quantitative trace analysis by wavelength-dispersive epma
TRANSCRIPT
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Quantitative Trace Analysis by Wavelength-Dispersive EPMA
Stephen J. B. Reed
Department of Earth Sciences, University of Cambridge, Cambridge CB2 3EQ, England
Abstract. `̀ Trace'' elements may be de®ned as ele-
ments whose concentrations are of a similar order to
the detection limit. In WD analysis the detection limit
is a function of the `®gure of merit' P2/B, where P is
the pure-element peak intensity and B the background
intensity. With normal analysis conditions detection
limits of �100 ppm are typical, but substantial im-
provements can be achieved by using higher values
of accelerating voltage and beam current. Long count-
ing times are also advantageous, but should preferably
be divided into relatively short alternating peak and
background measurements to minimise the effect of
instrumental drift. Using separate routines for trace and
major element analysis is desirable owing to their
different requirements. As the statistically de®ned
detection limit is reduced, errors due to background
nonlinearity and interferences (overlaps) from other
elemental peaks become more probable. Spectrum
simulation is useful for optimising background offsets
and choice of crystal to minimise interferences, and
estimating interference corrections when these are
necessary. `Blank' standards containing none of the
trace elements of interest are also useful for quantify-
ing background nonlinearity.
Key words: Trace analysis; WDS; EPMA.
In EPMA the presence of the X-ray continuum limits
the detectability of small peaks as de®ned by
statistical criteria. Other microprobe techniques which
are comparatively free of background have substan-
tially lower detection limits, but EPMA is more
widely available and has better spatial resolution. For
`trace element' EPMA, ED spectrometers are handi-
capped by their relatively poor resolution, which not
only is insuf®cient for relevant lines in the spectrum to
be resolved in some cases, but also results in low
peak-to-background ratios, owing to the greater width
of the band of continuum recorded with the peak. The
limited pulse throughput rate (which applies to the
whole spectrum) is a further drawback. As well as
their better resolution, WD spectrometers have the
additional advantage that they record only one
wavelength at a time and thus are not swamped by
major-element peaks when a high beam current is
used to maximise the intensity of trace-element peaks.
Microcalorimeter spectrometers [1] have resolution
comparable to WDS but are even more severely
limited in throughput rate than conventional EDS and
are thus uncompetitive for trace analysis at present.
The following discussion therefore refers solely to
WD analysis.
The minimum measurable peak size (and hence the
elemental detection limit) is ultimately governed by
counting statistics. By using appropriate conditions,
such as high beam current and long counting times,
peaks representing concentrations of the order of
10 ppm are detectable in favourable cases (higher
®gures apply for L and M lines and samples of high
mean atomic number). However, such peaks typically
correspond to as little as �1% of background, and
careful attention to possible errors in the background
correction is essential. Linear interpolation from
measurements made with the spectrometer offset on
each side of the peak may sometimes be subject to
errors caused by curvature of the continuum and
discontinuities related to absorption edges. Also,
when the presence of a neighbouring peak rules out
background measurement on one side, and only the
background on the other side is used for the
correction, errors can arise if no allowance is made
for slope. In trace analysis it is, in addition,
Mikrochim. Acta 132, 145±151 (2000)
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particularly important to beware of inter-elemental
interferences due to overlapping lines, which can
cause serious errors. These may be avoidable by
choosing a spectrometer crystal giving higher resolu-
tion or an alternative X-ray line, but some loss of trace
element detectability is entailed owing to the reduced
intensity. Interferences, if present, must be taken into
account by means of a correction re¯ecting the degree
of overlap and the concentration of the interfering
element. In such cases, trace-element analysis cap-
ability is impaired by increased errors from counting
statistics and uncertainties in the correction.
Counting Statistics
The statistics of counting random events is covered in
standard textbooks and for present purposes it is only
necessary to quote the following conclusions, which
refer to the measurement of a small peak super-
imposed on a relatively large background.
1. The detection limit, de®ned as the minimum
concentration required for the peak to be just
detectable at a speci®ed con®dence level for a
given counting time, is proportional to (P2/B)ÿ0.5,
where P is the number of counts recorded for the
pure-element peak and B the number of back-
ground counts for the specimen.
2. The time required to achieve a speci®ed detection
limit is inversely proportional to the `®gure of
merit', P2/B.
3. The maximum precision in the determination of
the background-corrected peak intensity with a
®xed total counting time is obtained with equal
times for peak and background.
Other Random Fluctuations
Fluctuations from other sources can be detected by
comparing the scatter in a series of repeated
measurements with that predicted from counting
statistics (standard deviation� square root of number
of counts). In practice the difference is usually
insigni®cant. As a precautionary measure, peak and
background measurements in trace analysis may be
subdivided into a series of relatively short counting
times (which is also advantageous in counteracting
drift, as discussed below) and the results analysed
statistically in the course of the measuring routine.
This allows outliers to be rejected; also counting
may be continued until a speci®ed precision is
achieved [2].
Detection Limit
Various de®nitions of detection limit are used, of
which the simplest is `3 standard deviations of
background' (3sdbg), obtained by dividing 3 times
the square root of the background count by the peak
count for the pure element (corrected for absorption in
the sample). The fraction of repeated determinations
of the background count lying within this limit is
99.6% according to classical probability theory.
However, the analytical procedure entails measuring
the number of counts on the peak as well as
background: assuming equal counting times the
fraction of repeated determinations of peak minus
background falling below the detection limit as
de®ned above is 96.6%. The 3sdbg detection limit is
thus the concentration for which the presence of the
element can be af®rmed with 96.6% con®dence.
Adapting to an alternative con®dence level merely
requires the substitution of a different standard
deviation multiplier. Various more elaborate expres-
sions exist, but there is little bene®t in attempting to
quantify the detection limit with high precision. In the
present context its main function is to compare
different analytical conditions.
Detection limits show an upward trend as the
atomic number of the element concerned increases,
owing to the lower intensity of the L� and M� lines
used for heavy elements compared to the K� line used
for lower atomic numbers. The mean atomic number
of the sample is also important, because of its effect
on the continuum intensity. Detection limits approach-
ing 1 ppm in favourable cases can be obtained by
using extreme conditions (high accelerating voltage
and beam current, and long counting times) [3].
However, for such results to be meaningful, close
attention must be paid to possible errors caused, for
example, by nonlinear background, or inter-element
interferences.
Optimum Conditions for Trace Analysis
As stated above, trace element analysis bene®ts equally
from maximisation of peak intensity and peak-to-
background ratio, both of which increase with increas-
ing accelerating voltage (V0), though in cases of high
absorption the peak intensity passes through a
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maximum and then decreases owing to the increasing
depth of X-ray production (Fig. 1). However, electron
penetration increases approximately as V5=30 , with a
consequent worsening of spatial resolution (see Fig. 1).
Counting Strategy
Optimum choice of counting times is important for
trace element analysis. Prior knowledge of peak and
background intensities enables detection limits to be
predicted and counting times chosen to achieve the
desired result. For this purpose stored or calculated
intensity data may be used, or alternatively a self-
adaptive procedure can be applied, whereby counting
times are adjusted in the light of relatively rapid
preliminary peak and background measurements [2].
To minimise errors due to beam current drift,
contamination build-up, and specimen damage, it is
desirable to divide the long counting times required
for trace analysis into a series of alternating peak and
background measurements. Where the operating soft-
ware has no provision for this, a similar result can be
obtained by repeating the normal analysis routine
using relatively short counting times.
Specimen Damage
For some types of sample the allowable current is
limited by specimen damage. Assuming this is
determined by the energy deposited in the sample
per unit volume (rather than by the energy of the
individual electrons), a higher current can be used
with high V0 because the energy is deposited in a
larger volume. The case for using a high V0 as stated
above is thus enhanced for this type of sample.
Other preventive measures commonly used, namely
enlarging the beam, scanning the beam in a raster, or
moving the specimen during the analysis, all incur a
sacri®ce of spatial resolution. Beam-induced heating
of poor heat-conductors can be reduced substantially
by coating with a material of high thermal conductiv-
ity [4] (the choice between suitable metals such as
aluminium, copper, silver or gold is in¯uenced by the
need to avoid interference with the X-ray spectrum of
the sample). By comparison with the thin carbon coat
normally used for insulating samples (which has little
protective effect), such relatively thick metallic coat-
ings reduce the X-ray intensities signi®cantly, and this
must be taken into account by using similarly coated
standards or applying a correction factor.
Pulse-Height Analysis
Pulse-height analysis not only minimises the con-
tribution of high-order re¯ections of characteristic
X-ray lines where these coincide with the analytical
(®rst-order) line, but may also reduce background by
excluding the contribution of high-order continuum
X-rays (especially for long wavelengths, where dif-
ferential absorption by the counter window enhances
the relative intensity of the high-order continuum).
Background produced by scattered X-rays and
electrons (especially at low Bragg angles) can also
be reduced by suitable threshold setting. When pulse-
height analysis is used, it is important to avoid
excessive count-rates (e.g.,� 104 counts/s), where
pulse shrinkage and broadening of the pulse-height
distribution may occur. These effects can be mini-
mised by using a reduced counter anode voltage
(compensated by increased ampli®er gain).
Choice of Line and Crystal
For a given element there is sometimes a choice of
analytical line: e.g., for atomic numbers 26 to 35 the
K� and L� lines are both within the range of
spectrometers equipped with the usual crystals (like-
wise the L� and M� lines for Z� 70±92). Further-
more, there is a choice of crystal when the wavelength
concerned falls within the region of overlap between
crystals. For trace analysis the optimum line/crystal
Fig. 1. Calculated relative spatial resolution and detection limit asfunction of accelerating voltage; detection limit shown with andwithout absorption in the sample (assuming arbitrary values ofmass absorption coef®cients for illustrative purposes)
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combination is that which gives the maximum P2/B.
However, the presence of spectral interferences
favours the crystal with smaller interplanar spacing
(and therefore higher Bragg angle for a given
wavelength, and better resolution). Using a narrow
spectrometer slit increases P/B but this is outweighed
by the decrease in P and is therefore of little bene®t,
except occasionally for resolving interferences.
Background Corrections
X-Ray Continuum
Background is attributable almost entirely to the
continuous X-ray spectrum (`continuum') generated
by the bombarding electrons. The continuum intensity
I(�) (in photons per second per unit wavelength
interval) is given by the Kramers expression:
I(�) = const. Z��ÿ10 ÿ �ÿ1��ÿ1, in which �0 is the
Duane-Hunt limit as determined by the incident
electron energy. The intensity rises to a maximum at
2�0 and decreases monotonically for � > 2�0 (the
usual region of interest). The observed background
consists of the continuum integrated over the width,
��, of the spectrometer response function. This is
equal to the peak width for an effectively monochro-
matic X-ray line, and decreases with increasing Bragg
angle, enhancing the effect of the downward trend in
I(�) [5]. Other relevant factors are crystal re¯ection
ef®ciency, window absorption, and counter detection
ef®ciency, but these affect background and peak
intensities equally.
Linear Background Interpolation
The normal method for estimating background is to
measure the intensity with the spectrometer offset on
each side of the peak and interpolate linearly to the
peak position. The offset required depends on the
peak width (which increases at the low end of the
Bragg angle range) and the presence of adjacent lines.
Using large offsets may risk errors due to background
nonlinearity, but it is not necessary to move so far
from the peak as to completely avoid the tails: a
moderate contribution from these is acceptable since
it has no effect on the ratio of the sample and standard
background intensities, provided the same offsets are
used for both and there is no difference in the shape of
the peak pro®le [6].
The presence of neighbouring lines on one side of
the peak sometimes requires background to be
measured only on the other side (assuming this is
interference-free). The factor required to allow for the
slope of the continuum can be derived from a `blank'
standard containing none of the trace elements
concerned. This need not necessarily be closely
similar with respect to major elements, since con-
tinuum shape is independent of composition, but must
not have any absorption edges or interfering lines in
the regions of interest.
Background Curvature
In trace-element analysis background nonlinearity
requires consideration, because the amount which is
acceptable (relative to other errors) is as little as 1%.
Curvature is generally small over the relevant
wavelength interval, but the correction required is
not necessarily negligible. The effect depends on the
size of the offsets used and, in terms of concentration,
is a function of the pure-element peak intensity
compared to the continuum. It is thus greatest for a
sample of high mean atomic number and for a
relatively weak X-ray line (see Fig. 2). Corrections
can be derived from a blank standard satisfying the
criteria described in the previous section. If required,
the local shape of the continuum may be represented
by an equation such as a parabola, the coef®cients of
which can be determined experimentally [7].
Fig. 2. Background error expressed as concentration (ppm) causedby continuum curvature (LiF crystal, accelerating voltage ± 25 kV,sample atomic number ± 26) plotted against sine of Bragg angle.The effect of curvature is greater for L� than for K� lines owing tothe lower intensity of the former
148 S. J. B. Reed
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Continuum Modelling
Predicting background intensities by calculating the
continuum intensity offers the attractive possibility of
saving counting time and avoiding interpolation and
interference problems associated with spectrometer
offset measurements. The generated continuum inten-
sity can be derived from Kramers' expression, but the
observed intensity also depends on the spectrometer
ef®ciency. Since it is impracticable to derive this
from ®rst principles, an empirical approach must be
adopted. For example, intensities measured at the
wavelengths of relevant lines using a blank standard
containing none of the trace elements of interest can
be scaled to allow for the atomic number difference.
The uncertainty involved in this scaling should
preferably be minimised by using a standard similar
in mean atomic number to the analysed sample. A
somewhat more complex function than the simple
linear Z-dependence in the Kramers expression is
required (except for small differences in Z): this can be
derived from experimental measurements on samples
of different mean atomic number [2, 8, 9, 10]. Correc-
tions for absorption in the specimen should be applied.
Limits to the accuracy obtainable by this method may
inhibit its use for extreme trace-element analysis.
Background Discontinuities
The assumption that background varies smoothly and
monotonically with wavelength is mostly valid, but
discontinuities due to absorption edges need to be taken
into consideration. For example, the Ar K absorption
edge at 0.3871 nm causes an abrupt change in the
ef®ciency of an argon-®lled proportional counter. Also,
absorption edges of major elements in the sample cause
steps owing to the change in the absorption of the
emerging continuum X-rays. Background offsets should
be chosen so that no such edges lie between the peak
and the positions used for measuring background.
A `hole' in the background for LiF occurs at
0.1271 nm, close to the Au L� line, where about 10%
of the intensity is lost owing to re¯ection by the
`wrong' planes in the crystal [11]. Allowance for the
hole must be made if this line is used, or alternatively
the M� line may be used instead.
Interferences
The high resolution of the WD spectrometer ensures
that characteristic X-ray lines are well resolved in
most cases. However, interfering peaks may cause
either over- or under-estimation of element concen-
trations, depending on whether peak or background is
affected most. It is common practice to adopt a `trial
and error' approach in which normal analytical
conditions are used initially and are modi®ed if the
presence of interferences is indicated, for example, by
asymmetry in the background intensity recorded
above and below the peak, or a negative concentra-
tion. It is preferable, however, to identify possible
interferences in advance, for example, by spectrum
simulation (see below).
Interferences in complex spectra can be minimised
by optimal selection of analytical line, spectrometer
crystal and background offsets, but where unavoidable
their effect needs to be corrected by deducting an
appropriate amount from the measured peak and/or
background intensities. To a fair approximation the
overlap correction can be equated to the apparent
concentration of the overlapped element in a standard
containing the overlapping element, scaled in propor-
tion to the concentration of the overlapping element in
the sample. However, it is desirable to take account of
the matrix-dependence of the relative line intensities
involved by applying `ZAF' factors [12]. Trace-
element analysis is inevitably affected adversely by
interferences, on grounds of both statistical precision
and uncertainty in the corrections.
WDS Simulation
The idea of spectrum simulation originated with the
NIST `Desk-Top Spectrum Analyzer' for ED spectra.
Modelling WD spectrometer characteristics is harder,
hence experimentally recorded spectra are used in the
`Virtual WDS' program [13]. This contains a database
of experimentally recorded spectra, which can be scaled
according to accelerating voltage and beam current, and
combined in proportion to assumed element concentra-
tions (using estimated values for `unknown' samples),
thereby obviating the need for time-consuming `real'
wavelength scans. A case where this approach is
valuable is rare-earth element determination in minerals
[14] (see Fig. 3). Another useful feature is the ability to
predict precision and detection limits.
Trace Element Quanti®cation
The principles of quantitative analysis are the same
for trace and major elements: the concentration of
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each element is derived from the ratio of the
background-corrected peak intensity for the sample
to that obtained from a reference standard (either a
pure element or a compound of known composition
containing the element concerned). There is little
bene®t in using as the standard for a trace element a
material in which the relevant element is present in a
similarly low concentration: indeed, this has the
disadvantage that the standard measurement is then
subject to the inaccuracies associated with measuring
small peaks. Also, homogeneous trace-element stan-
dards are hard to ®nd. It is therefore reasonable to use
the same standards for trace elements as for major
elements, though the beam current must be relatively
low to avoid excessive count-rates.
A secondary consideration is that uncertainty in the
matrix corrections is reduced if the standard resem-
bles the sample in composition. However, tests of
matrix correction procedures for major elements show
that errors are generally less than � 5% (relative),
which is usually smaller than the statistical errors for
trace elements; compositional similarity of standards
is thus less important than for major elements.
Combining Major and Trace Element Analysis
Optimum conditions for trace analysis tend to give
excessive count-rates for major elements, as men-
tioned above. This can be overcome by conducting
major-element analysis separately using `normal'
conditions and then combining the results with
trace-element data obtained with higher accelerating
voltage and beam current. However, electron penetra-
tion increases with the accelerating voltage, hence
trace and major element data will refer to different
volumes within the sample. Also, EPMA software is
commonly not adaptable to this strategy, necessitating
the use of a separate trace analysis program [15]. This
approach is facilitated by the fact that trace elements
need not be included in the iterative correction loop,
since they have a negligible effect on the correction
factors.
Separate routines may be avoidable by selecting
X-ray lines for major elements which are less intense
than the normal choice: for example, K� instead of
K�. (The spectrometer crystal can also be selected
with this in view in some cases). An alternative
possibility is to use an ED spectrometer with a small
aperture (the concentration of high X-ray intensity on
a limited area of the detector does not seem to have
any ill effects).
Errors in Trace Analysis
The precision of trace element analysis is ultimately
limited by counting statistics, but can be worsened by
¯uctuations caused, for example, by instrument
instability (though this is usually small). The most
important potential systematic errors are connected
with background subtraction and inter-element inter-
ferences. The effect of uncorrected continuum curva-
ture is generally small. Larger errors (either positive
or negative) can be caused by interferences. Avoid-
ance by using an alternative analytical line usually
entails poorer precision and detection limit, on
account of the lower peak intensity and peak-to-
background ratio. Even if an interference correction is
applied, there are residual errors due to uncertainties
in the correction, and with large interferences trace
analysis is effectively impossible.
A detected peak may be real, while not truly
re¯ecting the presence of that element in the sample.
For example, scattered electrons may excite X-rays
from surrounding objects, or nearby parts of the
specimen itself, though fortunately the focussing
properties of WD spectrometers help to minimise
such extraneous contributions. Surface contamination
from polishing materials etc. is another potential
cause of misleading results, but can be avoided by
suitable choice of materials and thorough specimen
cleaning. Fluorescence in a neighbouring phase
excited by primary X-rays from the analysed spot
can give rise to a spurious result where there is a high
Fig. 3. Spectra of Eu and other rare-earth elements (LiF crystal)produced by `Virtual WDS' program, illustrating interferencesaffecting both Eu L� peak and potential background offsetmeasurement positions
150 S. J. B. Reed
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concentration of the element concerned in the
adjacent phase. An example is �500 ppm Ca observed
in a Ca-free silicate mineral adjacent to calcite (40%
Ca) at a distance of 20mm from the interface [16].
There is no way of preventing this, but corrections can
be estimated. Alternatively, in some cases it may be
possible to extract the grains of interest and analyse
them in isolation.
Conclusions
To exploit the trace element capabilities of EPMA
fully it is necessary to use conditions that maximise
the statistical precision with which a small peak can
be distinguished from background. The high accel-
erating voltage and beam current desirable on these
grounds are, however, unsuitable for major element
analysis on account of excessive count-rates, large
ZAF corrections, poor spatial resolution, and speci-
men damage. Separate routines for major and trace
elements are therefore preferable. The long counting
times necessary for the latter should, if possible, be
divided into alternating peak and background mea-
surements to minimise the effect of instrumental drift.
Ultimate detection limits approaching 1 ppm as
de®ned by statistical criteria are obtainable in the
most favourable cases, but for heavy elements which
require the use of L or M lines (which are less intense
than the K lines used for elements in the range Z�11±
30) and for samples of high mean atomic number (and
consequently high continuum intensity) attainable
limits are considerably higher.
For concentrations around a few ppm, the normal
background correction method entailing linear back-
ground interpolation between offset spectrometer
positions is questionable, the accuracy required in
the background determination being of the order of
�1%. Careful attention must therefore be paid to the
possibility of nonlinearity, which may arise from
curvature of the continuum or absorption edges. A
`blank' standard known to contain none of the trace
elements of interest can be used to quantify these
effects. Serious errors can occur when either peak or
background measurements are affected by interfering
peaks of other elements.
Interference corrections can be applied when
necessary, but in such cases the accuracy of trace
element analysis inevitably suffers. Correction factors
can be determined from measurements on pure
elements (or other appropriate standards). A spectrum
simulation program enables interference effects to be
predicted and often avoided by choosing an alter-
native spectrometer crystal or X-ray line and saves
instrument (and operator) time.
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Quantitative Trace Analysis by Wavelength-Dispersive EPMA 151