cree 1200v 80mohm mosjfet cmf20120 - system plus · 9 rue alfred kastler - bp 10748 - 44307 nantes...

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© 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET CMF20120 1 9 rue Alfred Kastler - BP 10748 - 44307 Nantes Cedex 3 - France Phone : +33 (0) 240 180 916 - email : [email protected] - website : www.systemplus.fr April 2011 - Version 1 Written by: Sylvain HALLEREAU DISCLAIMER : System Plus Consulting provides cost studies based on its knowledge of the manufacturing and selling prices of electronic components and systems. The given values are realistic estimates which do not bind System Plus Consulting nor the manufacturers quoted in the report. System Plus Consulting is in no case responsible for the consequences related to the use which is made of the contents of this report. The quoted trademarks are property of their owners.

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 1

    9 rue Alfred Kastler - BP 10748 - 44307 Nantes Cedex 3 - France

    Phone : +33 (0) 240 180 916 - email : [email protected] - website : www.systemplus.fr

    April 2011 - Version 1

    Written by: Sylvain HALLEREAU

    DISCLAIMER : System Plus Consulting provides cost studies based on its knowledge of the manufacturing and selling prices of electronic components and systems. The given values are realistic

    estimates which do not bind System Plus Consulting nor the manufacturers quoted in the report. System Plus Consulting is in no case responsible for the consequences related to the use which is

    made of the contents of this report. The quoted trademarks are property of their owners.

    http://www.systemplus.fr/http://www.systemplus.fr/

  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 2

    Table of Contents

    Executive Summary

    Table of Contents

    Reverse Costing Methodology

    1. Physical Analysis

    Physical Analysis Methodology

    Package

    Die Overview

    Guard Ring

    Passivation

    Metal Layer

    MOSFET Gate

    SIMS Analysis

    Substrate and epitaxy

    Back Side

    Thickness Synthesis

    MOSFET Structure &Characteristics

    2. Manufacturing Process

    Process Flow

    Wafer Fabrication Unit

    2

    4

    5

    6

    37

    3. Manufacturing Cost

    Wafer Cost data

    Yields Explanation

    MOSFET Unprobed Wafer Cost

    Wafer Cost per process steps

    Equipment Cost per Family

    Material Cost per Family

    Die per Wafer and Probe Test

    Probe Test

    Dicing and Package

    Final Test Cost

    MOSFET Die Cost

    Yields synthesis

    Price estimation

    Contact

    Glossary

    42

    57

    61

    62

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 3

    Die in the Package

    Gate bond

    Source bond The Drain is directly soldered on the

    package leadframe with SAC solder.

    5 Aluminum wire bonds :

    Gate bond : 7mm and 200µm of diameter.

    Source bond : 7mm and 200µm of diameter.

    G

    S D

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 4

    Gate contacts

    Source area

    Source

    SEM views : Die after the delayering. The passivation and aluminum layer are etched.

    Die Overview - Delayering

    Gate

    Area where the

    aluminum pad is in

    contact with

    source doping

    Gate under an

    SiO2 dielectric

    layer.

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 5

    SEM view : metal and passivation layer details

    Si3N4 layer

    Optical view : passivation details

    Aluminum layer

    Passivation borderline

    Passivation Layer

    Pad

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 6

    MOSFET Gate

    Gate in Polysilicon

    Gate in Polysilicon

    SiO2 : 3 layers of SiO2 are deposited

    on the gate to insulate it.

    Thin gate oxide =

    52nm

    SEM view : Gate detail, small recess

    The recesses may be done to eliminate the first atomic

    layers damaged by the ionic implantations.

    SEM view : Gate detail high magnification

    Second SiO2 thin layer

    First SiO2 thin layer

    Third SiO2 thin layer

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 7

    SIMS analysis

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 8

    Process Flow (1/3)

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 9

    MOSFET Unprobed Wafer Cost

    • The main part of the wafer cost is due to the

    raw wafer (XX.X%).

    • The manufacturing yield is around XX% in 2011.

    Details of the cost per step are given in the Excel

    Spreadsheet

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  • © 2011 by SYSTEM PLUS CONSULTING, all rights reserved. CREE 1200V 80mohm MOSJFET – CMF20120 10

    Selling Price

    Note: These calculated selling prices are for large quantities purchased directly from CREE.

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