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Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Automated alignment procedure for s3tching with a focused ion beam
Marie Verbist
17 June 2010
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nano
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nano photonics
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nano photonics very very small photonic chips
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nano photonics very very small photonic chips fabricated with nanometer precision
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
waveguides by focused ion beam s3tching
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
confining and guiding light
photonic components
fabrica3on
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Light can be confined by refrac3ve index contrast
light
low n
high n
low n
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Light can be confined by refrac3ve index contrast
layer sandwich of materials with different refrac3ve index (n)
light
low n
high n
low n
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Light can be confined by refrac3ve index contrast
layer sandwich of materials with different refrac3ve index (n)
total internal reflec3on light stays in the core with higher n
light
low n
high n
low n
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Light can be confined by refrac3ve index contrast
layer sandwich of materials with different refrac3ve index (n)
total internal reflec3on light stays in the core with higher n
higher index contrast smaller core and sharper bends
light
low n
high n
low n
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Waveguides are the basis of many nanophotonic components
cross‐sec3on air (n=1)
Si (n=3.4)
SiO2 (n=1.4)
top view
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Waveguides are the basis of many nanophotonic components
cross‐sec3on air (n=1)
Si (n=3.4)
SiO2 (n=1.4)
top view
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
CMOS fabrica.on tools ideal for industry
?? ideal for research
mass fabrica3on prototype fabrica3on
long development cycle short development cycle
not all materials all materials
CMOS technology is not ideal for prototyping
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
CMOS fabrica.on tools ideal for industry
?? ideal for research
mass fabrica3on prototype fabrica3on
long development cycle short development cycle
not all materials all materials
CMOS technology is not ideal for prototyping
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
CMOS fabrica.on tools ideal for industry
?? ideal for research
mass fabrica3on prototype fabrica3on
long development cycle short development cycle
not all materials all materials
CMOS technology is not ideal for prototyping
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
CMOS fabrica.on tools ideal for industry
?? ideal for research
mass fabrica3on prototype fabrica3on
long development cycle short development cycle
not all materials all materials
CMOS technology is not ideal for prototyping
Focused Ion Beam tool
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
working principle
need for s3tching
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
An ion beam is focused scanned blanked
A focused ion beam tool enables milling and imaging
target
Ga+ beam
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
An ion beam is focused scanned blanked
Impact causes atoms to be spuTered away
A focused ion beam tool enables milling and imaging
target
Ga+ beam
spuTered atoms
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
An ion beam is focused scanned blanked
Impact causes atoms to be spuTered away
This allows for milling holes
A focused ion beam tool enables milling and imaging
target
Ga+ beam
spuTered atoms
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
An ion beam is focused scanned blanked
Impact causes atoms to be spuTered away electrons to be released
This allows for milling holes
A focused ion beam tool enables milling and imaging
target
Ga+ beam
secondary electrons
spuTered atoms
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
An ion beam is focused scanned blanked
Impact causes atoms to be spuTered away electrons to be released
This allows for milling holes imaging (through electron detec3on)
A focused ion beam tool enables milling and imaging
target
Ga+ beam
secondary electrons
spuTered atoms
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Large structures need to be s3tched
same number of pixels for any field width
field width
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Large structures need to be s3tched
same number of pixels for any field width for a certain required scan resolu3on, the FW is limited
large FW small FW
low resolu3on high resolu3on
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Large structures need to be s3tched
same number of pixels for any field width for a certain required scan resolu3on, the FW is limited
structures larger than the field width have to be s3tched i.e. etch part of the structure, move stage, etch next part, …
large FW small FW
low resolu3on high resolu3on
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
adjus3ng the beam rota3on
adjus3ng the beam shi[
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 1 : misalignment of beam and stage axes
Beam axes and stage axes are slightly misaligned
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 1 : misalignment of beam and stage axes
Beam axes and stage axes are slightly misaligned
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 1 : misalignment of beam and stage axes
Beam axes and stage axes are slightly misaligned
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 1 : misalignment of beam and stage axes
Beam axes and stage axes are slightly misaligned
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
mill & image
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
mill & image move stage
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
mill & image move stage
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
image & match
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
mill & image move stage
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
image & match
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 1 : adjust beam rota3on
mill & image move stage
Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square
image & match
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 2 : inaccuracy of stage moves
Stage moves are too inaccurate causing overlap or space between the several milled parts
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 2 : inaccuracy of stage moves
Stage moves are too inaccurate causing overlap or space between the several milled parts
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 2 : inaccuracy of stage moves
Stage moves are too inaccurate causing overlap or space between the several milled parts
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Problem 2 : inaccuracy of stage moves
Stage moves are too inaccurate causing overlap or space between the several milled parts
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Solu3on 2 : adjust beam shi[
mill & image move & match mill & image
Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers
The waveguide itself is never imaged to avoid damage/losses
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
nanophotonics
focused ion beam
alignment procedure
Automated alignment procedure for s3tching with a focused ion beam
waveguides by focused ion beam s3tching
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Long waveguides could be s3tched
£
80 μm
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Long waveguides could be s3tched
£
80 μm
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Structures are unlimited in size
80 μm
1.5 mm
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Structures are unlimited in size except by the size of the sample
80 μm
1.5 mm
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
Photonics Research Group www.photonics.intec.ugent.be
nanophotonics
Marie’s slidesWatch this presentation on www.scitable.com
© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)
as large as we want nanophotonics
Photonics Research Group www.photonics.intec.ugent.be