gaasfet

27
APPLICATION NOTE AN82901-1 California Eastern Laboratories Application of Microwave GaAs FETs INTRODUCTION The history of converting microwave communications, as well as other communications technologies, to solid state electronics is a long one. Early advances were first made in receivers, and then in transmitters. Progress in bipolar tran- sistor technology and the production of new semiconductor crystals during the 1960’s made possible the development of such new microwave diodes as the GUNN and the IMPATT (impact avalanche and transit time). For this reason, the decade might well be called the renaissance of microwave semiconductor devices. A series of microwave communica- tions amplifiers appeared in the first half of the 1970’s which used GUNN and IMPATT diodes. They played a leading role in the trend toward solid state technology. In the middle of the same decade, a commercially feasible gallium arsenide field effect transistor (GaAs FET) appeared, and the uses of this device are still increasing. In the latter half of the 1970’s, demands grew for systems more reliable than those using IMPATT and GUNN diodes. Users were demanding greater reliability, and those engaged in research and development began working toward this goal. The work is still going on today. The demands of the industry turned the emphasis away from creating new devices to developing competition among manu- facturers of semiconductors to produce devices of higher per- formance and greater reliability. Commercialization of GaAs field effect transistors led to lower energy consumption and smaller microwave components and systems. These are still major concerns today. With new developments in infor mation, communications and applied microwave systems, the GaAs FET has become an indispensable item. 1. THE FIELD EFFECT TRANSISTOR (FET) In 1952, Shockley conceived the structure of the field effect type transistor and pointed out that it could be used for am- plifier devices. Due to manufacturing difficulties, particu- larly in production technology, the field effect transistor was little known until the early 1960’s. The level of technology at the time made it very difficult for people to understand the importance of the FET. But with the development of planar technology, the micro wave semiconductor industry grew with explosive rapidity. There are three major types of FETS. The simplest of the three is the junction FET (JFET). Because of its simplicity and ease of manufacture, the JFET was the earliest to be produced commercially. It was put on the market about the same time as the first microwave bipolar transistor. With the development of semiconductor manufacturing tech- nology and the need for lower energy consumption, the metal oxide semiconductor FET (MOSFET) appeared. The MOSFET, like the JFET, was first developed for applica- tions in circuits that demanded high impedance, such as in- put circuits in analytical instruments. Field effect transis- tors, particularly the MOSFET, became widely known for their use as discrete devices in UHF band communications. However, having focused solely on performance for many years, nothing in the microwave band appeared on the mar- ket which was superior to the bipolar transistor. Around the time silicon reached its peak as a transistor ma- terial, Schottky barrier type FETs made of gallium arsenide appeared and quickly gained popularity by demonstrating their high theoretical performance. This new device, known as the Gallium Arsenide Metal Semiconductor FET (GaAs MESFET) showed performance far superior to the bipolar transistor. This new device provided lower noise and higher gain in established solid state applications. It also provided high frequency characteristics previously unavailable from bipo- lar transistors. It is made by using gallium arsenide (group III-V); one of the semiconductor com pounds which has been researched continually since the latter half of the 1960’s. The electron mobility of gallium arsenide is five to seven times that of silicon. Gallium arsenide crystal technology was used to produce the GUNN, varactor and Schottky diodes, and proved to be far better than silicon in high frequency performance. A GUNN diode made of silicon would be inconceivable, so the appearance of the contemporary GaAs FET contributed greatly to developing and commercializing the GUNN di- ode. The reason for this is that even though the GaAs MESFET is a three terminal device, it is simple in structure and its performance depends only on the crystal quality. Advances in crystal technology have made the commercial- ization of FETs possible. The GaAs FET is what is generally referred to as a “nor- mally ON” type device. Its basic difference from the MOSFET is the use of a Schottky barrier at the gate instead of an oxide layer. This is an extremely important point. In other words, almost no GaAs FET gates are insulated from the channels in terms of direct current. Thus, even though GaAs FETs are called “normally ON” type devices, the maxi- mum gate voltage must be zero. It does not use a dielectric like the MOSFET, so if a positive voltage is applied at the 9/82

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Page 1: GaAsFet

APPLICATION NOTEAN82901-1California Eastern Laboratories

Application of Microwave GaAs FETs

INTRODUCTION

The history of converting microwave communications, aswell as other communications technologies, to solid stateelectronics is a long one. Early advances were first made inreceivers, and then in transmitters. Progress in bipolar tran-sistor technology and the production of new semiconductorcrystals during the 1960’s made possible the development ofsuch new microwave diodes as the GUNN and the IMPATT(impact avalanche and transit time). For this reason, thedecade might well be called the renaissance of microwavesemiconductor devices. A series of microwave communica-tions amplifiers appeared in the first half of the 1970’s whichused GUNN and IMPATT diodes. They played a leadingrole in the trend toward solid state technology. In the middleof the same decade, a commercially feasible gallium arsenidefield effect transistor (GaAs FET) appeared, and the uses ofthis device are still increasing. In the latter half of the 1970’s,demands grew for systems more reliable than those usingIMPATT and GUNN diodes. Users were demanding greaterreliability, and those engaged in research and developmentbegan working toward this goal. The work is still going ontoday.The demands of the industry turned the emphasis away fromcreating new devices to developing competition among manu-facturers of semiconductors to produce devices of higher per-formance and greater reliability. Commercialization of GaAsfield effect transistors led to lower energy consumption andsmaller microwave components and systems. These are stillmajor concerns today. With new developments in information, communications and applied microwave systems,the GaAs FET has become an indispensable item.

1. THE FIELD EFFECT TRANSISTOR (FET)

In 1952, Shockley conceived the structure of the field effecttype transistor and pointed out that it could be used for am-plifier devices. Due to manufacturing difficulties, particu-larly in production technology, the field effect transistor waslittle known until the early 1960’s. The level of technologyat the time made it very difficult for people to understand theimportance of the FET. But with the development of planartechnology, the micro wave semiconductor industry grew withexplosive rapidity.There are three major types of FETS. The simplest of thethree is the junction FET (JFET). Because of its simplicityand ease of manufacture, the JFET was the earliest to beproduced commercially. It was put on the market about the

same time as the first microwave bipolar transistor. With the development of semiconductor manufacturing tech-nology and the need for lower energy consumption, the metaloxide semiconductor FET (MOSFET) appeared. TheMOSFET, like the JFET, was first developed for applica-tions in circuits that demanded high impedance, such as in-put circuits in analytical instruments. Field effect transis-tors, particularly the MOSFET, became widely known fortheir use as discrete devices in UHF band communications.However, having focused solely on performance for manyyears, nothing in the microwave band appeared on the mar-ket which was superior to the bipolar transistor.Around the time silicon reached its peak as a transistor ma-terial, Schottky barrier type FETs made of gallium arsenideappeared and quickly gained popularity by demonstratingtheir high theoretical performance. This new device, knownas the Gallium Arsenide Metal Semiconductor FET (GaAsMESFET) showed performance far superior to the bipolartransistor.This new device provided lower noise and higher gain inestablished solid state applications. It also provided highfrequency characteristics previously unavailable from bipo-lar transistors. It is made by using gallium arsenide (groupIII-V); one of the semiconductor com pounds which has beenresearched continually since the latter half of the 1960’s.The electron mobility of gallium arsenide is five to seventimes that of silicon.Gallium arsenide crystal technology was used to producethe GUNN, varactor and Schottky diodes, and proved to befar better than silicon in high frequency performance. AGUNN diode made of silicon would be inconceivable, so theappearance of the contemporary GaAs FET contributedgreatly to developing and commercializing the GUNN di-ode. The reason for this is that even though the GaAsMESFET is a three terminal device, it is simple in structureand its performance depends only on the crystal quality.Advances in crystal technology have made the commercial-ization of FETs possible.The GaAs FET is what is generally referred to as a “nor-mally ON” type device. Its basic difference from theMOSFET is the use of a Schottky barrier at the gate insteadof an oxide layer. This is an extremely important point. Inother words, almost no GaAs FET gates are insulated fromthe channels in terms of direct current. Thus, even thoughGaAs FETs are called “normally ON” type devices, the maxi-mum gate voltage must be zero. It does not use a dielectriclike the MOSFET, so if a positive voltage is applied at the

9/82

Page 2: GaAsFet

Mutual conductance is defined as the ratio of the change indirect current to the minor change in voltage between gatesources. This is generally described as the square-law char-acteristic and is shown in the equation for ID in Figure 2.

When ID in expression (1) is differentiated withrespect to VGS, the result is

and the mutual conductance for each value of VGS can beobtained.

II. GaAs FET BIAS AND OPERATING POINT

The most important characteristic to consider when design-ing a bias circuit for small signal GaAs FETs is the previ-ously mentioned transfer characteristic. Generally, two meth-ods can be used to bias a GaAs FET.

1. Dual Power Source Method Figure 3 shows a bias circuit which uses the dual powersource method. Since the condition

VP < VGS < 0

must always apply to a GaAs FET, VGS can be derived fromexpression (1)

2. Self Bias Method (Auto-Bias) Figure 4 shows the most universal method for reducingelectrical potential between a gate and the source when thereis only one power source. If the source resistance is RS, andthe operating current is ID, then the drop in electric poten-tial caused by RS will be

ID x RS

The actual electrical potential between the gateand the source will be

VGS = -ID . RS (4)

gate, direct current flows through it. Since the gate is a verysmall piece of metal (0.5,µ—1.Oµ—2.0µ), the gate electrodeswill fuse completely in almost all cases.Figure 1 shows the properties of a GaAs MESFET. In al-most all cases, a linear amplifier circuit biases the GaAsMESFET. This applies to other circuits as well, but consid-ering gate bias alone, the range must be from IDSS, i.e.,VG = 0 V, to IDS = 0 (at pinch off, VG = VP). In this range, thevoltage VDS between the drain and the source has little effecton the current IDS flowing through the channels. By chang-ing the gate voltage, VG, the drain to source (channel) cur-rent can be controlled. Figure 2 shows the transfer charac-teristics of a GaAs FET with n channels. This FET transfercharacteristic is an important basic parameter in circuit de-sign because it sets the bias conditions and operating point.The operating point line in Figure 2 is directly related to themutual conductance, gm.

Figure 1. Typical GaAs FET DC Characteristics

Figure 2. Square-Law Characteristic

AN82901-1

DRAIN TO SOURCE VOLTAGE ( VDS )

V =0

V = -1 V

-2 V

-3 V

G

G

DR

AIN

CU

RR

EN

T (

ID )

ID IDSS= 1VV

I

V V

V

GS

P

2

D

P P /2

G

0

ID IDSS= 1V

V

GS

P

2(1)-

dID 2IDSS= 1V

VGS

P= gm

VP-

dVGS- (2)

VGS VP= 1I

ID

DSS

(3)-

Page 3: GaAsFet

which is negative, so the FET can be turned on. The valueRS is obtained by combining expressions (3) and (4).

Therefore, these are the basic bias principles.

Figure 3. Dual Source Bias Method

Figure 4. Self (Auto) Bias Method

Figure 5 shows the five general bias types: A, B, C, D, andE. Type A is the previously described dual power sourcebias method appropriate for use in the higher frequencies.When directly connecting the source to the ground terminal,source inductance can be made relatively small. By usingthis method, higher gain can be obtained and a lower noisefactor anticipated in the higher frequencies.All other bias methods insert a bypass capacitor into thesource. Even if the high frequency performance of the by-pass capacitors can be guaranteed, there will always be aloss (tan δ) resulting from the material’s dielectric proper-ties. Even with chip capacitors, there is always some

AN82901-1

VGS VP= 1

I

I

D

DSS

(5)--I DI D

= -RS

BIAS ORDER BIAS POLARITY

inductance and care must be exercised when using them athigher frequencies. Types D and E in Figure 5 require onlyone power source. They are compatible with the previouslydescribed method. An advantage of this method is that ifthe source voltage should increase for any reason, that in-crease will be proportionate to the drop in potential causedby RS, which is connected in series with the source,

RS X ∆ID

Figure 5. GaAs FET Bias Circuits

Here, ∆ID is the increment in drain current caused by theincrement in source voltage.Drain current increase will be automatically suppressed, dueto the proportionate negative bias on the gate. Generally, ifa single source type (self biasing type) is selected, D is used;if the only available source is a negative one, then E shouldbe selected.Figure 5 shows the order for adding bias when a dual powersource is used. This is to prevent, as much as possible, a

V

V

VD

G

G(1)

(2)

(a)

V

V

VD

D

VS

S(1)

(2)

(b)

V

VS

VS

VG

G(1)

(2)

(c)

VD(d)

VD

RS

VG

VG

(e)

NEGATIVE

POSITIVE

VG

VD

POSITIVE VS

POSITIVE VD

NEGATIVE VG

NEGATIVE VS

POSITIVE VDONLY

NEGATIVE VGONLY

VD

VGS

DSS

D

SD

P

S

D

S

I

I

V

I R

R

R

I

X

b

a

ba=

I

I

V VVGS

GS′P 0

D

DSS

Page 4: GaAsFet

large current from flowing through the FET. The GaAs FETbeing discussed here generally has a high mutual conduc-tance, giving it excellent frequency characteristics. If thegate voltage is near zero, gm is at a maximum and oscillationmay occur. For this reason, a bias scheme should be adoptedthat first applies a negative bias to the gate and then turns onthe drain with a positive bias. There are slight differencesbetween a bias circuit for a small signal GaAs FET and onefor a power GaAs FET, but the above methods can be con-sidered for both. Moving one step further, let’s examine a practical bias cir-cuit. It is important to:

1. Obtain the necessary operating voltage and operatingcurrent, and

2. Ensure a high level of stability.

Figure 6. Possible Bias Points

Figure 6 shows the bias graph, indicating all possible biaspoints. Bias will be in the range determined by

VGSQ = IQRS

Given the bias range, the operating point for the maximumamplitude value, P, and the operating point where there isno signal, Q can be obtained. The change in IQ from point Pto point Q, or ∆IQ, becomes

∆IQ = IQ(max) - IQ(min)

This shows that with a variation in IQ, the drain voltage willchange only as RD . ∆IQ. If the signal midpoint is not fixed

AN82901-1

V

IQ(max)

IQ(min)

GS(min)

V VP(min) VP(max) GS(max)

DSS(min)IRS

DSS(max)I

R

S

D

R

δIQδIQ (0)

11 + gmRS

= = (6)

∂IQ∂T

∂IQ∂T

. ∂IQ∂VGSQ

δT+ .

δT -.

δIQ =

.=

at the center of the bias line and wanders off in some direc-tion, the wave form will be distorted. Also, the amplifica-tion operation will be degraded, and DC will flow throughthe gate. In a similar manner, the maximum variation involtage between the gate and the source when there is nosignal is

∆VGSQ = VGSQ(max) - VGSQ(min)

IQ is a function of both the temperature, T, and VGSQ

IQ = f (T, VGSQ )

If, with a variation in temperature of δT, IQ changes by onlyδTQ .

and from this

is obtained. If RS = 0, that is, if there is no series resistance, then

represents the drift. The bias stability coefficient is definedas

This means that fluctuation in the entire circuit is reducedby means of negative feedback due to RS. This effect is par-ticularly important when using small signal FETs.Figure 7 gives an example of a bias circuit. Since IDSS andVP often vary between devices, it is important that the biascircuit can absorb such variation, the optimum operatingpoint can always be established, and operation is stable re-gardless of ambient temperatures. The circuit in Figure 7 isbasically a fixed bias circuit and not a self bias circuit.

∂IQ∂T

δT = δIQ(0).

S =

δVGSQ

gmδIQ RS

δIQ (1 + gmRS) =∂IQ∂T

δT.

Fluctuation in IQ with independent of RS

Fluctuation in IQ with respect to RS

Page 5: GaAsFet

If there is no signal, the drain current ID is

Figure 8. Improving the Distortion FactorUsing a Series Feedback Resistance RF

Adding a simple sine wave voltage (Vsin wt) to the non-signal voltage results in

υgs = VGSQ + Vsin wt

If the expression is rearranged and substituted into the fol-lowing, then the harmonic distortion KF is

Relative value of second harmonic Relative value of fundamental harmonic

V (8)4(VGS - VP)

V is the maximum amplitude of the signal.As expression (8) shows, the distortion factor approaches itsminimum as VGSQ approaches zero. However, as the inputsignal increases and enters the realm of forward gate bias,quite naturally the distortion factor increases.Next, we will consider what happens to the cross modula-tion (intermodulation) produced when two sine wave sig-nals are amplified at the same time. That is

VGS = VGSQ + VI sin wt + V2 sin wt

Since the output current includes the sum and differencecomponents of two sine waves, crossmodulation

Feedback is applied to the circuit by the insertion of RS intothe source.

Figure 7. A Low Cost, Stable Bias Circuit

As stated previously, since the voltage between the gate andthe source is VGS = -IDRS in a self bias circuit, and if ID isknown, RS can be readily determined. In such a fixed biascircuit as the previously mentioned dual source type, the gatevoltage is selected independently of RS and ID. Thus, it isunderstood that the value RS can be higher than that whenusing a self-bias circuit, and the stability coefficient S cantherefore be improved.

III. GaAs FET CHARACTERISTICS ANDAPPLICATIONS

In this section, examples and explanations of GaAs FETapplications will be given. The first issue is the argument asto whether or not the FET is better than the bipolar transis-tor because of the FET’s cross modulation characteristic.Discussion will then turn to applications of the small signalFET and the large signal or power FET.

1. Distortion FactorThe transfer characteristic of a GaAs FET can be approxi-mated using a quadratic equation, as was shown in expres-sion (1). If the transfer characteristic could be perfectly rep-resented by such an equation, then the second harmonic willincrease to its maximum and will actually include the higherorder harmonic components. To determine the value of thesecond harmonic for a basic frequency, substitute the totalinput voltage and total output current into the equation.

KF =

=

AN82901-1

VR L1

C1

+Vcc

Rs

Vin

RF

VDD

RS

Vout

KF= V4(VGSQ PP)(1+gmRF)

IM=2(VGSQ VP)(V1+V2)2 2 1/2(1+gmRF)

V1V2

iD IDSS= 1v

V

gs

p

2(7)-

Page 6: GaAsFet

in terms of noise, gain and output-power saturation char-acteristics. Other than their primary use in ultra-high fre-quency amplifiers, such as those for electronic countermea-sures (ECM), most small signal FET applications are in low-noise amplifiers. They are used in both line-of-sight andover-the-horizon microwave communications, and in earthstations communicating with satellites. A low noise amplifier is designed by minimizing the noisemeasure, M, shown in expression (12).

NF is the amplifier noise factor. G is the amplifier gain.In single-stage amplifiers, the general procedure for match-ing input circuits is to mimimize the noise factor, NF; formatching output circuits, the gain is maximized. From observations of the input-output impedances of a GaAsFET, it is noted that there is generally a difference in imped-ance between maximum gain and minimum NF. This dif-ference is particularly apparent at lower frequencies. As thefrequencies go higher, the difference seems to decrease. Thenoise factor, which is a function of device gain, will be lowwhen the gain is maximized at high frequencies. However,of the commercially available GaAs FETs having character-istics which allow a gain of 8 to 10 dB or more, there is stilla difference between the impedance at maximum gain andthe impedance at miminum NF. This difference will be seenuntil the frequency range approaches the X band.

Figure 9. Frequency Characteristics Of S1l, S22, and ZFopt in the NE24406

(intermodulation) distortion, IM, is defined as follows:

Even here, we see that the distortion factor decreases as biasis brought closer to VGSQ = 0. The main cause of the distor-tion is the curve (non linearity) in the transfer characteristicline, but there are other causes as well.Distortion can also be caused by the change in output con-ductance, gd, related to the operating point and the drainvoltage, VDS. To improve distortion, carefully select gm andgd, which to a certain degree work to reverse this effect.Another point to consider is that since distortion can be pro-duced internally, KF and IM can both be improved by apply-ing feedback to the circuit.As shown in Figure 8, by adding a resistance, RF, in serieswith the source resistance, the distortion factor for the non-bypass feedback is calculated, using expressions (10) and (11).

By applying feedback to the circuit, both the distortion factorand the bandwidth can be improved. The value of RF willreduce the total gain only by its relative portion. It is pos-sible to have a wide-band amplifier with a low distortion fac-tor by initially designing the amplifier for high gain and tun-ing the gain to its optimum level by using feedback.

2. Small Signal FET ApplicationsThe first practical and commercially available GaAs FETwas introduced around 1973. Since then, many small signalamplifying devices with 1µm gate lengths and smaller havebeen marketed.The greatest advantages for these devices are found in thehigher frequency bands. Compared to the silicon bipolartransistors and tunnel diodes, GaAs FETs are far better

AN82901-1

+5+4

2

+33

ZFopt

+2.0

+1.5+1

.0

45

+0.8

+0.6

+0.4

6

7

8

+0.20

-0.2

-0.4

-0.6

-0.8

-1.0 -1

.5

-2.0

-3

-4-5

2

3

4

56

2

34

8

7

95

6

7

8

10

11 9

10

GHz

GHz GH

z

11

12

12

2.0

1.0

0.8

0.6

0.4

S22 S

11

M + 1 = 1 + NF - 11 - (1/G)

(12)

=2(VGSQ VP)(V1+V2)2 2 1/2

V1V2 (9)

IM =Relative value of Relative value of

cross modulation component fundamental harmonic

KF=V

4(VGSQ VP)(1+gmRF)

IM=2(VGSQ VP)(V1+V2)2 2 1/2(1+gmRF)

V1V2

(10)

(11)

Page 7: GaAsFet

Figure 9 shows S11 and S22, indicating input output imped-ance for the NE24406 and the signal source impedance whenthe noise factor, NF, is minimized. Circuits can be matchedusing these impedances. As mentioned previously, inputcircuit matching is accomplished by matching to ZFopt; andoutput circuit matching is accomplished by matching to S22. In the design of a multi-stage amplifier, the first and secondstages are designed so that (M + 1) will be minimized, andthe third and subsequent stages are made in such a way thattheir gain is maximized. Or, alternately, the amplifier canbe designed according to the characteristics determined bythe frequency and the device. One impedance matching circuit, shown in Figure 10(a), isthe well known Tchebycheff filter type multi-stage imped-ance matching circuit. The distinctive feature of this circuitlies in its applicability to the input/output circuits of wide-band amplifiers. In many cases, the circuit is used in ampli-fiers covering the band range 8 GHz to 12 GHz and above.Although this type of matching network was originally ap-plied to comparatively narrow bands (such as a 500 MHzbandwidth at 4 GHz), the matching circuits shown in Figure10(b) and (c) are now believed to be best suited for bandshaving approximately a 10 to 15 percent ratio to theamplifier’s center frequency.

For these bandwidths, the NF can be reduced to its lowestabsolute value. If the widest possible bandwidth is the ob-jective, then reduction of the NF to its absolute minimum isnot possible throughout the band. In the former amplifier,the most important consideration is reducing, as much aspossible, the loss in the impedance matching circuit. TheTchebycheff filter type impedance matching circuit in Fig-ure 10(a) uses a large number of components and is not wellsuited for obtaining a low loss matching network.As Figure 9 shows, both S11 and S22 go from capacitive toinductive with increasing frequencies. Consequently, S11and S22 can use the circuit in Figure 10(b) for frequencieswhich exhibit a capacitive response, or the circuit of Figure10(c) for the frequencies which exhibit an inductive response.In Figure 10(b), for frequencies slightly higher than theamplifier’s center frequency, the GaAs FET input or outputhas a resonance of either L1 or L2 (with a reactance of 0),which is then matched to the desired impedance by the λ/4impedance conversion circuit. This is only one of the count-less possible impedance matching circuits. However, this isa very effective design method for low noise amplifiers re-quiring a band ratio of 10 to 15 percent when the amplifier’scenter frequency is 4 GHz or greater.

Figure 10. GaAs FET Matching Networks

AN82901-1

IMPEDANCE INVERTER

_l 34_ l 34

jX34

ADMITTANCE INVERTER

_l 23

λ / 4 λ / 4

_ l 23_ l 12

_ l 12

jX12

l

(a)

λ / 4

λ / 4l1

l2

(b)

λ / 4

λ / 4

(c)

C1

C2

IMPEDANCE INVERTER

Page 8: GaAsFet

3. Low Noise Amplifiers in the 4 GHz BandFigure 11 is an example of a two-stage low-noise amplifierfor the 3.7 to 4.2 GHz band using either the NE21889 or theNE72089. The matching circuit in Figure 11 is based on thesame idea as Figure 10(b). It uses a microstrip with an

0.8 mm thickness teflon glass fiber substrate and transistorleads with lumped constant inductance. Figure 12 showsthe schematics. Figure 13 shows the gain and noise factornormally obtained using this circuit.

Figure 11. PCB Layout of a 2-Stage Amplifier in the 3.7 GHz-4.2 GHz Band

Figure 12. Schematics for a 3.7 GHz-4.2 GHz Band 2- Stage Amplifier

AN82901-1

CEL

10 pF

IN

10 pF

3.7-4.2 GHz LNA

THRU HOLES FOR NE72089 SOURCE LEADS 4 PLACES

10 pF

OUT

28.0 mm

69.6 mm

1000 pF 4 PLACES

SHIM STOCK TO GROUND ALL 4 SOLDER PADS

Parts List: NE72089 FET (2 ea.) California Eastern Laboratories10 pF Chip Capacitors (3 ea.) ATC #100A-100-J-P-X-50 or equivalent1000 pF Chip Capacitors (4 ea.) Johanson #50R11W102KP or equivalent1500 pF Feed-through Capacitors (4 ea.) Erie #2425-003-W5U0153AA or equivalentFerrite Beads (4 ea.) Fairrite #2643001301 or equivalent

C1

Z0

TRL1

SST1

λ / 4

λ / 4

λ / 4 λ / 4

λ / 4

λ / 4

C4 C5 C6

C2

C7 C8 C9 C10 C11 C12

C13 C14 C15

C3

SST2 SST3

SST4

Z0TRL2( )

TRL3Z0

Vd2

Vd1 Vg2Vg1

Page 9: GaAsFet

4. Low Noise Amplifiers in the 1 GHz BandFigure 14 shows a PCB layout for an amplifier designed forlow noise operation in the 1 to 1.4 GHz band. Since themicrostrip lines used are very thin, the diagram shown hereis twice the actual size. During the design, it should be drawnfour times the actual size and then reduced.Figure 15 shows the equivalent circuit. In the design of thiscircuit, a band ratio of 10 to 15 percent was not obtained aswith the previous amplifier. Instead, emphasis has shiftedto making the band as wide as possible and the noise factoras low as possible. Since it is in the relatively low-frequency1 GHz band, the loss due to the reactance elements (includ-ing the microstrip) was not given much concern. TheTchebycheff filter type multi-stage impedance matching cir-cuit could have been used. However, considering the fre-quencies involved and the large physical size of such a cir-cuit, a method was chosen that gives the transmission lineas high an impedance as possible for input and output, andwhich would gradually match to the characteristics imped-ance of 50Ω. Figure 16 shows the typical performance char-acteristics of this amplifer.

Figure 15. Equivalent Circuit for a NE72089 Low-Noise Amplifier

Figure 16. NE72089 Low-Noise Amplifier

When this amplifier was designed, a 4 pF blocking chip ca-pacitor was used as part of the matching circuit, as shown inFigure 15. The input matching circuit was designed chieflyFigure 14. PCB Layout for 1.0-1.4 GHz Amplifier

This two-stage amplifier uses the inductance in the first stageinput section to produce resonance. Then, using the λ/4impedance transformer, it forms a matching circuit for the50Ω characteristic impedance. Since there is a relativelysmall difference in values between S11and S22, the inter-mediate stage matches impedance by the simple means of atransmission line.Output matching is done in the same way as in the first step,i.e., the matching circuit shown in Figure 10(b) is used. Fig-ure 11 is a full-scale pattern showing lines and open stubsinserted in parallel. Although these are not necessary forthe ideal design, they are included to correct impedancematching problems caused by the printed circuit board con-nectors (microstrip to coaxial connection) and the DC block-ing chip capacitors. They are inserted after the design iscompleted.

Figure 13. Frequency Characteristic of NF and G for the NE72089 2-Stage Amplifier

AN82901-1

GA

IN, G

(dB

)

NO

ISE

FAC

TOR

, NF

(dB)

25

20

3.5 3.7 3.9 4.1 4.3 4.5

G

NF1.0

2.0

3.0

4.0

FREQUENCY (GHz)

77 Ω 70 Ω

70 Ω

70Ω 120 Ω120 Ω

74 Ω

4 pF

70 Ω 70 Ω

2SK281

94 Ω

85 Ω

60 Ω

1.8 pF

THROUGH-HOLES

IN OUT

4.625 cm

0.85 cm

MATERIAL 0.8 mm THICK TEFLON GLASS

24

20

16

12

81.1 1.2 1.3 1.4 1.5

4

3

2

1NF

G

FREQUENCY (GHz)

NO

ISE

FAC

TOR

, NF

GA

IN,G

(G

Hz)

Page 10: GaAsFet

to obtain matching for the noise factor. The data used forthe NE72089 is shown below:

The bias circuit used to actuate this amplifier is shown inFigure 17. The figure shows a bias circuit for a two-stageamplifier. For a single stage amplifier, only one half of theredundant portion of the circuit would be used. This circuitis a constant voltage, constant current type bias circuit, oneof the most applicable examples of circuits for use in small-signal amplifiers.

5. Applications to Other Amplifiers

(A) A technique of attaining wide band performance byinserting a source inductance.L. Neven, et al., have proposed a type of feed back circuit forrelatively low frequency GaAs FET amplifiers. For amplifi-ers operating in the 1 GHz to 2 GHz range, these circuitsguarantee a low noise factor as well as good input-outputimpedance. Figure 18 shows what is considered the universal GaAs FETequivalent circuit. In this circuit, drain noise current, Idn, isreferred to the input by the Vander-Ziel theory, then the gatesource resistances, Ri, becomes noiseless and, RS remainsnoisy. The noise currents at the gate and drain have beenremoved from the two-port. The circuit in Figure 18 is bet-ter handled by computers, where the noise and signal arecompared as a function of the externally added source in-ductance. In this instance, it is easier to consider the equiva-lent circuit shown in Figure 19.

Figure 17. Two Stage GaAs FET LNA Bias Supply

Figure 18. Universal GaAs FET Equivalent Circuit Figure 19. Cascade Connection of Device's Noise and S-Parameter Circuits

AN82901-1

f ΓFopt* Fmin G NF @ 50 Ω1 GHz 0.59<32.5 0.6dB 17.5 dB 1.73 dB

1.3 GHz 0.65<47.0 0.6 dB 15.0 dB 1.74 dB

VDS = 3 V, IDS = 10 mA

*(I' Fopt signifies the reflection coefficient obtained when comparing thesignal course impedance with 50 Ω when NF is minimized)

VDS2

(3V)

100K

500R3

330

4.3K

6.8V3.3K

VGS2

100K

.01µF

4.3K

6.8V3.3K

.01µF

A21 2

(3V)VDS1

VGS1

100K

100K

6.8V

A11 2

A11 2

(3V) 500R2

330

4.7µF100K

100K(3V)

10KR1500

15V

2.2K

15VDUAL

POWER SUPPLY

15V 2N3643

5.6K

A21 2

A1 AND A2: 747 DUAL OP-AMPALL RESISTORS: 1/4 Watt

LG GR Cgs d dR L

gd

m dnIg

C

R

R

L

L '

Cds

V

S

S

S

i

i

EXTERNAL SOURCE INDUCTANCE

en

+

I

I

C

u

NOISELESS TWO-PORT

EXTERNAL SOURCE INDUCTANCE

-

Page 11: GaAsFet

Figure 19 shows the cascade connections of the device’s noiseand S-parameter equivalent circuits. The circuit should be

designed so that matching is obtained for the input-outputimpedance given to this equivalent circuit. After the designgoals have been chosen, the noise figure, NF, and impedancematching networks are calculated. The circuits and charac-teristics of an amplifier designed by this method are shownin Figures 20(a) and 20(b).

(B) Ultra-wide band amplifiers using GaAs FETs.The method normally used to achieve wide-band amplifica-tion involves applying negative feed back to the transistor.This method improves the VSWR and dynamic range char-acteristics and also ensures very flat gain response. Anothermethod for achieving wide-band amplification involves us-ing a balanced amplifier design which ensures good VSWR.This method is widely used in applications that cover fre-quency ranges of one to several octaves in the higher fre-quency bands. However, it is difficult to obtain a very wideband using a 3 dB, 90° coupler while also trying to ensuregood input-output VSWR in ranges exceeding 10 octaves, orin the low frequency ranges. Figure 21 shows an equivalentcircuit for the balanced amp.

Figure 21. Balanced Amplifier Allowing Wide-Band Amplification

The use of GaAs FETs with negative feedback is an effectivemethod of ensuring low cost and simplicity for bandwidthsexceeding 10 octaves.Figure 22 shows the basic circuit for negative feedback am-plifiers. For the sake of simplicity, the DC bias circuit andthe coupling capacitors have been omitted. If the character-istics of the GaAs FET to be used are suitable at frequenciesof 10 MHz to 2 GHz, the device’s parasitic elements will besmall in size, and the equivalent circuit can be simplified tothat shown in Figure 23. The simplified equivalent circuitshown in Figure 24 is obtained by adding the negative feed-back resistor shown in Figure 22 to the circuit in Figure 23.The S-parameters may now be calculated for this situation.

Figure 20(b). Transmission Line Matching Network

Figure 20(a). Lumped Element Matching Network

AN82901-1

10 nH

10.6 nH

1.5 nH

pF0.8

nHpF0.13 11.4

G13

12

11

2

1

8

6

4

2

1.0 1.2 1.4 1.6 1.8 2.0

ISWR

NF

OSWR

FREQUENCY (GHz)

(a)

10 n H

1.5 n H

10 n Hλ 4 @ 1.5 GHz60 Ω

15

14

13

12

2

1

0

4

3

2

1

1.3 1.4 1.5 1.6 1.7

G

ISWR

OSWR

NF

FREQUENCY (GHz)(B)

NO

ISE

FA

CTO

R, N

F (

dB)

GA

IN, G

(dB

)

SW

R

IN 3 dB, 90˚ 3 dB, 90˚

OUTZo

Zo

AMPS (BOTH ARE THE SAME)

SW

R

NO

ISE

FA

CT

OR

, NF

(dB

)d

GA

IN, G

(dB

)

Page 12: GaAsFet

Figure 22. Basic Feedback Amplifier Circuit

Figure 23. Equivalent Circuit for GaAs at Low Frequency

Assuming that a negative feedback amplifier must improveVSWR, the input and output reflection coefficient must be0, then expressions (14) and (15) become

S11 = S22 = 0

From this, the following expression can be derived:

When expression (18) is substituted into expressions (16)and (17), the following results are obtained

Then, using expression (18), R1 is obtained as follows

Since the transconductance, gm, in a GaAs FET is not usu-ally large enough, the equation S11 = S22 = 0 will not besatisfied. However, the range of the gm values needed tosatisfy the expression can be calculated. If R1= 0 then

S21 = I - gmZo (22)

AN82901-1

R1

R2

IN

OUT

I R I

Vg

R

VV V

gm

22

1

g1 2

1

S11=1∆ 1 -

R (1 + g R )g Z 2

0(14)

S22=1∆ 1 -

R (1 + g R )g Z 2

0(15)

S12 =1∆ R2

2Z0(16)

S21 =1∆ 1 + g R

-2g Z 2R0(17)+

0R

= 1∆R2Z0

R (1 + g R )++

g Z20

2 m 1

2 m 1

m

m

mm 1 2

1m

m2 2

GATE DRAIN

VgsVgsgm

SOURCE

The admittance matrix can be determined by using thefollowing expression.

Figure 24. Simplified Feedback Amplifier Equivalent Circuit

If at this time, the input-output for Figure 24 is terminatedat Z0, the S matrix can be easily obtained by using expres-sion (13).

I1I2 =

1R2

gm

1 + gmR1

V1

V2 (13)1R2

1R2

1R2

Page 13: GaAsFet

is obtained, and thus

gm| min = 1 - S21 (23)Zo

For example, consider the design of an amplifier with 10 dBgain. Logically, if we take the input output VSWR as a lowvalue and the characteristic impedance, Z0, as 50Ω, whenS11 = S22 = 0, then substituting this in expression (23) yields,

It will therefore be acceptable if gm≥83mS. Figure 25 showsthe characteristics of an ultra wide band amplifier designedusing this method.

Figure 25. GaAs FET Feedback Amplifier

6. Relation of Ambient Temperature, Frequencyand Noise Temperature in GaAs FETs

Up to this point, only the applications of GaAs FETs in am-plifiers have been examined. Now, the discussion will turnto the relationship between ambient temperature and noisetemperature.Noise in a GaAs FET is chiefly thermal noise. Since there israrely shot noise, the noise temperature in an amplifierchanges greatly in response to the ambient temperature. Fig-ure 26 shows the relationship of operating temperature andthe noise temperature for the NE67383/NE71083. The noisetemperature, Te and ambient operating temperature, Ta, canbe shown to correspond to the following:

Figure 26 shows the linearity in the relationship between theambient operating temperature and the noise temperature.By taking advantage of this characteristic, a super low-noiseamplifier can be produced by cooling the amplifier with car-bonic gas, liquid nitrogen or liquid helium.

Figure 26. Te vs. Ta for the NE67383/NE71083

7. Power GaAs FET ApplicationsFor the small signal GaAs FETs discussed so far, we havecovered only those signal levels in the range in which oper-ating characteristics are not dependent on signal voltage orsignal current. In other words, each terminal’s voltage andcurrent was in a range which satisfied a linear relationship.As the signal level increases, this relation- ship is no longersatisfied and we have a situation known as large signal op-eration. Of course, even if the element is in non-linear op-eration, the electrophysical quantity of the signal frequencyis still in a linear relationship if non-linearity is small. Thus,the S-parameter relationship in a GaAs FET can be deter-mined for small signal operation.Because the voltage and current-to-terminal conditions whichdefine each parameter are not fixed for large signal opera-tion, it is difficult to determine parameters indicating a lin-ear relationship.Figure 27 is a simplified diagram showing the small andlarge signal operation of a Class A GaAs FET. Load lines Aand B indicate the optimum conditions for maximum inputand output when the input gate signal voltage is VGA andVGB.The optimum load for small signal operation is equal to thedrain conductance (ðIDS /ðVD). In large signal operation,however, the input signal level will increase and gate volt-age, VG, will enter the nonlinear zone. The output current,which is the drain current, ID, will then reach its upper limitand the load line gradient must increase to increase the out-put power. Therefore, when designing a circuit, it is neces-sary to use data which takes all factors into consideration.

AN82901-1

1 - (-3.16)

50

8

6

4

2

0.01 0.1 1 10

FREQUENCY (GHz)

GA

IN, G

(dB

)

ωCgs

gm

4GHz

12GHz

100 150 200 250 300 3500

50

100

150

200

250

300

NO

ISE

TE

MP

ER

ATU

RE

, T (

K)

= 0.082 S

Te = K TA (24)

GaAs FET OPERATING TEMPERATURE, Ta (K)

Page 14: GaAsFet

Figure 27. Simplified Load Line for a Class A GaAs FET in Small and Large Signal Operation

8. Operating Methods for Power GaAs FETs

(A) IntroductionAn important factor to consider when working with PowerGaAs FETs is power GaAs FETs are basically a group ofsmall signal GaAs FETs connected in parallel so that theycan handle a large power source. Therefore, they have anextremely high transconductance. Another important andnecessary factor to consider is at which bias point operationtakes place. Consideration must be given as to whether thereis adequate bias resistance to suppress the gate current. Asmentioned previously, Schottky gates are used in a GaAsFET, and there is the possibility that the operating point willcause an excessive current to flow across the gate.The gate structure in a GaAs FET is very delicate, with atypical gate length of 0.5/µm to 1.0µm. In some cases, justa slight current flow across the gate will have a current den-sity of 106A/cm2. With such high current density, the gatewill eventually fail.Figure 28 shows the change in input-output characteristicsdue to the increasing gate current. Here, the operating drainvoltage is constant, but direct current begins to flow in theopposite direction at the gate when the input signal level isincreased sufficiently. When the input signal power increases,the Schottky gate is biased in the forward direction and gatecurrent begins to flow in that direction. Caution must be

Figure 28. Relationship of Input-Output Characteristics to Increasing Gate Current

taken at this time since the amount of gate current has abearing on whether or not the FET will be destroyed.

AN82901-1

DB

V

i D

DSI

i DB

t

it

A

B

DA

1

P

VD

VGBVGB

VDS

DB

V

DA

V

t

V =0G

t1

10

5

0

5

10

1.3

1.2

1.1

302010

20

30

INPUT, Pin (dBm)

GAT

E C

UR

RE

NT

(mA

)D

RA

IN C

UR

RE

NT

(mA

)

OU

TP

UT,

Pou

t (dB

m)

Page 15: GaAsFet

NE8001 3.0 mANE8002 6.0 mANE8004 10.0 mANE8008 15.0 mANE3716 20.0 mANE9000 0.5 mA

NE9001 1.3 mANE9002 2.6 mANE9004 5.0 mANE9008 8.0 mANE8681 3.0 mANE8682 6.0 mA

NE8684 10.0 mANE8688 15.0 mANE8691 1.3 mANE8692 2.6 mANE8694 5.0 mA

(B) Bias Circuits Table 1 shows the maximum allowable gate current foreach of NEC’s high power GaAs FETS. Care should betaken at all times when planning bias circuits and input powerto ensure that these values are not exceeded.

One thing that is very basic when biasing power GaAs FETsis the need for increased impedance of the gate bias circuit.The example in Figure 29 shows a type of feedback circuitincorporating a resistor in series with the bias circuit whichproduces a drop in potential when the current across the gatebegins to increase, and adds to the gate series bias. By in-serting a low pass filter, such as an RFC or capacitor, unnec-essary oscillation or phase shift will be prevented.Another important factor is the order in which bias is ap-plied. It is generally disadvantageous, both thermally andelectrically, to self-bias a power GaAs FET. Therefore, apositive and negative dual power source should be used tobias the drain and gate separately. For a GaAs FET, maxi-mum current will flow when the gate voltage is at zero. Witha high output level FET, IDSS is sometimes greater than sev-eral amps and since typical gm is extremely high, oscillationwill occur and the FET will be destroyed either thermally orelectrically. For this reason, any appreciable flow of highcurrent must be prevented from reaching the drain. Thebias method used must be one whereby negative voltage isapplied to the gate first, after which positive voltage is ap-plied to the drain. The following is a detailed example ofthis method.

(1) Add a negative potential to the gate which isclose to -5V or to the pinch off voltage.

(2) Specify the drain voltage in such a way thatit moves as rapidly and smoothly as possible from zero voltsto the preset VD. If there is no possibility of a surge voltagebeing produced and the drain voltage is completely stable,add the preset voltage instantaneously. Figure 30 gives three recommended bias circuits for biasingpower FETS. Figure 30(a) is an excellent bias circuit be-cause there are no limitations requiring that either positiveor negative voltage be applied to the circuit first. Drain volt-age, VD, will reach its preset value according to the time

Figure 29. Example of a Gate Bias Circuit

Figure 30. Power GaAs FET Bias Circuits

Table 1: Maximum Allowable Gate Currents for the NEC Power GaAs FET Series

AN82901-1

V

1 µF VR

R 1000 pF RFC TO GATE

4.7 pF

V

R D1

V(a)

C

STABILIZED

STABILIZEDV

VG

VD V

(b)

VG

VD V

V VG

VD

STABILIZED

(c)

+-

Page 16: GaAsFet

Figure 31. Power GaAs FET Regulated Bias Supply

constant determined by C and R. When the power source isOFF, the electrical charge will pass through diode D1, andreturn quickly to the power source side, thus the FET canthen be safely biased.Figure 31 shows a bias circuit recommended for biasing amultistage (5 stages) power GaAs FET amplifier.

9. Examples of C-Band Application Circuits Using NEC’s Power GaAs FET SeriesWith the exception of the devices with the 96 package, NEC’sC-Band GaAs FET series using multiple chips contain in-ternal matching network (IMN) circuits within the packages.The IMNs are not intended to match the devices to 50Ω butto facilitate and reduce the external matching networks. TheGaAs FET series which are in 98 packages have both inputand output matching circuits close to VSWR, 1:2.5. Thedevices in 95 and 98 packages which have internal match-ing circuits are identified by the numbers -4, -5, (-5H), -6,-7, (-7H), and -8. Each of these numbers indicates the

center frequency at which the IMN circuit is optimized andtested. For example, -4 is at 4 GHz (3.5-4.5 GHz) and -6 isat 6 GHz (5.5-6.5 GHz). Figures 32 to 68 relate typical characteristics and illus-trate application circuits using an 0.8mm thick teflon glasscircuit board. The units used in these charts are millimeters(mm). Figure 69 gives AM-PM conversions for NE800,NE371, and NE868 series. This data is particularly effec-tive when designing a PCM transmitter. Figure 70 gives thestandard characteristics for the third order intermodulationof NE800898-7H and NE868898-6. This brief report explains current GaAs FET technology.Improvement of device characteristics is a major goal forboth applied technology and research in electronics. GaAsFET reliability has already been confirmed and there is littledoubt that FETs will eventually be used at frequencies of 40GHz and higher.

AN82901-1

DUAL ±15V

POWER SUPPLY

S1A

+10µF

2A

5V2K

R120K

3

6

9 IC1

8

Q1

S1B 330 22 6

6.8K 2 10

1

4

5

7

.01µF

7

100

.001

.0003

Q3 .1 2W

1KQ247µF

10µF

10µF

2.4K

2.5K+

5

3

2

1 9

IC2

8

.0003 + 47µF

R2 500

R3 33

+

VGS

+ VDS

A

Q1 - SK3448Q2 - 2N706Q3 - 2N3771IC1- MC1469IC2-LM304

NOTE: 1) Ammeter is optional.2) Q3 is mounted on external heat sink.3) R1, R2 and R3 are mounted externally.4) All resistors are 1\4 watt unless otherwise noted.

Page 17: GaAsFet

IN

20.04.0 2.0

17.0 5.

0

20.04.0

3.0

3.0

2.1

OUT

34

32

30

P =25 dBmin

f=4.2GHz

28

26

2416 18 20 22 24

3.6 3.7 3.8 3.9 4.0 4.1 4.2

26 28

28

30

26

24

224 16 18 20 22 24 26

5.9 6.0 6.1 6.2 6.3 6.4 6.5

inP = 22 dBm

f = 6.5GHzOUT

20.0

4.0

2.0

2.0

2.1

20.0

3.0

17.0

5.0

IN

28

26

24

22

2012 14 16 18 20 22 24

5.9 6.0 6.1 6.2 6.3 6.4 6.5

f = 6.5 GHz

IN OUT

20.0

9.0 2.0

20.0

4.0

4.0

2.1

17.0

4.0

4.0

P = 18 dBmin

IN OUT

20.03.0

3.0

20.0

4.0

3.0

3.0

2.1

17.0

28

26

24

22

2012 14 16 18 20 22 24

4.9 5.0 5.1 5.2 5.3 5.4 5.5

P = 18 dBmin

f = 5.5GHz

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 32. NE800196, 5 GHz Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)P

out

(dB

m)

Pin (dBm)

f (GHz)Figure 33. NE800196, 6 GHz Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Figure 34. NE800296 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)

Figure 35. NE800495-4 Circuit

Page 18: GaAsFet

34

32

30

28

26

2416 18 20 22 24 26 28

7.8 7.9 8.0 8.1 8.2 8.3 8.4

P = 26 dBmin

f = 8.4GHz

20.0

8.0 4.0

4.0

2.1

3.0

17

.0

20.0

8.0 4.04.0

IN OUT

34

32

30

28

26

24

16 18 20 22 24 26 28

4.4 4.5 4.6 4.7 4.8 4.9 5.0

P = 25 dBmin

f = 5.5 GHz

IN

20.0

5.0

20.0

3.0

4.0

4.0

4.0

4.017

.0

OUT

2.1

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

f (GHz)

Pou

t (d

Bm

)

Pin (dBm)

Figure 36. NE800495-5 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

f (GHz)

Pin (dBm)

Figure 37. NE800495-6 Circuit

P 26 dBmin

f = 6.5 GHz

2826242220181624

26

28

30

32

34OUT

20.0

IN

20.0

3.0

4.0

17.0

3.0

2.1

5.0

5.9 6.0 6.1 6.2 6.3 6.1 6.3

=

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

34

32

30

28

26

24

16 18 20 22 24 26 28

6.6 6.7 6.8 6.9 7.0 7.1 7.2

P = 26 dBmin

f = 7.2 GHz

IN

20.0

5.0

20.0

3.0

3.0

4.0

3.0

17.0

OUT

2.1

2.02.0 11.0

5.02.0

3.0

3.0

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Figure 38. NE800495-7 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

f (GHz)

Pin (dBm)

Figure 39. NE800495-8 Circuit

Page 19: GaAsFet

P = 29 dBm

f = 4.2GHz

in

22 24 26 28 30 32 34

38

36

34

32

30

3.7 3.8 3.9 4.0 4.1 4.2 4.3

IN OUT20.0

3.010.0

20.03.0

14.0

5.0

4.0

4.0

2.1

17.0

20.0

10.05.0

2.0

17.0

2.1

3.0

4.0

2.0

1.0

2.1

20.02.0

17.0

1.0

IN OUT

P =29.5 dBmin

f = 5.5 GHz

38

36

34

32

3022 24 26 28 30 32 34

5.0 5.1 5.2 5.3 5.4 5.5 5.6

38

36

34

32

3022 24 26 28 30 32 34

4.4 4.5 4.6 4.7 4.8 4.9 5.0

P = 29 dBmin

f = 5 GHz20.0 20.0

3.0 3.0

3.0

3.0

IN OUT

6.0 4.0 6.011.3

1.0

17.0

2.1

P = 29.5 dBmin

f = 6.4 GHz

38

36

34

32

3022 24 26 28 30 32 34

5.9 6.0 6.1 6.2 6.3 6.4 6.5

IN OUT

20.0

2.0

20.0

2.0

2.0

2.1

1.0

17.0

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

Figure 42. NE800898-5H Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 40. NE800898-4 Circuit

Figure 43. NE800898-6 Circuit

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)P

out

(dB

m)

Pin (dBm)

f (GHz)

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 41. NE800898-5 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Page 20: GaAsFet

20.09.06.0

20.07.0

17.0

2.0

3.0

2.1

IN OUT

38

36

34

32

30

2822 24 26 28 30 32 34

6.6 6.7 6.8 6.9 7.0 7.1 7.2

f = 7.2 GHz

P = 29.5 dBmin

2.0

5.0 2.0

3.0

20.0

1.5

17.0

5.0 2.0

2.0

2.0

3.0

2.1

20.0

IN OUT 38

36

34

32

30

22 24 26 28 30 32 34

f = 7.4 GHz

P IN = 30 dBm

7.2 7.3 7.4 7.5 7.6 7.7 7.8

20.03.0 4.0

2.0

20.03.0

10.0

3.0

2.1

17.0

OUTIN

34323028262422

7.8 7.9 8.0 8.1 8.2 8.3 8.4

38

36

34

32

30

28

P = 30.5dBmin

f = 8.4GHz

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 44. NE800898-7 Circuit

Figure 45. NE800898-7H Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

20.0

3.0 7.0

20.0

3.012.0

17.0

4.0

4.0

5.0

5.0

2.1

IN OUT 40

38

36

34

3224 26 28 30 32 34 36

3.7 3.8 3.9 4.0 4.1 4.2 4.3

P = 31.5 dBm

f = 4.2 GHz

in

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)Pin (dBm)

f (GHz)

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)

Figure 46. NE800898-8 Circuit

Figure 47. NE371698-4 Circuit

Page 21: GaAsFet

40

38

36

34

32

3024 26 28 30 32 34 36

6.6 6.7 6.8 6.9 7.0 7.1 7.2

P = 32.5 dBmin

f = 7.2 GHz

20.04.0 7.0

5.0

4.0

20.03.0 3.0

17.0

2.1

IN OUT

40

38

36

34

32

3024 26 28 30 32 34 36

7.1 7.2 7.3 7.4 7.5 7.6 7.7

f = 7.7 GHz

P = 32.5 dBmin20.03.0 3.0

20.0

2.0 4.0

2.0

2.1

4.0

17.0

IN OUT

f = 6.5 GHz

P = 32 dBmin

40

38

36

34

32

3024 26 28 30 32 34 36

5.9 6.0 6.1 6.2 6.3 6.4 6.5

20.0

5.0 8.0

4.0

4.0

3.0

17.0

2.1

20.07.0 3.0 3.0 3.0

OUTIN

20.010.07.0

3.0 10.0

3.0

3.0

17.0

20.03.0 3.0 4.0

3.0

2.0

2.1

IN OUT P = 32 dBm

f = 5.5GHz

40

38

36

34

32

3024 26 28 30 32 34 36

4.9 5.0 5.1 5.2 5.3 5.4 5.5

in

Figure 51. NE371698-7H Circuit

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Figure 48. NE371698-5H Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Figure 49. NE371698-6 Circuit

Pou

t (d

Bm

)

Figure 50. NE371698-7 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pin (dBm)

f (GHz)

Pou

t (d

Bm

)

Pin (dBm)

f (GHz)

Page 22: GaAsFet

P =17 dBm

f = 5 GHz

30

20

100 10 20

4.5 5 5.5

20

7 6.53.5 3 8.5

1015 2

IN OUT

in

30

20

100 10 20

3.5 4 4.5

Pin

f = 4 GHz

3014 6

21 10.5 29

3.5 3 4 3.8

5

OUTIN

= +17 dBm

30

20

100 10 20

6.5 7 7.5

P =+ 17 dBm

f = 7.2 GHz VDS = 9 V ID = 125 mA

in20

10.53 3.5

11.5

5

6

15 2

IN OUT

IN OUT

20

8.3 5.22.6 4 8.4

6.8

6.52

15

30

20

100 10 20

5.5 6 6.5

P = +17 dBm

f = 6 GHz

in

Figure 52. NE868196, 4 GHz Circuit

Figure 53. NE868196, 5 GHz Circuit

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Pou

t (dB

m)

Pou

t (dB

m)

Pou

t (dB

m)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

f (GHz)

Pin (dBm)

Figure 54. NE868196, 6 GHz Circuit

Figure 55. NE868196 Test Circuit (6.5 GHz and 7.5 GHz)

Pou

t (dB

m)

Page 23: GaAsFet

40

30

2010 20 30

5.8 6 6.2 6.4 6.6

20

6.52.5

2

4

2 7.5 2

2 5615

4

IN OUT

Pin = 22 dBm

f = 6.5 GHz

2

IN OUT20

3 4.5 3 2.78.7

3

4

6.5

6.715

40

30

2010 20 30

6.5 7 7.5

Pin = 22 dBm

f = 7.2 GHz

IN OUT30

20 4 5 63.5 3

8.5 5

99.5

10221 5.5

40

30

2010 20 30

4.5 5 5.5

f = 5 GHzPin = 22 dBm

f = 4 GHz

Pin = 22 dBm

40

30

2010 20 30

3.5 4 4.5

308.5 6.5

2221

415 9.

5 6

2911.5

OUTIN

Figure 57. NE868296, 5 GHz Circuit

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 59. NE868296 Test Circuit (6.5 GHz and 7.5 GHz)

Figure 56. NE868296, 4 GHz Circuit

Figure 58. NE868296, 6 GHz Circuit

Pou

t (dB

m)

Pin (dBm)

Pin (dBm)

f (GHz)

Pin (dBm)

f (GHz)

f (GHz)

Pou

t (dB

m)

Pou

t (dB

m)

Pou

t (dB

m)

f (GHz)

Pin (dBm)

Page 24: GaAsFet

2.512.7

2.52.52.2

3.56

3.7

30

8.5

7.7

2.1

21.5

2.1

5

OUTIN

Figure 60. NE868495-4 Circuit

Figure 61. NE868495-5 Circuit

Figure 63. NE868495-7 Circuit

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm 40

30

2010 20 30

6.0 6.5 7.0

VDS = 9.0 V

Pin= 26 dBm

f = 6.5 GHz

18.5

9.5

2.5

18.5

14

3.5 32

6

6.5

7.0

IN OUT

40

30

2010 20 30

3.5 4.0 4.5

VDS = 9.0 V

Pin = 25 dBm

f = 4.0 GHz

9.5

10.5

7.5

28.5

18.01.53

28.52.5 2 2

4.5

IN OUT

Pin (dBm)

f (GHz)

Pou

t (dB

m)

Pou

t (dB

m)

Pin (dBm)

f (GHz)

Pou

t (dB

m)

Pin (dBm)

f (GHz)

40

30

2010 20 30

6.5 7.0 7.5

f = 7.0 GHz

Pin = 26 dBm

VDS = 9.0 V

20.0

9.0

1.9 1.9

11.0

9.0

2.0

2.1

5.2

6.74.

7

2.1

15.0

IN OUT

Figure 62. NE868495-6 Circuit

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Page 25: GaAsFet

Figure 64. NE868495-8 Circuit

Figure 65. NE868898-5 Circuit

Figure 67. NE868898-7 Circuit

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mmIN OUT

20

6.2

2 1.5 2.6

112.4

2 2

15 2.1

3.3

4.5

5

7 3.5

2.1

15

44.55

5

4.3

2.1

42.1

21.5

30

IN OUT MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

Figure 66. NE868898-6 Circuit

IN OUT

25

12 23.5

25

14.5

3.6

8.8

40

30

2010 20 30

6.5 7.0 7.5

VDS = 9.0 V

f = 7.2 GHz

P in= 29 dBm

IN OUT

25

13.5

9.8

7.8

25

13.5

9.0

4.0 5.

5

40

30

2010 20 30

5.5 6.0 6.5

VDS = 9.0 V

f = 6.0 GHz

Pin = 29 dBm

Pin (dBm)

f (GHz)

Pou

t (dB

m)

Pin (dBm)

f (GHz)

Pou

t (dB

m)

Page 26: GaAsFet

Figure 68. NE868898-8 Circuit

Figure 69. AM-PM Conversion for the NE800, NE371 and NE868 Series

AN82901-1

MATERIAL -TEFLON GLASSTHICKNESS: 0.8mm

202

1.53

4.815 2.1 3.

7

2.1

IN OUT

35

30

25

2010 15 20 30

7.5 8.0 8.5

f = 8 GHz

Pin = 30 dBm

20 dBm

VDS = 9 V

6

4

2

0

-220 22 24 26 28 30

NE800898-4 NE371698-4

6

4

2

0

-222 24 26 28 30 32

NE868196 (NE868199)

6

4

2

0

-2

-40 5 10 15 20 25

6

4

2

0

-2

-410 15 20 25 30 35

NE868495 NE868898

10 15 20 25 30 35

6

4

2

0

-2

-4

Pou

t (dB

m)

Pin (dBm)

f (GHz)

Pin (dBm)Pin (dBm)

Pin (dBm)Pin (dBm)Pin (dBm)

PH

AS

E (

deg.

)

PH

AS

E (

deg.

)

PH

AS

E (

deg.

)

PH

AS

E (

deg.

)

PH

AS

E (

deg.

)

Page 27: GaAsFet

References

[1] Masuo Fukuda, et. al.,”Low Noise GaAs FET Ampliliers,” MW77-21.

[2] Charles A Liechti, et. al., MTT-22, No. 5, May 1974

[3] Herman Sfatz, et. al., ED-21, No. 9, Sept. 1974.

[4] P. Bura, Electronics Letters, Vol. 10, No. 10, p.181-,16th, May 1974.

[5] L. Nevin, et. al., “L-Band GaAs FETAmp.,” Microwave Journal, Apr. 1979.

[6] Eric Ulrich, “Use Negative Feedback to SlashWideband VSWR,” Microwaves, Oct. 1978.

[7] K. Honjo, et. al., “Broadband Internal Matching ofMicrowave Power GaAs MES FETs.,” IE3, Trans,Mit. Jan. 1979.

[8] Y. Takayama, “A New Load-Pull CharacterizationMethod for Microwave Power Transistors,”1976 MTT-S, Digest, p. 218-220, June 1976.

Figure 70. Third Order Intermodulation Distortions for the NE800898-7H and NE868898-6

AN82901-1

50

45

40

35

30

25

20

1515 20 25 30 35

f = 7.7 GHz, ∆f = 10 MHzVDS= 9 VIDS = 1.0 A

Pout

IM3

10

0

-10

-20

-30

-40

-50

-60

40

30

20

10

0

-10

-20

-3010 20 30 40

NE800898-7H NE868898-6

Pout

IDS = 1.2A,Pin=30 dBmIDS = 0.8A,Pin=30 dBm

IM3

Pou

t, IM

3 (d

Bm

)

Pou

t (d

Bm

)

Pin (dBm)Pin (dBm)

IM3 (dB

)