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Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA www.mems-issys.com A Universal, High-Vacuum, Wafer-Level, MEMS Packaging Technology/Service Introductory Presentation

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Page 1: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

Doug Sparks

 Integrated Sensing Systems Inc. (ISSYS)BAA 04-10 MX

391 Airport Industrial DrYpsilanti, MI 48198 USA

www.mems-issys.com

A Universal, High-Vacuum, Wafer-Level, MEMS Packaging Technology/Service

Introductory Presentation

Page 2: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

MEMS Vacuum Packaging

Vacuum packaging is used for many MEMS devices: gyroscopes, RF-MEMS, optical displays, IR sensors, density meters, resonant clocks, Coriolis mass flow sensors, vacuum microelectronics, density meters, pressure sensors…

Vacuum sealing can be accomplished at the package level (metal or ceramic packages) or at the chip/wafer level.

Page 3: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

Micromachined Capping Wafer

Micromachined Device Wafer- Pyrex

Sealing Material

Bond Pads

Vacuum Cavity

Resonating Silicon MicroTube

NanoGetter

Micromachined Capping Wafer

Micromachined Device Wafer- Pyrex

Sealing Material

Bond Pads

Vacuum Cavity

Resonating Silicon MicroTube

NanoGetter

NanoGetter Thin-Film Technology

To improve the vacuum quality of ISSYS resonant sensors,reduce particle contamination and simplify the processing, a new gettering technology, called NanoGetters due to the very thin metal layers employed, was developed.

NanoGettersTM are covered by pending patents and US patent 6,499,354

Page 4: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

The process flow for glass frit wafer bonding, including the addition of the thin film getter used to form the chip-level vacuum package.

Silicon or Pyrex Wafer

Etch

Sealing Material

A.

B.

C.

Silicon or Pyrex Wafer

Etch

Sealing Material

Silicon or Pyrex Wafer

Etch

Sealing Material

Silicon or Pyrex Wafer

Etch

Sealing Material

A.

B.

C.

NanoGetters

NanoGetters

Active Micromachine Wafer

Resonator or Tunneling Cantilever Bond Pad

Vacuum

D.

E.

Cavity

Cap Wafer

NanoGetters

NanoGetters

Active Micromachine Wafer

Resonator or Tunneling Cantilever Bond Pad

Vacuum

D.

E.

NanoGetters

NanoGetters

Active Micromachine Wafer

Resonator or Tunneling Cantilever Bond Pad

NanoGettersNanoGetters

NanoGettersNanoGetters

Active Micromachine Wafer

Resonator or Tunneling Cantilever Bond Pad

Vacuum

D.

E.

Cavity

Cap Wafer

NanoGetter and the Glass Frit Wafer Bonding Process

Page 5: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

NanoGetter Patterning & SealingNanoGetters can be patterned using shadow masking, and various types of standard photolithography techniques.

The patterning method depends on the MEMS wafer surface topography and dimensional control requirements.

This thin film getter approach can be used with glass frit, eutectic, fusion / silicon direct, anodic and solder bonding

Page 6: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

Q values of2,000-68,000are obtained bywafer-level vacuumpackaging

Vacuum Performance – High Q ResonatorsUsing the NanoGetter Process/Design

With No Nanogetter – the average Q value is 36, standard deviation=17

Q-Plot Silicon Tube Resonator with NanoGetters

-30

-25

-20

-15

-10

-5

0

16354 16355 16356 16357 16358

Frequency (Hz)

Ga

in (

db

)

Q=61,700

Page 7: Doug Sparks Integrated Sensing Systems Inc. (ISSYS) BAA 04-10 MX 391 Airport Industrial Dr Ypsilanti, MI 48198 USA  A Universal, High-Vacuum,

Program Goals & Status 7/04-7/05

• Optimize the getter formulation and deposition process -Done• Conduct reliability tests on the optimized getter - Done• Standardize the design guidelines and processes for integrating

the getter into the various wafer-level vacuum sealing technologies for 100mm-150mm wafer diameters – On-Going

• Insert the new design guidelines into MEMS Exchange – On-Going

• Integrate and run getters for initial DoD customers.Q versus Time @ 95C

15000

17000

19000

21000

23000

25000

27000

29000

31000

33000

0 500 1000 1500 2000

Time @ 95C (hrs)

Q