for exam 3, make sure you study these …reactorlab.net/.../ceng252/slides_14_march_2017.pdfthin...
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For Exam 3, make sure you study these files:ReactorLab.net, Resources, Grad CRE Notes, - Reaction and diffusion in porous catalysts- Non-uniformly active catalysts I may also ask general questions about the LPCVD wafer stackreactor models that we discussed in class
“Outer” means the side of the layer nearest the gas. “Inner” means the side of the layer away from the gas toward the sealed face of the layer
You$are$to$add$this$reac.on:$$SiH4$(g)$7>$Si$(s)$+$2H2$(g)$
For details of our model, see ReactorLab.net, Resources, Grad CRE Notes, LPCVD of polysilicon in wafer-stack tube reactor
Weerts, W. L. M. , de Croon, M. H. J., and Marin, G. B., 1997. “Low-Pressure Chemical VaporDeposition of Polycrystalline Silicon: Analysis of Nonuniform Growth in an Industrial-Scale Reactor,”J. Electrochem. Soc., vol. 144, no. 9, pp. 3213-3221.
This$is$only$the$le>$side$of$the$table$Data$for$higher$T’s$are$also$shown$
For details of converting collision frequency and sticking coefficient - or decomposition probability - see ReactorLab.net, Resources, Grad CRE Notes, Step coverage and determination of sticking coefficients, file Komiyama_trench.pdf
For details of our model, see ReactorLab.net, Resources, Grad CRE Notes, LPCVD of polysilicon in wafer-stack tube reactor