nirt: opto-plasmonic nanoscope nsf nirt grant ecs-068863 pis: y. fainman, v. lomakin, a. groisman,...
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NIRT: Opto-Plasmonic NanoscopeNIRT: Opto-Plasmonic NanoscopeNSF NIRT Grant ECS-068863
PIs: Y. Fainman, V. Lomakin, A. Groisman, and G. W. Schmid-Schoenbeim
University of California, San Diego, La Jolla, California 92093-0407Tel: (858) 534-8909; Fax: (858) 534-1225; E-mail: [email protected]; web site: http://emerald.ucsd.edu
Microscope: Diffraction limited
Nanoscope in Plasmonic Era
Plasmonic nanoscope: Sub-diffraction limited
A 1879 optical microscope
Our focusing approachSub-diffraction limited focusingR. Rokitski et al, Phys. Rev. Lett. 95, 177401 (2005)
L. Yin et al, Nano Lett. 5, 1399 (2005)
Objective: Plasmonic microscopy with sub-wavelength resolutionObjective: Plasmonic microscopy with sub-wavelength resolution
//x y
SPP G Gn m k k K K
// 0ˆ ˆsin cos sin sinx y k k k k x y
1,3 21 2,2 3 0
1,3 2
sp k
k
Assuming small modulation (d << a), and no coupling between adjacent sides:
Phase matching condition (resonant Wood’s anomaly):
(planar case) (-X)
Norm
aliz
ed
fre
qu
en
cy (
a/2
c =
a/
) ~ 1.5 m, NIR
SPP Bloch modes in 2-D nanohole array
Sample fabrication: nanoholes in metal films• Variety of substrates (GaAs, Si, SiO2, Al2O3)
• Evaporation or sputtering of Al, Au, or Ag metallic films (thickness h ~ 50-200 nm)
• ICP-RIE and wet etching (hole diameters d ~ 100-500 nm)
200 m
Al on GaAs
1 m
E-beam direct write• Tailored structures on same
substrate for comparison• Limited area (~ 200 m)
E-beam direct write• Tailored structures on same
substrate for comparison• Limited area (~ 200 m)
200 m
Au on SiO2
1 m
Holographic lithography• Use of chemically amplified
negative resist (SU-8) • Precise control of fill factor
(easier to make small holes)• Large areas (~ 1 cm2)
Holographic lithography• Use of chemically amplified
negative resist (SU-8) • Precise control of fill factor
(easier to make small holes)• Large areas (~ 1 cm2)
SPP Heterodyne Imaging Setup
Time averaged SPP mode*
Time-resolved SPP interferogram
Input and reference pulse:0 = 1.55 mFWHM ~ 200 fs
CCD OutputSample illumination
R. Rokitski, KA. Tetz, Y. Fainman, PRL, vol.95, no.17, 21 Oct. 2005, pp.177401/1-4
Time evolution of SPP wavepacketSpatial amplitude and phaseof scattered SPP field
= 0 fs = 133 fs = 266 fs = 400 fs
Ultrafast SPP electrodynamics
Spatial phase: focused SPP fieldsSpatial amplitude and phase with converging and diverging illumination
R. Rokitski, KA. Tetz, Y. Fainman, Phys. Rev. Lett., vol.95, 2005, pp.177401/1-4
1 1 1tot mat radsp sp sp
20 5totsp m
80 9matsp m
27radsp m
Radiative vs. material damping
0 50 100 150 20010
-3
10-2
10-1
100
Distance [m]
Inte
nsity
[a.
u.]
totsp
x
I e
matsp
x
I e
Simultaneous measurement of both planar and corrugated surface propagation lengthsDetermines radiative decay (coupling strength) from grating array
Diffractive plasmonics: SPP Fresnel Zone Plate
Diffractive plasmonics: SPP Fresnel Zone Plate
2 2
4spp
n spp
nr n f
SPP Fresnel Zone Plate
A SPP Fresnel zone plate was fabricated at aluminum (Al)/air interface and worked at the free space wavelength of 1.55 μm (λspp = 1.547 μm). The designed focal length was 80 μm.
Fresnel Zone Plate
Al
Si
Sample preparation and fabricationSample preparation and fabrication
Si-on-Al SPP
Fresnel Zone Plate
Si-on-Al SPP
Fresnel Zone Plate
20 μm 5 μm
SPP plane wave excitationSPP plane wave excitation
ExcitationArray
DetectionArray
How to make sure the incident SPP wave is planar?
Image with Fresnel zone plate
Image without Fresnel zone plate
Diffractive SPP focusingDiffractive SPP focusing
High intensity focused SPP field is observed
SPP focusing SPP focusing after the compensation of radiation loss
x (m)
y (
m)
Focusing with Radiation Loss
-100 -50 0 50 100
-100
-80
-60
-40
-20
0
20
40
60
80
100-100 -50 0 50 100
-100
-80
-60
-40
-20
0
20
40
60
80
100Focuing without Radiation Loss
x (m)
y (
m)
x (m)
y (
m)
Focusing with Radiation Loss
-100 -50 0 50 100
-100
-80
-60
-40
-20
0
20
40
60
80
100
x (m)
y (
m)
Focusing with Radiation Loss
-100 -50 0 50 100
-100
-80
-60
-40
-20
0
20
40
60
80
100
Measured focal length: 83μm Designed focal length: 80μm
Fresnel diffraction of SPPFresnel diffraction of SPP
Fresnel diffractionFresnel diffraction
20 0 0 0
exp( )( , ) ( ) exp( ( ) )
2spp spp
spp T
ik x iku x y u y y y dy
i x x
20 0 0 0
exp( )0.3 ( )exp( ( ) )
2spp spp
spp O
ik x iku y y y dy
i x x
FEM Simulation:FEM Simulation:
Transmission through Si bumps
Power Transmission ~ 0.3
-50 -40 -30 -20 -10 0 10 20 30 40 500.0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1.0
Op
tica
l Sig
na
l (a
.u.)
y (m)
-50 -40 -30 -20 -10 0 10 20 30 40 500.0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1.0
Op
tica
l Sig
na
l (a
.u.)
y (m)
Calculated vs Measured Field
Diffraction theory is valid for SPP
-50 -40 -30 -20 -10 0 10 20 30 40 500.0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1.0
Opt
ical
Sig
nal (
a.u.
)
y (m)
Fresnel Diffraction CalculationFresnel Diffraction Calculation MeasurementMeasurement
Field intensity distribution at the focal planeField intensity distribution at the focal plane
Time-resolved SPP focusingTime-resolved SPP focusingSnapshots of amplitude at different timeSnapshots of amplitude at different time
Education, Outreach, and Data Dissemination
• Established new graduate courses: Nanophotonics (ECE 242A) and Optics in Space and Time (ECE 240B)
• Modified Undergraduate Photonics Laboratory in Engineering, Physics and Biochemnistry (opt. comm., CGH, and NLO)
• Graduate students weekly meetings and seminars on recent progress and other relevant topics in nanophotonics
• Involvement of undergraduate students via NSF’s REU program• Establishing education and outreach projects with the UCSD’s
Preuss School, designed for 6-12 grades student coming from disadvantaged households [e. g., Ph.D. students are serving as mentors and leaders of robotics club; RET program with the Undergraduate Photonics Laboratory in Engineering]
• Saperstein-2005 JSOE Woolley Fellow, 2006 Summer Graduate Teaching Fellow
• Numerous journal publications, conference presentations including invited conference papers
• http://emerald.ucsd.edu
L. Feng, K. Tetz, B. Slutsky, V. Lomakin, Y. Fainman, Appl. Phys. Lett. 91, 081101 (2007)
L. Feng, K. Tetz, B. Slutsky, V. Lomakin, Y. Fainman, Appl. Phys. Lett. 91, 081101 (2007)
Imaging various SPP modesa/
polarizers //to (2, 1) type modes
ASE: = 1520-1570 nm
(-X) (-X)0.90
1.03
1.41noise limited spectral measurements
2.00
Fainman Y, Tetz K, Rokitski R, Pang, Optics & Photonics News, vol.17, 24-9, 2006