement. The RF Direct Digital Synthesizer (DDS) block generates an RF voltage at a

0 reference phase which is applied to the input of the DUT. The output from the DUT

to the RF Detector input is a signal to be measured with a given amplitude and phase. In

addition, the RF signal at the Detector input is measured with a short length of transmission

line in place of the DUT that is assumed to have unity gain and zero phase, and with an

open at the Detector input. From these three vector measurements at a single frequency,

all DUT transmission characteristics, such as gain and phase, can be calculated [9]. In the

same way, impedance and reflection characteristics of the DUT can be measured with the

use of a reflection bridge. In this case, three accurate terminations, open, short, and load,

are used as references.

The N2PK VNA uses a narrowband direct-conversion architecture to convert the

Page 29: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

15

Fig. 2.1: Block diagram of the N2PK network analyzer.

detected signal to DC base band through mixing. The DC voltage is dependent not only on

the magnitude of the RF voltage at its input, but also its phase relative to the RF signal

at the local oscillator (LO) input. Highly accurate measurements of this amplitude and

phase dependent DC voltage are obtained using a precision linear analog detector, a 24-bit

analog-digital converter, and precise phase control of the LO DDS. The phase information is

obtained by making two sequential DC measurements for each frequency and test condition

(reference loads and DUT). In each case, the first measurement is made with the LO at the

reference phase of 0; the second measurement is made with the LO phase shifted by 90.

This process results in the quadrature or vector components of each signal at the Detector

RF input.

2.2 Sweeping Impedance Probe Requirements

A Sweeping Impedance Probe operating in the Earth’s ionosphere has a number of

requirements that are significantly different than the N2PK VNA, which is primarily used for

measuring the performance of HF antennas and communication systems. These requirements

labeled R1 through R6 are presented below with discussion.

Page 30: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

16

R1 The frequency of operation shall be between 1 MHz and 20 MHz and shall be pro-

grammable.

When the ionosphere is driven near the local electron cyclotron frequency significant

energy can be transferred to the plasma heating the electrons and disturbing the

medium to be probed. On previous SIP instruments the sweep range had started as

low as 0.1 MHz and strong interference was generated for all diagnostic instruments

on the sounding rocket through a process known as sheath rectification when the SIP

was at the low end of its sweep. The low end of the sweep needs to be adjusted based

on the expected cyclotron frequency of plasma to be measured.

R2 The number of sample points in a frequency sweep shall be at least 128 points.

Previous experience with impedance probes on the STORMS mission has shown that

this is a sufficient number of samples to locate the various resonances of the probe-

plasma system [6]. In general, the points are distributed linearly in two band with

higher resolution at low frequencies where the upper hybrid frequency is expected and

few points at the highest frequency ranges.

R3 The sweep rate shall be at least 10 Hz.

The sweep rate determines the along track resolution of the measurements. Given that

the plasma environment is dynamic, it is desirable to accomplish the measurement

before the underlying media changes significantly.

R4 The admittance measurement shall have an accuracy of greater that 1% in magnitude

and 1 in phase across the measurement range.

It is not essential that the SIP be extremely accurate because of the morphology of

the parallel resonance associated with the upper hybrid frequency. A small error in

magnitude or phase does not change the estimation of the frequency of this resonant

condition significantly. However, it is often desirable to obtain as noiseless and accurate

values as possible. These requirements were made base on the design capabilities and

their relative impact on other important parameters like power, size, and mass.

Page 31: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

17

Because the SIP is actually an admittance probe, where the magnitude sensed is the

current proportional to the admittance, it is more convenient to express the accuracy

requirement or the error model in terms of the admittance instead of impedance.

However, because traditionally impedance has been used more and it is a more

intuitive magnitude, both terms will be used in the thesis.

R5 The magnitude range of the impedance measurements shall be between 100 Ω and

100 kΩ.

This is one of the driving requirements for the SIP because most network analyzers

operate relatively near a reference frequency of 50 Ω. The need to observe the high

impedance of the plasma-antenna parallel resonance drives this extended operating

range.

R6 The maximum voltage presented at the probe input shall be less than 0.5 V peak.

The ambient plasma can be driven to nonlinear states such that the simple linear

theory for the impedance of an antenna in plasma is not applicable. The desire to

drive the plasma harder to improve the signal to noise ratio for the instrument need

to be balanced by the need to not unduly perturb the plasma. This level is based on

best practices from years of impedance probe work [10].

2.3 Block Diagram

The ASSP SIP instrument is composed of the functional blocks indicated in Fig. 2.2.

The electronics are divided into two boards. The Main Board is located inside the rocket and

contains the major functionality. It includes the VNA, which produces the constant voltage

sine wave for exciting the probe, and the detector to acquire and digitize the measured

current in quadrature, coming from the RF Head. All the VNA sequencing and frequency

sweep is managed by the Controller, which is also in charge of the digital processing and

packing the values into the Telemetry (TM) format. The different electronic components

are powered from a single high-voltage bus. The Power Conditioning and Filtering stage

generates all the voltages required.

Page 32: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

18

The second board is inside the RF Head. It is located inside the antenna boom, and

closely placed to the feed. It connects the VNA excitation voltage to the probe, while

measures the current through it. It is then amplified by a Low-Noise Amplifier (LNA), and

transmitted to the VNA for its acquisition.

2.4 Theory of Operation

The Sweeping Impedance Probe is based on the N2PK VNA, which has proven over 10

years to be very accurate and similar to commercial equipments in performance. By basing

the SIP off an existing design, it is ensured it has the required simplicity and compaction to

be implemented as part of a flight instrument. The RF Head is based on the N2PK design,

but more heavily on the experience of previous SIP instruments developed at Utah State

University. Both of them have been adapted for the SIP admittance ranges, sweep rate, and

accuracy requirements. The error model has been extensively analyzed compared with the

N2PK VNA, which relied more on prototype measurements.

The way the SIP VNA operates is indicated in Fig. 2.3. A DDS will output from one

of its channel a sine wave of the desired frequency. After removing the harmonics produced

by the DDS with the antialias filter, the signal will be ideally a pure sine wave

VRF(t) = A sin(2πf0t), (2.1)

where A is the amplitude of the sine wave, and the initial phase can be considered zero

Power Conditioning & Filtering

VNA

Controller

SIP Main Board

Power bus

TM & sync(PCM) SIP Probe

Rock

et e

xter

nal

fac

e

VRF

Vsens∝ I

RF HeadNASATM & Power

Fig. 2.2: ASSP SIP block diagram.

Page 33: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

19

DDS

AntialiasFilter

AntialiasFilter

LPF

ADC

LO Phase

Ch. Sel.

0°90°180°270°

DataN

Freq.CH 0(RF)

CH 1(LO)

Detector(mixer)

RF Head

Contr

oller

MeasuredCurrent

Fig. 2.3: SIP VNA block diagram and operation.

without loss of generality.

This voltage will be directly applied to the probe. In the RF Head a current sensing

circuit is implemented consisting of a Current Transformer (CT) and a LNA. Considering a

CT with a turn ratio of n, a burden resistor Rb, and an amplifier of gain Gamp, the incoming

signal to the VNA has the following expression:

Vsens(t) =I(t)

nRbGamp =

A|Y (f0)|RbGamp

nsin(2πf0t+ arg(Y (f0))). (2.2)

In the VNA, a second DDS channel will generate a sine wave with the same frequency and

phase as the first channel. It is multiplied with the incoming signal from the RF Head

producing the following output:

Vdet(t) = GdetVsens(t)VLO(t) = Gchain|Y (f0)|[cos(arg(Y (f0)))− cos(4πf0t+ arg(Y (f0)))],

(2.3)

where Gdet and Gchain are the detector and the measurement chain gain, respectively,

Gchain =ARbGampGdet

n. (2.4)

Page 34: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

20

The doubled frequency signal can be easily removed with a Low-Pass Filter (LPF). The

filtered DC signal is digitized with a regular Analog-to-Digital Converter (ADC),

VADC,0 = Gchain|Y (f0)| cos(arg(Y (f0))). (2.5)

This value corresponds with the in-phase or real component of the admittance.

After that measure has been performed, the DDS second channel will shift its phase by

90,

VLO,0(t) = ALO sin(2πf0t) −→ VLO,90(t) = ALO sin(2πf0t+π

2) = ALO cos(2πf0t), (2.6)

that, when multiplied by Vsens(t) and filtered, gives the following output,

VADC,90 = Gchain|Y (f0)| sin(arg(Y (f0))), (2.7)

which is the quadrature component or imaginary part of the admittance.

Given both components the admittance can be calculated directly as

|Y (f0)| = Gchain

√V 2

ADC,0 + V 2ADC,90, (2.8)

arg(Y (f0)) = tan−1(VADC,90

VADC,0). (2.9)

This operation is similar to the calculation of the components of a vector with respect

to base vectors. A graphical representation of the admittance plane can be seen in Fig. 2.4,

where the base is formed by the LO different phases.

Compared with other SIP architectures, this method relays on two things: the use of a

digital source generator and sequential measurements. Both DDS channels must have the

exact same frequency, otherwise the ADC input will be a slowly modulated signal. Moreover,

even if we could get two signals with the same frequency, being able to shift the local

oscillator by exactly 90 at any frequency is impossible without the use of digital methods.

Page 35: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

21

B = Im(Y)

G = Re(Y)

VADC,90

VADC,0

VLO,90

VLO,0

Y

Fig. 2.4: Admittance plane and calculation of the components.

With respect to the sequential measurements, they provide an excellent accuracy because

both values are affected by the same gains and delays. In the STORMS SIP an error of 1

or 2 was assumed in phase because the in-phase and quadrature components had different

tracks and lengths [6]. The importance of the sequential measurements will be even more

noticeable when the use of Correlated Double Sampling (CDS) and the reference channel

are explained.

From Equation (2.8) we can see that for obtaining an accurate magnitude value the

measurement chain gain must be known with very good accuracy. Even more, any drift

of this gain will ruin the instrument accuracy. As for the phase, obtained in Equation

(2.9), a simplification has been made. Any element in the measurement chain (amplifiers,

transformers, mixer) will introduce phase delays that must be corrected. Hence, a very

good calibration procedure, including temperature drifts, must be made to ensure final

performances. In the next subsections, two methods will be explained to improve the inherent

accuracy and alleviate the calibration.

2.4.1 Correlated Double Sampling

The first technique described is the Correlated Double Sampling (CDS). In general, the

measurements VADC,0 and VADC,90 will have a certain offset error from different components

Page 36: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

22

such as the mixer, amplifiers, and the ADC. The digitized signals can be expressed more

generally as

VADC,0 = Gchain|Y (f0)| cos(arg(Y (f0)) + Voff ), (2.10)

VADC,90 = Gchain|Y (f0)| sin(arg(Y (f0)) + Voff ), (2.11)

which results in a measurement error of the calculated admittance,

|Y (f0)| = Gchain

√(VADC,0 − Voff )2 + (VADC,90 − Voff )2, (2.12)

arg(Y (f0)) = tan−1(VADC,90 + VoffVADC,0 + Voff

). (2.13)

By taking two additional measurements using LO phases of 180 and 270,

VLO,180(t) = ALO sin(2πf0t− π) −→ VADC,180 = −Gchain|Y (f0)| cos(arg(Y (f0))) + Voff ,

(2.14)

VLO,270(t) = ALO sin(2πf0t−3π

2) −→ VADC,270 = −Gchain|Y (f0)| sin(arg(Y (f0))) + Voff ,

(2.15)

two new values are obtained with a similar offset, but with the opposite value for the signal

of interest. Subtracting these new measurements from the original ones results in a value

free of offset error (see Fig. 2.5). In reality, the offset can change slightly between the

measurements, but after the CDS correction it will be much lower. The residual offset error

will be corrected by calibration. It is important to remark that the CDS technique is only

possible by acquiring sequential measurements using the same acquisition chain.

For sake of simplicity, the corrected values with CDS are defined as

VI =VADC,0 − VADC,180

2, (2.16)

VQ =VADC,90 − VADC,270

2. (2.17)

Page 37: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

23

B

G

VADC,90

VADC,0

Y

VOff

VADC,270

VADC,180

2 Re[Y]

2 I

m[Y

]

Fig. 2.5: Measurement of complementary values (CDS) for offset cancellation.

2.4.2 Reference Channel

The use of a reference channel has been used in many of the previous SIP instruments.

Measuring the reference channel duplicates the number of measurements, but it also provides

several advantages, correcting gain errors and phase delays. The impedance is calculated as

follows:

|Y (f0)| =

√V 2I,ant + V 2

Q,ant√V 2I,ref + V 2

Q,ref

|Yref |, (2.18)

arg(Y (f0)) = tan−1(VQ,ant

VI,ant)− tan−1(

VQ,ref

VI,ref). (2.19)

In the graphical plane, shown in Fig. 2.6 for a resistive reference, it can be seen as both

measurements are affected by the same delay that can be corrected. If gain errors affect

both channels in the same way, the triangles formed by the real admittances, and the ones

affected by the gain error are similar.

While the gain and phase delay of the measurement chain can be effectively corrected,

this is only true if the reference impedance is very stable and very well known.

Page 38: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

24

B

G

Y

Yrefθdelay

arg(Y)

Fig. 2.6: Measurement of a reference admittance for phase delay and gain correction.

2.4.3 Summary of Instrument Operation

The use of sequential measurements provide a very good inherent accuracy for the

instrument. Most of the systematic errors (offset, gain, and phase delay) and their drifts are

corrected. The residual errors can be corrected by calibration as explained in Chapter 4.

However, the main disadvantage is the sequential use of the ADC, requiring a device with

a high sampling rate. To allow a high sampling rate, the input signal cannot be filtered

without impacting the settling time. Thus, there is a trade-off between the sweeping rate and

the maximum admissible noise in the system. The noise analysis has been one of the main

concerns for the selection of components. Appropriate power distribution and grounding is

essential to obtain a reduction of the Electromagnetic Interference (EMI) noise.

There are several sources of nonlinearity errors in the system as will be explained.

Although they may be systematic, its calibration is often difficult and tedious. Therefore,

the main objective has been minimizing its influence at the source, in order to do a simpler

linear calibration.

Page 39: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

25

Chapter 3

Design and Analyses

This chapter explains the different design decisions taken during the component selection

and their main parameters. It also presents the analyses that were performed to ensure the

final performance of the instrument.

3.1 Detailed Design

The detailed design section should provide enough insight to the reader to perform the

next SIP generation instruments based on this architecture. The order of the subsections

tries to replicate the flow of the signal from the source (DDS) up to the final destination

(ADC).

3.1.1 Direct Digital Synthesizer

The DDS must output two signals synchronized in frequency. For that matter two DDS

chips can be used with the same clock oscillator, or like in this case, a single 2-channel chip.

The DDS selected presents several advantages against others.

• It uses a serial port for configuring the DDS, that while slow, occupies less pins in the

Field-Programmable Gate Array (FPGA).

• It supports different kinds of modulations by direct action on some special pins. In

this case for the LO channel, it is very convenient for changing its phase.

• It presents a low phase noise and Spurious-Free Dynamic Range (SFDR).

It also has disadvantages like the unique voltage used, 1.8 V, or having more functionality

than needed in this application.

Page 40: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

26

The DDS output, shown in Fig. 3.1, consists of a complementary differential current

sink, which must be converted with a balun for driving the unbalanced antenna impedance.

R147 sets the DC voltage of the outputs around 1.55 V, and R148 helps maintain the

maximum output voltage inside their compliance range (there can be problems driving a

filter with inductive input impedance).

While the use of a DDS is very convenient for frequency and phase accuracy, they have

larger phase noise and harmonics than other signal generator methods. In order to reduce

the harmonics and the digital aliases, a reconstruction filter is implemented at the output

with a frequency cut-off of 25 MHz. When the generated signal has a low frequency, not

every harmonic can be filtered. The filter is implemented with passive components to avoid

any additional noise or error. Additionally it is known that DDS produce higher harmonics

when the output frequency is a sub-multiple of the reference clock frequency, 64 MHz. In

those cases, the frequency has been slightly shifted (1 LSB introduces a shift of less than

1 Hz, negligible for the instrument operation).

Because the output of the DDS is the result of a reconstructed digital sine wave, it

follows a sinc(f0/fREF ) response. There is a small decay of 15% when the output is at

20 MHz that will be considered as part of the gain error.

IOUT

R147IOUT

1 : 1

R148

+1.8V A

LPF

Fig. 3.1: DDS output configuration.

Page 41: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

27

3.1.2 RF Head

The RF Head block diagram can be seen in Fig. 3.2. The excitation voltage received

from the Main Board drives the antenna through a Current Transformer (CT) that senses

the current. It is converted to voltage in the secondary with a burden resistor and an

amplifier closely placed augments the signal to appropriate levels for its transmission to the

Main Board.

The reference channel is configured in the same way replacing the antenna by a fixed and

very accurate resistor. In this sense two changes have been made with respect to previous

SIP instruments.

• First, the reference impedance selected is mechanically less representative, but on the

other hand is much more accurate and stable having an initial tolerance of 0.01% and

a Temperature Coefficient of Resistance (TCR) of 20 ppm/C.

• With the exception of the CT, burden resistor, and amplifier, all the other elements of

the measurement chain are the same to the antenna channel. And all the mentioned

components have been implemented as symmetrically as possible to the antenna

channel.

• The CT for each channel are positioned perpendicular to each other, avoiding magnetic

coupling between them.

The CT analysis and testing took a fair amount of time, and all the know-how has been

compiled in Appendix A. The final configuration is a 1:5 turns ratio transformer with a

burden resistor of 50 Ω. To avoid phase differences between channels, an amplifier with very

high Gain-Bandwidth Product (GBW) has been selected. Additionally, only one signal is

sent back to the Main Board with the help of a multiplexer made from RF switches. In this

way, the uncertainty in the phase delay produced by the cable is eliminated. The amplifier is

configured in a non-inverting configuration to increase the input impedance compared with

the burden resistor. Small resistors values have been used to reduce their thermal noise.

Page 42: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

28

Antenna Channel

ReferenceChannel

Vsens

VN

AVRF

Ch. Sel.

Fig. 3.2: RF Head block diagram.

There always exist stray capacitances between the antenna feed and ground. There

are also border effects of the antenna. Figure 3.3(a) shows the three possibilities. Stray

capacitances before the CT load the driver, but it does not produce any output on the CT.

However any current after the CT and returning through the enclosure or other ground

track, will be sensed by the CT and produce an undesirable output. All these capacitances

combined are the shunt capacitance referred in the introduction, which reduces the instrument

sensitivity. To mitigate this problem the use of a guard is implemented, where the enclosure

is grounded through the primary wire shield, which is also coupled to the CT. As seen in

Fig. 3.3(b), any current through these stray capacitances or from the antenna to the guard

return through the shield canceling its effect on the output.

The guard design has been improved over previous instruments obtaining a very enclosed

guard. At the moment of writing this thesis, a new design based on an insulated material

(green in the figure) coated with a high conductivity spray (orange in the figure) is being

studied by the mechanical team. It will provide a very good mechanical fixation for the guard

Page 43: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

29

and the antenna, a continuous and conductive guard from the connector to the enclosure and

will ease its manufacturing. This new guard design together with a very close transformer

to the antenna connector (just a few centimeters) should reduce the shunt capacitance effect

to a minimum.

3.1.3 Detector and ADC

The detector is a Direct-Conversion Receiver (DCR) (or zero-IF receiver), consisting of

a frequency shifter by combining the current sensed with the LO signal from the DDS, both

of the same frequency. For the detector there are two possible designs.

• A frequency multiplier or linear mixer. It generates the sum and difference frequencies

with much less harmonics. The main disadvantages are that LO signal noise is present

in the output (together with its mixing with RF noise [11]) and they have less conversion

gain.

• A frequency mixer or modulator. In these kind of devices the LO input is overloaded

(a) Stray capacitances effect without guard.

(b) Stray capacitances effect with guard.

Fig. 3.3: Mitigation of shunt capacitance with a guard.

Page 44: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

30

into a square signal and acts like a switch control for the RF signal and its opposite.

The main advantage is that it is much less sensible to the LO noise and has higher

conversion gains, but it generates multiple harmonics and intermodulation products.

For the ASSP SIP a conservative approach has been taken. The AD831 active mixer has

been selected having a high conversion gain with low harmonics. The only disadvantage is

its elevated power consumption.

The differential output of the mixer is filtered and buffered for driving the ADC.

The frequency cut-off of this filter is critical for the instrument timing. The fundamental

requirement is that it must be much lower than 2 MHz (twice the minimum frequency),

because the mixer will produce an output with the same level as the DC signal we want to

digitize. Furthermore, to reduce aliasing and limit the noise, the filter must reject frequencies

higher than 200 kHz, which is half the sampling frequency when oversampling (see Section

3.1.4). However, reducing the bandwidth increases the settling time of the filter after a

change of phase or frequency, being the major contributor to the instrument measurement

time. The final bandwidth selected is around 100 kHz, obtaining a good rejection at 2 MHz

of 25 dB. With the settling time configured to 9 ms, the value has been settled to 99.92 % of

the final value (in average of the four coadded samples).

The ADC is also a critical element of the system for determining the dynamic range. A

24-bit Delta-Sigma ADC would have been preferred but they have a very limited sampling

rate, insufficient for this application. A very accurate 16-bit ADC with a higher sampling

rate has been used.

3.1.4 Controller

The Controller is implemented in an Igloo FPGA (AGL1000V5). The main block

diagram of the digital design can be seen in Fig. 3.4.

• The Data Acquisition System (DAS) Controller acquires all the different information

to be transmitted by Telemetry (TM), it controls the SIP instrument, changing the

frequency and phase of the DDS and acquiring the ADC, and acquires houskeeping

Page 45: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

31

information.

• The Ground Support Equipment (GSE) Interface implements a Universal Asynchronous

Receiver/Transmitter (UART) interface for on-ground debugging and testing.

• The Payload Controller modifies the acquisition modes of the DAS Controller according

to the commands received from the GSE.

• The Telemetry Matrix Former groups the information from the DAS Controller and

other information relevant to the status of the SIP instrument, and transmits it to the

NASA TM&Power unit. From this unit, some synchronization signals are received

which are used for triggering the acquisition of the telemetry.

• The Flash interface implements a counter that is incremented after each reset.

Many of the blocks have been reused from another programs, or from other ASSP units

some modifications. The DAS Controller is specific of the SIP instrument. The complete

Register-Transfer Level (RTL) diagrams can be found in Appendix C.

The general timing of the SIP acquisition can be seen in Fig. 3.5. The SIP instrument

has nine 16-bit channels allocated in each Sub Frame (SF), where the raw data of a single

frequency is transmitted. A Major Frame (MF) consists of 32 SF, and the SIP instrument

requires four complete MF to transmit a single sweep data (128 frequency points). Being

the SF period 140 µs, and the MF period 5.88 ms, this results in a maximum sweep rate of

about 42.5 Hz. Because of the huge amount of allocated data rate, it was decided to push the

design, increasing the sweep rate at the expense of reduced accuracy. The NSROC Payload

from NASA generates the timing signals indicating to the SIP Payload the beginning of

SFs and MFs. This signals are used for synchronizing and timing the SIP operations. After

the DDS initial configuration, the FPGA remains idle until the next MF. Then, it starts

acquiring each frequency values at the beginning of each SF, and stores them into a memory.

These values are transmitted in the next MF, i.e. data is delayed by one MF period but

time-tagged for further post-processing.

Page 46: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

32

-186-0030

ASSP Main Functional

C. Weston

Top Level SIP Functional Partition

1

ASSP

DESCRIPTION

FILE NAME

ITEM

SHEET

SHT REV

TITLE

TITLE

ENGINEER

LAST MODIFIED

SPACE DYNAMICS LABORATORYUTAH STATE UNIVERSITY R ESEARCH FOUNDATION

North Logan, Utah 84341

PROGRAM

14 feb, 2014 SPSIPTOP.VSDX

NEXT ASSY.

186-0030ASSP Main Payload Top Level

DWG NO.

7 6 5 4 3 2 1

B

A

D

C

B

A

8 7 6 5 4 3 2 1

8

D

C

1 1OFTHIS DRAWING CONTAINS INFORMATION THAT IS PROPRIETARY TO SPACE DYNAMICS LABORATORY (SDL). REFERENCE USURF BP409.1

Form No. QF0423 Rev A

VHDL FILE = ASSP_MAIN_TOP.VHD

Co

mm

an

d[7

:0]

UA

RT

_P

ay_T

x_

H

UA

RT

_G

SE

_T

x_

H

UMBI

Ne

wC

oA

dd

Cnt[

1:0

]

Rst_

H

AR

st_

L

AD9958

DD

S_

Re

set_

L

DD

S_

PW

R_

DW

N

DD

S_

SC

K

FstC

lk

Rd

RcvF

IFO

_H

RcvF

E_H

WrS

IPC

onfig

_H

TMAddr[3:0]

DD

S_

SD

O[3

:0]

DD

S_

Sync_C

lk

TM

_D

ata

_H

Globals

Rst_

H

Rst_

H

Rst_

H

Payload Firmware Instruction Set

Reset Payload

Hex Command Parameters (Big-endian)

Set SIP Config

AD

C_

SC

K

AD

C_

CN

V

AD

C_S

DI

AD

C_

SD

O

AD7688

Te

lem

etr

y S

igna

ls

2

8

TM Serial Deck

TM

_G

td_C

k

TM

_L

oa

d_

L

TM

_E

na

ble

_H

TM

_W

ord

_H

TM

_F

ram

e_H

TM

_M

Fra

me_H

Flash

FL

_S

O_H

FL

_S

I_H

FL

_H

old

_L

FL

_C

S_

L

FL

_S

ck

FL

_W

P_

L

Rst_

H

FL

Com

ma

nd

[15:0

]

16

FL

Wr_

H

Flash Interface

Sweeping Impedance Probe

HK

_C

S_L

HK

_D

Clk

HK

_S

hd

n_L

HK

_B

usy_H

HK

_D

In_H

HK

_D

Ou

t_H

ADS8343

HK

(CH0)(CH1)(CH2)(CH3)

4

HK

ad

dr[

3:0

]

Te

stP

ort

[7:0

]

8

Data Acquisition System Controller

5

+V

PayID

[4:0

]

PCB S/N

UA

RT

_U

AR

T_In

va

lid_

L

UMBI UART Interface

Synchronous Serial Interface

SS

I_E

na

ble

_H

SS

I_E

na

ble

_L

+V

WrGetTM_H

RF

IV_C

trl

DD

S_

P[3

:0]

DD

S_

CS

_L

DD

S_

IO_

UP

DA

TE

0x33

0xA0 Fixed Frequency enable

2-bit CDS enable

2-bit CoAdd number of samples

32-bit fixed frequency value

Get TM data 4-bit Chunk address0xA2

Telemetry Matrix Former

Dia

gno

sticD

ata

[7:0

]

WrD

iagn

osticsD

ata

_H

SysClk

Generator

SysC

lk

Ne

wF

ixe

dF

req

[31:0

]

32

Ne

wF

ixe

dF

req

_H

Ne

wC

DS

En[1

:0]

2

Payload Controller

Fig. 3.4: FPGA design block diagram.

Page 47: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

33

IdleInit

5.88 ms 5.88 ms 5.88 ms 5.88 ms

1 sweep: 23.52 ms

MF -1 MF 0

Data acquired in MF itransmitted in MF i+1

MF 1 MF 2 MF 3 MF 4 MF 5 MF 4 MF 5

SF 0 SF 1 SF 2 SF 3 SF 4 SF 5 SF 6 SF 30 SF 31

140 μs

Antenna

Smpl 0

Channel Reference

Phase 0° 180° 90° 270° 0° 180° 90° 270°

DDS Active frequency 4 & Load frequency 5

ADC

ADC input

Smpl 1 Smpl 2 Smpl 3

17 μs

Settling time9 μs

2.28 μs

Settling time9 μs

Smpl 0 Smpl 1 Smpl 2

2.28 μs

...

Fig. 3.5: FPGA and SIP overall timing diagram.

Page 48: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

34

It should be noted that there is an overlap between SFs. While the ADC has sampled

the data and initiates the conversion phase, the next frequency and phase is loaded. It

should also be noted that because frequency is loaded with a serial line it requires some

time. To avoid any additional delay to the settling time, frequencies values are preloaded in

the previous SF and loaded immediately into the DDS registers at the beginning of the SF.

With the limited processing made in the FPGA, the amount of logic needed is very

limited too. In Table 3.1, it is shown a comparative of different resources between the specific

SIP modules, the complete FPGA design and the total amount provided by the FPGA.

The Random-Access Memory (RAM) blocks utilization could be optimized by delaying the

values acquisition by only two SF instead of a MF. It can be seen that the SIP digital design

does not require a high demand of the FPGA and it could be integrated together with other

instruments.

For debugging purposes, different test modes have been implemented in the FPGA

design which are only accessible through the UART. These test modes allow to establish the

VNA in a particular frequency (which in VNA is called zero-span), with/without CDS or

the amount of coadded samples.

3.1.5 Power Conditioning and Filtering

All the components mentioned previously are powered from a single high-voltage

and high-power unregulated bus. Different voltage rails are generated and conditioned

from the primary bus, as shown in Fig. 3.6, by using DC/DC converters, Low-Dropout

Regulators (LDOs), and references. The power consumption associated with each converter

is summarized in Table 3.2. The VNA dissipates around 1.3 W with 1 W coming from

the mixer. The RF Head dissipates 230 mW due to the amplifiers. The Controller and

Table 3.1: SIP modules occupation on the FPGA.Module SIP Controller Complete Design Total FPGA

Core Cells 1622 (7%) 3131 (13%) 24576

I/O pins 19 (11%) 51 (29%) 177

RAM blocks 19 (59%) 28 (87%) 32

Page 49: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

35

housekeeping circuits take only 220 mW and all the remaining power is lost in the converters,

which are working at a very low load with low efficiency.

3.2 Analyses

Different analyses were made for the selection of components and assuring performances.

In particular, the driving requirements for the design were the impedance range, and measure-

ment uncertainty in magnitude and phase. This measurement error will be determined by

two different kind of errors, systematic and random errors. Systematic errors are comprised

by:

• Offset error: mitigated by the CDS technique. The offset voltage limits the dynamic

range of the ADC, but with enough margin it is not a critical parameter. The residual

error is difficult to predict and it will be considered only during testing and calibration.

• Gain error: mitigated by the reference channel. Like the offset error, it will be

considered later during testing and calibration.

IsolatedDC/DCconverter

LDO

SIP Electronics

Box

NASA Power

LDO

+5VD +3.3VD+1.5VD

+15VA

–15VA

IsolatedDC/DCconverter

IsolatedDC/DCconverter

– 5VA

LDO

LDO

LDORef.

+5VA

+3.3VA

+1.8VA

+2.5VA

+1.25VA

UnregulatedBus 16-24V

Ground Star Point LDORef.

Fig. 3.6: Power generation and conditioning from the primary bus.

Page 50: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

36

Tab

le3.

2:P

ower

con

sum

pti

onof

the

SIP

inst

rum

ent.

Com

pon

ent

+1.

5VD

+3.

3VD

+5V

D+

1.2

5V

A+

2.5

VD

+1.8

VA

+3.3

VA

+5V

A-5

VA

+15V

A-1

5V

A+

VB

us

RS

422

Drv

/Rcv

16.1

GS

EP

ort

Inte

rfac

e0.

0R

eset

Cir

cuit

ry0.

0F

lash

Mem

ory

0.0

Clo

ckC

ircu

it7.

0F

PG

A8.

72.

2C

ontr

olle

r8.

718

.3

DD

S0.

483.0

Ref

eren

ceC

lock

30C

h.

Sel

.B

uff

er0.

00.0

Det

ecto

r106.0

100.0

Tem

per

ature

Sen

sor

0.3

AD

C0.

00.1

4.3

VN

A0.

40.1

83.0

0.0

110.6

100

Am

pli

fier

s22.8

22.8

Mu

ltip

lexer

0.1

RF

Hea

d0.1

22.8

22.8

Vol

tage

Mon

itor

0.1

0.1

0.1

1.7

2.5

0.3

Cu

rren

tS

ense

0.1

0.1

0.1

0.4

0.4

0.1

Mu

ltip

lexer

0.0

2.2

0.9

AD

C0.

00.0

1.5

Hou

seke

epin

g0.

10.2

1.7

0.1

4.3

3.8

Su

bto

tal

8.7

55.8

0.2

0.1

0.0

83.0

0.1

135.1

122.9

4.3

3.8

0.4

Tot

alO

utp

ut

Con

v.

8.7

65.2

65.4

0.1

0.0

83.0

0.1

226.4

122.9

4.3

3.8

Tot

alIn

pu

tC

onv.

9.4

65.2

32.1

0.1

0.1

91.0

0.1

117.1

32.6

181.8

Tot

alP

ower

3.4

WN

ote

:all

valu

esin

mA

un

less

oth

erw

ise

note

d.

Page 51: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

37

• Nonlinearities: there are several sources of nonlinearities and each one requires a

different approach that will be explained. In particular, the loading effect will affect

the gain of the instrument for different admittance ranges.

These errors are repetitive under the same operating conditions and will be ultimately

calibrated. On the other hand random errors will be present.

• Noise: it has been properly limited by design in order to assure it does not degrade

the measurement when acquiring low signals.

• Resolution: although limited by the device used, some techniques can be used to

improve the effective resolution.

• Nonlinearities: some of the nonlinearities are not only dependent on the value being

measured but on other characteristics of the DUT or the test equipment. An example

would be the harmonic distortion.

Some of the random errors presented, like resolution or the ADC Integral Nonlinearity

(INL), are not really random but dependent on the specific component. However, they are

considered random because of its difficulty to be calibrated.

3.2.1 Noise

Because of the high sampling rate, noise was one of the main concerns, and as such,

a detailed staged analysis was performed in order to select the components. During this

analysis the noise values are provided in dBc/Hz of the Single-Sideband (SSB) noise with

respect to the fundamental (i.e. graphs represent the offset frequency with respect to the

fundamental frequency and with the relative magnitude value to the fundamental magnitude

integrated over 1 Hz bandwidth). This representation is convenient for this application

where the frequency is swept.

The phase noise of the DDS can be expressed as [12]

LDDS(f, r) =1

2r2LCLK(f) + (

r

rR)2L1/f (f, rR) + κ(r)Lfloor, (3.1)

Page 52: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

38

where r = f0

fCLKis the ratio of the output frequency and the reference clock, and κ(r) is a

weak function of r. It has three components:

• The phase noise from the reference clock LCLK(f);

• The 1/f or flicker noise from DDS L1/f (f), which is given at a particular reference

ratio rR;

• Floor white noise of the output DAC of the DDS Lfloor.

Shown in Fig. 3.7 is the phase noise at the output of the DDS for the worst case, i.e. the

maximum output frequency. Because it is an accessible point, during testing it can be

observed the expected performance of the DDS.

The signal will be sensed by the CT and amplified by the LNA. Because of the low

signals in this stage, the noise of the components affect in great measure the total amount of

noise. Shown in Fig. 3.8 are the different contributors, including the burden resistor thermal

noise, the amplifier, and the resistors used for the amplification. As it can be observed, the

LNA used has very low floor noise (its flicker noise at low frequencies is irrelevant because

it will be rejected by the balun and mixer), and being the major contributors the thermal

noise of the amplifier resistors.

The mixer will introduce its intrinsic noise while rejecting all noise from the LO

input. Unfortunately, the datasheet does not provide the flicker noise information, and it is

something that should be checked during testing. After that, the noise from the ADC buffer

101 102 103 104 105 106 107

−160

−140

−120

−100

−80

Frequency Offset [Hz]

Magn

itu

de

[dB

c/H

z] Ref. ClockDAC

FlickerTotal Noise

Fig. 3.7: Phase noise spectrum at the DDS output.

Page 53: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

39

101 102 103 104 105 106 107−140

−120

−100

−80

Frequency Offset [Hz]

Mag

nit

ud

e[d

Bc/

Hz] DDS Output

Burden Resistoreninninp

Other ResistorsTotal Noise

Fig. 3.8: Phase noise spectrum at the LNA output.

amplifiers (including their flicker noise) is added taking into account an increase of 3dB for

the differential path. The ADC noise is negligible according to the datasheet (0.137 LSB),

and it has not been considered. The different contributors can be seen in Fig. 3.9.

The use of CDS improves not only the offset rejection but also the flicker noise [13].

It can be considered as a digital filter with a sampling rate equal to the time difference

between phases 17 µs (see Fig. 3.10). The frequency response is a high pass-filter with a

cut-off frequency of fs/4, which in this case is 14.7 kHz. This results in a very good rejection

of the low frequency noise as seen in Fig. 3.11.

Although many sources of noise have not been considered like EMI or components noise

that is not given in the datasheet, it is expected that their contribution will be negligible.

This is the result of a very low bandwidth digitized (and further reduced by coadding) and

the use of CDS.

101 102 103 104 105 106 107−200

−150

−100

Frequency Offset [Hz]

Mag

nit

ud

e[d

Bc/

Hz] LNA Output

Mixer Noiseeninp

Total Noise

Fig. 3.9: Phase noise spectrum at the ADC input.

Page 54: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

40

−2 2

−1

−0.5

0.5

1

n

h[n]

(a) Impulse Response

103 104 105 106

−20

−10

0

Frequency [Hz]

Magn

itu

de

[dB

]

(b) Frequency response

Fig. 3.10: CDS filter response in time and frequency domains.

101 102 103 104 105 106 107−160

−140

−120

−100

−80

Frequency Offset [Hz]

Mag

nit

ud

e[d

Bc] Without CDS

With CDS

Fig. 3.11: Phase noise spectrum reduction with the use of CDS.

Page 55: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

41

3.2.2 Nonlinear Errors

3.2.2.1 Loading Effect

The DDS output gets loaded with the different elements shown in Fig. 3.12. Usually,

the antenna impedance is much higher than Z0 and Rb/n2, there is no loading effect and the

voltage VRF is constant and about 250 mVp. However, as its impedance lowers, the voltage

in the antenna will decrease. With 100 Ω, the voltage decreases to 200 mVp, and with 50 Ω

to only 110 mVp.

The loading effect is systematic and can be easily corrected. The main concern for the

loading effect is that only affects low antenna impedances where the most accurate calibration

loads are found. For future designs it would be interesting analyzing the convenience of

implementing a low output impedance buffer to drive the antenna and reference taking into

account the degradation of noise and harmonics.

3.2.2.2 Harmonic Analysis

The main source of harmonics is the DDS. It has a high SFDR of 65 dBc (see Fig.

3.13(a)). However, if the fundamental is located in the resonant frequency (where the

impedance is maximum) and its harmonics are located in the low impedance, they will get

amplified to higher levels. Figure 3.13(b) shows the output of the LNA superimposing the

IOUT10 mA

50Ω

RREF200 Ω

Rb/n2

≈ 2 Ω

VRF

Zant

Rb/n2

≈ 2 Ω

Fig. 3.12: Loading effect on the DDS output.

Page 56: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

42

impedance curve. Supposing a resonant impedance of 100 kΩ and an impedance of 1 kΩ for

the harmonics, the 65 dBc margin gets reduced to only 25 dBc.

The mixer will produce a DC output of these harmonics when mixed with the LO

harmonics. The conversion gains for the different harmonics are shown in Fig. 3.13(c). With

the harmonic level at 25dBc below the fundamental and with the mixer rejection of 40dB, it

produces an output of -65dBc. Although this value is negligible, it is only achieved by the

use of the high-power mixer. With other lower power DDS and mixers, this value can get as

worse as -35dBc (1.7% in linear units), and it would require special measures to mitigate its

influence.

3.2.2.3 ADC Resolution

The ADC resolution is 16 bits, which may seem not enough for the lowest admittances.

However due to noise dithering at the ADC input, and the coadding implemented in

the Controller, the effective resolution is enhanced. Each value transmitted quadrature

component is the result of eight ADC samples, four coadded values in one phase, and another

four for the complementary phase. This results in an effective resolution of 17.5 bits. If

datarate is not the limiting factor, future designs should implement higher resolution ADC.

3.2.2.4 ADC Linearity

The main problem of the ADC that cannot be mitigated is its lack of linearity. This

ADC has a typical INL of 0.4 LSB (≈ 6 ppm). While the INL of the ADC can be potentially

calibrated it requires a very specific test set-up, and it is not practical for this kind of

instrument. Oversampling and coadding does not reduce the INL because the oversampled

values have the same INL error. However, CDS can reduce the INL by a factor of√

2,

because for this particular ADC the INL has a zero mean value and looks like white noise

(is the same consideration as it is normally made for considering the quantization error a

white noise). The ADC nonlinearity influence was discovered too late in the design process,

when the boards were already manufactured.

Page 57: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

43

0 1 2 3 4 5 6 7 8 9 10

65dBc

Frequency [MHz]

Mag

nit

ud

e[d

Bc]

(a) Harmonic output of the DDS.

0 1 2 3 4 5 6 7 8 9 10

25dBc

Frequency [MHz]

Mag

nit

ud

e[d

Bc]

(b) Harmonic output of the LNA.

0 1 2 3 4 5 6 7 8 9 10

0dB

−41dB

−41B

−39dB

Frequency [MHz]

Mag

nit

ud

e[d

Bc]

(c) Mixer conversion gain for different harmonics.

Fig. 3.13: Nonlinear error produced by harmonic mixing of the local oscillator with DDSharmonics.

Page 58: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

44

3.2.2.5 Other Sources of Nonlinearity

In general, all components can generate nonlinear behavior near saturation. All the

amplifiers are used with low-level signals compared to the supply voltage, and therefore

should not present any appreciable saturation effect. This however, should be taken into

account if low-power devices are used.

3.2.3 Saturation: Maximum Admittance

The different gains and voltages for the minimum impedance are shown in Fig. 3.14.

The voltage at the ADC input is ±0.7 V (for 0 and 180, respectively), which has been

properly adjusted to the ADC reference voltage of ±1.25 V. The LNA gain has been limited

to avoid saturation of the mixer RF input. A short-circuit cannot be used as an antenna

impedance because it will enter the nonlinear region generating compression on the output

signal and excessive harmonics.

3.2.4 Measurement Uncertainty

The real admittance Y will be measured with some error giving the estimation YM .

The admittance error is due to the in-phase and quadrature components errors εI and εQ as

shown in Fig. 3.15. The expression of the magnitude error in percentage is

εmag =

(|YM ||Y |

− 1

)· 100 =

(|Y + εI + jεQ|

|Y |− 1

)· 100, (3.2)

IOUT10 mAp

50 ΩRREF200 Ω

200 mVp

Zant100 Ω

2.86 mAp

570 µAp

28.6 mVp

Rb50 Ω

470 mVp 684 mVdc

Fig. 3.14: Saturation and gain analysis of the measurement chain.

Page 59: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

45

and it can maximized for the minimum admittance and for the error aligned with the

admittance vector as in Fig. 3.15,

max(εmag) = ±

min(|Y |) +√ε2I + ε2Q

min(|Y |)− 1

· 100 = ±

√ε2I + ε2Q

min(|Y |)· 100. (3.3)

The phase error is calculated as the angle between both vectors,

εph = arg(YM )− arg(Y ), (3.4)

and the worst case is found for the minimum admittance and the errors aligned 90 to the

admittance vector (see Fig. 3.15),

max(εph) = ± tan−1

√ε2I + ε2Q

min(|Y |)≈ ±

√ε2I + ε2Q

min(|Y |). (3.5)

B

G

|Z| = 100 kΩ

±εI

±εQ

max(εph)

max(εg)

Fig. 3.15: Admittance gain and phase error as a function of the quadrature componentserrors.

Page 60: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

46

Assuming that the in-phase and quadrature errors will have the same standard deviation,

the previous expressions can be simplified as

max(εmag) = ±√

min(|Y |)· 100, (3.6)

max(εph) = ±√

min(|Y |). (3.7)

Assuming a perfect calibration of the systematic errors (offset, gain, loading effect)

the measurement uncertainty will be limited by the random errors, noise, resolution, and

nonlinearities (see Table 3.3). This assumption is not entirely true, because the calibration

has some issues that will impact the performances. They are explained in the following

chapter.

The measurement uncertainty has been calculated to predict the compliance with the

accuracy requirements. Without taking into account the ADC, the requirements can be met

with margin because of the new architecture with great selectivity and dynamic range, and

with a very conservative selection of components. All the elements (DDS, amplifiers, mixer,

etc.) have extremely good performances at the expense of an elevated power consumption.

The ADC lack of resolution and linearity is the only design drawback, but it has been

analyzed and it should be noted and corrected for future instruments. It is believed that all

the analyses and considerations that have been collected here should prove a resourceful

guide for the next SIP instruments based on this architecture.

Table 3.3: Measurement uncertainty of the SIP instrument.Error Value

Noise ±6.76 µVResolution ±6.74 µV

INL ±10.78 µV

Total (RSS) ±14.40 µVMin. Signal (Ymin) ±478.5 µV

Magnitude Accuracy ±3.0 %Phase Accuracy ±1.7

Page 61: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

47

Chapter 4

Calibration and Testing

In this chapter, the calibration methodology is explained, including the systematic error

model derived from the analyses and the different calibration loads available. The ASSP

SIP boards have been recently manufactured and the initial testing showing some the main

parameters are presented.

4.1 Calibration Methodology

4.1.1 Error Model

To perform the calibration the instrument error model must be defined, including all

the sources of systematic errors present. The error model is developed from the admittance

measurement expression derived in the previous chapter,

YM =VI,ant + jVQ,ant

VI,ref + jVQ,ref

1

(Rref +Rb/n2)?, (4.1)

where (Rref + Rb/n2)? is the nominal resistance of the reference channel, including the

impedance loading of the burden resistor. Using the complete expression along with the

systematic errors of the raw values,

VI,ref =Gref

|1/Yref + Zs,ref |cos(arg(1/Yref + Zs,ref)− φref) + Voff , (4.2)

VQ,ref =Gref

|1/Yref + Zs,ref |sin(− arg(1/Yref + Zs,ref)− φref) + Voff , (4.3)

VI,ant =Gant

|1/Yant + Zs,ant|cos(arg(1/Yant + Zs,ant)− φant) + Voff , (4.4)

VQ,ant =Gant

|1/Yant + Zs,ant|sin(− arg(1/Yant + Zs,ant)− φant) + Voff , (4.5)

Page 62: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

48

where Gref , Gant are the gains for the different channels, φref , φant are the phase delays

associated with each path, and Zs,ref , Zs,ant are the impedance in series with the reference

resistor and the antenna (including the burden resistor). The first approximations are then

taken by assuming that the offset will be the same for all the measurements, and by having

the same gain and phase delay for the in-phase and quadrature components. Introducing

these expressions on the impedance measurement equation results in

YM =Gante

−jφant

(1

1/Yant+Zs,ant+ Yoff

)Grefe−jφref

(1

1/Yref+Zs,ref+ Yoff

) 1

(Rref +Rb/n2)?, (4.6)

where Yoff represents the equivalent admittance of the offset voltage. For the reference

channel the admittance selected is high enough so that the offset can be neglected. The

connection to the reference resistor is also short so Zs,ref ≈ Rb/n2. On the other hand, for

the antenna channel the ground impedance could be a source of error to be determined

during testing. Finally, the previous equation can be reduced to obtain the error model

based on the minimum number of independent parameters,

YM = εge−jφd

(1

1/Yant + Zs,ant+ Yoff

), (4.7)

where εg includes the mismatch between channel gains and the knowledge uncertainty of the

reference resistor, and φd represents the phase mismatch between channels.

The calculated error model has three complex parameters requiring three independent

measurements. A higher order model could have been obtained without making approxi-

mations. During the initial testing and characterization, it will be possible to observe if

the assumptions can be validated. Once the error parameters are determined the inverse

function can be used to correct the measured values,

Yant =1

1YM

εge−jφd

−Yoff

− Zs,ant. (4.8)

Page 63: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

49

4.1.2 Calibration Loads

The mechanical configuration of the RF Test Head was designed in order to reuse the

calibration loads built for the STORMS mission. These loads are canned shaped similar to

the antenna allowing for easier connection to the instrument. They were also constructed

with a great range of impedances comprised by:

• Open Load;

• Short Load;

• Resistors: 50 Ω, 100 Ω, 200 Ω, 500 Ω, 1 kΩ, 2 kΩ, 5 kΩ, 10 kΩ, 20 kΩ, 50 kΩ, 100 kΩ,

200 kΩ, 300 kΩ;

• Capacitors: 0.5 pF, 1 pF, 1.5 pF, 2 pF, 2.5 pF, 3 pF, 3.5 pF, 4 pF, 4.5 pF, 5 pF, 6 pF,

8 pF, 10 pF, 12 pF, 15 pF, 18 pF;

• Inductors: 1 µH, 2 µH, 5 µH, 10 µH, 20 µH, 50 µH, 100 µH, 200 µH, 500 µH, 1000 µH,

2000 µH;

• Resonant Circuits: 1.4 MHz, 2 MHz, 4 MHz, 6 MHz, 8 MHz, 10 MHz, 12 MHz.

The resonant circuits present a similar impedance to the plasma with different parallel

resonant frequencies.

Ideally, the calibration loads must be characterized with higher accuracy than the

instrument under calibration. Unfortunately, there is no equipment in the market that has

the required accuracy over the impedance and frequency range. For example, commercial

LCR meters have a great accuracy but only at a fixed frequency. For this project, a

commercial VNA was used and the complete measurements can be found in Appendix D.

The problem of using a VNA is that they are only accurate for resistive impedances

around the characteristic impedance Z0 (Agilent recommends using them only for 3 Ω around

Z0 for better performances). In the results, the measurement uncertainty in magnitude and

phase is shown along with the measured impedance. Because of this, only the 50 Ω load is

known with enough accuracy, around ±1 % in magnitude and ±0.7 in phase. Additionally,

Page 64: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

50

it can be said that the OPEN load presents a high impedance (more than 3 kΩ) and the

SHORT load presents a low impedance (lower than 0.6 Ω), but the exact value is uncertain

as well as its phase. In Appendix D the problems associated with the OPEN load are

explained. Furthermore, it is discussed the convenience of not connecting any load, instead

of the OPEN load, for having a higher impedance.

4.1.3 Calibration Procedure

Given the unavailability of very well known calibration loads, the following approxima-

tions are made.

• First, assume Zs,ant is equal to Rb/n2. In either case, the ground impedance cannot

be calibrated with the calibration loads, but with the real antenna and rocket (or in

more practical terms, with an analysis or simulation).

• It is foreseen that Yoff will be very small because of a very low offset voltage after the

CDS correction. In that case, it can be simply discarded. Because the OPEN load can

not be properly characterized, the result will only be valid if the parallel is larger than

100 kΩ.

• Characterize the gain and phase mismatch with the 50 Ω load.

In principle, temperature drifts should be mostly corrected by the CDS and reference

channel. However, to improve the final accuracy it is also recommended to do a calibration

with a controlled temperature in 10 C steps.

4.2 Initial Tests

After solving some problems associated with layout errors, ADC common mode range,

obsolete parts, etc., the ASSP SIP boards were ready to be tested functionally and obtain

some of its performance parameters. The schematics of both boards are included in Appendix

B and the GSE used during the testing is described in Appendix E. Some of the solutions

adopted had a negative impact on the performances.

Page 65: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

51

• Noise from the digital logic (specially the master clock oscillator) is coupled into the

analog plane. This will increase the total amount of noise in all frequencies.

• The reconstruction filter cut-off frequency is lower than expected (around 18 MHz),

due to the components tolerance and Q factor of the inductances.

• To solve a problem with the ADC common mode range, the low pass filter after the

mixer had to be simplified into a single pole. With this change, the image frequency

when measuring the lower frequencies (below 6 MHz) cannot be rejected completely

and this results in a higher amount of noise, and directly proportional to the signal

being measured.

In Fig. 4.1, the standard deviation noise measurements has been represented. The

CDS reduces the noise drastically because of the flicker noise filtering. On the other hand,

the coadding reduces the high-frequency noise (including the image frequency output of

the mixer). Gain at high frequencies has degraded and thus, the amount of noise increases.

Combining the CDS and coadding the total amount of noise is very reduced but higher than

expected for the reasons stated before.

In Fig. 4.2, the measurement offset has been represented. The CDS reduces in almost

2 4 6 8 10 12 14 16 18 20

0

1

2

3

·10−4

Frequency [MHz]

Ad

mit

tan

ceM

ag.

[Ω−

1]

w/out CDS & 1 coadd

w/out CDS & 2 coadd

w/out CDS & 4 coaddwith CDS & 1 coaddwith CDS & 4 coadd

Fig. 4.1: Noise measurements with different configurations.

Page 66: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

52

an order of magnitude the total admittance offset, but it is still high enough to be considered

during the calibration. The offset in the lower frequencies is consistent with a shunt

capacitance of 0.6 pF which will need to be further investigated.

Finally to assess the capability of the instrument for measuring variations on the free

space capacitance, several capacitor loads were measured. In Fig. 4.3, three nominal loads of

1, 4, and 10 pF have been represented. As can be seen, the dynamic range of the instrument

is large enough to measure the 10 and 4 pF, but it is not enough for measuring the 1 pF

(only with averaging the capacitor curve can be distinguished).

Focusing on the 4 pF capacitor which is similar to the expected free space capacitance, a

curve fitting is performed to find the true capacitance being measured and express the error

as the residual with respect to this fitting. This has been represented in Fig. 4.4, dividing

the total error between the mean and the standard deviation. The mean deviation is due to

the lack of calibration and nonlinearity of the instrument, while the standard deviation is

purely due to the instrument noise. At low frequencies the error is primarily due to the noise

of the image frequency, and at high frequencies the loss of gain and dissimilarities between

the antenna and reference channel. It should be noted that the curves here represented

have not been calibrated in gain or phase, and therefore the mean error can potentially be

2 4 6 8 10 12 14 16 18 20

0

0.5

1

1.5

2

·10−4

Frequency [MHz]

Ad

mit

tan

ceM

ag.

[Ω−

1]]

w/out CDSwith CDS

Fig. 4.2: Offset measurements with and without CDS.

Page 67: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

53

2 4 6 8 10 12 14 16 18 20

103

104

105

106

Frequency [MHz]

Imp

edan

ceM

ag.

[Ω]

1 pF4 pF10 pF

2 4 6 8 10 12 14 16 18 20−200

−100

0

100

200

Frequency [MHz]

Imp

edan

ceP

has

e[

]

Fig. 4.3: Dynamic range of the instrument measuring different capacitors.

Page 68: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

54

reduced. Additionally, correcting the low-pass filter and reconstruction filter, the error curve

should be approximately flat like it is in mid-frequencies with a total error of 3% and 4 in

magnitude and phase.

Finally, a resonant circuit at 4 MHz has been measured and represented in Fig. 4.5

comparing the results with the curve obtained with a commerical VNA. Even with an error

in general higher than expected, the resonant frequency can be easily determined.

2 4 6 8 10 12 14 16 18 200

5

10

Frequency [MHz]

Mag

.E

rror

[%]

Std. Dev.Mean

2 4 6 8 10 12 14 16 18 200

2

4

6

8

Frequency [MHz]

Ph

ase

Err

or

[]

Fig. 4.4: Residual error for a 4 pF capacitor measurement.

Page 69: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

55

2 4 6 8 10 12 14 16 18 20102.8

103

103.2

103.4

103.6

Frequency [MHz]

Mag

nit

ud

e[Ω

−1]]

SIPVNA

2 4 6 8 10 12 14 16 18 20

−80

−60

−40

−20

0

20

Frequency [MHz]

Ph

ase

[]

Fig. 4.5: Measurement comparison of a resonant frequency with a commercial VNA.

Page 70: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

56

Chapter 5

Conclusions

In this thesis, a new SIP architecture has been outlined and analyzed. It is considered

a mature design and it can achieve the required performance metrics. The main advantages

of this architecture are the following.

• It has a high selectivity. The energy of the in-phase or quadrature component is

integrated over many cycles providing good rejection of spurious signals and noise.

The main limitation is usually found in the ADC dynamic range.

• The accuracy is enhanced by techniques like CDS or the reference channel. This

provides an inherent accuracy that can be further improved by calibration.

• An error model has been developed and some guidelines are given for the calibration.

In principle, many of the systematic errors will be corrected or limited.

• It is a compact design requiring very few components.

The design and manufacturing errors will degrade the accuracy, but they have been identified

and will be corrected in future versions. Because enough margin was taken in the impedance

range, it is anticipated that the actual antenna impedance will be accurately measured. The

ASSP mission presented a wonderful opportunity to test this new architecture by providing

very few restrictions in terms of size or power. This SIP architecture based on a VNA, along

with techniques like CDS, is very compact and provides a very good accuracy. However, for

future missions, the power consumption should be reduced, and the design optimized in

general, by for example, reducing the amount of different voltages required. If the noise level

is kept under appropriate levels, additional drivers and amplifiers are suggested to avoid

loading effect and to better adjust the dynamic range to the ADC input.

The RF Head is another block that has undergone important improvements.

Page 71: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

57

• The reduced frequency span with respect to previous instruments has made it possible

to use a very small transformer, with an exceptional flat response and high repeatability.

• The symmetry between channels is increased, and the reference channel should be very

accurate and stable.

• The guard design has a better electrical continuity, mechanical support, and ease of

manufacturing.

Minor improvements are suggested for the next SIP. The burden resistor could be changed

for an active load [14]. In this way, the impedance loading in the primary would be negligible

and it would simplify the error model and calibration, while also improving the low frequency

response. To improve the lower cut-off frequency even further, the primary cable should

be changed to a material with lower resistivity. This will allow selecting a core magnetic

material with lower permeability, which are more stable with temperature and frequency.

Another idea to increase the symmetry between channels would be using a low gain amplifier

for each one, and a larger gain after the multiplexer.

For the calibration it is strongly recommended to use an impedance analyzer with

more calibration loads. Even if they are not capable of reaching the highest impedances, it

would allow to characterize with 1%/1 accuracy impedances between 10 and 100 kΩ loads.

Characterizing with precision capacitors and inductors would improve the knowledge of

the instrument, by observing the possible differences between the in-phase and quadrature

components. Moreover, having more calibration loads, even in the lower range, would enable

the use of more terms in the error model. In particular, a SHORT load is easy to construct

with high accuracy (ignoring the electrical length) and an effort should be made to make

possible its use inside the VNA range.

More ambitious projects include the miniaturization of this instrument for its integration

into small satellites like CubeSats. From an electrical perspective, this presents several

challenges. Low-power components must be selected and the accuracy degradation must be

assessed. However, even more challenging will be the mechanical deployment of the antenna

while maintaining a good electrical guard.

Page 72: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

58

Even if the SIP highest advantage is providing a very accurate impedance curve,

it requires a high data rate that is not always available. There is work in progress for

implementing a digital phase locked loop. Because the frequency update is limited by the

serial line data rate, the tracking cannot be performed like that of an analog PLL. It is

proposed to implement a small span sweep centered around the parallel frequency. The raw

data must be converted to impedance values and the parallel resonance estimated in just a

few milliseconds. Therefore, it seems reasonable to perform those operations with limited

accuracy, even without calibration, while down-linking enough raw data to ground where

the parallel frequency could be calculated with higher accuracy.

Going even further, it is the intention of SDL-USU to implement a CubeSat top-side

sounder based on this same architecture. This will present many challenges and possible

projects, including the RF design of a tunable impedance matching network, the signal

post-processing for reducing the data rate or the on-ground post-processing. If successful, it

will provide invaluable data being the first top-side sounder on-board a CubeSat.

Page 73: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

59

References

[1] SID Monitoring Station. [Online]. Available: http://sidstation.loudet.org/

[2] Space Weather Center - GAIM Global TEC. [Online]. Available: http://spaceweather.usu.edu/htm/innovations/gaim-global-tec

[3] W. G. Sanderson, “The history and dynamics of plasma impedance probe,” Master’sthesis, Utah State University, 2007.

[4] K. Balmain, “The impedance of a short dipole antenna in a magnetoplasma,” IEEETransactions on Antennas and Propagation, vol. 12, no. 5, pp. 605–617, 1964.

[5] J. Ward, C. Swenson, and C. Furse, “The impedance of a short dipole antenna in amagnetized plasma via a finite difference time domain model,” IEEE Transactions onAntennas and Propagation, vol. 53, no. 8, pp. 2711–2718, 2005.

[6] A. Hummel, “The plasma impedance probe: a quadrature sampling technique,” Master’sthesis, Utah State University, 2006.

[7] K. Endo, A. Kumamoto, H. Oya, T. Ono, and Y. Katoh, “Plasma wave turbulencedue to the wake of an ionospheric sounding rocket,” in European Geosciences UnionGeneral Assembly Conference Abstracts, vol. 15, p. 7293, April 2013.

[8] E. Stromberg, C. Swenson, and C. Fish, “Auroral spatial structures probe soundingrocket mission,” in American Geophysical Union Fall Meeting Abstracts, vol. 1, p. 1959,2011.

[9] P. Kiciak, “An HF vector network analyzer Part 1,” Technical Report, 2003. [Online].Available: http://www.n2pk.com

[10] W. Pfister, “Survey of RF impedance probes,” in Direct Aeronomic Measurements inthe Lower Ionosphere. Urbana, IL: University of Illinois Urbana, pp. 31–36, 1963.

[11] E. Rotholz, “Phase noise of mixers,” Electronics Letters, vol. 20, no. 19, pp. 786–787,Sept. 1984.

[12] T. M. Comberiate, “Phase noise and spur reduction in an array of direct digitalsynthesizers,” Master’s thesis, University of Illinois, 2010.

[13] C. C. Enz and G. C. Temes, “Circuit techniques for reducing the effects of op-ampimperfections: autozeroing, correlated double sampling, and chopper stabilization,”Proceedings of the IEEE, vol. 84, no. 11, pp. 1584–1614, Nov. 1996.

[14] M. Milkovic, “Current transformer with active load termination,” US Patent US3 815 012A, June, 1974.

[15] N. Kondrath and M. Kazimierczuk, “Bandwidth of current transformers,” IEEE Trans-actions on Instrumentation and Measurement, vol. 58, no. 6, pp. 2008–2016, 2009.

Page 74: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

60

[16] “Use of ferrites in broadband transformers,” Fair-Rite Products Corp., Technical Report,2008.

[17] D. W. Knight. (2008) Current transformers: Part 1. [Online]. Available:http://www.g3ynh.info/zdocs/bridges/Xformers/part 1.html

[18] “Applying error correction to network analyzer measurements,” Agilent Technologies,Technical Report, 2002.

Page 75: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

61

Appendices

Page 76: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

62

Appendix A

Current Transformer

The Current Transformer (CT) has a large influence on the overall instrument perfor-

mances. It has to measure the current over a wide frequency range (1.3 decades), with very

high sensitivity (currents in the order of microamperes in the upper-hybrid frequency) while

introducing low noise. This appendix explains the different transformer cores, configurations

and decisions that were made during the design and manufacturing process.

A.1 Theory

The CT is used in the typical configuration shown in Fig. A.1, with a small burden

resistor that senses the current reflected from the primary, and with a Low Noise Amplifier

(LNA) connected to it. This together with the CT ratio 1:n assures that the impedance

insertion in the primary Rb/n2 is minimum. The CT general model [15, 16] can be seen

in Fig. A.2, where R1 and R2 are the resistive losses of the windings, L1 and L2 are the

leakage inductance of the windings, C1 and C2 are the capacitance of the windings, RC

represents the losses on the core, and LM is the magnetizing inductance of the core (where

the hysteresis and saturation can be modeled). The capacitance between windings has been

neglected because the braid of the primary wire grounded acts like a Faraday shield [17].

This model is approximated by the lumped elements model of Fig. A.3, where

R1,2 = R1 +R2/n2, (A.1)

L1,2 = L1 + L2/n2, (A.2)

C1,2 = C1 + n2C2. (A.3)

For low frequencies, the model gets simplified as shown in Fig. A.4. In general, all

inductances and capacitances present a low and high impedance, respectively, and can

Page 77: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

63

Z

1 : n

Rb

I

Fig. A.1: Typical circuit using a current transformer.

C1

R1 L1

RC LC

1 : nR2 L2

C2 Rb

Fig. A.2: General model of the current transformer.

R1,2 L1,2

RC LC C1,2 Rb/n2

1 : n

Fig. A.3: Lumped elements model of the current transformer.

Page 78: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

64

be ignored. However, the core inductance at low frequencies presents a low impedance

comparable to the burden resistor load, thus decreasing the sensitivity. The transfer function

is similar to a high-pass filter where the cut-off frequency is

fL =R1,2 +Rb/n

2

2πLC. (A.4)

For increasing the bandwidth in the lower frequencies the core inductance must be increased.

For example, toroidal cores have the following expression:

L =µn2A

2πr, (A.5)

where A is the cross-sectional area and r is the radius. In general, manufacturers use the AL

parameter which indicate the inductance per turn. Taking this into account, it is usually

selected a high permeability material, with big dimensions and a large number of turns. It is

also convenient to reduce the burden resistor load in the primary, and using wires with low

resistivity (mostly in the primary because the secondary impedance gets reduced by n2).

In high frequency the transformer model gets simplified as shown in Fig. A.5. The high

cut-off frequency can be calculated as

fH =1

2π√

(Rb/n2C1,2)2 + (L1,2/RC)2. (A.6)

For increasing the bandwidth in the upper frequencies, it is recommended the least number

of turns (reducing in this way all parasitic elements) and low permeability materials. These

materials have a lower permeability at low frequencies, but they extend much further in

R1,2

LC Rb/n2

1 : n

Fig. A.4: Low frequency model of the current transformer.

Page 79: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

65

high frequencies without dropping. They also have less losses and are more stable with

temperature.

Additional requirements are having enough sensitivity, which is given by

SV =VOI

=Rbn, (A.7)

and low noise, which results in a low burden resistor. As can be seen, there exists a trade-off

between the material, number of turns, and burden resistor.

A.2 Configurations Tested

Different configurations were tested varying the core geometry (toroidal, small binocular,

or big binocular), the number of turns of the primary and secondary, the wire type, and the

burden resistor. The configurations used are summarized in Table A.1. In order to compare

the different transformers, the transfer functions have been normalized to the ideal gain (i.e.

0dB represents the gain of an ideal transformer with that configuration).

The transformers are characterized with the test set-up shown in Fig. A.6. The series

resistance is used to excite the primary with a constant current independent of the impedance

load. The input impedance of the network analyzer is used as the burden resistor.

The conclusions extracted from the tests are:

• Because the ASSP SIP transformer is situated very close to the antenna, the use of

a big impedance controlled coaxial was considered not necessary. Instead of that, a

thin shielded wire was used, allowing the employment of the binocular core. This core

presents the advantage with respect toroidal cores of very reduced leakage inductance

L1,2

RC C1,2 Rb/n2

1 : n

Fig. A.5: High frequency model of the current transformer.

Page 80: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

66

Tab

leA

.1:

Lis

tof

curr

ent

tran

sfor

mer

con

figu

rati

ons

test

ed.

#C

ore

P/N

Geo

met

ryM

atl

n1

Pri

mar

yn

2S

econ

dar

yRb

SV

Rem

arks

1596

1000

801

Toro

idal

611

36A

WG

Tefl

on5

36A

WG

Tefl

on50

10

2286

1002

402

Bin

ocu

lar

611

36A

WG

Tefl

on5

36A

WG

Tefl

on50

10

3286

1002

402

Bin

ocu

lar

612

24A

WG

En

amel

1036

AW

GE

nam

el50

10

4286

1002

402

Bin

ocu

lar

611

24A

WG

En

amel

536

AW

GE

nam

el50

10

5286

1002

402

Bin

ocu

lar

611

28A

WG

Tefl

on5

28A

WG

Tefl

on50

10

6286

1002

402

Bin

ocu

lar

610.

518

AW

GT

eflon

328

AW

GT

eflon

508.

3

7596

1000

801

Toro

idal

611

28A

WG

Enam

el5

28A

WG

En

amel

5010

8286

1002

402

Bin

ocu

lar

611

28A

WG

En

amel

628

AW

GE

nam

el50

10

9286

1002

402

Bin

ocu

lar

611

28A

WG

En

amel

628

AW

GE

nam

el75

15

10

2873

0024

02

Bin

ocu

lar

731

28A

WG

En

amel

528

AW

GE

nam

el50

10

11

2843

0024

02

Bin

ocu

lar

431

28A

WG

En

amel

528

AW

GE

nam

el50

10

12

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el5

24A

WG

En

amel

5010

13

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el10

24A

WG

En

amel

5010

14

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el10

24A

WG

En

amel

5010

Fir

ston

ew

ired

onop

pos

ite

sid

es

15

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el+

Bra

id10

28A

WG

En

amel

5010

Sh

ield

un

con

nec

ted

16

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el+

Bra

id10

28A

WG

En

amel

5010

Sh

ield

con

nec

ted

tod

rive

rgr

oun

d

17

2873

0003

02

Bin

ocu

lar

(big

)73

124

AW

GE

nam

el+

Bra

id10

28A

WG

En

amel

5010

Sh

ield

con

nec

ted

tore

ceiv

ergr

ound

18

2873

0003

02

Bin

ocu

lar

(big

)73

1C

ust

omsh

ield

edw

ire

1028

AW

GE

nam

el50

10S

hie

ldu

nco

nn

ecte

d

19

2873

0003

02

Bin

ocu

lar

(big

)73

1C

ust

omsh

ield

edw

ire

1028

AW

GE

nam

el50

10P

otte

d.

Sh

ield

un

con

nec

ted

Page 81: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

67

PORT 1 (OUT)

PORT 2 (IN)

100Ω/1kΩ

NetworkAnalyzer

Fig. A.6: Current transformer test set-up.

(in mundane words, very little wire is not contributing to the magnetic field), with

higher AL, and it is very easy to wire allowing a high repeatability. A comparative of

toroidal and binocular cores of similar dimensions can be seen in Fig. A.7.

• The highest permeability core is preferred. Even if the permeability is reduced at high

frequencies or has more temperature degradation, to achieve a good low frequency

response is the best option. In Fig. A.8, three different materials were tested in the

same configuration, 73 with µr = 2500, 61 with µr = 125, and 43 with µr = 800.

• The burden resistor was selected to be 50Ω. It is an often convenient load to use [17],

because it is the load used by the manufacturer to provide its data, an arbitrary

5 10 15 20 25 30 35 40 45 50−20

−15

−10

−5

0

5

Frequency [MHz]

Mag

nit

ud

e[d

B]

1 (toroidal)

2 (binocular)

5 (binocular)

7 (toroidal)

Fig. A.7: Normalized gain for different core geometries and sizes.

Page 82: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

68

105 106 107 108−10

−5

0

5

Frequency [Hz]

Gain

[dB

]

9 (61)

10 (73)

11 (43)

Fig. A.8: Normalized gain for different core materials.

length of coaxial wire and common instrumentation can be used without changing

its properties, it requires a low number of turns to have a low impedance insertion,

and it imposes a low requirement on the amplifier input impedance. In this particular

application, it also presents an adequate low thermal noise.

• The number of turns was limited to five turns in the secondary. By having this low

number of turns, the high frequency response and the sensitivity are improved. On the

other hand, the impedance insertion is high, but limited by the low burden resistor.

In Fig. A.9, it can be seen how a big turns ratio (1:6) improves the low frequency

response, but with 1:5 is enough. It was also tested with half turn in the primary

(making it similar to a toroidal), but the response was not acceptable.

• The wire selected for the primary is a custom manufactured Stainless Steel (SS)

shielded wire. Unifilar shielded wires are not very common and this wire was already in

use in other ASSP instruments. As indicated some tests were performed with enamel

coated wire with a small braid (configurations 15 to 17), but even if the electrical

properties were good, the mechanical result was much better with the shielded wire.

• For the secondary, an enamel coated wire was used. This type of wire is often referred

as magnetic wire, because it is used in transformers and motors. It presents the

Page 83: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

69

5 10 15 20 25 30 35 40 45 50−10

−8

−6

−4

−2

0

2

Frequency [MHz]

Mag

nit

ud

e[d

B]

5 (1:5)

6 (0.5:3)

8 (1:6)

Fig. A.9: Normalized gain for different turns ratio.

advantages of having a copper core and a very thin insulation. This results in a

high conductivity and density, needing less turns than other wires. In the tests, this

advantage can be observed with respect to regular Teflon coated wire, or the custom

SS wire used in the primary. The final gauge selected, 28 AWG, was chosen from the

ones that were performing well electrically (24 and 28), and made easier the winding.

For example, a 36 AWG gauge was available, but at these frequencies the performance

was poor.

Configuration 19 is the final one. It consists of a big binocular core (2873000302), with

the custom shielded SS wire in the primary (N12-50F+00007-5), and the 28 AWG enamel

coated wire in the secondary (MW-MC5516-038). It presents a very flat frequency response

and a fair sensitivity. The transformer selected has enough space in the holes in case more

turns are considered necessary in the future. To fix the cables into a right position, the holes

are potted without affecting the electrical performances.

A.3 Final Transformer Tests

In order to improve the performances of the instrument, it is interesting to have two

similar transformers for the antenna and reference channels. Several transformers were

wired, potted, and tested with the configuration selected. The results presented in Fig. A.10,

Page 84: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

70

and zoomed in the bandwidth of interest in Fig. A.11, show a good repeatability, and they

were used to select the more similar couple in terms magnitude and phase. In this case,

transformers 8 and 11 are quite similar and have some of the higher gain.

The primary wire resistance was measured to be about 5.7Ω and the secondary resistance

105 106 107 108

−30

−20

−10

0

10

Frequency [Hz]

Mag

nit

ud

e[d

B]

4678910111213

105 106 107 108

−20

0

20

40

60

80

100

120

140

160

Frequency [Hz]

Ph

ase

[deg

rees

]

Fig. A.10: Final tests for transformer selection.

Page 85: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

71

2 4 6 8 10 12 14 16 18 200

5 · 10−2

0.1

0.15

0.2

0.25

0.3

0.35

0.4

Frequency [MHz]

Mag

nit

ud

e[d

B]

4678910111213

2 4 6 8 10 12 14 16 18 20−2

−1

0

1

2

3

Frequency [MHz]

Ph

ase

[deg

rees

]

Fig. A.11: Final tests for transformers selection with detail in the operational frequencybandwidth.

Page 86: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

72

of 0.1Ω. It would have been interesting to measure the capacitance and inductance (which

are normally not provided in the wire datasheet), to check the the expected cut-off and

resonant frequencies.

A.4 Hystereis and Saturation

Saturation and hysteresis affects the CT by producing harmonics on the secondary

output. A specific test was performed to assure that the level was acceptable. The CT

was driven with the maximum current at the minimum frequency and the secondary was

measured with a spectrum analyzer. The result can be seen in Fig. A.12, where the third

harmonic is 62 dB below the fundamental. This harmonic is in fact produced by the signal

generator (two different signal generator were used with similar results). Even if it were a

harmonic produced by the CT, it is low enough to discard any saturation degradation effects,

which was foreseen due to the low current levels, but it also discards any hysteresis problem.

A.5 Shield Rejection

The guard is only effective if the coupling between the primary core and secondary, and

the primary shield and secondary are very similar. To test this, the set-up of Fig. A.13

was used, where the same current is flown through primary and shield. In ideal conditions

0.5 1 1.5 2 2.5 3 3.5 4 4.5 5

−80

−60

−40

−20

62dB

Frequency [MHz]

Mag

nit

ud

e[d

Bm

]

Fig. A.12: Harmonics testing of the current transformer.

Page 87: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

73

the secondary output would be zero. The result have been normalized to the output of

the secondary when only current is flowing through the primary shown in Fig. A.14. As

frequency increases, the different geometry of the core and shield are more pronounced.

However, there is still a good rejection of at least 20 dB. This means that for having a

similar output to the actual signal, the stray capacitances should be 20dB higher than the

antenna capacitance (10 times in linear units), when in fact they are much less.

PORT 1 (OUT)

PORT 2 (IN)

1kΩ

NetworkAnalyzer

Fig. A.13: Current transformer shield rejection test set-up.

2 4 6 8 10 12 14 16 18 2015

20

25

30

35

40

Frequency [MHz]

Rej

ecti

on

Rat

io[d

B]

Fig. A.14: Rejection ratio of currents through the shield of the current transformer.

Page 88: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

74

Appendix B

PCB Schematics

(7 pages)

Page 89: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

75

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

08/1

2/20

13S

ync

Ser

ial I

nter

face

1

DG

ND

Vbu

s_In

UA

RT

_RS

232_

GS

E_T

X

TM

_Dat

a_H

_N

TM

_Dat

a_H

_P

TM

_MF

ram

e_H

_N

TM

_MF

ram

e_H

_P

TM

_Fra

me_

H_N

TM

_Fra

me_

H_P

TM

_Wor

d_H

_N

TM

_Wor

d_H

_P

TM

_Ena

ble_

H_N

TM

_Ena

ble_

H_P

TM

_Loa

d_L_

N

TM

_Loa

d_L_

P

TM

_Gtd

_Ck_

N

TM

_Gtd

_Ck_

P

JSI2

UA

RT

_GN

D

TM

_MF

ram

e_H

_N

TM

_Dat

a_H

_N

TM

_Dat

a_H

_P

TM

_MF

ram

e_H

_P

TM

_Fra

me_

H_N

TM

_Fra

me_

H_P

TM

_Wor

d_H

_N

TM

_Wor

d_H

_P

TM

_Ena

ble_

H_N

TM

_Ena

ble_

H_P

TM

_Loa

d_L_

N

TM

_Loa

d_L_

P

TM

_Gtd

_Ck_

N

TM

_Gtd

_Ck_

P

Vbu

s_In

UA

RT

_RS

232_

Pay

_TX

UA

RT

_RS

232_

Pay

_TX

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

TM

_MF

ram

e_H

_P

TM

_MF

ram

e_H

_NT

M_F

ram

e_H

_P

TM

_Fra

me_

H_N

TM

_Wor

d_H

_P

TM

_Wor

d_H

_NT

M_E

nabl

e_H

_P

TM

_Ena

ble_

H_N

TM

_MF

ram

e_H

_N

TM

_Loa

d_L_

P

TM

_Loa

d_L_

NT

M_G

td_C

k_P

TM

_Gtd

_Ck_

N

TM

_Dat

a_H

_NT

M_D

ata_

H_N

TM

_Fra

me_

H_P

TM

_Fra

me_

H_N

TM

_Wor

d_H

_P

TM

_Wor

d_H

_NT

M_E

nabl

e_H

_P

TM

_Ena

ble_

H_N

TM

_MF

ram

e_H

_P

TM

_Loa

d_L_

P

TM

_Loa

d_L_

NT

M_G

td_C

k_P

TM

_Gtd

_Ck_

N

C5

C04

02C

102K

3RA

CT

U0.

001u

F25

V

25V

0.00

1uF

C04

02C

102K

3RA

CT

UC4

C11

C04

02C

102K

3RA

CT

U0.

001u

F25

V

25V

0.00

1uF

C04

02C

102K

3RA

CT

UC12 C3

C04

02C

102K

3RA

CT

U0.

001u

F25

V

25V

0.00

1uF

C04

02C

102K

3RA

CT

UC2

SS

I_E

nabl

e_L

SS

I_E

nabl

e_H

SS

I_E

nabl

e_L

25V

0.1u

FC

0603

C10

4K3R

AC

TU

C6

C7 C

0603

C10

4K3R

AC

TU

0.1u

F

25V

TM

_Dat

a_H

_PT

M_D

ata_

H_P

SS

I_E

nabl

e_L

SS

I_E

nabl

e_L

SS

I_E

nabl

e_L

SS

I_E

nabl

e_L

SS

I_E

nabl

e_L

422

Rec

eive

rs

422

Driv

er

Ope

n in

puts

allo

wed

Tes

t Por

t

TM

_MF

ram

e_H

TM

_Fra

me_

HT

M_W

ord_

HT

M_E

nabl

e_H

TM

_Loa

d_L

TM

_Gtd

_Ck

511o

hmR

K73

H1J

L511

0F

R13

3

511o

hmR

K73

H1J

L511

0F

R13

4

511o

hmR

K73

H1J

L511

0F

R13

5

511o

hmR

K73

H1J

L511

0F

R13

6

511o

hmR

K73

H1J

L511

0F

R13

9

511o

hmR

K73

H1J

L511

0F

R14

0

511o

hmR

K73

H1J

L511

0F

R14

1

511o

hmR

K73

H1J

L511

0F

R14

2T

PP

0T

P-1

05-0

1-05

TE

ST

PO

INT

, GR

EE

N

TP

P1

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P2

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P3

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P4

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P5

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P6

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

TP

P7

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

Tes

tPor

t(7)

Tes

tPor

t(6)

Tes

tPor

t(5)

Tes

tPor

t(3)

Tes

tPor

t(2)

Tes

tPor

t(0)

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

TM

_Dat

a_H

TM

_Dat

a_H

TP

D7

SM

L-21

0MT

T86

21

TP

D6

SM

L-21

0MT

T86

21

TP

D5

SM

L-21

0MT

T86

21

TP

D4

SM

L-21

0MT

T86

21

TP

D3

SM

L-21

0MT

T86

21

TP

D2

SM

L-21

0MT

T86

21

TP

D1

SM

L-21

0MT

T86

21

TP

D0

SM

L-21

0MT

T86

21

Din

Rin

C1+

C1-

C2+

C2-

FO

RC

EO

FF

FO

RC

EO

N

EN

GN

DV-

V+

INV

ALI

D

Rou

t

Dou

t

VC

C

DG

ND

DG

ND

DG

ND

U4

MA

X32

21IP

W

15 13 9 10 3 7 14112166542811

C14

C06

03C

104K

3RA

CT

U0.

1uF

25V

C10

C06

03C

104K

3RA

CT

U0.

1uF

25V

25V

0.1u

F

C06

03C

104K

3RA

CT

U

C13

UA

RT

_GS

E_T

X_H

2-C

1

UA

RT

_Inv

alid

_L2-

C1

C9

C06

03C

104K

3RA

CT

U

0.1u

F

25V

UA

RT

_RS

232_

GS

E_T

X

GS

E P

ort I

nter

face

UA

RT

_RS

232_

GS

E_T

XU

AR

T_P

ay_T

X_H

UA

RT

_RS

232_

Pay

_TX

+3.3

VD

+3.3

VD

DG

ND

C1

C06

03C

104K

3RA

CT

U0.

1uF

25V

DG

ND

+3.3

VD 50

V0.

1uF

C11

1

GN

D

GN

D

GN

D

Shi

eld_

Ter

min

atio

n_T

M_D

ata

Dig

ital

Ext

erna

l

Ext

erna

lD

igita

l

Digital

External

GN

D

++

C8

TA

JD22

6K03

5R22

uF 35V

C18

6

TA

JD22

6K03

5R22

uF

35V

UA

RT

_RS

232_

Pay

_TX

100o

hmR

K73

H1J

L100

0F

R11

UA

RT

_GS

E_T

X_H

UA

RT

_Inv

alid

_L

100o

hmR

10 RK

73H

1JL1

000F

RK

73H

1JL1

000F

R5

100o

hmT

M_G

td_C

kT

M_L

oad_

LTM

_Ena

ble_

HT

M_W

ord_

HT

M_F

ram

e_H

TM

_MF

ram

e_H

100o

hmR

12

100o

hmR

9R

710

0ohm

100o

hmR

8

R6

100o

hm

C1

A2

D2

D2

A2

A2

A2

B2

A2

B2

B2

C2

B2

C2

C2

5-B

2

C2

B1

B1

B1

B1

B1

B1

B1

B1

C1

C1

C1

C1

B1

B2,

C2

B1

C2,

D3

2-C

1B

2,D

3

2-C

12-

B1

2-B

12-

B1

2-B

12-

B1

B2,

C2

C2,

D3

B2,

D3

2-C

1

2-C

1

B1

2-C

1

B1

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

AS

SP

W. C

ox18

6-01

40- 6

186-

0140

Pla

ce a

ll LE

Ds

and

Tes

t poi

nts

on to

p si

deO

rder

with

7 o

n le

ft an

d 0

on r

ight

.

R4

RK

73H

2BT

TD

1210

F12

1ohm

121o

hmR

K73

H2B

TT

D12

10F

R3

R15

RK

73H

2BT

TD

1210

F12

1ohm

121o

hmR

K73

H2B

TT

D12

10F

R16 R2

RK

73H

2BT

TD

1210

F12

1ohm

121o

hmR

K73

H2B

TT

D12

10F

R1

U3

16 3 5 11 13 812415149107612

1A 1B 2A 2B 3A 3B 4A 4B G GG

ND4Y3Y2Y1Y

VC

C

AM

26LV

32ID

R

Inpu

ts d

on't

load

line

whe

n V

cc =

0V

1A 1B 2A 2B 3A 3B 4A 4B G GG

ND4Y3Y2Y1Y

VC

C

AM

26LV

32ID

R

2 1 6 7 10 9 14 15 4 12813115316

U2

4.8

Mbp

s S

erea

l Int

erfa

ce

4.8

Mbp

s S

erea

l Int

erfa

ce

U7

2 3 6 5 10 11 14 1381241597116

VC

C 1A 2A 3A 4A G G

GN

D4Z4Y3Z3Y2Z2Y1Z1Y

AM

26LV

31ID

R

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

JSI2

1

5747

238-

2

JSI2

2

5747

238-

2

JSI2

3

5747

238-

2

JSI2

4

5747

238-

2

JSI2

5

5747

238-

2

JSI2

6

5747

238-

2

JSI2

7

5747

238-

2

JSI2

8

5747

238-

2

JSI2

9

5747

238-

2

JSI2

10

5747

238-

2

JSI2

11

5747

238-

2

JSI2

12

5747

238-

2

JSI2

13

5747

238-

2

JSI2

14

5747

238-

2

JSI2

15

5747

238-

2

JSI2

16

5747

238-

2

JSI2

17

5747

238-

2

JSI2

18

5747

238-

2

JSI2

19

5747

238-

2

JSI2

20

5747

238-

2

JSI2

21

5747

238-

2

JSI2

22

5747

238-

2

JSI2

23

5747

238-

2

JSI2

24

5747

238-

2

JSI2

25

5747

238-

2

Digital

External

Tes

tPor

t(7)

Tes

tPor

t(6)

Tes

tPor

t(5)

Tes

tPor

t(4)

Tes

tPor

t(3)

Tes

tPor

t(2)

Tes

tPor

t(1)

Tes

tPor

t(0)

2-D

2

2-D

2

2-D

2

2-D

2

2-D

2

2-D

2

2-D

2

2-D

2

186-

0317

Page 90: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

76

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

08/1

2/20

132

TD

I

TC

K

TM

S

TD

O

TR

ST

IO00

RS

B0/

GA

A0

IO01

RS

B0/

GA

A1

IO02

RS

B0/

GA

B0

IO03

RS

B0/

GA

B1

IO04

RS

B0/

GA

C0

IO05

RS

B0/

GA

C1

IO223NDB3

IO11

RS

B0

IO23

RS

B0

IO16

RS

B0

IO17

RS

B0

IO21

RS

B0

IO22

RS

B0

IO28

RS

B0

IO29

RS

B0

IO25

RS

B0

IO27

RS

B0

IO36

RS

B0

IO38

RS

B0

IO33

RS

B0

IO34

RS

B0

IO35

RS

B0

IO46

RS

B0

IO47

RS

B0

IO44

RS

B0

IO42

RS

B0

IO45

RS

B0

IO50

RS

B0

IO51

RS

B0

IO49

RS

B0

IO52

RS

B0

IO55

RS

B0

IO57

RS

B0

IO61

RS

B0

IO56

RS

B0

IO60

RS

B0

IO80NDB1

IO62

RS

B0

IO71

RS

B0

IO79

ND

B1

IO72

RS

B0/

GB

C0

IO73

RS

B0/

GB

C1

IO74

RS

B0/

GB

B0

IO75

RS

B0/

GB

B1

IO76

RS

B0/

GB

A0

IO77

RS

B0/

GB

A1

IO78

PD

B1/

GB

A2

IO81PDB1

IO79

PD

B1/

GB

B2

IO78

ND

B1

IO80PDB1/GBC2

IO83NPB1

IO81NDB1

IO82NSB1

IO86PPB1

IO86NPB1

IO90PPB1

IO90NPB1

IO87PDB1

IO87NDB1

IO83PPB1

IO96NPB1

IO91PPB1/GCC1

IO91NPB1/GCC0

IO92PPB1/GCB1

IO92NPB1/GCB0

IO93PPB1/GCA1

IO93NPB1/GCA0

IO94PSB1/GCA2

IO102PDB1

IO95PPB1/GCB2

IO95NPB1

IO96PPB1/GCC2

IO102NDB1

IO88PDB1

IO88NDB1

IO113NDB1/GDA0

IO100PPB1

IO100NPB1

IO107PDB1

IO107NDB1

IO106PDB1

IO106NDB1

IO111PDB1/GDC1

IO111NDB1/GDC0

IO112PPB1/GDB1

IO112NPB1/GDB0

IO113PDB1/GDA1

IO11

6RS

B2/

GD

C2

IO18

7RS

B2/

GE

A2

IO18

6RS

B2/

GE

B2/

FF

IO18

5RS

B2/

GE

C2

IO19

2NP

B3

IO18

4RS

B2

IO17

9RS

B2

IO18

3RS

B2

IO17

1RS

B2

IO17

2RS

B2

IO16

8RS

B2

IO16

5RS

B2

IO203PDB3

IO16

3RS

B2

IO16

1RS

B2

IO17

0RS

B2

IO15

9RS

B2

IO16

4RS

B2

IO15

7RS

B2

IO15

5RS

B2

IO15

1RS

B2

IO15

8RS

B2

IO14

7RS

B2

IO15

3RS

B2

IO14

9RS

B2

IO14

2RS

B2

IO13

6RS

B2

IO14

3RS

B2

IO14

1RS

B2

IO13

7RS

B2

IO13

5RS

B2

IO13

8RS

B2

IO13

4RS

B2

IO12

9RS

B2

IO13

0RS

B2

IO12

4RS

B2

IO13

1RS

B2

IO12

8RS

B2

IO12

5RS

B2

IO110NDB1

IO12

0RS

B2

IO110PDB1

IO11

5RS

B2/

GD

B2

IO11

4RS

B2/

GD

A2

GND1

GND2

GND3

GND4

GND5

GND6

GND7

GND8

GND9

GND10

GND11

GND12

GND13

GND14

GND15

GND16

GND17

GND18

GND19

GND20

GND21

GND22

GND23

GND24

GNDQ1

GNDQ2

GNDQ3

GNDQ4

GNDQ5

GNDQ6

IO18

8PD

B3/

GE

A1

IO18

8ND

B3/

GE

A0

IO18

9PD

B3/

GE

B1

IO18

9ND

B3/

GE

B0

IO19

0PP

B3/

GE

C1

IO19

0NP

B3/

GE

C0

IO19

2PP

B3

IO19

3NP

B3

IO197NSB3

IO19

4PS

B3

IO196PPB3

IO19

6NP

B3

IO203NDB3

IO202PDB3

IO19

3PP

B3

IO210PSB3

IO217PDB3

IO217NDB3F1

IO216PDB3

IO218PDB3

IO213PDB3

IO218NDB3

IO216NDB3

IO221PDB3

IO222PDB3

IO222NDB3

IO223PDB3/GAC2

IO221NDB3

IO224PDB3/GAB2

IO224NDB3

IO225PDB3/GAA2

IO225NDB3

IO204PDB3/GFC2

IO202NDB3

IO205PDB3/GFB2

IO205NDB3

IO206PSB3/GFA2

IO204NDB3

IO207PDB3/GFA1

IO209NPB3/GFC0

IO208PPB3/GFB1

IO208NPB3/GFB0

IO209PPB3/GFC1

IO207NDB3/GFA0

IO213NDB3

VCC1

VCC2

VCC3

VCC4

VCC5

VCC6

VCC7

VCC8

VCC9

VCC10

VCC11

VCC12

VCC13

VCC14

VCC15

VCC16

VCCIB0_1

VCCIB0_2

VCCIB0_3

VCCIB0_4

VCCIB1_1

VCCIB1_2

VCCIB1_3

VCCIB1_4

VCCIB2_1

VCCIB2_2

VCCIB2_3

VCCIB2_4

VCCIB3_1

VCCIB3_2

VCCIB3_3

VCCIB3_4

VMV0_1

VMV0_2

VMV1_1

VMV1_2

VMV2_1

VMV2_2

VMV3_1

VMV3_2

VCCPLF

VPUMP

VJTAG

VCOMPLF

TC

KG

ND

1

TD

O

VJT

AG

TM

S

VP

UM

PT

RS

T

PM

OD

E

TD

IG

ND

2

DG

ND

DG

ND

DG

ND

NC

GN

D

OU

TP

UT

VC

C

DG

ND

DG

ND

DG

ND

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+3.3

VD

+1.5

VD

+3.3

VD

SI

SC

K

HO

LD

WP

CS

GN

DSO

VC

C

EP

DG

ND

+3.3

VD

DG

ND

DG

ND

DG

ND

+1.5

VD

+1.5

VD

DG

ND

+1.5

VD

DG

ND

DG

ND

+3.3

VD

+3.3

VD

DG

ND

+3.3

VD

DG

ND

+1.5

VD

A1

A2

GN

DY

2

Y1

VC

C

DG

ND

+3.3

VD

U1

AG

L100

0V5-

FG

256I

H4

N14

P14

J3

M5

C3

M12

P3

P12

E12

E5

C14

L5

K5

G5

F5

M11

M10

M7

M6

L12

K12

G12

F12

E11

E10

E7

E6

L10

L9

L8

L7

K11

K6

J11

J6

H11

H6

G11

G6

F10

F9

F8

F7

G2

H2

G4

H1

H3

H5

J2

K2

J1

J4

J5

L1

K1

C2

B2

C1

B1

E3

D3

D1

D2

E4

F4

F2

G3

E2

F3

E1

G1

L4

L2

K3

M2

L3

N1

M1

M3

N2

M4

N3

P2

P1

R2

R1

R15

N12

N5

D12

D5

B3

T16

T1

L11

L6

K10

K9

K8

K7

J10

J9

J8

J7

H10

H9

H8

H7

G10

G9

G8

G7

F11

F6

A16

A1

T14

R13

N13

T13

M13

R12

P11

R11

N11

T11

N10

P10

R10

T10P9

N9

R9

M9

T9

R8

T8

M8

T7

P8

N8

R7

T6 P7

T5

N7

R6

K4

P6

R5

T4

P5

T2

P4

R3

N4

R4

T3

N6

T12

N16

L13

M14

N15

M15

L14

L15

M16

L16

K14

J15

P16

G16

G15

K15

J14

K13

J12

K16

J16

H14

J13

H16

H13

H12

G13

H15

E14

F16

E16

G14

F15

F14

E15

D16

C16

F13

E13

C15

D14

B16

B15

A15

A14

A13

B13

B12

C12

D15

B14

C13

D13

D11

C11

A12

B11

A11

D10

C10

B10

A10

A9

C9

B9

E9

D9

A8

B8

D8

E8

C8

B7

C7

D7

A7

A6

B6

B5

A5

D6

C4

D4

C6

C5

B4

A4

A3

A2

P15

R16

T15

P13

R14

P1

PZ

N-1

0-A

A_J

TA

G

109

4 875

6

3

21

100K

ohm

RK

73H

1JL1

003F

R13

7

FO

X92

4B-1

0.00

0

Y3

4 3 21

0ohm

RK

73Z

1JLT

D

R27

C17

C08

05C

105K

3PA

CT

U1u

F

25V

100Kohm

RK73H1JL1003F

R18

1N58

19H

W-7

-F

D1

2 1

R23 0603RES_NA

R22 0603RES_NA

R21 0603RES_NA

R20 0603RES_NA

R19 0603RES_NA

Sys

Clk

Hol

ds F

PG

A in

res

et fo

r ap

prox

. 100

ms

Res

et C

ircui

tJT

AG

Con

nect

or

Clo

ck C

ircui

tIG

LOO

FP

GA

Load

with

firm

war

e 18

6-01

22

Pla

ce z

ero

ohm

jum

pers

in p

rope

r po

sitio

ns fo

r W

ID[4

:0]

to in

dica

te P

CB

SN

in b

inar

y.

Ser

ial N

umbe

r D

etec

tF

LAS

H M

emor

y

AT

25D

F64

1-M

WH

-Y

U12

98 2 4

13765

FL_

CS

_LF

L_W

P_L

FL_

Hol

d_L

FL_

SI_

H

FL_

SO

_H

TestPort(7)TestPort(6)TestPort(5)

TestPort(4)TestPort(3)

TestPort(2)

TestPort(1)

TestPort(0)

FL_

SI_

H

FL_

Hol

d_L

FL_

SO

_H

FL_

WP

_L

FL_

CS

_L

R47

100o

hm

R48

100o

hm

R50

100o

hm

R46

100o

hm

R49

100o

hm

FL_

Sck

FL_

SO

_H

FL_

SI_

H

FL_

WP

_L

FL_

Hol

d_L

FL_

CS

_L

FL_

Sck

0.1u

FC

0603

C10

4K3R

AC

TU

C26

R30 100ohm100ohmR29

R28 100ohm

100ohmR31

HK_ADC_DIn_H HK_ADC_DIn_H

HK_ADC_DClk HK_ADC_DClk

HK_ADC_Shdn_L HK_ADC_Shdn_L

HK_ADC_CS_L HK_ADC_CS_L

100ohmR34

R32 100ohm

100ohmR36

R33 100ohm

HK

_DO

ut_H

HK

_DO

ut_H

HK

_Bus

y_H

HK

_Bus

y_H

FL_

Sck

FL_

Sck

2.2u

F

C35

C16

C12

06C

225K

5RA

CT

U

2.2u

F50

V

C27

0.1u

F25

V0.

1uF

C06

03C

104K

3RA

CT

U

C21

C12

5

C04

02C

103K

3RA

CT

U

0.01

uF0.

01uF

C12

4C

123

0.01

uF25

V0.

01uF

C13

4

C25

C06

03C

104K

3RA

CT

U

0.1u

F0.

1uF

C32

0.1u

F

C11

2C

113

0.1u

F0.

1uF

C19

C33

0.1u

F

C24

0.1u

F0.

1uF

C30

C20

0.1u

F25

V

C11

5

C04

02C

103K

3RA

CT

U

0.01

uF0.

01uF

C11

4C

144

0.01

uF0.

01uF

C14

3C

139

0.01

uF0.

01uF

C12

2C

141

0.01

uF0.

01uF

C14

2C

117

0.01

uF25

V

0.00

1uF

C04

02C

102K

3RA

CT

U

C13

7C

136

0.00

1uF

C14

0

0.00

1uF

0.00

1uF

C13

8

0.00

1uF

C12

0C

118

0.00

1uF

C12

1

0.00

1uF

0.00

1uF

C11

9

0.00

1uF

C11

6C

132

0.00

1uF

C12

6

0.00

1uF

25V

C13

3

C04

02C

102K

3RA

CT

U

0.00

1uF

0.00

1uF

C13

5

0.00

1uF

C13

1C

128

0.00

1uF

C12

7

0.00

1uF

25V

0.00

1uF

C13

0

R25

100o

hm

100o

hmR

24S

SI_

Ena

ble_

LS

SI_

Ena

ble_

L

SS

I_E

nabl

e_H

SS

I_E

nabl

e_H

TM

_Fra

me_

H

TM

_Wor

d_H

UA

RT

_Pay

_TX

_H

UA

RT

_GS

E_T

X_H

UA

RT

_Inv

alid

_L

UA

RT

_GS

E_T

X_H

UA

RT

_Inv

alid

_L

TM

_MF

ram

e_H

TM

_Ena

ble_

H

TM

_Gtd

_Ck

TM

_Loa

d_L

R26

100o

hmT

M_D

ata_

HT

M_D

ata_

H

TM

_Ena

ble_

H

TM

_MF

ram

e_H

TM

_Fra

me_

H

TM

_Wor

d_H

TM

_Gtd

_Ck

TM

_Loa

d_L

U6

NC

7WP

14P

6X

5 6 4231

AR

st_L

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

SIP

_DD

S_S

ync_

Clk

SIP

_DD

S_S

ync_

Clk

SIP

_DD

S_S

CK

SIP

_DD

S_C

S_L

SIP

_DD

S_I

O_U

pdat

e

SIP

_DD

S_R

eset

_L

SIP

_DD

S_P

WR

_DW

N

100o

hmR

53S

IP_D

DS

_SC

K

100o

hmR

54

100o

hmR

55

100o

hmR

51

100o

hmR

52S

IP_D

DS

_PW

R_D

WN

SIP

_DD

S_R

eset

_L

SIP

_DD

S_I

O_U

pdat

e

SIP

_DD

S_C

S_L

6-C2

6-C2

1-C

2

1-D

3

1-A

3

3-B

1

3-B

1

3-C4

3-C43-C4

3-C4

100o

hmR

5610

0ohm

R57

100o

hmR

58

100ohm R59

B4

SIP_DDS_P(0)

SIP_RFIV_Ctrl

SIP_ADC_SDI

SIP_ADC_SCKSIP_ADC_CNV

100ohm R35

100ohm R42

100ohm R40100ohm R38 SIP_ADC_CNV

SIP_ADC_SCK

SIP_ADC_SDI

SIP_RFIV_Ctrl

SIP_ADC_SDO SIP_ADC_SDO

R13

806

03R

ES

_NA

100o

hmR

79

PayID[4]PayID[3]PayID[2]PayID[1]PayID[0]

Pla

ce 1

k on

R??

? fo

r fli

ght

3-B

1

B4

B4

B4

B4

B4

A2

A2 A2

A2

A2

A2

3-B

1

3-B

1

3-B

2

6-C2

6-B

4

1-C

2

1-C

2

1-D

2

1-A

3

1-A

3

1-A

3

1-C

3

3-D1

6-C2

6-B

4

1-C

3

6

186-

0140

186-

0140

-

AS

SP

W. C

ox

FP

GA

DG

ND

+3.3

VD

C18

C06

03C

104K

3RA

CT

U0.

1uF

25V

25V

0.1u

FC

0603

C10

4K3R

AC

TU

C23

DG

ND

+3.3

VD

10 M

Hz

Fre

quen

cy C

lock

UA

RT

_Pay

_TX

_H

R39 100ohm

R41

100o

hm

R43

100o

hm

R45

100o

hm

C14

9C

0603

C10

4K3R

AC

TU

0.1u

F

25V

DG

ND

+3.3

VD

SIP

_DD

S_S

DO

(1)

SIP

_DD

S_S

DO

(0)

SIP

_DD

S_S

DO

(2)

SIP_DDS_SDO(3)

SIP_DDS_P(0)

SIP

_DD

S_P

(2)

SIP

_DD

S_P

(3)

SIP

_DD

S_P

(1)

HkAddr(2)

HkAddr(1)HkAddr(0)

HkAddr(3)

TestPort(0)

TestPort(1)

TestPort(2)

TestPort(3)TestPort(4)

TestPort(5)TestPort(6)TestPort(7)

3-B

1

3-B

1

3-B

1

3-B

1

1-C

1

3-B

1

6-B

16-

B1

1-C

41-

C4

3-B

1

3-B

1

3-B

1

6-B

16-

B1

1-C

41-

C4

1-C

41-

C4

1-C

41-

C4

186-

0317

Page 91: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

77

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

308

/12/

2013

AS

SP

W. C

ox18

6-00

10

C97

0.1u

F

50V

C93

0.1u

F

50V

C91

0.1u

F

50V

C88

0.1u

F

50V

C83

C08

05C

104K

5RA

CT

U

0.1u

F

50V

AG

ND

+1.8

VA

AG

ND

+1.8

VA

C10

40.

1uF

50V

C92

0.1u

F

50V

C94

0.1u

F

50V

C98

0.1u

F

50V

C10

2C

0805

C10

4K5R

AC

TU

0.1u

F

50V

C89

0.1u

F

50V

C10

30.

1uF

50V

C85

0.1u

F

50V

C10

50.

1uF

50V

C99

0.1u

F

50V

AG

ND

+1.8

VA

C10

00.

1uF

50V

C10

60.

1uF

50V

DG

ND

C82

0.1u

F

50V

+3.3

VD

DG

ND

+3.3

VD C

159

0.1u

F

50V

25V0.01

uF

C04

02C

103K

3RA

CT

U

C16

0

+1.8

VA

R14

8

RK

73H

1JL2

4R9F

24.9

ohm

VR

FV

RF

VR

F_N

VR

F_N

VLO

VLO

_N

VLO

VLO

_N

+1.8

VA

+3.3

VD

C16

20.

001u

F

50V

C16

3

C08

05C

102J

5RA

CT

U

0.00

1uF

DG

ND

Y1

4 3 21

E/D

GN

D

OU

TP

UT

VD

D

CW

X81

3-06

4.0M

R14

5R

K73

H1J

L150

1F

R14

6

RK

73H

1JL1

501F

DG

ND

U17

2

31+ P

AD

-

AD

590J

F

AG

ND

HK

_Tem

pSen

sor_

SIP

See

CW

X8

serie

s da

tash

eet f

or

deco

uplin

g ca

paci

tor

reco

mm

ende

d ro

utin

g an

d po

sitio

ning

.

U23

57

3937 38343228

40 41 42 43

5 7 11 15 19 21 26 29 30 33 35

24 23 22

36

27

31 54 2

1

6 10 12 16 18 20 25

56443 41749 46

1413

5150 52

98

53 47485545D

VD

D1

DV

DD

2

SC

LK

CS

SD

IO_3

CH

0_O

UT

CH

0_O

UT

SD

IO_2

SD

IO_0

SD

IO_1

CH

1_O

UT

CH

1_O

UT

I/O_U

PD

AT

E

DV

DD

_I/O

DA

C_R

SE

T

PW

R_D

WN

_CT

L

MA

ST

ER

_RE

SE

T

DG

ND

1

DG

ND

2

AG

ND

7

AG

ND

6

AG

ND

5

AG

ND

4

AG

ND

3

AG

ND

2

AG

ND

1

SY

NC

_IN

SY

NC

_OU

T

SY

NC

_CLK

AV

DD

10

LOO

P_F

ILT

ER

AV

DD

13

RE

F_C

LK

RE

F_C

LK

CLK

_MO

DE

_SE

L

AV

DD

12

AV

DD

11

AV

DD

9

AV

DD

8

AV

DD

7

AV

DD

6

AV

DD

5

AV

DD

4

AV

DD

3

AV

DD

2

AV

DD

1

P3

P2

P1

P0

NC

1

NC

2

NC

3

NC

4

AV

DD

14

AV

DD

15

EP

AD

9958

BC

PZ

AG

ND

+1.8

VA

+3.3

VD

AG

ND

AG

ND

+1.8

VA

VR

F_N

VR

FV

RF

_NV

RF

VLO

_NV

LOV

LO_N

VLO

C17

0

220p

F50

V

C17

21u

F

AG

ND

C16

9

220p

F50

V

C90

270p

F

VR

Ffil

t

50V

120p

F

C17

7

50V

82pF

C18

3

50V

270p

F

C17

4

AG

ND

+5V

A

AG

ND

AG

ND

SIP

_AD

C_I

n_N

SIP

_AD

C_I

n_P

SIP

_AD

C_I

n_P

SIP

_AD

C_I

n_N

C54

1uF25

V

AG

ND

C16

4

47pF

C16

506

035A

470J

AT

2A47

pF50

V

DG

ND

HK

_Tem

pSen

sor_

SIP

U14

2 110 7 568943

IN+

IN-

SD

I

SC

K

CN

VG

ND

SD

O

VIO

RE

F

VD

D

AD

7687

BR

MZ

SIP

_AD

C_I

n_P

SIP

_AD

C_I

n_N

SIP

_AD

C_S

DI

SIP

_AD

C_S

CK

SIP

_AD

C_C

NV

AG

ND

+3.3

VD

+5V

A

SIP

_AD

C_S

DI

SIP

_AD

C_S

CK

SIP

_AD

C_C

NV

SIP

_AD

C_S

DO

SIP

_DD

S_S

CK

SIP

_DD

S_S

CK

SIP

_DD

S_R

eset

_LS

IP_D

DS

_Res

et_L

SIP

_DD

S_P

WR

_DW

NS

IP_D

DS

_PW

R_D

WN

SIP

_DD

S_I

O_U

pdat

eS

IP_D

DS

_IO

_Upd

ate

SIP

_DD

S_C

S_L

SIP

_DD

S_C

S_L

SIP

_DD

S_S

ync_

Clk

DG

ND

+3.3

VD 50

V0.

1uF

C44

50V

0.1u

FC

55

+5V

A

AG

ND

U24

16 17 18 20 2 4 13

14 76101131915851291V

P1

VP

2

VP

3

VN

1

VN

2

VN

3

AP

AN

LOP

LON

RF

P

RF

N

BIA

S

GN

D2

GN

D1

IFN

IFP

CO

M

VF

B

OU

T

AD

831A

PZ

AG

ND

AG

ND

VR

Fde

t

+5V

A

-5V

A

AG

ND

+5V

A +5V

A

DG

ND

+5V

A-5

VA

50V

0.1u

FC

179

50V

0.1u

FC

178

50V

0.1u

FC

184

50V

0.1u

FC

181

50V

0.1u

FC

185

50V

0.1u

FC

173

AG

ND

AG

ND

SIP

_AD

C_I

n_P

SIP

_AD

C_I

n_N

+3.3

VA

RF

IV_C

trl_

Buf

SIP

_RF

IV_C

trl

SIP

_RF

IV_C

trl

C52

0.1u

F

50V

+5V

A

+5V

A

AG

ND

AG

ND

+5V

A

AG

ND

C17

50.

1uF

50V

+5V

A

AG

ND

C18

00.

1uF

50V

L1

MLF

1005

LR47

K

470n

HL3 MLF

1005

DR

33K

T

330n

HL5

MLG

1005

SR

36J

360n

H

L2

MLF

1005

LR47

K

470n

HL4 MLF

1005

DR

33K

T

330n

HL6

MLG

1005

SR

36J

360n

H

+3.3

VA

AG

ND

+1.8

VA

AG

ND

186-

0140

SIP

_DD

S_P

(3)

SIP

_DD

S_P

(2)

SIP

_DD

S_P

(1)

SIP

_DD

S_P

(0)

Ref

Clk

Ref

Clk

_N

Ref

Clk

Ref

Clk

_N

Ref

Clk

Ref

Clk

_NR

efC

lk_N

Ref

Clk

Ref

Clk

Ref

Clk

_NR

efC

lkR

efC

lk_N

VR

Ffil

t_N

VR

Fde

t_N

AG

ND

+5V

A

+3.3

VA

-5V

A

J1 54

32

1

1053

378-

1

J2 54

32

1 1053

378-

1

J1

J2

JSI3

R14

9R

K73

H1J

L49R

9F49

.9oh

m

R15

0R

K73

H1J

L49R

9F49

.9oh

m

R14

7R

K73

H1J

L49R

9F

49.9

ohm

R15

2R

K73

H1J

L49R

9F

49.9

ohm

R15

1R

K73

H1J

L49R

9F49

.9oh

m

R12

606

03R

ES

_NA

C17

1

24pF

25V

C18

2

180p

F50

V

C17

6

2-D

32-

D3

2-D

32-

D3

240p

F10

0V

2-D

3

50V

120p

F

C96

50V

82pF

C86

25V

24pF

C95

B2

B2

B2

B2

B2

50V

B1,

C1

B1,

C1

C1

C1

100V

240p

F

A2

A2

C4

Iout

= 1

8.91

/ R

set

For

Rse

t = 1

.87k

->

Iout

= 1

0.1

mA

Rec

onst

ruct

ion

Filt

er

Out

put:

- 1V

pp (

open

)-

0/8V

pp (

ref.

chan

nel l

oad)

Tel

emet

ry A

DC

Gai

n fr

om R

F to

IF: 2

*pi

(diff

eren

tial)

Det

ecto

r (b

alan

ced

dem

odul

ator

)

Inpu

t: -

Max

: +10

dBm

-

Nom

: +4

dBm

(1V

pp)

Rec

onst

ruct

ion

Filt

er

+1.2

5VA

R13

2R

K73

H1J

L49R

9F

49.9

ohm

R13

1

RK

73H

1JL1

001F

1Koh

m

R12

9R

K73

H1J

L49R

9F

49.9

ohm

1Koh

m

RK

73H

1JL1

001F

R13

0

R12

4

RK

73H

1JL1

871F

1.87

Koh

m

Rec

onst

ruct

ion

Filt

er S

imul

atio

n

C10

9

C06

03C

333J

5RA

CT

U0.

033u

F

50V

50V 0.03

3uF

C06

03C

333J

5RA

CT

U

C10

7

C11

0C

0603

C15

2K5R

AC

TU

0.00

15uF 0.

0015

uF

C06

03C

152K

5RA

CT

UC10

8

9C-6

4.00

0MA

AJ-

Tis

a N

OT

AS

SE

MB

LED

part

.

R12

5R

K73

Z1J

LTD

0ohm

U25

48

132

- +A

DA

4896

-2A

RM

Z

U25

48

756

- +A

DA

4896

-2A

RM

Z

B2

B1,

C1

B1,

C1

6-C

1

180p

F

C84

C87

C4

A4

2-C

4

2-B

4

B4

2-C

4

2-C

4

2-C

42-C

4

Sig

nal G

ener

ator

(D

DS

)

T26

3 2 1

4 5 6654

123

PR

IS

EC

T1-

6T-X

65+T

273 2 1

4 5 6654

123

PR

IS

EC

T1-

6T-X

65+

T28

3 2 1

4 5 6654

123

PR

IS

EC

T1-

6T-X

65+

6S

IP

-

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

64 M

Hz

Osc

illat

or

R11

610

0ohm

R11

910

0ohm

R11

810

0ohm

R11

710

0ohm

SIP

_DD

S_S

ync_

Clk

SIP

_DD

S_S

DO

(3)

SIP

_DD

S_S

DO

(2)

SIP

_DD

S_S

DO

(1)

R76

100o

hm

R12

010

0ohm

SIP

_DD

S_S

DO

(0)

SIP

_AD

C_S

DO

Digital

Analog

U15

5

6 4 2

31V

CC

A A

GN

D

BVC

CB

DIR

SN

74LV

C1T

45M

DC

KR

EP

+3.3

VD

AG

ND

C48

0.1u

F

50V

+3.3

VD

DG

ND

AG

ND

Y2

12

9C-6

4.00

0MA

AJ-

T

P2

9

1734

352-

1

P2

3

1734

352-

1

P2

1

1734

352-

1

P2

6

1734

352-

1

2-B

4

2-A

4

2-C

4

2-C

4

P2

2

1734

352-

1

P2

8

1734

352-

1

P2

7

1734

352-

1

P2

5

1734

352-

1

P2

4

1734

352-

1

50V

C15

0

10uF

C10

1

10uF

SIP

_DD

S_S

DO

(0)

SIP

_DD

S_S

DO

(1)

SIP

_DD

S_S

DO

(2)

SIP

_DD

S_S

DO

(3)

SIP

_DD

S_P

(0)

SIP

_DD

S_P

(1)

SIP

_DD

S_P

(2)

SIP

_DD

S_P

(3)

2-B

4

2-B

4

2-D

3

2-C

4

AG

ND

AG

ND

DG

ND

R15

9

RK

73Z

2ALT

D

0ohm

RF

PR

FN

$4I8

703

186-

0317

Page 92: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

78

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

+Vin

CT

RL

-Vin

NC

CO

M

-Vou

t

+Vou

t

AG

ND

AG

ND

IN

FB

CO

MP

RE

F

GN

D

PG

ND

LX

VC

C

The

rmal

Pad

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

DG

ND

AG

ND

AG

ND

+3.3

VD

+1.5

VD

Vin

+

CT

RL

Vin

-V

out-

NC

2

Vou

t+

NC

1

DG

ND

10V

10uF

C12

10C

106J

8NA

CT

U

C36

PS

1

RS

3-24

15D

Z

6 87 5

132

U10

MA

X19

51E

SA

+

91 7

6325

4

8

T15

PV

A

TP

-105

-01-

02T

ES

T P

OIN

T, R

ED

GN

D2 TP

-105

-01-

04T

ES

T P

OIN

T, Y

ELL

OW

T1P

5VD T

P-1

05-0

1-05

TE

ST

PO

INT

, GR

EE

N

VB

US

1 TP

-105

-01-

06

TE

ST

PO

INT

,BLU

E

0ohm

RK

73Z

1JLT

D

R65

R70

RK

73H

1JL1

692F

16.9

Koh

mR72

RK

73H

1JL1

472F

14.7

Koh

m

L7 7440

4300

18

1.8u

H

10V

10uF

C12

10C

106J

8NA

CT

U

C42

C43

C08

05C

221K

4RA

CT

U22

0pF

16V

TE

ST

PO

INT

, GR

EE

NT

P-1

05-0

1-05

T5V

D

R73

RK

73H

1JL5

112F

51.1

Koh

m

+5V

D_I

N

±15V

A S

uppl

y

±5V

A S

uppl

y

Digital

Analog

FP

GA

Cor

e +1

.5V

D S

uppl

y

+5V

D S

uppl

y

+5V

A_I

N

C15

3C

0805

C10

5K3P

AC

TU

1uF

25V

+15V

A_I

N

C15

4

C08

05C

105K

3PA

CT

U

1uF

25V

-15V

A_I

N

+5V

D_I

N

+15V

A_I

N

-15V

A_I

N

+5V

A_I

N

PS

3

RS

3-24

05S

Z

56 8 7132

C41

C06

03C

104K

3RA

CT

U0.

1uF

25V

C38

C06

03C

104K

3RA

CT

U

0.1u

F25

V

+1.8

VA

Sup

ply

IN NC

1

NC

2

SH

DN

GN

D

BY

P

SE

NS

E

OU

T8 6 7 5

4321

LT19

62E

MS

8-1.

8#P

BF

VR

5

25V

1uF

C79

C08

05C

105K

3PA

CT

U10

uF10

V

C80

C12

10C

106J

8NA

CT

U

AG

ND

AG

ND

AG

ND

PS

2

6 87 5

132+V

in

CT

RL

-Vin

NC

CO

M

-Vou

t

+Vou

t

RS

3-24

05D

Z/H

3

AG

ND

25V

1uF

C08

05C

105K

3PA

CT

U

C16

7

AG

ND

25V

1uF

C08

05C

105K

3PA

CT

UC

166

-5V

A

+Vbu

s

+Vbu

s

+Vbu

s

186-

0140

DG

ND

DG

ND

GN

D

VIN T

AB

_OU

T

OU

T

T3P

3VD

TP

-105

-01-

05T

ES

T P

OIN

T, G

RE

EN

C40

C12

10C

106J

8NA

CT

U10

uF

10V

0ohm

RK

73Z

1JLT

D

R68

+3.3

VD

_IN 5-

D2

25V

1uF

C37

C08

05C

105K

3PA

CT

U

C39

C06

03C

104K

3RA

CT

U0.

1uF

25V

+3.3

VD

Sup

ply

3A O

utpu

t

+5V

D_I

N+5

VD

_IN

A2

VR

4

LT10

85C

M-3

.3#P

BF2 4

3 1

+5V

D_I

N

+1.8

VA

TE

ST

PO

INT

, BR

OW

N

TP

-105

-01-

01

T5N

VA

TE

ST

PO

INT

, OR

AN

GE

TP

-105

-01-

03T

1P8V

A

GN

D

GN

D

GN

D

External

Digital

++

C12

9

TA

JD22

6K03

5R22

uF 35V

C14

5

TA

JD22

6K03

5R22

uF

35V

R63 RK

73H

1JL2

0R0F

20oh

m

DG

ND

AG

ND

CG

ND

GN

D

DG

ND

1T

P-1

05-0

1-00

TE

ST

PO

INT

, BLA

CK

TE

ST

PO

INT

, BLA

CK

TP

-105

-01-

00AG

ND

1

TE

ST

PO

INT

, GR

AY

TP

-105

-01-

08CG

ND

1

TE

ST

PO

INT

, BLA

CK

TP

-105

-01-

00GN

D1

R12

308

05R

ES

_NA

R12

2R

K73

Z2A

LTD

0ohm

R12

7R

K73

Z2A

LTD

0ohm

Gro

und

Sta

r

Cha

ssis

Gro

und

Opt

ion

GN

D is

Vbu

s R

etur

nP

lace

all

test

poi

nts

on to

p si

de o

f boa

rd

Opt

ion

to c

onne

ct G

roun

dSta

r to

one

of t

he b

oard

pla

ted

thro

ugh

hole

s

Gro

undS

tar

VIN

DN

C1

GN

D1

GN

D2

DN

C2

VO

UT

AG

ND

AG

ND

AG

ND

VR

1

LT17

90A

IS6-

1.25

6 5 2134

0ohm

RK

73Z

1JLT

D

R90

25V

1uF

C08

05C

105K

3PA

CT

U

C61

+1.2

5VA

Ref

eren

ce

C59

C12

10C

106J

8NA

CT

U10

uF

10V

25V

0.1u

FC

0603

C10

4K3R

AC

TU

C63

+5V

A

+1.2

5VA

R66 RK

73H

1JL2

0R0F

20oh

m

5-C

2

5-A

3

5-B

3

5-C

3

B1

6P

ower

4

186-

0140

-

AS

SP

W. C

ox

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

R15

4

RK

73Z

2ALT

D

0ohm

0ohm

RK

73Z

2ALT

D

R15

3

0ohm

RK

73Z

2ALT

D

R15

6

R15

5

RK

73Z

2ALT

D

0ohm

0ohm

RK

73Z

2ALT

D

R15

8

R15

7

RK

73Z

2ALT

D

0ohm

T15

NV

A

TP

-105

-01-

02

TE

ST

PO

INT

, RE

D

TE

ST

PO

INT

, BR

OW

N

TP

-105

-01-

01

T5P

VA

+5V

A

+3.3

VA

Sup

ply

VR

6

5

3

4 2

1IN

GN

D

BY

P

SH

DN

OU

T

LT17

61E

S5-

3.3#

TR

MP

BF

+5V

A

C81

0.01

uF25

V25V

0.01

uF

C15

2

+3.3

VA

25V

1uF

C64

C08

05C

105K

3PA

CT

U

AG

ND

10uF

10V

C58

C12

10C

106J

8NA

CT

U

AG

ND

AG

ND

DG

ND

TE

ST

PO

INT

, OR

AN

GE

TP

-105

-01-

03T

3P3V

A

VIN

DN

C1

GN

D1

GN

D2

DN

C2

VO

UT

AG

ND

AG

ND

AG

ND

VR

2

LT17

90A

IS6-

2.5

6 5 2134

T2P

5V

TE

ST

PO

INT

, WH

ITE

TP

-105

-01-

09

C62

C08

05C

105K

3PA

CT

U1u

F

25V

R89

RK

73Z

1JLT

D

0ohm+2

.5V

A R

efer

ence

C65

C06

03C

104K

3RA

CT

U0.

1uF

25V

+5V

A

+2.5

VA

TP

-105

-01-

09T

ES

T P

OIN

T, W

HIT

E

T1P

25V

R12

8R

K73

Z2A

LTD

0ohm

R87

RK

73Z

2ALT

D

0ohm

0ohm

RK

73Z

2ALT

D

R11

5

C15

5

47uF

47uFC15

1

47uFC16

1

C16

8

47uF

08/1

2/20

13

186-

0317

Page 93: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

79

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

08/1

2/20

135

-IN

+IN

-V

OU

T

+V

-IN

+IN

-V

OU

T

+V

DG

ND

DG

ND

DG

ND

-IN

+IN

-V

OU

T

+V

-IN

+IN

-V

OU

T

+V

DG

ND

DG

ND

DG

ND

-IN

+IN

-V

OU

T

+V

-+

AG

ND

AG

ND

AG

ND

AG

ND

AG

ND

DG

ND

AG

ND

-15V

A

+15V

A

AG

ND

AG

ND

AG

ND

AG

ND

AG

ND

AG

ND

GN

D

GN

DG

ND

-IN

+IN RE

F-V

GA

IN2

GA

IN1

OU

T

+V

LT61

07M

PS

5#T

RM

PB

F

U5

5 1 2

43

R14

RK

73H

1JL4

321F

4.32

Koh

m

+Vbu

s_C

S6-

B1

U9

LT61

07M

PS

5#T

RM

PB

F

5 1 2

4310

0ohm

RK

73H

1JL1

000F

R60

+3.3

VD

_CS

6-B

1

U22

LT61

07M

PS

5#T

RM

PB

F

5 1 2

43

R11

3

RK

73H

1JL1

000F

100o

hm+5

VA

_CS

6-B

1

U8

LT61

07M

PS

5#T

RM

PB

F

5 1 2

43

R37

RK

73H

1JL1

000F

100o

hm+5

VD

_CS

6-B

1

U16

LT61

07M

PS

5#T

RM

PB

F

5 1 2

43

R85

RK

73H

1JL1

000F

100o

hm+1

5VA

_CS

6-B

1

+15V

A_I

N4-

B3

+5V

A_I

N4-

D3

+5V

D_I

N4-

A2

U20A

D86

24A

RU

Z11 4

1412 13

C50

C08

05C

105K

3PA

CT

U1u

F

25V

1uF

25V

C68

C08

05C

105K

3PA

CT

U

4.32

Koh

mR

K73

H1J

L432

1F

R10

4

C70

0.04

7uF

25V

R92

RK

73H

1JL4

021F

4.02

Koh

m

R93

RK

73H

1JL1

001F

1Koh

m

-15V

A_I

N4-

C3

-15V

A_C

S6-

B1

C08

05C

105K

3PA

CT

U

C74

25V

1uF

10K

ohm

RK

73H

1JL1

002F

R10

5

RK

73H

1JL4

992F

R78

49.9

Koh

m

40.2

Koh

mR

K73

H1J

L402

2F

R10

6

R64

10K

ohm

RK

73H

1JL1

002F

40.2

Koh

mR

K73

H1J

L402

2FR62

10K

ohm

R71

RK

73H

1JL1

002F

49.9

Koh

m

RK

73H

1JL4

992F

R69

R77

RK

73H

1JL1

822F

18.2

Koh

m

+Vbu

s_V

6-A

1+1

5VA

_V6-

A1

6-A

1+5

VD

_V6-

A1

+5V

A_V

6-A

1

+3.3

VD

_V6-

A1

R67

RK

73H

1JL1

001F

1Koh

m

Cur

rent

Sen

se

Vbu

s C

urre

nt S

ense

+3.3

VD

Cur

rent

Sen

se

+5V

A C

urre

nt S

ense

+5V

D C

urre

nt S

ense

+15V

A C

urre

nt S

ense

-15V

A C

urre

nt S

ense

G=1

0.09

Vol

tage

Mon

itors

+5V

A V

olta

ge M

onito

r

G=

-0.8

, Vou

t = 4

V

Nom

inal

: Vin

= +

15V

, Vou

t = 4

V

+15V

A V

olta

ge M

onito

rG

= 1

8.2

/ (18

.2 +

50)

= 0

.267

G=

1, V

out =

3.3

V

+3.3

VD

Vol

tage

Mon

itor

+5V

D V

olta

ge M

onito

rG

= 0.

8, V

out =

4V

G =

40k

/(40

k+10

k) =

0.8

G =

10k

/(50

k+10

k) =

0.1

667

G=

0.16

67, V

out =

4V

Vbu

s (+

16V

to 2

4V)

Vol

tage

Mon

itor

G =

4.3

2k /

49.9

= 8

6.4

Isat

@ 1

1.5A

G=+

10 (

whe

n pi

n 5

and

8 ar

e gr

ound

ed)

+Vbu

s_C

S

+3.3

VD

_IN

+5V

A_C

S

+15V

A_C

S -15V

A_C

S-1

5VA

_IN

+5V

A_V

+5V

D_V

+Vbu

s_V

+3.3

VD

_V

+15V

A_V

+3.3

VD

_IN

Vbu

s_In

25V0.1u

FC

0603

C10

4K3R

AC

TU

C76

25V

0.1u

FC

0603

C10

4K3R

AC

TU

C51

C71

C06

03C

104K

3RA

CT

U0.

1uF

25V

Vbu

s_In

R44

WS

LP12

06R

0100

FE

A

10m

ohm R61

WS

LP12

06R

0100

FE

A

10m

ohm

R86

WS

LP12

06R

0100

FE

A

10m

ohm

R88

WS

LP12

06R

0100

FE

A

10m

ohm

R11

4

WS

LP12

06R

0100

FE

A

10m

ohm

U19

LT19

90A

IS8#

PB

F

7 6 8 5 4132

+15V

A

+5V

D

+5V

A

+3.3

VD

+5V

D

+3.3

VD

+15V

A

+15V

A

-15V

A

-15V

A

+15V

A

+5V

A

+5V

A

186-

0140

+Vbu

s

GN

D

AG

ND

- +

AG

ND

R10

8

RK

73H

1JL1

003F

100K

ohm

U20 A

D86

24A

RU

Z114

132

-15V

A_V

-15V

A V

olta

ge M

onito

r

Nom

inal

: Vin

= -

15V

, Vou

t = 3

.87V

G =

3.4

8 / 1

3.48

* -

1 =

-0.

258

R11

1

RK

73H

1JL1

002F

10K

ohm

R10

9R

K73

H1J

L100

2F10

Koh

m

R11

0R

K73

H1J

L348

1F

3.48

Koh

m

R10

7

RK

73H

1JL1

002F

10K

ohm

-15V

A_V

-15V

A

-15V

A-1

5VA

+15V

A+1

5VA

R17

CS

NL2

010F

T5L

00

5moh

m

R13

RK

73H

1JL4

9R9F

49.9

ohm

+Vbu

s

10K

ohm

RK

73H

1JL1

002F

R14

4

10K

ohm

RK

73H

1JL1

002F

R14

3

10K

ohm

RK

73H

1JL1

002F

R82

10K

ohm

RK

73H

1JL1

002F

R11

2

U20

114

756

- +A

D86

24A

RU

Z

C15

6C

0805

C10

5K3P

AC

TU

1uF

25V

AG

ND

1uF

25V

C72

C08

05C

105K

3PA

CT

U

AG

ND

25V

0.1u

FC

0603

C10

4K3R

AC

TU

C75

C67

C06

03C

104K

3RA

CT

U 0.1u

F

25V

+15V

A-1

5VA

+3.3

VD

C29

C08

05C

105K

3PA

CT

U1u

F

25V

DG

ND

+5V

D

C34

C08

05C

105K

3PA

CT

U1u

F

25V

DG

ND

GN

D

C22

C08

05C

105K

3PA

CT

U1u

F

25V

+Vbu

s

G =

10k

/ 10

0 =

100

Isat

@ 5

A

G =

10k

/ 10

0 =

100

Isat

@ 5

A

G =

10k

/ 10

0 =

100

Isat

@ 5

A

4-B

2

1-A

1

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

6H

K V

olta

ges/

Cur

rent

s

186-

0140

-

AS

SP

W. C

ox

- +

9 108

4 11A

D86

24A

RU

Z

U20

-15V

A

+15V

A

AG

ND

10K

ohm

RK

73H

1JL1

002FR98

40.2

Koh

mR

K73

H1J

L402

2FR97

R94

RK

73H

1JL1

003F

100K

ohm

R95

RK

73H

1JL1

002F

10K

ohm

AG

ND

-5V

A_V

-5V

A_V

-5V

A

+3.3

VA

_V6-

B1

R84

RK

73H

1JL1

001F

1Koh

m

+3.3

VA

Vol

tage

Mon

itor

G=

1, V

out =

3.3

V +3.3

VA

_V

6-B

1+1

.8V

A_V

1Koh

mR

K73

H1J

L100

1F

R12

1

G=

1, V

out =

1.8

V

+1.8

VA

Vol

tage

Mon

itor

+1.8

VA

_V

-5V

A V

olta

ge M

onito

r

+3.3

VA

+1.8

VA

G =

40

/ 50

* -1

= -

0.8

G=

0.8,

Vou

t = 4

V

10K

ohm

RK

73H

1JL1

002F

R96

C28 C04

02C

473J

8NA

CT

U0.

047u

F10V

10V

0.04

7uF

C04

02C

473J

8NA

CT

U

C31

C15 C04

02C

473J

8NA

CT

U0.

047u

F10V

C78 C04

02C

473J

8NA

CT

U0.

047u

F10V

C56 C04

02C

473J

8NA

CT

U0.

047u

F10V

AG

ND

AG

ND

AG

ND

G =

10k

/ 10

0 =

100

Isat

@ 5

A

6-B

118

6-03

17

Page 94: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

80

NE

XT

AS

SY

. TIT

LE

NE

XT

AS

SE

MB

LY

PR

OG

RA

M

EN

GIN

EE

R

LAS

T M

OD

IFIE

D

SC

H R

EV

DR

AW

ING

NU

MB

ER

INS

TA

NC

E N

AM

E

SC

HE

MA

TIC

NA

ME

TIT

LE

For

m N

umbe

r Q

F04

42

Rev

-

(B L

ands

cape

)

43

21

A B C D

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

Nor

th L

ogan

, Uta

h 84

341

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

INF

OR

MA

TIO

N T

HA

T IS

PR

OP

RIE

TA

RY

TO

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

(S

DL)

. R

EF

ER

EN

CE

US

UR

F B

P 4

09.1

A B C D

43

21

PA

GE

NA

ME

08/1

2/20

13H

K D

igiti

zatio

n6

186-

0140

6

CH

0

CH

1

CH

2

CH

3

CO

M

VR

EF

DIN

DC

LK

SH

DN

CS

GN

D1

GN

D2

BU

SY

DO

UT

VC

C2

VC

C1

AG

ND

AG

ND

AG

ND

AG

ND

S1

S2

S3

S4

S5

S6

S7

S8

S9

S10

S11

S12

S13

S14

S15

S16

A0

A1

A2

A3

EN

GN

D

NC

3

NC

2

NC

1DV-

V+

AG

ND

- +

DG

ND

DG

ND

Digital

Analog

Digital

Analog

Hou

seke

epin

g A

/D

AS

SP

Hou

seke

epin

g A

/D's

AD

S83

43E

B

U18

1 9 12 13 11 101571614865432

10V

10uF

C12

10C

106J

8NA

CT

U

C57

50V

0.1u

FC

0805

C10

4K5R

AC

TU

C53

HK

_AD

C_C

S_L

HK

_AD

C_S

hdn_

LH

K_A

DC

_DC

lkH

K_A

DC

_DIn

_H

C08

05C

104K

5RA

CT

U0.

1uF

50V

C60

HK

_AD

C_D

In_H

2-A

4H

K_A

DC

_DC

lk2-

A3

HK

_AD

C_S

hdn_

L2-

A4

HK

_AD

C_C

S_L

2-A

3

C14

7

50V

0.1u

FC

0805

C10

4K5R

AC

TU

C14

8

50V

0.1u

FC

0805

C10

4K5R

AC

TU

25V

1uF

C45

25V

1uFC

46

U11

DG

406E

UI+

1 27 28 2 3 13 12181415161745678910112625242322212019

+Vbu

s_V

5-A

1+V

bus_

V

AD

8624

AR

UZ

U21

114

8109

HK

_DO

ut_H

2-B

4H

K_B

usy_

H2-

B4

RK

73H

1JL1

000F

R75

100o

hm10

0ohm

R74

RK

73H

1JL1

000F

HK

_DO

ut_H

HK

_Bus

y_H

4.64

ohm

RK

73H

1J4R

64F

R83

+Vbu

s_C

S5-

B3

+Vbu

s_C

S

HkA

ddr(

3)H

kAdd

r(2)

HkA

ddr(

1)H

kAdd

r(0)

AG

ND

AG

ND

5-A

1+1

5VA

_V+1

5VA

_V

5-B

1+5

VD

_V+5

VD

_V

5-C

1+3

.3V

D_V

+3.3

VD

_V

5-B

2-1

5VA

_V-1

5VA

_V

5-C

1+5

VA

_V+5

VA

_V

5-B

4-1

5VA

_CS

5-D

3+3

.3V

D_C

S+3

.3V

D_C

S5-

C3

+5V

D_C

S+5

VD

_CS

5-C

4+5

VA

_CS

U21

114

141213

- +A

D86

24A

RU

Z

R10

1R

K73

H1J

L432

1F

4.32

Koh

m

+15V

A_C

S+1

5VA

_CS

-15V

A_C

S+5

VA

_CS

+15V

A

-15V

A

+15V

A-1

5VA

-15V

A

+15V

A

-15V

A

+2.5

VA

+5V

A

+3.3

VD

+3.3

VD

AG

ND

HK

_Tem

pSen

sor_

SIP

HK

_Tem

pSen

sor_

SIP

R10

0

RK

73H

1JL1

001F

1Koh

mR

99

RK

73H

1JL2

551F

2.55

Koh

m

R10

3

RK

73H

1JL1

002F

10K

ohm

AG

ND

R10

2R

K73

H1J

L100

4F

1ME

Goh

m AG

ND RK

73H

1JL1

002F

R91

10K

ohm

C04

02C

473J

8NA

CT

U

C69

U13

1 2 3 54678

VC

CB

B1

B2

GN

DD

IRA2

A1

VC

CA

SN

74LV

C2T

45D

CU

R

+15V

A

AG

ND

D3

RB

876W

2

1

3

AG

ND

D2

RB

876W

2

1

3

+5V

A

+5V

A

100o

hmR

80

100o

hmR

K73

H1J

L100

0F

R81

+5V

D

DG

ND

25V

0.01

uF

C49

DG

ND

25V

0.01

uF

C47+3

.3V

D

+5V

D

AG

ND

+15V

A-1

5VA

C08

05C

104K

5RA

CT

U0.

1uF

50V

C15

8C

0805

C10

4K5R

AC

TU

0.1u

F50

V

C15

7

C73

1uF

25V

C77

1uF25

V

AG

ND

AG

ND

3-C

4

5-A

4

AS

SP

SIP

Mai

n In

stru

men

t Sch

emat

ics

186-

0140

-W

. Cox

- +

- +2 3

1

4 11A

D86

24A

RU

Z

U21

6 57

4 11A

D86

24A

RU

Z

U21

+15V

A

-15V

A

+15V

A

-15V

AA

GN

DA

GN

D

-5V

A_V

+3.3

VA

_V+1

.8V

A_V

-5V

A_V

+3.3

VA

_V+1

.8V

A_V

C66

C04

02C

473J

8NA

CT

U0.

047u

F 10V

C08

05C

104K

5RA

CT

U

0.1u

F50

VC

146

DG

ND

Digital

Analog

External

HkA

ddr(

0)H

kAdd

r(1)

HkA

ddr(

2)H

kAdd

r(3)

2-A

32-

A3

2-A

32-

A35-

D2

5-C

15-

D1

186-

0317

Page 95: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

81

Page 96: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

82

Appendix C

FPGA RTL Diagrams

(14 pages)

Page 97: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

83

-X

X-X

XX

X

AS

SP

Ma

in F

unction

al

J. M

art

in-H

idalg

o

To

p L

eve

l SIP

Function

al P

art

itio

n

1

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

TO

P.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Main

Paylo

ad T

op L

eve

l

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

11

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

VH

DL F

ILE

= A

SS

P_M

AIN

_T

OP

.VH

D

Command[7:0]

UART_Pay_Tx_H

UART_GSE_Tx_H

UM

BI

NewCoAddCnt[1:0]

Rst_H

ARst_L

AD

99

58

DDS_Reset_L

DDS_PWR_DWN

DDS_SCK

FstClk

RdRcvFIFO_H

RcvFE_H

WrSIPConfig_H

TM

Ad

dr[

3:0

]

DDS_SDO[3:0]

DDS_Sync_Clk

TM_Data_H

Glo

bals

Rst_H

Rst_H

Rst_H

Pay

load

Fir

mw

are

In

str

ucti

on

Se

t

Reset

Pa

ylo

ad

Hex

Co

mm

an

dP

ara

mete

rs (

Big

-en

dia

n)

Set

SIP

Config

ADC_SCK

ADC_CNV

ADC_SDI

ADC_SDO

AD

76

88

Telemetry Signals2

8

TM

Seria

l Deck

TM_Gtd_Ck

TM_Load_L

TM_Enable_H

TM_Word_H

TM_Frame_H

TM_MFrame_H

Fla

sh

FL_SO_H

FL_SI_H

FL_Hold_L

FL_CS_L

FL_Sck

FL_WP_L

Rst_H

FLCommand[15:0]

16

FLWr_H Fla

sh Inte

rfa

ce

Sw

ee

pin

g Im

pedan

ce P

robe

HK_CS_L

HK_DClk

HK_Shdn_L

HK_Busy_H

HK_DIn_H

HK_DOut_H

AD

S83

43

HK

(CH

0)(

CH

1)(

CH

2)(

CH

3) 4

HKaddr[3:0]

TestPort[7:0]

8

Data

Acq

uis

ition S

yste

m C

ontr

olle

r

5

+VPayID[4:0]

PC

B S

/N

UART_UART_Invalid_L

UM

BI U

AR

T Inte

rfa

ce

Syn

chro

no

us S

eri

al I

nte

rface

SSI_Enable_H

SSI_Enable_L

+V

WrG

etT

M_

H

RFIV_Ctrl

DDS_P[3:0]

DDS_CS_L

DDS_IO_UPDATE

0x33

0xA

0F

ixed

Fre

que

ncy

en

ab

le

2-b

it C

DS

ena

ble

2-b

it C

oA

dd

num

ber

of sam

ple

s

32

-bit fix

ed fre

quen

cy

valu

e

Ge

t T

M d

ata

4-b

it C

hun

k ad

dre

ss

0xA

2

Tele

me

try M

atr

ix F

orm

er

DiagnosticData[7:0]

WrDiagnosticsData_H

SysC

lk

Gen

era

tor

SysClk

NewFixedFreq[31:0] 32

NewFixedFreq_H

NewCDSEn[1:0]

2

Paylo

ad C

ontr

olle

r

Page 98: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

84

-X

X-X

XX

X

AS

SP

Scie

nce

Boa

rd

J. M

art

in-H

idalg

o

Paylo

ad C

ontr

olle

r

2

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

PA

YL

OA

DC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

12

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

VH

DL F

ILE

= s

pP

aylo

adC

trl.V

HD

CIState[2:0]

Paylo

ad C

ontr

olle

r C

om

mand

In

terp

rete

r

Next S

tate

& O

utp

ut

De

code

r

Next S

tate

& O

utp

ut

Re

gis

ters

Q

3

WA

IT_

FO

R_C

OM

MA

ND

Cle

arC

md

_H

D

Rst_

H +

AR

st_

L

RcvF

E_H

Yes

No

GE

T_

CO

MM

AN

D

Rd

RcvF

IFO

_H

D

NewCmd_H

RcvFE_H

SysClk

Para

me

ters

_H

No

WA

IT_F

OR

_P

AR

AM

ET

ER

Yes

Ne

wC

md_H

D

UM

BI U

AR

T Inte

rfa

ce

GE

T_P

AR

AM

ET

ER

RcvF

E_H

No

Yes

Rd

RcvF

IFO

_H

D

De

cP

ara

mC

nt_

HD

DecParamCnt_H

RdRcvFIFO_H

Para

me

ters

_H

No

Yes

Parameters_H

UM

BI U

AR

T Inte

rfa

ce

CO

MP

UT

E_P

AR

AM

_C

NT

No

SysClk

Cmd_D1_HNewCmd_H

Para

mC

ntD

one

_H

PA

RA

M_C

NT

_C

OM

PU

TE

D

Yes

ClearCmd_H

Rst_H

ParamCntDone_H

Regis

ter

D Q

Regis

ter

D Q ParamCntDone_H

Reset

Pa

ylo

ad

Co

mm

an

dP

ara

mete

rs

Ge

t T

M d

ata

Set

SIP

Config

4-b

it C

hun

k ad

dre

ss

SIP

Fir

mw

are

In

str

uc

tio

n S

et

Hex

0x33

0xA

0

0xA

2

All

para

me

ters

are

big

endia

n.

Fix

ed

Fre

que

ncy

en

ab

le,

32

-bit v

alu

e

2-b

it C

DS

ena

ble

2-b

it C

oA

dd

num

ber

of sam

ple

s

Page 99: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

85

-X

X-X

XX

X

AS

SP

Scie

nce

Boa

rd

J. M

art

in-H

idalg

o

Paylo

ad C

ontr

olle

r

2

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

PA

YL

OA

DC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

22

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

VH

DL F

ILE

= s

pP

aylo

adC

trl.V

HD

SysClk

4

Decre

men

ter

CN

T

CL

RD

EC

DA

RS

TL

D

Para

mC

nt[

3:0

]

Pap

er

Gate

10

+V

0x0

4

+V

0x1

4

+V

0x6

4

4

NewParamCnt[3:0]

S

Y

els

e2

1 .!=

0D

Para

me

ters

_HDecParamCnt_H

Co

un

ter

is inte

rpre

ted a

s a

n

un

sig

ne

d 4

-bit c

oun

t o

f th

e

nu

mbe

r of

rem

ain

ing p

ara

me

ters

.

Th

e c

oun

t can

be d

ecre

me

nte

d,

an

d d

oes n

ot

roll

over

in e

ith

er

dir

ectio

n.

SysClk

Rst_

H

ARst_L

Rcvd

Cm

d[7

:0]

8

Regis

ter

D Q

AR

ST

RS

TC

ENewCmd_D1_H

Command[7:0]

8

UM

BI U

AR

T Inte

rfa

ce

SysClk

Rst_H

ARst_L

8 8

Parameter1[7:0]

Regis

ter

D Q

AR

ST

RS

T

Rst_H

ARst_L

8 8

Parameter2[7:0]

Regis

ter

D Q

AR

ST

RS

TC

E

Rst_H

ARst_L

8 8

Parameter3[7:0]

Regis

ter

D Q

AR

ST

RS

TC

E

Rst_H

ARst_L

8 8

Parameter4[7:0]

Regis

ter

D Q

AR

ST

RS

TC

E

Rst_H

ARst_L

8 8

Parameter5[7:0]

Regis

ter

D Q

AR

ST

RS

TC

E

Rst_H

ARst_L

8 8

Parameter6[7:0]

Regis

ter

D Q

AR

ST

RS

TC

E

4 .1 DParamCnt[3:0]

4 .2 DParamCnt[3:0]

4 .3 DParamCnt[3:0]

4 .4 DParamCnt[3:0]

4 .5 DParamCnt[3:0]

4 .6 DParamCnt[3:0]

LastParam_H

Command[7:0]

Command[7:0]

Command[7:0]

Command[7:0]

Command[7:0]

Command[7:0]

ARst_L

LdParamCnt_H

Regis

ter

D Q

.

SysClk

LdParamCnt_H

NeedParam_H

.

Rst_

H

LastP

ara

m_

D1

_H

Cle

arC

md

_H

.

8

Parameter2[7:0]

8

Parameter1[7:0]

32

Pap

er

Gate

[15:8

][7

:0]

[31:0

]

NewCoAddCnt[1:0]

2

Pap

er

Gate

[1:0

]

2

Parameter5[1:0]

NewFixedFreq[31:0]

[1:0

]

DA

S C

ontr

olle

r

WrSIPConfig_H

LastParam_D1_H

.

Rst_H

8

Parameter1[7:0]

TM

Ad

dr[

3:0

] TM

Form

er

WrG

etT

M_

H

LastParam_D1_H

.

Rst_H

4

Pap

er

Gate

[3:0

]

[3:0

]

GetTM_H

SIPConfig_H

SetSIPConfig_H

SetSIPConfig_H

8

Parameter4[7:0]

8

Parameter3[7:0]

[31:2

4]

[23:1

5]

Pap

er

Gate

Parameter6[0] NewFixedFreq_H

.33

H

Rst_H

.A

0H

SetSIPConfig_H

.A

2H

GetTM_H

GetTM_H

NewCDSEn[1:0]

2

Pap

er

Gate

[1:0

]

2

Parameter5[3:2] [3:2

]

Page 100: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

86

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

Data

Acq

uis

itio

n F

unctio

na

l Pa

rtiti

on

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

DA

SC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

12

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

AD

S83

43

HK_CS_L

HK_DClk

HK_Shdn_L

HK_Busy_H

HK_DIn_H

HK_DOut_H

DA

S C

on

tro

l B

locks

AD

S83

43_H

K

HK_DOut[15:0]

Rst_H

SFID[4:0]HkAddr[3:0]

Com

bin

ato

rial Lo

gic

Decod

er

Co

mb

inato

rial L

og

ic D

eco

de

r

SF

ID[4

:0]

HkA

dd

r[3

:0]

0x07

0x0

0x08

0x09

0x0

A

0x0

B

0x0

C

0x0

D

0x0

E

0x0

F

0x10

0x11

0x12

0x13

0x1

0x2

0x3

0x4

0x5

0x6

0x7

0x8

0x9

0xA

0xB

0xC

HK

Mu

x

SFPulse_H

SysClk

DA

SCtr

l

AD

99

58

DDS_Reset_L

DDS_PWR_DWN

DDS_SCK

DDS_SDO[3:0]

DDS_Sync_Clk

ADC_SCK

ADC_CNV

ADC_SDI

ADC_SDO

AD

76

88

Sw

ee

pin

g Im

pedan

ce P

robe

RFIV_Ctrl

DDS_P[3:0]

DDS_CS_L

DDS_IO_UPDATE

Rst_H

SFPulse_H

SFID[4:0]

SIP4[31:0]

SIP3[31:0]

SIP2[31:0]

SIP1[31:0]

SIP

Ctr

l

NewFixedFreq[31:0]

NewCoAddCnt[1:0]

NewFixedFreq_H

WrSIPConfig_H

MFPulse_H

NewCDSEn[1:0]

SIPSeq[15:0]

Page 101: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

87

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

Data

Acq

uis

itio

n F

unctio

na

l Pa

rtiti

on

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

DA

SC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

22

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

Data

Acqu

isitio

n S

am

ple

Tim

ing D

iagra

m2

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

37

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

37

MF

Pu

lse

_H

SF

Puls

e_

H

HK

_D

Out[

15

:0]

14

0 u

s

SIP

Se

q[1

5:0

]

SF

ID[4

:0]

0d

0d

8d

31

d

HK

Ad

dr[

3:0

]

+V

ba

tt

1d

1d

4.4

8m

s

Note

*: du

ring

sw

eep

, co-a

ddin

g is

dis

able

d o

n D

CLP

_H

, D

CLP

_L a

nd

the

FP

P. T

he s

am

ple

d v

alu

es

are

pip

ed

into

a F

IFO

befo

re b

ein

g s

ent o

ut in

th

e T

ele

metr

y m

atr

ix. T

he s

we

eps o

ccu

r every

11

8 m

ajo

r fr

am

es.

SIP

1[3

1:0

]In

-ph

ase v

alu

e fre

quen

cy 0

In-p

hase v

alu

e fre

quen

cy 8

In-p

hase v

alu

e fre

quen

cy 3

1

SIP

1[3

1:0

]Q

uad

ratu

re v

alu

e fre

que

ncy

0Q

uad

ratu

re v

alu

e fre

que

ncy

8Q

uad

ratu

re v

alu

e fre

que

ncy

31

SIP

1[3

1:0

]In

-ph

ase r

efe

rence v

alu

e fre

quen

cy

0In

-ph

ase r

efe

rence v

alu

e fre

quen

cy

8In

-ph

ase r

efe

rence v

alu

e fre

quen

cy

31

SIP

1[3

1:0

]Q

uad

ratu

re r

efe

rence v

alu

e fre

que

ncy

0Q

uad

ratu

re r

efe

rence v

alu

e fre

que

ncy

8Q

uad

ratu

re r

efe

rence v

alu

e fre

que

ncy

31

Page 102: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

88

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

Ctr

l F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

CT

RL

.VS

DX

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

15

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

10

0ns

10

MH

z3

7

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

37

SIP

Hig

h-l

eve

l T

imin

g D

iag

ram

MF

_P

ULS

E

SF

_P

ULS

E

DD

S s

eria

l lin

e

DD

S P

ha

seP

ha

se 0

°

AD

CS

am

ple

4

Pha

se 1

80

°

RF

IV_

CT

RL

Sam

ple

1...

Pha

se 9

t SE

T =

st S

AM

PL =

9.1

s

t PH

AS

E =

17

μs

13

st ID

LE =

s

If 4

th M

F r

ece

ived

, ch

an

ge

to

firs

t fr

equ

en

cy

Valu

es o

f p

rio

r M

F

Activ

ate

fre

qu

ency i &

Lo

ad

feq

ue

ncy

i+1

Sam

ple

1S

am

ple

2S

am

ple

3

t SE

T =

st S

AM

PL =

9.1

s

Pha

se 2

70

°P

ha

se 0

°P

ha

se 1

80

°P

ha

se 9

Pha

se 2

70

°

Sam

ple

4...

...

...

...

...

...

TM

Fo

rmer

valu

es

Page 103: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

89

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

Ctr

l F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

CT

RL

.VS

DX

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

25

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

SIP_CTRL_STATE[4:0]

SIP

_C

TR

L_

FS

M

Next S

tate

& O

utp

ut

Re

gis

ters

Q

5

SYS_CLK

RS

T_

H +

AR

ST

LastPhase_H

PhaseFinished_H

SendInstr_H

No

WR

ITE

_C

ON

F_

WO

RD

Ready_H

SFPulse_H

D S

end

Instr

_H

D In

crC

onfW

ord

Cntr

_H

SmplSettled_H

ConfEnd_H

WA

IT_

CO

NF

_W

OR

D

Yes

Re

ad

y_

H

WA

IT_

FIR

ST

_S

WE

EP

Yes

J F

stM

ode

_H

J In

itSw

ee

p_

H

D S

end

IOU

pda

te_

H

D S

end

Instr

_H

D R

stP

hase

Cn

tr_

H

D R

stP

hase

Dly

_H

AC

Q_

PH

AS

E

Sm

plS

ett

led

_H

D In

itC

nv_

H

No

Yes

Pha

se

Fin

ish

ed

_H

D In

crP

ha

seC

ntr

_H

D R

stP

hase

Dly

_H

LastP

ha

se_

H

No

Yes

No

IDL

E

SF

Pu

lse

_H

No

Yes

D S

end

IOU

pda

te_

H

D S

end

Instr

_H

D R

stP

hase

Cn

tr_

H

D R

stP

hase

Dly

Cn

tr_

H

Co

nfE

nd

_H

No

Yes

MF

Puls

e_

H

Yes

No

Yes

IncrConfWordCntr_H

FstMode_H

SendIOUpdate_H

RstPhaseCntr_H

RstPhaseDly_H

IncrPhaseCntr_H

RstRWAddr_H

IncrRDAddr_H

InitCnv_H

D S

end

IOU

pda

te_

H

Re

ad

y_

HY

es

No

K F

stM

ode

_H

K I

nitS

we

ep

_H

InitSweep_H

MFPulse_H

Page 104: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

90

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

Ctr

l F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

CT

RL

.VS

DX

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

35

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

S

Y

015

109

62

114

1311

128

75

43

Const:00C6------h

40

4

40

ConfWord[39:0]

ConfWordCntr[3:0]

Const:01005120--h

40

Const:02A000----h

40

Const:03C00000--h

40

Const:0404000003h

40

Const:0A00000000h

40

Const:0B80000000h

40

Const:0C40000000h

40

Const:0DC0000000h

40

40

40

40

40

40

40

Const:----------h

40

S

Y

015

109

62

114

131

112

87

54

3

Const:16d

6

4

6

ConfWordNumBits[5:0]

ConfWordCntr[3:0]

66

66

66

66

66

66

66

6

Co

nf

Word

s C

oun

ter

Cn

t

RS

TA

RS

T

ARst_L

4

SysClk

Rst_H

CEIncrConfWordCntr_H

4

ConfWordCntr[3:0]

.8 d ConfEnd_H

Config

ura

tion

:

1.

CS

R:

chan

ne

l 0 e

nab

led

, chan

ne

l 1 e

nab

led

, 4

-bit s

eria

l mo

de

2.

FR

1:

4-c

han

ne

l modu

lation

, R

U/R

D d

isab

led

, S

YN

C_

CLK

dis

ab

led

3.

FR

2:

au

to-c

lear

swee

p a

nd p

hase a

ccum

ula

tor

4.

CF

R:

ph

ase m

odula

tion

5.

CF

TW

0:

1 M

Hz

(first fr

equ

ency)

6.

CW

0:

Pha

se 0

°

7.

CW

1:

Pha

se 1

80

°

8.

CW

2:

Pha

se 9

9.

CW

3:

Pha

se 2

70

°

Const:----------h

Const:----------h

Const:----------h

Const:----------h

Const:----------h

Const:----------h

Const:32d

Const:24d

Const:32d

Const:40d

Const:40d

Const:40d

Const:40d

Const:40d

Const:-d

Const:-d

Const:-d

Const:-d

Const:-d

Const:-d

Const:-d

Co

nfE

nd

_H

40

ConfWord[39:0]

40

Instr[39:0]

6

ConfWordNumBits[5:0]

6

NumBits[5:0]

Const:40d

6

S

Y

01

S

Y

01

FreqData[31:0]

40

Pape

r G

ate

32

8S

Y

01

Fix

edF

req

_H

ROM_Data[31:0] 32

FixedFreq[31:0] 32

Pha

se C

ou

nte

r

Cn

t

RS

TA

RS

T

ARst_L

3

SysClk

CEIncrPhaseCntr_H

3

PhaseCntr[2:0]

.7 d LastPhase_H

.

Rst_H

RstPhaseCntr_H

AR

ST

ARst_L

8

SysClk

PhaseDlyCntr[7:0]

.89

d

SmplSettled_H

.

Rst_H

RstPhaseDlyCntr_H

.16

9d

PhaseFinished_H

88

Pha

se D

ela

y C

ou

nte

r

Cn

t

RS

T

Sett

ling t

ime

: 9 u

s

Pha

se tim

e:

17

0 u

s

Const:04h

AR

ST

16

-Bit M

FID

Co

unte

r

CN

T

CE

AS

ET

ARst_L

16

SIPSeq[15:0]

InitSweep_H

SE

T

+V

0xF

FF

F

Rst_H

SysClk

MFPulse_H

.

Regis

ter

Q

SE

TA

RS

T

ARst_L TMOutputEn_H

RS

T

Rst_H

SysClk

MFPulse_H

.

InitSweep_H

Page 105: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

91

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

Ctr

l F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

CT

RL

.VS

DX

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

45

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

SR

AM

Write

(12

8x19

)

Rea

d (

32

x76

)

WD

RD

WE

NR

EN

RS

T

SysClk

RAM_WD[18:0] 19

WA

DD

R

RAM_WADDR[6:0]

7

RAM_RE_L

RAM_WE_H

ARst_L

RAM_RD[75:0]

RAM_RADDR[4:0]

RA

DD

R

76

5

SysClk

Da

taV

alid_D

1_

H

Da

taV

alid_D

3_

H

SysClk

Regis

ter

D Q

.

Da

taV

alid_

D2_H

Ris

ing

ed

ge

de

tecto

r

Regis

ter

D Q

Regis

ter

D QDataValid_H

RdADCData_H

Re

ad

Add

ress C

ou

nte

r

Cn

t

RS

TA

RS

T

ARst_L

5

SysClk

CE

5

RAM_RADDR[4:0]

Rst_H

Write

Ad

dre

ss C

ou

nte

r

Cn

t

RS

TA

RS

T

ARst_L

7

SysClk

CE

7

RAM_WADDR[6:0]

Rst_H

19

1

18

19

19

Accu

mula

tor

(19

bits)

D Q

Rst

CEWrBufferCE_H

DataOut[17:0]

RAM_WD[31:0]

19

19

Pap

er

Gat

e

[37

:19

][1

8:0

]

[12

7:0

]

19

19

[75

:57

][5

6:3

8]

32

32

32

SIP1[31:0]

32Regis

ter

D Q

SIP2[31:0]

SIP3[31:0]

SIP4[31:0]

RAM_RE_L

Regis

ter

D Q

SysClk

SysClk

S

Y

10

Regis

ter

D Q

CE

SysClk

ComplPhase_H

SysClk1

9

ComplPhase_H

Rst_H

PhaseCntr[2:0]

3

Pape

r G

ate

[2:0

]

2

[2]

[1:0

]

RFIV_Ctrl

DDS_P[3:0]Pape

r G

ate

[3:0

]

[3:2

][1

:0]

2

2

Synchro

niz

er

from

FstC

lk,

de

tectin

g t

he

rise e

dge

fo

r da

ta v

alid

ation

Pha

se c

ounte

r is

de

code

d into

the

pro

file

pin

s a

nd R

FIV

_C

trl t

o s

ele

ct t

he

ap

pro

pia

te c

han

nel a

nd p

hase

.

Th

e C

DS

ca

n b

e c

on

figure

d for

each c

ha

nne

l

(an

tenn

a/r

efe

rence

) in

dep

end

en

tly.

Fo

r de

bug

purp

ose

s on

ly,

by d

efa

ult,

bo

th

chan

ne

ls a

re a

dde

d.

CE

RA

M_

RE

_D

_H

RAM_RE_L

RAM_WE_LR

egis

ter

Q

RS

TA

SE

T

ARst_L RAM_RE_L

SE

T

Rst_H

SysClk

.

..

MFPulse_H

InitSweep_H

TMOutputEn_H

SFPulse_H

Da

taO

ut[

17]

Tw

o’s

com

ple

me

nt

S

Y

10

ComplPhase_H

CDSEn[1]

CDSEn[0]

.

RdADCData_H

WrBufferCE_H

Re

gis

ter

Q

SE

TA

SE

T

ARst_L

SysClk

D

Rst_H

RAM_WE_L

.TMOutputEn_H

SFPulse_H

Page 106: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

92

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

Ctr

l F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

SIP

CT

RL

.VS

DX

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

55

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

ADC_SDI

ADC_SCK

ADC_CONV

ADC_SDO

InitCnv_H

CoAddCnt[1:0]

2

DataValid_H

DataOut[17:0]18

AD

CC

trl

DA

SCtr

l

DD

SC

trl

SendInstr_H

Instr[39:0] 40

NumBytes[5:0]

6

DDS_SCK

DDS_SDIO[3:0]

4

DA

SCtr

lReady_H

32

ROM_Data[31:0]

7

ROM_Addr[7:0]

AB

(A+

B) Fre

qR

OM

Const:01h

7

RAM_WADDR[7:0]

SendIOUpdate_H

2-B

it S

hift

Re

gis

ter

SO

UT

LD

SysClk

ARst_L

AR

st

2

LD

_D

AT

AS

IN

+V DDS_IO_UPDATE

DA

SC

trlP

uls

e g

ene

rato

r

to a

llow

syn

chro

niz

ation

for

SysC

lk

DDS_PWR_DWN

DA

SC

trl

DDS_CS_L

DDS_Reset_L.

Arst_L

Rst_H

NewCoAddCnt[1:0]

NewFixedFreq_H

WrS

IPC

onfig

_H

SysClk

NewFixedFreq[31:0]

23

2

Regis

ter

D Q

AS

et

CE

Regis

ter

D Q

AR

st

CE

Regis

ter

D Q

AR

st

CE

Regis

ter

D Q

AS

et

CE

ARst_L

NewCDSEn[1:0]

2

DA

SCtr

l

CoAddCnt[1:0]

FixedFreq_H

FixedFreq[31:0]

23

2

CDSEn[1:0]

2

ARst_L

ARst_L

ARst_L

Page 107: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

93

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

DD

S S

eri

al I/

F F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

DD

SC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

12

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

10

0ns

10

MH

z3

7

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

37

DD

S S

eri

al In

terf

ace D

eta

iled

Tim

ing D

iagra

m

Sen

dIn

str

_H

Instr

[39

:0]

SysC

lk

Num

Bits[5

:0]

Instr

Le

ft[3

9:0

]

Num

BitsL

eft

[5:0

]

DD

S_

SC

K

Data

N

Data

NN

-1

Data

[38

:0]

0 0

FstM

ode

_H

DD

S_

SD

IO0

Data

[39

]D

ata

[2]

Data

[1:0

]

2

Data

[0]

1

Data

[1]

BitsL

eft

_H

RegC

E_

D_

H

0 0

Data

[0]

Data

N

Data

NN

-4

Data

[35

:0]

0D

ata

[39

:36

]D

ata

[11

:8]

Data

[7:0

]

8

Data

[3:0

]

4

Data

[7:4

]

0 0

Data

[3:0

]0

Read

y_

H

RegC

E_

H

Page 108: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

94

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

DD

S S

eri

al I/

F F

un

ctio

nal D

iagra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

DD

SC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

22

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

40

-Bit S

hift

Re

gis

ter

Q

LD

Da

taIn

Load_H

SysClk

ARst_L

AR

st

Instr[39:0]

40

InstrLeft[39:0]

SendInstr_H

SH

4/1

FstMode_H

Bits

Le

ft C

oun

ter

Q

LD

Da

taIn

Load_H

SysClk

ARst_L

AR

st

NumBits[5:0]

DE

C4/1

FstMode_H NumBitsLeft[5:0] AB

(A>

B)

4

InstrLeft[39]

4

InstrLeft[39:36]

FstM

ode

_H

AR

st

ARst_L

4

S

Y

01

SysClk

BitsLeft_H

Regis

ter

D Q

SysClk

RegCE_D_H CE

RegCE_D_H CE

.

Re

gC

E_

H

RegCE_H

DDS_SCK

Instr[39:0] 40

NumBits[5:0]

6

DDS_SCK

DDS_SDIO[3:0]

4

4

DDS_SDIO[3:0]

Q

CE

D

Regis

ter

D

Q

SysClk

Ready_H

Ready_H

DA

SC

trl

3

NextSDIO[3:0]

Rst_H

SendInstr_H

BitsLe

ft c

oun

ter

is a

n u

nsig

ed

decre

me

nte

r.

It d

oe

s n

ot u

nde

rflo

w

Rst_H Set

AS

et

AR

st

ARst_L

Sen

dIn

str

_D

_H

SysClk

Regis

ter

D Q

.R

isin

g e

dge

de

tecto

r

Load_H

SendInstr_H

Regis

ter

D Q

SysClk

RegCE_D_H

Page 109: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

95

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

AD

C F

unctio

na

l Dia

gra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

AD

CC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

12

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

3

D14

D2

1d

1d

2d

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

20

ns

50

MH

z3

7

02

31

01

11

21

31

41

51

61

92

02

12

22

32

42

52

72

93

03

13

23

44

56

78

91

17

18

26

28

35

36

33

37

AD

C_

SC

K

Mrs

Mn

tCnt[

3:0

]0

d

AD

C_

SD

O

Data

Acqu

isitio

n D

eta

iled T

imin

g D

iag

ram

(A

/D)

AD

C_

CN

V

D15

D14

80

d

Dout[

15

:0]

MS

RM

T1

0

EnA

DC

lk_

H

82

d83

d84

d85

d81

d

12

t CY

C =

2.2

s

86

d87

d11

0d

11

1d

11

2d

11

3d

11

4d

0d

11

3d

11

4d

2d

2d

1d

11

4d

0d

0d

0d

11

3d

0d

0d

0d

0d

0d

0d

0d

IncM

srm

nt2

_H

Mrs

Mn

t2C

nt[

6:0

]0

1

idle

D1

D0

0d

InitC

nv_

syn

c

tco

nv =

1.6

µs

15

16

D15

D1

La

stM

srm

nt_

H

2

16

MS

RM

T3 3

Data

Valid

_H

16

MS

RM

T4

t PU

LS

E =

30

0ns

t AC

Q =

0.6

s

0

t SM

PL =

9.1

s

Page 110: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

96

-X

X-X

XX

X

AS

SP

Dig

ital D

esig

n

J. M

art

in-H

idalg

o

SIP

AD

C F

unctio

na

l Dia

gra

m

3

AS

SP

DE

SC

RIP

TIO

N

FIL

E N

AM

E

ITE

M

SH

EE

T

SH

T R

EV

TIT

LE

TIT

LE

EN

GIN

EE

R

LA

ST

MO

DIF

IED

SP

AC

E D

YN

AM

ICS

LA

BO

RA

TO

RY

UT

AH

ST

AT

E U

NIV

ER

SIT

Y R

ES

EA

RC

H F

OU

ND

AT

ION

No

rth L

og

an

, U

tah

843

41

PR

OG

RA

M

27

fe

b, 20

14

SP

AD

CC

TR

L.V

SD

X

NE

XT

AS

SY

. XX

-XX

XX

AS

SP

Scie

nce

Firm

ware

DW

G N

O.

76

54

32

1

B A

D C B A

87

65

43

21

8

D C

22

OF

TH

IS D

RA

WIN

G C

ON

TA

INS

IN

FO

RM

AT

ION

TH

AT

IS P

RO

PR

IET

AR

Y T

O S

PA

CE

DY

NA

MIC

S L

AB

OR

AT

OR

Y (

SD

L).

RE

FER

EN

CE

USU

RF B

P409.

1

Form

No. Q

F042

3 R

ev

A

16

-Bit S

hift

Re

gis

ter

Q

CE

Da

taIn

Regis

ter

D Q

FstClk

InitCnv_H

Regis

ter

D Q InitCnv_Sync_H

7-B

it F

irst

Sta

ge

Mea

sure

me

nt

Cou

nte

rC

nt

RS

T

Regis

ter

D Q.11

3dM

srm

ntC

nt[

7:0

]

Nb

of M

ea

sure

me

nts

Cou

nte

r

Cn

t

CE

LD

AR

ST

2

(Load when CE

is Asserted)

.81

d

ADC_CONV

Regis

ter

Q

AR

ST

IncM

srm

nt2

_H

AR

ST

ARstFst_L

ARstFst_L

7

.1 d SE

TR

ST

77

.11

4d

.82

d

77

7

EnADClk_H

2

.

ARstFst_L

ARstFst_L

IncMsrmnt2_H

IncMsrmnt2_H

RstMsrmntCnt_H

Regis

ter

Q

AR

ST

SE

TR

ST

FstClk

RstMsrmntCnt_H

LD

FstClk

InitCnv_Sync_H

Regis

ter

Q

AR

ST

FstClk

CE

ARstFst_L

D

.

ADC_SCK

. ShfDout_H

. RstMssrmntCnt_H

IncMsrmnt2_H

LastMsrmnt_H

CoAddCnt[1:0]LastMsrmnt_H

ShfDOut_H

FstClk

ARst_L

AR

st

ADC_SDO 18

2

16 A

B

(A+

B)

DataOut[17:0]

DataOut[17:0]

FstClk

18

18

18

Regis

ter

D Q

RS

TC

E

18

InitCnv_Sync_H

Dout[15:0]

DASCtrl

RstMssrmntCnt_H

16

-Bit S

hift

Re

gis

ter

SO

UT

LD

FstClk

ARstFst_L

AR

st

15

LD

_D

AT

AS

IN

+V DataValid_H

DA

SC

trl

ADC_SDI

ADC_SCK

ADC_CONV

+V

DA

SC

trl

ADC_SDO

InitCnv_H

CoAddCnt[1:0]

2

2

Synchro

niz

er

fro

m S

ysC

lk to

FstC

lk

Puls

e g

ene

rato

r

to a

llow

syn

chro

niz

ation

for

SysC

lk

.

Const:01h

Data

sam

ple

d

with

ris

ing e

dge

MsrmntCnt2[1:0]

Regis

ter

D Q

FstClk

ARst_L

Regis

ter

D Q ARstFst_L

Reset

gen

era

tor

for

the

Fst

Clk

do

main

.

Rst_H

ARST ARST

Regis

ter

Q

AR

ST

D

ARstFst_L

IncMsrmnt2_H Regis

ter

Q

AR

ST

DD

out[

15]

Th

e c

oun

ter

is o

nly

ena

ble

d

if it

is

gre

ate

r th

an 0

.

A v

alu

e 0

is id

le s

tate

Page 111: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

97

Appendix D

Calibration Loads Characterization

To characterize the calibration loads a commercial VNA (FieldFox 44914A) was used.

The calibrations loads were connected to the VNA by using a base adapter (see Fig. D.1),

which provides an standard SMA connector on the VNA side, and an SMB and ground

connection for the can ground on the load side.

Before measuring the calibration load cans, the VNA is calibrated by using an standard

N-type connectors calibration kit with an SMB to type-N adapter (Pasternak PE9313) as

shown in Fig. D.2. Ideally, the calibration kit should have SMB connectors but these are

very rare. The introduction of the SMB to N-type adapter introduces a phase delay (the

reference plane is located at the adapter output) and could limit the effective directivity

measured [18]. Although the adapter datasheet does not provide electrical information, based

on the results of the calibration kit LOAD, with a return loss of about 70 dB, the directivity

is not limited by it. The electrical length introduced by the adapter was characterized to be

66.8 mm and it needs to be subtracted from all the calibration loads measurements. With

this correction, the measurement at the SMB connector without any load is very similar to

an OPEN.

With this set-up, all the calibration loads were measured. Apart from the instrument

Fig. D.1: Test set-up for the calibration loads characterization.

Page 112: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

98

Reference plane

Calibration kitOPENSHORTLOAD

Fig. D.2: Calibration of the VNA with an SMB to N-type adapter and an N-type cal kit.

uncertainty, additional disturbances can be observed in the graphs. At low frequencies, the

VNA shows an abnormal response and what it seems a scale change. There is also observed

a shunt capacitance of about 3 pF that affects the measurement of high impedances, such as

resistors, low value capacitors, and inductors. The shunt capacitance seems to be associated

with the mechanical configuration. Between the measurements of the SMB without any load

and the OPEN load there is about 0.7 pF. The OPEN load has the can configuration and a

PCB without any trace. Even more, with a high resistor value 300 kΩ at high frequencies

it can be observed about 0.7 pF. It can be concluded that the parasitic capacitance of the

mechanical can and the PCB traces affect the measurements, especially for high impedances.

In the next set of figures, the measurement of the pertinent loads and the unloaded

SMB connector are presented. It can be seen that due to the nonlinear relation between the

reflection coefficient and the impedance, when the former is acquired with low uncertainty

the latter has very large uncertainty and vice versa. In the case of the 50 Ω load, shown in

Fig. D.3 and D.4, the impedance uncertainty is minimum. The SHORT load, shown in Fig.

D.5 and D.6, is a very good reflector but the impedance uncertainty is large, especially its

phase. The same happens with high impedances. Additionally, it can be observed that the

OPEN load, shown in Fig. D.7 and D.8, presents a smaller impedance than the unloaded

SMB connector, shown in Fig. D.9 and D.10.

Page 113: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

99

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−60

−40

−20

0

Frequency [MHz]

Mag

nit

ud

e[d

B] Measured

UncertaintyNominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

0

100

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.3: s1,1 magnitude and phase of the 50 Ω load.

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

49

50

51

52

Frequency [MHz]

Mag

nit

ud

e[Ω

] MeasuredUncertainty

Nominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

0

1

2

3

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.4: Impedance magnitude and phase of the 50 Ω load.

Page 114: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

100

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−0.4

−0.2

0

0.2

0.4

Frequency [MHz]

Mag

nit

ud

e[d

B] Measured

UncertaintyNominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−200

−100

0

100

200

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.5: s1,1 magnitude and phase of the SHORT load.

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

0

0.5

1

Frequency [MHz]

Mag

nit

ud

e[Ω

] MeasuredUncertainty

Nominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−200

0

200

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.6: Impedance magnitude and phase of the SHORT load.

Page 115: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

101

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−0.4

−0.2

0

0.2

0.4

Frequency [MHz]

Mag

nit

ud

e[d

B] Measured

UncertaintyNominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−2

−1

0

1

2

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.7: s1,1 magnitude and phase of the OPEN load.

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

0

1

2

3·105

Frequency [MHz]

Mag

nit

ud

e[Ω

] MeasuredUncertainty

Nominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−200

0

200

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.8: Impedance magnitude and phase of the OPEN load.

Page 116: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

102

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−0.4

−0.2

0

0.2

0.4

Frequency [MHz]

Mag

nit

ud

e[d

B] Measured

UncertaintyNominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−2

−1

0

1

2

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.9: s1,1 magnitude and phase of the unloaded SMB connector.

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

0

2

4

6

8

·104

Frequency [MHz]

Mag

nit

ud

e[Ω

] MeasuredUncertainty

Nominal

0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2

·107

−200

0

200

Frequency [MHz]

Ph

ase

[deg

ree]

MeasuredUncertainty

Nominal

Fig. D.10: Impedance magnitude and phase of the unloaded SMB connector.

Page 117: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

103

Appendix E

Ground Support Equipment

Two GSE specific software were developed during the development of the project. The

framework chosen was Labview due to its ease of programming and fast integration with

instruments controlled by GPIB.

E.1 Scalar Network Analyzer

Prior to the acquisition of the commercial VNA, a Scalar Network Analyzer (SNA) was

constructed with a signal generator and a spectrum analyzer controlled from a PC as can

be seen in Fig. E.1. The process followed is the same as with any SNA: both instruments

are initialized with the required parameters (power, IF bandwidth, span, etc.), the signal

generator is set to the minimum frequency, an appropriate settling time is waited and the

measured value by the SA is obtained. Then, the frequency is changed to the next value

and the process starts again. Because of the multiple interaction with the equipments, and

the settling time of the SA, the process requires some minutes to complete for a regular

frequency span and resolution. As indicated in the figure, the signal generators used had

a limited frequency range of operation, and for covering the complete range both of them

were used requiring a manual disconnection and connection for each measurement.

The software interface, shown in Fig. E.2, allows the configuration of the frequency span

(with linear or logarithmic sweep), averaging and exporting the results in Comma-Separated

Value (CSV) format. It is intended to emulate a real SNA interface with the most common

options.

E.2 SIP Ground Support Equipment

When using the SIP board the telemetry must be acquired by a specific GSE with

Page 118: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

104

GPIB

Labview Control Software

DUT

Spectrum analyzerHP 8595E

9 kHz – 6.5 GHz

Signal GeneratorHP E4433B

1 MHz – 4 GHz

Signal GeneratorHP 33120A

0.1 mHz – 15 MHz

Fig. E.1: SNA GSE block diagram.

Fig. E.2: SNA GSE software interface.

Page 119: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

105

a PCM telemetry module. Because at the time neither the GSE nor the FPGA module

were finished, a specific GSE was developed through the SIP UART. It allows configuring

the FPGA in all the test modes (fixed frequency, CDS disabled, and variable number of

coadded samples) and acquiring the measured values in small chunks. Because of the limited

buffering in the FPGA and UART data rate (115.2 kbps), the complete frequency range

has to be acquired over multiple sweeps. This does not introduce any error as long as the

load is static like in the case of the SIP. In the same manner than in the SNA, the interface

emulates a real VNA, providing real-time impedance values (without calibration) and a

table with raw values for post-processing in more specialized software.

Fig. E.3: SIP GSE software interface.

Page 120: SEQUENTIAL QUADRATURE MEASUREMENTS FOR ......iii Abstract Sequential Quadrature Measurements for Plasma Diagnostics by Julio Martin-Hidalgo, Master of Science Utah State University,

106

Appendix F

DVD Contents

The DVD attached to this thesis contains the following materials:/

thesis .................................................. LATEXfiles of this thesisfigures............................................Figures used in the thesistables........................Tables used for generating plots with PGFPlots

matlab

analyses

noise...........................................Noise analysis and figuresharmonics ..................................Harmonic analysis and figureslpffilter.........................................Low pass filter analysisaafilter ....................................Reconstruction filter analysisloading............................................Loading effect analysis

calloads................................Calibration Loads tests and analysesfpga.......................................Support files for the FPGA designtransformers................................Transformers tests and analysestests.................................................SIP tests and analyses

labview

sna...................................................SNA Labview softwaregse...............................................SIP GSE Labview software

fpga

Common....................................Common files of the ASSP FPGAsSIP

ActelDesigner.............Place-and-Route project and physical contraintsDocumentation.............................................RTL diagramsSimulation ..............................Simulation models and testbenchSynplify.................................Synthesis project and constraintsVHDL.........................................VHDL source code and cores

pcb.........................................PCB schematics, layout and part list