development of high-rate timing rpcs l. lopes 1,2, r. ferreira marques 1,2, p. fonte 1,3, a. pereira...
TRANSCRIPT
Development of high-rate timing RPCs
L. Lopes1,2, R. Ferreira Marques1,2, P. Fonte1,3,
A. Pereira1, V. Peskov4, A. Policarpo1,2
1 - Laboratório de Instrumentação e Física Experimental de Partículas (LIP), Portugal.
2 - Departamento de Física, Universidade de Coimbra,Portugal.
3 - Instituto Superior de Engenharia de Coimbra, Portugal.
4 - Royal Institute of Technology, Stockholm, Sweden.
P.Fonte CBM collaboration meeting GSI 13.4.04 2
Rate capability – Standard RPCs
0
500
1000
1500
2000
2500
3000
3500
1.0E+09 1.0E+10 1.0E+11 1.0E+12 1.0E+13
Resistivity ( cm)
Max
Co
un
tin
g R
ate
(Hz/
cm2)
LHCbCERN+BolognaWarsawCERN+RioATLASCMS-forwardCMS-barrelALICE-TOFBeijingALICE-muon
"Multigap"RPC
Streamer mode
uniformand
continuous illumination Timing RPCs
P.Fonte CBM collaboration meeting GSI 13.4.04 3
Rate capability – Special RPCs
PPAC
microRPC
Si plate =104 cm-HV
0.1-0.5 mm Drift gap
Amplification gap
Resistive anode on a metal base= 107 cm
Wire meshes (50 m wires at 0.5 mm pitch)
15 mm
3.5 mm
Protected PPAC
microRPC
1.0E+04
1.0E+05
1.0E+06
1.0E+00 1.0E+01 1.0E+02 1.0E+03 1.0E+04 1.0E+05 1.0E+06
Counting rate (Hz/mm2)
Eff
ectiv
e ga
in
N0 = 200 e-
=
Metallic (PPC) limit
Ava
lanc
he C
harg
e (e
lect
rons
) 1.0E+08
1.0E+06
1.0E+07What about timing
RPC?Gain is huge (G0~1012)
Must be tested.
[Fon
te e
t al.,
199
9]
[Car
lson
et a
l, N
SS
2001
]
P.Fonte CBM collaboration meeting GSI 13.4.04 4
Construction technique
No spacers
Resistive electrode
ENSITAL® SD (polimer)
~ 4109 cm
Good surface finish
Commercial material
Gas system
Gas filters used to prevent discharges due to gas impurities
Gas Mixture:
TFE (R-134a) / SF6 = 90% / 10%
Assembled under clean conditions
P.Fonte CBM collaboration meeting GSI 13.4.04 6
Event Generation
Compton scattering
Very low background counting rate during all the measurements. Less than 2 Hz/cm2 below the streamer threshold.
511 keV photons from the annihilation of positrons
662 keV
P.Fonte CBM collaboration meeting GSI 13.4.04 8
Results - Current & Counting Rate
Tired chamber
Current saturation due to electrode resistivity around 2.8 kV
Linear due to space charge effect
(kH
z/cm
2 )
Counting plateau
P.Fonte CBM collaboration meeting GSI 13.4.04 10
Time Resolution
i0
beam ~ 50 ps
Wider initial current distribution
Kt
photons ~ 90 ps
Compton electrons
P.Fonte CBM collaboration meeting GSI 13.4.04 11
Results - Time Resolution 1
The time resolution remains essentially unchanged from
2 kHz/cm2 to 25 kHz/cm2 at a level around 90 ps .
Typical time spectrum
P.Fonte CBM collaboration meeting GSI 13.4.04 12
Results - Time Resolution 2
For a given
counting rate,
an increase of
the applied
voltage doesn't
considerably
improve the
time resolution
Counting Plateau
P.Fonte CBM collaboration meeting GSI 13.4.04 13
Problems – Chamber CurrentIf 0.95Ii at 1.55 mfrom source
If 0.90Ii at 0.85 mfrom source
Time elapsedbetween Ii
and If, 8 min on average
The counting rate presents a similar behaviour
P.Fonte CBM collaboration meeting GSI 13.4.04 14
Problems - Electrode resistivity
After 5 min
with V= 0 V
i+5= 1.15 i
on average.
After 20 min
with V= 0 V
i+20= 1.30 i
External Measurement
Short term behaviour
P.Fonte CBM collaboration meeting GSI 13.4.04 15
Problems - Electrode resistivityExternal Measurement
0 V 600 V100 V
i=185 nAi=122 nA
Full recoveryalso possible
Average value during beam test
2x1010
P.Fonte CBM collaboration meeting GSI 13.4.04 17
Results - Current & Counting Rate
(kH
z/cm
2 )
60Co (3000 Ci)
Initially, when the electrode presents its lower volume resistivity, it is possible to reach much higher currents and counting rates.
P.Fonte CBM collaboration meeting GSI 13.4.04 18
Conclusions
• Time resolution of 90 ps was demonstrated at 25 kHz/cm2.
• Commercial plastic material, ionic conductor must find
something else. Very active field within the ATOF/I3HP
project...
• Up to 50 kHz/cm2 with the lowest resistivity value (but no time
information).
• Strict clean conditions must be observed. Considerably more
difficult technology than low rate RPC.