euv source workshop - sematech source workshop, barcelona, spain, october 19, 2006 euv source...

EUV Source Workshop, Barcelona, Spain, October 19, 2006

EUV Source WorkshopAgora 2, World Trade CenterBarcelona, Spain, October 19, 2006

Organization CommitteeVivek Bakshi (Chair, SEMATECH), Vadim Banine (ASML), Akira Endo (EUVA), Igor Fomenkov (Cymer) , Hajime Kanazawa (Canon), Kazua Ota (Nikon), Joseph Pankert (Philips Extreme UV), Uwe Stamm (Xtreme technologies), Koichi Toyoda (EUVA)

Thanks to Obert Wood (AMD) and Michael Goldstein / Zhiyu Zhang (Intel) for their help in the organization.

EUV Source WorkshopAgora 2, World Trade CenterBarcelona, Spain, October 19, 2006

Organization CommitteeVivek Bakshi (Chair, SEMATECH), Vadim Banine (ASML), Akira Endo (EUVA), Igor Fomenkov (Cymer) , Hajime Kanazawa (Canon), Kazua Ota (Nikon), Joseph Pankert (Philips Extreme UV), Uwe Stamm (Xtreme technologies), Koichi Toyoda (EUVA)

Thanks to Obert Wood (AMD) and Michael Goldstein / Zhiyu Zhang (Intel) for their help in the organization.


Welcome to the EUV Source Workshop

– The EUV Source Workshop is one in a collection of single-focus industry meetings designed to increase global knowledge in key areas of semiconductor R&D

– As part of the SEMATECH Knowledge Series, this series focuses on accelerating solutions for critical challenges in the nanoelectronics industry

– For more details on other meetings in this series, please pick up one of our SEMATECH Knowledge Series flyers located at the registration area


Public Meeting Notice

• This meeting is classified as an “Open Conference”per the U.S. Export Administration Regulations.

• Confidential or Proprietary information may NOT be disclosed.

• All meeting attendees are permitted to take notes or otherwise make a personal record of these proceedings.

• Presentations and meeting summary will be available to the public, including posting on the SEMATECH public website: www.SEMATECH.org


EUV Source Workshop AgendaPart I: Commercial EUV Sources

07:00 Continental Breakfast

08:00 Welcome and Introduction Vivek BakshiSession I: Technology Status UpdateSession Chair: Akira Endo (EUVA)08:05 Update on Joint EUV Source

RequirementsAkira Miyake (Canon)

08:15 EUV Source Technology Status Update Vivek Bakshi (SEMATECH)Session II: Panel Discussion – EUV Sources for HVMModerator: Mike Lercel (SEMATECH/IBM)

08:3008:4008:50

Scanner ManufacturersASMLCanonNikon

Vadim BanineShigeyuki UzawaSusumu Mori

09:0009:1009:2009:30

EUV Source SuppliersCymerEUVAPhilips Extreme UVXtreme technologies

Igor FomenkovAkira EndoJoseph PankertUwe Stamm

09:40 Break


EUV Source Workshop AgendaPart I: Commercial EUV Sources (cont)

Session II: Panel Discussion – EUV Sources for HVM Moderator: Vadim Banine (ASML)

09:5510:0510:1510:2510:3510:4510:5511:05

End UsersAMDIBMIntelNXPQimondaSeleteSTMToshiba

Obert WoodKurt KimmelYashesh ShroffMart GraefFrank GoodwinIchiro MoriPaolo CanestrariTatsuhiko Higashiki


EUV Source Workshop AgendaPart II: R&D Topics on EUV Sources

Session I: Debris Mitigation TechnologySession Chair: Joseph Pankert (Philips Extreme)

11:15 Plasma Debris Interaction with Mitigation and Collector Systems

A. Hassanein (ANL)

11:30 Collector Lifetime and Debris Specifications

D. Ruzic (UIUC)

11:45 Present and Future of EUV Collector Technology

V. Rigato (Media Lario)

12:00 Near Normal Incidence Collector for Easier and More Efficient Debris Mitigation

R. Geyl (Sagem)

12:15 Lunch



Session II: Future Generation EUV SourcesSession Chair: David Attwood (UC Berkeley)

(A) FEL Based EUV Sources

13:15 Compact FEL Applications for EUV Lithography

M. Goldstein (Intel)

13:30 Laser Readiness for all Optical EUV FEL A. Endo (EUVA)

13:45 Free Electron Laser as a Potential Source for EUV Lithography

M.V. Yurkov (DESY)

14:00 Laser Seeded FEL R&D at the NSLS SDL and Its Potential Application for the EUV Generation

X.J. Wang (BNL)



Session II: Future Generation EUV SourcesSession Chair: Obert Wood (AMD)

(B) New Concepts

14:15 Micro Discharge-Array Based EUV Sources

B. Jurczyk (Starfire Industries)

14:30 Some Aspects of ISAN/ASML Prototype DPP EUV Source

K. Koshelev (ISAN)

14:45 EUV Source Multiplexing M. Goldstein (Intel)

15:00 Fiber Laser Based EUV Sources A. Galvanskus (University of Michigan)

15:15 Update on Mass Limited Sn LPP Performance

M. Richardson (UCF)

15:30 Break



Session III: BenchmarkingSession Chair: Kurt Kimmel (IBM)(A) EUV Metrology Benchmarking13:45 Beamline Benchmarking V. Bakshi (SEMATECH)16:00 Benchmarking Absolute Out of Band

(OOB) MeasurementsP. Dunne (UCD)

(B) EUV Source Modeling Benchmarking16:15 Benchmarking of HEIGHTS Simulation

against LPP and DPP Discharge Experiments

A. Hassanein (ANL)

16:30 Japanese Update on Sn LPP Benchmarking

A. Sunahara (University of Osaka)

16:45 Update on EUV Source Modeling Benchmarking

S. Zakharov (EPPRA)

17:00 Status of Modeling Benchmarking K. Nishihara (University of Osaka)

17:15 EUV Source Workshop Summary V. Bakshi (SEMATECH)


AuditoriumSymposium

AgoraSource WS

Port Vell 2

Optics TWGOptics WS

CIC 1 = Resist TWG

⇓ CIC2 = Mask WS ⇓

World Trade CenterGround Floor


Important Information• Lunch, Poster Session and Reception are in

Agora 2 room (next door)• Please place all pagers and/or cell phones

on vibrate mode only or turn them off• For any speaker questions — see Mario

Gonzales or Connie Reed at the projection table

euv source workshop - sematech source workshop, barcelona, spain, october 19, 2006 euv source...

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