g. janik 11/14/03€¦ · 8· fast modeling – performance analysisfast modeling – performance...
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T h e Y i e l d M a n a g e m e n t C o m p a n y
Modeling in FaST Division
G. Janik 11/14/03
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FaST ModelingFaST FaST ModelingModeling
Uses of modeling:Hardware designMeasurement performance analysisFilm properties and materials
Instruments:Spectroscopic Ellipsometer (F5x, SpectraFx 100)Single Wavelength Ellipsometer (Accufilm)Electron Microprobe Analyzer (Metrix 100)New products
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FaST Modeling – Hardware DesignFaST FaST Modeling Modeling –– Hardware DesignHardware Design
Mechanical Design:3-D solid modelsFinite Element Analysis for structure and vibration
Electrical Design:Logic simulation of FPGAsSpreadsheet analysis of analog circuits
Optical DesignSystem ray tracingX-ray ray tracing
Electron beam DesignElectron optics simulation
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FaST Modeling – Hardware DesignFaST FaST Modeling Modeling –– Hardware DesignHardware Design
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FaST Modeling – Hardware DesignFaST FaST Modeling Modeling –– Hardware DesignHardware Design
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FaST Modeling – Hardware DesignFaST FaST Modeling Modeling –– Hardware DesignHardware Design
Magnetic lens for Metrix 100 column
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FaST Modeling – Hardware DesignFaST FaST Modeling Modeling –– Hardware DesignHardware Design
Magnetic contour map of lens interior
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FaST Modeling – Performance AnalysisFaST FaST Modeling Modeling –– Performance AnalysisPerformance Analysis
Spot size analysis for SE on SpectraFx 100in-house software including diffraction, and polarization
effects
Precision analysis for SE on SpectraFx 100custom model developed including shot noise, lamp noise, and vibration
Calibration analysis for SE on SpectraFx 100custom model developed to investigate different calibration schemes
Matching analysis for SWE on SpectraFx 100custom model developed including various optical imperfections, misalignments, and motor speed variations
Wafer damage analysis for Metrix 100custom model including direct and indirect electron and x-ray damage mechanisms
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FaST Modeling – Performance AnalysisFaST FaST Modeling Modeling –– Performance AnalysisPerformance Analysis
Generic Performance Model
Instrumentalimperfections
Instrumentmodel
HypotheticalWafer sample
Simulateddata
Dataalgorithm
MeasurementResult
error
Calibrationscheme
-
calibrationparameters
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FaST Modeling – Performance AnalysisFaST FaST Modeling Modeling –– Performance AnalysisPerformance Analysis
Figure 2Thickness Sensitivity to Intensity Noise
0
0.05
0.1
0.15
0.2
0.25
0.3
0.35
0 2 4 6 8 10 12
frequency
Thic
knes
s s
ensi
tivity
Results from a precision model:
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FaST Modeling – Simulated SWE dataFaST FaST Modeling Modeling –– Simulated SWE dataSimulated SWE data
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FaST Modeling – Simulated SWE dataFaST FaST Modeling Modeling –– Simulated SWE dataSimulated SWE data
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FaST Modeling – Wafer vibrationFaST FaST Modeling Modeling –– Wafer vibrationWafer vibration
Mode 3: 90 Hz Mode 4: 133 Hz
Mode 2: 55 HzMode 1: 42 Hz
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FaST Modeling: Film – Probe InteractionFaST FaST Modeling: Film Modeling: Film –– Probe InteractionProbe Interaction
Optical properties of films: Spectra Fx 100OLSA – offline spectral analysisStandalone version of modeling and regression
algorithms contained in the tool softwareSimulates reflectivity and polarization effects in
multi-layer films
X-ray emission from films: Metrix 100Models electron beam interaction with multilayer
filmsModels x-ray emission
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FaST Modeling: SpectraFx 100 OLSAFaST FaST Modeling: Modeling: SpectraFx SpectraFx 100 OLSA100 OLSA
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FaST Modeling: Metrix 100 OLSAFaST FaST Modeling: Modeling: MetrixMetrix 100 OLSA100 OLSA