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Plasmafysica & Stralingstechnologie Elementary Processes in Gasdischarges Plasma & Materials Processing Coherence & Quantum Technology Science and Technology of Nuclear Fusion Slide 2 / Applied Physics Plasma medium: common interest to the PPRT thrust area Same fundamental knowledge reservoir Plasmas investigated vary in density and temperatures Intrinsic nonequilibrium medium Utilize fundamental knowledge in various applications Very good example of applied science Plasma Physics and Radiation Technology Experiments and modeling approach Slide 3 / Applied Physics Plasma Physics and Radiation Technology Physics and chemistry on short time and length scales Use of high power lasers for in situ and real time plasma and surface diagnostics Two groups: Research on plasma-surface interaction Plasma & Materials Processing (PMP) Research on homogeneous plasma processes Elementary Processes in Gasdischarges (EPG) Slide 4 / Applied Physics Plasma Physics and Radiation Technology CQT High phase space density plasmas Coherence & Quantum Technology DeBroglie wavelength: Phase space density: Quantum Effects become important Slide 5 / Applied Physics Plasma Physics and Radiation Technology Science & Technology of Nuclear fusion Group will have experimental focus Strong collaboration with national and international facilities world wide Direct links with PMP and EPG groups are present Slide 6 / Applied Physics The track embraces research subjects such as: the generation of plasmas plasma-surface interaction (e.g. plasma deposition, plasma etching, etc.), plasma-accelerators, novel ion and electron sources laser cooling techniques and atomic optics An important characteristic of the master track is the fundamental approach of the themes as well as the research into new applications of this broad field of research. Plasma Physics and Radiation Technology Slide 7 / Applied Physics General outline of the Master programme 1 st year 60 ECTS 3 compulsory courses 10ECTS (Compulsory) track courses 17ECTS Optional courses 14ECTS External Assignment 19 ECTS 2 nd year 60 ECTS Graduation project 60 ECTS General compulsory courses: 3 courses with a total of 10 ECTS Compulsory and optional track courses: 17 ECTS consisting 2 compulsory courses of 8 ECTS in total and at least 11 ECTS of optional track courses; optional courses: each student has to choose a well-balanced set of courses to a total of at least 14 ECTS points (about 3-4 courses); external assignment project of 19 ECTS points (12 weeks) usually outside TU/e; graduation project of 60 ECTS points (1 year). Plasma Physics and Radiation Technology Slide 8 / Applied Physics Coherence & Quantum Technology (CQT) Extreme states of matter: Ultra-cold & ultra-hot, plasmas & gases; Laser manipulation of atoms, electrons and ions; Atom, electron & ion beams for femto-nano science & engineering. Staff: Prof. Jom Luiten Prof. Ton van Leeuwen Dr. Servaas Kokkelmans Dr. Peter Mutsaers Dr. Edgar Vredenbregt Dr. Seth Brussaard Slide 9 / Applied Physics Coherence & Quantum Technology (CQT) Ultra-Cold Electron & Ion Beams: Laser cooling & trapping; Femtosecond (10-15 s) laser physics; Ultra-low temperature (0.001 - 10 kelvin) plasmas; Femtosecond electron microscopy; Sub-nanometer ion beam drilling & milling. Edgar Vredenbregt, Jom Luiten, Peter Mutsaers Slide 10 / Applied Physics Ultracold electron & ion beams 15 K Electron temperature e-e- ions V II Taban et al., to be published Ultracold plasmas Taban et al., Phys. Rev. Special Topics, 11, 050102 (2008) Slide 11 / Applied Physics Theory of Quantum Gases: Atoms trapped in an optical lattice; Superfluidity of ultra-cold (nano-kelvin) Fermi and Bose gases; Quantum Plasmas & Beams. Servaas Kokkelmans Laser Wakefield Acceleration: Tera-watt light bullet laser physics; Extreme high-energy-density plasmas; Seth Brussaard Coherence & Quantum Technology (CQT) Slide 12 / Applied Physics Femtosecond structural dynamics The (bio)molecular movie... The poor mans X-ray Free Electron Laser Luiten et al., PRL 93, 094802 (2004) Claessens et al., PRL 95, 164801 (2005) Van Oudheusden et al., JAP 102, 093501 (2007) VICI project Luiten: Exploring extreme beam regimes for femtosecond electron imaging Phase space density = Beam Brightness Slide 13 / Applied Physics Staff: Prof.dr.ir. Gerrit Kroesen Prof.dr. Joost van der Mullen Dr.ir. Eddie van Veldhuizen Dr.ir. Peter Bruggeman Dr.ir. Sander Nijdam Dr.ir. Jan van Dijk Prof.dr. Ute Ebert Prof.dr. Marco Haverlag Elementary Processes in Gas Discharges (EPG) Light and photons: Efficient lamps and EUV sources Environmental technology: using plasmas for air / water cleaning Biomedical technology: sterilisation; new medical treatments Slide 14 / Applied Physics Plasmas: Heaven and earth Elementary Processes in Gas Discharges (EPG) Slide 15 / Applied Physics Plasmas in lab and industry (1) Elementary Processes in Gas Discharges (EPG) Slide 16 / Applied Physics Plasmas in lab and industry (2) Elementary Processes in Gas Discharges (EPG) Slide 17 / Applied Physics Stereo-photography of Corona discharges S. Nijdam et al., Appl. Phys. Lett. 92 101502 (2008) Slide 18 / Applied Physics Plasma & Materials Processing (PMP) Staff: Dr.ir. Erwin Kessels Dr. Richard Engeln Dr. Adriana Creatore Dr. Ageeth Bol Prof.dr. Fred Roozeboom Prof.dr.ir. Richard van de Sanden Plasma physics and chemistry of plasma & materials processing; Advanced plasma and surface diagnostics Micro- and nano-engineering of functional materials Slide 19 / Applied Physics Physics and chemistry of plasma & materials processing Micro- and nano-engineering of functional materials Advanced plasma and surface diagnostics Plasma chemistry Ion/radical densities/fluxes Energy distribution fcts. Plasma surface interaction Plasma enhanced CVD Dry etching Plasma-assisted ALD Thin films & devices Ellipsometry Nonlinear surface spectroscopy Novel surface diagnostics (Laser) based gas phase diagnostics Plasma & Materials Processing (PMP) Slide 20 / Applied Physics In situ dangling bond detection during a-Si:H growth H-abstractionadsorption on DBweakly-adsorbed stateinsertion into Si-Si 1 m mc-Si Ag ZnO glass substrate High rate plasma deposition of amorphous and microcrystalline silicon: Understanding the film growth mechanism Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) Slide 21 / Applied Physics In situ dangling bond detection during a-Si:H growth Evanescent wave cavity ring down absorption spectroscopy on dangling bonds dangling bond absorption Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) Slide 22 / Applied Physics Si-radical growth pulse Surface dangling bond density during growth ~ 5x10 11 cm -2 surface coverage ~ 5x10 -4 !! In situ dangling bond detection during a-Si:H growth Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) Slide 23 Waar komen onze afstudeerders terecht? Lokale industrie (ASML, NXP, OTB-Solar, Fujifilm, FEI) Instituten (TNO, ECN, etc.) Promotieplaatsen bij diverse universiteiten (ook buitenland via de verschillende zeer internationaal georienteerde groepen) / Applied Physics Slide 24 Plasma medium: common interest to the PPRT thrust area Same fundamental knowledge reservoir Plasmas investigated vary in density and temperatures Intrinsic nonequilibrium medium Utilize fundamental knowledge in various applications Very good example of applied science Plasma Physics and Radiation Technology Experiments and modeling approach