customized optical sensor for r2r - nov 2014
TRANSCRIPT
Customized Optical Sensors for
Roll-to-Roll Manufacturing
November 2014
Gang Sun, Ph.DSunOptical Systems, LLC
Email: [email protected]: 908-799-8886, Fax: 908-509-0711
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Overview
�Provide high-speed inline inspection sensors for roll-to-roll manufacturing and research needs.
�Macro inspection (5 to 20µm resolution) for large area at high-speed for continous moving targets
�Realtime inspection synchronized with roller encoder inputs to have accurate position stamps
�Customized illumiation configurations optimized for different applications
�Sensor array can provide full area coverage, with independent sensor-level defects identification and ethernet-connected data storage and analysis.
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Installations at CAMM Endicott, NY
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Speed benefit of a profile sensor
� Traditional vision sensor read in all pixels with full information but requires N×N amount of data transfer
� Projection profiles are the sum of the pixels in columns and rows, which subtracts the shape and position while
requires only 2N amount of data transfer.
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image sensor projection profiles
x - profile
y -
pro
file
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Defects inspection
�Surface particles - size, count, statistics�Oblique light scattering provides strong signals
for micon or sub-micron particles identification
�Modeling polarized light scattering on transparent substrate provides quantitative measurements
�Surface scratch - length, width, intensity�Shape-based algorithms can effectively identify
and measure scratches of micron-level
�Scratch depth can be estimated from polarized light scattering analysis
�For substrate as well as for patterned structrues, such as sensitive sensor pads
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Test with a glass defects standard
Scrach: 10µm width, 400nm height,
with AFM measurement Kodak Surface Quality Reference,
Edmund Optics #53-197
AFM image and measurement
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Pattern inspection
� Pattern matching and
registration
� Dimension and position measurements
� Low-contast patterns can be enhanced with polarizers in
illumination and imaging
together
� Selective edge signal
enhancement depends on
applications need
Courtesy of a CAMM sample
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Line edge quality
� Light scattering from edge is
polarization dependent and
correlates to its height, slope and roughness
� Some pattern print errors can be quickly identified at edge under
certain polarizer configations in
illumination and imaging
� Combine results from multiple
polarization configurations can
provide more information
good die
bad die
null configuration
null configuration
Courtesy of a CAMM sample
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Film inspection
� Difference in contrast and
color indicates difference in film thickness or
refractive index
� Large area inline color
inspection measures film uniformity in realtime
� Polarization-dependent changes in color and
intensity can provide
measurements for
anisotropic films
300nm ITO film with one Oxygen concentration
300nm ITO film with a different Oxygen concentration
low contrast polarization configuration high contrast polarization configuration
low contrast polarization configuration high contrast polarization configuration
Courtesy of a CAMM sample
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Sensors array for large-area inspection
� To measure large area at high-speed, array of the same
sensors can be connected
� Different measurements are carried out by different
sensor arrays in parallel for the same moving sample
� Each sensor provides low-level defects identification
� Combined measurement results are analyzed to make the process decision
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Ethernet connected sensors array for high-speed
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�Defects identification and classification algorithms
development - Timothy Moon
�Timing generation with FPGA based on roller postion encoder - Robert Hogan
�Pattern position & dimension measurement, pattern
errors identification - Kenji Okamoto
�CAMM applications and systems support - Robert
Malay & Joseph Steiner
�Sensors supplier with inspection & metrology
technology support - SunOptical Systems
�Director - Mark Poliks
Current CAMM inspection team
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� Rudolph Technologies, http://www.rudolphtech.com, 2004 - 2013� Sr. Technologist, optical systems design for thin-film metrology
� WaferView Inspection Tool Owner and Products Development Manager, for semiconductor lithography and defects inspection
� Nanometrics, http://nanometrics.com, 2002 - 2004� Sr. Systems Scientist, developed data acquisition and system
calibration for a new spectroscopic ellipsometer design
� Therma-Wave, http://www.thermawave.com, 2000 - 2002� Sr. Research Scientist, designed & prototyped integrated DUV
reflectrometer, confocal autofocusing, dual-mag pattern-rec imaging
� Ford Research, http://corporate.ford.com/innovation, 1998 - 2000� Research Assistant, developed a metal corrosion inspection system
� Rutgers Business School, MBA
� Wayne State University, PhD in Physics
Gang's Previous experience