lase - spielasers and applications in science and engineering. one of the strengths of this ......

CONNECTING MINDS. ADVANCING LIGHT.

Call for Papers Submit Abstracts by 3 August 2015 www.spie.org/lase16call

The Moscone Center San Francisco, California, USA

Conferences + Courses 13–18 February 2016

Photonics West Exhibition16–18 February 2016

BIOS EXPO 13–14 February 2016 C

LASE•LASE IS THE LASER TECHNOLOGY AND INDUSTRIAL LASER CONFERENCE, PART OF PHOTONICS WEST

LASE Call for Papers

C.Call for Papers.

DATESConferences + Courses: 13–18 February 2016

LOCATIONThe Moscone Center San Francisco, California, USA

Present your work at LASELASE conferences address the latest results in laser sources, materials, and engineering for industrial applications.

TECHNOLOGIES- Laser Source Engineering

- Nonlinear Optics

- Semiconductor Lasers and LEDs

- Laser Micro-/Nanoengineering

- Laser Applications

- Green Photonics

- 3D Printing

+1 360 676 3290 • [email protected] • twitter (#PhotonicsWest) 1

2015 SYMPOSIUM CHAIRS:

2015 SYMPOSIUM CO-CHAIRS:

SPIE LASE 2016 conferences will address advances in basic laser device research and in laser materials, device and system engineering for various applications ranging from emerging nanotechnologies, microelectronic and photonic manufacturing, and free-space communications, to use on the industrial manufacturing floor.

These conferences continue a 26-year tradition of presenting the latest results in Lasers and Applications in Science and Engineering. One of the strengths of this symposium is its ability to bring together people engaged in the full spectrum of laser research and development, from basic research to product manufacturing to system devices and components. Your experience will be enhanced by a plenary session and other networking opportunities, technical courses for professional development, and the co-location with the SPIE Photonics West and BiOS Expo.

We invite all researchers, scientists, engineers, and applications and product developers to join their colleagues and share results related to the conference topics described here.

Present your research at SPIE LASE 2016, Part of Photonics West.

Guido HennigDaetwyler Graphics AG (Switzerland)

Yongfeng LuUniv. of Nebraska-Lincoln (USA)

Reinhart PopraweFraunhofer-Institut für Lasertechnik (Germany)

Koji SugiokaRIKEN (Japan)

Plan to Participate.

EXECUTIVE ORGANIZING COMMITTEECraig B. Arnold, Princeton Univ. (USA)Lutz Aschke, IVAM Microtechnology Network

(Germany)John Ballato, Clemson Univ. (USA)Don M. Boroson, MIT Lincoln Lab. (USA)W. Andrew Clarkson, Univ. of Southampton

(United Kingdom)Steven J. Davis, Physical Sciences Inc. (USA)Friedhelm Dorsch, TRUMPF Laser- und

Systemtechnik GmbH (Germany)Jan J. Dubowski, Univ. de Sherbrooke (Canada)John M. Dudley, FEMTO-ST, Univ. de Franche -

Comté, CNRS (France)David B. Geohegan, Oak Ridge National Lab.

(USA)Alexei L. Glebov, OptiGrate Corp. (USA)Costas P. Grigoropoulos, Univ. of California,

Berkeley (USA)Bo Gu, Bos Photonics (USA)Michael C. Heaven, Emory Univ. (USA)Alexander Heisterkamp, Leibniz Univ. Hannover

(Germany)Henry Helvajian, The Aerospace Corp. (USA)Hamid Hemmati, Facebook Inc. (USA)Peter R. Herman, Univ. of Toronto (Canada)Vladimir S. Ilchenko, OEwaves, Inc. (USA)Bahram Jalali, Univ. of California, Los Angeles

(USA)Andrei V. Kabashin, Aix-Marseille Univ. (France)Stefan Kaierle, Laser Zentrum Hannover e.V.

(Germany)Udo Klotzbach, Fraunhofer IWS Dresden

(Germany)Alexis V. Kudryashov, Moscow State Open Univ.

(Russian Federation)Paul O. Leisher, Rose-Hulman Institute of

Technology (USA)

Tetsuya Makimura, Univ. of Tsukuba (Japan)Michel Meunier, Ecole Polytechnique de Montréal

(Canada)Beat Neuenschwander, Berner Fachhochschule

Technik und Informatik (Switzerland)Stefan Nolte, Friedrich-Schiller-Univ. Jena

(Germany)Alan H. Paxton, Air Force Research Lab. (USA)Alberto Piqué, U.S. Naval Research Lab. (USA)Gregory J. Quarles, Optoelectronics Management

Network (USA)Craig Robin, Lockheed Martin Aculight (USA)Stephan Roth, BLZ Bayerisches Laserzentrum

GmbH (Germany)Kenneth L. Schepler, CREOL, The College of Optics

and Photonics, Univ. of Central Florida (USA)J. Thomas Schriempf, Naval Sea Systems

Command (USA)Ramesh K. Shori, SPAWAR Systems Ctr. (USA)Daniel R. Solli, Univ. of California, Los Angeles

(USA) and Georg-August-Univ. Göttingen (Germany)

Klaus P. Streubel, OSRAM AG (Germany)Sergei K. Turitsyn, Aston Univ. (United Kingdom)Konstantin L. Vodopyanov, CREOL, The College

of Optics and Photonics, Univ. of Central Florida (USA)

Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

Keith G. Wilcox, Univ. of Dundee (United Kingdom)Mark S. Zediker, Nuburu Inc. (USA)

LASE IS THE LASER TECHNOLOGY AND APPLICATIONS CONFERENCE

Proceedings

2 SPIE PHOTONICS WEST 2016 • www.spie.org/lase16call

CALL FOR PAPERS

Contents.LASER SOURCE ENGINEERINGProgram Chair: Gregory J. Quarles, Optoelectronics Management Network (USA)

LA101 Solid State Lasers XXV: Technology and Devices (Clarkson, Shori) . . . . . . . . . . 4

LA102 Laser Resonators, Microresonators, and Beam Control XVIII (Kudryashov, Paxton, Ilchenko, Aschke) . . . . . . . . . . . . . 5

LA103 Fiber Lasers XIII: Technology, Systems, and Applications (Ballato, Robin) . . . . . . 6

LA104 High Energy/Average Power Lasers and Intense Beam Applications IX (Davis, Heaven, Schriempf) . . . . . . . . . . . . .7

LA105 Components and Packaging for Laser Systems II (Glebov, Leisher) . . . . . . . . . . . 8

NONLINEAR OPTICSLA106 Nonlinear Frequency Generation

and Conversion: Materials, Devices, and Applications XV (Vodopyanov, Schepler) . . . . . . . . . . . . . . . 9

LA107 Real-time Measurements, Rogue Events, NEW and Emerging Applications (Jalali,

Turitsyn, Solli, Dudley) . . . . . . . . . . . . . . . .10

OE104 Organic Photonic Materials and Devices XVIII (Tabor, Kajzar, Kaino, Koike) . . . . . 11

OE105 Ultrafast Phenomena and Nanophotonics XX (Betz, Elezzabi) . . . . . . . . . . . . . . . . . . . . 12

SEMICONDUCTOR LASERS AND LEDSProgram Chair: Klaus P. Streubel, OSRAM AG (Germany)

LA108 High-Power Diode Laser Technology and Applications XIV (Zediker) . . . . . . . . . 13

LA109 Vertical External Cavity Surface Emitting Lasers (VECSELs) VI (Wilcox) . . . . . . . . . . 14

LA106 Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications XV (Vodopyanov, Schepler) . . . . . . . . . . . . . . . 9

OE101 Physics and Simulation of Optoelectronic Devices XXIV (Witzigmann, Osiński, Arakawa) . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15

OE107 Gallium Nitride Materials and Devices XI (Chyi, Fujioka, Morkoç) . . . . . . . . . . . . . . . . 16

OE125 Vertical-Cavity Surface-Emitting Lasers XX (Choquette, Guenter) . . . . . . . . 17

OE126 Novel In-Plane Semiconductor Lasers XV (Belyanin, Smowton) . . . . . . . . 18

OE127 Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XX (Jeon, Tu, Krames, Strassburg) . . . . . . 19

LASER MICRO-/NANOENGINEERINGProgram Chairs: Henry Helvajian, The Aerospace Corp. (USA) and Alberto Piqué, U.S. Naval Research Lab. (USA)

LA110 Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXI (Neuenschwander, Roth, Grigoropoulos, Makimura) . . . . . . 20

LA111 Laser-based Micro- and Nanoprocessing X (Klotzbach, Washio, Arnold) . . . . . . . . . . . . . . . . . . . . . 22

LA112 Synthesis and Photonics of Nanoscale Materials XIII (Kabashin, Geohegan, Dubowski) . . . . . . . . . . . . . . . . . . . . . . . . . . 23

OE118 Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX (von Freymann, Schoenfeld, Rumpf) . . 24

LASER APPLICATIONSProgram Chair: Bo Gu, Bos Photonics (USA)

LA113 Laser 3D Manufacturing III (Helvajian, Piqué, Gu) . . . . . . . . . . . . . . . 26

LA114 Free-Space Laser Communication and Atmospheric Propagation XXVIII (Hemmati, Boroson) . . . . . . . . . . . . . . . . . 27

LA115 Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVI (Heisterkamp, Herman, Meunier, Nolte) . . . . . . . . . . . . . 28

LA116 High-Power Laser Materials Processing: Lasers, Beam Delivery, Diagnostics, and Applications V (Dorsch, Kaierle) . . . . . . . 30

LA110 Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXI (Neuenschwander, Roth, Grigoropoulos, Makimura) . . . . . . 20

LA111 Laser-based Micro- and Nanoprocessing X (Klotzbach, Washio, Arnold) . . . . . . . . . . . . . . . . . . . . . 22

OE123 Complex Light and Optical Forces X (Glückstad, Andrews, Galvez) . . . . . . . . . . 31

OE124 Optical and Electronic Cooling of Solids IX (Epstein, Seletskiy, Sheik-Bahae) . . . . . . . . . . . . . . . . . . . . . . . . 32

General Information . . . . . . . . . . . . . . . . . . . . . . . . . . 33

Photonics West Technology Tracks (TRANSLATIONAL RESEARCH, GREEN PHOTONICS, AND 3D PRINTING) . . . . . . . 34

Submission of Abstracts . . . . . . . . . . . . . . . . . . . . . . 35

SPIE Photonics West Exhibition . . . . . . . . . . . . . . . . 36

SUBMIT YOUR ABSTRACT TODAY!www.spie.org/lase16call



LASER SOURCE ENGINEERING

Solid State Lasers XXV: Technology and Devices (LA101)

Conference Chairs: W. Andrew Clarkson, Univ. of Southampton (United Kingdom); Ramesh K. Shori, SPAWAR Systems Ctr. (USA)

Program Committee: Patrick A. Berry, Air Force Research Lab. (USA); Marc Eichhorn, Institut Franco-Allemand de Recherches de Saint-Louis (France); Dennis G. Harris, MIT Lincoln Lab. (USA); Norman Hodgson, Coherent, Inc. (USA); Helena Jelínková, Czech Technical Univ. in Prague (Czech Republic); Christian Kränkel, Univ. Hamburg (Germany); Jacob I. Mackenzie, Univ. of Southampton (United Kingdom); Markus Pollnau, KTH Royal Institute of Technology (Sweden); Narasimha S. Prasad, NASA Langley Research Ctr. (USA); Bojan Resan, JDSU Ultrafast Lasers AG (Switzerland); Deyuan Shen, Fudan Univ. (China); Matteo Vannini, Istituto Nazionale di Ottica, CNR (Italy)

The primary purpose of this conference is to highlight the development of new laser sources, advanced technologies, components, and laser system designs that can benefit the development, commercialization, and fielding of new laser platforms based on solid state media and associated frequency conversion techniques. As the field matures, this conference provides a forum for the discussion of challenges and advances in materials research, applied science, and design innovations that are fundamental to the operation and applications of solid state lasers. De-velopments in the IR, visible, and UV will be present-ed, with emphasis on new materials, components, fabrication techniques, and design alternatives that can enhance laser performance, reduce foot-print and/or increase device efficiency, lifetime, and reli-ability while reducing life-cycle costs. Descriptions of advances necessary to better meet the needs of the many industrial, biomedical, life sciences, commu-nications, lidar, sensing, space and military systems, and applications in which solid state lasers play a significant role are especially solicited.

Key topics include diode-pumped lasers, novel gain materials and gain geometries, ceramic materials, alternative power scaling and resonator design approaches, hybrid fiber/solid state lasers, seed lasers for solid state/fiber amplifiers, and recent developments in tuning, Q-switching, ultrafast pulse generation, and frequency conversion technologies. Papers describing new modeling tools, measurement techniques, and system miniaturization efforts are also welcome.

Several sessions in the area of lasers utilizing thin disk gain media are planned. Contributions on solid state disk lasers, disk laser gain materials including ceramics, and applications of disk lasers are espe-cially solicited.

Papers are again solicited for a series of critical tech-nologies sessions on ‘Challenges and Issues in Field, Flight and Space Qualifying Laser Components & Sys-tems’ addressing the needs of ruggedizing airborne and space qualifiable platforms for communications, lidar, and sensing applications.

Technical areas include:• high-power solid state lasers and laser systems• visible and UV solid state lasers• eye-safe, mid- and far-IR solid state lasers• disk lasers

• slab and rectangular waveguide lasers• single crystal (coilable & cladded) fiber lasers• seed lasers for solid state and fiber amplifiers• Q-switching and mode locking media and

techniques• new gain materials and composites• novel resonator and pumping designs• resonantly pumped lasers• single-frequency and narrow line lasers• lasers using ceramic gain media• laser modeling, testing, and characterization

methods• high-power beam delivery and characterization• techniques for improving laser system reliability

and efficiency• compact laser devices and miniaturization

efforts• hybrid fiber/bulk laser systems• intra-cavity and extra-cavity frequency

converted lasers• solid state lasers in applications including:• medical, life sciences, and biophotonics• industrial, microelectronic, imaging, and display• lidar, atmospheric, aerospace, and military

systems.

SPECIAL SESSION CELEBRATING 25TH ANNIVERSARY OF SOLID STATE LASER ENGINEERINGLA101 will have a half-day session with invited talks representing the historical perspective, key milestone achievements, status of (bulk) solid state lasers.


CALL FOR PAPERS

(LA102) (continued next page)

Laser Resonators, Microresonators, and Beam Control XVIII (LA102)

Conference Chairs: Alexis V. Kudryashov, Moscow State Open Univ. (Russian Federation); Alan H. Paxton, Air Force Research Lab. (USA); Vladimir S. Ilchenko, OEwaves, Inc. (USA)

Conference Co-Chair: Lutz Aschke, IVAM Microtechnology Network (Germany)

Program Committee: Andrea M. Armani, The Univ. of Southern California (USA); Gaurav Bahl, Univ. of Illinois at Urbana-Champaign (USA); Yanne K. Chembo, FEMTO-ST (France); Jean-Claude M. Diels, The Univ. of New Mexico (USA); Hans Joachim Eichler, Laser- und Medizin-Technologie GmbH, Berlin (Germany); Andrew Forbes, CSIR National Laser Ctr. (South Africa); Pierre Galarneau, INO (Canada); Thomas Graf, Univ. Stuttgart (Germany); Tobias J. Kippenberg, Ecole Polytechnique Fédérale de Lausanne (Switzerland); James R. Leger, Univ. of Minnesota, Twin Cities (USA); Andrey B. Matsko, OEwaves, Inc. (USA); Gualtiero Nunzi Conti, Istituto di Fisica Applicata Nello Carrara (Italy); Andrew W. Poon, Hong Kong Univ. of Science and Technology (Hong Kong, China); Michelle L. Povinelli, The Univ. of Southern California (USA); Michael J. Scaggs, Neoteric Concepts, LLC (USA); Haiyin Sun, ChemImage Corp. (USA); Kunihiko Washio, Paradigm Laser Research Ltd. (Japan); Yun-Feng Xiao, Peking Univ. (China); Lei Xu, Fudan Univ. (China); Lan Yang, Washington Univ. in St. Louis (USA)

Laser resonators may be considered to be the heart of any laser system and mainly determine the output beam quality of any type of laser. Therefore resonator design may be the solution of various scientific and technological problems. Controlling the shape of laser beams is central to all laser applications and is an enabling factor for the application of lasers in new technologies and applications. This conference will explore new and novel approaches to the beam shaping of laser radiation with low- and high-power levels and the design of laser resonators with various nonstandard optical elements and systems. Also new criteria for laser beam characterization of lasers and amplifiers, and beam and pulse formation in lasers will be discussed.

Optical microresonators have become a distinct and growing subject of research, development, and opti-cal engineering as building blocks in variety of appli-cations ranging from micro-lasers, laser stabilization, through nonlinear and quantum optics devices and experiments, to filters, sensors, radio-frequency and terahertz oscillators, lightwave circuits, and signal processors. In this conference we intend to explore all areas of optical microresonators field, including latest developments in microcavity optomechanics, resonant optical cooling, optical frequency comb generation, and phonon lasing.

Conference papers are solicited on a wide range of topics related to the conference title, including but not limited to the following:

LASER RESONATORS:• active and adaptive laser resonators• stable and unstable laser resonators for high-

quality laser beams• resonators for gas, solid state, and fiber lasers• high-stability laser resonators.

BEAM SHAPING AND BEAM CONTROL OF SPECIFIC LASERS:• collimation of the output beams of laser diodes• fiber coupling of diode lasers• lasers with phase conjugation and their

applications• femtosecond lasers: beam and pulse control and

formation• laser beam homogenization• Gauss to top hat conversion• line focus generation• generation of application specific intensity

distributions• beam shaping of multi KW lasers• new optical elements and systems for lasers• applications with specific laser beam geometries• laser-beam characterization and measurement

of laser-beam parameters• spatial stabilization of laser beam shapes• beam delivery systems• feedback and control systems for aiming,

frequency stabilization, or energy absorption• high-power and high-brightness beam delivery

optics, including advanced isolators, connectors, beam switches, etc.

• high-speed beam steering devices, including KTN scanners, etc.

• advanced beam shapers and spatial light modulators for smart laser processing, etc.

• novel polarization and angular momentum state conversion devices and technologies.

MICRORESONATORS, PROPERTIES, AND APPLICATIONS:• microcavity fundamentals: novel resonator

topologies, morphologies, coupling methods; novel resonator materials, mechanisms of optical losses and quality-factor limitations

• multiresonator structures: resonator chains, 2D and 3D structures

• fabrication technologies and their limitations, device integration, packaging and stability factors

• microcavity-based and microcavity-stabilized lasers: self-injection locked lasers, functionalization and gain media, resonant SRS and resonant SBS with microcavities

• nonlinear optical phenomena with microresonators: optical frequency combs and parametric oscillators with microresonators, microresonator-based plasmonics and polaritonics

• microwave and Terahertz photonics with microcavities: resonant microwave photonic modulators and receivers, microwave photonic oscillators, microwave photonic filters, arbitrary waveform generation

• cavity quantum electrodynamics and quantum optics with microresonators: atom-photon interactions, solid state spectrometry, multiphoton spectroscopy, zero-phonon-line spectroscopy with microcavities; microcavities and quantum dots



Fiber Lasers XIII: Technology, Systems, and Applications (LA103)

Laser Resonators, Microresonators, and Beam Control XVIII (LA102) (continued)

• microcavity optomechanics: laser cooling of mesoscopic mechanical degrees of freedoms, stimulated phonon emission, microparticle manipulations and transport

• sensor applications with microresonators: accelerometry, vibrometry, temperature, pressure, biochemical and trace gas sensors, single molecule detection, microresonators in microfluidics and gyroscopes

• novel and emerging applications of microresonators.

JOINT SESSION WITH LA102 AND LA106Frequency Combs with Optical Resonators

The joint session will be dedicated to different meth-ods of producing optical frequency combs in the vis-ible, near IR and mid IR spectral ranges. These meth-ods include micro- and macro-resonators and other structures with pronounced optical nonlinearities of the 2nd, 3rd, and higher orders. Physical mechanisms responsible for the formation of frequency combs in dispersive resonators will be discussed, as well as novel techniques of resonator-assisted frequency conversion, optical parametric oscillation, and re-lated phenomena and methods, including emerging applications of mid-infrared combs, comb-assisted spectroscopy, and sensing.

JOINT SESSION WITH LA102 AND LA116Beam Shaping and Phase DistortionIn this joint session aspects of beam shaping com-ponents that are used to tailor the laser beam to the needs of an application. For example, micro-optic elements are used to collimate and combine beam of diode lasers to increase the available power, refractive or diffractive elements can transform the intensity distribution of the processing beam, or spectrally selective components are used for beam combining to increase the brightness.

Conference Chair: John Ballato, Clemson Univ. (USA)

Conference Co-Chair: Craig Robin, Lockheed Martin Aculight (USA)

Program Committee: Thomas Tanggaard Alkeskjold, NKT Photonics A/S (Denmark); Paulo Almeida, Fianium Ltd. (United Kingdom); Adrian L. Carter, Nufern (USA); Fabio Di Teodoro, Raytheon Co. (USA); Mark Dubinskii, U.S. Army Research Lab. (USA); Ingmar Hartl, Deutsches Elektronen-Synchrotron (Germany); Clifford Headley III, OFS Labs. (USA); Sami T. Hendow, Adaptive Laser Processing (USA); Stuart D. Jackson, Macquarie Univ. (Australia); Jens Limpert, Friedrich-Schiller-Univ. Jena (Germany); Jian Liu, PolarOnyx (USA); John D. Minelly, Coherent, Inc. (USA); Peter F. Moulton, Q-Peak, Inc. (USA); Martin H. Muendel, JDSU (USA); Siddharth Ramachandran, Boston Univ. (USA); L. Brandon Shaw, U.S. Naval Research Lab. (USA); Akira Shirakawa, The Univ. of Electro-Communications (Japan); Ji Wang, Corning Incorporated (USA); Pu Wang, Beijing Univ. of Technology (China); Yoann Zaouter, Amplitude Systèmes (France); Michalis N. Zervas, Univ. of Southampton (United Kingdom)

ADDITIONAL CONFERENCE INFORMATIONSupport for Authors from Low-Income Economies Based on availability of sponsorship funds, reduced registration fees or partial travel support may be avail-able for presenting authors from low-income countries whose submissions are accepted. If you wish to apply, please contact SPIE ([email protected]) after notification of paper acceptance. Include your SPIE paper number, name, and amount/type of support requested.

As research, development, and deployment of fiber lasers continues to expand, the Fiber Lasers Confer-ence at Photonics West has become the preeminent gathering in the field. Drawing leading researchers from universities, laboratories, and industry, it pro-vides a comprehensive update in all areas of fiber lasers and amplifiers. Submissions are solicited in all areas related to fibers and fiber lasers broadly categorized into the following four sub-categories:• Fiber Lasers and Amplifiers• Fiber Laser Materials, Design, Fabrication and

Characterization• Fiber Laser Devices and Components• Applications.

COSPONSORS:


CALL FOR PAPERS

High Energy/Average Power Lasers and Intense Beam Applications IX (LA104)Conference Chairs: Steven J. Davis, Physical Sciences Inc. (USA); Michael C. Heaven, Emory Univ. (USA); J. Thomas Schriempf, Naval Sea Systems Command (USA)

Program Committee: David L. Carroll, CU Aerospace LLC (USA); Jarmila Kodymová, Institute of Physics of the ASCR, v.v.i. (Czech Republic); Timothy Madden, Air Force Research Lab. (USA); Wilson T. Rawlins, Physical Sciences Inc. (USA); Greg A. Pitz, Air Force Research Lab. (USA)

Gas and chemical lasers were the first to be scaled to very high-energies and average-powers including megawatt class lasers for military applications and tens of kilowatt class lasers for industrial manufac-turing. Prominent examples include: HF/DF, CO, CO2, and COIL and their applications. This conference solicits papers in all areas of high power lasers and applications. We especially encourage submissions that describe new hybrid systems, such as optically pumped gas phase lasers, including the diode laser pumped alkali laser (DPAL) and the optically pumped rare gas laser.

This conference is envisioned to provide a good cross-section of different aspects of laser develop-ment and applications.•Papers on basic kinetics, thermodynamics,

spectroscopy, modeling, and new designs are solicited.

• Scaling of lasers for high-peak powers, high-average powers and special pulse formatting for specific applications are of interest.

• Applications including lidar, materials cutting, surface treatment and surface modifications and other intense beam applications are especially solicited.

• With the rapid progress in high-power fiber lasers and diode-pumped solid state lasers, we also encourage contributions that discuss recent results in these devices, especially in the area of high-power applications.

• Papers on current progress of existing systems will be integrated into the conference to show the applications of knowledge generated by break-through technological developments.

SPECIAL ABSTRACT REQUIREMENTS: PEER REVIEWSubmissions to this conference must include the following three separate abstracts:• 100-word text abstract (for online program)• 250-word text abstract (for abstract digest)• 2-page extended abstract (for committee review

only)- The extended abstract is limited to two pages,

including tables and figures.- Include author names and affiliations; text; any

figures, tables, or images; and sufficient data to permit peer review (main body text font size at least: 11 pt. Times/Times Roman).

- Only the extended abstract (PDF file) will be considered by the review committee when scoring submissions to determine acceptance.

- Extended abstracts will be used only for the purpose of peer review, and will not be published.

Submissions must be completed by 3 August 2015.

BEST STUDENT PRESENTATION AWARDSA cash prize donated by our cosponsors will be awarded to the best and runner-up student oral presentations. To be eligible for consideration, the student must:• be a graduate or undergraduate full-time

student• have conducted the majority of the work to

be presented• submit their abstract online by the deadline• be the primary author• select “Yes” when asked if they are a full-time

student• select themselves as the speaker• be accepted to present an oral presentation• submit their manuscript online by the deadline• make the oral presentation.

Presentations will be judged based on scientific merit, impact, as well as clarity of the student presenter’s talk.



Components and Packaging for Laser Systems II (LA105)

Conference Chairs: Alexei L. Glebov, OptiGrate Corp. (USA); Paul O. Leisher, Rose-Hulman Institute of Technology (USA)

Program Committee: Igor Anisimov, Air Force Research Lab. (USA); Gunnar Böttger, Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration (Germany); Kristian J. Buchwald, Ibsen Photonics A/S (Denmark); Te-Yuan Chung, National Central Univ. (Taiwan); Joseph L. Dallas, Avo Photonics, Inc. (USA); Martin Forrer, FISBA OPTIK AG (Switzerland); Alexander V. Laskin, AdlOptica Optical Systems GmbH (Germany); Jian Liu, PolarOnyx, Inc. (USA); Victor Liu, Xi’an Focuslight Technologies Co., Ltd. (China); Jens Meinschien, LIMO Lissotschenko Mikrooptik GmbH (Germany); Christian V. Poulsen, NKT Photonics Inc. (USA); Mark A. Stephen, NASA Goddard Space Flight Ctr. (USA); Takunori Taira, Institute for Molecular Science (Japan); Torsten Vahrenkamp, ficonTEC Service GmbH (Germany); Alexander Yusim, IPG Photonics Corp. (USA); Arnaud Zoubir, ALPhANOV (France)

Optical components are crucial for laser performance and form a foundation for advances in laser science and technology. All around the globe, vast and constantly growing research efforts are dedicated to developing new and more advanced laser com-ponents and systems. Along this line, packaging solutions for optical components enable their most efficient and consistent integration in laser systems. Laser component packaging is decisive for stable and reliable laser operations while not only improving laser characteristics but also enabling broader laser usability and applications.

This conference is dedicated to recent achievements and progress made in the field of optical components for lasers and laser systems as well as laser packaging solutions. A wide range of topics covers a variety of laser components and packaging technologies for semiconductor lasers, solid state lasers, fiber lasers, gas lasers, cw and pulsed lasers, ultra-short pulsed lasers, and others.

COMPONENTS FOR LASERS• diffractive optical elements (DOE) and

holographic optical elements (HOE)• lenses and lens arrays• mid-IR optical elements for lasers• components for high-power and high-energy

laser systems• space qualification of laser components• AR coating of components for high-power laser

applications• polarization optics for lasers• recent advances in isolators, couplers, splitters,

etc.• grating components for lasers: volume Bragg

gratings, blazed gratings, holographic phase gratings, and others

• components for laser line narrowing, mode locking, and mode selection

• novel active laser medium

• beam transforming systems for laser diode arrays

• high-power and high-energy beam delivery components

• laser ceramics, and orientation controlled laser ceramics

• components for ultra-short pulsed laser (USPL) systems

• components for coherent and spectral beam combining of CW and pulsed lasers

• advanced cooling components and solutions• theoretical and practical solutions for laser

coupling into fibers• novel optical component design methodologies• modeling of optical components in laser systems• advanced manufacturing techniques for laser

optical components• novel materials for optical components (high

index glasses, polymers, diamond, etc.)

LASER PACKAGING SOLUTIONS• packaging, assembly, and mounting solutions of

optical components in lasers• packaging technologies for high-power lasers• laser array packaging solutions• thermal management of high-power lasers• materials for laser packaging• materials for component attachment (epoxies,

solders, etc.)• novel active and passive alignment techniques• reliability of laser systems• modeling and design of laser packaging.


NONLINEAR OPTICS

Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications XV (LA106)

Conference Chair: Konstantin L. Vodopyanov, CREOL, The College of Optics and Photonics, Univ. of Central Florida (USA)

Conference Co-Chair: Kenneth L. Schepler, CREOL, The College of Optics and Photonics, Univ. of Central Florida (USA)

Program Committee: Darrell J. Armstrong, Sandia National Labs. (USA); Majid Ebrahim-Zadeh, ICFO - Institut de Ciències Fotòniques (Spain); Peter Günter, ETH Zurich (Switzerland); Baldemar Ibarra-Escamilla, Instituto Nacional de Astrofísica, Óptica y Electrónica (Mexico); Yehoshua Y. Kalisky, Nuclear Research Ctr. Negev (Israel); Yun-Shik Lee, Oregon State Univ. (USA); Rita D. Peterson, Air Force Research Lab. (USA); Peter G. Schunemann, BAE Systems (USA); Andrei V. Shchegrov, KLA-Tencor Corp. (USA); Wei Shi, Tianjin Univ. (China); Michael Vasilyev, The Univ. of Texas at Arlington (USA)

The purpose of this conference is to provide a forum for discussing advances in nonlinear optics. Areas of emphasis include novel nonlinear materials, new devices and techniques for improved nonlinear fre-quency conversion, and new effects and application demonstrations based on nonlinear optics.

Topics include:

NONLINEAR MATERIALS• bulk inorganic and organic nonlinear materials• engineered nonlinear materials including

semiconductors and quantum-well structures• nanostructures, photonic bandgap structures• nonlinear fibers, waveguides and thin films• new measurement techniques of nonlinear

optical properties.

DEVICES AND TECHNIQUES• nonlinear processes in bulk crystals, fibers,

waveguides and thin films• parametric frequency up and down conversion• stimulated Raman and Brillouin scattering• multi-photon effects• four-wave mixing and other 3-rd and higher-

order processes.

APPLICATIONS• spectroscopy, chemical and biological sensing,

remote sensing• frequency combs and supercontinuum

generation• materials processing• THz generation, spectroscopy and imaging• all-optical switches, high-speed signal

processing.

JOINT SESSION WITH LA102 AND LA106Frequency Combs with Optical ResonatorsThe joint session will be dedicated to different meth-ods of producing optical frequency combs in the vis-ible, near IR and mid IR spectral ranges. These meth-ods include micro- and macro-resonators and other structures with pronounced optical nonlinearities of the 2nd, 3rd, and higher orders. Physical mechanisms responsible for the formation of frequency combs in dispersive resonators will be discussed, as well as novel techniques of resonator-assisted frequency conversion, optical parametric oscillation, and re-lated phenomena and methods, including emerging applications of mid-infrared combs, comb-assisted spectroscopy, and sensing.

IMPORTANT DATESAbstracts Due: 3 AUGUST 2015Author Notification: 12 OCTOBER 2015Manuscript Due Date: 20 JANUARY 2016Please Note: Submissions imply the intent of at least one author to register, attend the conference, present the paper as scheduled, and submit a full-length manuscript for publication in the conference proceedings.


NONLINEAR OPTICS

Real-time Measurements, Rogue Events, and Emerging Applications (LA107)

Conference Chairs:Bahram Jalali, Univ. of California, Los Angeles (USA); Sergei K. Turitsyn, Aston Univ. (United Kingdom); Daniel R. Solli, Univ. of California, Los Angeles (USA), Georg-August-Univ. Göttingen {Germany); John M. Dudley, FEMTO-ST, Univ. de Franche - Comté, CNRS (France)

Program Committee:Nail Akhmediev, The Australian National Univ. (Australia); Mohammad Hossein Asghari, Univ. of California, Los Angeles (USA); Goëry Genty, Tampere Univ. of Technology (Finland); Keisuke Goda, The Univ. of Tokyo (Japan); Claus Ropers, Georg-August-Univ. Göttingen (Germany); Majid Taki, Univ. des Sciences et Technologies de Lille (France); Chao Wang, Univ. of Kent (United Kingdom)

Rogue events otherwise known as outliers and black swans are singular, rare events that carry important information about the system they emerge from. They appear in seemingly unconnected contexts such as ocean waves, financial markets, evolution, nonlin-ear optics and communication systems. Attempts to understand the underlying dynamics of such complex systems exhibiting dramatic outcomes are often frustrated by the scarcity of events, resulting in insufficient statistical data, and by the inability to perform experiments under controlled conditions. Ul-trafast systems make it possible to collect large data sets, even for rare events, in a relatively short time period. The knowledge gained from observing rare events in ultrafast systems provides valuable insight into extreme value phenomena that occur over much slower timescales, including those that have a closer connection with human experience. However, the real-time measurement of fast single shot events with large record lengths is one of the most challenging problems in the fields of instrumentation and mea-surement. Notwithstanding the sensitivity and speed requirements needed for fast single-shot real-time measurements, such instruments also create a big data problem associated with continuous-recording at high data rates. Applications include the study of optical rogue waves, the investigation of nonlinear dynamics and laser transients, the detection of rare cancer cells in blood, high-throughput spectroscopy, industrial inspection and machine vision.

The aim of this conference is to create a forum for presentation of the latest developments in rogue waves, nonlinear dynamics and real-time instruments and to facilitate the exchange of ideas in this new and promising field of science and technology.

Topics of interest include but are not limited to:• real-time spectroscopy and imaging• optical rogue waves• laser transients• nonlinear dynamics• dissipative solitons• instabilities in linear and nonlinear systems• PT-symmetry optical media• ultrafast optical signal characterization• time-stretch dispersive Fourier transform• single-shot pulse characterization• real-time data processing systems• computationally-efficient algorithms• real-time data compression and real-time

analytics• big data visualization and storage• mathematical and analytical techniques.

New


CALL FOR PAPERS

This conference of related interest is part of OPTO 2016 co-located at Photonics West, www.spie.org/optocall

Organic Photonic Materials and Devices XVIII (OE104)

Conference Chairs: Christopher E. Tabor, Air Force Research Lab. (USA); François Kajzar, Univ. Politehnica of Bucharest (Romania); Toshikuni Kaino, Tohoku Univ. (Japan); Yasuhiro Koike, Keio Univ. (Japan)

Program Committee: Chantal Andraud, Ecole Normale Supérieure de Lyon (France); Werner J. Blau, Trinity College Dublin (Ireland); Andreas Bräuer, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Fabrice Charra, Commissariat à l’Énergie Atomique (France); Beata J. Derkowska-Zielinska, Nicolaus Copernicus Univ. (Poland); Raluca Dinu, GigOptix, Inc. (USA); Manfred Eich, Technische Univ. Hamburg-Harburg (Germany); Alain F. Fort, Institut de Physique et Chimie des Matériaux de Strasbourg (France); James G. Grote, Air Force Research Lab. (USA); F. Kenneth Hopkins, Air Force Research Lab. (USA); Alex K. Y. Jen, Univ. of Washington (USA); Michael H. C. Jin, Johns Hopkins Univ. Applied Physics Lab., LLC (USA); Eunkyoung Kim, Yonsei Univ. (Korea, Republic of); Jang-Joo Kim, Seoul National Univ. (Korea, Republic of); Nakjoong Kim, Hanyang Univ. (Korea, Republic of); Isabelle Ledoux-Rak, Ecole Normale Supérieure de Cachan (France); Charles Y. C. Lee, Air Force Office of Scientific Research (USA); Kwang-Sup Lee, Hannam Univ. (Korea, Republic of); Misoon Y. Mah, Asian Office of Aerospace Research and Development (Japan); Seth R. Marder, Georgia Institute of Technology (USA); Antoni C. Mitus, Wroclaw Univ. of Technology (Poland); Jaroslaw Mysliwiec, Wroclaw Univ. of Technology (Poland); Robert L. Nelson, Air Force Research Lab. (USA); Robert A. Norwood, College of Optical Sciences, The Univ. of Arizona (USA); Jean-Michel Nunzi, Queen’s Univ. (Canada); Shuji Okada, Yamagata Univ. (Japan); Akira Otomo, National Institute of Information and Communications Technology (Japan); Ileana Rau, Univ. Politehnica of Bucharest (Romania); Niyazi Serdar Sariciftci, Johannes Kepler Univ. Linz (Austria); Devanand K. Shenoy, Defense Advanced Research Projects Agency (USA); Kenneth D. Singer, Case Western Reserve Univ. (USA); Attila A. Szep, Air Force Research Lab. (USA); Rebecca E. Taylor, Lockheed Martin Space Systems Co. (USA); Jeong-Weon Wu, Ewha Womans Univ. (Korea, Republic of); Shiyoshi Yokoyama, Kyushu Univ. (Japan); Roberto Zamboni, Istituto per la Sintesi Organica e la Fotoreattività (Italy)

For energy-saving and economic reasons, there is a growing interest and a revolution in organic/polymer-ic photonic and electronic materials and devices for optical communication, data transmission, storage, display and other applications. Recent advances in the development of optical interconnection and electro-optic devices as well as planar lightwave circuits, light-emitting and photovoltaic devices sug-gest that organic and polymeric materials will play a significant role in this area. Organic-inorganic hybrid materials and biophotonic materials are also of spe-

cial concern for novel photonic device development. Metamaterials are also becoming important even in these fields. Organic Photonic Materials and Devices XVIII will serve as a forum for the dissemination and discussion of state-of-the-art results pertaining to organic/polymeric opto-electronic, nanophotonic, and biophotonic materials and devices as well as their applications.

The objective of this conference is to bring together researchers and engineers from academia, industry, and government laboratories who share a common interest in organic/polymeric photonic materials and devices.

This conference will provide a forum for an update on progress in the highly-connected and multidisci-plinary subject of photonic technologies based on organic/polymeric materials. Papers are solicited in the following areas:• nonlinear optical polymer materials and devices• organic light-emitting materials and devices• photorefractive materials and processes• photochromic materials• polymer optical waveguides and fibers• multiphoton processes• charge transport in organic materials• single-molecule spectroscopy• organic field effect transistors• polymer lasers and amplifiers• optical limiting materials• polymer solar cells and photodetectors• nanophotonics and organic metamaterials• biophotonics• electro-optic materials for silicon photonics• biopolymers• organic-inorganic hybrid materials and devices• flexible semiconductors• plasmonic NLO effects• polymeric photonic crystals• hybrid organic-inorganic materials• multiphoton processes• theoretical description of NLO processes• printed optical materials and processes• Rf organic materials properties.

In 2016, we are planning to have a joint session with the Optical Interconnects conference, focusing on the theme, “Electro-optic polymers meet optical interconnection.” so please submit related papers to this conference or to the Optical Interconnects conference (OE112).


NONLINEAR OPTICS

Ultrafast Phenomena and Nanophotonics XX (OE105)

Conference Chairs: Markus Betz, Technische Univ. Dortmund (Germany); Abdulhakem Y. Elezzabi, Univ. of Alberta (Canada)

Program Committee: Alan D. Bristow, West Virginia Univ. (USA); Yujie J. Ding, Lehigh Univ. (USA); Kazuhiko Hirakawa, The Univ. of Tokyo (Japan); Rupert Huber, Univ. Regensburg (Germany); Robert A. Kaindl, Lawrence Berkeley National Lab. (USA); Dai-Sik Kim, Seoul National Univ. (Korea, Republic of); Xiaoqin Li, The Univ. of Texas at Austin (USA); Christoph Lienau, Carl von Ossietzky Univ. Oldenburg (Germany); Torsten Meier, Univ. Paderborn (Germany); Walter Pfeiffer, Univ. Bielefeld (Germany); Pascal Ruello, Univ. du Maine (France); Volker J. Sorger, The George Washington Univ. (USA); Fabrice Vallee, Univ. Claude Bernard Lyon 1 (France)

This conference covers ultrafast phenomena in bulk semiconductors, semiconducting and metallic nano-structures and devices with emphasis on ultrafast optical and/or coherent phenomena. Manuscripts are solicited in the following topics but not restricted to:

ULTRAFAST DYNAMICS IN SEMICONDUCTORS• carrier-carrier, carrier-phonon interactions• formation, recombination dynamics of excitons• polariton dynamics in microcavities• ultrafast acoustic phenomena.

COHERENT DYNAMICS OF OPTICAL EXCITATIONS• excitonic coherences• quantum interference effects• four-wave mixing, two-dimensional

spectroscopy• coherent phonons.

NON-LINEAR OPTICAL EFFECTS• optical frequency conversion• multi-photon processes, high-field physics• high harmonic generation, attosecond physics• ultrafast probing of surfaces and interfaces.

NON-EQUILIBRIUM CARRIER TRANSPORT• ballistic carrier transport• tunneling phenomena• Bloch oscillations.

ULTRAFAST PHENOMENA CARBON NANOMATERIALS• dynamics in graphene and carbon nanotubes• graphene plasmonics• carbon-based quantum dots• related effects in other monolayer materials.

SPIN DYNAMICS AND SPIN MANIPULATION• ultrafast optical spin manipulation• spin coherence and relaxation• ultrafast magnetism• spin injection and transport.

ULTRAFAST PLASMONICS• active plasmonics• THz plasmonics• ultrafast dynamics in metallic nanostructures.

THZ SPECTROSCOPY• THz wave generation• field-resolved techniques• THz time-domain spectroscopy• strong-field THz physics.

ULTRAFAST PROCESSES IN DEVICES AND LASERS• ultrafast optical switching• wavelength conversions• gain dynamics in lasers and amplifiers.

ULTRAFAST NANO-OPTICS• nanoemitters, nanoantennae• nanolocalization of optical fields• coherent control in nanostructures• semiconductor quantum dots and wires• single-photon sources• applications for quantum information

processing.

ULTRAFAST OPTICAL PROPERTIES OF METAMATERIALS• photonic and phononic crystals• metal-semiconductor hybrid structures• negative-index materials• metatronics.

COSPONSOR:This conference of related interest is part of OPTO 2016 co-located at Photonics West, www.spie.org/optocall


SEMICONDUCTOR LASERS AND LEDS

High-Power Diode Laser Technology and Applications XIV (LA108)

Conference Chair: Mark S. Zediker, Nuburu Inc. (USA)

Program Committee: Friedrich G. Bachmann, FriBa LaserNet (Germany); Stefan W. Heinemann, TRUMPF Photonics (USA); Volker Krause, Laserline GmbH (Germany); Robert Martinsen, nLIGHT Corp. (USA); Kurt J. Linden, N2 Biomedical (USA); Erik P. Zucker, JDSU (USA)

The High-Power Diode Laser Technology and Ap-plications conference intends to gather people to discuss the latest developments in high-power laser diode technology and how the technology is being used. The conference will focus on high-power diode laser devices based on bars, single emitters and multi-chip arrays. Topics of special interest include coherent beam combining, spatial beam combining, spectral beam combining, frequency stabilization, high-power and high-brightness fiber coupling, reliability and failure mode analysis, high-efficiency, high-temperature operation, and short wavelength high-power diode lasers for display applications. The conference provides a forum to introduce new developments in high-power diode laser technolo-gy and how new devices are being integrated into applications.

Papers are solicited on a wide range of topics related to high-power diode laser technology and applica-tions, including but not limited to:• high-power diode laser systems• high-power single emitters, mini-bars and array

technology• reliability of high-power diode laser devices and

packages• high-brightness diode laser technology• beam formation with high-power diode laser

arrays• beam combining of high-power diode lasers and

arrays• frequency stabilization of high-power laser

diodes and arrays• fiber coupling of high-power diode lasers and

arrays• high-power visible diode lasers for digital

cinema and other projection display applications• high power mid-infrared diode lasers• fiber lasers pump sources• solid-state laser pump sources• 2D pump arrays for fusion energy systems• diode laser system applications including,

brazing, welding, heat treating, annealing, and cladding

• comparison of diode laser performance to other laser technologies.

SPECIAL ABSTRACT REQUIREMENTS: PEER REVIEWContributions are accepted based on a peer review-ing process. Contributions to this conference must include the following three separate abstracts:• 100-word text abstract (for online program)• 250-word text abstract (for abstract digest)• 2-page extended abstract (for committee review

only)- The extended abstract is limited to two pages,

including tables and figures.- Include author names and affiliations; text; any

figures, tables, or images; and sufficient data to permit peer review (main body text font size at least: 11 pt. Times/Times Roman).

- Only the extended abstract (PDF file) will be considered by the review committee when scoring submissions to determine acceptance.

- Extended abstracts will be used only for the purpose of peer review, and will not be published.



Vertical External Cavity Surface Emitting Lasers (VECSELs) VI (LA109)

Conference Chair: Keith G. Wilcox, Univ. of Dundee (United Kingdom)

Program Committee: Juan L. Chilla, Coherent, Inc. (USA); Arnaud Garnache, Univ. Montpellier 2 (France); Mircea Guina, Tampere Univ. of Technology (Finland); Jennifer E. Hastie, Univ. of Strathclyde (United Kingdom); Elyahou Kapon, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Ursula Keller, ETH Zürich (Switzerland); Jerome V. Moloney, College of Optical Sciences, The Univ. of Arizona (USA); Wolfgang Stolz, NAsP III/V GmbH (Germany); Anne C. Tropper, Univ. of Southampton (United Kingdom)

The purpose of this conference, now in its sixth year, is to highlight current work in the rapidly developing field of optically- and electrically-pumped vertical external cavity surface emitting lasers (VECSELs). These lasers, which are also referred to as optical-ly-pumped semiconductor lasers (OPSLs) or semi-conductor disk lasers (SDLs), have gained a strong interest for brightness scaling over a broad range of emission wavelengths. In a VECSEL the light is emitted perpendicular to the epitaxial layers, unlike edge-emitting lasers where the beam propagates in the epitaxial layers. In contrast to a VCSEL (i.e. a vertical cavity surface emitting laser) the external cavity of the VECSEL offers additional mode control for excellent transverse beam quality, even at highest power levels, and enables the integration of elements for nonlinear intracavity frequency conversion, wave-length tuning elements, or passive mode-locking.

Since the first demonstration in 1997, we have seen tremendous progress in VECSEL research, operating in both continuous-wave and the ultrafast regime. Optically-pumped VECSELs can convert low-cost, low-beam-quality optical pump beams provided by high-power diode laser bars into a near-diffrac-tion-limited output beam with good efficiency. This has resulted in achieving more than 20 W cw power in single frequency operation, substantially higher than from any other type of semiconductor laser. An important advantage compared to well-established diode-pumped solid-state lasers, is that VECSELs operate in spectral regions not covered by solid-state laser gain materials. To date, direct CW emission from VECSEL has been demonstrated for the entire wavelength range covered by compound semicon-ductors, extending from 650 nm to 2.9 µm, and have been extended even to 4-5 µm. Moreover they allow efficient, low-noise, intra-cavity nonlinear frequency conversion to further broaden spectral coverage, including visible, ultra-violet, and terahertz emission.

In mode-locked operation, the performance of ultrafast VECSELs has also surpassed that of other semiconductor lasers. Ultrafast VECSELs have gen-erated average power levels of several watts in sev-eral-hundred-femtosecond pulses. Pulse durations below 100 fs have been achieved, and the repetition rate of fundamentally mode-locked VECSELs has increased to tens of GHz. Furthermore the SESAM

and the VECSEL gain structure can be integrated into a single semiconductor structure, which is referred to as a mode-locked integrated external-cavity sur-face emitting laser (MIXSEL). MIXSELs can produce fundamentally mode-locked trains of sub-picosecond pulses at repetition rates over 100 GHz. Recently, ultrafast VECSELs and MIXSELs have been used to generate gigahertz self-referenceable frequency combs and dual wavelength combs.

Such VECSEL performance should be well-suited for many applications including laser projection, opti-cal clocking, frequency metrology, high resolution nonlinear multiphoton microscopy, or laser cooling.

A selection of invited papers will provide a compre-hensive overview of the latest progress in this new field. In addition, contributed papers are solicited for this VECSEL conference with the focus on:• power scaling of VECSELs and MIXSELs• novel wavelength, heat management and optical

pumping schemes• material systems, epilayer design, and epitaxial

fabrication• intracavity nonlinear frequency conversion• numerical modeling of gain, dynamical behavior,

thermal behavior• experimental characterization of semiconductor

components, including ultrafast dynamics• electrical pumping• mode-locked operation• single frequency operation• frequency comb generation and applications• integrated extended cavities and wafer

processing• applications.

BEST STUDENT PRESENTATION AWARDThe committee is pleased to announce that this year a cash prize of $500, donated by Coherent Inc., will be awarded for the best student presen-tation; judged, by the committee, on the basis of scientific content, impact and clarity.To be eligible for consideration, the student must:• submit their abstract online by the deadline• be the primary author• select “Yes” when asked if they are a full-time

student• select themselves as the speaker• be accepted to present an oral presentation• submit their manuscript online by the deadline• make the oral presentation.

COSPONSOR:


CALL FOR PAPERS

Physics and Simulation of Optoelectronic Devices XXIV (OE101)

Conference Chairs: Bernd Witzigmann, Univ. Kassel (Germany); Marek Osinski, The Univ. of New Mexico (USA); Yasuhiko Arakawa, The Univ. of Tokyo (Japan)

Program Committee: Hiroshi Amano, Nagoya Univ. (Japan); Toshihiko Baba, Yokohama National Univ. (Japan); Enrico Bellotti, Boston Univ. (USA); Guillermo Carpintero del Barrio, Univ. Carlos III de Madrid (Spain); Weng W. Chow, Sandia National Labs. (USA); Alexandre Freundlich, Univ. of Houston (USA); Frédéric Grillot, Télécom ParisTech (France); Ortwin Hess, Imperial College London (United Kingdom); Thomas A. Klar, Johannes Kepler Univ. Linz (Austria); Stephan W. Koch, Philipps-Univ. Marburg (Germany); Cun-Zheng Ning, Arizona State Univ. (USA); Joachim Piprek, NUSOD Institute LLC (USA); Marc Sciamanna, Supélec (France); Ikuo Suemune, Hokkaido Univ. (Japan)

This conference targets existing and new physical and mathematical methods as applied to optoelec-tronics, as well as recent advances in new materials and devices. Its objective is to bring together ex-perimentalists, theorists, computational specialists, and development engineers to provide an interdis-ciplinary forum to discuss physical understanding and state-of-the-art computational analysis of active and passive optoelectronic materials and devices. Theoretical and experimental papers are solicited on the following and related topics:• optoelectronic device modeling: lasers, light-

emitting diodes, photodetectors, modulators• materials for optoelectronic devices: wide

bandgap materials; band structure, band offsets, gain and recombination in II-VI and III-nitride structures, materials for mid-infrared optoelectronic devices, photonics synthetic matter

• plasmonic materials and structures: theory and application in optoelectronic devices

• graphene and its applications in photonics: electronic band structure, luminescent properties, device strategies

• photovoltaics modeling: simulation models and modeling results for solar cells

• organic/inorganic hybrid nanostructures and devices: interfaces, atomistic simulations

• physics of nano structures: quantum well, quantum wire, and quantum dot lasers and surface plasmon devices; lattice mismatch and strain effects; Coulomb effects and macroscopic theories; carrier and quantum transport, capture, and dynamics; hole burning, gain suppression and non-equilibrium effects; coherent effects; polarization phenomena

• micro- or nano-cavity effects and photonic crystals: applications for LEDs and lasers; thresholdless laser; novel VCSEL structures; polariton lasers

• quantum communications: semiconductor quantum bits; single-photon devices; entangled states; quantum cryptography; optically-probed spin dynamics; cavity quantum electrodynamics, superconducting optoelectronics

• dynamics and noise in diode lasers and systems: gain switching; passive and actively mode-locked diode lasers; self-pulsations; chaos and instabilities in diode lasers and laser arrays; bistability and multistability, effects of injected light and optical feedback; coherence of lasers and laser arrays

• WDM network optical devices: tunable lasers; ultrastable lasers; high-speed optoelectronics

• numerical simulation methods: new approaches for heterolayer transport simulation; ab-initio and multi-scale simulation of materials for optoelectronics; computational electromagnetics; comprehensive simulation of optical, electrical and thermal phenomena; photonic circuit simulation, code parallelization techniques

• modeling techniques for fiber and integrated optical devices: eigenvalue techniques, finite difference, finite element and Fourier transform methods, high-order propagation methods, wide-angle and vector wave equations, models of guided-wave reflection

• advances in waveguides and waveguide devices: pulse propagation in active waveguides, waveguide structures for routing, switching and high brightness devices; tapered waveguides; waveguide-fiber coupling; nonlinear and high-power effects in waveguides and fibers; gratings; soliton propagation.






Gallium Nitride Materials and Devices XI (OE107)

Conference Chairs: Jen-Inn Chyi, National Central Univ. (Taiwan); Hiroshi Fujioka, The Univ. of Tokyo (Japan); Hadis Morkoç, Virginia Commonwealth Univ. (USA)

Conference Co-Chairs: Yasushi Nanishi, Ritsumeikan Univ. (Japan); Ulrich T. Schwarz, IMTEK, Univ. Freiburg (Germany); Jong-In Shim, Hanyang Univ. (Korea, Republic of)

Program Committee: Frank Bertram, Otto-von-Guericke-Univ. Magdeburg (Germany); Michal Bockowski, Institute of High Pressure Physics (Poland); Enrique Calleja, Univ. Politécnica de Madrid (Spain); Shigefusa F. Chichibu, Tohoku Univ. (Japan); Bernard Gil, Univ. Montpellier 2 (France); Nicolas Grandjean, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Hideki Hirayama, RIKEN (Japan); Ray-Hua Horng, National Chung Hsing Univ. (Taiwan); Stacia Keller, Univ. of California, Santa Barbara (USA); Michael Kneissl, Technische Univ. Berlin (Germany); Hao-Chung Kuo, National Chiao Tung Univ. (Taiwan); Masaaki Kuzuhara, Univ. of Fukui (Japan); Koh Matsumoto, Taiyo Nippon Sanso Corp. (Japan); Hideto Miyake, Mie Univ. (Japan); Eva Monroy, CEA Grenoble (France); Yong-Tae Moon, LG Electronics Inc. (Korea, Republic of); Ki-Bum Nam, Seoul Semiconductor (Korea, Republic of); Ümit Özgür, Virginia Commonwealth Univ. (USA); Joachim Piprek, NUSOD Institute LLC (USA); Tae-Yeon Seong, Korea Univ. (Korea, Republic of); Chih-Chung Yang, National Taiwan Univ. (Taiwan); Euijoon Yoon, Seoul National Univ. (Korea, Republic of); Enrico Zanoni, Univ. degli Studi di Padova (Italy)

This conference will focus on recent advances and challenges in GaN and related materials and electronic, switching and optical devices based on them, including potential applications. An important objective of this conference is to provide a forum for dissemination of the latest results on current and emerging topics in GaN and related materials and devices, as well as paving the way for in-depth discussions among participants. The topics of dis-cussion will include, but not limited to, scientific and technological advances in all aspects of materials, including bulk GaN, ternaries and quaternaries, heterostructures, new substrates and new method-ologies employed for alternative substrates such as Si, materials physics, devices (electronic and optical), device physics, novel devices such as microcavities, processing, and particularly devices with emphasis on light emitters, novel growth techniques, and device reliability.

Topics for presentation and discussion will include but not be limited to:

BULK GROWTH• solution growth methods both very high

pressure and not so high pressure, HVPE growth, or by any other method, characterization (structural, electrical, and optical), high resistivity bulk GaN.

EPITAXIAL GROWTH, BULK GROWTH, AND GROWTH OF NANOSTRUCTURES• MOVPE, MBE, HVPE, substrates (patterned and

planar, alternative orientations), precursors for dopants and constituents, epitaxial lateral overgrowth, alloys, low-dimensional systems, growth and exploitation of non-polar and semi-polar surfaces.

DEFECTS AND DOPING• defect structures at the structural and electronic

energy levels, electronic states associated with group dopants (mainly involuntary kinds); techniques applied to illuminate the local nature of impurities; surface states; surface passivation; interface states; DLTS and its variants, low-frequency noise techniques, microscopy (TEM, electron holography, STM, AFM and its variants), x-ray analysis, novel dopants.

OPTICAL CHARACTERIZATION• photoluminescence, cathodoluminescence,

optical emission imaging, non-linear optics, reflection spectroscopy, experimental measurement of energy band parameters and band structure, etc.

ELECTRICAL CHARACTERIZATION• hall effect, carrier transport, magneto-transport,

photoconductivity, thermally stimulated currents, etc.

STRUCTURAL CHARACTERIZATION• x-ray, TEM and its variants, local charge

mapping, AFM detection of dislocations, stacking faults, etc.

III-NITRIDE NANOSTRUCTURES• including self-assembled and ordered

quantum dots, quantum wires and related low dimensional structures.

FUNDAMENTAL PHYSICS• band structure (including quantum well

heterostructures), quantum size effects, strain effects, excitons (free and bond), polaritons, nanocavities, plasmonic effects, surface phenomena, polarization effects, piezoelectric effects, theoretical models.

DEVICES• lighting by LEDs, LEDs for displays , LEDs

for TVs, UV and visible LEDs (particularly radiative/nonradiative recombination processes and efficiency related topics), Laser diodes (particularly extended wavelengths toward longer and shorter wavelengths), FETs and dielectric gated FETs for high power switching and RF as well as high frequency applications inclusive of topics such as hold voltage and on current, hot phonon and hot electron effects, power dissipation, degradation/reliability, pathways for degradation and ways to improve reliability, UV and other optical detectors, chemical and biological sensors, field emitters, integration with other technologies, novel devices, device theory and simulations.


CALL FOR PAPERS


Vertical-Cavity Surface-Emitting Lasers XX (OE125)

Conference Chairs: Kent D. Choquette, Univ. of Illinois at Urbana-Champaign (USA); James K. Guenter, Finisar Corp. (USA)

Program Committee: Nicolae Chitica, TE Connectivity Ltd. (Sweden); Aaron James Danner, National Univ. of Singapore (Singapore); Kent M. Geib, Sandia National Labs. (USA); Martin Grabherr, Philips Technologie GmbH U-L-M Photonics (Germany); Anders Larsson, Chalmers Univ. of Technology (Sweden); Chun Lei, EMCORE Corp. (USA); James A. Lott, Technische Univ. Berlin (Germany); M. V. Ramana Murty, Avago Technologies Ltd. (USA); Krassimir Panajotov, Vrije Univ. Brussel (Belgium); Jean-Francois Seurin, Princeton Optronics, Inc. (USA); Noriyuki Yokouchi, Furukawa Electric Co., Ltd. (Japan); Jongseung Yoon, The Univ. of Southern California (USA); Mial E. Warren, TriLumina Corp. (USA)

Sustained research and development of vertical-cav-ity surface-emitting lasers (VCSELs) over the past thirty years has transformed VCSELs to viable components in the photonic marketplace for optical interconnect and sensing applications.

Currently, VCSELs are being developed for a wide variety of applications, as well as being designed to conform to standard system architectures. This conference seeks to provide a forum for interaction between VCSEL researchers, product developers, and system engineers, and VCSEL component users to disseminate information about new advances and applications. Subjects of interest for this conference include the design, novel fabrication, and physical characterization of VCSELs. Papers concerning com-mercial VCSEL activity and new VCSEL applications are particularly solicited.

Topics of interest include:• high-performance VCSELs (low-threshold

current, high output power, high-speed modulation, etc.)

• VCSEL applications (smart pixels, optical data links, print heads, display, scanning, position sensing, sensors, etc.)

• VCSEL reliability (qualification, research)• hybrid VCSEL integration with optics and/or

microelectronics• advances in fabrication technologies (selective

oxidation, dry etching, wafer bonding, etc.)• techniques and monitoring of VCSEL growth

(uniformity, reproducibility)• new materials for VCSELs• 2D VCSEL arrays• characterization and control of transverse

optical modes and polarization• new VCSEL devices including tunable VCSEL

structures• commercial VCSEL production techniques• VCSEL packaging• VECSEL/VCSEL similarities and differences.




Novel In-Plane Semiconductor Lasers XV (OE126)

Conference Chairs: Alexey A. Belyanin, Texas A&M Univ. (USA); Peter M. Smowton, Cardiff Univ. (United Kingdom)

Program Committee: Yasuhiko Arakawa, The Univ. of Tokyo (Japan); Mikhail A. Belkin, The Univ. of Texas at Austin (USA); Dan Botez, Univ. of Wisconsin-Madison (USA); Federico Capasso, Harvard School of Engineering and Applied Sciences (USA); Gary A. Evans, Southern Methodist Univ. (USA); Michael Kneissl, Technische Univ. Berlin (Germany); Luke F. Lester, Virginia Polytechnic Institute and State Univ. (USA); Shinji Matsuo, NTT Photonics Labs. (Japan); Luke J. Mawst, Univ. of Wisconsin-Madison (USA); Jerry R. Meyer, U.S. Naval Research Lab. (USA); Roberto Paiella, Boston Univ. (USA); Richard V. Penty, Univ. of Cambridge (United Kingdom); Johann Peter Reithmaier, Univ. Kassel (Germany); Haisheng Rong, Intel Corp. (USA); Gary M. Smith, MIT Lincoln Lab. (USA); Nelson Tansu, Lehigh Univ. (USA); Miriam Serena Vitiello, Consiglio Nazionale delle Ricerche (Italy); Qi Jie Wang, Nanyang Technological Univ. (Singapore)

High-quality, in-plane semiconductor lasers exhibit improved performance over a wide range of emission wavelengths from ultraviolet into the THz range. Devices are finding an ever increasing number of applications in, for example, telecommunications, printing, spectroscopy, displays, and medical diag-nostics and therapy.

Well-developed GaAs- and InP-based lasers oper-ating from the 0.8 to 2-µm are achieving multi-watt output powers with beams of high spatial and spec-tral purity. Lasers made from new material systems, such as dilute nitride-antimonides, bismides or quan-tum-dot active regions, are pushing performance and spectral coverage. Mode-locked diode lasers are demonstrating improvements such as reduced pulse length and timing jitter. Applications in com-munication are pushing advances in laser dynamics, including the use of coupled and/or chaotic semicon-ductor lasers. The GaN based laser field continues to innovate and make progress in terms of e.g. power, reliability and to extend operation deeper into the green and the ultraviolet parts of the spectrum. In the infrared, Sb-based quantum well lasers display high performance at wavelengths up to ~ 5 µm, and quantum cascade lasers operate at wavelengths from just below 3 µm to almost 300 µm. Emerging applications in the mid/far-infrared stimulate the development of high-efficiency, high-power quantum cascade lasers operating at an ambient temperature and with new functionalities such as ultrashort pulse generation, frequency combs, injection locking, and beam control. Novel laser sources utilize recent ad-vances in plasmonics, nanophotonics, and nonlinear optics for efficient generation and manipulation of light. A variety of approaches are being developed for silicon based lasers, including hybrid structures by local area growth or wafer bonding.

This conference provides a forum for the most recent breakthroughs in device design and performance. We solicit papers describing novel designs that achieve higher performance levels and unique operational characteristics, as well as papers describing the tech-nical limitations of the current in-plane laser tech-nology and lasers tailored to particular applications such as heat-assisted magnetic recording. Papers of experimental and/or theoretical nature are welcome.

Examples of in-plane laser types of interest include, but are not limited to:• quantum cascade• organic lasers• InGaAsP/InP and InGaAsP/GaAs• InGaAsN, InGaAsNSb or GaAsBi• AlInGaP/GaAs visible• Sb-based• GaN- and ZnSe-based UV, blue and visible• silicon-based lasers• quantum dot lasers• type-II quantum-well and superlattice lasers• communications lasers• sub-wavelength scale lasers• photonic bandgap and microcavity lasers• DFB and DBR lasers• multi-segment and ring lasers• mode-locked lasers• coherent and incoherent laser arrays• MOPA and / or flared-waveguide lasers• high-brightness lasers• narrow-linewidth lasers• vertically-coupled in-plane lasers.


CALL FOR PAPERS


Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XX (OE127)

Conference Chairs: Heonsu Jeon, Seoul National Univ. (Korea, Republic of); Li-Wei Tu, National Sun Yat-Sen Univ. (Taiwan); Michael R. Krames, Arkesso (USA); Martin Strassburg, OSRAM Opto Semiconductors GmbH (Germany)

Program Committee: Gerd Bacher, Univ. Duisburg-Essen (Germany); Mitch M. C. Chou, National Sun Yat-Sen Univ. (Taiwan); Michael Heuken, AIXTRON SE (Germany); Christoph Hoelen, Philips Lighting B.V. (Netherlands); Satoshi Kamiyama, Meijo Univ. (Japan); Jong Kyu Kim, Pohang Univ. of Science and Technology (Korea, Republic of); Markus Klein, OSRAM Opto Semiconductors GmbH (Germany); Kei May Lau, Hong Kong Univ. of Science and Technology (Hong Kong, China); Kurt J. Linden, N2 Biomedical (USA); Tien-Chang Lu, National Chiao Tung Univ. (Taiwan); Joongseo Park, LG Electronics Inc. (Korea, Republic of); E. Fred Schubert, Rensselaer Polytechnic Institute (USA); Ross P. Stanley, Ctr. Suisse d’Electronique et de Microtechnique SA (Switzerland); Klaus P. Streubel, OSRAM AG (Germany); Tetsuya Takeuchi, Meijo Univ. (Japan); Dong-Sing Wuu, National Chung Hsing Univ. (Taiwan)

Light-emitting diodes (LEDs) have been evolving as the dominant light source in mobile phones, LCD displays, automobiles, and architectural lighting. The availability of devices emitting in the full visible color range including white, ultraviolet, and infrared enables a variety of exciting applications.

Novel materials and device architectures combined with increasingly sophisticated manufacturing pro-cesses promise low-cost solid-state light sources with high efficiency and luminous flux. With the recent advances in efficiency, output power, and white qual-ity, LEDs are seriously competing with conventional lighting technologies in all areas of lighting including the huge general lighting market.

The objective of this conference is to bring together scientists working on material and device aspects of LEDs, OLEDs, and solid-state lighting, and to review the current state of the art in efficiency, color quality, reliability, and other relevant factors. Theoretical and experimental papers will include, but will not be limited to the following areas:

LED APPLICATIONS AND SOLID-STATE LIGHTING• LEDs for SSL, quality of white light, phosphors

for SSL, packages for SSL, white binning.

NOVEL TECHNOLOGIES FOR LED DESIGN AND FABRICATION• simulations and optimization of LED• novel LED fabrication methods.

HIGH CURRENT PERFORMANCE AND “DROOP” IN INGAN LEDS• fundamental physics and modeling• droop-free and droop-optimized structures.

LED MANUFACTURING• MOVPE, MBE, HVPE• LED processing (etching, bonding, patterning,

novel processes)• LED packaging.

NOVEL SUBSTRATES FOR LED EPISTRUCTURE GROWTH• non-polar substrates• LEDs on silicon.

OLEDS AND OLED LIGHTING• materials, structures, LED efficiency, device

lifetime, white light.

NANOMATERIALS AND NANOSTRUCTURES FOR LEDS• nanowires, quantum dots, low-dimensional

structures• photonic crystals and surface plasmons• nano-phosphors.

UV/DUV-EMITTING LEDS• LEDs for near- and deep-UV emission• applications for UV/DUV LEDs.

NIR/IR-EMITTING LEDS• LEDs for near-IR and IR emission including

arsenides and phosphides• applications for NIR/IR LEDs.


LASER MICRO-/NANOENGINEERING

Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXI (LA110)

Conference Chairs: Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland); Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany); Costas P. Grigoropoulos, Univ. of California, Berkeley (USA); Tetsuya Makimura, Univ. of Tsukuba (Japan)

Program Committee: Craig B. Arnold, Princeton Univ. (USA); J. Thomas Dickinson, Washington State Univ. (USA); Jan J. Dubowski, Univ. de Sherbrooke (Canada); Bo Gu, Bos Photonics (USA); Henry Helvajian, The Aerospace Corp. (USA); Sami T. Hendow, Adaptive Laser Processing (USA); Guido Hennig, Daetwyler Graphics AG (Switzerland); Michel Meunier, Ecole Polytechnique de Montréal (Canada); Yoshiki Nakata, Osaka Univ. (Japan); Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan); Alberto Piqué, U.S. Naval Research Lab. (USA); Gediminas Ra?iukaitis, Ctr. for Physical Sciences and Technology (Lithuania); Andrei V. Rode, The Australian National Univ. (Australia); Klaus Sokolowski-Tinten, Univ. Duisburg-Essen (Germany); Razvan Stoian, Lab. Hubert Curien (France); Koji Sugioka, RIKEN (Japan); Xianfan Xu, Purdue Univ. (USA); Steven M. Yalisove, Univ. of Michigan (USA)

The aim of this conference is to provide a forum for discussion of fundamentals, methods, and techniques in laser materials processing and their relation to the applications and manufacturing of micro- and nanoscale electronic, photonic, optical, mechanical, fluidic, energy, and hybrid devices. Topics cover process development and applications for technical and consumer electronics as well for medical devices.

Papers are solicited on, but not limited to, the follow-ing topics within the broad area of microelectronics and optoelectronics manufacturing:• fundamental aspects of laser-materials

interaction• generation and dynamics of laser ablation

plumes, including gas-dynamic effects, charge generation, and charge transfer

• modeling of laser-materials and laser-plume interactions for quantitative prediction of process parameters

• laser processing from cw to fs time scales• laser processing across wavelength scales from

VUV to IR• laser modification of materials (annealing,

doping, intermixing, photosensitivity)• laser cleaning, texturing, bending, and repair• laser microscale materials processing and

manufacturing• laser nanoscale materials processing and

manufacturing, including near-field nano-optical lithography

• pulsed-laser deposition, laser-assisted thin-film epitaxy, atomic-layer epitaxy, resonant infrared pulsed-laser deposition, thin film and wafer processing

• direct-write technologies• laser additive manufacturing and rapid

prototyping• parallel laser manufacturing• digital photonic production

• laser manufacture of MEMS and microsystems, including microfluidic chips

• laser processing in microelectronic and optoelectronic manufacturing, including laser micro processing of electronic or optoelectronic material for advanced devices and integrated systems

• laser-induced modification of glasses or transparent materials for applications in optoelectronic and photonics

• novel laser systems and optics for materials processing and device fabrication.

JOINT SESSION WITH LA110 AND LA111Photovoltaics, Alternative Energy Sources, and Advanced Energy Storage SystemsThis session is addressed to recent progresses in la-ser-assisted development and fabrication of advanced solar cell devices, energy sources, and advanced energy storage systems and materials. A broad range of advanced laser processes are of interest including materials research and applications such as hole drill-ing, groove formation, edge isolation, cutting, doping, soldering, and laser thin film ablation for silicon or or-ganic solar cells, energy source, and advanced energy storage systems (e.g. lithium-ion batteries).

JOINT SESSION WITH LA110 AND LA112Laser Modification of NanomaterialsThe intent of this session is to present recent research in laser interactions with nanomaterials for the devel-opment of new laser-based processing techniques. This includes laser interactions with nanomaterials resulting in physical transformations such as melting, alloying, shaping, welding, sintering, and solidification, laser-induced chemical modifications to nanomateri-als, mechanisms of laser-induced defect generation or healing, laser processing techniques to move, self-assemble, or separate nanomaterials, as well as laser-based processing techniques for producing plasmonic nanostructures.

COSPONSORS:


CALL FOR PAPERS

JOINT SESSION WITH LA110 AND LA113Additive Manufacturing and 3D PrintingThe intent of this session is to present research in additive manufacturing and 3D printing. This includes laser-based digital fabrication techniques and pro-cesses, which offer the greatest versatility and range in terms of feature size (nano to micro), material type (from metals and ceramics to organics), phase (bulk to porous, homogenous to graded compositions), and processing options (from ablative to sintering and physical to chemical modification).

JOINT SESSIONS WITH LA110 AND LA115Ultrafast Laser MicromachiningThis session will address important emerging technol-ogies at the picosecond, femtosecond and attosecond time scale, for a broad audience of researchers in the fields of ultra-fast lasers and laser processing, together with experts at the forefront of alternative micro- and nanofabrication technologies. The topics will cover, but will not be limited to, fundamentals of ultra-fast laser-matter interaction and novel machining techniques.

BEST STUDENT PRESENTATION AWARDSupported by the conference cosponsors, we will offer awards for the best oral and poster presen-tations given by students. Student contributions will be judged based on scientific content and quality of presentation, and the winners will be honored with a cash prize. To be eligible for the awards, you must:• be a graduate or undergraduate full-time

student• have conducted the majority of the work to

be presented• submit your abstract online by the deadline• be the primary author• select “Yes” when asked if you are a full-time

student• select yourself as the speaker• be accepted to present in conference LA110• submit your manuscript online by the deadline• make the oral presentation.

Note that prior prize holders will not be eligible. IMPORTANT DATESAbstracts Due: 3 AUGUST 2015Author Notification: 12 OCTOBER 2015Manuscript Due Date: 20 JANUARY 2016Please Note: Submissions imply the intent of at least one author to register, attend the conference, present the paper as scheduled, and submit a full-length manuscript for publication in the conference proceedings.



Laser-based Micro- and Nanoprocessing X (LA111)

Conference Chair: Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

Conference Co-Chairs: Kunihiko Washio, Paradigm Laser Research Ltd. (Japan); Craig B. Arnold, Princeton Univ. (USA)

Program Committee: Antonio Ancona, CNR-Institute for Photonics and Nanotechnologies (Italy); Arkadiusz J. Antonczak, Wroclaw Univ. of Technology (Poland); Jiyeon Choi, Korea Institute of Machinery & Materials (Korea, Republic of); Francois Courvoisier, Univ. de Franche-Comté (France); Miguel Holgado Bolaños, Univ. Politécnica de Madrid (Spain); Minghui Hong, National Univ. of Singapore (Singapore); Rainer Kling, ALPhANOV (France); Andres F. Lasagni, Technische Univ. Dresden (Germany); Yongfeng Lu, Univ. of Nebraska-Lincoln (USA); Andreas E. H. Oehler, Time-Bandwidth Products JDSU (Switzerland); Yasuhiro Okamoto, Okayama Univ. (Japan); Roberto Osellame, Politecnico di Milano (Italy); Andreas Ostendorf, Ruhr-Univ. Bochum (Germany); Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany); Alberto Piqué, U.S. Naval Research Lab. (USA); Martin Sharp, Liverpool John Moores Univ. (United Kingdom); Razvan Stoian, Lab. Hubert Curien (France); Koji Sugioka, RIKEN (Japan); Hong-Bo Sun, Jilin Univ. (China); Jorma Vihinen, Tampere Univ. of Technology (Finland); Akira Watanabe, Tohoku Univ. (Japan); Michael J. Withford, Macquarie Univ. (Australia); Xianfan Xu, Purdue Univ. (USA); Haibin Zhang, Electro Scientific Industries, Inc. (USA); Haiyan Zhao, Tsinghua Univ. (China)

Cutting-edge technological visions and applications are increasingly based on micro- and nano-system technologies. The realization of such devices or functional prototypes is often a new challenge for patterning, structuring, and processing. Scientists and engineers are increasingly confronted with tasks that cannot be accomplished with conventional tools.

Demands in high-tech industries are growing for specialized prototypes and high-throughput devices with micro- and nano-scaled structures, including fluidic, biologic, chemical, electronic, mechanical, or photonic features. Nano-materials and nano-pattern-ing technologies increasingly coexist with micro-ma-terials and micro-structuring technologies, leading not only to new applications and research fields but also to new challenges for appropriate assembly and processing technologies.

Laser-assisted applications emerge as an increasingly important technology which can be established in new technical approaches, in order to overcome apparent process limitations on nearly each material and for different scaling lengths. The aim of this con-ference is to bring together scientists and engineers working on laser-based processes on micro- and nano-meter scales for advanced applications, such as photovoltaics, energy storage systems, photonic de-vices (LED, OLED), MOEMS, MEMS/bio-MEMS, NEMS, micro- and nano-fluidic devices, analytical systems (e.g. lab-on-chip), or bio-compatible devices. High throughput laser processing with high-speed scan-ners and advanced parallel processing techniques for improving the yield in the laser processes.

Papers are solicited on the following application-ori-ented topics and other laser processing related issues:• Fundamental physical and chemical issues

in laser-based micro- and nano-fabrication, processing, 3D laser processing and assembly.

• Laser material processing for metals, polymers, ceramics, semiconductors, or dissimilar materials- laser ablation (cutting, scribing, dicing, drilling,

and cleaving).- laser joining (welding, soldering, bonding,

splicing, and sealing).- laser transformations and modification for

integrated device functionalities (annealing, curing, alloying, doping, metallization, cleaning, polymerization, sintering, cladding, bending, forming change of chemical/physical properties, and transferring).

- laser ablation and micro- and nano-machining relevant for device fabrication and processing (drilling, marking, engraving, milling, caving, texturing, trimming, deflashing, and lithography).

- laser surface structuring in the micro- and nano-meter scales (texturing, interference patterning, laser induced periodic surface patterns).

• Laser processes for alternative energy sources and advanced energy storage systems (e.g. lithium-ion batteries), power-electronics devices, high-brightness white LEDs, photovoltaics processing, including contact formation, laser-assisted selective metallization, edge isolation, thin film processing, and soldering etc.

• Laser processing and packaging of thin and flexible advanced electronic, optoelectronic, and photonic components, including OLED.

• Structuring, packaging, and assembling of components in micro-reaction technology, micro-electronic and photonic devices, MOEMS, MEMS/bio-MEMS, NEMS , micro- and nano-fluidic devices and analytical systems (e.g. lab-on-chip).

• High speed laser beam engineering systems, advanced adaptive optics and beam engineering methods for improving laser processes, yields, and throughput.

• Innovative “green photonics” for micro- and nano-processing and assembly.


CALL FOR PAPERS

Synthesis and Photonics of Nanoscale Materials XIII (LA112)

Conference Chairs: Andrei V. Kabashin, Aix-Marseille Univ. (France); David B. Geohegan, Oak Ridge National Lab. (USA); Jan J. Dubowski, Univ. de Sherbrooke (Canada)

Program Committee: Jason D. Fowlkes, Oak Ridge National Lab. (USA); Reuven Gordon, Univ. of Victoria (Canada); Costas P. Grigoropoulos, Univ. of California, Berkeley (USA); Richard F. Haglund Jr., Vanderbilt Univ. (USA); Henry Helvajian, The Aerospace Corp. (USA); Hiroshi Kumagai, Kitasato Univ. (Japan); Thomas K. Lippert, Paul Scherrer Institut (Switzerland); Yongfeng Lu, Univ. of Nebraska-Lincoln (USA); Rajesh Menon, The Univ. of Utah (USA); Rahul Rao, Honda Research Institute USA, Inc. (USA); Federico Rosei, Univ. du Québec (Canada); James P. Schuck, The Molecular Foundry (USA); Oleksandr Voznyy, Univ. of Toronto (Canada); Xianfan Xu, Purdue Univ. (USA)

This conference is dedicated to the use of lasers in nanoscience, and the exploration of their unique capabilities to synthesize, characterize, modify, and manipulate nanostructures and their interaction with their local environment. Lasers are not only powerful tools for the nonequilibrium synthesis of unique nanostructures by pulsed laser vaporization, depo-sition, and surface processing but they also provide sensitive spectroscopic probes of the novel electronic and vibrational properties of nanoscale materials and energy transfer within their architectures. This fundamental understanding of nanostructure syn-thesis and properties not only provides the means to remotely characterize nanomaterials using optical spectroscopy, but for remote manipulation and con-trol over their size, shape, orientation, and alignment. Understanding the dynamics of laser processing at nanoscale dimensions is essential to explore new laser welding, cutting, doping, alloying, patterning and intermixing methods for nanomaterials to form novel new architectures to enable applications rang-ing from biodetectors to photovoltaics and other energy materials.

This symposium crosscuts nanoscience research in materials science, chemistry, biology, physics, and engineering to explore new laser-based techniques for synthesis, characterization, manipulation, and control of nanostructures.

Papers are solicited on the following topics:• laser-based synthesis/diagnostics of

nanostructure growth: from 0D and 1D nanomateriasl such as nanocrystals, nanoparticles, quantum dots, nanohorns, nanowires, nanotubes, to 2D nanosheets such as graphene, metal chalcogenides, to heterostructures of nanomaterials, including multi-element (semiconductor) materials, polymers, and composites

• laser characterization of nanostructures, including electronic excitations and vibrational dynamics by photoluminescence, Raman scattering, transient ultrafast absorption, and nonlinear spectroscopic techniques

• plasmonic nanostructures• laser-nanomaterial interactions: fundamental

science (e.g. probing melting at the nanoscale)

• laser-based surface modification and size manipulation of individual nanostructures (i.e. shaping, cutting, melting/recrystallization, doping, welding)

• laser-processing to create nanostructured surfaces, including sub-λ ablation, machining, LIPSS

• laser-control of optical, electrical and magnetic properties of nanostructures and their devices by impurity doping, impurity-free processing, and bandgap engineering

• laser-tuning of quantum dot emission wavelength

• laser-based methods for biomolecule detection using nanoparticles and nanowires

• laser photo-control of physical and chemical properties of nanostructures for catalysis, photovoltaics, photonics

• femtosecond laser interactions/advantages in nanoscale laser processing.

JOINT SESSION WITH LA110 AND LA112Laser Modification of NanomaterialsThe intent of this session is to present recent research in laser interactions with nanomaterials for the devel-opment of new laser-based processing techniques. This includes laser interactions with nanomaterials resulting in physical transformations such as melting, alloying, shaping, welding, sintering, and solidification, laser-induced chemical modifications to nanomateri-als, mechanisms of laser-induced defect generation or healing, laser processing techniques to move, self-assemble, or separate nanomaterials, as well as laser-based processing techniques for producing plasmonic nanostructures.




Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX (OE118)

LITHOGRAPHIC FABRICATION APPROACHES• fabrication methodologies based on binary,

grayscale, interferometric, and laser direct-write techniques

• additional techniques, such as additive lithography, and lift-off processes for sub-micron patterning.

ELECTRON AND ION BEAM FABRICATION OF MICRO- AND NANO-OPTICS• single and multilayer resists• analog and multi-exposure methods• unique patterning and beam controls• three-dimensional structuring.

ULTRAFAST LASER MICROMACHINING• surface and bulk micromachining for micro-

and nano-optics, fabrication of 2D and 3D waveguides, and the fabrication of novel optical elements.

ETCHING TECHNOLOGIES• reactive ion etch (RIE) and chemically assisted

etching of analog surfaces and high-aspect ratio structures

• focused ion beam and plasma jet etching• processing of micro/nano optics and photonics

in glass, silicon, and III-V and II-VI materials.

DEPOSITION AND GROWTH TECHNOLOGIES• self-assembly and nucleation site control (2D

and 3D)• atomic-layer deposition• lithographically defined selective growth• pre-patterned and strain engineered templates.

MATERIALS ISSUES AND TECHNOLOGIES FOR POLYMERIC AND SOL-GEL MICRO- AND NANO-OPTICS• LIGA, SLIGA, and related processes• sol-gel processing methods for free-space and

guided wave optics• polymer replication• novel photoresists.

PROCESSING OF NANOPHOTONIC DEVICES• holographic lithography and multi-beam

exposure methods for photonic crystals and metamaterials

• patterning and etching of multilayer DBR structures

• porous silicon• selective etching techniques for 2D and 3D

photonic crystal and metamaterials fabrication• fabrication of polarization optics• nano-patterning for site selective growth• texturing and patterning for enhanced light

extraction• fabrication of plasmonic devices• quantum device fabrication for micro and nano-

devices.

MICRO- AND NANO-OPTICAL INTEGRATION AND MANUFACTURING• passive and/or active integration• quality and metrology issues• volume fabrication techniques for micro- and

nano-optics and photonics.

COSPONSOR:

Conference Chairs: Georg von Freymann, Technische Univ. Kaiserslautern (Germany); Winston V. Schoenfeld, CREOL, The College of Optics and Photonics, Univ. of Central Florida (USA); Raymond C. Rumpf, The Univ. of Texas at El Paso (USA)

Program Committee: Cornelia Denz, Münster Univ. (Germany); Ruth Houbertz, Multiphoton Optics GmbH (Germany); Saulius Juodkazis, Swinburne Univ. of Technology (Australia); Stephen M. Kuebler, CREOL, The College of Optics and Photonics, Univ. of Central Florida (USA); Akhlesh Lakhtakia, The Pennsylvania State Univ. (USA); Robert R. McLeod, Univ. of Colorado at Boulder (USA); Hernán R. Míguez, Institute of Materials Science of Seville (Spain); Dennis W. Prather, Univ. of Delaware (USA); Aaron J. Pung, Clemson Univ. (USA); John A. Rogers, Univ. of Illinois at Urbana-Champaign (USA); Thomas J. Suleski, The Univ. of North Carolina at Charlotte (USA); Michael Thiel, Nanoscribe GmbH (Germany); Sandra Wolff, Technische Univ. Kaiserslautern (Germany)

Technologies for fabrication of optics and photonics at the micro- and nano-scales continue to advance and diversify due to rising demands for miniatur-ization, cost reduction, functional integration, and increased performance in optical and photonic sys-tems. Examples include diffractive optics, sub-wave-length optics, microrefractive optics, optical wave-guides, photonic crystals, photonic metamaterials, plasmonic devices, and heterogeneously integrated active and passive micro- and nano-optical devices. These devices are playing increasing roles in a wide range of applications, including sensors, communi-cations, imaging, biomedical, data storage, photo-voltaics and other areas.

Both conventional and unconventional micro- and nano-fabrication techniques serve as fundamental enablers for wide ranges of passive and active optical components and devices. To this end, this conference provides a forum for exchange of viewpoints and re-ports on new techniques and advances in fabrication methods for optics and photonics at the micro- and nano-scales. Applications enabled through these novel fabrication processes are also appropriate.

Topics of interest include, but are not limited to:

NON-CONVENTIONAL LITHOGRAPHY AND NOVEL APPROACHES• DNA based plasmonic self-assembly• nano-imprint lithography• plasmonic lithography• dip-pen lithography• two-photon processes for two-dimensional and

three-dimensional micro- and nanostructures• ink jet printing• soft-lithography• STED inspired lithography• assembly via optical tweezers• lithography with structured light.


CALL FOR PAPERS

JOINT SESSION WITH OE118 AND OE120Advanced Fabrication using a Digital Micromirror Device or MEMS ArrayActive research in the fields of advanced fabrication and MEMS Arrays, such as the digital micromirror device, have shown application and promise for implementing lithography and other forms of high precision printing. The purpose of this joint session is to explore the relationships between MEMS tech-nology and fabrication as they relate to:• 3D printing• additive manufacturing• lithography• structured light.

JOINT SESSION WITH OE118 AND LA1133D PrintingThe purpose of this joint session is to emphasize the growing field of laser printing/fabrication of micro/nano optics and photonics.

BEST PAPER AWARDSWe are pleased to announce that a cash prize, sponsored by Nanoscribe GmbH, will be awarded to the best paper and best student paper in this conference. Qualifying papers will be evaluated by the awards committee. Manuscripts will be judged based on scientific merit, impact, and clarity. The winners will be announced during the conference and the presenting authors will be awarded a cash prize.

To be eligible for the Best Paper Award, you must:• be listed as an author on an accepted paper

within this conference• have conducted the majority of the work to

be presented• submit your manuscript online by 20 January

2016• present your paper as scheduled.

To be eligible for the Best Student Paper Award, you must:• be a student without a doctoral degree

(undergraduate, graduate, or PhD student)• submit your abstract online, and select “Yes”

when asked if you are a full-time student, and select yourself as the speaker

• be the presenting author on an accepted paper within this conference

• have conducted the majority of the work to be presented

• submit your manuscript online by 20 January 2016

• present your paper as scheduled.

NominationsAll submitted papers will be eligible for the awards if they meet the above criteria.



LASER APPLICATIONS

Laser 3D Manufacturing III (LA113)

Conference Chairs: Henry Helvajian, The Aerospace Corp. (USA); Alberto Piqué, U.S. Naval Research Lab. (USA); Bo Gu, Bos Photonics (USA)

Program Committee: John T. Fourkas, Univ. of Maryland, College Park (USA); Youping Gao, Aerojet Rocketdyne (USA); Craig Goldberg, Newport Corp. (USA); Weidong Huang, Northwestern Polytechnical Univ. (China); Jian Liu, PolarOnyx, Inc. (USA); Michael Thiel, Nanoscribe GmbH (Germany); Paul S. Unwin, Stanmore Implants (United Kingdom); Augustine M. Urbas, Air Force Research Lab. (USA); Martin Wegener, Karlsruher Institut für Technologie (Germany)

Additive manufacturing and 3D printing are revolu-tionizing the way objects can be fabricated. Leading this revolution are laser-based digital fabrication techniques and processes, which offer the greatest versatility and range in terms of feature size (nano to macro), material type (from metals and ceramics to organics), phase (bulk to porous, homogenous to graded compositions), and processing options (from ablative to sintering and physical to chemical modification).

This conference will provide a common forum for various laser-based disciplines that promise to yield advances in manufacturing that will accelerate the mass-customization of products. Examples of these disciplines include laser free-form fabrication which involve additive and subtractive techniques to per-mit the development of solid objects that cannot be manufactured using traditional approaches. Also considered are laser-based materials processing techniques that rely on light-matter interaction phe-nomena to achieve transformative effects. Another example includes the interaction of lasers with func-tional or advanced materials to yield structures with a desired functional property and very high specificity. Many of these materials also have protean (mutable, changeable) properties that could be induced via light-matter interaction “upon command.” Common to all these processes is their operation under com-puter control without requiring part specific tooling or special fixturing. All these and other laser-based processing disciplines are enablers for the revolution in manufacturing offered by direct 3D fabrication.

The primary goal of this conference is to provide a forum for professionals in materials science, laser processing physics/chemistry, mechanical engineer-ing, design tools, software modeling, characterization and metrology to share and discuss the latest ad-vances in the field of laser-based manufacturing. This gathering will offer a unique opportunity to join the discussion for the development and implementation of next generation laser-based 3D manufacturing processes.

Joint Sessions with LAMOM (LA110), Synthesis and Photonics of Nanoscale Materials (LA112) and Ad-vanced Fabrication Technologies for Micro/Nano Optics and Photonics (OE118) are planned. These joint sessions will bridge other technologies relevant to laser 3D manufacturing such as fundamentals of laser processing, nanoscale processing and fabrication of micro/nano optics. Future joint sessions with material developers will also be planned.

Papers are solicited on the following topics:• applications of laser-based 3D manufacturing• laser-based solid freeform fabrication• selective laser sintering (SLS)• direct metal laser sintering (DMLS)• selective laser melting (SLM)• laser cladding• stereolithography (SLA)• multi-photon polymerization• laser direct-write and laser induced forward

transfer (LIFT)• laser-based bioprinting• bio-inspired processing techniques• biomedical structures and devices generated by

laser digital fabrication• laser manufacturing of materials with graded or

heterogeneous composition• laser induced phase transformations to realize

specific material properties• lasers, materials and process controls for

additive manufacturing• effects of laser processing conditions on

mechanical behavior• scale-up and overcoming product throughput

barriers• development of standards and structure

validation• laser-materials processing interactions,

modeling, and simulation.

COSPONSORS:


CALL FOR PAPERS

Free-Space Laser Communication and Atmospheric Propagation XXVIII (LA114)

Conference Chairs: Hamid Hemmati, Facebook Inc. (USA); Don M. Boroson, MIT Lincoln Lab. (USA)

Program Committee: Abhijit Biswas, Jet Propulsion Lab. (USA); Donald M. Cornwell Jr., NASA Goddard Space Flight Ctr. (USA); Olga Korotkova, Univ. of Miami (USA); William S. Rabinovich, U.S. Naval Research Lab. (USA); Zoran Sodnik, European Space Research and Technology Ctr. (Netherlands); Morio Toyoshima, National Institute of Information and Communications Technology (Japan)

This conference will provide a forum for all pro-fessionals involved in technologies related to free-space laser communications, and broadband optical communications. The conference will cover subjects related to the latest research and tech-nology advances, and provide an overview useful to lasercom specialists, technology managers, and THz/mm-wave communication engineers. Papers are encouraged on ongoing laser communication programs, free-space laser communication system requirements, technology and subsystem advance-ments, and in-depth analysis of present status and future trends. Original papers are solicited on, but are not limited to, the following topics:

FREE-SPACE LASER COMMUNICATION TECHNOLOGIES AND ATMOSPHERIC PROPAGATION• present and future laser communication

systems; space-based systems, airborne links terrestrial/indoor/commercial links

• next generation lasercom technologies• modulation and error correction encoding• pointing, acquisition, and tracking• atmospheric propagation, transmission effects,

and compensation techniques• transmitters for space, receivers, subsystems,

optical and optoelectronic components• flight qualification, lifetime and reliability• ground receivers, particularly low-cost large

apertures (telescope, dome, gimbal)• optics for electronic module interconnects• quantum communication and cryptography• global communications systems that make use

of wireless-terrestrial, air, and space optical connections.


LASER APPLICATIONS

Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVI (LA115)

Conference Chairs: Alexander Heisterkamp, Leibniz Univ. Hannover (Germany); Peter R. Herman, Univ. of Toronto (Canada); Michel Meunier, Ecole Polytechnique de Montréal (Canada); Stefan Nolte, Friedrich-Schiller-Univ. Jena (Germany)

Program Committee: Craig B. Arnold, Princeton Univ. (USA); Denise M. Krol, Univ. of California, Davis (USA); Yves Bellouard, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Eric Mazur, Harvard Univ. (USA); Eric P. Mottay, Amplitude Systèmes (France); Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland); Roberto Osellame, CNR-Istituto di Fotonica e Nanotecnologie (Italy); Christopher B. Schaffer, Cornell Univ. (USA); Koji Sugioka, RIKEN (Japan); Alfred Vogel, Univ. zu Lübeck (Germany); Sascha Weiler, TRUMPF Inc. (USA); Dvir Yelin, Technion-Israel Institute of Technology (Israel)

Recent advances in ultrafast laser technology have resulted in widespread availability of robust, prac-tical laser sources. As a result, useful applications for these sources have emerged in many different fields, from micromachining and THz-imaging to nonlinear microscopy and semiconductor testing to laser surgery and communications. Now in its sixteenth year, this conference is the premier venue for discussing the development of new ultrafast laser sources, the manipulation and characterization of ultrashort pulses as well as their use in biomedical, scientific and industrial applications. We anticipate a larger conference than ever that will bring together a multi-disciplinary group consisting of university researchers from diverse fields, as well as scientists and engineers from industry. A program that includes invited and tutorial presentations will provide the context for contributed talks and posters, and for stimulating discussions.

We encourage submission of papers on all aspects of applications of ultrafast lasers and on ultrafast laser technology development. In addition, all graduate and undergraduate students are encouraged to enter their submissions in the Student Competition for best presentation. General topics include, but are not limited to, the following areas:• emerging ultrafast laser technologies and novel

systems • ultrafast laser source engineering for industrial

and biomedical use • characterization and measurement of ultrashort

pulses• ultrashort pulse delivery and beam manipulation • ultrashort pulse propagation and nonlinear

effects in materials • interaction of ultrashort pulses with materials • surface and bulk micromachining using ultrafast

lasers • interactions and modification of biological

tissues

• tissue and surgical applications of ultrashort pulse lasers

• optical manipulation of biological systems with ultrashort pulses

• micro and nano manipulation of cells and organelles, optical transfection

• ultrafast lasers in plasmonics, interaction with nanoparticles

• novel medical applications of ultrafast lasers • applications and generation of x-ray ultrashort

pulses.

CONFERENCE HIGHLIGHTS In addition to the exciting technical program that has been the hallmark of previous years, we plan several highlights this year:• Joint sessions with LA110, addressing the field of

laser processing by ultrashort lasers • Joint session on Sunday with BiOS BO300

covering recent advances in imaging and manipulation of cells and tissues using ultrashort laser pulses

• Session hosting the best student competition, awarding the best student paper.

JOINT SESSIONS WITH LA110 AND LA115Ultrafast Laser MicromachiningThis session will address important emerging technol-ogies at the picosecond, femtosecond and attosecond time scale, for a broad audience of researchers in the fields of ultra-fast lasers and laser processing, together with experts at the forefront of alternative micro- and nanofabrication technologies. The topics will cover, but will not be limited to, fundamentals of ultra-fast laser-matter interaction and novel machining techniques.

JOINT SESSIONS WITH BIOS BO300 AND LA115Ultrafast Laser Interaction with Tissues and CellsThese sessions will deal with the emerging optical technologies based on ultrafast laser interaction with tissues and cells for biomedical applications. These sessions will occur on Sunday, in good overlap with sessions of other BiOS conferences. The topics will cover but will not be limited to, fundamentals and ap-plications of ultrafast laser-imaging, manipulation and modification of cells or tissues, like optical transfec-tion, nerve generation, interaction with nanoparticles and multiphoton imaging.


CALL FOR PAPERS

STUDENT COMPETITION Thanks to generous corporate sponsorship, we are happy to announce that a student competition will be held again this year. Due to the great success in previous years, the competition will be a gen-eral best student award, taking posters and talks into account. The winner will be announced and awarded a $1000 cash prize to the best student paper, with the runner-up students receiving a cash prize as well.

Judging and RequirementsPapers submitted by graduate and undergradu-ate students are eligible. In order to ensure a fair evaluation the conference chairs and the program committee will judge the students within a special session held during the conference. Here, the students have to present a brief summary of their original talk or poster presented at our conference with a time limit of 5 minutes. Presentations will be judged based on content, scientific impact, orga-nization, quality of presentation, and presenter’s mastery of the subject. Candidates for the award need to be the presenting author, a full-time student, must have conducted the majority of the research presented in the paper, and must submit their manuscript to the conference proceedings.

NominationsTo be considered, submit your abstract online, select “Yes” when asked if you are a full-time stu-dent, and select yourself as the speaker. Note that prior first prize holders may participate, but will not be eligible for a cash prize. Please be aware, that the submission of a manuscript to the SPIE Proceedings is mandatory to be able to take part.



LASER APPLICATIONS

High-Power Laser Materials Processing: Lasers, Beam Delivery, Diagnostics, and Applications V (LA116)

Conference Chairs: Friedhelm Dorsch, TRUMPF Laser- und Systemtechnik GmbH (Germany); Stefan Kaierle, Laser Zentrum Hannover e.V. (Germany)

Program Committee: Bo Gu, Bos Photonics (USA); Klaus Kleine, Coherent, Inc. (USA); Annett Klotzbach, Fraunhofer IWS Dresden (Germany); Wolfgang Knapp, Cooperation Laser Franco-Allemande (France); Lin Li, The Univ. of Manchester (United Kingdom); Silke Pflueger, DirectPhotonics, Inc. (USA); Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany); Leonardo D. Scintilla, Politecnico di Bari (Italy); Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

High-power lasers are used in a multitude of industrial settings. There are several key laser technologies em-ployed for materials processing and each laser type, wavelength and architecture has its advantages and key applications where it excels. The laser, however, is only part of the story. Delivering the beam to the work piece, and monitoring both the beam characteristics, as well as the process, are important enablers for any given application.

This conference will explore high-power lasers, how their radiation is shaped and delivered to the work piece, how the process is monitored, and, in general, their use in the world of industrial materials processing. Preference will be given to “real world” industry-related submissions. Papers are solicited on a wide range of topics related to the conference title, including but not limited to the following:

LASERS AND LASER SYSTEMS FOR MATERIALS PROCESSING, OPERATED IN CW AS WELL AS IN PULSED MODE:• disk• fiber• direct diode• CO2• operating in any wavelength range from IR to

UV.

BEAM DELIVERY: • processing heads and accessories for cutting,

welding, material deposition (LMD) and surface treatment

• scanning heads• beam shaping and guiding devices, including

fibers, connectors, and accessories• fibers and components for high peak power

usage• thermal lensing and optics design approaches.

DIAGNOSTICS: • laser-beam characterization and measurement

of laser-beam parameters• laser material interaction• process monitoring• vision systems and tracking• destructive and non-destructive quality testing

methods• surface diagnostics• coupling experiments and simulations• high-speed imaging• particulate diagnostics• systems considerations.

APPLICATIONS:• all types of laser welding, including remote

welding and hybrid welding• brazing / soldering• joining of non-ferrous and dissimilar materials• laser applications for light-weight materials (e.g.

cutting, structuring, joining)• laser processes for battery manufacturing• laser metal deposition• hardening• cladding• cleaning and structuring• surface treatment• cutting, including remote cutting• drilling• rapid prototyping and manufacturing.

JOINT SESSIONS WITH LA102 (BEAM SHAPING COMPONENTS) AND LA113 (LASER 3D-MANUFACTURING) Joint Session will be held to accommodate pre-sentations that cover the aspects of the respective conferences.


CALL FOR PAPERS


Complex Light and Optical Forces X (OE123)

Conference Chairs: Jesper Glückstad, Technical Univ. of Denmark (Denmark); David L. Andrews, Univ. of East Anglia (United Kingdom); Enrique J. Galvez, Colgate Univ. (USA)

Program Committee: Robert R. Alfano, The City College of New York (USA); Cornelia Denz, Westfälische Wilhelms-Univ. Münster (Germany); Kishan Dholakia, Univ. of St. Andrews (United Kingdom); Wolfgang A. Ertmer, Leibniz Univ. Hannover (Germany); Andrew Forbes, CSIR National Laser Ctr. (South Africa); Jörg B. Götte, Max-Planck-Institut für Physik komplexer Systeme (Germany); David G. Grier, New York Univ. (USA); Rüdiger Grunwald, Max-Born-Institut für Nichtlineare Optik und Kurzzeitspektroskopie (Germany); Jandir M. Hickmann, Univ. Federal do Rio Grande do Sul (Brazil); Thomas R. Huser, Univ. Bielefeld (Germany); Lorenzo Marrucci, Univ. degli Studi di Napoli Federico II (Italy); Miles J. Padgett, Univ. of Glasgow (United Kingdom); Darwin Palima, Technical Univ. of Denmark (Denmark); Monika Ritsch-Marte, Medizinische Univ. Innsbruck (Austria); Halina H. Rubinsztein-Dunlop, The Univ. of Queensland (Australia); Marat S. Soskin, Institute of Physics (Ukraine); Grover A. Swartzlander Jr., Rochester Institute of Technology (USA); Nirmal K. Viswanathan, Univ. of Hyderabad (India)

Complex light – light with structured wavefronts, amplitudes, phases and polarization – is the common theme in a rapidly expanding number of areas in op-tics. Fundamental topics in this field include: classical and quantum aspects of the spin and orbital angular momentum of light; spin-orbit effects; optical beams with structured wavefronts and polarization distribu-tions; high-order modes and their generation meth-ods; optical waves that have singularities of phase and polarization; monochromatic and multichromatic vortices; vortex loops and knots; novel propagation dynamics; the interaction between singularities; new topological effects of multidimensional mode spac-es; the interactions of complex light with rotating optical elements and in laser cavities; and the encod-ing of spatial modes onto light for communication. These studies also link significantly into other fields including optical trapping, lab-on-a-chip fluidics, microrheology, and cold atoms. Increasing interest in quantum information has also led to developments in the multimode encoding of quantum information, quantum communication, quantum imaging, the use of orbital angular momentum quantum eigenstates for quantum computing, and new fundamental tests of quantum mechanics.

The complex light fields that can now be routinely produced offer an unprecedented level of control for probing and exerting forces on matter at the microscale and nanoscale level. The applied topics of this conference include the study of novel ways to manipulate matter with optical fields, and to organize, rotate, bind, channel or sort microscale or nanoscale objects. The applications of optical forces

on matter generally engage light fields with special structures. Optical tweezers today offer exquisite control over microscopic objects using methods based on intensity and phase differentials. They are also used to generate beams with vortices, singulari-ties and other kinds of phase structure: hollow beams; tailor-made three-dimensional optical traps; sheets of light; curved focus beams and evanescent waves. The optical elements associated with the production and detection of such beam structures themselves have significant imaging applications. Through the exchange of linear or angular momentum between light and matter, optical force fields and torques can be produced with no conventional counterpart. Many of these methods offer new opportunities for implementation in ultrahigh resolution imaging, nanoscale probes, optical tools for biotechnology, nanofabrication and photonics, laser cooling, atom trapping, atom chips, particle sorting, and quantum information.

Together, these topics represent a highly active interdisciplinary field with a rich scope for new de-velopments, notably spanning both fundamental and applied aspects. This conference provides a forum for advancing the development and application of new forms and methods of generating complex optical structures. The world-wide interest in these topics brings together an international community to discuss new fundamentals, methods, techniques, and devices. Papers on all such areas are solicited, focusing on any of the following or related topics:• singular optics with phase or polarization

discontinuities• optical vortices and their interactions• optical angular momentum• geometric phases• spiral phase contrast and vortex filters• polarization management• structured optical modes• Laguerre-Gauss, Hermite-Gauss, Bessel,

Mathieu, Airy, helico-conical beams• pulsed structured beams, Bessel-X pulses• optical tweezers and holographic optical

trapping and manipulation• optical binding• optical manipulation using generalized phase

contrast (GPC)• optical robotics• laser cooling, atom trapping and atom chips• tractor beams and vector beams• single-photon spin transfer• single-molecule interactions• quantum multimode spaces, quantum

information and imaging• entanglement and hyper-entanglement with

spatial modes• micro- and nanofabrication with structured light• nano-optics and nanostructure devices• optofluidics, optical sorting, optical fractionation• chirality in optical fields• chirality in particles and film nanophotonics• near-field and evanescent wave interactions• ultrahigh resolution imaging• electron vortices• multimode propagation in fibers• spin-orbit effects.


LASER APPLICATIONS

The paper you present will live far beyond the conference roomAll proceedings from this event will be published in the SPIE Digital Library, promoting breakthrough results, ideas, and organizations to millions of key researchers from around the world.

www.SPIEDigitalLibrary.org

Helping engineers and scientists stay current and competitive

Optical and Electronic Cooling of Solids IX (OE124)

Conference Chairs: Richard I. Epstein, The Univ. of New Mexico (USA); Denis V. Seletskiy, Univ. Konstanz (Germany); Mansoor Sheik-Bahae, The Univ. of New Mexico (USA)

Program Committee: Daniel A. Bender, Sandia National Labs. (USA); Steven Bowman, U.S. Naval Research Lab. (USA); Tal Eliezer Carmon, Technion-Israel Institute of Technology (Israel); Joaquín Fernández, Univ. del País Vasco (Spain); Thomas Fraser, Air Force Research Lab. (USA); Zameer Ul Hasan, Temple Univ. (USA); Raman Kashyap, Ecole Polytechnique de Montréal (Canada); Paul D. LeVan, Air Force Research Lab. (USA); Mauro Tonelli, Univ. di Pisa (Italy); Qihua Xiong, Nanyang Technological Univ. (Singapore)

The laser cooling of solids and the related area of electroluminescent refrigeration and thermoelectric cooling have been advancing on many fronts. Work on the laser cooling of rare-earth doped solids has expanded to include materials comprised of ytter-bium, thulium, erbium and dysprosium dopants in a variety of crystal and glass hosts. The quality of these cooling materials have has improved to the point that operating temperatures below 100 K have been demonstrated, approaching liquid nitrogen temperatures. Rare-earth-based cryogenic optical


refrigerators may soon find applications in cooling infrared cameras, low-noise electronics, high-purity germanium gamma ray spectrometers and high-tem-perature superconductors. The last couple of years have also witnessed the first demonstration of laser cooling in semiconductors and cryogenic cooling by collisional redistribution of radiation and sponta-neous Brillouin cooling in microcavities. Additionally, there has been great progress in cooling of small mechanical structures with radiation pressure and encouraging proposals for various implementations of Raman cooling. We encourage the submission of papers dealing with experimental, theoretical studies and the applications of optical refrigeration of solids, electroluminescent refrigeration, radiationally bal-anced lasers, and optomechanical cooling.

In parallel to the developments in laser cooling of solids, the alternative solid-state cooling technol-ogy of thermoelectric cooling has also seen great experimental and theoretical progress, with recent proposals of possibility of deep cryogenic operation of Peltier coolers. This conference will serve as a venue to present and discuss novel research on both optical and electronic cooling of solids.


CALL FOR PAPERS

General InformationVENUEThe Moscone Center 747 Howard Street San Francisco, CA 94103-3118 USA

San Francisco is often called “Everybody’s Favorite City,” a title earned by its scenic beauty, cultural attractions, diverse communities, and world-class cuisine. Visitors rate the atmosphere and ambience as their top reason for visiting San Francisco. Mea-suring 49 square miles, this walkable city is dotted with landmarks like the Golden Gate Bridge, cable cars, and Alcatraz.

REGISTRATIONSPIE Photonics West registration will be avail-able October 2015All participants, including invited speakers, con-tributed speakers, session chairs, co-chairs, and committee members, must pay a registration fee. Authors, coauthors, program committee members, and session chairs are accorded a reduced sympo-sium registration fee.

Fee information for conferences, courses, a registra-tion form, and technical and general information will be available on the SPIE website in October 2015.

HOTEL INFORMATIONOpening of the hotel reservation process for SPIE Photonics West 2016 is scheduled for June 2015. SPIE will arrange special discounted hotel rates for SPIE conference attendees.

The website will be kept current with any updates.

STUDENT TRAVEL GRANTSA limited number of SPIE student travel grants will be awarded based on need. Applications must be received no later than 7 December 2015. Eligible applicants must present an accepted paper at this meeting. Offer applies to undergraduate/graduate students who are enrolled full-time and have not yet received their PhD.

CLEARANCE INFORMATIONIf government and/or company clearance is required to present and publish your presenta tion, start the process now to ensure that you receive clearance if your paper is accepted.

IMPORTANT NEWS FOR ALL VISITORS FROM OUTSIDE THE UNITED STATESFind important requirements for visiting the United States on the SPIE Photonics West website. There are new steps that ALL visitors to the United States need to follow.

Online at: www.spie.org/visa

SPIE International Headquarters PO Box 10 Bellingham, WA 98227-0010 USA Tel: +1 360 676 3290 / Fax: +1 360 647 1445 [email protected] / www.SPIE.org

SPIE Europe Office 2 Alexandra Gate Ffordd Pengam, Cardiff, CF24 2SA UK Tel: +44 29 2089 4747 / Fax: +44 29 2089 4750 [email protected] / www.SPIE.org


CALL FOR PAPERSCALL FOR PAPERS

Symposium Chairs:

Bruce TrombergBeckman Laser Institute, Univ. of California, Irvine (USA)

Symposium Chair:

Henry Helvajian, The Aerospace Corp. (USA)

Symposium Chair:

Stephen J. Eglash Stanford Data Science Initiative, Stanford Univ. (USA)

Get more exposure from your work—include your abstract in a Photonics West Applications TrackIf your BiOS, LASE, or OPTO paper has applications for translational research, 3D printing, environmental or energy solutions, then you are eligible to include your abstract in one of the Photonic West Applications Tracks. See details below on how to submit your abstract.

TRANSLATIONAL RESEARCHSPIE Translational Research 2016 will highlight papers from BiOS that showcase the latest photonics technologies, tools, and techniques with high potential to impact healthcare.

GREEN PHOTONICSSPIE Green Photonics 2016 highlights papers from OPTO and LASE that showcase the latest photonics and optoelectronic tools and materials that will reduce power consumption, enable cleaner manufacturing, and create new energy generation for a broad range of applications.

3D PRINTINGSPIE Applications of 3D Printing 2016 highlights papers from BiOS, LASE, and OPTO that showcase innovative ways to apply this multidimensional/multidisciplinary technology.

Submit outcomes-based research in these areas: –• Laser-assisted Manufacturing

and Micro/Nano Fabrication• Renewable Energy Generation:

Fusion and Photovoltaics• Solid State Lighting and

Displays• Communications

• Additive Manufacturing• Selective Laser Melting,

Maser Sintering, Laser Photopolymerization

• Novel Materials, Protean Materials, and Laser Interactions

• Software that Increases Efficiencies and Speed

• In-situ Sensors or Probes to Verify and Quantify Additive Manufacturing Processes in Real Time

• Conformal Photonics/Electronics

STEPS:

SUBMIT YOUR ABSTRACT TODAY!www.spie.org/lase16call

• Photonic Therapeutics and Diagnostics

• Tissue Optics, Laser-Tissue Interaction, and Tissue Engineering

• Clinical Technologies and Systems

• Biomedical Spectroscopy, Microscopy, and Imaging

• Nano/Biophotonics• Neurophotonics,

Neurosurgery, and Optogenetics

Gabriela ApiouHarvard Medical School, Wellman Ctr. for Photomedicine, Massachusetts General Hospital (USA)

* Choose your conference in BiOS, LASE, or OPTO.* When submitting your conference abstract, enter

related Applications Track (translational research, 3D printing, or green photonics).

* If paper is accepted in the conference, it will be cross-listed in the Applications Track of your choice in online and printed programs.

* To compete for a Best Paper Award in the Applica-tions Track (optional), submit a 1-2-page summary when prompted by SPIE staff.


ABSTRACT SUBMISSION

By submitting an abstract, I agree to the following conditions:

AN AUTHOR OR COAUTHOR (INCLUDING KEYNOTE, INVITED, ORAL, AND POSTER PRESENTERS) WILL:• Register at the reduced author registration rate

(current SPIE Members receive an additional discount on the registration fee).

• Attend the meeting.• Make the presentation as scheduled in the program.• Submit a full-length manuscript (6 pages mini-

mum) for publication in the SPIE Digital Library and Proceedings of SPIE.

• Obtain funding for registration fees, travel, and accommodations, independent of SPIE, through their sponsoring organizations.

• Ensure that all clearances, including government and company clearance, have been obtained to present and publish. If you are a DoD contractor in the USA, allow at least 60 days for clearance.

Submit an abstract and summary online athttp://www.spie.org/lase16call• Abstracts should contain enough detail to clearly

convey the approach and the results of the re-search. Accepted abstracts will be published and made available at the meeting. Please submit a 250-word abstract for review.

• Please also submit a 100-word text summary suitable for early release. If accepted, this sum-mary text will be published prior to the meeting in the online or printed programs promoting the conference.

• Only original material should be submitted.• Abstracts should contain enough detail to clearly

convey the approach and the results of the re-search.

• Commercial papers, papers with no new research/development content, and papers where support-ing data or a technical description cannot be given for proprietary reasons will not be accepted for presentation in this conference.

• Please do not submit the same, or similar, ab-stracts to multiple conferences.

• GREEN PHOTONICS: If your research is working toward improvements in energy, sustainability, and conservation, identify your paper as “GREEN” when prompted during the abstract submission wizard. If your paper is accepted, SPIE will contact you to collect a 1-2 page summary explaining how your research is “green.” If your paper is selected by Green Photonics selection committee, your presentation will be cross-listed in the SPIE Green Photonics Program, and you will be eligible to win an SPIE Green Photonics Best Paper Award.

• 3D PRINTING: If your research is connected with 3D printing, manufacturing, or fabrication, enter “3D” when prompted during the abstract submission wizard. If your paper is accepted, SPIE will contact you to collect a 1-2 page sum-mary explaining how your work can be used for an application area or can improve on current understandings. If your paper is selected by the 3D Printing committee, your presentation will be cross-listed in the SPIE Applications of 3D Printing Program and you will be eligible to win an SPIE Applications of 3D Printing Award.

REVIEW, NOTIFICATION, AND PROGRAM PLACEMENT INFORMATION• To ensure a high-quality conference, all submis-

sions will be assessed by the Conference Chair/Editor for technical merit and suitability of con-tent.

• Conference Chair/Editors reserve the right to reject for presentation any paper that does not meet content or presentation expectations.

• The contact author will receive notification of acceptance and presentation details by e-mail the week of 12 October 2015.

• Final placement in an oral or poster session is subject to the Chairs’ discretion.

PROCEEDINGS OF SPIE AND SPIE DIGITAL LIBRARY INFORMATION• Manuscript instructions are available from the

“For Authors/Presenters” link on the conference website.

• Conference Chair/Editors may require manuscript revision before approving publication and reserve the right to reject for publication any paper that does not meet acceptable standards for a scientif-ic publication. Conference Chair/Editors’ decisions on whether to allow publication of a manuscript is final.

• Authors must be authorized to transfer copyright of the manuscript to SPIE, or provide a suitable publication license.

• Only papers presented at the conference and received according to publication guidelines and timelines will be published in the conference Proceedings of SPIE and SPIE Digital Library.

• Published papers are indexed in leading scien-tific databases including Astrophysical Data System (ADS), Chemical Abstracts (relevant content), Compendex, CrossRef, Current Con-tents, DeepDyve, Google Scholar, Inspec, Portico, Scopus, SPIN, and Web of Science Conference Proceedings Citation Index, and are searchable in the SPIE Digital Library. Full manuscripts are available to SPIE Digital Library subscribers worldwide.



Start your sales year at the premier photonics and laser event.Experience Photonics West—your exhibition booth will put you face-to- face with over 20,000 attendees and over 1,250 exhibiting companies, plus you can access the world’s most comprehensive photonics and laser conference.

There is no other event that provides your company the exposure of SPIE Photonics West. Every year more products are launched, more deals are made, and more collaboration occurs—it is the annual flagship event for the photonics industry.

- Grow your revenue

- Identify the hottest opportunities in the industry

- Connect with your customers

- Demo your new products

- Gain exposure with strategically placed advertising and sponsorships

INTERESTED IN EXHIBITING, SPONSORING AN EVENT, ADVERTISING WITH SPIE OR TO LEARN MORE•www.spie.org/pwexhibition

E.EXHIBITION

“Photonics West was the best show ever! We started getting orders off the exhibition just a couple of weeks after the event. Great show, keep up the good work.”

- Brian Samoriski, President, Bristol Instruments, Inc.

BiOS EXPO, 13–14 Feb. 2016, the world's largest biomedical optics and biophotonics exhibition. BiOS EXPO, held Saturday and Sunday, kicks off the Photonics West week. Find the latest technologies from more than 220 companies in the thriving biomedical optics and photonics industries.

PW Exhibition16-18 Feb. 2016

The Moscone Center San Francisco, California, USA

DATES Conferences & Courses: 13–18 Feburary 2016

TWO EXHIBITIONS BiOS EXPO: 13–14 February 2016 Photonics West: 16–18 February 2016

Participate in the premier technical event and marketplace for the photonics, biophotonics, and laser industry.

BiOS – Biophotonics Topics include biomedical optics, photonic therapeutics and diagnostics, tissue engineering, translational research, tissue optics, clinical technologies and systems, biomedical spectroscopy, microscopy, imaging, nano/biophotonics.

LASE – Lasers and SourcesTopics include laser source engineering, nonlinear optics, semiconductor lasers and LEDs, laser manufacturing, laser micro-/nanoengineering, 3D fabrication, and more.

OPTO – Optoelectronic Devices and Materials

Topics include optoelectronic materials and devices, photonic integration, displays and holography, nanotechnologies in photonics, advanced quantum and optoelectronic applications, semiconductor lasers and LEDs, MOEMS-MEMS, optical communications: devices to systems.

BiOS EXPO: The world’s largest biomedical optics and biophotonics exhibition. The exhibition had more than 220 companies in 2015.

Photonics West Exhibition: The flagship event for companies in the photonics industry. The exhibition sold out in 2015 with more than 1,250 companies.

Present your work at Photonics West, the premier laser, photonics, biomedical optics conference: 20,000 attendees, two exhibitions, 1,250 exhibiting companies, a wide range of papers on biomedical optics, biophotonics, industrial lasers, optoelectronics, microfabrication, MOEMS-MEMS, displays, and more.

Translational Research: Including the latest photonics technologies, tools, and techniques with high potential to impact healthcare.

Green Photonics: Including green photonics for solid state lighting and displays, laser-assisted manufacturing and micro/nano fabrication, communications, renewable energy generation: fusion and photovoltaics.

3D Printing: Highlighting papers from BiOS, LASE, and OPTO that showcase innovative ways to apply this multidimensional/multidisciplinary technology.

If your BiOS, LASE, or OPTO paper has applications in translational research, 3D printing, environmental or energy solutions, then you are eligible to also submit your abstract to the Photonics West Application Tracks. Details provided in the online submission webpage.

www.spie.org/lase16call

Non-

Profi

t Org

.U.

S. P

osta

ge

Paid

SPIE

13–1

8

FEB

RU

ARY

20

16

SUB

MIT

YO

UR

A

BST

RA

CT

TOD

AY

•

The

Mos

cone

Cen

ter

San

Fran

cisc

o, C

alifo

rnia

, USA

P.O

. Box

10

Belli

ngha

m, W

A 98

227-

0010

USA

The

Mos

cone

Cen

ter

San

Fran

cisc

o, C

alifo

rnia

, USA

ww

w.s

pie

.org

/las

e16

call

Pres

ent y

our

rese

arch

on

fiber

, sol

id s

tate

, di

ode,

ult

rafa

st, h

igh

pow

er, V

EC

SELs

, se

mic

ondu

ctor

lase

rs a

nd m

ore.

lase - spielasers and applications in science and engineering. one of the strengths of this ......

Documents