non-traditional high resolution patterning nanoimprint and ...kcarter/research/nanoimprint...cdse...
TRANSCRIPT
Carter Research GroupOverview Talk October 2012UMass
Non-Traditional High Resolution Patterning
Nanoimprintand
Roll-to-Roll Fabrication
Carter Research GroupOverview Talk October 2012UMass
UMass Nanoimprint Lithography Laboratory
Molecular ImprintsMI-55 SF-IL Tool Nanonex NX-2000
Nanoimprinter
Trion SystemsICP Etch Tool
One‐of‐a‐kind
NanoimprintLithography Facility
Carter Research GroupOverview Talk October 2012UMass
CdSe Nanowire Fabrication
1) spin coat w/ NOA 60 2-3) Soft lithography 4-5) Patterned NOA 60 w/ residual layer 6) ICP/ RIE etch to remove the residuallayer & create free-standing features 7) CdSe electrodeposition 8) NOA 60 lift-off &CdSe nanowire formation
PHOTORESIST
1PDMS
ITO
2
3
UV
5 4
6
87
Erenturk, B.; et al., Chemistry of Materials, 2011, 23(14), 3371–3376.
Carter Research GroupOverview Talk October 2012UMass
(A) (B)
• (A‐B) Effective photoresist removal without damaging the CdSe structures achieved by using Microposit MF‐319 (TMAH‐based aqueous developer, 4h development time)
• (C) The hexagonal CdSe crystal structure was unaffected by the template removal as confirmed by XRD analysis ( diffraction peaks at 2 = 23.5o, 25.5o, 26.9o, 41.9o and 45.0 o )
20 30 40 50 60 70 80
Inte
nsity
(a.u
.)
2
ITO substrate
Electrodeposition
Template removal
(100
)(0
02)
(101
)
(103
)
(110
)
CdSe Nanowire Fabrication
Erenturk, B.; et al., Chemistry of Materials, 2011, 23(14), 3371–3376.
Carter Research GroupOverview Talk October 2012UMass
Colloidal Assembly on Fibers
Carter Research GroupOverview Talk October 2012UMass
Colloidal Assembly on Fibers
Carter Research GroupOverview Talk October 2012UMass
Templated Electrodeposition of PEDOT
Carter Research GroupOverview Talk October 2012UMass
2D Nano/Microporous CdSe from Bilayer Templates
Park, J. Y.; Hendricks, J. L.; Carter, K. R. Submitted, 2011.
Carter Research GroupOverview Talk October 2012UMass
CHM Test Bed: Roll-to-Roll Process Facility• UMass NanoEmboss R2RNIL Tool has been constructed and installed• Tool is unique and is designed for coating and imprinting with nanoscopic precision• CHM will leverage our expertise in ordered BCP systems to fabricate a number of technologically
useful materials and devices.• Efforts includes the development of functionalized materials to target specific active surfaces &
coatings, electronic, mechanical and optical properties.• As our capabilities grow, the complexity of end-products will increase.• To realize our goal, the CHM has augmented it skill base and assembled a world class team with
experts from academia, government, and industry.
Carter Research GroupOverview Talk October 2012UMass