matrix 105r plasma ash/descum - allwin21 · asher and descum is an automated tool designed as a...
TRANSCRIPT
Matrix 105R Plasma Ash/Descum
220 Cochrane Circle Morgan Hill, CA95037
U.S.A. Tel.:+1-408-778-7788
Fax.:+1-408-904-7168 www.allwin21.com
1 © 2015 Allwin21 Corp. All Rights Reserved. All specification and information here are subject to change without notice and can not be used for purchase and facility plan.
Production Proven for
Compound Semiconductor materials
Matrix 105R
4
Introduction
The Matrix 105R single-wafer photoresist
asher and descum is an automated tool
designed as a flexible 13.56MHz RF Parallel
Plate plasma photoresist removal and
descum system for compound material
wafer fabrication. Matrix 105R is in direct
response to manufacturer’s concerns for
wafer uniformity, uptime, reliability and
production-proven technology.
Matrix 105R
5
Sales History and Main Customers
Start Year: 2009
Total Sales: 75 Units
Main USA Customers
Skyworks
Anritsu
TriQuint
Stanford University
UC Berkeley
Main Overseas customers
Win Semiconductor
TSMC
MEMSIC Semiconductor
Wavetek Taiwan
National Research Council Canada
Dynax Semiconductor
OMMIC France
3SPT Technologies France
Matrix 105R
6
Applications
• GaAs, InP, GaN, SiC wafer Strip (Mainly)
• GaAs, InP, GaN, SiC wafer Descum (Mainly)
• Thin Film Head Resist Cleaning
• Opto-Electronic Devices Cleaning
• MEMS (Micro Systems Technology)
Photoresist Stripping
• High dose implant (As+, B+, P+)
• Rework
• Post-polysilicon etch
• Post-metal etch
• Post-oxide etch
Controlled Resist Removal
• Post-develop descum (pre-etch)
• Dry/wet process capability
• Uniformity capability (<5% 1σ)
Matrix 105R
7
Main Modules and Assemblies
Chamber PCBs RF and Eurotherm
Integrated Robot
Up to 3 MFCs RF Match PCBs RF Match Network
Center Station Fixed Cassette Station
Matrix 105R
8
Key Features Production-proven plasma Asher/Descum system Up to 3%-5% Uniformity. Frontside and backside isotropic removal. Element heating for up to 250C. 50mm-150mm wafer capability. Up to 6.25” wafer. 4 wafer sizes capability without hardware change if necessary. Integrated solid robotic wafer handling, Single wafer process Fixed cassette station and wafer center aligner. Can handle 50um thickness wafer PC controller with Advanced Allwin21 Software Package Endpoint detection with Allwin21 SLOPE technology, Optional Up to 3 gas lines with MFC’s MKS 13.56 MHz RF Generator with air cooling, 300W, 600W option. Pressure control with Throttle Valve Touch screen monitor EMO, Interlocks and Watchdog function GEM/SECS II, Optional Small Footprint : 27”W x 40”D x 59”H (280LBs) Made in U.S.A.
Matrix 105R
9
Chuck and Reaction Chamber
4-6 .125” Chuck 2-4” Chuck
Bellows for Pin Up/Down Element Heating
Matrix 105R
10
Configuration
Item Description Remark
1 Main Frame With Circuit Breakers, Solenoid Valves etc.
2 Pentium Class PC with AW SW □ With GEM SECS II ; □W/O GEM SECS II; □Others
3 15-inch Touch Screen 17-inch LCD Monitor is Available if necessary
4 Keyboard, Mouse, USB and Cables USB with SW Backup
5 Chuck /w Heat, Pump Ring ,Lift Pins □2-4”; □2-6”; □4-6”; □6.125”; □6.25”
6 Center Aligner and Cassette Station □One Dimension; □Two Dimensions □Others
7 Anodized Reactor with Door
8 Chamber Base plate with water sensor
9 Ceramic Rings Baste Plate and Reactor; Base Plate and Chuck
10 Up Electrode and Low Electrode
11 Quartz Chamber and Baffle
12 EOP Sensor Optional
Matrix 105R
11
Configuration (Con.)
Item Description Remark
13 Main Control and Distributor PCB
14 Integrated Robust Solid Robot □H1-7X10.5; □Others
15 RF Match Network with PCBs
16 13.56MHz RF Generator with cable □MKS Elite 600HD-01; □ENI OEM-6(Used, Water Cool)
17 MFC /w In-line Filter and Solenoid Valve □1 ; □2; □3 MFC(Common:5 SLM O2 /500 SCCM N2.)
18 AC/DC Box with Temp. Controller □Eurotherm 808(V); □Eurotherm 847(H); □Others
19 MKS Manometer with Pneumatic Valve
20 Throttle Valve
21 Main Vacuum Valve
22 Front EMO, Interlocks System interlock, RF Interlock, Overheat Interlock
23 Lamp Tower Alarm and Alarm Buzzer
24 Vacuum Pump Optional (□With Blower; □Without Blower)
25 Chiller for Chamber Base Plate Optional
Matrix 105R
12
Specifications
Item Description
Wafer Size Up to 6.25 inch Capability
Temperature 60-250 ºC (±2 ºC), Typical processes: 80C, 110C, 150C
Gas Lines Up to three gas lines with MFCs. Popular MFC Range: 5 SLM O2 and 500 SCCM N2.
Rate 0.5-1.5 um/min at 200 to 250 ºC, bulk strip; 600 A/min at 100 ºC, Descum
Uniformity In Wafer <±8% (Max-Min) Asher; <±5% (Max-Min) Descum or better , 6 inch
Runs <±5% (Max-Min) Asher, <±3% (Max-Min) Descum or better , 6 inch
Particulate <0.05 /cm2 (0.03um or greater)
Damage CV:<0.1V from control; Mobile Ion:<1-2 E10 ; Vt :0% total shift on 98% of points tested no shift >5%
Process Range
(For bulk strip application) Pressure : 1.0 to 6.5 torr ; Power: 250-475W ;Flow: 1.0-2.5 liters O2
MTBF/MTTA/MTTR 450 Hours/100 Hours/3.5 Hours or Better. 95% uptime
Selectivity >1000:1
Others Contact Allwin21 sales for other applications and specifications
Key Features of Matrix 105R
13
Key Feature Benefit
Production-proven “downstream” Chamber structure
• Low RF damage • Rapid start-up, release for production • Not a “Guinea Pig”
Key Features of Matrix 105R
14
Key Feature Benefit
Pentium Class PC Controller with 15” touch screen.
Advanced control technologies. More useful functions. Better Performance (Uniformity, Repeatability and Stability)
Key Features of AW-105R
15
Key Feature Benefit
Integrated Solid Robotic Wafer Transfer Much Better Reliability Low Particulates Extremely Low Wafer Breakage III-V material substrate handling 50 um thickness substrate handling Integration of Robot and Controller Increase MTBF, Low MTTR
Key Features of Matrix 105R
16
Features Benefit
New air cooled RF Generator No Chiller, low cost, reliable
Multiple wafer sizes for one equipment Low cost, flexible, easy operation
Lamp Tower function Safety, easy operation
Fixed Cassette Stations More Reliable
More gas lines with MFC if necessary Low cost, flexible
Wafer center aligner function III-V wafers. Good repeatability
CE Mark if necessary For all fabs/labs
Key Features of Matrix 105R
17
Key Feature Benefit
Software has been using on different models of thousands of equipment for customers from 40 countries all over the world for more than 20 years.
Reliability Low cost Low risk Not a “Guinea Pig”
Advanced Controller of Matrix 105R
18
Benefit
Easy recipe edit and validation
Advanced Controller of Matrix 105R
19
Benefit
Fast, easier software calibration leading to enhanced process results.
Pressure Calibration
RF Calibration
Gases Calibration
Advanced Controller of Matrix 105R
20
Benefit
Storage of multiple recipes, process, and calibration files so that process and calibration results can be maintained and compared over time.
Storage of error data, log data so that all the activities on the equipment can be traceable.
Advanced Controller of Matrix 105R
21
Benefit
Real time close-loop process control, monitoring, data collection, acquisition, display and analysis
Precise parameters profiles tailored to suit specific process requirements.
Advanced Controller of Matrix 105R
22
Benefit
Easy Software Robot Teach
Advanced Controller of Matrix 105R
23
Benefit
More I/O, A/D, D/A “Exposure” for easier troubleshooting.
Key Features of Allwin21 Main Products
24
Benefit
WTM for easier equipment manual / automatic test
Key Features of Allwin21 Main Products
25
Benefit
Diagnostic Screen for easier monitoring the system at any time.
Advanced Controller of Matrix 105R
26
Benefit
Different Users with password for system safety and control.
Advanced Controller of Matrix 105R
27
Benefit
Very reliable and stable EOP function. Wafer to Wafer Repeatability, No need many recipes
Advanced Controller of Matrix 105R
28
Benefit
Communication between the equipment and a host controller in a GEM/SEC II enviroment.
Video of Matrix 105R
31 Click the above photo to watch the video at Youtube
220 Cochrane Circle
Morgan Hill, CA95037,U.S.A.
Tel.:+1-408-778-7788
Fax.:+1-408-904-7168
www.allwin21.com
© 2015 Allwin21 Corp. All Rights Reserved. All specification and information here are subject to change without notice and can not be used for purchase and facility plan. 32
Contact Us