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Design Review I Dual Threshold Voltage Domino Logic Zhiwen Lu and Robert Addo Part I Publication summaries by Zhiwen The main references that lead to the topic we finally decide are listed and summarized as follow. Not all the references will be included in the final report. Reference 1: Neeraj Kr. Shukla, Debasis Mukherjee, Shilpi Birla and R. K. Singh, Leakage Current Minimization in Deep-Submicron Conventional Single Cell SRAM , 2010 International Conference on Recent Trends in Information, Telecommunication and Computing This paper includes a simple review of several popular techniques for leakage current reduction, such as data

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Page 1: Design Review I - University of Virginiavenividiwiki.ee.virginia.edu/mediawiki/images/9/95/Design_Review_I.doc · Web viewThe improvement in performance is demonstrated with a 16

Design Review I

Dual Threshold Voltage Domino LogicZhiwen Lu and Robert Addo

Part I Publication summaries by Zhiwen

The main references that lead to the topic we finally decide are listed and summarized as follow. Not all the references will be included in the final report.

Reference 1:Neeraj Kr. Shukla, Debasis Mukherjee, Shilpi Birla and R. K. Singh, ‘ Leakage Current Minimization in Deep-Submicron Conventional Single Cell SRAM ’ , 2010 International Conference on Recent Trends in Information, Telecommunication and Computing

This paper includes a simple review of several popular techniques for leakage current reduction, such as data retention gated ground, a drowsy mode and dynamic threshold voltage. It demonstrates the first two approaches on a single 6T cell SRAM. The author has provided good explanation of data retention gated-ground (DRG) cache and the so called drowsy mode. It’s a good material for students outside the CMOS field to have a grasp of the main technology involved nowadays.

In addition, the introduction brings up several approaches for the leakage reduction, including standby leakage control using transistor stack, multiple Vth shceme (multi-threshold voltage CMOS, dual threshold voltage CMOS, dynamic threshold voltage CMOS, double gate dynamic threshold SOI CMOS, etc. ) Among them, Dual Threshold Voltage CMOS finally becomes our topic for this project. And this paper is a thread to it.

Reference 2:Kalyana C. Bolapalli, Rajesh Garg, Kanupriya Gulati and Suil P. khatri, ‘ Low power and high performance SRAM design using bank-based selective forward body bias ’ , GLSVLSI ’ 09 May 10-12, 2009.

Applying a concept of word line groups (WLGs), suppressing leakage current is demonstrated in a 512K Byte SRAM with 45nm technology. Several highlights of this paper:1. Achieved both improvement in power and speed by partitioning the SRAM into

WLGs: 9.2% improvement in access time and 53.4% reduction in power consumption.

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2. It develops an approach to optimize a WLGs based memory by modifying the forward body bias, number of WLGs and the size for the driver driving the bulk of WLG. The tradeoff between power and delay is thus achieved.

Reference 3:Ram K. Krishnamurthy, Atila Alvandpour, Ganesh Balamurugan, Naresh R. Shanbhag, K. Soumyanath and Shekhar Y. Borkar, ‘ A 130-nm 6-GHz 256 x 32 bit leakage – tolerant register file ’ , IEEE Journal of solid-state circuits, VOL 37, NO. 5, May 2003

This paper describes a 256 word X 32 bit register file for 6 GHz operation in 1.2 V 130nm technologies. It realizes the leakage reduction with an approach named pseudo-static technique. The pseudo-static technique is then further compared with dual threshold Vt in performance, robustness and keeper sizing. It finally comes to the conclusion that the pseudo-static technique achieves 8% faster read performance and a simultaneous 36% increase in dc noise robustness.

Reference 4:Fatih Hamzaoglu , Kevin Zhang , Yih Wang , Hong Jo Ahn, Uddalak Bhattacharya , Zhanping Chen , Yong-Gee Ng, Andrei Pavlov , Ken Smits , and Mark Bohr , ‘A 3.8 GHz 153 Mb SRAM Design With Dynamic Stability Enhancement and Leakage Reduction in 45 nm High-k Metal Gate CMOS Technology’ , IEEE Journal of solid-state circuits, vol. 44, NO . 1, J anuary 2009

This paper coordinates the 45nm high-k metal gate technology with the traditional dynamic SRAM PMOS forward-body-bias (FBB) and Active-Controlled SRAM VCC in Sleep. VCCmin, performance, leakage and area are optimized for a 0.346 μm2

6T SRAM bitcell. The improvement in performance is demonstrated with a 16 KB subarray on-die 6 MB Cache for Intel Core 2 Duo CPU in 45 nm technology.

Reference 5:James T. Kao and Anantha P. Chandrakasan, ‘ Dual-threshold voltage techniques for low-power digital circuits ’ , IEEE journal of solid-state circuits ’ , VOL. 35, NO. 7, July 2000

Reference 5 and 6 are closely related to the topic of this project. During the demonstration of the similar idea – dual threshold voltage, a new domino logic will be presented and addressing keeper sizing to achieve an optimized circuit with analysis in different modes.‘Dual threshold voltage domino logic provides the performance equivalent of a purely low-Vt design with the standby leakage

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characteristic of a purely high-Vt implementation.’ Several dual-threshold voltage techniques are applied in this paper, including hierarchical transistor sizing methodology and a imbedded dual threshold domino logic.

Reference 6:Volkan Kursun and Eby G. Friedman, ‘ Low Swing Dual Threshold Voltage Domino Logic’ , GLSVLSI .02 , April 18-19, 2002

This paper combines low swing circuit technology and dual threshold voltage technology in domino logic to achieve leakage reduction. It reviews the power reduction techniques in design of reliable domino logic circuits. A low swing domino logic with and without a keeper is discussed, where two types of keeper are also compared. Low swing domino logic circuit with fully driven keeper is demonstrated to provide the better performance compare to standard domino logic circuit and low swing domino logic circuit with weakly driven keeper.

Part II Initial implementation of a domino logic with and

without dual Vt voltageBy Robert Addo

We implemented an 8-input 4-stage AND gate using domino logic to investigate how leakage current could be reduced in subthreshold operations. A keeper transistor was introduced in each stage so that it could help in the “pull-up” of the output during a low-to-high output transition. We built these circuits using only low threshold transistors in one circuit, a purely high threshold transistors in a second circuit and a combination of both in a third circuit. This helped us to compare their output under various simulations.

Preliminary simulation result of the domino logics with and without dual VT shows that the dual threshold voltage domino circuit which utilizes both a high threshold and low threshold transistors has a similar performance characteristic as the domino logic implemented with all low threshold transistors but it characteristics during the standby mode is that of a domino circuit implemented with a high threshold transistors. This is because the high threshold transistors are put along a non critical transition path that switches during the precharge while the low threshold transistors are put along a critical path which switches during the evaluate phase.

With the correct sizing of both the high and low threshold transistors in the dual VT domino circuit, the leakage current of the circuit when operated in subthreshold is significantly reduced

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Further works to be done include sizing the transistors using various methods so that an optimum operation could be achieved, finding ways of further improving the performance of the circuit during both the precharge and evaluate phases by proposing new techniques in duel VT.

Part III Project progress and planBy Zhiwen LuPhase 1: (Before proposal)

1. Research on the prevalent issues in VLSI design through references, narrow the topic to reduce sub-threshold leakage current. Pick an efficient technique – dual Vt and implement it into a popular circuit – domino logic to see if this topic is practical. The results turn out promising.

2. Simulate a conventional domino logic to gain some initial result, including comparison between circuits with and without dual Vt. During the simulation process, transistor sizing turns out to play an important role in the performance of the circuit. This may lead to the new idea on how to improve the current dual Vt technique.

Phase 2: (After proposal)3. Future work could include:

a. Develop a specific method to evaluate the circuit performanceb. Investigate the transistor sizing issues and expand the volume of the

circuit if necessary and possiblec. Study the various characteristics of the domino circuit, such as noise

margin, time delay and power consumption. Look for new techniques that can optimize as many properties as possible within contemporary technologies

Simulation printout and initial result:

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