µpg 101 - micro pattern generator€¦ · µpg 101 quick start guide 4 startup 4. exposure wizard...

Quick Guide

Quick Start Guide

µPG 101 - Micro Pattern Generator

µPG 101

Quick Start Guide 2

Doc. No.: DWL-HI-059 Revision: 0 (August 2014) Wizard Version: 4.1.6 Copyright © 2014 by Heidelberg Instruments

µPG 101

Quick Start Guide 3

Introduction

This quick guide gives instructions on how to set up an exposure procedure in standard mode and in advanced mode. When working in advanced mode it is recommended to gain knowledge about the alignment options before setting up an alignment job. To get informed about this topic, read chapter 4 Alignment Methods and Batch Exposures in the User Guide for the µPG 101 system. We generally recommend to keep the User Guide handy for reference during an exposure procedure instructed by this quick guide. Throughout this guide, you find icons that point to a button or to a section of interest within the wizard window. The icons say: Click the button this arrow points to. Click this button, checkbox etc., if the optional task is required to be performed. Check the parameters, values etc.

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µPG 101

Quick Start Guide 4

Startup

1. At the supply unit, switch on the µPG 101 with the power switch. The power indicator lamps at the supply unit and at the lithography unit light up.

2. Close the cover lid and make sure that air pressure for the stage is applied. The safety interlock lamp should be off.

3. Power up the User PC according to the manufacturer’s instructions.

4. Wait at least 5 minutes before starting the Exposure Wizard (for information see 1.4 Exposure Wizard). The internal controller of the system has to finish booting before. Together with the wizard, the camera software HI Vision starts and creates a minimized window.

power

switch power indicator lamp

Wizard may crash and parameters get lost! Never close the camera window while the wizard is running

power indicator lamp

safety interlock lamp

Note: It is recommended to wait for at least 20 minutes for the system to warm up and stabilize before doing an exposure.

µPG 101

Quick Start Guide 5

Standard Mode

µPG 101

Quick Start Guide Standard Mode 6

Welcome Screen

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Choose standard mode by deselecting Show Advanced Options:

Standard Mode

If required, change write mode (see User Guide, 2.3 Write Head Exchange for Write Mode Change ).

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µPG 101


Design panel (design prepared according to the rules mentioned in the Design Guide!)

In the Design panel:

Some design parameters are listed.

A preview of the design is given in the Preview frame. To open the design in the standard viewing application that is set in the operating system, click on the preview window.

After you have unloaded the substrate, process it according to the substrate type (see User

Guide, 2.11 Substrate Processing) and the manufacturer’s recommendation.



Click Next. You are lead to the Check Options panel to set parameters for the exposure.

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2

Click Load Design.

1. Navigate to the directory on the PC or the network that contains the design file.

2. Select a design file and click OK.

3. If a dialog window requests now the size that was defined for one drawing unit during design creation, then enter the number and click OK. Note: Only integer values may be entered for DXF and BMP

designs.

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µPG 101


Check Options panel

5



5

6

Click Load Substrate. The stage moves into loading position.

1. When all movement has stopped, open the cover lid.

2. Mount the alignment pins in the appropriate position on the chuck (see Appendix at the end for positioning information).

3. Take a substrate from the storage container and place it on the stage with the resist coated side turned up(see Appendix at the end for placing information).

4. Remove alignment pins. 5. Close the cover lid.

6. In the loading status window, click OK.

Set Expose Options. In the Expose Options frame you can influence the amount of energy that is deposited on the resist surface. If necessary:

Change the output power and the pixel pulse duration.

Change the Energy Mode.

Turn the filter knob.

For more information see User Guide, 2.9 Exposure Settings.

Click Next. You are lead to the panel where you start the exposure procedure from.

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5

6

µPG 101


Expose Design panel

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Check the design data and the energy values.

If required, choose from the Options frame at the bottom of the panel.

Click Expose.

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µPG 101


Expose Design panel (after exposure)

After you have unloaded the substrate, process it according to the substrate type’s requirements (see User Guide, 2.11 Substrate Processing) and the manufacturer’s recommendation.

8

Click Unload Stage.

1. Wait until all movement has stopped.

2. Open the cover lid and switch off the vacuum with the vacuum switch.

3. Carefully lift the substrate off the chuck.

To expose the same design on a new substrate, click Expose same Design. Your design settings are kept and you are lead back to the Expose Design panel (before exposure) in which you can change the energy settings.

To load a new design, click Expose new Design. You are lead back to the Design panel.

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µPG 101

Quick Start Guide Advanced Mode 11

Advanced Mode


Welcome Screen

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1

Choose advanced mode by selecting Show Advanced Options: Advanced Mode

If required, change write mode (see User Guide, 2.3 Write Head Exchange for Write Mode Change).

1

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µPG 101


Design panel (design prepared according to the rules mentioned in the Design Guide!)

Click Load Design.

4. Navigate to the directory on the PC or the network that contains the design file.

5. Select a design file and click OK.

6. If a dialog window requests now the size that was defined for one drawing unit during design creation, then enter the number and click OK. Note: Only integer values may be entered for DXF and BMP

designs.

In the Design panel:

Some design parameters are listed.

A preview of the design is given in the Preview frame. To open the design in the standard viewing application that is set in the operating system, click on the preview window.

Click Next. You are lead to the Check Options panel to set parameters for the exposure.

2

3

2

3

µPG 101


Check Options panel

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5

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6

Click Show Control Panel. In the Control Panel window, click To Un/Load.

1. When all movement has stopped, open the cover lid.

2. Mount the alignment pins in the appropriate position on the chuck (see Appendix at the end for positioning information).

3. Take a substrate from the storage container and place it on the stage with the resist coated side turned up(see Appendix at the end for placing information).

4. Remove alignment pins. 5. Close the cover lid. 6. In the loading status window, click OK.

In the Check Options panel, set Expose Options. In the Expose Options frame you can influence the amount of energy that is deposited on the resist surface. If necessary:

Change the output power and the pixel pulse duration.

Change the Energy Mode.

Turn the filter knob.

For more information see User Guide, 2.9 Energy Settings for Exposure.

If required, choose from the Design Options frame.

In the Control Panel window, you can choose from the available focusing modes. Select the required mode from the Writehead frame (for futher information see User Guide)

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5

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µPG 101


Manual Alignment panel

7

In the Manual Alignment panel, select the alignment method of your choice. Perform the alignment procedure (see User Guide for details).

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µPG 101


Expose Design panel

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Check the data displayed in the Expose Design panel.

If required, choose from the Options frame at the bottom of the panel.

Click Expose. The exposure starts.

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µPG 101


Expose Design panel

After you have unloaded the substrate, process it according to the substrate type (see User Guide, 2.11 Substrate Processing) and the manufacturer’s recommendation.

9

In the Expose Design panel, click Show Control Panel. In the Control Panel window, click To Un/Load.

1. Wait until all movement has stopped.

2. Open the cover lid and switch off the vacuum with the vacuum switch.

3. Carefully lift the substrate off the chuck. To expose the same design on a new substrate, click Expose same

Design. Your design settings are kept and you are lead back to the Expose Design panel in which you can change the energy settings.

To load a new design, click Expose new Design. You are lead back

to the Design panel.

9

Quick Start Guide 18

Appendix

µPG 101

Quick Start Guide Appendix 19

Alignment Pins Positioning



selected: deselected:

[(6")5"4"] [3"] [2"]

alignment pin

thread

Vacuum Region Selection

Pin Removal Tool

1. Screw the threaded end of the tool into the alignment pin on the chuck. Now the tool is fixed inside the pin.

2. Pull out the tool together with the pin.

If the substrate has a size of 2” or larger, add vacuum region extensions by turning the vacuum field selection screws (3)

µpg 101 - micro pattern generator€¦ · µpg 101 quick start guide 4 startup 4. exposure wizard...

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