lecture 4 - university of california,...
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EE141
Design RulesCMOS Inverter
MOS Transistor Model
EE141- Spring 2003Lecture 4
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Today’s lecture
Design RulesThe CMOS inverter at a glanceAn MOS transistor model for manual analysis
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Important!
Labs start next weekYou must show up in one of the lab sessions next weekIf you don’t show up you will be dropped from the class» Unless you let me know that you still want to be in
the classHomework 2 will be posted later today. Due next Thursday, February 6.
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Jan M. Rabaey
Design Rules
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3D Perspective
Polysilicon Aluminum
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Design Rules
Interface between designer and process engineerGuidelines for constructing process masksUnit dimension: Minimum line width» scalable design rules: lambda parameter» absolute dimensions (micron rules)
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CMOS Process Layers
Layer
Polysilicon
Metal1
Metal2
Contact To Poly
Contact To Diffusion
Via
Well (p,n)
Active Area (n+,p+)
Color Representation
Yellow
Green
RedBlue
MagentaBlack
BlackBlack
Select (p+,n+) Green
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Layers in 0.25 µm CMOS process
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Intra-Layer Design Rules
Metal2 4
3
10
90
Well
Active3
3
Polysilicon2
2
Different PotentialSame Potential
Metal1 3
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Contactor Via
Select2
or6
2Hole
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Transistor Layout
1
2
5
3
Tran
sist
or
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Vias and Contacts
1
2
1
Via
Metal toPoly ContactMetal to
Active Contact
1
2
5
4
3 2
2
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Select Layer
1
3 3
2
2
2
WellSubstrate
Select3
5
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CMOS Inverter Layout
A A’
np-substrate Field
Oxidep+n+
In
Out
GND VDD
(a) Layout
(b) Cross-Section along A-A’
A A’
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Layout Editor
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Design Rule Checker
poly_not_fet to all_diff minimum spacing = 0.14 um.
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Sticks Diagram
1
3
In Out
VDD
GND
Stick diagram of inverter
• Dimensionless layout entities• Only topology is important• Final layout generated by “compaction” program
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Jan M. Rabaey
CMOS InverterMOS Transistor
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What is a Transistor?
VGS ≥ VT
RonS D
A Switch!
|VGS|
A MOS Transistor
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NMOS and PMOS
V GS<0
PMOS Transistor
V GS>0
NMOS Transistor
S D
G
S D
G
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The CMOS Inverter: A First Glance
Vin Vout
CL
VDD
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CMOS Inverter
Polysilicon
In Out
VDD
GND
PMOS 2λ
Metal 1
NMOS
OutIn
VDD
PMOS
NMOS
Contacts
N Well
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Two Inverters
Connect in Metal
Share power and ground
Abut cells
VDD
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Switch Model of CMOS Transistor
Ron
|VGS| < |VT| |VGS| > |VT|
|VGS|
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CMOS InverterFirst-Order DC Analysis
VOL = 0VOH = VDD
VM = f(Rn, Rp)
VDD VDD
Vin 5 VDD Vin 5 0
VoutVout
Rn
Rp
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CMOS Inverter: Transient Response
tpHL = f(Ron.CL)= 0.69 RonCL
V outVout
R n
R p
V DDV DD
V in 5 V DDV in 5 0
(a) Low-to-high (b) High-to-low
CLCL
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CMOS Properties
Full rail-to-rail swingSymmetrical VTCPropagation delay function of load capacitance and resistance of transistorsNo static power dissipationDirect path current during switching
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The MOS Transistor
Polysilicon Aluminum
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MOS Transistors -Types and Symbols
D
S
G
D
S
G
G
S
D D
S
G
NMOS Enhancement NMOS
PMOS
Depletion
Enhancement
B
NMOS withBulk Contact
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Threshold Voltage: Concept
n+
p-substrate
DSG
B
VGS
+
–
Depletionregion
n-channel
n+
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The Threshold Voltage
Threshold
Fermi potential
2φF is approximately - 0.6V for p-type substratesγ – the body factorVT0 is approximately 0.45V for our process
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The Body Effect
-2.5 -2 -1.5 -1 -0.5 00.4
0.45
0.5
0.55
0.6
0.65
0.7
0.75
0.8
0.85
0.9
VBS
(V)
VT (V
)
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The Drain CurrentCharge in the channel is controlled by the gate voltage:
Drain current is proportional to charge and velocity:
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The Drain Current
Combining velocity and charge:
Integrating over the channel:
Transconductance:
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Transistor in Linear
n+n+
p-substrate
D
SG
B
VGS
xL
V(x) +–
VDS
ID
MOS transistor and its bias conditions
Linear (Resistive) mode
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Transistor in Saturation
n+n+
S
G
VGS
D
VDS > VGS - VT
VGS - VT+-
Pinch-off
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Saturation
For VGD < VT, the drain current saturates
Including channel-length modulation
( )22 TGSn
D VVL
WkI −′
=
( ) ( )DSTGSn
D VVVL
WkI λ+−′
= 12
2
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Modes of Operation
Cutoff:
VGS < VT ID = 0
Resistive:
VT < VGS ; VGS − VT > VDS
( )22 TGSn
D VVL
WkI −′
=
Saturation:
VT < VGS ; VGS − VT < VDS
( )⎥⎥⎦
⎤
⎢⎢⎣
⎡−−
′=
22
2DS
DSTGSn
DVVVV
LWkI
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Current-Voltage RelationsA Good Ol’ Transistor
QuadraticRelationship
0 0.5 1 1.5 2 2.50
1
2
3
4
5
6x 10
-4
VDS (V)
I D(A
)
VGS= 2.5 V
VGS= 2.0 V
VGS= 1.5 V
VGS= 1.0 V
Resistive Saturation
VDS = VGS - VT
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A model for manual analysis
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Current-Voltage RelationsThe Deep-Submicron Era
LinearRelationship
-4
VDS (V)0 0.5 1 1.5 2 2.5
0
0.5
1
1.5
2
2.5x 10
I D(A
)
VGS= 2.5 V
VGS= 2.0 V
VGS= 1.5 V
VGS= 1.0 V
Early Saturation
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Velocity Saturation
ξ (V/µm)ξc = 1.5
υn
(m/s
)υsat = 105
Constant mobility (slope = µ)
Constant velocity
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Velocity Saturation
IDLong-channel device
Short-channel device
VDSVDSAT VGS - VT
VGS = VDD
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ID versus VGS
0 0.5 1 1.5 2 2.50
1
2
3
4
5
6x 10
-4
VGS(V)
I D(A
)
0 0.5 1 1.5 2 2.50
0.5
1
1.5
2
2.5x 10
-4
VGS(V)I D
(A)
quadratic
quadratic
linear
Long Channel Short Channel
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ID versus VDS
-4
VDS(V)0 0.5 1 1.5 2 2.50
0.5
1
1.5
2
2.5x 10
I D(A
)
VGS= 2.5 V
VGS= 2.0 V
VGS= 1.5 V
VGS= 1.0 V
0 0.5 1 1.5 2 2.50
1
2
3
4
5
6x 10-4
VDS(V)
I D(A
)
VGS= 2.5 V
VGS= 2.0 V
VGS= 1.5 V
VGS= 1.0 V
Resistive Saturation
VDS = VGS - VT
Long Channel Short Channel
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Including Velocity Saturation
Approximate velocity:
And integrate current again:
In deep submicron, there are four regions of operation:(1) cutoff, (2) resistive, (3) saturation and (4) velocity saturation
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Regions of Operation
Long Channel Short Channel
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An Unified Modelfor Manual Analysis
S D
G
B
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Regions of Operation
0 0.5 1 1.5 2 2.50
0.5
1
1.5
2
2.5x 10
-4
DSV (V)
I D(A
)
VelocitySaturatedLinear
Saturated
VDSAT=VGT
VDS=VDSAT
VDS=VGT
0 0.5 1 1.5 2 2.50
0.5
1
1.5
2
2.5x 10
-4
DSV (V)DSV (V)
I D(A
)
VelocitySaturatedLinear
Saturated
VDSAT=VGT
VDS=VDSAT
VDS=VGT
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A PMOS Transistor
-2.5 -2 -1.5 -1 -0.5 0-1
-0.8
-0.6
-0.4
-0.2
0x 10
-4
VDS (V)
I D(A
)
Assume all variablesnegative!
VGS = -1.0V
VGS = -1.5V
VGS = -2.0V
VGS = -2.5V
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Transistor Model for Manual Analysis
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The Transistor as a Switch
VGS ≥ VT
RonS D
ID
VDS
VGS = VD D
VDD/2 VDD
R0
Rmid
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The Transistor as a Switch
0.5 1 1.5 2 2.50
1
2
3
4
5
6
7x 10
5
VDD
(V)
Req
(Ohm
)
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The Transistor as a Switch
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Future Perspectives
25 nm MOS transistor (Folded Channel)