jie chen, david wright, and hugh barnaby electrical engineering, asu, tempe, az

14
Hydrogen 2007 1 Studying the Effect of Molecular Hydrogen on Silicon Device Radiation Response Using Gated Bipolar Transistors Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

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Studying the Effect of Molecular Hydrogen on Silicon Device Radiation Response Using Gated Bipolar Transistors. Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az. Topics of Discussion. Motivation for the study Background Initial experimental results - PowerPoint PPT Presentation

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Page 1: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 1

Studying the Effect of Molecular Hydrogen on Silicon Device Radiation Response

Using Gated Bipolar Transistors

Jie Chen, David Wright, and Hugh Barnaby

Electrical Engineering, ASU, Tempe, Az

Page 2: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 2

Topics of Discussion

• Motivation for the study

• Background

• Initial experimental results

• Modeling the effect of molecular hydrogen

• Recent experimental results

• Experimental data vs. model

• Summary

Page 3: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 3

Motivation of Study

1.E-09

1.E-08

1.E-07

1.E-06

-100 -80 -60 -40 -20 0

Vg (V)

Ib (

A)

sealed @ 30krad

unsealed @ 30Krad after 8 days

Previous experiments showed 3x increase in Nit in devices in sealedpackages compared toun-sealed ones.

ΔNot (cm-2) ΔNit (cm-2)

Unsealed ~1.7x1011 ~0.8x1011 0.00005% H2

Sealed ~1.4x1011 ~2.5x1011 1.3% H2

Sealed package

Unsealed package

Page 4: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 4

Post-irradiation annealing in H2

After Mrstik & Rendell, IEEE Trans. Nucl. Sci., 1991

• MOSFETS exposed to 10Mrad and 1Mrad 10KeV x-rays.

• Post-irradiation annealing in 100%, 10%, and 1% H2 environment.

• Results show increase in Nit after annealing in H2.

Increase in Nit

Increase in Nit

Page 5: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 5

Earlier Experiments

NAVSEA Crane performed HDR testing performed at NAVSEA on devices in 100% H2

1.E-09

1.E-08

1.E-07

1.E-06

-100 -80 -60 -40 -20 0Vg (V)

Ib (A

)

preradIrrad in airIrrad in 1.3% H2Irrad in 100% H2

0

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

0 10000 20000 30000 40000

Total Dose (rad)

del N

it (c

m^-

2)

Air (unsealed)

1.3% H2 (sealed)

100% H2 (unsealed)

Increase in Nit

Page 6: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 6

Interface Trap Formation:2 stage model

Si-SiO2

interface

-+

-

+

-

+

H

-

+fH

tox

Ionizing radiation

H

xd

H

DH volume

fp

H+

H+

- protons

- Si-H (NSiH)

- dangling bond (Nit)

H

H+

fH- proton flux

- hydrogen defect (D’H)

H+

HDH DH p

f HN f

x t

it itSiH it it H

it

N N (t)N N (t) σ f

t

After Mclean TNS 1980Rashkeev et al. TNS 2002

Page 7: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 7

Model:Impact of Molecular H2

Si-SiO2

interface

-+

-

+

-

+

H

-

+fH

tox

Ionizing radiation

H

xd

H

D’H volume

fp

H+

H+

H+

Si-SiO2

interface

-+

-

+

-

+

H

-

+fH

tox

Ionizing radiation

H

xd

H

D’H volume

fp

H+

H+

H+

Empty D centers

HH

HH

H2 molecules

Molecular hydrogen reacts with empty D centers to generate more DH centers

2DH2DH2

HH

DHcenters

H

H

H

H2 transportinto material

21

H2

21H1

DH

2

2

Nk1

Nk N

Rad-inducedholes

Page 8: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 8

1D Analytical Model

2

2

1

21 2

1

22

2

1oDH DH SiH it g y o

Hit

H

x

k ( )N ( N Dk f t t )

NN

N

/

k ( )

Note: final 1D model assumes steady state, no Nit saturation or annealing

21

H2

21H1

DH

2

2

Nk1

Nk N

Equil. H2 - DH model Steady state hole transport

oxygp tfkDf (fp > 0 for all x)

HDH DH p

f HN f

x t

Proton continuity

it itSiH it it H

it

N N (t)N N (t) σ f

t

Trap continuity

Final Model

*

Page 9: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 9

Latest Experiments

• GLPNP devices used are designed by NAVSEA Crane and fabricated using National’s standard linear bipolar IC process

• Using only devices with no-passivation (Wafer #4) for simplicity (one less parameter in modeling)

• 10%, 0.1%, 0.01%, 50% H2 ambient concentrations, as well as re-examination of 1% and 100% data points

GLPNP with no passivation

Page 10: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 10

Experimental Details

• 4 device samples for each H2 concentration

• De-seal lids at least 3 days prior to soaking

• 10-5 torr vacuum before filling of H2

• >48hrs soaking before irradiation

• Gamma HDR test to 30Krad at 18 rad/s

• Pb shield used during irradiation

• Devices grounded during irradiation

• Soaking temperature: 72 deg F

• Irradiation temperature: 72 deg F H2 Chamber (Soaking & Irradiation)

Page 11: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 11

Latest Experimental Results

• Characterization performed using Agilent 4156 SPA. Gate Sweep (GS), Subthreshold Sweep (SS), and Gummel are performed.

• Gate Sweep: VG = 80V to -100V, VBE = 0.5V, VC = 0V

Page 12: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 12

Latest Experimental Results

• Subthreshold Sweep: Vg = 10V to -100V, VE = -0.1V as the drain of the pMOSFET, VC = 0V, VB = 0V.

Page 13: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 13

1D model fit to data

• ASU results indicated monotonic increase of Nit vs ambient H2 concentration, agrees with the predictions of the model.

• Saturation at high H2 and low H2 concentration agrees with the predictions of the model,

• Crane’s 100% data is different than ASU’s 100% data. The difference may be due to differences in dose, dose rate, environmental factors, etc.

Re-fit of the data with the analytical model

Page 14: Jie Chen, David Wright, and Hugh Barnaby Electrical Engineering, ASU, Tempe, Az

Hydrogen 2007 14

Continuing work

• Post-irradiation annealing studies

• Effect of high pressure H2 environment

• Model refinement

• Relate dose-rate effects to the reaction processes of hydrogen species in SiO2

• Effect of H2 under low temperature exposure