iab project abstract/description form · 2019. 9. 10. · -general protective coatings for the...
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IAB PROJECT ABSTRACT/DESCRIPTION FORM INVESTIGATORS: Prof. Jyotirmoy Mazumder (Primary), Joonghan Shin (Participant)
ABSTRACT/DESCRIPTION: Multi-energy processing can be applied for novel thin film deposition, synthesis of new phase of materials, enhancement of film growth rate, efficient removal of materials and other applications. Our approach is to use multi-energy source to perform different functions, ablation and heat treatment, to get the desired materials. Potential application can be found in a wide range of fields, both in the military and commercial sectors. Benefits from some of the developed techniques will also have applications in the area of diagnostics and materials analysis PROGRESS TO DATE: - Ni superalloy film deposition experiment under L9 Daguchi DOE - Investigation of microstructure and growth behavior of the Ni superalloy films with XRD (X-ray diffraction) and SEM. - Investigation of effects of the process parameters on the process. - Investigation of film growth behavior in cavities
BENEFITS TO MEMBERS (Achieved and Anticipated) This research will open up new avenues for hard and protective coatings at a lower temperature which is useful for both aerospace industry and ground transportation industry. Moreover, in conjunction with the single crystal deposition work one can explore co-deposition of superalloy and TBC leading to more robust fabrication technique for components for high temperature use. The basic research will lead to fundamental understanding of thin coating of ceramic and metal by laser ablation by plasma diagnostics during the process and post analysis to determine structure property relationship. The proposed project will support research training for graduate students at the two institutions participating in the proposed research effort. The universities will be able to provide a more comprehensive educational experience for the students and students will be able to develop research skills and gain valuable experience in both basic science and the engineering application of new technologies. This off-campus experience will broaden their knowledge and provide opportunities for collaboration and technology transfer.
MILESTONES - Process parameters for homoepitaxial Ni superalloy film deposition were found. - Experimental parameters to give a main effect on the process were found. - Comparison of film growth behavior between on smooth and rough (cavity regions) surface was implemented.
NSF I/UCRC BOARD MEETING May 2007NSF I/UCRC BOARD MEETING May 2007
Center for Lasers and plasmas for Advanced Manufacturing
Thin film production by multi energyprocessing based on pulsed laser de
position technique
JoonghanJoonghan Shin and Shin and JyotiJyoti MazumderMazumder
Center for Lasers and plasmas for Advanced Manufacturing
ContentsContents
PART Ⅰ: Background and Motivation of the project
- Multi energy processing
- Impact and Benefits
PART Ⅱ: Some achievements of the project
- Ni-base superalloy film deposition
- Investigation of microstructure and growth behavior of the films with XRD (X-ray diffraction) and SEM.
- Investigation of the film growth behavior in cavities
PART Ⅲ: Future work
Center for Lasers and plasmas for Advanced Manufacturing
Background and motivation of the project -1Background and motivation of the project -1
Multi energy processingMulti energy processing
- Good quality film (smooth, large uniformity, good stoichiometry and mechanical properties)
- Increase of film growth rate
Substrate
Laser1
α β
Laser2
Target
Plume/Plasma
Electric field
Heat
Expected results
Use advantages result from combination of multi energy sources(Reduce chance of splashing, enhancedexcitation and expansion of plume plasma, attraction and acceleration of ionparticles)
Center for Lasers and plasmas for Advanced Manufacturing
Background and motivation of the project -3Background and motivation of the project -3
Technical impact and BenefitsTechnical impact and Benefits
- Several technological benefits in the areasof hard and corrosion protective coatingsfor mechanical components
- Potential application in the military / commercialsectors and in the area of diagnostics / materials analysis
- High quality film (smooth, large uniformity, goodstoichiometry and thermo-mechanical properties)
- Increase of film growth rate / provide control for the development of new phase of materials
Center for Lasers and plasmas for Advanced Manufacturing
Some achievements of the projectSome achievements of the project
Ni base superalloy film deposition experiment was carried out under the L9 Daguchi DOE (4 parameters and 3 levels)to investigate effects of the each process parameter on the process.
- Investigation of microstructure and growth behavior of the films with XRD (X-ray diffraction) and SEM.
- Investigation of the film growth behavior in cavities
Updated ones
Previous ones
1. Characterization study of YSZ film (Film surface morphology, mechanical properties)
2. Experimental investigation of the effect of the electric field assisted PLD process on the collection rate
Center for Lasers and plasmas for Advanced Manufacturing
Potential applications- General protective coatings for the components used under the extreme environment (high temperature, hot corrosion and oxidation, wear)- A bond coat in the thermal barrier coating (TBC) system
Ni based super-alloy film deposition-1Ni based super-alloy film deposition-1
The result of 2500 h low altitude sea flight service on an uncoated and NiAl coated blade turbine blade, from Eskner M., PhD thesis, Royal Institute of Technology, Stockholm, 2004
UncoatedUncoated Ni-Al coatedNi-Al coated
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Experimental setup for PLD processing with substrate heating systemExperimental setup for PLD processing with substrate heating system
Substrate holder and heating system assemblySubstrate holder and heating system assembly
Vacuumchamber
Pumpsystem
Powersupply
+
-~V
Beam Target
Substrateholder /heatingsystemassembly
Electric feedthrough
Heater
Single crystalNi super-alloysubstrate
Thermocouple
Electrical connection parts
Ni based super-alloy film deposition-2Ni based super-alloy film deposition-2
Center for Lasers and plasmas for Advanced Manufacturing
Design of experiment (DOE)Design of experiment (DOE)
1233L9
3123L8
2313L7
2132L6
1322L5
3212L4
3331L3
2221L2
1111L1
DCBA
Taguchi method : 4 parameters / 3 levels
20
120
3
900
2
10
90
2
850
1 3
4B (Pulse energy fluence, J/cm^2)
30D (Pulse repetition rate, Hz)
150C (Deposition time, min)
950A (Temp, ℃)
Level
Parameter
DOE matrix
Ni based super-alloy film deposition-3Ni based super-alloy film deposition-3
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XRD analysis of the films
Ni based super-alloy film deposition-4Ni based super-alloy film deposition-4
Temperature increase
Pulse energy increase
Pulse energy increase
Pulse energy increase
Group1: 850 ℃
Group2: 900 ℃
Group3: 950 ℃
- Films deposited under different conditions show the XRDpatterns of the stronger polycrystalline characteristic assubstrate temperature and pulse energy increase
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SEM images of the film cross sectionsSEM images of the film cross sections
L1 L5L8
Film Film
Substrate SubstrateSubstrate
Film
Substrate / filminterface
γ
γ’
Single crystal film
γ’
γγ
γ’
γ: Ni matrix, γ’: coherent and ordered Ni3Al precipitation
Ni based super-alloy film deposition-7Ni based super-alloy film deposition-7
AFM analysis of SC Ni superalloy film
Roughness (rms) : 9.76nmHeight difference : 20~30nm
Center for Lasers and plasmas for Advanced Manufacturing
10
30
20
20
10
30
30
20
10
Pulse repetition rate (Hz)
111204950L9
10903950L8
51502950L7
61504900L6
6903900L5
41202900L4
41504850L3
21203850L2
1902850L1
ResponseDeposition time (min)
Pulse energy(J/cm^2)
Temperature(℃)
- Response 1 : when a film shows same peak pattern ( (100) and (200) Ni3Al ) as thatof SC substrate
- Add additional counts to response whenever other film growth direction is found
Definition of the response in the process
Analysis of the effect of each process parameter
Ni based super-alloy film deposition-8Ni based super-alloy film deposition-8
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Mea
n of
resp
onse
for i
ndiv
idua
l pro
cess
par
amet
er
Process parameter
Mea
n of
sig
nal t
o no
ise
ratio
for i
ndiv
idua
l pro
cess
par
amet
er
Process parameter
- According to statistical calculation with the defined response of the process, it was found thattemperature and pulse energy are variables to give significant effect on the process.Deposition time and pulse repetition rate are variables to give relatively small influence onthe process ( steeper slope means more significant effect )
- It was also found that 850 ℃, 2J/cm^2, 90min, 20Hz are variables to give high signal to noise ratioof the process (smaller minus value is better S/N ratio, points enclosed by circles)
Analysis of the effect of each process parameter
Ni based super-alloy film deposition-9Ni based super-alloy film deposition-9
Center for Lasers and plasmas for Advanced Manufacturing
Film deposition in cavityFilm deposition in cavity
Cavity area Smooth areaγ
γ’
Scratch by diamond saw
Etch treated film surface
Film deposition condition : L1
Ni based super-alloy film deposition-10Ni based super-alloy film deposition-10
Center for Lasers and plasmas for Advanced Manufacturing
~150um
Smooth area
Film
substrate
substrate
FilmFilm
substrate
SEM images of the film cross section in cavities
Ni based super-alloy film deposition-11Ni based super-alloy film deposition-11
Center for Lasers and plasmas for Advanced Manufacturing
~300um
Film
Film
Filmsubstrate
substrate
substrate
Ni based super-alloy film Ni based super-alloy film deposition-12deposition-12
SEM images of the film cross section in cavities
Center for Lasers and plasmas for Advanced Manufacturing
Future workFuture work
Experimental work for multi energy process
- Preparation of experimental setup for Electric field assistedand dual beam process
- Investigate film properties: smoothness, particle density,mechanical properties
- Microstructure analysis of films
- Film growth rate measurement / Spectroscopic study