patents by applied microstructures, inc

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applied microstructures & boris kobrin

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Controlled vapor deposition of biocompatiblecoatings over surface-treated substratesApplication number: 20060088666Abstract: We have developed an improved vapor-phasedeposition method and apparatus for the application oflayers and coatings on various substrates. The methodand apparatus are useful in the fabrication ofbiofunctional devices, Bio-MEMS devices, and in thefabrication of microfluidic devices for biologicalapplications. In one important embodiment, a siloxanesubstrate surface is treated using a combination ofozone and UV radiation to render the siloxane surfacemore hydrophilic, and subsequently a functional coatingis applied in-situ over the treated surface of the siloxanesubstrate.Type: ApplicationFiled: December 5, 2005Issued: April 27, 2006Assignee: APPLIED MICROSTRUCTURES, INC.Inventors: Boris Kobrin, Jeffrey Chinn, Romuald Nowak

Controlled vapor deposition of biocompatiblecoatings over surface-treated substratesPatent number: 7695775Abstract: We have developed an improved vapor-phasedeposition method and apparatus for the application oflayers and coatings on various substrates. The methodand apparatus are useful in the fabrication ofbiofunctional devices, Bio-MEMS devices, and in the

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427/248.1 (8)427/255.7 (5)438/763 (3)427/255.18 (2)427/255.23 (2)427/255.27 (2)427/255.6 (2)257/642 (2)422/130 (1)427/491 (1)


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fabrication of microfluidic devices for biologicalapplications. In one important embodiment, a siloxanesubstrate surface is treated using a combination ofozone and UV radiation to render the siloxane surfacemore hydrophilic, and subsequently a functional coatingis applied in-situ over the treated surface of the siloxanesubstrate.Type: GrantFiled: December 5, 2005Issued: April 13, 2010Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Jeffrey D. Chinn, RomualdNowak

Protective thin films for use during fabrication ofsemiconductors, MEMS, and microstructuresPatent number: 8067258Abstract: A method of protecting a substrate duringfabrication of semiconductor, MEMS, or biotechnologydevices. The method includes application of aprotective thin film which typically has a thicknessranging from about 3 ? to about 1,000 ?, whereinprecursor materials used to deposit the protective thinfilm are organic-based precursors which include at leastone fluorine-comprising functional group at one end of acarbon back bone and at least one functional bondinggroup at the opposite end of a carbon backbone, andwherein the carbon backbone ranges in length from 4carbons through about 12 carbons. In manyapplications at least a portion of the protective thin filmis removed during fabrication of the devices.Type: GrantFiled: June 5, 2006Issued: November 29, 2011Assignee: Applied Microstructures, Inc.Inventors: Jeffrey D. Chinn, Boris Kobrin, Romuald

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Nowak

Controlled vapor deposition of multilayered coatingsadhered by an oxide layerPatent number: 8545972Abstract: An improved vapor-phase deposition methodand apparatus for the application of multilayeredfilms/coatings on substrates is described. The methodis used to deposit multilayered coatings where thethickness of an oxide-based layer in direct contact witha substrate is controlled as a function of the chemicalcomposition of the substrate, whereby a subsequentlydeposited layer bonds better to the oxide-based layer.The improved method is used to deposit multilayeredcoatings where an oxide-based layer is depositeddirectly over a substrate and an organic-based layer isdirectly deposited over the oxide-based layer. Typically,a series of alternating layers of oxide-based layer andorganic-based layer are applied.Type: GrantFiled: July 29, 2010Issued: October 1, 2013Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Jeffrey D. Chinn, RomualdNowak, Richard C. Yi

Controlled vapor deposition of multilayered coatingsadhered by an oxide layerPatent number: 7776396Abstract: An improved vapor-phase deposition methodand apparatus for the application of multilayeredfilms/coatings on substrates is described. The methodis used to deposit multilayered coatings where thethickness of an oxide-based layer in direct contact witha substrate is controlled as a function of the chemical


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composition of the substrate, whereby a subsequentlydeposited layer bonds better to the oxide-based layer.The improved method is used to deposit multilayeredcoatings where an oxide-based layer is depositeddirectly over a substrate and an organic-based layer isdirectly deposited over the oxide-based layer. Typically,a series of alternating layers of oxide-based layer andorganic-based layer are applied.Type: GrantFiled: April 21, 2005Issued: August 17, 2010Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Jeffrey D. Chinn, RomualdNowak, Richard C. Yi

Method of depositing a multilayer coating with avariety of oxide adhesion layers and organic layersPatent number: 8298614Abstract: An improved vapor-phase deposition methodand apparatus for the application of multilayeredfilms/coatings on substrates is described. The methodis used to deposit multilayered coatings where thethickness of an oxide-based layer in direct contact witha substrate is controlled as a function of the chemicalcomposition of the substrate, whereby a subsequentlydeposited layer bonds better to the oxide-based layer.The improved method is used to deposit multilayeredcoatings where an oxide-based layer is depositeddirectly over a substrate and a SAM organic-based layeris directly deposited over the oxide-based layer.Typically a series of alternating layers of oxide-basedlayer and organic-based layer are applied.Type: GrantFiled: November 4, 2010Issued: October 30, 2012Assignee: Applied MicroStructures, Inc.


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Inventors: Boris Kobrin, Jeffrey D. Chinn, RomualdNowak, Richard C. Yi

MOISTURE BARRIER COATINGSApplication number: 20130320509Abstract: A moisture barrier coating for protecting asubstrate from moisture, comprises an inorganic layerdisposed over the substrate, the inorganic layercomprising an oxide or nitride of an element selectedfrom the group consisting of silicon, aluminum, titanium,zirconium, hafnium and combinations thereof; and anorganic silicon-containing layer disposed over theinorganic layer.Type: ApplicationFiled: August 5, 2013Issued: December 5, 2013Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Nikunj Hirji Dangaria, RomualdNowak, Michael T. Grimes

Articles with super-hydrophobic and-or super-hydrophilic surfaces and method of formationPatent number: 8236379Abstract: The present invention is related to a chemicalvapor deposition method of depositing layers ofmaterials to provide super-hydrophilic surfaceproperties, or super-hydrophobic surface properties, orcombinations of such properties at various locations ona given surface. The invention also relates to electronicapplications which make use of super-hydrophobicsurface properties, and to biological applications whichmake use of super-hydrophilic surface properties.Type: GrantFiled: September 26, 2007Issued: August 7, 2012


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Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Jeffrey D. Chin, Benigno A.Janeiro, Romuald Nowak

DURABLE, HEAT-RESISTANT MULTI-LAYERCOATINGS AND COATED ARTICLESApplication number: 20130320510Abstract: An article having a surface treated to providea protective coating structure in accordance with thefollowing method: vapor depositing a first layer on asubstrate, wherein said first layer is a metal oxideadhesion layer selected from the group consisting of anoxide of a Group IIIA metal element, a Group IVB metalelement, a Group VB metal element, and combinationsthereof; vapor depositing a second layer upon said firstlayer, wherein said second layer includes a silicon-containing layer selected from the group consisting ofsilicon oxide, silicon nitride, and silicon oxynitride; andvapor depositing a third layer upon said second layer,wherein said third layer is a functional organic-comprising layer, wherein said functional organic-comprising layer is a SAM.Type: ApplicationFiled: August 5, 2013Issued: December 5, 2013Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Nikunj Dangaria, RomualdNowak, Michael T. Grimes

Method of in-line purification of CVD reactiveprecursor materialsPatent number: 7687110Abstract: We have devised an apparatus useful for anda method of removing impurities from vaporousprecursor compositions used to generate reactive


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precursor vapors from which thin films/layers areformed under sub-atmospheric conditions. The methodis particularly useful when the layer depositionapparatus provides for precise addition of quantities ofdifferent combinations of reactants during a single stepor when there are a number of different individual stepsin the layer formation process, where the presence ofimpurities has a significant affect on both the quantity ofreactants being charged and the overall composition ofthe reactant mixture from which the layer is deposited.The method is particularly useful when the vaporpressure of a liquid reactive precursor is less than about250 Torr at atmospheric pressure.Type: GrantFiled: September 20, 2007Issued: March 30, 2010Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Romuald Nowak, Jeffrey D.Chinn, Richard C. Yi

Method for controlled application of reactive vaporsto produce thin films and coatingsPatent number: 7413774Abstract: A vapor phase deposition method andapparatus for the application of thin layers and coatingson substrates. The method and apparatus are useful inthe fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMSdevices, micro and nano imprinting lithography, andmicrofluidic devices. The apparatus used to carry outthe method provides for the addition of a preciseamount of each of the reactants to be consumed in asingle reaction step of the coating formation process.The apparatus provides for precise addition ofquantities of different combinations of reactants duringa single step or when there are a number of different


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individual steps in the coating formation process. Theprecise addition of each of the reactants in vapor formis metered into a predetermined set volume at aspecified temperature to a specified pressure, toprovide a highly accurate amount of reactant.Type: GrantFiled: December 21, 2004Issued: August 19, 2008Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Romuald Nowak, Richard C.Yi, Jeffrey D. Chinn

Durable, heat-resistant multi-layer coatings andcoated articlesPatent number: 8501277Abstract: A method of providing a durable protectivecoating structure which comprises at least three layers,and which is stable at temperatures in excess of 400°C., where the method includes vapor depositing a firstlayer deposited on a substrate, wherein the first layer isa metal oxide adhesion layer selected from the groupconsisting of an oxide of a Group IIIA metal element, aGroup IVB metal element, a Group VB metal element,and combinations thereof; vapor depositing a secondlayer upon said first layer, wherein said second layerincludes a silicon-containing layer selected from thegroup consisting of silicon oxide, silicon nitride, andsilicon oxynitride; and vapor depositing a third layerupon said second layer, wherein said third layer is afunctional organic-comprising layer. Numerous articlesuseful in electronics, MEMS, nanoimprinting lithography,and biotechnology applications can be fabricated usingthe method.Type: GrantFiled: May 5, 2008Issued: August 6, 2013


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Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Dangaria Nikunji Hirji, RomualdNowak, Michael T. Grimes

Controlled deposition of silicon-containing coatingsadhered by an oxide layerPatent number: 8178162Abstract: We have developed an improved vapor-phasedeposition method and apparatus for the application offilms/coatings on substrates. The method provides forthe addition of a precise amount of each of thereactants to be consumed in a single reaction step ofthe coating formation process. In addition to the controlover the amount of reactants added to the processchamber, the present invention requires precise controlover the total pressure (which is less than atmosphericpressure) in the process chamber, the partial vaporpressure of each vaporous component present in theprocess chamber, the substrate temperature, andtypically the temperature of a major processing surfacewithin said process chamber. Control over thiscombination of variables determines a number of thecharacteristics of a film/coating or multi-layeredfilm/coating formed using the method. By varying theseprocess parameters, the roughness and the thickness ofthe films/coatings produced can be controlled.Type: GrantFiled: November 19, 2009Issued: May 15, 2012Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Romuald Nowak, Richard C.Yi, Jeffrey D. Chinn

Controlled deposition of silicon-containing coatingsadhered by an oxide layer


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Patent number: 7638167Abstract: We have developed an improved vapor-phasedeposition method and apparatus for the application offilms/coatings on substrates. The method provides forthe addition of a precise amount of each of thereactants to be consumed in a single reaction step ofthe coating formation process. In addition to the controlover the amount of reactants added to the processchamber, the present invention requires precise controlover the total pressure (which is less than atmosphericpressure) in the process chamber, the partial vaporpressure of each vaporous component present in theprocess chamber, the substrate temperature, andtypically the temperature of a major processing surfacewithin said process chamber. Control over thiscombination of variables determines a number of thecharacteristics of a film/coating or multi-layeredfilm/coating formed using the method. By varying theseprocess parameters, the roughness and the thickness ofthe films/coatings produced can be controlled.Type: GrantFiled: June 4, 2004Issued: December 29, 2009Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Romuald Nowak, Richard C.Yi, Jeffrey D. Chinn

High aspect ratio performance coatings forbiological microfluidicsPatent number: 7879396Abstract: We have developed an improved vapor-phasedeposition method and apparatus for the application oflayers and coatings on various substrates. The methodand apparatus are useful in the fabrication ofbiotechnologically functional devices, Bio-MEMSdevices, and in the fabrication of microfluidic devices


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for biological applications. In one importantembodiment, oxide coatings providing hydrophilicity oroxide/polyethylene glycol coatings providinghydrophilicity can be deposited by the present method,over the interior surfaces of small wells in a plasticmicro-plate in order to increase the hydrophilicity ofthese wells. Filling these channels with a preciseamount of liquid consistently can be very difficult. Thisprevents a water-based sample from beading up andcreating bubbles, so that well can fill accurately andcompletely, and alleviates spillage into other wells whichcauses contamination.Type: GrantFiled: January 31, 2005Issued: February 1, 2011Assignee: Applied Microstructures, Inc.Inventors: Boris Kobrin, Jeffrey D. Chinn, RomualdNowak, Richard C. Yi


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