eed2013 engineering materials non-mechanical properties of materials 1
TRANSCRIPT
EED2013 Engineering Materials
Non-Mechanical Properties of Materials
1
Overview
• Electrical Properties
• Magnetic Properties
• Thermal Properties
• Durability
2
3
ISSUES TO ADDRESS...
• How are electrical conductance and resistance characterized?
• What are the physical phenomena that distinguish conductors, semiconductors, and insulators?
• For metals, how is conductivity affected by imperfections, temperature, and deformation?
• For semiconductors, how is conductivity affected by impurities (doping) and temperature?
Electrical Properties
4
• Scanning electron micrographs of an IC:
Fig. (d) from Fig. 12.27(a), Callister & Rethwisch 3e. (Fig. 12.27 is courtesy Nick Gonzales, National Semiconductor Corp., West Jordan, UT.)
• A dot map showing location of Si (a semiconductor): -- Si shows up as light regions.
(b)
View of an Integrated Circuit
0.5 mm
(a)(d)
45 m
Al
Si (doped)
(d)
• A dot map showing location of Al (a conductor): -- Al shows up as light regions. (c)
Figs. (a), (b), (c) from Fig. 18.27, Callister & Rethwisch 8e.
5
Electrical Conduction• Ohm's Law: V = I R
voltage drop (volts = J/C) C = Coulomb
resistance (Ohms)current (amps = C/s)
1
• Conductivity,
• Resistivity, : -- a material property that is independent of sample size and geometry
RA
l
surface area of current flow
current flow path length
6
Electrical Properties
• Which will have the greater resistance?
• Analogous to flow of water in a pipe• Resistance depends on sample geometry and
size.
D
2D
R1 2
D2
2
8D2
2
R2
2D
2
2D2
R1
8
7
Definitions
Further definitions
J = <= another way to state Ohm’s law
J current density
electric field potential = V/
flux a like area surface
current
A
I
Electron flux conductivity voltage gradient
J = (V/ )
8
• Room temperature values (Ohm-m)-1 = ( - m)-1
Selected values from Tables 18.1, 18.3, and 18.4, Callister & Rethwisch 8e.
Conductivity: Comparison
Silver 6.8 x 10 7
Copper 6.0 x 10 7
Iron 1.0 x 10 7
METALS conductors
Silicon 4 x 10-4
Germanium 2 x 10 0
GaAs 10 -6
SEMICONDUCTORS
semiconductors
Polystyrene <10-14
Polyethylene 10-15-10-17
Soda-lime glass 10
Concrete 10-9
Aluminum oxide <10-13
CERAMICS
POLYMERS
insulators
-10-10-11
9
What is the minimum diameter (D) of the wire so that V < 1.5 V?
Example: Conductivity Problem
Cu wire I = 2.5 A- +
V
Solve to get D > 1.87 mm
< 1.5 V
2.5 A
6.07 x 107 (Ohm-m)-1
100 m
I
V
AR
4
2D
100 m
Relative Permittivity, εr
• Property governs the electro-static charge stored on an electric capacitor.
• The main equation that this is found is:
C = εoεrA/d
where C = capacitance in Farads
A = area of the capacitor plate
d = distance between the capacitor plates
εo = absolute permittivity (8.85 x 10-12)
10
Relative Permittivity, εr
• Here is a table of some example values of εr:
11
12
Band Structure Representation
Adapted from Fig. 18.3, Callister & Rethwisch 8e.
13
Conduction & Electron Transport• Metals (Conductors):-- for metals empty energy states are adjacent to filled states.
-- two types of band structures for metals
-- thermal energy excites electrons into empty higher energy states.
- partially filled band - empty band that overlaps filled band
filled band
Energy
partly filled band
empty band
GAP
fille
d st
ates
Partially filled band
Energy
filled band
filled band
empty band
fille
d st
ates
Overlapping bands
14
Energy Band Structures: Insulators & Semiconductors
• Insulators: -- wide band gap (> 2 eV) -- few electrons excited across band gap
Energy
filled band
filled valence band
fille
d st
ates
GAP
empty
bandconduction
• Semiconductors: -- narrow band gap (< 2 eV) -- more electrons excited across band gap
Energy
filled band
filled valence band
fille
d st
ates
GAP?
empty
bandconduction
15
Metals: Influence of Temperature and Impurities on Resistivity
• Presence of imperfections increases resistivity -- grain boundaries -- dislocations -- impurity atoms -- vacancies
These act to scatterelectrons so that theytake a less direct path.
• Resistivity increases with:
=
deformed Cu + 1.12 at%Ni
Adapted from Fig. 18.8, Callister & Rethwisch 8e. (Fig. 18.8 adapted from J.O. Linde, Ann. Physik 5, p. 219 (1932); and C.A. Wert and R.M. Thomson, Physics of Solids, 2nd ed., McGraw-Hill Book Company, New York, 1970.)
T (ºC)-200 -100 0
1
2
3
4
5
6
Res
istiv
ity,
(10
-8 O
hm
-m)
0
Cu + 1.12 at%Ni
“Pure” Cu
d -- %CW
+ deformation
i
-- wt% impurity
+ impurity
t
-- temperature
thermal
Cu + 3.32 at%Ni
16
Estimating Conductivity
Adapted from Fig. 7.16(b), Callister & Rethwisch 8e.
• Question:-- Estimate the electrical conductivity of a Cu-Ni alloy that has a yield strength of 125 MPa.
mOhm10 x 30 8
16 )mOhm(10 x 3.31
Yie
ld s
tren
gth
(M
Pa
)
wt% Ni, (Concentration C)0 10 20 30 40 50
6080
100120140160180
21 wt% Ni
Adapted from Fig. 18.9, Callister & Rethwisch 8e.
wt% Ni, (Concentration C)R
esi
stiv
ity,
(10
-8 O
hm
-m)
10 20 30 40 500
10203040
50
0
125
CNi = 21 wt% Ni
From step 1:
30
17
Charge Carriers in Insulators and Semiconductors
Two types of electronic charge carriers:
Free Electron – negative charge – in conduction band
Hole – positive charge
– vacant electron state in the valence band
Adapted from Fig. 18.6(b), Callister & Rethwisch 8e.
Move at different speeds - drift velocities
18
Intrinsic Semiconductors
• Pure material semiconductors: e.g., silicon & germanium– Group IVA materials
• Compound semiconductors – III-V compounds
• Ex: GaAs & InSb
– II-VI compounds• Ex: CdS & ZnTe
– The wider the electronegativity difference between the elements the wider the energy gap.
19
Intrinsic Semiconduction in Terms of Electron and Hole Migration
Adapted from Fig. 18.11, Callister & Rethwisch 8e.
electric field electric field electric field
• Electrical Conductivity given by:
# electrons/m3 electron mobility
# holes/m3
hole mobilityhe epen
• Concept of electrons and holes:
+-
electron hole pair creation
+-
no applied applied
valence electron Si atom
applied
electron hole pair migration
20
Number of Charge Carriers
Intrinsic Conductivity
)s/Vm 45.085.0)(C10x6.1(
m)(10219
16
hei e
n
For GaAs ni = 4.8 x 1024 m-3
For Si ni = 1.3 x 1016 m-3
• Ex: GaAs
he epen
• for intrinsic semiconductor n = p = ni
= ni|e|(e + h)
21
Intrinsic Semiconductors: Conductivity vs T
• Data for Pure Silicon: -- increases with T -- opposite to metals
Adapted from Fig. 18.16, Callister & Rethwisch 8e.
material Si Ge GaP CdS
band gap (eV) 1.11 0.67 2.25 2.40
Selected values from Table 18.3, Callister & Rethwisch 8e.
ni e Egap / kT
ni e e h
22
• Intrinsic: -- case for pure Si -- # electrons = # holes (n = p)
• Extrinsic: -- electrical behavior is determined by presence of impurities that introduce excess electrons or holes -- n ≠ p
Intrinsic vs Extrinsic Conduction
3+
• p-type Extrinsic: (p >> n)
no applied electric field
Boron atom
4+ 4+ 4+ 4+
4+
4+4+4+4+
4+ 4+ hep
hole
• n-type Extrinsic: (n >> p)
no applied electric field
5+
4+ 4+ 4+ 4+
4+
4+4+4+4+
4+ 4+
Phosphorus atom
valence electron
Si atom
conductionelectron
een
Adapted from Figs. 18.12(a) & 18.14(a), Callister & Rethwisch 8e.
23
Extrinsic Semiconductors: Conductivity vs. Temperature
• Data for Doped Silicon: -- increases doping -- reason: imperfection sites lower the activation energy to produce mobile electrons.
• Comparison: intrinsic vs extrinsic conduction... -- extrinsic doping level: 1021/m3 of a n-type donor impurity (such as P). -- for T < 100 K: "freeze-out“, thermal energy insufficient to excite electrons. -- for 150 K < T < 450 K: "extrinsic" -- for T >> 450 K: "intrinsic"
Adapted from Fig. 18.17, Callister & Rethwisch 8e. (Fig. 18.17 from S.M. Sze, Semiconductor Devices, Physics, and Technology, Bell Telephone Laboratories, Inc., 1985.)
Co
nd
uct
ion
ele
ctro
n
con
cen
tra
tion
(1
021
/m3 )
T (K)6004002000
0
1
2
3
fre
eze
-ou
t
ext
rin
sic
intr
insi
c
doped
undoped
24
• Allows flow of electrons in one direction only (e.g., useful to convert alternating current to direct current).• Processing: diffuse P into one side of a B-doped crystal.
-- No applied potential: no net current flow.
-- Forward bias: carriers flow through p-type and n-type regions; holes and electrons recombine at p-n junction; current flows.
-- Reverse bias: carriers flow away from p-n junction; junction region depleted of carriers; little current flow.
p-n Rectifying Junction
++
++
+- ---
-p-type n-type
+ -
++ +
++
--
--
-
p-type n-typeAdapted from Fig. 18.21 Callister & Rethwisch 8e.
+++
+
+
---
--
p-type n-type- +
25
Properties of Rectifying Junction
Fig. 18.22, Callister & Rethwisch 8e. Fig. 18.23, Callister & Rethwisch 8e.
26
• Electrical conductivity and resistivity are: -- material parameters -- geometry independent• Conductors, semiconductors, and insulators... -- differ in range of conductivity values -- differ in availability of electron excitation states• For metals, resistivity is increased by -- increasing temperature -- addition of imperfections -- plastic deformation• For pure semiconductors, conductivity is increased by -- increasing temperature -- doping [e.g., adding B to Si (p-type) or P to Si (n-type)]• Other electrical characteristics -- ferroelectricity -- piezoelectricity
Summary
27
ISSUES TO ADDRESS...
• What are the important magnetic properties?
• How does magnetic memory storage work?
Magnetic Properties
28
• Created by current through a coil:
• Computation of the applied magnetic field, H:
H N I
Generation of a Magnetic Field -- Vacuum
I = current (ampere)H
I
B0 N = total number of turns
B0 = 0Hpermeability of a vacuum(1.257 x 10-6 Henry/m)
• Computation of the magnetic flux density in a vacuum, B0:
= length of each turn (m)
H = applied magnetic field (ampere-turns/m)B0 = magnetic flux density in a vacuum (tesla)
29
• A magnetic field is induced in the material
Generation of a Magnetic Field -- within a Solid Material
current I
B = Magnetic Induction (tesla) inside the materialapplied
magnetic field H B = H
permeability of a solid
r 0
• Relative permeability (dimensionless)
B
Relative Permeability, μr
• Property that governs the magnetic strength of a material.
• The main equation that this property occurs is B/H = μoμr
where B = flux density in Tesla
H = magnetising force
μo = absolute permeability (12.566 x 10-7)
30
31
Types of Magnetism
Plot adapted from Fig. 20.6, Callister & Rethwisch 8e. Values and materials from Table 20.2 and discussion in Section 20.4, Callister & Rethwisch 8e.
B (
tesl
a)
H (ampere-turns/m)
vacuum (m = 0)
(1) diamagnetic (m ~ -10-5)e.g., Al2O3, Cu, Au, Si, Ag, Zn
(3) ferromagnetic e.g. Fe3O4, NiFe2O4
(4) ferrimagnetic e.g. ferrite(), Co, Ni, Gd(m as large as 106 !)
(2) paramagnetic ( e.g., Al, Cr, Mo, Na, Ti, Zr
m ~ 10-4)
32
Magnetic Responses for 4 Types
Adapted from Fig. 20.5(a), Callister & Rethwisch 8e.
No Applied Magnetic Field (H = 0)
Applied Magnetic Field (H)
(1) diamagnetic
none
oppo
sing
Adapted from Fig. 20.5(b), Callister & Rethwisch 8e.
(2) paramagnetic
rand
om
alig
ned
Adapted from Fig. 20.7, Callister & Rethwisch 8e.
(3) ferromagnetic(4) ferrimagnetic
alig
ned
alig
ned
33
• As the applied field (H) increases the magnetic domains change shape and size by movement of domain boundaries.
Adapted from Fig. 20.13, Callister & Rethwisch 8e. (Fig. 20.13 adapted from O.H. Wyatt and D. Dew-Hughes, Metals, Ceramics, and Polymers, Cambridge University Press, 1974.)
Domains in Ferromagnetic & Ferrimagnetic Materials
Applied Magnetic Field (H)
Mag
netic
in
duct
ion
(B)
0
Bsat
H = 0
H
H
H
H
H
• “Domains” with aligned magnetic moment grow at expense of poorly aligned ones!
34
Adapted from Fig. 20.14, Callister & Rethwisch 8e.
Hysteresis and Permanent Magnetization
H
Stage 1. Initial (unmagnetized state)
B
Stage 4. Coercivity, HC
Negative H needed to demagnitize!
• The magnetic hysteresis phenomenon
Stage 2. Apply H, align domains Stage 3. Remove H, alignment
remains! => permanent magnet!
Stage 5. Apply -H, align domains
Stage 6. Close the hysteresis loop
35
Hard and Soft Magnetic Materials
Hard magnetic materials:-- large coercivities-- used for permanent magnets-- add particles/voids to inhibit domain wall motion-- example: tungsten steel -- Hc = 5900 amp-turn/m)
Soft magnetic materials:-- small coercivities-- used for electric motors-- example: commercial iron 99.95 Fe
Adapted from Fig. 20.19, Callister & Rethwisch 8e. (Fig. 20.19 from K.M. Ralls, T.H. Courtney, and J. Wulff, Introduction to Materials Science and Engineering, John Wiley and Sons, Inc., 1976.)
H
B
Har
d
So
ft
36
Magnetic Storage• Digitized data in the form of electrical signals are transferred to
and recorded digitally on a magnetic medium (tape or disk) • This transference is accomplished by a recording system that consists of a read/write head
Fig. 20.23, Callister & Rethwisch 8e.
-- “write” or record data by applying a
magnetic field that aligns domains in small regions of the recording medium -- “read” or retrieve data from medium by sensing changes in magnetization
37
Magnetic Storage Media Types
Fig. 20.25, Callister & Rethwisch 8e. (Fig. 20.25 from Seagate Recording Media)
-- CoCr alloy grains (darker regions) separated by oxide grain boundary segregant layer (lighter regions) -- Magnetization direction of each grain is perpendicular to plane of disk
• Hard disk drives (granular/perpendicular media):
• Recording tape (particulate media):
Fig. 20.24, Callister & Rethwisch 8e. (Fig. 20.24 courtesy Fuji Film Inc., Recording Media Division)
-- Acicular (needle-shaped) ferromagnetic metal alloy particles
-- Tabular (plate-shaped) ferrimagnetic barium-ferrite particles
38
• A magnetic field is produced when a current flows through a wire coil.• Magnetic induction (B): -- an internal magnetic field is induced in a material that is situated within an external magnetic field (H). -- magnetic moments result from electron interactions with the applied magnetic field • Types of material responses to magnetic fields are: -- ferrimagnetic and ferromagnetic (large magnetic susceptibilities) -- paramagnetic (small and positive magnetic susceptibilities) -- diamagnetic (small and negative magnetic susceptibilities)
• Types of ferrimagnetic and ferromagnetic materials: -- Hard: large coercivities -- Soft: small coercivities
• Magnetic storage media: -- particulate barium-ferrite in polymeric film (tape) -- thin film Co-Cr alloy (hard drive)
Summary
39
ISSUES TO ADDRESS...
• How do materials respond to the application of heat?
• How do we define and measure... -- heat capacity? -- thermal expansion? -- thermal conductivity? -- thermal shock resistance?
• How do the thermal properties of ceramics, metals,
and polymers differ?
Thermal Properties
40
• Quantitatively: The energy required to produce a unit rise in temperature for one mole of a material.
heat capacity(J/mol-K)
energy input (J/mol)
temperature change (K)
Heat Capacity
• Two ways to measure heat capacity:Cp : Heat capacity at constant pressure.
Cv : Heat capacity at constant volume.Cp usually > Cv
• Heat capacity has units of
Fmollb
Btu
Kmol
J
dT
dQC
The ability of a material to absorb heat
41
• Heat capacity... -- increases with temperature -- for solids it reaches a limiting value of 3R
• From atomic perspective: -- Energy is stored as atomic vibrations. -- As temperature increases, the average energy of atomic vibrations increases.
Dependence of Heat Capacity on Temperature
Adapted from Fig. 19.2, Callister & Rethwisch 8e.
R = gas constant 3R = 8.31 J/mol-K
Cv = constant
Debye temperature (usually less than Troom )
T (K)D00
Cv
42
Atomic VibrationsAtomic vibrations are in the form of lattice waves or phonons
Adapted from Fig. 19.1, Callister & Rethwisch 8e.
43
incr
eas
ing
cp • Why is cp significantly
larger for polymers?
Selected values from Table 19.1, Callister & Rethwisch 8e.
• PolymersPolypropylene Polyethylene Polystyrene Teflon
cp (J/kg-K)
at room T
• CeramicsMagnesia (MgO)Alumina (Al2O3)Glass
• MetalsAluminum Steel Tungsten Gold
1925 1850 1170 1050
900 486 138 128
cp (specific heat): (J/kg-K)
Material
940 775 840
Specific Heat: Comparison
Cp (heat capacity): (J/mol-K)
44
Thermal Expansion
Materials change size when temperature is changed
l final l initial
l initial
l (Tfinal Tinitial)
linear coefficient ofthermal expansion (1/K or 1/ºC)
Tinitial
Tfinal
initial
final
Tfinal > Tinitial
45
Atomic Perspective: Thermal Expansion
Adapted from Fig. 19.3, Callister & Rethwisch 8e.
Asymmetric curve: -- increase temperature, -- increase in interatomic separation -- thermal expansion
Symmetric curve: -- increase temperature, -- no increase in interatomic separation -- no thermal expansion
46
Coefficient of Thermal Expansion: Comparison
• Q: Why does generally decrease with increasing bond energy?
Polypropylene 145-180 Polyethylene 106-198 Polystyrene 90-150 Teflon 126-216
• Polymers
• CeramicsMagnesia (MgO) 13.5Alumina (Al2O3) 7.6Soda-lime glass 9Silica (cryst. SiO2) 0.4
• MetalsAluminum 23.6Steel 12 Tungsten 4.5 Gold 14.2
(10-6/C)at room T
Material
Selected values from Table 19.1, Callister & Rethwisch 8e.
Polymers have larger
values because of
weak secondary bonds
incr
eas
ing
47
Thermal Expansion: Example
Ex: A copper wire 15 m long is cooled from 40 to -9ºC. How much change in length will it experience?
16.5 x 10 6 (C) 1• Answer: For Cu
mm 12m 012.0
)]C9(C40[)m 15)](C/1(10 x5.16[ 60
T
rearranging Equation 19.3b
48
The ability of a material to transport heat.
temperaturegradient
thermal conductivity (J/m-K-s)
heat flux
(J/m2-s)
• Atomic perspective: Atomic vibrations and free electrons in hotter regions transport energy to cooler regions.
T2 T2 > T1
T1
x1 x2heat flux
Thermal Conductivity
dx
dTkq
Fourier’s Law
49
Thermal Conductivity: Comparisonin
crea
sing
k
• PolymersPolypropylene 0.12Polyethylene 0.46-0.50 Polystyrene 0.13 Teflon 0.25
vibration/rotation of chain molecules
• CeramicsMagnesia (MgO) 38Alumina (Al2O3) 39 Soda-lime glass 1.7 Silica (cryst. SiO2) 1.4
atomic vibrations
• MetalsAluminum 247Steel 52 Tungsten 178 Gold 315
atomic vibrations and motion of free electrons
k (W/m-K)Energy Transfer
MechanismMaterial
Selected values from Table 19.1, Callister & Rethwisch 8e.
50
• Occur due to: -- restrained thermal expansion/contraction -- temperature gradients that lead to differential
dimensional changes
Thermal Stresses
E(T0 Tf ) ET
Thermal stress
-- A brass rod is stress-free at room temperature (20ºC). -- It is heated up, but prevented from lengthening. -- At what temperature does the stress reach -172 MPa?
Example Problem
T0
0
Solution:
Original conditions
room
thermal (Tf T0)Tf
Step 1: Assume unconstrained thermal expansion
0
Step 2: Compress specimen back to original length
0
compress room
thermal
51
52
Example Problem (cont.)
0
The thermal stress can be directly calculated as
E(compress)
E(thermal ) E(Tf T0) E(T0 Tf )
Noting that compress = -thermal and substituting gives
20 x 10-6/ºCAnswer: 106ºC 100 GPa
Tf T0
E
20ºC
Rearranging and solving for Tf gives
-172 MPa (since in compression)
53
• Occurs due to: nonuniform heating/cooling• Ex: Assume top thin layer is rapidly cooled from T1 to T2
Tension develops at surface
E(T1 T2)
Critical temperature difference
for fracture (set = f)
(T1 T2)fracture f
Eset equal
• Large TSR when is large
fk
E
Thermal Shock Resistance
Temperature difference thatcan be produced by cooling:
kTT
rate quench)( 21
rapid quench
resists contraction
tries to contract during cooling T2
T1
(quench rate)for fracture Thermal Shock Resistance (TSR)fkE
•
54
• Application:
Space Shuttle Orbiter
• Silica tiles (400-1260ºC):-- large scale application -- microstructure:
Fig. 19.2W, Callister 6e. (Fig. 19.2W adapted from L.J. Korb, C.A. Morant, R.M. Calland, and C.S. Thatcher, "The Shuttle Orbiter Thermal Protection System", Ceramic Bulletin, No. 11, Nov. 1981, p. 1189.)
Fig. 19.3W, Callister 5e. (Fig. 19.3W courtesy the National Aeronautics and Space Administration.)
Fig. 19.4W, Callister 5e. (Fig. 219.4W courtesy Lockheed Aerospace CeramicsSystems, Sunnyvale, CA.)
Thermal Protection System
reinf C-C (1650ºC)
Re-entry T Distribution
silica tiles(400-1260ºC)
nylon felt, silicon rubbercoating (400ºC)
~90% porosity!Si fibersbonded to oneanother duringheat treatment.
100 m
Chapter-opening photograph, Chapter 23, Callister 5e (courtesy of the National Aeronautics and Space Administration.)
55
The thermal properties of materials include: • Heat capacity: -- energy required to increase a mole of material by a unit T -- energy is stored as atomic vibrations• Coefficient of thermal expansion: -- the size of a material changes with a change in temperature -- polymers have the largest values• Thermal conductivity: -- the ability of a material to transport heat -- metals have the largest values• Thermal shock resistance: -- the ability of a material to be rapidly cooled and not fracture
-- is proportional to
Summary
fk
E
56
ISSUES TO ADDRESS...
• How does corrosion occur?
• Which metals are most likely to corrode?
• What environmental parameters affect corrosion rate?
• How do we prevent or control corrosion?
Durability:Corrosion and Degradation of Materials
57
• Corrosion: -- the destructive electrochemical attack of a material. -- Ex: Al Capone's ship, Sapona, off the coast of Bimini.
• Cost: -- 4 to 5% of the Gross National Product (GNP)* -- in the U.S. this amounts to just over $400 billion/yr**
* H.H. Uhlig and W.R. Revie, Corrosion and Corrosion Control: An Introduction to Corrosion Science and Engineering, 3rd ed., John Wiley and Sons, Inc., 1985.**Economic Report of the President (1998).
Photos courtesy L.M. Maestas, Sandia National Labs. Used with permission.
THE COST OF CORROSION
58
• Two reactions are necessary: -- oxidation reaction: -- reduction reaction:
Zn Zn2 2e
2H 2e H2(gas)
• Other reduction reactions in solutions with dissolved oxygen:
-- acidic solution -- neutral or basic solution
O2 4H 4e 2H2O
O2 2H2O 4e 4(OH)
Adapted from Fig. 17.1, Callister & Rethwisch 8e. (Fig. 17.1 is from M.G. Fontana, Corrosion Engineering, 3rd ed., McGraw-Hill Book Company, 1986.)
ELECTROCHEMICAL CORROSION
Zinc
Oxidation reactionZn Zn2+
2e-Acid solution
reduction reaction
H+H+
H2(gas)
H+
H+
H+
H+
H+
flow of e-
in the metal
Ex: consider the corrosion of zinc in an acid solution
59
STANDARD HYDROGEN ELECTRODE• Two outcomes:
0ometal V (relative to Pt)
Standard Electrode PotentialAdapted from Fig. 17.2, Callister & Rethwisch 8e.
-- Corrosion
-- Metal is the anode (-)
Pla
tinum
met
al,
M
Mn+ ions
ne- H2(gas)
25ºC 1M Mn+ sol’n 1M H+ sol’n
2e-
e-e-
H+
H+
-- Electrodeposition
-- Metal is the cathode (+)
Mn+ ions
ne-
e- e-
25ºC1M Mn+ sol’n 1M H+ sol’n
Pla
tinum
met
al,
M
H+H+
2e-
0ometal V (relative to Pt)
H2(gas)
60
STANDARD EMF SERIES
metalo
• Metal with smaller V corrodes.
• EMF series
AuCuPbSnNiCoCdFeCrZnAlMgNaK
+1.420 V+0.340- 0.126- 0.136- 0.250- 0.277- 0.403- 0.440- 0.744- 0.763- 1.662- 2.363- 2.714- 2.924
metal Vmetalo
Data based on Table 17.1, Callister 8e.
mor
e an
odic
mor
e ca
thod
ic
V = 0.153V
o
Adapted from Fig. 17.2, Callister & Rethwisch 8e.
-
1.0 M
Ni2+ solution
1.0 M
Cd2+ solution
+
25ºC NiCd
Cdo
Nio
• Ex: Cd-Ni cell V < V Cd corrodes
61
CORROSION IN A GRAPEFRUIT
Zn2+
2e- oxidation reaction
Acid
H+ H+H+
H+
H+
H+
H+-+
Zn (anode)Cu (cathode)
O2 4H 4e 2H2O
2H 2e H2(gas)
reduction reactions
Zn Zn2+ 2e
62
EFFECT OF SOLUTION CONCENTRATION AND TEMPERATURE
• Ex: Cd-Ni cell with standard 1 M solutions
VNio VCd
o 0.153 V-
Ni
1.0 M
Ni2+ solution
1.0 M
Cd2+ solution
+
Cd 25ºC
• Ex: Cd-Ni cell with non-standard solutions
Y
Xln
nF
RTVVVV o
Cdo
NiCdNi
n = #e-
per unitoxid/redreaction(= 2 here)F = Faraday'sconstant= 96,500C/mol.
• Reduce VNi - VCd by -- increasing X -- decreasing Y -- increasing T
- +
Ni
Y M
Ni2+ solution
X M
Cd2+ solution
Cd T
63
GALVANIC SERIES• Ranking of the reactivity of metals/alloys in seawater
Based on Table 17.2, Callister & Rethwisch 8e. (Source of Table 17.2 is M.G. Fontana, Corrosion Engineering, 3rd ed., McGraw-Hill Book Company, 1986.)
PlatinumGoldGraphiteTitaniumSilver316 Stainless Steel (passive)Nickel (passive)CopperNickel (active)TinLead316 Stainless Steel (active)Iron/SteelAluminum AlloysCadmiumZincMagnesium
mor
e an
odic
(act
ive)
mor
e ca
thod
ic(in
ert)
64
• Uniform AttackOxidation & reductionreactions occur uniformly over surfaces.
• Selective LeachingPreferred corrosion ofone element/constituent[e.g., Zn from brass (Cu-Zn)].
• Stress corrosionCorrosion at crack tips when a tensile stress is present.
• GalvanicDissimilar metals arephysically joined in the presence of an electrolyte. Themore anodic metalcorrodes.
• Erosion-corrosionCombined chemical attack and mechanical wear (e.g., pipeelbows).
FORMS OF CORROSION
Formsof
corrosion
• Crevice Narrow and confined spaces.
Fig. 17.15, Callister & Rethwisch 8e. (Fig. 17.15 is courtesy LaQue Center for Corrosion Technology, Inc.)
Rivet holes
• IntergranularCorrosion alonggrain boundaries,often where precip.particles form.
Fig. 17.18, Callister &
Rethwisch 8e.
attacked zones
g.b. prec.
• PittingDownward propagationof small pits and holes.
Fig. 17.17, Callister & Rethwisch 8e. (Fig. 17.17 from M.G. Fontana, Corrosion Engineering, 3rd ed., McGraw-Hill BookCompany, 1986.)
65
-- Use metals that passivate - These metals form a thin, adhering oxide layer that slows corrosion.
• Lower the temperature (reduces rates of oxidation and reduction)
CORROSION PREVENTION (i)
Metal (e.g., Al, stainless steel)
Metal oxide
• Apply physical barriers -- e.g., films and coatings
• Materials Selection-- Use metals that are relatively unreactive in the corrosion environment -- e.g., Ni in basic solutions
66
• Add inhibitors (substances added to solution that decrease its reactivity) -- Slow oxidation/reduction reactions by removing reactants (e.g., remove O2 gas by reacting it w/an inhibitor). -- Slow oxidation reaction by attaching species to the surface.
CORROSION PREVENTION (ii)
Adapted from Fig. 17.22(a), Callister & Rethwisch 8e.
Using a sacrificial anode
steel pipe
Mg anode
Cu wiree-
Earth
Mg2+
• Cathodic (or sacrificial) protection -- Attach a more anodic material to the one to be protected.
Adapted from Fig. 17.23, Callister & Rethwisch 8e. steel
zinczinc
Zn2+
2e- 2e-
e.g., zinc-coated nail
Galvanized Steel
e.g., Mg Anode
67
• Metallic corrosion involves electrochemical reactions -- electrons are given up by metals in an oxidation reaction -- these electrons are consumed in a reduction reaction• Metals and alloys are ranked according to their corrosiveness in standard emf and galvanic series.• Temperature and solution composition affect corrosion rates. • Forms of corrosion are classified according to mechanism • Corrosion may be prevented or controlled by: -- materials selection -- reducing the temperature -- applying physical barriers -- adding inhibitors -- cathodic protection
SUMMARY