ensuring high water yields in the semiconductor fab piping to convenient local service. table 1...
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Water Technologies & Solutions case study
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CS1123EN.docx Mar-10
ensuring high water yields in the semiconductor fab
Figure 1: SUEZ EDI
challenge
Water is at the very heart of semiconductor manufacturing. This wafer manufacturer in Texas needed assurance of an extremely consistent ultrapure water product with 18 megohm-cm resistivity. They needed to know they would have reliable 24-hour per day, uninterrupted ultrapure water performance to ensure the high wafer yields required to remain competitive in today’s semiconductor industry.
solution
Eliminate Chemical Regenerants with SUEZ EDI
The SUEZ EDI (Figure 1) is the key building block for producing ultrapure water for wafer fabrication in this 700 gpm facility, designed, built and maintained by SUEZ. Reliable 24-hour per day, uninterrupted performance is what the customer gets—no excuses, no concerns for lost productivity. Because the SUEZ EDI process regenerates electrically, it requires no acid or caustic regenerants. SUEZ EDI removes 99%+ of the mineral load of RO-pretreated water, including silica boron and CO2, and delivers treated water of exceptional purity.
Demineralizing with electricity, not chemicals is a real benefit for this end-user, as the process produces no
regenerant waste and it doesn’t have the associated waste disposal hassle. The system also takes up only 20% of the floor space required for a conventional deionized (DI) system.
The SUEZ Brand means quality you can depend upon. SUEZ pays attention to all the details from PVDF piping to convenient local service. Table 1 summarizes the project.
Table 1: Project Summary
Location Central Texas
Commissioned February 1997
Application Ultrapure water for water fabrication
FVeedwater type
City of Sherman municipal water treated with SUEZ EDR
Feedwater quality
10-15 µS/cm
Product quality 18 megohm-cm resistivity
Capacity 700 gpm (2.7 m3/h)
Technologies Reverse osmosis (RO) and electrodeionization (EDI)