electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

16
Journal ofElectronic Materials, Vol. 14, No. 2, 1985 ELECTRON-BEAM DOPING-ELECTRON RADIATION EFFECTS IN IMPURITY OVERLAYERS AND SEMICONDUCTOR SUBSTRATES-- Takao Wada, Michihiko Takeda and Kyoichiro Yasuda* Department of Electronics, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466 Japan Government Industrial Research Institute, Nagoya, Hirate, Kita,Nagoya 462 Japan (Received June 20, 1984) 3-9 MeV electrons were used to introduce impurity Ge atoms into Si wafers from Ge sheets, which are in contact with a Si surface at 20-60°C in water bath. Concentration-dependent diffusivities of ~i0-18-i0 -14 cm2sec-i for Ge in Si were measured. Activation energies of sputtering yield for Ge and of the diffusivity of Ge in Si are estimated to be ~0.3 eV and N0.58 eV, respectively. In a case of hot (~250°C) irradiation in ~ixl0-3 Torr vacuum, also the similar concentration profiles of impurity atoms in the substrates were observed. Key words: electron-beam doping, high-energy electron bombardment, impurity doping, diffusion, silicon and germanium. Introduction The physical properties of semiconductors irradiated by high energ~ electrons have been studied by many workers. -4) Ion implantation has been developed into a successful technique for doping semiconductor materials. It is well known 171 0361-5235/85/1401-017153.00 © 1985 AIME

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Page 1: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

Journal of Elec tronic Materials, Vol. 1 4 , N o . 2 , 1985

E L E C T R O N - B E A M D O P I N G - E L E C T R O N R A D I A T I O N E F F E C T SIN I M P U R I T Y O V E R L A Y E R S A N D

S E M I C O N D U C T O R S U B S T R A T E S - -

T a k a o W a d a , M i c h i h i k o T a k e d a and K y o i c h i r o Y a s u d a *

D e p a r t m e n t of E l e c t r o n i c s , N a g o y a I n s t i t u t e ofT e c h n o l o g y , G o k i s o , S h o w a , N a g o y a 466 J a p a n

G o v e r n m e n t I n d u s t r i a l R e s e a r c h I n s t i t u t e ,N a g o y a , H i r a t e , K i t a , N a g o y a 462 J a p a n

(Received June 20, 1984)

3-9 M e V e l e c t r o n s w e r e used to i n t r o d u c e i m p u r i t yGe a t o m s into Si w a f e r s from Ge s h e e t s , w h i c h arein c o n t a c t w i t h a Si s u r f a c e at 2 0 - 6 0 ° C in w a t e rb a t h . C o n c e n t r a t i o n - d e p e n d e n t d i f f u s i v i t i e s of~ i 0 - 1 8 - i 0 -14 c m 2 s e c - i for Ge in Si w e r e m e a s u r e d .A c t i v a t i o n e n e r g i e s of s p u t t e r i n g y i e l d for Geand of the d i f f u s i v i t y of Ge in Si are e s t i m a t e dto be ~ 0 . 3 eV and N 0 . 5 8 eV, r e s p e c t i v e l y . In acase of h o t ( ~ 2 5 0 ° C ) i r r a d i a t i o n in ~ i x l 0 -3 T o r rv a c u u m , also the s i m i l a r c o n c e n t r a t i o n p r o f i l e sof i m p u r i t y a t o m s in the s u b s t r a t e s w e r e o b s e r v e d .

Key w o r d s : e l e c t r o n - b e a m d o p i n g , h i g h - e n e r g ye l e c t r o n b o m b a r d m e n t , i m p u r i t y d o p i n g , d i f f u s i o n ,s i l i c o n and g e r m a n i u m .

I n t r o d u c t i o n

The p h y s i c a l p r o p e r t i e s of s e m i c o n d u c t o r si r r a d i a t e d by h i g h e n e r g ~ e l e c t r o n s h a v e b e e ns t u d i e d b y m a n y w o r k e r s . -4) Ion i m p l a n t a t i o n hasb e e n d e v e l o p e d into a s u c c e s s f u l t e c h n i q u e ford o p i n g s e m i c o n d u c t o r m a t e r i a l s . It is w e l l k n o w n

171

0361-5235/85/1401-017153.00 © 1985 AIME

Page 2: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

172 Wada , Takeda and Yasuda

that ion i m p l a n t a t i o n in s e m i c o n d u c t o r s isa c c o m p a n i e d by s e v e r e r a d i a t i o n d a m a g e i n t r o d u c e dw i t h the i m p l a n t a t i o n p r o c e s s . 5) In s i l i c o n , w i t hl o w ion d o s e s , the d a m a g e t a k e s the from ofa m o r p h o u s z o n e s , 6) and w h e n i r r a d i a t i o n isc o n t i n u e d , the z o n e s o v e r l a p to from a c o n t i n u o u sa m o r p h o u s l a y e r .

The i m p o r t a n t b a s i s for the use of e l e c t r o n slies in the fact that as long as the e n e r g y ofthe e l e c t r o n s is c l o s e to the d i s p l a c e m e n tt h r e s h o l d , it is p r e s u m e d that o n l y s i n g l eF r e n k e l p a i r s are f o r m e d . E l e c t r o n i r r a d i a t i o na v o i d s the c o m p l i c a t i o n a t t e n d a n t upon theg e n e r a t i o n of c o m p l e x d a m a g e r e g i o n s p r e s u m e d too c c u r in n e u t r o n and h e a v y - c h a r g e d p a r t i c l ei r r a d i a t i o n .

A n e w m e t h o d of e l e c t r o n b e a m d o p i n g wasr e p o r t e d by one of the a u t h o r s W a d a . 7 , 8) Thet e c h n i q u e e m p l o y s an i m p u r i t y s h e e t in c o n t a c tw i t h the s e m i c o n d u c t o r s u r f a c e w h i c h is b o m b a r d e dw i t h h i g h e n e r g y e l e c t r o n s . 7 - 1 4 )

In the p r e s e n t p a p e r the i n t r o d u c t i o n s of Gei m p u r i t i e s into Si at 2 0 - 6 0 ° C in w a t e r b a t h , andat ~ 2 5 0 ° C in v a c u u m are i n v e s t i g a t e d . Thed i f f u s i v i t y of Ge i m p u r i t y in Si, an a c t i v a t i o ne n e r g y of s p u t t e r i n g y i e l d for Ge and an a c t i v a -tion e n e r g y of the d i f f u s i v i t y of Ge are e s t i m a -ted. D e p e n d e n c e s of i m p u r i t y c o n c e n t r a t i o n s on Ges h e e t t h i c k n e s s and on e l e c t r o n e n e r g y areo b s e r v e d .

E x p e r i m e n t a l p r o c e d u r e s

The s a m p l e s u s e d in the e x p e r i m e n t s were P-Si ( B - d o p e d ( i i i ) , ~ 2 5 - 5 0 ~ . c m ) w i t h an a r e a of5x5 m m 2 ( t = 0 . 3 5 mm). t r e p r e s e n t s the t h i c k n e s sof s u b s t r a t e s or i m p u r i t y s h e e t s . The Ge c r y s t a l swere S b - d o p e d ( i i i ) w a f e r s w i t h d i m e n s i o n s of5 x 5 x t ( ~ O . l - l ) m m 3. The s u r f a c e of the Ge s h e e t inc o n t a c t w i t h the Si w a f e r w a s i r r a d i a t e d w i t h af l u e n c e of ( l - l O ) x l 0 1 7 e l e c t r o n s cm -2 at 3-9 M e Vf r o m a 2-10 M e V e l e c t r o n l i n e a r a c c e l e r a t o r w i t ha p u l s e w i d t h of 3.5 ~s h a v i n g a 200 Hz dutyc y c l e and an a v e r a g e e l e c t r o n b e a m c u r r e n t of 40-

Page 3: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

Electron-Beam Doping-Electron Effects 173

I Is,

(a)

F i g . l .

L i n a c /I I

11111

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(a) S c h e m a t i c d i a g r a m of e l e c t r o n b e a md o p i n g . (b) S c h e m a t i c d i a g r a m ofe l e c t r o n b o m b a r d m e n t at 2 0 - 6 0 ° C and (c)at 2 5 0 ° C in v a c u u m .

f f " l ~ l : :'~/////H///~'t'- r--l]

50 ~ A - c m -2 ( F i g . l . ( a ) ) .In the case of 2 0 - 6 0 ° C i r r a d i a t i o n , the

s a m p l e s w e r e put in a c i r c u l a t i n g w a t e r b a t h ,w h i c h w a s k e p t at a c o n s t a n t t e m p e r a t u r e by u s i n ga t h e r m o r e g u l a t o r , as s h o w n in F i g . l . ( b ) . Thed e t a i l of the s a m p l e m o u n t at ~ 2 5 0 ° C i r r a d i a t i o nin v a c u u m is s c h e m a t i c a l l y i l l u s t r a t e d in F i g . l(c). The i n t r o d u c t i o n of i m p u r i t y a t o m s in Si w a sm e a s u r e d u s i n g b o t h R u t h e r f o r d b a c k s c a t t e r i n gs p e c t r o s c o p y ( R B S ) and s e c o n d a r y ion m a s ss p e c t r o s c o p y ( S I M S ) .

P r e c e d i n $ d i s c u s s i o n

T h e r a n g e of e l e c t r o n s at 7 M e V (3 MeV) inSi and Ge are ~ b o u t 1 5 ( 6 . 4 ) and 5 . 6 ( 2 . 4 ) mm,r e s p e c t i v e l y . I ) So, the i m p u r i t y s h e e t l a y e r iss u f f i c i e n t l y thin to a l l o w the i r r a d i a t i n ge l e c t r o n s to p e n e t r a t e into the s u b s t r a t e w i t h o u ta s i g n i f i c a n t loss in k i n e t i c e n e r g y . T h ep r o d u c t i o n r a t e s of d e f e c t s in Si and Ge for 7M e V e l e c t r o n i r r a d i a t i o n a r e a b o u t 8 and 9 cm -I,1 6 , 1 7 ) r e s p e c t i v e l y .

W h e n the f l u x and e n e r g y s p e c t r u m of r e c o i la t o m s c r o s s i n g the i n t e r f a c e b e t w e e n the Ge l a y e rand the s u b s t r a t e are c a l c u l a t e d , the d e p t h

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174 W a d a , Takeda and Yasuda

d i s t r i b u t i o n of the r e c o i l i m p u r i t y a t o m s w i t h i nthe s u b s t r a t e can be e s t i m a t e d . The e n e r g ys p e c t r u m of r e c o i l a t o m s d u r i n g e l e c t r o n b o m b a r d -m e n t can be o b t a i n e d from an e q u a t i o n g i v e n byM c k i n l e y and F e s h b a c h I)

= ~ / Z e 2 ~ 2 (B-~y2) Tmd ~ M c F ~ m c 2 /

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F i g . 2 . T h e o r e t i c a l n u m b e rof r e c o i l s c r o s s i n g ani n t e r f a c e as a f u n c t i o nof r e c o i l e n e r g y .

Page 5: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

Electron-Beam Doping-Electron Effects 175

T m is the m a x i m u m r e c o i l e n e r g y

m ( E + 2 m c 2 ) ETm= 2 M mc 2 '

E is the e l e c t r o n e n e r g y , T the r e c o i l k i n e t i ce n e r g y and M the m a s s of a t o m .

F i g . 2 s h o w s the c a l c u l a t e d t y p i c a l r e c o i ls p e c t r u m , i.e. the n u m b e r of r e c o i l s c r o s s i n g ani n t e r f a c e as a f u n c t i o n of the r e c o i l e n e r g y . Them a x i m u m r e c o i l e n e r g y is a b o u t 3.4 K e V for i0 M e Ve l e c t r o n s . The r a n g e of i m p l a n t e d ion in Si hasb e e n c a l c u l a t e d as a f u n c t i o n of ion e n e r g y 18)By u s i n g the b o t h r e s u l t s , the p e n e t r a t i o nd i s t r i b u t i o n d u r i n g the r e c o i l i m p l a n t a t i o n of Geinto Si by i0 M e V e l e c t r o n b o m b a r d m e n t is t h e o r e -t i c a l l y o b t a i n e d as a f u n c t i o n of d e p t h , as s h o w nin F i g . 3 . The i m p l a n t e d i m p u r i t y a t o m s ared i s t r i b u t e d w i t h i n the Si c r y s t a l up to a d e p t h

8E Electron enen:Jyu

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u lo10 2 0 3C 40D e p t h ( .,~ )

F i g , 3 . T h e o r e t i c a l c o n c e n t r a -t i o n p r o f i l e s of r e c o i l a t o m sinto Si as a f u n c t i o n of d e p t h .

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176 W a d a , Takeda and Yasuda

of a b o u t 30 A b e l o w the s u r f a c e .H o w e v e r , in the p r e s e n t e x p e r i m e n t s the

c o n c e n t r a t i o n p r o f i l e s of Ge a t o m s into Si areo b t a i n e d up to a d e p t h of a b o u t 0.6 ~ m b e l o w thes u r f a c e ( ( s e e F i g . 9 . ( a ) ) ) . As the i n c i d e n te l e c t r o n s p a s s t h r o u g h the s h e e t into s i l i c o n ,d e f e c t s in Si are i n t r o d u c e d from the s u r f a c e upto thd r a n g e of e l e c t r o n s . T h e n , m e c h a n i s m s forsuch p r o f i l e s of Ge a t o m s are not o n l y the r e c o i lp r o c e s s of Ge a t o m s , but a l s o e n h a n c e d d i f f u s i o nof i m p u r i t y a t o m s in Si.

F i g . 4 s h o w s the t h e o r e t i c a l e n e r g y s p e c t r aof e l e c t r o n s at d i f f e r e n t d e p t h in Si fori n c i d e n t e l e c t r o n e n e r g y E o of 6 MeV. Thec a l c u l a t e d r e s u l t s are o b t a i n e d by u s i n g aS u g i y a m a , s p r o g r a m 19) of a M o n t e C a r l o s i m u l a t i o nfor the t h e o r y of fast e l e c t r o n p e n e t r a t i o n inm a t t e r . The c a l c u l a t i o n s are done for i000h i s t o r i e s and A E = 0 . 0 2 M e V , w h e r e AE m e a n s the

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~ = 0.02 MeV 2

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3.6 48Electron energy ( MeV

F i g . 4 . T h e o r e t i c a l e n e r g ys p e c t r a of e l e c t r o n s at 6 M e Vin Si w i t h d i f f e r e n t d e p t h s .

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Electron-Beam Doping-Electron Effects 177

a v e r a g e e n e r g y lost in p a s s i n g t h r o u g h them a t e r i a l . In a case of E o = 4 0 0 KeV, the t h e o r e t i -cal r e s u l t s are in good a g r e e m e n t w i t h thee x p e r i m e n t a l r e s u l t s . 20) W i t h i n c r e a s i n g d e p t h ,a p e a k v a l u e of the s p e c t r a d e c r e a s e s and itsw i d t h i n c r e a s e s . M o n t e C a r l o s i m u l a t i o n tooka c c o u n t of m u l t i p l e s c a t t e r i n g of e l e c t r o n ,s t r a g g l i n g of e l e c t r o n e n e r g y loss by i o n i z a t i o nand e x c i t a t i o n , p r o d u c t i o n of k n o c k on e l e c t r o n sand p r o d u c t i o n of b r e m s t r a h l u n g p h o t o n s . Forp h o t o n p e n e t r a t i o n , p h o t o e l e c t r i c e f f e c t s ,c o m p t o n e f f e c t , p a i r p r o d u c t i o n and a n n i h i l a t i o nr a d i a t i o n f r o m p o s i t r o n in rest or in f l i g h t w e r ealso c o n s i d e r e d .

W h e n e v e r a c h a r g e d p a r t i c l e l o s e s e n e r g y ina s o l i d , e l e c t r o n - h o l e p a i r s ( e h p ) are p r o d u c e d .The r a t e of g e n e r a t i o n , g, of e h p ' s p e r u n i t timeby an i n c i d e n t e l e c t r o n b e a m can be e s t i m a t e df r o m the r e l a t i o n

i dE d_~ (2)g E dx dt

w h e r e E is the e n e r g y for f o r m a t i o n of ehp (E inGe and Si are 2.84 and 3.23 eV, r e s p e c t i v e l y ) , 21)d E / d x ~ l . 7 and 1.6 M e V cm 2 g-l. e l e c t r o n - i 22) arethe e n e r g y loss per cm of p a t h by a fast e l e c t r o nin Ge and Si, and d ~ / d t is the i r r a d i a t i o n r a t e .I r r a d i a t i o n at a r a t e of 2 . 5 x i 0 1 4 e l e c t r o n s cm -2sec -I (an a v e r a g e b e a m c u r r e n t of 40 ~ A - c m -2)w o u l d r e s u l t in g ~ 3 x l O20 e h p ' s c m - 3 . s e c -I forSi The ehp g e n e r a t i o n p r o d u c e s an ehp c o n c e n t -r a t i o n of c = g T , w h e r e T is the e x c e s s c a r r i e rl i f e t i m e . C = 8 x l 0 1 7 c m -3 for Ge ( 3 x I 0 1 7 9 ~ 3 forSi), s i n c e T is on the o r d e r of 1 m s l 4 J - ( A c t u a l l yT is d i f f i c u l t to e v a l u a t e , s i n c e it is v e r ys e n s i t i v e to the a m o u n t of d e f e c t s and t h e r e f o r eit w i l l v a r y d u r i n g the i r r a d i a t i o n ) .

W h e n such a n u m b e r of c o n d u c t i o n e l e c t r o n sa n d / o r h o l e s in Ge (Si) r e c o m b i n e at d e f e c t s v i an o n - r a d i a t i v e t r a n s i t i o n s , m o b i l i t y e n h a n c e m e n tof i m p u r i t y a t o m s m a y be c a u s e d by the e n e r g yr e l e a s e d in t h e s e p r o c e s s e s .

On the o t h e r h a n d , the B o u r g o i n m e c h a n i s m 23)o c c u r s w h e n d i f f e r e n t c h a r g e - s t a t e s r e v e r s e the

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178 W a d a , T a k e d a and Yasuda

p o s i t i o n s of t h e i r r e s p e c t i v e m i n i m u m of p o t e n t i a le n e r g y and d i f f u s i o n s a d d l e p o i n t s . A c h a n g e inthe c h a r g e s t a t e of a m i g r a t i n g d e f e c t u s u a l l yg i v e s rise to a c h a n g e in the m i g r a t i o n e n e r g yEm.

B o t h the e n e r g y r e l e a s e and the B o u r g o i nm e c h a n i s m s may a p p l y for two d i f f e r e n t c h a r g es t a t e s (0, +I) or (0, -i) of the i n t e r s t i t i a lw h e r e O, +i and -i m e a n the c h a r g e s t a t e . 23) '

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20 40 60 80 100Channel number

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F i g . 5 . (a) B a c k s c a t t e r -ing s p e c t r a for thei r r a d i a t e d Si in ther a n d o m c o n d i t i o n s atd i f f e r e n t i r r a d i a t i o nt e m p e r a t u r e s .(b) C o n c e n t r a t i o n of Gei m p u r i t y as a f u n c t i o nof r e c i p r o c a l i r r a d i a -tion t e m p e r a t u r e .

36

Page 9: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

Electron-Beam Doping-Elec tronEffects 179

E x p e r i m e n t a l r e s u l t s and d i s c u s s i o n

In the case of Ge o v e r l a y e r s ( t ~ 0 . 5 mm) andSi s u b s t r a t e , the b a c k s c a t t e r i n g s p e c t r a in ther a n d o m c o n d i t i o n s by 1.4 M e V He + ions are s h o w nin F i g . 5 . (a) for the s p e c i m e n s i r r a d i a t e d at 2 0 ° C ,40 ° and 60°C w i t h a t o t a l f l u e n c e of ~ 5 . 1 x l O 17e l e c t r o n s cm -2 at 7 MeV. The n u m b e r of c o u n t s ofGe p e a k s in Si i n c r e a s e s w i t h i n c r e a s i n gi r r a d i a t i o n t e m p e r a t u r e . The e x p r e s s i o n of the Gec o n c e n t r a t i o n r a t i o is g i v e n by

C G [S] Pe NGe Ge Si

CSi NSi [ S ] s i PGe(3)

w h e r e C m e a n a c o n c e n t r a t i o n , N the n u m b e r ofc o u n t s , [S] the b a c k s c a t t e r i n g e n e r g y lossp a r a m e t e r and P the d i f f e r e n t i a l s c a t t e r i n g c r o s ss e c t i o n s . The m a x i m u m Ge c o n c e n t r a t i o n s CGee s t i m a t e d f r o m the b a c k s c a t t e r i n g s p e c t r a in thef i g u r e are s h o w n in F i g . 5 . ( b ) as a f u n c t i o n ofr e c i p r o c a l i r r a d i a t i o n t e m p e r a t u r e . An a c t i v a t i o ne n e r g y of s p u t t e r i n g y i e l d for Ge a t o m s into Siis e s t i m a t e d to be a b o u t 0.3 eV f r o m this f i g u r e .

The i n t e n s i t y r a t i o s of 74Ge + ions to 2 8 S i +ions in the case of Ge ( t ~ 0 . 5 m m ) / S i i r r a d i a t e dby the same c o n d i t i o n s as d e s c r i b e d a b o v e a r es h o w n in F i g . 6 " ( a ) as a f u n c t i o n of d e p t h m e a s u r -ed f r o m the Si f r o n t s u r f a c e , w h i c h is in c o n t a c tw i t h the o v e r l a y e r . The SIMS m e a s u r e m e n t s w e r ep e r f o r m e d b y u s i n g the p r i m a r y i o n (02 + ) b e a m( d i a m e t e r 1 mm~) w i t h an ion e n e r g y of 7 K e V ina 1 . 5 x 1 0 -7 T o r r v a c u u m . For Si w a f e r s i r r a d i a t e dw i t h o u t i m p u r i t y s h e e t s , the Ge + p e a k s d i s a p p e a r -ed. T h e d i f f u s i o n p r o f i l e is not a c o m p l e m e n t a r ye r r o r f u n c t i o n . T h i s s u g g e s t s t h a t thed i f f u s i v i t y is c o n c e n t r a t i o n d e p e n d e n t Thea n a l y s i s of B o l t z m a n n 24) and M a t a n o 25) is u s e d too b t a i n the c o n c e n t r a t i o n C d e p e n d e n c e of thed i f f u s i v i t y D (c). A s s u m i n g a c o n s t a n t s u r f a c ec o n c e n t r a t i o n C o d u r i n g the e n t i r e d i f f u s i o n ,the e q u a t i o n of D(c) in the case of the S I M S

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180 W a d a , Takeda and Yasuda

w=~ lo . 2

q

: " 153

~t

~ ~64

16

E = 7 M e VO = 5 x i 0 e l c m 2

I , I , I a0.01 0 . 0 2 0.03

D e p t h ( j J m )

(a)

0.04

F i g . 6 (a) I n t e n s i t yr a t i o s of 7 4 G e + to 2 8 S i2 8 S i + in Si s u b s t r a t eas a f u n c t i o n of d e p t hf r o m the f r o n t s u r f a c eof Si. (b) D i f f u s i v i t yD as a f u n c t i o n ofd e p t h from the Sis u r f a c e , and (c) Gei m p u r i t y c o n c e n t r a t i o nat 4 0 ° C . (d) D i f f u s i -v i t y of Ge i m p u r i t y inSi as a f u n c t i o n ofr e c i p r o c a l i r r a d i a t i o nt e m p e r a t u r e

i 0-I~

t(~ I s

inO-'6

a

tO-I~

ioo, o~, 0̧0'3

D E P T H { ~ m )

(b)

iO -~,.

°O-ISI

.^-1el , , . . . . . . i , . . . . . . .10'9 IoZO Ioz,

C ( [Ge] J c m2 )

(c)

o , D , ex~- 0k - - ~ Tv )

tO-S~C =3XlOS9(cm - 3)

,o-,,a

io- le

' ° ~ . , ~.o ~i~ ~i, ~.~IO001T

(d)

m e a s u r e m e n t s is g i v e n by

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Electron-Beam Doping-Electron Effects 181

I Ir x

1 I r o ( K s I r + K i ) 2 d I rD(c) = 2t ( 1 dI r (4)

2 dx ) Ir(K I +K.)

s r m

w h e r e I i and I s are the SIMS s i g n a l i n t e n s i t i e sof i m p u r i t y ions a n d s u b s t r a t e i o n s , r e s p e c t i v e -ly, w h i c h are c o r r e c t e d for the n a t u r a la b u n d a n c e of the i s o t o p e , K i and K s are thes p u t t e r e d ion y i e l d of i m p u r i t y ions and

s u b s t r a t e i o n s , r e s p e c t i v e l y , and I r is ther a t i o of I i to I s . The c a l c u l a t e d v a l u e s of D(c)at the i r r a d i a t i o n t e m p e r a t u r e of 40°C are s h o w nin Fig.6"(b) and (c) as a f u n c t i o n of d e p t h f r o m theSi s u r f a c e and i m p u r i t y c o n c e n t r a t i o n r e s p e c t i v e -ly. The v a l u e of D(c) d e c r e a s e s w i t h i n c r e a s i n gi m p u r i t y c o n c e n t r a t i o n and i n c r e a s e s w i t h thed e p t h f r o m the Si s u r f a c e . The v a l u e s of D(c) atx < O . 0 1 um and x > O . O l ~m for Ge are o b s e r v e d tobe 1 0 - 1 8 - 1 0 -16 c m 2 s e c -I and ~ I 0 - 1 6 - i 0 -14 c m 2 s e c - ~r e s p e c t i v e l y . The v a l u e of C o is e s t i m a t e d to b e~ l . 4 x l 0 2 O c m -3. The r e s u l t a n t p l o t is m a i n l yc o m p o s e d of t h r e e c u r v e s . It is s u g g e s t e d thatt h r e e k i n d s of s p e c i e s d i f f u s e into thes u b s t r a t e . The d i f f u s i v i t i e s of D(c) at c = i x l 0 2 0c m -3 for 20 ° , 40 ° and 6 0 ° C , w h i c h are e s t i m a t e dby the a n a l y s i s of B o l t z m a n n and M a t a n o from thec u r v e s of F i g . 6 . ( a ) , are s h o w n in F l a . ( d ) as af u n c t i o n of r e c i p r o c a l i r r a d i a t i o n t e m p e r a t u r e .F r o m this c u r v e , an a c t i v a t i o n e n e r g y for thed i f f u s i v i t y in Si is o b t a i n e d to be a b o u t 0.58eV. F i g . 6 " ( d ) s u g g e s t s that t o t a l Ge a t o m sd i f f u s e d into the Si s u b s t r a t e m i g h t h a v e theform

N G e / c m 2 = N o . ( D T ) I/2 (5)

and t h e r e f o r e s h o w an a c t i v a t i o n e n e r g y ofa p p r o x i m a t e l y 0 . 5 8 / 2 eV (see F i g . 5 " ( b ) ) .

F i g . 7 s h o w s the i n t e n s i t y r a t i o of 7 4 G e +

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182 W a d a , Takeda and Yasuda

lrradlali~n In v a c u u m

E = 7 M e V

~b= 5 x I01"/e I c rn2¢ •

I0 -3

10"~

1if:

10"

I0-2t

Oepth (~m)

F i g . 7 . I n t e n s i t y r a t i o s of7 4 G e + to 2 8 S i + in Si i r r a d i a t e din v a c u u m as a f u n c t i o n ofd e p t h f r o m the f r o n t s u r f a c eof Si.

ions to 2 S S i + ions in the case of the i r r a d i a t i o nin ~i0 -3 Tort v a c u u m for Ge ( t ~ 0 . 5 m m ) / S i . Thes a m p l e w a s i r r a d i a t e d w i t h a f l u e n c e of N 4 . 7 x 1 0 1 7e l e c t r o n s cm -2 at ~ 2 5 0 ° C . The v a l u e s of D(c)r a n g e from 10 -18 to 4x10 -15 c m 2 s e c - l . The v a l u eof C o is e s t i m a t e d to be ~ 5 x i 0 2 0 c m - 3 . Thec o n c e n t r a t i o n p r o f i l e of i m p u r i t y a t o m s in Sii r r a d i a t e d in v a c u u m is s i m i l a r to thati r r a d i a t e d in w a t e r b a t h . It s u g g e s t s thati n t e r f a c i a l o x i d e s and c a p i l l a r y w a t e r l a y e r s inthe c o n t a c t of the o v e r l a y e r and the s u b s t r a t em i g h t not be s e r i o u s l y a f f e c t e d for e l e c t r o n -b e a m d o p i n g .

The r e l a t i v e i n t e n s i t i e s of Ge i m p u r i t ya t o m s are i n d i c a t e d in F i g . 8 as a f u n c t i o n ofi r r a d i a t i o n e l e c t r o n e n e r g y at d i f f e r e n t d e p t h sf r o m the Si s u r f a c e . The s a m p l e s w e r e i r r a d i a t e d

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Electron-Beam Doping-Electron Effects 183

02j

-- lo-S

E l e c t r o n energy (MeV)

F i g . 8 . I n t e n s i t y r a t i o s of7 4 G e + to 2 8 S i + in Si as af u n c t i o n of i r r a d i a t i o ne l e c t r o n e n e r g y at d i f f e r e n td e p t h s f r o m the Si s u r f a c e .

w i t h a f l u e n c e of ~ 5 x 1 0 1 7 e l e c t r o n s cm -2 at 3,5,7 and 9 M e V at 6 0 ° C , and the t h i c k n e s s of GeS h e e t s is ~0.5 mm. T h e 5-7 M e V e l e c t r o ni r r a d i a t i o n b e c o m e s to o b t a i n a m a x i m u m s p u t t e r -ing y i e l d .

F i g . 9 . ( a ) s h o w s the r e l a t i v e i m p u r i t yi n t e n s i t i e s of Ge a t o m s in Si as a f u n c t i o n ofd e p t h from the Si s u r f a c e at d i f f e r e n t Ge w a f e rt h i c k n e s s e s . T h e s e s a m p l e s w e r e i r r a d i a t e d w i t ha t o t a l f l u e n c e of ~ 5 x i 0 1 7 e l e c t r o n s cm -2 at 7MeV. The r e l a t i v e i m p u r i t y i n t e n s i t i e s of Gea t o m s at a d e p t h of 0.i ~m in Si are i n d i c a t e d inF i g . 9 " ~ ) a s a f u n c t i o n of Ge o v e r l a y e r t h i c k n e s s .At the t h i c k n e s s of ~ 0 . 2 mm, the i n t e n s i t y r a t i oof 7 4 G e + ions to 2 8 S i + ions b e c o m e s a m a x i m u mv a l u e .

Page 14: Electron-beam doping-electron radiation effects in impurity overlayers and semiconductor substrates

184 Wada , Takeda and Yasuda

LO

iO-s

0

10-3~ • t=013 mm

h. :t \ o °5I" ~ . , 0.6L \ , o 08

I- " ~ . ~ . . O ~ o

2.0C:3

"= 0.5

0 0.2 0.4 0.6 0.8 1.0THICKNESS (ram)

(b)

(a),~w~ , I ,v 0 0.1 0.2

D E P T H ( ~ m )

F i g . 9 . (a) I n t e n s i t y r a t i o s of 7 4 G e + to 2 8 S i +in Si as a f u n c t i o n of d e p t h , f r o m the Sis u r f a c e at d i f f e r e n t Ge s h e e t t h i c k n e s s e s . (b)I n t e n s i t y r a t i o s of 74Ge + to 2 8 S i + in Si as af u n c t i o n of Ge s h e e t t h i c k n e s s .

1.2

S u m m a r y

A n e w e l e c t r o n - b e a m d o p i n g into Si b y u s i n gh i g h e n e r g y e l e c t r o n b o m b a r d m e n t is i n v e s t i g a t e d .An i m p u r i t y s h e e t of Ge is in c o n t a c t w i t h Sis u r f a c e a n d the s u r f a c e of the i m p u r i t y s h e e t isb o m b a r d e d w i t h 3-9 M e V e l e c t r o n s . C o n c e n t r a t i o n -d e p e n d e n t d i f f u s i v i t i e s for Ge in Si areo b t a i n e d . A c t i v a t i o n e n e r g i e s of s p u t t e r i n g y i e l dfor Ge and of the d i f f u s i v i t y of Ge in Si arem e a s u r e d .

A c k n o w l e d g e m e n t s

The a u t h o r s w o u l d like to e x p r e s s t h e i r

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Electron-Beam Doping-Electron Effects 185

t h a n k s to M e s s r s K . Y a s u d a and H . M a s u d a of theG o v e r n m e n t I n d u s t r i a l R e s e a r c h I n s t i t u t e ofN a g o y a , for t h e i r h e l p in c o n n e c t i o n w i t hi r r a d i a t i o n of the s a m p l e , and V a n de G r a a f fg r o u p of the G o v e r n m e n t I n d u s t r i a l R e s e a r c hI n s t i t u t e of N a g o y a , for t h e i r h e l p in RBSm e a s u r e m e n t s .

1)

2)

3)

4)

5)

6)

7)

8)

9)

i0)

11)

12)

R e f e r e n c e

J . W . C o r b e t t , E l e c t r o n R a d i a t i o n D a m a g e inS e m i c o n d u c t o r s a n d M e t a l s ( A c a d e m i c P r e s s ,N e w Y o r k and L o n d o n , 1 9 6 6 ) .H . Y . F a n and K . L a r k - H o r o v i t z , E f f e c t s ofR a d i a t i o n on M a t e r i a l s ( R e i n h o l d , N e w Y o r k ,1 9 5 8 ) .D . S . B i l l i n g t o n and J . H . C r a w f o r d , Jr,R a d i a t i o n D a m a g e in S o l i d s ( P r i n c e t o nU n i v e r s i t y P r e s s , 1 9 6 1 ) .F . S e i t z and J . S . K o e h l e r , S o l i d S t a t eP h y s i c s 2 ( A c a d e m i c P r e s s , N e w Y o r k , 1 9 5 5 ) .J . W . M a y e r and O . J . M a r s h in A p p l i e d S o l i dS t a t e S c i e n c e , C . J . K r i e s s m a n and R . W o l f ,eds ( A c a d e m i c P r e s s , N e w Y o r k , 1 9 6 8 ) .D . J . M a z e y , R . S . N e l s o n and R o S . B a r n e s , P h i l .Mag. 17, 223 ( 1 9 6 8 ) .T . W a d a , N u c l . I n s t r . and M e t h . 1 8 2 / 1 8 3 ,131 ( 1 9 8 1 ) .T . W a d a , P r o c . 3rd I n t e r n . C o n f . on N e u t r o n -T r a n s m u t a t i o n D o p e d Si ( P l e n u m P r e s s , N e wY o r k and L o n d o n ) , 447 ( 1 9 8 1 ) .T . W a d a and M . K a n e i w a , I n s t . P h y s . C o n f .Ser. 59 223 ( 1 9 8 1 ) .T . W a d a , M . T a k e d a , K . Y a s u d a and H . M a s u d a ,P r o c . 6th S y m p . on Ion S o u r c e s and Ion-A s s i s t e d T e c h n o l o g y ( I o n i c s Co, T o k y o ) , 433( 1 9 8 2 ) .T . W a d a , K . N a k a i and H . H a d a , P r o c . 4thI n t e r n . C o n f . on Ion I m p l a n t a t i o n ,E q u i p m e n t and T e c h n i q u e s ( S p r i n g e r - V e r l a g ,B e r l i n , H e i d e l b e r g , N e w Y o r k and T o k y o ) ii,214 ( 1 9 8 3 ) .T . W a d a and M . T a k e d a , P r o c . I n t e r n . IonE n g i n e e r i n g C o n g r e s s ( I o n i c s Co, T o k y o ) .

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186 W a d a , Takeda and Yasuda

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24)

1747 (1983).T.Wada and H.Hada, Phys. Rev. B30(6) 3384(1984).T.Wada, M.Takeda, H.Yamaguchi, N.Kitamura,T.Endo and M.Kakehi, To be published inJour. of Elec. Materials (1984).T.Tabata, R.Ito and S.Okabe, Nucl. Instr.and Meth. 103, 85 (1972).J.H.Cahn, J. Appl. Phys. 30, 1310 (1959).T.Wada, K.Yasuda, S.Ikuta, M.Takeda andH.Masuda, J. Appl. Phys. 48, 2145 (1977).S.Furukawa, H.Matsumura and H.Ishiwara,Jap. J. Appl. Phys. ii, 134 (1972).H.Sugiyama, Bul. Electrotech. Lab. 34 577(1970) •T.Wada and E.Matsumoto, Inst. Phys. Conf.Ser. No59 (6) 347 (1980).E.Baldinger, W.Czaja and A.Z.Farooqi, Helv.Phys. Acta 33, 551 (1960).H.Sugiyama, Research of the Electrotechni-cal Laboratory, No.724 (Feb. 1972).J.C.Bourgoin and J.W.Corbett, Radiat. Eff.36, 157 (1978).L.Boltzmann, Ann. Physik 53, 948 (1894).