journal of materials chemistry a electronic supplementary ... · g. seeta rama raju,a e. pavitra,b...
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Journal of
Materials Chemistry A
ELECTRONIC SUPPLEMENTARY INFORMATION (ESI†)
Rational design of forest-like nickel sulfide hierarchical architectures
with ultrahigh areal capacity as a binder-free cathode material for
hybrid supercapacitors†
G. Seeta Rama Raju,a E. Pavitra,b Goli Nagaraju,c S. Chandra Sekhar,d Seyed Majid Ghoreishian,b
Cheol Hwan Kwak,b Jae Su Yu,*d Yun Suk Huh,*b and Young-Kyu Han,*a
aDepartment of Energy and Materials Engineering, Dongguk University–Seoul, Seoul 04620,
Republic of Korea
bDepartment of Biological Engineering, Biohybrid Systems Research Center (BSRC), Inha
University, Incheon, 22212, Republic of Korea
cDepartment of Chemical Engineering, College of Engineering, Kyung Hee University, 1732
Deogyeong-daero, Gihung-gu, Yongin-si, Gyeonggi-do 17104, Republic of Korea
dDepartment of Electronic Engineering, Institute for Wearable Convergence Electronics, Kyung
Hee University, 1732 Deogyeong-daero, Gihung-gu, Yongin-si, Gyeonggi-do 17104, Republic of
Korea
Corresponding Authors
*Email: [email protected] (J. S. Yu)
*Email: [email protected] (Y. S. Huh)
*Email: [email protected] (Y.-K. Han)
Electronic Supplementary Material (ESI) for Journal of Materials Chemistry A.This journal is © The Royal Society of Chemistry 2018
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Fig. S1 FE-SEM images of pristine Ni foam, showing its porous conductive frames with smooth
surface.
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Fig. S2 (a) XRD patterns of NiS-based samples synthesized under different time intervals [i) 1 h,
ii) 2 h, iii) 3 h and iv) 5 h], (b) HR-Raman, and (c–e) XPS survey scan spectrum, high-resolution
Ni 2p and S 2p XPS spectra, respectively, of forest-like NiS NTs/Ni foam sample under the optimal
growth condition of 85 C for 3 h.
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Section 1: Structural, morphological and electrochemical properties of NiS on
Ni foam without using the nickel salt in the growth solution:
Fig. S3a-c shows the low and high-magnification FE-SEM images of the nanostructured NiS on
Ni foam, which was developed without Ni salt (Ni(NO3)2∙6H2O source) in the growth solution.
Interestingly, NiS nanoparticles were observed on the Ni foam with a mass loading of 0.9 mg/cm2
at the reaction temperature of 85 ºC for 3 h. This indicates that, forest-like NiS NTs on Ni foam
were not formed without the addition of nickel salt in the growth solution. The structural and
electrochemical properties of the corresponding sample was also examined. From the EDX (taken
from FE-SEM equipment) and XRD results (Fig. S3d-e), it is evident that the prepared sample
(without the addition of nickel salt) composed of Ni and S elements has pure NiS phase without
any impurities. The XRD pattern of NiS/Ni foam showed low intense peaks, which may be due to
the less amount material deposited on the spectrum. Furthermore, when tested the electrochemical
properties in 1 M KOH solution, the NiS nanoparticles coated Ni foam exhibited a battery-type
redox behavior, confirmed from the CV and GCD curves (Fig. S3f-g and Fig. S4a-b), which is
similar to the forest-like NiS NTs electrode behavior. However, NiS nanoparticles coated Ni foam
sample exhibited relatively low electrochemical performance compared to the forest-like NiS
NTs/Ni foam electrode, as shown in Fig. S4a-b. The obtained results indicate that the inclusion of
nickel salt in growth solution help to increase the nucleation and precipitation rate to form the
hierarchically designed forest-like NiS NTs for the enhancement of energy storage performance.
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Fig. S3. Physical and electrochemical properties of NiS nanoparticles coated Ni foam, which was
prepared without addition of nickel salt in the growth solution. (a-c) low- and high-magnification
FE-SEM images of NiS nanoparticles, (d-e) EDX and XRD pattern of the same sample. (f-h) CV
curves, GCD curves and calculated areal capacity values of NiS nanoparticles coated Ni foam
electrode, respectively.
Matrix
Correction:
ZAF Element
Wt.% At.%
NiL 91.16 84.92
S K 08.84 15.08
5 m 200 nm 50 nm
(a) (b) (c)
0 100 200 300 400 500 600 7000.0
0.1
0.2
0.3
0.4
40 mA cm-2
Po
ten
tia
l (V
vs
. A
g/A
gC
l)
Time (s)
4 mA cm-2
-0.1 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7-60
-40
-20
0
20
40
60
Cu
rre
nt
De
ns
ity
(m
A/c
m2)
2 mV s-1
5 mV s-1
7 mV s-1
10 mV s-1
15 mV s-1
20 mV s-1
30 mV s-1
Potential (V vs. Ag/AgCl)
0 5 10 15 20 25 300
50
100
150
200
250
Are
al C
ap
acit
y (A
h c
m-2)
Current Density (mA cm-2)
(f) (g) (h)
Ni
10 20 30 40 50 60 70 80 90
NiS
Ni foam
(200)
(101)
(100)
Inte
ns
ity
(a
.u.)
2 (degree)
(d) (e)
OS
Ni
Ni
Energy (keV)
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Fig. S4. Comparative electrochemical properties of NiS nanoparticles and forest-like NiS NTs,
which were prepared with and without inclusion of nickel salt in the growth solution. (a) CV curves
(b) GCD curves and calculated capacity values of the both samples. This results indicate that the
sample prepared with an inclusion of nickel salt (i.e., forest-like NiS NTs) ensued superior capacity
values than the sample synthesized without addition of nickel salt in the growth solution.
Section 2: Effect of growth temperature on the morphological and electrochemical properties
of NiS nanostructures on Ni foam: The effect of growth time on the structural and
electrochemical properties of NiS on Ni foam were carried out under different temperatures of 50-
115 C with a constant growth time of 3 h. At the low growth temperature (50 C), as shown in
FE-SEM images of Fig. S5a, NiS with nanosheet like morphology was started to grew on Ni foam
substrate. This means that the growth temperature is not enough to form the vertically aligned
forest-like nanoarchitectures. With increasing the growth temperature to 85 C, the forest-like NiS
NTs were uniformly distributed on Ni foam due to the increased nucleation and growth rate of the
added reactants (see FE-SEM images of Fig. 2). Further increasing the growth temperature to 115
C (Fig. S5b), NiS nanostructures were densely integrated on Ni foam in the form of lumps with
high mass loading. Also, several cracks were observed due to the extreme growth rate and
0 5 10 15 20 25 30 35 400
200
400
600
800
NiS nanoparticles
Forest-like NiS NTs
Without nickel salt
Are
al
Ca
pa
cit
y (A
h c
m-2)
Current Density (mA cm-2)
With nickel salt
15.1%
0 300 600 900 1200 15000.0
0.1
0.2
0.3
0.4
I: 4 mA cm-2
Forest-like NiS NTs
NiS
nanoparticles
(With nickel salt)
Po
ten
tia
l (V
vs
. A
g/A
gC
l)
Time (s)
(Without
nickel salt)
-0.1 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7-150
-100
-50
0
50
100
150
Scan rate: 10 mV s-1
(Without
nickel salt)
NiS nanoparticles
(With nickel salt)
Forest-like NiS NTs
Cu
rre
nt
(mA
)
Potential (V vs. Ag/AgCl)
(a) (b) (c)
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precipitation of added reactants. This kind of cracks may not useful for improving the capacity and
rate capability of the prepared samples.
Fig. S5. FE SEM images of NiS nanostructures prepared at the growth temperatures of (a) 50 C
and (b) 115 C.
The electrochemical properties of the prepared samples under different temperatures were
included in Fig. S6. The comparative CV curves (measured at a scan rate of 10 mV/s), shown in
Fig. S6a displayed the dynamic redox peaks, indicating the battery-type mechanism of NiS-based
samples. Compared to other samples, the forest-like NiS NTs synthesized at 85 C exhibited higher
redox current and large enclosed CV area, revealing the high capacity contribution of the material.
To estimate the capacity of the prepared samples, the GCD curves (Fig. S6b) also measured as a
function of synthesis temperature. As shown in the comparative GCD curves (measured at a
constant current density of 4 mA/cm2), the sample synthesized at high temperature (115 C)
demonstrated uneven charge-discharge times, where the material showed high charge time and
small discharge time, which indicates the low columbic efficiency of the prepared sample and this
could be due to the surface cracks and over mass loading of the material. On the other hand, as
Lumps
Cracks
300 nm3 m10 m
(b) (ii) (iii)NiS/Ni foam at 115 C(i)
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shown in discharge curves of the prepared electrodes, the NiS synthesized at 85 C demonstrated
high discharge time compared to the other growth temperature samples. The calculated discharge
capacities of these samples were plotted in Fig. S6c, which showed the areal capacities of 287.37,
752.71 and 386.88 Ah/cm2 for the NiS nanostructures prepared at various growth temperatures
of 50, 85, and 115 C, respectively. Thus, we have chosen 85 C and 3 h were the optimal growth
conditions in the development of forest-like NiS NTs as a high capacity cathode material for the
hybrid supercapacitors. The overall electrochemical properties, including CV at various scan rates,
GCD at different current densities and calculated capacity plots, of NiS samples developed at 50
and 115 C, were presented in Fig. S7.
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Fig. S6. Comparative electrochemical properties of NiS nanostructures prepared under various
growth temperatures.
-0.1 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7-120
-80
-40
0
40
80
120
160C
urr
en
t D
en
sit
y (
mA
/cm
2)
Potential (V vs. Ag/AgCl)
50 C
85 C
115 C
0 300 600 900 1200 15000.0
0.1
0.2
0.3
0.4
Po
ten
tial (V
vs. A
g/A
gC
l)
Time (s)
50 C
85 C
115 C
NiS/Ni foamNiS/Ni foam
Scan rate: 10 mV/s
I : 4 mA/cm2
0 100 200 300 400 500 600 7000.0
0.1
0.2
0.3
0.4
Po
ten
tial (V
vs. A
g/A
gC
l)
Time (s)
50 C
85 C
115 C
40 60 80 100 1200
200
400
600
800
Are
al C
ap
acit
y (A
h c
m-2)
Growth Temperature (C)
Discharge Curves
(a) (b)
(c)
752.71 Ah/cm2
386.88 Ah/cm2
287.37 Ah/cm2
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Fig. S7. CV curves, GCD curves and calculated areal capacity values of the NiS-based samples
synthesized at various growth temperatures of (a) 50 C and (b) 115 C, respectively.
0 5 10 15 20 25 300
100
200
300
Are
al C
ap
acit
y (A
h c
m-2)
Current Density (mA cm-2)
-0.1 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7
-120
-80
-40
0
40
80
120
160 2 mV s
-1
5 mV s-1
7 mV s-1
10 mV s-1
15 mV s-1
20 mV s-1
30 mV s-1C
urr
en
t D
en
sit
y (
mA
/cm
2)
Potential (V vs. Ag/AgCl)0 300 600 900 1200 1500
0.0
0.1
0.2
0.3
0.4
40 mA cm-2
Po
ten
tial (V
vs. A
g/A
gC
l)
Time (s)
4 mA cm-2
0 5 10 15 20 25 300
100
200
300
400
Are
al C
ap
acit
y (A
h c
m-2)
Current Density (mA cm-2)
-0.1 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7-100
-75
-50
-25
0
25
50
75
100 2 mV s-1
5 mV s-1
7 mV s-1
10 mV s-1
15 mV s-1
20 mV s-1
30 mV s-1C
urr
en
t D
en
sit
y (
mA
/cm
2)
Potential (V vs. Ag/AgCl)0 100 200 300 400 500
0.0
0.1
0.2
0.3
0.4
40 mA cm-2
Po
ten
tia
l (V
vs
. A
g/A
gC
l)
Time (s)
4 mA cm-2
(a) (ii) (iii)(i)
(b) (ii) (iii)(i)
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Fig. S8. Electrochemical performance of NiS-based sampled deposited under different growth
times of (a-b) 1 h, (c-d) 2 h and (e-f) 5 h, respectively with a constant growth temperature of 85
C.
0 5 10 15 20 25 30 35 400
100
200
300
400
500
600
700
Are
al
Ca
pa
cit
y (A
h c
m-2)
Current Density (mA cm-2)
0 200 400 600 800 1000 12000.0
0.1
0.2
0.3
0.4
40 mA cm-2
Po
ten
tial
(V v
s.
Ag
/Ag
Cl)
Time (s)
4 mA cm-2
0 100 200 300 400 500 600 700 8000.0
0.1
0.2
0.3
0.4
40 mA cm-2
P
ote
nti
al
(V v
s.
Ag
/Ag
Cl)
Time (s)
4 mA cm-2
0 5 10 15 20 25 30 35 400
100
200
300
400
Are
al C
ap
ac
ity
(A
h c
m-2)
Current Density (mA cm-2)
0 300 600 900 12000.0
0.1
0.2
0.3
0.4
40 mA cm-2
Po
ten
tial
(V v
s.
Ag
/Ag
Cl)
Time (s)
4 mA cm-2
0 5 10 15 20 25 30 35 400
100
200
300
400
500
600
700
Are
al C
ap
ac
ity
(A
h c
m-2)
Current Density (mA cm-2)
(a)
(b)
(c)
(d)
(e)
(f)
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Fig. S9 FE-SEM images of the forest-like NiS NTs/Ni foam after cycling test in three-electrode
system.
Fig. S10 (a) CV (b) GCD curves of PAC/Ni foam electrode in 1 M KOH solution.
-1.0 -0.8 -0.6 -0.4 -0.2 0.0
-80
-60
-40
-20
0
20
40
60
80
Cu
rre
nt
De
nsit
y (
mA
/cm
2)
Potential (V, vs. Ag/AgCl)
5 mV/s
100 mV/s
0 50 100 150 200 250 300 350-1.0
-0.8
-0.6
-0.4
-0.2
0.0
Po
ten
tial
(V, v
s. A
g/A
gC
l)
Time (s)
5 mA/cm2
40 mA/cm2
(a) (b)
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Table S1. Comparative electrochemical properties of previously reported metal sulfide/selenide
based nanostructures with forest-like NiS NTs/Ni foam electrode.
Electroactive material Current
collector Electrolyte
Test
condition
(mA/cm2)
Area
(cm2)
Areal
capacity
(Ah/cm2)
Ref.
Ni3S2 nanoparticles Carbon
fiber paper 2 M KOH 2 1 119.44 S1
NiSe microspheres Ni foam 2 M KOH 3 0.6 1250 S2
Ni3S2 nanosheets Ni foam 1 M KOH 1 1 154.16 S3
NiS box-in-box Ni foam 3 M KOH 1 1 63.8 S4
Ni3S2@MWCNTs
composite Ni foam 2 M KOH 1.2 1 191.6 S5
NiSe nanowires Ni foam 2 M KOH 5 1 700.1 S6
NiS nanoframes Ni foam 6 M KOH 1 1 279.16 S7
NiS hollow spheres Ni foam 2 M KOH 4.08 1 147.3 S8
CoS hollow tubes Ni foam 6 M KOH 5 1.13 472.2 S9
CuS nanonedles@CNT Ni foam 2 M KOH 2.9 1 40.7 S10
NiS nanostructures Graphene-
Cotton 6 M KOH 0.5 1 172.1 S11
Forest-like NiS NTs Ni foam 1 M KOH 4 1 752.71 This
work
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