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MICROWAVE ENGINEERING EKT 345

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  • MICROWAVE ENGINEERING

    EKT 345

  • CHAPTER 4: MICROWAVE

    SEMICONDUCTOR DEVICES

    Outline:

    4.1Microwave Diodes

    - Shottky Diodes, Pin Diodes, Varactor Diodes, Tunnel Diodes, Gunn Diodes, IMPATT, TRAPATT

    4.2Microwave Transistors

    - Bipolar, Unipolar FET, HEMT

    - Limitation of Transistor at High Frequencies

    4.3 Parametric Amplifier

    - Manley Rowe Relationship

  • 4.1 Microwave Diodes

    Two elements device which will do much more

    than rectify or clamp a dc voltage.

    General functions : able to switch, attenuate, mix

    frequencies, detect, amplify, oscillate and

    modulate signals in microwave and millimeter

    bands frequencies.

    Definition: two terminal electronic device that will conduct electricity much more easily in one direction than in the other.

  • Contd

    Schottky Diodes for mixing and detection

    Pin diodes for attenuation, modulation,

    switching, phase shifting and limiting.

    Varactor diodes for frequency multiplications,

    parametric amplification and tuning

    Tunnel and Gunn Diodes for oscillation

    Impact Ionization Avalanche Transit Time

    (IMPATT) and Trapped Plasma Avalanche

    Transit Time (TRAPATT) for amplification and

    oscillation

  • Contd

    a. Schottky Diodes

    Rj = resistance of metallic junctionCj = barrier capacitanceRs = bulk resistance of heavily doped Si substrate (4-6 ohm)Ls= inductance of gold whisker wire (0.4 0.9nH)Cc = Case Capacitance

  • Contd

    Metal-semiconductor barrier diodes

    Exhibits a squarelaw characteristic and have

    higher burnout rating

    Better reliability compared to point contact

    diodes

    Constructed on a thin silicon (n+ type) substrate

    by growing epitaxially on n-type active layer of

    about 2 microns thickness.

    Metal semiconductor is formed by depositing

    metal over SiO2.

  • Contd

    b. Pin Diodes

    Rj = junction resistance (variable)Cj = junction capacitance (~0.2pf)Rs = bulk semiconductor (p+ and n+) layer and contact resistance.Lp, Cp = package inductance, capacitance

  • Contd

    Consists of a high-resistivity intrinsic semiconductor layer between highly doped p+

    and n+Si layers.

    Acts as an electrically variable resistor related to i layer thickness.

    Intrinsic layer has a very large resistance in reverse bias and it decreases in forward bias.

    When mobile carriers from p and n regions are injected into the i layer, carriers take time -diode ceases to act as a rectifier at microwave frequency and appear as a linear resistance:

    variable attenuator

  • Contd

    Pin device is designed under reverse or zero

    biasing, Rj is extremely large and Cj plays the

    dominant role, where Cp, Lp, Rs are small.

    For reverse bias, high capacitance impedance

    is presented to the microwave signal.

    For forward bias, the diodes represents a very

    low resistance .

    Changing the bias, it acts as a switch

    Single switch

    Double switch use two diodes called single-pole

    double-throw (SPDT)

  • Contd

  • Contd

  • Contd

    c. Varactor Diodes

  • Contd

    Operated under reverse bias where the

    junction resistance is 10 M or more.

    Equivalent circuit reverse-bias at

    microwave frequencies : a simple of

    capacitance and resistance in series.

    Equivalent circuit of forward-bias at

    microwave frequencies more complicated

    must include the diffusion of the injected

    carriers.

  • Contd

    Due to skin effect, Rs increases with increase

    in frequency

    So, frequency used normally below 0.2fc

  • Contd

    d. Tunnel Diodes

    Rj = junction

    resistance (100 ohms)

    Cj = junction

    capacitance (pf)

    Ls = lead inductance

    (nH)

    Rs = bulk resistance

    (few ohms)

    -Rj

    Equivalent circuit of tunnel diode

  • Contd

    Heavily doped p-n junction diodes with a

    negative resistance over a portion of its I-V

    characteristic (refer page 416)

    Used as microwave amplifiers or oscillators.

    Heavy doping depletion width becomes very

    thin and overlap occurs between the

    conduction-band level (n-side) and the

    valence-band level (p-side).

  • Contd Tunnel-diode oscillator

    Consists of a tank circuit coupled with the diode by means of a capacitive divider

    When the power switched on, a surge current produces oscillationin the tank circuit

    The R-C values make the dc bias at the centre of the negative resistance characteristic of the diode

    Sustained oscillation occurs if magnitude of the negative resistance of the diode is equal or greater than the resistance of tank circuit.

    The oscillator circuit can generate microwave signals up to frequencies: 100GHz

  • Contd

  • Contd

  • Contde. Gunn Diodes

  • Contd

    Negative resistance devices which normally

    used as low-power oscillator at the microwave

    frequencies in transmitter and as local oscillator

    in receiver front ends.

    Two main principles of operation:

    Gunn Mode or Transit-Time (TT) mode

    Limited-Space Charge Accumulation (LSA) mode

    Other modes:

    Quenched domain mode

    Delayed mode

  • Contd

    TT mode

    Low efficiency of power generation

    Uncontrollable frequency by external circuit

    LSA mode

    Produce several watts of power with minimum

    efficiency 20%.

    Power output decreases with frequency:

    example:

    1 Watt at 10 GHz

    1 mW at 100 GHz

  • Contd

  • Contdf. IMPATT

    IMPact Avalanche and Transit Time

    diodes

    An efficiency of 3% CW power and 60%

    pulsed power.

    Operated from 500 MHz to 100GHz.

    Power output between 1W (CW) and over

    400W (pulsed).

    Many forms:

    n+ pip + or p + nin + Read device

    p + nn + abrupt junction

    p + in + diode

    Manufactured from Ge, Si, GaAs or InP,

    The highest efficiency, highest operating

    frequency and least noise figure but

    complicated fabrication process: GaAs

  • Contd

  • Contd

    Reverse-biased condition n+ pip +

    When reverse bias voltage exceeds the breakdown voltage VB, a maximum electric field of very high value (MV/m) appears at the n+p junction.

    The holes moving in the high field region acquire sufficient energy to excite valence electrons of the atom into the conduction band resulting in avalanche multiplication of electron hole-hole pairs

    To prevent burning diode: a constant diode current bias source is used to maintained the average current at safe limit I0.

    The diode current is contributed by the conduction electrons which move to n+

    region and associated holes which drift through i space charge region to the p+

    region, under the influence of a lower but steady electric field.

  • Contd

  • Contd

    IMPATT disadvantages:

    Since dc power is drawn due to induced electron

    current in the external circuit, IMPATT diodes

    have low efficiency.

    Tend to be noisy due primarily to the avalanche

    process and to the high level of operating

    current.

    Typical noise figure is 30dB which is worse than

    Gunn Diodes.

  • Contd

    g. TRAPATT

    TRApped Plasma Avalanche Triggered

    Transit Diode

    Suitable for low frequency (1-3GHz) applications

    with pulse output of several hundreds watts

    Efficiency 20-60%

    Manufactured from Si and have p+n n+ or n+ pp+

    configurations

    p-n junction reverse-biased beyond the

    breakdown junction current density is higher

  • Contd

    TRAPATT diode is mounted inside a coaxial resonator at position of maximum RF voltage swing.

    When avalanche occurs at the dc reverse-bias plus RF swing beyond the threshold of breakdown, a plasma of holes and electrons are generated

    The plasma density results in a high potential difference across the junction in opposition to the dc reverse bias voltage

    At this low voltage, the plasma gets trapped

    Since the external circuit current flow, the voltage rise and the trapped plasma is released producing current pulse across the drift space.

    Total transit time is the sum of the delay time in releasing the trapped plasma and the drift time.

    Since the transit time is longer due to low voltage, the operating frequency is limited below 10 GHz current pulse is associated with low voltage, the power dissipation is low and efficiency is higher

  • Contd

    TRAPATT disadvantages:

    High noise figure ~60dB limits it use as an

    amplifier

    Generates strong harmonics due to the short

    duration current pulse

  • Contd

    COMPARISON BETWEEN GUNN, IMPATT, TRAPATT AND BARITT

  • 4.2 Microwave Transistors

    Ordinary transistors are pnp or npn junction transistors :

    bipolar and unipolar FET

    High frequency operations of these devices are limited by:

    Diffusion capacitance at base-emitter junction

    Space charge capacitances at base-emitter and base-collector

    junction

    Base spreading resistance

    Bulk resistance of the base

    Microwave transistors (MT) are miniaturized design to

    reduce device and package parasitic capacitances and

    inductances and to overcome the finite transit time of

    charge carriers in the semiconductor materials.

  • Contd

    Three categories of MT:

    Low-noise transistor which is employed in first stage

    Low-level transistor which is used to drive power stage

    Power transistor which amplifies final power output.

    MT constructions:

    Hybrid Microwave Integrated Circuits (HMIC)

    The transmission lines and matching networks are

    realised by microstrip circuit elements and the discrete

    components.

    Monolithic Microwave Integrated Circuits (MMIC)

    All active devices and passive circuit elements are

    fabricated on a single semiconductor crystal

  • Contd

    a. Bipolar Transistor

    Planar in form, Si n-p-n type operating up to

    5GHz

    GaAs used for performance improvements in

    the operating frequency in high temperature

    and radiation field

    Devices Geometry:

    Inter-digitated

    Overlay

    Matrix form with wide emitter area

  • Contd

  • Contd

  • Contd

    Epitaxial n layer is formed by condensing a

    single crystal film of semiconductor material

    upon a low resistivity Si wafer of substrate

    n+.

    A p-type diffused base and n+-type diffused

    emitter are formed

    Typical value:

    emitter width is 1 micron

    base thickness is 2 microns

    emitter length is 25 microns

  • Contd

    High frequency limitations:

    At high frequencies, the reactance due to junction

    capacitances limit the gain. The values of these

    capacitance depend on the depletion layers width or

    the bias voltage and provides feedback paths. The

    feedback effect is reduced in CB mode of operation. The

    junction capacitance must be reduce as much as

    possible.

    Signal loss in the lead inductance can be minimized by

    reducing the length in packaging

    The transit time taken by the majority of charge

    carriers to cross from the emitter to collector limits the

    high frequency

  • Contdb. Unipolar Field Effect Transistor (FET)

    Manufactured from GaAs for higher frequency of operation which

    is achieved due to higher electron mobility compared to Si.

    Frequency up to 40GHz, Noise figure 3dB.

    Operates with only one type of carrier: electrons

    Earliest FET

    Junction FET (JFET)

    Metal oxide semiconductor FET (MOSFET)

    Insulated gate FET (IGFET)

    Metal semiconductor FET (MESFET) Competitor to bipolar

    Different design from bipolar

    Bipolar : 10V 12V on the collector, biased the base and attached

    emitter to ground

    Unipolar: 10V 12V on the drain, biased the gate and attached source

    to ground.

  • Contd

    MESFET Construction MESFET equivalent circuit

  • Contd

    c. High Electron M0bility Transistor (HEMT)

    Latest addition to the line up of

    solid state devices design.

    Looks similar to GaAs FET

    Single stage gain 15dB at 8 GHz,

    noise figure 0.4dB

  • 4.3 Parametric Amplifier

    Parametric amplifier Named because its operation due to the periodic variation of the devices parameter such as capacitance of varactor diode under the influence of a suitable pump signal.

    If a small input signal at a frequency fg and the ac power source operated as a pumping signal at a frequency fp are applied together to the varactor diode, linear amplification of a small signal results, due to time varying capacitance of the diode.

    Pump signals provides the power required for amplification and the power output is either at the input frequency fg or at the idler frequency fi = fp-fg

  • Contd

    Manley-Rowe Relations Derived a set of general energy relations regarding power

    flowing into and out of an ideal nonlinear reactance.

    These relations are useful in predicting whether power gain

    is possible in a parametric amplifier.

    Sometimes called Power-Conservation Relations (PCR)

  • Contd Advantages and limitations of Parametric Amplifiers

    Noise figure

    Less thermal noise due to minimum resistive elements

    Range 1-2 dB

    Frequency

    Upper frequency limit (40-200GHz), set by difficulty of obtaining source power at the pump frequency and by the frequency at which the varactor capacitance can be pumped.

    Lower frequency is set by the cut-off frequency of the microwave components used in the circuit

    Bandwidth

    Small due to the presence of tuned circuit

    Gain

    Limited to (20-80dB) by the stabilities of the pump source and the time varying capacitance